CN109433663A - Mask plate processing procedure tub cleaning method - Google Patents
Mask plate processing procedure tub cleaning method Download PDFInfo
- Publication number
- CN109433663A CN109433663A CN201811278788.7A CN201811278788A CN109433663A CN 109433663 A CN109433663 A CN 109433663A CN 201811278788 A CN201811278788 A CN 201811278788A CN 109433663 A CN109433663 A CN 109433663A
- Authority
- CN
- China
- Prior art keywords
- cleaning
- processing procedure
- wall
- slot
- mask plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 103
- 238000000034 method Methods 0.000 title claims abstract description 100
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 35
- 239000007788 liquid Substances 0.000 claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 claims abstract description 32
- 229910001868 water Inorganic materials 0.000 claims abstract description 32
- 238000004851 dishwashing Methods 0.000 claims abstract description 26
- 239000002699 waste material Substances 0.000 claims abstract description 23
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 19
- 239000006193 liquid solution Substances 0.000 claims abstract description 18
- 238000006243 chemical reaction Methods 0.000 claims abstract description 11
- 239000013049 sediment Substances 0.000 claims abstract description 5
- 239000000428 dust Substances 0.000 claims description 13
- 239000004744 fabric Substances 0.000 claims description 12
- 238000005201 scrubbing Methods 0.000 claims description 11
- 238000005406 washing Methods 0.000 claims description 2
- 238000002242 deionisation method Methods 0.000 claims 1
- 230000007547 defect Effects 0.000 abstract description 12
- 239000000243 solution Substances 0.000 description 12
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 6
- 229910002651 NO3 Inorganic materials 0.000 description 5
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 5
- 229940005561 1,4-benzoquinone Drugs 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012286 potassium permanganate Substances 0.000 description 3
- 230000001376 precipitating effect Effects 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 125000001292 4,6-dihydroxy-1,3-phenylene group Chemical group OC1=C(C=C(C(=C1)O)*)* 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- JVXNCJLLOUQYBF-UHFFFAOYSA-N cyclohex-4-ene-1,3-dione Chemical compound O=C1CC=CC(=O)C1 JVXNCJLLOUQYBF-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium nitrate Inorganic materials [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Abstract
The embodiment of the present invention provides a kind of mask plate processing procedure tub cleaning method, the following steps are included: using nitric acid solution manufacturing process for cleaning slot inner wall, it reacts the sediment being attached on inner wall sufficiently with nitric acid solution, the first cleaning waste liquid formed in processing procedure slot is removed after the completion of cleaning；Using dish washing liquid solution manufacturing process for cleaning slot inner wall, the reaction residue on inner wall is sufficiently dissolved, and removes the second cleaning waste liquid formed in processing procedure slot after the completion of cleaning；Using water manufacturing process for cleaning slot inner wall, and the third cleaning waste liquid formed in processing procedure slot is removed after the completion of cleaning.The embodiment of the present invention is cleaned by using first nitric acid solution, the method of dish washing liquid solution cleaning afterwards, mask plate processing procedure slot can thoroughly be cleaned, it is easy to operate, clean it is at low cost, high degree avoid for produce mask plate when mask plate on forming black defect, reduce the pressure of corrective pitting, product yield is improved, extend processing procedure slot uses time, save the cost.
Description
Technical field
The present embodiments relate to mask plate technical fields, more particularly to a kind of mask plate processing procedure tub cleaning method.
Background technique
Defect in dry plate manufacturing process on product is mainly white defect and black defect, wherein black defect is mainly wet
It is generated in processing procedure link, the wet process of dry plate mainly develops and two links of fixing, respectively in developing trough and fixing bath
Chemical liquid react and complete, some insoluble substances or perishable can be generated in the development of dry plate and fixing reaction process
Substance, such as: 1,4-benzoquinone, silver and silver bromide, these substances can seriously pollute processing procedure slot after accumulation after a period of time,
When producing dry plate in contaminated groove body, the gelatin on dry plate surface layer is highly prone to pollution and forms black defect, and black defect is for dry plate
For endanger very big, gently then cause product bad, it is heavy then cause to scrap.
In order to be reduced or avoided the generation of the black defect of dry plate, improve dry plate product quality and yield, it is necessary to processing procedure slot into
Development and the liquid medicine being fixed in link residual or reactant residual are washed off in row cleaning, and the cleaning method in industry is usually at present
Dish washing liquid ablution, potassium permanganate ablution either ammonium ceric nitrate ablution.
Traditional dish washing liquid ablution mainly utilizes the effect of surfactant, remains in reactant on groove body
Adhesiveness reduces, and is easy to rinse out from groove body, but since it fails to chemically react with residue, so that cleaning effect is simultaneously
It is undesirable；In addition, potassium permanganate or ammonium ceric nitrate ablution, this both of which is to utilize its strong oxidizing property and residue
Reaction is learned, achievees the purpose that dissolution is removed, however two methods or some deficiencies.
Potassium permanganate is difficult silver oxide simple substance in the aqueous solution of room temperature, and its oxidation reaction can all have indissoluble produce
It is raw:
3C6H6O2 + 4KMnO4 3C6H4O2 + 4MnO2 + 4KOH + H2O,
Ammonium ceric nitrate equally can also be reacted with developer hydroquinone generates 1,4-benzoquinone precipitating, and silver-colored reaction in room temperature aqueous solution
In also more difficult progress:
C6H6O2 C6H4O2 ,
Ce(NH4)2(NO3)6 + Ag Ce(NO3)3 + AgNO3 + 2NH4NO3 。
Therefore, above 3 kinds of existing cleaning methods can only all do the cleaning or partial cleaning of shallow-layer, cannot cut completely
Bottom cleans up, and causes groove body using for a long time, and buildup of residue is more, can become because of 1,4-benzoquinone precipitating in developing trough body
It can become grey black because of silver precipitating in brownish red or fixing bath body, produce dry plate in such groove body, it will cause black
Defect is increasing, and finally also has to replace groove body.
Summary of the invention
Technical problems to be solved of the embodiment of the present invention are, provide a kind of mask plate processing procedure tub cleaning method, can be thoroughly
Mask plate processing procedure slot is cleaned, to avoid for forming black defect on mask plate when producing mask plate.
In order to solve the above technical problems, the embodiment of the present invention uses following technical scheme: a kind of mask plate processing procedure slot cleans
Method, comprising the following steps:
It using nitric acid solution manufacturing process for cleaning slot inner wall, reacts the sediment being attached on inner wall sufficiently with nitric acid solution, cleans
The the first cleaning waste liquid formed in processing procedure slot is removed after the completion；
Using dish washing liquid solution manufacturing process for cleaning slot inner wall, the reaction residue on inner wall is sufficiently dissolved, and clear after the completion of cleaning
Except the second cleaning waste liquid formed in processing procedure slot；
Using water manufacturing process for cleaning slot inner wall, and the third cleaning waste liquid formed in processing procedure slot is removed after the completion of cleaning.
Further, the concentration of the nitric acid solution is 20% ~ 30%.
When further, using nitric acid solution manufacturing process for cleaning slot inner wall, non-dust cloth or brush scrubbing processing procedure slot inner wall are utilized.
Further, the dish washing liquid solution is to be diluted with water to be formulated by dish washing liquid, dose volume ratio are as follows: every
5ml dish washing liquid adds 4-7L water.
When further, using dish washing liquid solution manufacturing process for cleaning slot inner wall, using in non-dust cloth or brush scrubbing processing procedure slot
Wall.
Further, described to use water manufacturing process for cleaning slot inner wall, and the formed in processing procedure slot is removed after the completion of cleaning
The step of three cleaning waste liquids, carries out at least twice.
Further, after removing first formed in processing procedure slot cleaning waste liquid, water manufacturing process for cleaning slot inner wall is first used
And removed after the completion of cleaning and be formed by the 4th cleaning waste liquid, it then carries out again using dish washing liquid solution manufacturing process for cleaning slot inner wall
The step of.
Further, the water is deionized water.
When further, using water manufacturing process for cleaning slot inner wall, non-dust cloth or brush scrubbing processing procedure slot inner wall are utilized.
Further, the processing procedure slot is developing trough or fixing bath.
By adopting the above technical scheme, the embodiment of the present invention at least has the advantages that the embodiment of the present invention by adopting
It is cleaned with first nitric acid solution, the method for rear dish washing liquid solution cleaning can thoroughly clean mask plate processing procedure slot, easy to operate, cleaning
It is at low cost, high degree avoid for produce mask plate when mask plate on forming black defect, reduce the pressure of corrective pitting,
Product yield is improved, extend processing procedure slot uses time, save the cost.
Detailed description of the invention
Fig. 1 is the flow diagram of an alternative embodiment of mask plate processing procedure tub cleaning method of the present invention.
Fig. 2 is the flow diagram of another alternative embodiment of mask plate processing procedure tub cleaning method of the present invention.
Specific embodiment
Invention is further described in detail in the following with reference to the drawings and specific embodiments.It should be appreciated that signal below
Property embodiment and explanation be only used to explain the present invention, it is not as a limitation of the invention, moreover, in the absence of conflict,
The feature in embodiment and embodiment in the present invention can be combined with each other.
As shown in Figure 1, a kind of mask plate processing procedure tub cleaning method that an alternative embodiment of the invention provides, the processing procedure
Slot be developing trough or fixing bath, the cleaning method the following steps are included:
S1: nitric acid solution manufacturing process for cleaning slot inner wall is used, reacts the sediment being attached on inner wall sufficiently with nitric acid solution, clearly
The the first cleaning waste liquid formed in processing procedure slot is removed after the completion of washing；
S3: dish washing liquid solution manufacturing process for cleaning slot inner wall is used, sufficiently dissolves the reaction residue on inner wall, and after the completion of cleaning
Remove the second cleaning waste liquid formed in processing procedure slot；
S5: using water manufacturing process for cleaning slot inner wall, and the third cleaning waste liquid formed in processing procedure slot is removed after the completion of cleaning.
It is cleaned in the present embodiment by using first nitric acid solution, the method for rear dish washing liquid solution cleaning can be cleaned thoroughly
Mask plate processing procedure slot, easy to operate, cleaning is at low cost, and high degree avoids being formed on mask plate when producing mask plate
Black defect reduces the pressure of corrective pitting, improves product yield, and extend processing procedure slot uses time, save the cost.
In another alternative embodiment of the invention, the concentration of the nitric acid solution is 20% ~ 30%.The present embodiment is by making
It is reacted with the nitric acid solution that concentration is 20% ~ 30% with sediment, substance soluble easily in water is generated, convenient for the reaction on inner wall is residual
Object is stayed to remove, under the acid condition of nitric acid, the 1,4-benzoquinone in processing procedure slot easily generates water-soluble hydroquinone,
C6H4O2 + 2H+ C6H6O2 ,
Silver is dissolved in dust technology, generates silver nitrate solution,
3Ag + 4HNO3 3AgNO3 + NO + 2H2O 。
In another of the invention alternative embodiment, when using nitric acid solution manufacturing process for cleaning slot inner wall, using non-dust cloth or
Brush scrubbing processing procedure slot inner wall.The present embodiment will can sufficiently be attached to processing procedure by non-dust cloth or brush scrubbing processing procedure slot inner wall
Reaction residue and processing procedure slot inner wall on slot inner wall are removed, convenient for scrubbing reaction residue.
In another alternative embodiment of the invention, the dish washing liquid solution is to be diluted with water to be formulated by dish washing liquid,
Its dose volume ratio are as follows: every 5ml dish washing liquid adds 4-7L water.The present embodiment in every 5ml dish washing liquid by adding 4-7L water to be configured to
The suitable dish washing liquid solution of concentration, can efficiently, fully dissolve the reaction residue on inner wall, remain in reactant in groove body
Adhesiveness on wall reduces, and can be cleaned up convenient for subsequent using less clear water, saves water resource.
In another alternative embodiment of the invention, when using dish washing liquid solution manufacturing process for cleaning slot inner wall, non-dust cloth is utilized
Or brush scrubbing processing procedure slot inner wall.When the present embodiment passes through dish washing liquid solution manufacturing process for cleaning slot inner wall, non-dust cloth or brush are utilized
Clean processing procedure slot inner wall, it is easier to scrub processing procedure slot inner wall.
It is described to use water manufacturing process for cleaning slot inner wall in another alternative embodiment of the invention and clear after the completion of cleaning
The step of cleaning waste liquid except the third formed in processing procedure slot carries out at least twice.The present embodiment is by carrying out at least two for step S3
It is secondary, using remaining dish washing liquid solution in water manufacturing process for cleaning slot, thoroughly mask plate processing procedure slot is cleaned up.
In another of the invention alternative embodiment, as shown in Fig. 2, be on embodiment basis as shown in Figure 1,
Increase step S2 between step S1 and step S3: being formed by using water manufacturing process for cleaning slot inner wall and being removed after the completion of cleaning
4th cleaning waste liquid.The present embodiment is by first using water manufacturing process for cleaning slot inner wall and removing institute after the completion of cleaning after step S1
The 4th cleaning waste liquid formed, then carries out step S3 again, the first cleaning waste liquid for remaining in processing procedure slot inner wall can be removed
Completely, prevent remaining first cleaning waste liquid from influencing the cleaning effect of subsequent step.
In another alternative embodiment of the invention, the water is deionized water.The present embodiment is by using deionized water
Processing procedure slot is cleaned, prevents the ion in water from generating pollution to processing procedure slot in the process of cleaning.
In another alternative embodiment of the invention, when using water manufacturing process for cleaning slot inner wall, wiped using non-dust cloth or brush
Wash processing procedure slot inner wall.The present embodiment, using non-dust cloth or brush scrubbing processing procedure slot inner wall, more holds in water manufacturing process for cleaning slot inner wall
Easily processing procedure slot inner wall is scrubbed.
The embodiment of the present invention is described with above attached drawing, but the invention is not limited to above-mentioned specific
Embodiment, the above mentioned embodiment is only schematical, rather than restrictive, those skilled in the art
Under the inspiration of the present invention, without breaking away from the scope protected by the purposes and claims of the present invention, it can also make very much
Form, within these are all belonged to the scope of protection of the present invention.
Claims (10)
1. a kind of mask plate processing procedure tub cleaning method, it is characterised in that: the following steps are included:
It using nitric acid solution manufacturing process for cleaning slot inner wall, reacts the sediment being attached on inner wall sufficiently with nitric acid solution, cleans
The the first cleaning waste liquid formed in processing procedure slot is removed after the completion；
Using dish washing liquid solution manufacturing process for cleaning slot inner wall, the reaction residue on inner wall is sufficiently dissolved, and clear after the completion of cleaning
Except the second cleaning waste liquid formed in processing procedure slot；
Using water manufacturing process for cleaning slot inner wall, and the third cleaning waste liquid formed in processing procedure slot is removed after the completion of cleaning.
2. mask plate processing procedure tub cleaning method as described in claim 1, which is characterized in that the concentration of the nitric acid solution is 20
~30%。
3. mask plate processing procedure tub cleaning method as claimed in claim 1 or 2, which is characterized in that using nitric acid solution cleaning system
When journey slot inner wall, non-dust cloth or brush scrubbing processing procedure slot inner wall are utilized.
4. mask plate processing procedure tub cleaning method as described in claim 1, which is characterized in that the dish washing liquid solution is clean by washing
Essence, which is diluted with water, to be formulated, dose volume ratio are as follows: every 5ml dish washing liquid adds 4-7L water.
5. mask plate processing procedure tub cleaning method as described in claim 1 or 4, which is characterized in that cleaned using dish washing liquid solution
When processing procedure slot inner wall, non-dust cloth or brush scrubbing processing procedure slot inner wall are utilized.
6. mask plate processing procedure tub cleaning method as described in claim 1, which is characterized in that described using in water manufacturing process for cleaning slot
Wall, and the step of third cleaning waste liquid formed in processing procedure slot is removed after the completion of cleaning carries out at least twice.
7. mask plate processing procedure tub cleaning method as described in claim 1, which is characterized in that removing the formed in processing procedure slot
After one cleaning waste liquid, is first removed using water manufacturing process for cleaning slot inner wall and after the completion of cleaning and is formed by the 4th cleaning waste liquid,
Then the step of carrying out again using dish washing liquid solution manufacturing process for cleaning slot inner wall.
8. the mask plate processing procedure tub cleaning method as described in claim 1 or 4 or 7, which is characterized in that the water is deionization
Water.
9. the mask plate processing procedure tub cleaning method as described in claim 1 or 6 or 7, which is characterized in that use water manufacturing process for cleaning slot
When inner wall, non-dust cloth or brush scrubbing processing procedure slot inner wall are utilized.
10. mask plate processing procedure tub cleaning method as described in claim 1, which is characterized in that the processing procedure slot be developing trough or
Fixing bath.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811278788.7A CN109433663A (en) | 2018-10-30 | 2018-10-30 | Mask plate processing procedure tub cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811278788.7A CN109433663A (en) | 2018-10-30 | 2018-10-30 | Mask plate processing procedure tub cleaning method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109433663A true CN109433663A (en) | 2019-03-08 |
Family
ID=65550213
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811278788.7A Pending CN109433663A (en) | 2018-10-30 | 2018-10-30 | Mask plate processing procedure tub cleaning method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109433663A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1191891A (en) * | 1996-12-26 | 1998-09-02 | 克拉瑞特国际有限公司 | Rinsing solution |
| JP2001281884A (en) * | 2000-03-29 | 2001-10-10 | Fuji Photo Film Co Ltd | Brush roller and photosensitive material processing device |
| CN101403867A (en) * | 2008-10-30 | 2009-04-08 | 清溢精密光电（深圳）有限公司 | Dry plate, film developing baths cleaning agent and cleaning method |
| CN101859074A (en) * | 2010-07-15 | 2010-10-13 | 深圳市路维电子有限公司 | Cleaning solution for dry plate developing tank and cleaning method thereof |
| CN103923514A (en) * | 2014-05-04 | 2014-07-16 | 深圳市实锐泰科技有限公司 | PCB developing tank cleaning solution and method for cleaning developing tank by using same |
-
2018
- 2018-10-30 CN CN201811278788.7A patent/CN109433663A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1191891A (en) * | 1996-12-26 | 1998-09-02 | 克拉瑞特国际有限公司 | Rinsing solution |
| JP2001281884A (en) * | 2000-03-29 | 2001-10-10 | Fuji Photo Film Co Ltd | Brush roller and photosensitive material processing device |
| CN101403867A (en) * | 2008-10-30 | 2009-04-08 | 清溢精密光电（深圳）有限公司 | Dry plate, film developing baths cleaning agent and cleaning method |
| CN101859074A (en) * | 2010-07-15 | 2010-10-13 | 深圳市路维电子有限公司 | Cleaning solution for dry plate developing tank and cleaning method thereof |
| CN103923514A (en) * | 2014-05-04 | 2014-07-16 | 深圳市实锐泰科技有限公司 | PCB developing tank cleaning solution and method for cleaning developing tank by using same |
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Application publication date: 20190308 |