CN109407194B - Device for forming grating - Google Patents
Device for forming grating Download PDFInfo
- Publication number
- CN109407194B CN109407194B CN201811566456.9A CN201811566456A CN109407194B CN 109407194 B CN109407194 B CN 109407194B CN 201811566456 A CN201811566456 A CN 201811566456A CN 109407194 B CN109407194 B CN 109407194B
- Authority
- CN
- China
- Prior art keywords
- substrate
- grating
- component
- interference field
- collimated laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 claims abstract description 124
- 238000000034 method Methods 0.000 claims abstract description 17
- 230000008569 process Effects 0.000 claims abstract description 15
- 238000001514 detection method Methods 0.000 claims description 13
- 230000008859 change Effects 0.000 claims description 12
- 238000013519 translation Methods 0.000 claims description 8
- 230000003028 elevating effect Effects 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000011161 development Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/48—Laser speckle optics
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
The present disclosure relates to an apparatus for forming a grating, the apparatus including a substrate, a reflecting member, and a position moving member; a preset angle is formed between the substrate and the reflecting component; the position moving component is connected with the substrate and is used for enabling the substrate to move relative to the reflecting component at least along the direction of the grid line of the grating to be formed on the substrate. According to the device for forming the grating, the substrate is moved relative to the reflecting component at least along the grid line direction of the grating to be formed on the substrate through the position moving component, the influence of laser speckles in the exposure process can be reduced, and the low stray light grating is convenient to manufacture.
Description
Technical Field
The present disclosure relates to the field of optics, and more particularly, to an apparatus for forming a grating.
Background
A hologram grating is widely used in the fields of AR glasses, spectral analysis, precision metrology, laser beam combining, laser pulse compression, and the like as a typical diffractive optical element. Grating stray light is an important indicator of high quality holographic gratings. The main reason for causing stray light of the holographic grating is laser speckle, and the quality of the holographic grating is seriously affected by the problem of the laser speckle because the exposure process requires the use of laser with good coherence.
Disclosure of Invention
In view of this, the present disclosure proposes an apparatus for forming a grating.
According to an aspect of the present disclosure, there is provided an apparatus for forming a grating, the apparatus including a substrate, a reflecting member, and a position moving member;
a preset angle is formed between the substrate and the reflecting component;
the position moving component is connected with the substrate and is used for enabling the substrate to move relative to the reflecting component at least along the direction of the grid line of the grating to be formed on the substrate.
In one possible implementation, the apparatus further includes a control part configured to control the position moving part to move the substrate relative to the reflecting part.
In one possible implementation, the apparatus further comprises a rotating member,
the reflecting member is vertically provided on the rotating member, the position moving member is provided above the rotating member, the substrate is perpendicular to the rotating member, and the substrate and the reflecting member are rotatable with the rotating member.
In one possible implementation, the position moving member includes a lifting portion configured to move the substrate along the gate line.
In one possible implementation, the position moving part includes a translation portion for moving the substrate in a direction perpendicular to the gate line.
In a possible implementation manner, the device further comprises a first grating and a detection component, wherein the first grating is connected with the substrate and moves along with the substrate;
the detection component is used for receiving an interference field signal formed by the collimated laser in the space through the first grating and transmitting the interference field signal to the control component.
In one possible implementation, the control component is configured to:
before exposure, acquiring a first interference field signal formed in space by collimated laser through the first grating;
in the exposure process, controlling the position moving part to enable the substrate to move along the direction of the grid line and obtain a second interference field signal formed in space by the collimated laser through the first grating;
and when the phase change of the second interference field signal relative to the first interference field signal exceeds a first threshold value, controlling the position moving component to move the substrate along the direction vertical to the grid line.
In a possible implementation manner, a preset angle between the first grating and the substrate is greater than 0 and smaller than a second threshold.
In a possible implementation manner, an absolute value of a difference between a period of the first grating and a period of the interference field to be exposed is smaller than or equal to a third threshold, and the interference field to be exposed is an interference field formed on the substrate by the collimated laser light incident on the substrate and the reflecting member.
The embodiment of the disclosure enables the substrate to move relative to the reflecting component at least along the grid line direction of the grating to be formed on the substrate through the position moving component, so that the influence of laser speckles in the exposure process can be reduced, and the manufacturing of the low stray light grating is facilitated.
Other features and aspects of the present disclosure will become apparent from the following detailed description of exemplary embodiments, which proceeds with reference to the accompanying drawings.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate exemplary embodiments, features, and aspects of the disclosure and, together with the description, serve to explain the principles of the disclosure.
Fig. 1 shows a schematic top view of an apparatus for forming a grating according to an embodiment of the present disclosure;
FIG. 2 illustrates a schematic top view of an apparatus for forming a grating according to an embodiment of the present disclosure;
fig. 3 shows a schematic top-view structure diagram of an apparatus for forming a grating according to an embodiment of the present disclosure.
Detailed Description
Various exemplary embodiments, features and aspects of the present disclosure will be described in detail below with reference to the accompanying drawings. In the drawings, like reference numbers can indicate functionally identical or similar elements. While the various aspects of the embodiments are presented in drawings, the drawings are not necessarily drawn to scale unless specifically indicated.
The word "exemplary" is used exclusively herein to mean "serving as an example, embodiment, or illustration. Any embodiment described herein as "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments.
Furthermore, in the following detailed description, numerous specific details are set forth in order to provide a better understanding of the present disclosure. It will be understood by those skilled in the art that the present disclosure may be practiced without some of these specific details. In some instances, methods, means, elements and circuits that are well known to those skilled in the art have not been described in detail so as not to obscure the present disclosure.
Fig. 1 shows a schematic top-view structure diagram of an apparatus for forming a grating according to an embodiment of the present disclosure.
As shown in fig. 1, the apparatus for forming a grating includes a substrate 1, a reflecting member 2, and a position moving member 6; the substrate 1 and the reflecting member 2 form a predetermined angle (for example, 90 degrees), and the position moving member 6 is connected to the substrate 1, and is provided, for example, below or on the side of the substrate 1. The position moving component is used for enabling the substrate to move relative to the reflecting component at least along the direction of the grid line of the grating to be formed on the substrate. For example, as shown in fig. 1, in the case where the position of the reflecting member is not changed, if the direction of the grating line of the grating to be formed is perpendicular to the paper surface (vertical direction), the position moving member may move the substrate in the direction perpendicular to the paper surface.
In this embodiment, the substrate may be a hard material with smooth surface and photosensitivity, and may also be a glass plate with a coating of photoresist or other photosensitive material with a certain thickness and smooth surface, which is not limited by the present disclosure. The reflecting member may be any type of reflecting member such as a plane mirror.
In operation, laser with vertical polarization forms a collimated laser beam after beam expansion, pinhole filtering and collimation, and the center of the collimated laser beam is positioned on the intersection line of the substrate 1 and the reflecting component 2. When the collimated laser beam is incident on the substrate 1 and the reflecting component 2 in the device, as shown in fig. 1, the upper part of the intersection line of the substrate 1 and the reflecting component 2 is directly incident on the substrate 1 at an angle θ, the lower part of the intersection line of the substrate 1 and the reflecting component 2 is reflected by the reflecting component 2 and then incident on the substrate 1 at an angle θ, the normal of the substrate 1 is perpendicular to the normal of the reflecting component 2, and meanwhile, the two parts of the collimated laser beam can form an interference field (interference fringes between light and dark) on the substrate 1. And after exposure and development of the interference field, forming a grating on the substrate.
By moving the substrate along the direction of the grid line, the stray light of the grating caused by the laser speckles can be averagely removed, the influence of the laser speckles in the exposure process is reduced, and the manufacturing of the low-stray-light grating is facilitated. The device of the embodiment has the advantages of compact structure, convenient use and convenient operation, and is suitable for manufacturing gratings with various sizes, in particular small-size gratings.
The substrate can be moved in the exposure process, namely, the substrate can be moved along the grid line direction after the interference field to be exposed is formed on the substrate and before the exposure is finished. The movement may be a slow, uniform movement.
In one possible implementation, the position moving part may include a lifting part 4 for moving the substrate along the gate line direction. The lifting part can be positioned below the substrate to enable the substrate to move up and down. The grating line direction of the grating to be formed on the substrate can be the same as the up-down moving direction of the substrate. The present disclosure does not limit the specific implementation of the elevating unit as long as it can move the substrate up and down.
The distance that the lifting part 4 moves the substrate 1 can be within 1mm, and the direction and distance that the lifting part 4 moves can be set according to the direction and the period of the interference field formed on the substrate 1 by the collimated laser beam, which is not limited by the present disclosure.
In one possible implementation, the apparatus further includes a control part (not shown) configured to control the position moving part to move the substrate relative to the reflecting part. The control part may output a control signal to control the position moving part to move. The position moving means may comprise a controllable motor or the like controllable by the control signal. The control part can be realized by a computer, a singlechip or a logic circuit and the like.
Fig. 2 shows a schematic top-view structure diagram of an apparatus for forming a grating according to an embodiment of the present disclosure.
In a possible implementation, the device further comprises a rotating member 7 (e.g. a turntable, a rotatable base plate, etc.), the reflecting member 2 being arranged vertically on the rotating member 7, the position moving member 6 being arranged above the rotating member 7, the substrate 1 being perpendicular to the rotating member 7, the substrate 1 and the reflecting member 2 being rotatable with the rotating member. The intersection line of the substrate 1 and the reflecting member 2 may coincide with the rotation axis of the rotating member 7.
In operation, the rotating member 7 is rotated to change the angle at which the collimated laser beam enters the substrate 1 and the reflecting member 2. By changing the angle at which the collimated laser beam is incident on the substrate 1 and the reflecting member 2, the period of the interference field formed on the substrate 1 by the collimated laser beam can be changed. Therefore, if gratings with different periods are manufactured, a grating with a target period can be obtained by rotating the rotating member 7, changing the angle at which the collimated laser beam enters the substrate 1 and the reflecting member 2, and performing exposure processing. The size and shape of the rotating member can be set as desired by those skilled in the art, and the present disclosure is not limited thereto.
In one possible implementation, the position moving part may further include a translation portion 5, and the translation portion 5 is configured to move the substrate along a direction perpendicular to the gate line. For example, the grid line extends in the vertical direction, and the translation part can enable the substrate to move in the horizontal direction. The translation part can be located below the substrate or on the side of the substrate, and the position and the specific implementation mode of the translation part are not limited in the disclosure.
Fig. 3 shows a schematic top-view structure diagram of an apparatus for forming a grating according to an embodiment of the present disclosure.
As shown in fig. 3, in a possible implementation manner, the apparatus further includes a first grating 3 and a detection component 8, the first grating 3 is connected with the substrate 1 and moves along with the substrate; and the detection component 8 is used for receiving an interference field signal formed in the space by the collimated laser through the first grating 3 and transmitting the interference field signal to the control component.
The first grating may be a reflective diffraction grating, a transmissive diffraction grating, or may be other types of gratings, which the present disclosure is not limited to.
The detecting component 8 may be a CCD, a photodetector, or other kinds of signal detecting components, which is not limited by the present disclosure. The detection component 8 is arranged in a direction that can receive an interference field, such as a direction in which the collimated laser light propagates after being transmitted through the first grating (transmissive), or a direction in which the collimated laser light propagates after being reflected by the first grating (reflective). The detection component 8 receives the interference field signal and transmits the interference field signal to the control component. The position of the detecting member 8 in the apparatus may be set according to the type of the first grating, which is not limited by the present disclosure.
For example, as shown in fig. 3, when the upper part of the collimated laser beam at the intersection line of the substrate 1 and the reflecting member 2 is directly incident on the substrate 1 at the angle θ, the upper part of the collimated laser beam is also incident on the first grating 3 at the angle θ, and the lower part of the collimated laser beam is reflected by the reflecting member 2 and then incident on the substrate 1 at the angle θ, and is also incident on the first grating 3 at the angle θ. When the first grating is a reflective diffraction grating, the two parts of collimated laser beams form an interference field signal in space through the reflection diffraction order of the first grating, and the detection component 8 is arranged in the propagation direction of the collimated laser beams after being diffracted through the first grating as shown in fig. 3. The detection unit 8 receives the interference field signal and transmits the interference field signal to a control unit (not shown). In order to facilitate the detection component 8 to receive the interference field signal, the first grating with a proper period is selected, so that the two parts of the collimated laser beams can form the interference field signal with a period of millimeter magnitude in the space through the reflection diffraction order of the first grating.
In operation, the substrate 1 may have an angle inclination and a position shake during moving along the grid line direction (e.g. vertical direction), wherein the shake of the substrate along the direction perpendicular to the grid line direction (e.g. horizontal direction) may introduce an interference field phase error, thereby introducing an error to the phase for manufacturing the grating. Such a phase error can be sensed by the detecting means and the first grating and can be compensated for.
In a possible implementation manner, a preset angle between the first grating and the substrate is greater than 0 and smaller than the second threshold.
In this arrangement, the first grating may be substantially in the same plane as the substrate, for example by being arranged above or below the substrate. The position of the first grating can be set according to the structure of the device, so that the first grating can move along with the substrate, and meanwhile, the two parts of collimated laser beams can be incident on the first grating.
When the first grating 3 is disposed above the substrate 1, a small angle deviation between the first grating 3 and the substrate 1 may be caused, and the angle is greater than 0 and smaller than a second threshold (e.g., the second threshold is 1 degree). Therefore, two parts of collimated laser beams can generate interference field signals with a larger period through the first grating, so that the detector can receive the interference field signals conveniently, and meanwhile, when the detector is arranged at a position close to the first grating, the interference field generated through the first grating can be received, so that the device is compact in structure. The second threshold may be set as desired, and the present disclosure is not limited thereto.
In one possible implementation, the control component is configured to: before exposure, acquiring a first interference field signal formed in space by collimated laser through a first grating; in the exposure process, controlling the position moving part to enable the substrate to move along the direction of the grid line and obtain a second interference field signal formed by the collimated laser in the space through the first grating; when the phase change of the second interference field signal relative to the first interference field signal exceeds a first threshold value, the position moving component is controlled to move the substrate along the direction vertical to the grid lines.
In this implementation, the interference field signal formed by the collimated laser beam received by the detection component 8 passing through the first grating 3 is used as a reference to determine whether the phase change occurs in the interference field formed on the substrate, where the phase change may be caused by the substrate shaking in the direction perpendicular to the gate line during the movement of the substrate in the direction along the gate line.
In one example, before exposure processing, the detection part 8 receives a first interference field signal formed in space by a collimated laser beam through a first grating and transmits the first interference field signal to the control part; in the exposure process, the control component controls the position moving component (for example, the lifting part 4) to move along the direction of the grid line, and obtains a second interference field signal formed by the collimated laser in real time in the space through the first grating; when the phase change of the second interference field signal relative to the first interference field signal exceeds a first threshold value, the position moving means (for example, the translation section 5) is controlled so that the substrate moves in a direction perpendicular to the gate lines. Wherein the first threshold value can be set according to requirements and can be 0.
In one possible implementation, the direction of movement (e.g., forward or backward) and the distance of movement of the substrate may be determined based on the magnitude and sign of the phase change. The corresponding relationship between the phase change and the moving mode can be determined according to actual conditions, and the disclosure does not limit this.
When the phase error is detected in the process of moving the substrate along the grid line direction, the substrate is moved along the direction vertical to the grid line direction, so that the phase error can be compensated, and the phase of an interference field formed on the substrate by the collimated laser beam after the substrate is moved is the same as that formed before the substrate is moved. By the mode, the phase error introduced in the process that the substrate moves along the grid line direction can be compensated.
In one possible implementation, the control part may stop the movement of the substrate in a direction perpendicular to the gate lines when a phase change of the second interference field with respect to the first interference field does not exceed a first threshold value during the exposure.
In this implementation, during the exposure, the control part controls the substrate to move or stop moving in a direction perpendicular to the gate lines according to whether a phase change of the second interference field signal with respect to the first interference field signal exceeds or does not exceed a first threshold. In this way, the phase change of the second interference field signal relative to the first interference field signal can be made not to exceed the first threshold value substantially in the whole process of moving the substrate along the gate line. When the exposure amount reaches a predetermined value, the exposure is stopped, and a second grating is formed on the substrate by subsequent development or the like. The exposure amount may be set according to the period of the second grating and other parameters, which is not limited by the present disclosure.
In one possible implementation manner, an absolute value of a difference between a period of the first grating and a period of an interference field to be exposed is smaller than or equal to a third threshold, and the interference field to be exposed is an interference field formed on the substrate by collimating laser light incident on the substrate and the reflecting member. In this implementation, in order to enable the collimated laser to better reflect the shaking caused by the substrate moving in the grid line direction in the interference field formed after the collimated laser is diffracted by the first grating, the absolute value of the difference between the period of the first grating and the period of the interference field to be exposed is less than or equal to the third threshold (e.g., 10% of the period of the interference field to be exposed). The specific third threshold may be determined according to the period of the actual interference field to be exposed, which is not limited by the present disclosure.
By the above method, in the exposure process, one point on the substrate is irradiated by a plurality of points on the exposure beam, so that high-frequency errors caused by speckles are averaged out. In the moving process, the phase of the exposure beam relative to the substrate is locked to ensure that grating lines are not smoothed due to moving errors or the grating occupying ratio is reduced due to moving.
Having described embodiments of the present disclosure, the foregoing description is intended to be exemplary, not exhaustive, and not limited to the disclosed embodiments. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the described embodiments. The terminology used herein is chosen in order to best explain the principles of the embodiments, the practical application, or improvements made to the technology in the marketplace, or to enable others of ordinary skill in the art to understand the embodiments disclosed herein.
Claims (7)
1. An apparatus for forming a grating, comprising a substrate, a reflecting member, and a position moving member;
a preset angle is formed between the substrate and the reflecting component;
the position moving component is connected with the substrate and is used for enabling the substrate to move relative to the reflecting component at least along the grid line direction of the grating to be formed on the substrate;
wherein the apparatus further comprises a control component, a first grating and a detection component, the control component configured to:
before exposure, acquiring a first interference field signal formed in space by collimated laser through the first grating, wherein the collimated laser is formed by polarized laser after beam expansion, pinhole filtering and collimation;
in the exposure process, controlling the position moving part to enable the substrate to move along the direction of the grid line and obtain a second interference field signal formed in space by the collimated laser through the first grating;
when the phase change of the second interference field signal relative to the first interference field signal exceeds a first threshold value, controlling the position moving component to enable the substrate to move along the direction vertical to the grid line so as to compensate the phase error generated when the substrate moves along the direction of the grid line in the exposure process;
the upper part of the collimated laser is incident on the substrate at the preset angle, the lower part of the collimated laser is incident on the substrate at the preset angle after being reflected by the reflecting component, and the upper part and the lower part of the collimated laser form an interference field signal on the substrate, wherein the center of the collimated laser is located on an intersecting line of the substrate and the reflecting component, and a plane where the center line of the collimated laser and the intersecting line are located divides the collimated laser into the upper part of the collimated laser and the lower part of the collimated laser;
wherein the device further comprises a rotating component,
the reflecting member is vertically provided on the rotating member, the position moving member is provided above the rotating member, the substrate is perpendicular to the rotating member, and the substrate and the reflecting member are rotatable with the rotating member.
2. The apparatus of claim 1, wherein the control component is further configured to control the position moving component to move the substrate relative to the reflecting component.
3. The apparatus of claim 1, wherein the position moving member includes an elevating portion for moving the substrate along the gate line direction.
4. The apparatus according to claim 1 or 3, wherein the position moving member includes a translation portion for moving the substrate in a direction perpendicular to the gate line.
5. The apparatus of claim 1, wherein the first grating is connected to the substrate and moves along with the substrate;
the detection component is used for receiving an interference field signal formed by the collimated laser in the space through the first grating and transmitting the interference field signal to the control component.
6. The device of claim 5, wherein the first grating is at a predetermined angle with respect to the substrate that is greater than 0 and less than a second threshold.
7. The apparatus according to claim 5, wherein an absolute value of a difference between a period of the first grating and a period of an interference field to be exposed, which is an interference field formed on the substrate by collimating laser light incident on the substrate and the reflecting member, is less than or equal to a third threshold value.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811566456.9A CN109407194B (en) | 2018-12-19 | 2018-12-19 | Device for forming grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811566456.9A CN109407194B (en) | 2018-12-19 | 2018-12-19 | Device for forming grating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109407194A CN109407194A (en) | 2019-03-01 |
| CN109407194B true CN109407194B (en) | 2021-02-09 |
Family
ID=65460160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811566456.9A Active CN109407194B (en) | 2018-12-19 | 2018-12-19 | Device for forming grating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109407194B (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101793988A (en) * | 2009-12-31 | 2010-08-04 | 中国科学院长春光学精密机械与物理研究所 | Method for accurately adjusting groove density in light path for making holographic grating |
| CN101750649A (en) * | 2009-12-31 | 2010-06-23 | 中国科学院长春光学精密机械与物理研究所 | Groove spacing accurately adjusting device in holographic grating manufacturing light path |
| CN102087480B (en) * | 2010-12-22 | 2012-02-08 | 中国科学院长春光学精密机械与物理研究所 | A method for adjusting real-time monitoring device in exposure light path of planar holographic grating |
| CN102103269B (en) * | 2011-03-25 | 2012-06-13 | 中国科学院长春光学精密机械与物理研究所 | Method for adjusting collimated light in holographic grating exposure light path by using Moire fringes |
-
2018
- 2018-12-19 CN CN201811566456.9A patent/CN109407194B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN109407194A (en) | 2019-03-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107003114B (en) | Spectral beam profiling | |
| TWI358614B (en) | Triangulation methods and systems for profiling su | |
| KR930004112B1 (en) | Alignment of lithographic system | |
| US5771098A (en) | Laser interferometric lithographic system providing automatic change of fringe spacing | |
| IL257866A (en) | Spectroscopic beam profile overlay metrology | |
| CN105115444B (en) | A kind of detection device and detection method of off axis paraboloidal mirror surface figure accuracy | |
| TW201643414A (en) | Optical metrology with small illumination spot size | |
| JP3192630B2 (en) | Automatic high-precision wavelength controller and method for optical fiber Bragg grating writing | |
| TWI608308B (en) | Method and system for position control of an optical component relative to a surface, method for manufacturing devices, non-transitory computer program product, and detection apparatus | |
| CN108761602B (en) | Adjusting method for auto-collimation of interference light path in holographic grating photoetching system | |
| TW201142236A (en) | Lithographic apparatus and device manufacturing method | |
| JP3330874B2 (en) | High accuracy wavelength control apparatus and method for automatic optical fiber Bragg grating writing | |
| JPH09501803A (en) | Method for repeatedly imaging a mask pattern on a substrate and apparatus for implementing this method | |
| TW201142530A (en) | Lithographic apparatus and device manufacturing method | |
| JPS61108904A (en) | Optical interference measuring device | |
| CN109407194B (en) | Device for forming grating | |
| TWI816991B (en) | Mask defect correction device and mask defect correction method | |
| JP2002213930A (en) | Method of measuring shape, and method of manufacturing highly precise lens | |
| CN111708258B (en) | A holographic grating scanning lithography exposure monitoring device and adjustment method | |
| JP3702733B2 (en) | Alignment method and mechanism of optical inspection apparatus | |
| CN113341304A (en) | Testing method and testing device for reflecting micromirror array | |
| JPH06104158A (en) | Position detecting device | |
| JP3948852B2 (en) | Refractive index distribution measuring apparatus and refractive index distribution measuring method | |
| CN110686620B (en) | Measuring device and method for grating integration precision and measuring system for planar grating ruler | |
| CN106931876B (en) | Grating type vertical position measuring system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |