CN109442888B - Drying system based on heat pump - Google Patents

Abstract

The invention discloses a drying system based on a heat pump, which aims to provide a drying system that can not only overcome the problems of large consumption of wood and pollute the environment in the traditional drying process of shiitake mushrooms; Heat-pump-based drying system with the problem of heating uniformity of the edge. It includes a drying room, a heat pump, a drying room set in the drying room, and an air duct system. The air duct system includes a main air duct, a return air duct, a return air outlet connecting the main air duct and the return air duct, and the control of the return air opening. A return air valve, an exhaust duct connected to the return air duct at one end, a new air duct connecting the outside of the drying room with the main air duct, and a fresh air valve that controls the opening and closing of the new air duct; the heat pump includes an indoor unit arranged in the main air duct; The bottom of the inner cavity of the drying room is provided with a drying room air inlet, the top of the inner cavity of the drying room is provided with a drying room air outlet, and the inner cavity of the drying room is provided with a mushroom drying rack.

Description

Heat pump based drying system

technical field

The invention relates to a drying device, in particular to a drying system based on a heat pump.

Background technique

Shiitake mushroom is a kind of edible fungus, which is loved by consumers because of its delicious taste and high nutritional value. After the shiitake mushrooms are picked, the shiitake mushrooms should be pre-processed and then packaged and sold. The most important process in the initial processing of shiitake mushrooms is the drying process. The drying process of shiitake mushrooms plays a decisive role in the quality of dried shiitake mushrooms.

In the traditional mushroom drying process, wood combustion is used to heat the gas to the required temperature, and then a fan or an air pump is used to send the high-temperature gas into the drying room to heat the mushrooms in the drying room. This drying method involves wood. The consumption is large, which increases the drying cost and pollutes the environment.

To this end, the inventor invented a mushroom drying device in 2016 (Chinese Patent Application No. 201621464225.3, published on August 8, 2017, the name of the invention is a mushroom drying device), the mushroom drying device Using the heat pump to provide heat energy to dry the shiitake mushrooms effectively solves the shortcomings in the traditional shiitake mushroom drying process, but it still has the following shortcomings: the hot air flow in the drying chamber of the shiitake mushroom drying device flows horizontally through the shiitake mushroom drying process. Drying rack, which makes the mushroom cover unevenly heated during the drying process. The mushroom cover edge facing the air inlet side is heated and rolled inward, while the mushroom cover edge facing away from the air inlet side is heated and rolled inward. Small, resulting in uneven rolling of the dried mushroom cover edge, poor roundness of dried mushrooms, affecting the quality of dried mushrooms.

SUMMARY OF THE INVENTION

The object of the present invention is to provide a kind of problem that can not only overcome the traditional shiitake mushroom drying, the consumption of wood is large, the drying cost is high, but also the environmental pollution; and can effectively improve the uniform heating of the mushroom cover edge during the drying process It is a heat pump-based drying system that avoids the uneven heating of the lid edge of the mushroom, which causes the uneven turning of the lid edge of the dried mushroom, which affects the quality of the dried mushroom.

The technical scheme of the present invention is:

A drying system based on a heat pump, comprising a drying room, a heat pump, a drying room arranged in the drying room, and an air duct system, wherein the air duct system includes a main air duct, a return air duct, and a connection between the main air duct and the return air. The return air outlet of the duct, the return air valve controlling the opening and closing of the return air outlet, the exhaust air duct connected with the return air duct at one end, the new air duct connecting the outside of the drying room and the main air duct, and the fresh air valve controlling the opening and closing of the new air duct; The heat pump includes an outdoor unit and an indoor unit arranged in the main air duct; the bottom of the inner cavity of the drying chamber is provided with a drying chamber air inlet that is communicated with the main air duct, and the top of the inner cavity of the drying chamber is provided with an air inlet of the drying chamber. The air outlet of the drying chamber connected with the return air duct, the inner cavity of the drying chamber is provided with a mushroom drying rack, and the mushroom drying rack includes a number of mushroom drying screens distributed in sequence from bottom to top, and the mushroom drying screen is located in the Between the air inlet of the drying chamber and the air outlet of the drying chamber.

The heat pump-based drying system of this scheme utilizes the external unit of the heat pump to provide heat energy to the indoor unit. The indoor unit forms a hot air flow in the main air duct and enters the drying room to dry the mushrooms, which does not require the use of wood and reduces the drying time of the mushrooms. Dry cost, and will not pollute the environment during the work.

On the other hand, the hot air in the main air duct enters the inner cavity of the drying chamber through the air inlet of the drying chamber, and is discharged from the air outlet of the drying chamber, thereby forming a bottom-to-up hot air flow in the inner cavity of the drying chamber , and the mushroom drying sieves are distributed from bottom to top and located between the air inlet of the drying room and the air outlet of the drying room (the mushrooms are placed on the mushroom drying sieve, and the mushroom feet of the mushrooms are facing up). During the drying process, the shiitake mushrooms are dried by the hot air flowing from the bottom to the top, the lid edges of the shiitake mushrooms are heated at the same time, and the lid edges of the shiitake mushrooms are heated evenly, the lid edges of the dried shiitake mushrooms are evenly rolled inward, and the dried shiitake mushrooms have good roundness, thereby Improve the quality of dried shiitake mushrooms.

Preferably, it also includes an evaporator room arranged in the drying room, the evaporator room is provided with a ventilation port that communicates with the outside of the drying room, the external machine is located in the evaporator room, and the other end of the exhaust duct is connected to the evaporator. Room is connected.

In this scheme, the hot air discharged from the air outlet of the drying room can enter the evaporator room where the outdoor machine is located through the air exhaust duct, so as to further recycle the heat energy.

Preferably, the air duct system is located between the drying chamber and the evaporator chamber, the return air duct and the fresh air duct are located above the indoor unit, and the air inlet of the drying chamber is located below the indoor unit. The structure of the solution can improve the compactness of the drying room and reduce the volume of the drying room.

Preferably, the mushroom drying rack also includes a number of drying sieve placement racks corresponding to the mushroom drying sieves one-to-one, the mushroom drying sieves are placed on the corresponding drying sieve placement racks, and the drying sieve placement racks include two drying sieve placement racks. The drying sieve supporting plates on the inner side of the inner cavity of the drying chamber are placed in the same drying sieve rack: two drying sieve supporting plates are located on the opposite inner sides of the inner cavity of the drying chamber, and the two drying sieve supporting plates are located on the opposite inner sides of the inner cavity of the drying chamber. Dry sieve support plates are located at the same height. The structure of the scheme is convenient for taking and placing the shiitake mushroom drying sieve, and is convenient for practical operation.

Preferably, the drying screen support plate is arranged horizontally.

Preferably, the drying screen placing rack further includes a floating drying screen positioning mechanism arranged on the drying screen support plate in a one-to-one correspondence, and the floating drying screen positioning mechanism includes a floating drying screen positioning mechanism arranged on the drying screen support plate. A vertical guide rod, a drying screen placing plate raised and lowered along the vertical guide rod, a placing plate limit block arranged on the outer side of the vertical guide rod and located below the drying screen placing plate, and a placing plate limit block disposed on the vertical guide rod The limit baffle and the sleeve at the lower end of the drying sieve are set on the vertical guide rod and are located between the limit baffle and the drying sieve placing plate, the drying sieve placing plate is located below the drying sieve supporting plate, When the drying sieve placing plate abuts on the limiting block of the placing plate: an air passage for airflow is formed between the drying sieve placing plate and the drying sieve support plate; the mushroom drying sieve is placed on the corresponding drying sieve Place the drying sieve of the rack on the placement plate.

In the actual operation process, after the fresh shiitake mushrooms are placed on the shiitake drying sieve, the fresh shiitake mushrooms almost cover the sieve holes of the shiitake mushroom drying sieve, which will cause the following problems:

In the initial stage of shiitake mushroom drying, because the fresh shiitake mushrooms cover the sieve holes of the shiitake mushroom drying sieve, the hot air entering the inner cavity of the drying chamber from the air inlet of the drying chamber is gathered at the bottom of the drying chamber, and the hot air flow is difficult and easy In the initial stage of drying mushrooms, fresh mushrooms have high water content and high humidity. At this stage, the most important thing is to quickly remove the surface moisture of mushrooms, and at the same time, the temperature should not be too high. It will affect the drying quality of shiitake mushrooms; in this way, due to the difficulty and smooth flow of hot air, the surface moisture of shiitake mushrooms cannot be quickly removed, and at the same time, the drying efficiency of shiitake mushrooms in the upper part of the drying room is seriously reduced; A large number of them gather at the bottom of the drying chamber, which will also cause the temperature of the shiitake mushrooms at the bottom of the drying chamber to be too high in the initial stage of drying the shiitake mushrooms, which will affect the drying quality of the shiitake mushrooms at the bottom of the drying chamber.

In view of the above problems, this solution improves the drying screen placement rack, and designs a floating drying screen positioning mechanism, so as to effectively solve the above problems. Drying efficiency and quality of shiitake mushrooms during drying, urging drying and Titian stages).

Preferably, vertical guide holes matched with the vertical guide rods are provided on the drying screen placing plate, and the vertical guide rods pass through the corresponding vertical guide holes.

Preferably, the shiitake drying sieves are distributed equidistantly from bottom to top.

Preferably, the fresh air duct passes through the exhaust air duct.

The new air duct in this scheme passes through the exhaust duct, which can also heat the air in the new air duct during the process of hot air passing through the exhaust duct, thereby further recycling heat energy.

Preferably, the air duct system further includes an air exhaust valve for controlling the opening and closing of the air exhaust duct.

Preferably, an electric auxiliary heating device is also included, the electric auxiliary heating device is arranged in the main air duct, and the electric auxiliary heating device is located between the indoor unit and the air inlet of the drying room. The electric auxiliary heating device can assist the indoor unit in the case of low climate temperature (such as winter), form a hot air flow in the main air duct, and improve the drying efficiency.

Preferably, one side of the drying chamber is provided with a drying chamber door for the mushroom drying screen to enter and exit.

The beneficial effects of the invention are as follows: not only can the traditional shiitake mushroom drying consume large amount of wood, the drying cost is high, but also the problems of environmental pollution can be overcome; and the heating uniformity of the shiitake mushroom cover edge during the drying process can be effectively improved, The dried shiitake mushrooms can be rolled evenly inward and the roundness of the dried shiitake mushrooms is good, thereby improving the quality of the dried shiitake mushrooms and avoiding the uneven heating of the lids of the shiitake mushrooms. The problem.

Description of drawings

FIG. 1 is a schematic structural diagram of a drying system based on a heat pump according to Embodiment 1 of the present invention.

FIG. 2 is a schematic diagram of a cross-sectional structure at A-A in FIG. 1 .

FIG. 3 is a schematic structural diagram of the drying chamber in the working process of Embodiment 2 of the present invention.

FIG. 4 is a partial enlarged view of B in FIG. 3 .

In the picture:

Drying room 1, drying room air inlet 1.1, drying room air outlet 1.2, drying room door 1.3;

Mushroom drying sieve 2;

Drying screen placing rack 3, drying screen supporting plate 3.1, floating drying screen positioning mechanism 3.2, vertical guide rod 3.2.1, drying screen placing plate 3.2.2, placing plate limit block 3.2.3, Return spring 3.2.4, limit stopper 3.2.5;

Air duct system 4 in the drying room, main air duct 4.1, return air duct 4.2, exhaust air duct 4.3, fresh air duct 4.4, return air valve 4.5, fresh air valve 4.6, exhaust air valve 4.7;

evaporator chamber 5;

Outdoor unit 6.1, indoor unit 6.2;

Electric auxiliary heating device 7;

Airflow aisle 8.

Detailed ways

The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments:

Embodiment 1: As shown in Figure 1 and Figure 2, a drying system based on a heat pump includes a drying room, a heat pump, an electric auxiliary heating device 7, a drying room 1 arranged in the drying room, and a drying room arranged in the drying room. The air duct system 4 and the evaporator chamber 5 arranged in the drying room.

The air duct system is located between the drying chamber and the evaporator chamber. The air duct system includes a main air duct 4.1, a return air duct 4.2, a return air outlet connecting the main air duct and the return air duct, a return air valve 4.5 for controlling the opening and closing of the return air outlet, and an exhaust duct 4.3 connected to the return air duct at one end, The exhaust valve 4.7 for controlling the on-off of the exhaust duct, the new air duct 4.4 for connecting the outside of the drying room and the main air duct, and the fresh air valve 4.6 for controlling the on-off of the new air duct. The new air duct passes through the exhaust duct. The other end of the exhaust duct communicates with the evaporator chamber. The main air duct extends up and down. The return air duct is near the top of the oven. The exhaust duct is near the top of the oven.

The heat pump includes an outdoor unit 6.1 and an indoor unit 6.2 arranged in the main air duct. The return air duct and the fresh air duct are located above the indoor unit. The air inlet of the drying chamber is located below the indoor unit.

The electric auxiliary heating device is an electric heater, such as electric heating wire or electric heating rod. The electric auxiliary heating device is arranged in the main air duct, and the electric auxiliary heating device is located between the indoor unit and the air inlet of the drying room.

The evaporator room is provided with a ventilation port which communicates with the outside of the drying room. The outdoor unit is located in the evaporator room.

The bottom of the inner cavity of the drying chamber is provided with a drying chamber air inlet 1.1 which is communicated with the main air duct. The top of the inner cavity of the drying chamber is provided with an air outlet 1.2 of the drying chamber which is communicated with the return air duct. A mushroom drying rack is arranged in the inner cavity of the drying chamber.

The shiitake mushroom drying rack includes a plurality of shiitake mushroom drying sieves 2 equidistantly distributed in sequence from bottom to top, and a drying sieve placing rack 3 corresponding to the shiitake mushroom drying sieves one-to-one. One side of the drying chamber is provided with a drying chamber door 1.3 for entering and exiting the mushroom drying screen. Mushroom drying sieve level setting. The mushroom drying sieve is placed on the corresponding drying sieve rack. The mushroom drying screen is located between the air inlet of the drying chamber and the air outlet of the drying chamber.

The drying screen placing rack includes two drying screen supporting plates 3.1 arranged on the inner side of the inner cavity of the drying chamber. The drying screen support plate is set horizontally. In the same drying sieve rack: two drying sieve support plates are located on the opposite inner sides of the inner cavity of the drying chamber, and the two drying sieve support plates are located at the same height. In this embodiment, the mushroom drying sieve is placed on the two drying sieve support plates of the corresponding drying sieve placement rack.

The specific application of the drying system based on the heat pump of the present embodiment is as follows:

First, place the fresh shiitake mushrooms evenly on the shiitake mushroom drying sieve, and the mushroom feet of the shiitake mushrooms placed on the shiitake mushroom drying sieve face upwards;

Place the shiitake drying sieve on which the fresh shiitake mushrooms are placed on the drying sieve support plate of the corresponding drying sieve placement rack;

Second, close the door of the drying chamber, turn on the heat pump, and dry the mushrooms. The drying of shiitake mushrooms includes the following stages in turn;

The initial stage of mushroom drying:

In this stage, due to the high water content and high humidity of fresh shiitake mushrooms, at this time, the most important thing is to quickly remove the moisture on the surface of shiitake mushrooms without having too high temperature; therefore, in the initial stage of shiitake mushroom drying: the return air valve is closed and the air is exhausted. The valve and the fresh air valve are fully open;

The indoor unit works in the main air duct to form a hot air flow and enters the inner cavity of the drying chamber through the air inlet of the drying chamber. The air is discharged from the air outlet, and is discharged into the evaporator room through the return air duct and the exhaust air duct; at the same time, the outside air enters the main air duct through the new air duct;

In this process: the hot air can also heat the air in the new air duct during the process of passing through the exhaust duct, so as to recycle the heat energy once; , so that the energy loss is greatly reduced.

Drying and holding stage of shiitake mushrooms:

In this stage, since the mushrooms have been heated for a period of time, the moisture of the mushrooms has decreased, so the drying temperature should be increased and the exhaust air flow should be reduced; therefore, in the drying and maintenance stage of the mushrooms: the return air valve is partially opened, and the exhaust valve and the fresh air valve are partially open. Open;

In the hot air discharged from the air outlet of the drying room, a part of the hot air enters the main air duct through the return air duct for recycling; the other part of the hot air is discharged into the evaporator room through the return air duct and the exhaust air duct; The new air duct enters the outside air in the main air duct; thereby increasing the drying temperature, reducing the exhaust air flow and reducing heat loss.

Similarly, in this process: the hot air can also heat the air in the new air duct during the process of passing through the exhaust duct, so as to recycle the heat energy once; Recycling and reuse greatly reduces energy loss.

Mushroom drying, drying, Titian stage:

This stage is the final stage of drying the mushrooms. Since the humidity of the mushrooms is close to the drying requirements, the moisture of the mushrooms is already low. In order to promote the decomposition of the fragrance elements in the mushrooms, the drying of the mushrooms must reach a higher temperature; In the fragrance stage: the return air valve is fully opened, and the exhaust air valve and the fresh air valve are closed;

All the hot air discharged from the air outlet of the drying room enters the main air duct through the return air duct for recycling, and the air circulation is not discharged to the outside, which greatly reduces the heat loss of the drying device and improves the quality of shiitake mushrooms.

More importantly, in each stage of drying the mushrooms in this embodiment; the mushrooms are dried by the hot air flowing from bottom to top, the lid edges of the mushrooms are heated at the same time, and the lid edges of the mushrooms are heated evenly, so that the dried lid edges of the mushrooms are The inversion is evenly rolled, and the roundness of the dried shiitake mushrooms is good, thereby improving the quality of the dried shiitake mushrooms.

Embodiment 2: The remaining structures of this embodiment refer to Embodiment 1, and the differences are:

As shown in Figures 3 and 4, the drying screen placing rack further includes a floating drying screen positioning mechanism 3.2 which is arranged on the drying screen support plate in a one-to-one correspondence.

The floating drying screen placement and positioning mechanism includes a vertical guide rod 3.2.1 arranged on the drying screen support plate, a drying screen placement plate 3.2.2 that rises and falls along the vertical guide rod, and is disposed outside the vertical guide rod. The placing plate limit block 3.2.3 on the side and below the drying screen placing plate, the limit baffle 3.2.5 set at the lower end of the vertical guide rod and the sleeve are set on the vertical guide rod and located at the limit Return spring 3.2.4 between the baffle plate and the drying screen placement plate. In this embodiment, there are two vertical guide rods of the same floating drying screen placement and positioning mechanism. The drying screen placing plate is provided with vertical guide holes matched with the vertical guide rods, and the vertical guide rods pass through the corresponding vertical guide holes.

The drying screen placing plate is located below the drying screen supporting plate. The drying screen placing plate is parallel to the drying screen supporting plate.

As shown in FIG. 4 , when the drying sieve placing plate is against the limiting block of the placing plate, an airflow passage 8 for air flow is formed between the drying sieve placing plate and the drying sieve supporting plate.

In this embodiment, the mushroom drying sieve is placed on the drying sieve placing plate of the corresponding drying sieve placing rack.

As shown in Figure 3 and Figure 4, when the shiitake drying sieve for placing the fresh shiitake mushrooms is placed on the drying sieve placement plate of the corresponding drying sieve placement rack, because the weight of the fresh shiitake is large, the shiitake mushroom drying sieve is at this time. Overcoming the elastic force of the return spring, the drying screen placing plate will go down along the vertical guide rod until the drying screen is placed against the limit block of the placing plate.

When the placing plate of the drying sieve abuts on the limiting block of the placing plate, an air passage for air circulation is formed between the placing plate of the drying sieve and the supporting plate of the drying sieve; in this way, in the initial stage of mushroom drying: from the drying room The hot air from the air inlet into the bottom of the inner cavity of the drying chamber will circulate from bottom to top through the airflow channel formed between the drying screen placing plate and the drying screen support plate, ensuring that the mushrooms are dried in the initial stage, and the surface of the mushrooms is The moisture can be smoothly taken away by the hot air; thus avoiding the initial stage of drying the mushrooms: because the hot air is difficult and smooth to circulate upwards, it is impossible to quickly remove the surface moisture of the mushrooms, and it also seriously reduces the dryness of the mushrooms in the upper part of the drying room. The problem of drying efficiency; and because a large number of hot air flows at the bottom of the drying chamber, the temperature of the mushrooms at the bottom of the drying chamber is too high in the initial stage of drying the mushrooms, which affects the drying quality of the mushrooms at the bottom of the drying chamber. question.

After the shiitake mushrooms are dried for a period of time, the moisture of the shiitake mushrooms decreases and the weight of the shiitake mushrooms decreases. At this time, under the action of the return spring, the drying screen placing plate moves up the vertical guide rod until the drying screen is placed against the drying screen support. up to the lower surface of the board.

When the drying sieve is placed against the lower surface of the drying sieve support plate, the airflow passage between the drying sieve placing plate and the drying sieve support plate is closed; A certain amount of inward rolling and shrinkage occurs, so that there is a gap between the mushrooms on the mushroom drying sieve. Part of the sieve holes of the mushroom drying sieve are opened, and the hot air can flow directly from the bottom to the top through the sieve holes of the mushroom drying sieve. , will not affect the drying efficiency and quality of the subsequent stages of shiitake drying, thereby ensuring the drying efficiency and quality of the shiitake mushrooms in the subsequent stages of drying (maintenance stage of drying of mushrooms, drying of dried mushrooms, and stages of incense enhancement).

Claims (6)

1. A drying system based on a heat pump is characterized by comprising a drying room, the heat pump, a drying room arranged in the drying room and an air duct system,

the air duct system comprises a main air duct, an air return port communicated with the main air duct and the air return duct, an air return valve for controlling the on-off of the air return port, an exhaust duct with one end communicated with the air return duct, a fresh air duct communicated with the outside of the drying room and the main air duct and a fresh air valve for controlling the on-off of the fresh air duct;

the heat pump comprises an outdoor unit and an indoor unit arranged in the main air duct;

the bottom of the inner cavity of the drying chamber is provided with a drying chamber air inlet communicated with the main air duct, the top of the inner cavity of the drying chamber is provided with a drying chamber air outlet communicated with the return air duct, a mushroom drying rack is arranged in the inner cavity of the drying chamber, the mushroom drying rack comprises a plurality of mushroom drying sieves which are sequentially distributed from bottom to top, and the mushroom drying sieves are positioned between the drying chamber air inlet and the drying chamber air outlet;

the mushroom is dried and is put up still includes a plurality of and mushroom drying sieve one-to-one's drying sieve rack, and mushroom drying sieve places on the drying sieve rack that corresponds, and drying sieve rack includes two drying sieve backup pads that set up on the medial surface of the inner chamber of drying chamber, in same drying sieve rack: the two drying screen supporting plates are positioned on two opposite inner side surfaces of an inner cavity of the drying chamber and are positioned at the same height;

the drying sieve placing frame also comprises a floating type drying sieve placing and positioning mechanism which is arranged on the drying sieve supporting plate in a one-to-one correspondence manner, the floating type drying sieve placing and positioning mechanism comprises a vertical guide rod arranged on the drying sieve supporting plate, a drying sieve placing plate which can be lifted along the vertical guide rod, a placing plate limiting block which is arranged on the outer side surface of the vertical guide rod and is positioned below the drying sieve placing plate, a limiting baffle plate arranged at the lower end of the vertical guide rod, and a return spring which is sleeved on the vertical guide rod and is positioned between the limiting baffle plate and the drying sieve placing plate, the drying sieve placing plate is positioned below the drying sieve supporting plate,

when the drying screen is placed the board and is supported on placing the board stopper: an airflow passage for air circulation is formed between the drying sieve placing plate and the drying sieve supporting plate;

the mushroom drying sieve is placed on the drying sieve placing plate of the corresponding drying sieve placing frame;

the drying screen placing plate is provided with vertical guide holes matched with the vertical guide rods, and the vertical guide rods penetrate through the corresponding vertical guide holes.

2. The heat pump-based drying system as claimed in claim 1, further comprising an evaporator chamber disposed in the drying room, wherein the evaporator chamber is provided with a vent communicated with an outside of the drying room, the external unit is disposed in the evaporator chamber, and the other end of the exhaust duct is communicated with the evaporator chamber.

3. The heat pump-based drying system of claim 2, wherein the air duct system is located between the drying chamber and the evaporator chamber, the return air duct and the fresh air duct are located above the indoor unit, and the drying chamber inlet is located below the indoor unit.

4. The heat pump-based drying system according to claim 1, 2 or 3, wherein the fresh air duct passes through an exhaust duct.

5. The heat pump-based drying system as claimed in claim 1, 2 or 3, wherein the air duct system further comprises an exhaust valve for controlling the on-off of the exhaust duct.

6. The heat pump-based drying system according to claim 1, 2 or 3, further comprising an electric auxiliary heating device, wherein the electric auxiliary heating device is disposed in the main air duct, and the electric auxiliary heating device is located between the indoor unit and the air inlet of the drying chamber.

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