CN109346212B - Metal grid type transparent electrode designed by utilizing fractal geometry principle - Google Patents
Metal grid type transparent electrode designed by utilizing fractal geometry principle Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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Abstract
The invention relates to the field of preparation of photoelectric functional materials, in particular to a metal grid type transparent electrode designed by utilizing a fractal geometric principle. In the prior art, the research on the metal grid structure mainly focuses on the aspects of optimizing the grid width, the grid spacing and the like, and the comprehensive photoelectric performance of the metal grid structure is limited in improving space; the invention deposits the metal grid layer with the fractal grid pattern on the surface of the substrate by means of the fractal geometric theory, overcomes the limitation of the prior metal grid adjusting method in the aspect of improving the comprehensive photoelectric property of the metal grid type transparent electrode by changing the grid structure of the metal grid layer, and improves the comprehensive photoelectric property to a greater extent.
Description
Technical Field
The invention relates to the field of preparation of photoelectric functional materials, in particular to a metal grid type transparent electrode designed by utilizing a fractal geometric principle.
Technical Field
The transparent electrode is a photoelectric functional material integrating the functions of electric conduction and light transmission, and has high electric conductivity and high light transmission in a visible light range, so that the transparent electrode is widely applied to the fields of flat panel displays, solar cells, light emitting diodes, low-radiation glass, electromagnetic interference prevention transparent windows and the like. With the rapid development of the optoelectronic industry, researchers have prepared a variety of novel transparent electrodes, such as graphene, carbon nanotubes, conductive polymers, silver nanowires, and metal grids.
The metal grid type transparent electrode is formed by forming continuous periodic grid patterns on a glass or PET substrate by using metal materials such as gold, silver and the like, has low production cost, simple preparation process and excellent light transmittance, has lower resistivity than an industrialized indium tin oxide film, and also has better bending resistance when a flexible material is used as the substrate. At present, the research on the metal grid type transparent electrode mainly focuses on the selection of metal materials, the improvement of the preparation process and the design of the grid structure.
At present, researchers mainly focus on the aspects of optimizing grid width and grid spacing, the methods are limited in adjusting space and improve performance on one hand, performance on the other hand is damaged inevitably, when the grid spacing is too small, the transparent electrode is good in conductivity but poor in light transmittance, if the grid spacing is increased and the light transmittance is improved, the conductivity of the transparent electrode is greatly reduced, and sometimes even the conductivity index cannot be measured due to too few contact points of a test probe. Therefore, in view of comprehensive light transmittance and conductivity, the achievement of perfecting the comprehensive performance of the metal mesh type transparent electrode by optimizing the mesh width and the mesh spacing in the prior art is not obvious. The invention aims to solve the problem that whether the fractal geometric principle can be applied to the metal grid type transparent electrode or not so as to break through the limitation that the performance of the metal grid type transparent electrode is improved by simply changing the grid width and the grid distance.
Disclosure of Invention
Aiming at the problems, the invention provides a metal grid type transparent electrode designed by utilizing a fractal geometry principle, wherein a metal grid layer with a fractal grid pattern is deposited on a metal grid type transparent electrode substrate by means of the fractal geometry principle, and the aim of optimizing and improving the comprehensive performance of the metal grid type transparent electrode is fulfilled by changing the metal grid structure.
In order to achieve the purpose, the invention provides a metal grid type transparent electrode designed by utilizing a fractal geometric principle, wherein a metal grid layer with a fractal grid pattern is deposited on a metal grid type transparent electrode substrate, and the grid pattern part and the whole have self-similarity.
The fractal grid pattern is a fractal geometric pattern which is constructed into a regular polygon based on a fractal geometric theory method, and is expanded according to the apparent size of the transparent electrode by taking the fractal geometric pattern as a basic unit. Further, the regular polygon is an equilateral triangle, a square or a regular hexagon.
The fractal geometric patterns comprise any one or a combination of two of different periods, different orders and geometric figures.
In order to explain the present invention well, taking regular polygon pattern as an example, the period in the present invention can be understood as that if a regular polygon is equally divided into 4 regular polygons, the formed period is 4 periods, and the above-mentioned dividing method is repeated, preferably, divided into 4 periods, 9 periods, and 16 periods; the level number can be understood as a level-one fractal graph which is a regular fractal graph, and the level-two fractal graph is evenly divided into a plurality of similar graphs on the basis of the level-one fractal graph; repeating the graph dividing method to obtain three-level, four-level and five-level fractal graphs. The geometric figure of the invention refers to any one or combination of two of regular triangle, square and regular hexagon.
Preferably, the fractal geometric pattern comprises a second-level fractal geometric pattern, a third-level fractal geometric pattern or a second-level periodic combined fractal geometric pattern; the secondary fractal geometric patterns comprise regular triangle secondary fractal geometric patterns, square secondary fractal geometric patterns and regular hexagon secondary fractal geometric patterns. The two-stage period combined fractal geometric pattern is characterized in that a square is averagely divided into four large squares, two large squares in diagonal distribution are randomly selected and averagely divided into four medium squares, and the other two large squares in diagonal distribution are averagely divided into nine small squares.
The invention provides a metal grid type transparent electrode designed by utilizing a fractal geometric principle, wherein a metal grid layer is a single layer or a plurality of layers. The single layer is that all levels of fractal patterns of the metal grid are on the same layer; the multi-layer fractal refers to that all levels of fractal patterns of the metal grid are on different layers, and the first-level fractal grid is on the uppermost layer.
The substrate is selected from glass, polyethylene terephthalate, TCO/glass or TCO/polyethylene terephthalate; the TCO is zinc oxide, tin oxide, indium oxide, aluminum-doped zinc oxide, fluorine-doped tin oxide or tin-doped indium oxide.
The metal grid layer is a layer formed by any one or more than two alloys of silver, copper, gold, platinum, nickel and aluminum.
Furthermore, the metal mesh type transparent electrode designed by utilizing the fractal geometric principle is suitable for the preparation process of various metal mesh type transparent electrodes.
Compared with the prior art, the invention has the beneficial effects that:
(1) the metal grid type transparent electrode designed by utilizing the fractal geometry principle improves the metal grid pattern by means of the fractal geometry theory, overcomes the limitation of the prior metal grid structure on the comprehensive photoelectric property of the metal grid transparent electrode when only the grid width and the grid distance are taken as adjusting means, has better quality factors compared with the prior pure periodic grid pattern transparent electrode, and can improve the comprehensive photoelectric property of the metal grid electrode to a greater extent.
(2) The fractal geometric patterns are combined with each other in different periods, different grades and geometric figures, the pattern design is flexible and changeable, and the preparation of metal grids in various fractal grid pattern forms can be realized. According to actual requirements, the light transmittance and the conductivity can be improved by comprehensively regulating and controlling the grid width and the grid distance, and the comprehensive performance optimization of the metal grid type transparent electrode is realized.
(3) The metal grid electrode provided by the invention has the advantages of simple preparation method and low process requirement, and is suitable for large-scale industrial production.
Drawings
FIG. 1 is a schematic diagram of a square grid pattern with a grid width of 0.2 mm drawn by EZCAD software; wherein, the graph (a) is a conventional periodic grid pattern with the grid spacing of 1.8 mm, the graph (b) is a conventional periodic grid pattern with the grid spacing of 0.8mm, and the graph (c) is a square two-level fractal geometric pattern with the grid spacing of 1.8 mm and 0.8mm respectively;
FIG. 2 is an optical microscope photograph of the Ag mesh/glass transparent electrode prepared in example 1; wherein, the graph (a) is a superposed conventional period Ag grid/glass transparent electrode with the grid spacing of 1.8 mm, the graph (b) is a superposed conventional period Ag grid/glass transparent electrode with the grid spacing of 0.8mm, and the graph (c) is a superposed square two-stage fractal Ag grid/glass transparent electrode;
FIG. 3 is a schematic diagram of a square grid pattern with a grid width of 0.2 mm drawn by EZCAD software; wherein, the graph (a) is a conventional periodic grid pattern with the grid spacing of 1.8 mm, the graph (b) is a conventional periodic grid pattern with the grid spacing of 0.8mm, the graph (c) is a conventional periodic grid pattern with the grid spacing of 0.3 mm, and the graph (d) is a square three-level fractal geometric pattern with the grid spacing of 1.8 mm, 0.8mm and 0.3 mm respectively;
FIG. 4 is an optical microscope photograph of the Ag mesh/glass transparent electrode prepared in example 2; wherein, the graph (a) is a stacked conventional period Ag grid/glass transparent electrode with the grid spacing of 1.8 mm, the graph (b) is a stacked conventional period Ag grid/glass transparent electrode with the grid spacing of 0.8mm, the graph (c) is a stacked conventional period Ag grid/glass transparent electrode with the grid spacing of 0.3 mm, and the graph (d) is a stacked square three-level fractal Ag grid/glass transparent electrode;
FIG. 5 is a schematic diagram of a regular hexagonal grid pattern drawn by EZCAD software; wherein, the graph (a) is a conventional periodic grid pattern with the side length of 1.0mm, the graph (b) is a conventional periodic grid pattern with the side length of 0.5 mm, and the graph (c) is a regular hexagon two-stage fractal geometric pattern with the side lengths of 1.0mm and 0.5 mm respectively;
FIG. 6 is an optical microscope photograph of a regular hexagonal Cu grid/FTO transparent electrode prepared in example 3; wherein (a) is an embedded regular hexagonal periodic Cu grid/FTO transparent electrode with the side length of 1.0mm, the diagram (b) is an embedded regular hexagonal periodic Cu grid/FTO transparent electrode with the side length of 0.5 mm, and the diagram (c) is an embedded regular hexagonal secondary fractal Cu grid/FTO transparent electrode with the side lengths of 1.0mm and 0.5 mm respectively;
FIG. 7 is a schematic diagram of a square grid pattern with a grid width of 0.15 mm drawn by EZCAD software; wherein, the graph (a) is a conventional periodic grid pattern with the grid interval of 1.3 mm, the graph (b) is a conventional periodic grid pattern with the grid interval of 0.8mm, and the graph (c) is a square two-stage periodic combined fractal grid pattern with the grid intervals of 1.3 mm and 0.8mm respectively;
FIG. 8 is an optical microscope photograph of the Ag mesh/PET transparent electrode prepared in example 4; wherein, the graph (a) is a stacked conventional period Ag grid/PET transparent electrode with the grid spacing of 1.3 mm, the graph (b) is a stacked conventional period Ag grid/PET transparent electrode with the grid spacing of 0.8mm, and the graph (c) is a stacked square two-level period combined fractal Ag grid/PET transparent electrode with the grid spacing of 1.3 mm and 0.8mm respectively;
FIG. 9 is a schematic diagram of an equilateral triangular grid pattern with a grid width of 0.2 mm drawn by EZCAD software; wherein, the graph (a) is an equilateral triangle periodic grid pattern with the side length of 2.3 mm, the graph (b) is an equilateral triangle periodic grid pattern with the side length of 1.0mm, and the graph (c) is an equilateral triangle two-level fractal geometric pattern;
FIG. 10 is an optical microscope photograph of the Ag mesh/glass transparent electrode prepared in example 5; wherein, the graph (a) is a superposed equilateral triangle period Ag grid/glass transparent electrode with the side length of 2.3 mm, the graph (b) is a superposed equilateral triangle period Ag grid/glass transparent electrode with the side length of 1.0mm, the graph (c) is a single-layer superposed equilateral triangle two-stage fractal Ag grid/glass transparent electrode, and the graph (d) is a double-layer superposed equilateral triangle two-stage fractal Ag grid/glass transparent electrode.
Detailed Description
The present invention will be described in further detail with reference to specific examples. Materials, reagents and the like used in examples are commercially available unless otherwise specified.
Example 1
The method comprises the steps of taking quartz glass as a substrate, placing the glass substrate with the area of 15 mm × 15 mm into deionized water, acetone and absolute ethyl alcohol in sequence, carrying out ultrasonic cleaning for 10 min, taking out, drying for later use by a nitrogen gun, placing the glass substrate on a sample table of a magnetron sputtering coating machine, sputtering Ag with the thickness of 200 nm on the surface of the glass under the sputtering power of 30W, the sputtering pressure of 15 Pa and the atmosphere of argon (the purity of an Ag target is 99.99%), placing the Ag/glass substrate on the sample table of a laser, adjusting the position of the sample table, enabling the focal point of a laser beam emitted by the laser after being focused by a lens to be 1.0mm above the surface of the Ag/glass, drawing a square two-level fractal geometric pattern with the grid width of 0.2 mm and the grid spacing of 1.8 mm by EZCAD software respectively, as shown in figure 1(a), drawing a regular periodic grid pattern with the grid spacing of 0.8mm as shown in figure 1(b), drawing a square two-level fractal geometric patterns with the grid spacing of 1.8 mm and two large diagonal lines, and dividing the two secondary fractal patterns into four larger square points.
And introducing the drawn pattern into a laser control system, scanning the surface of the Ag/glass by using laser beams in sequence, rapidly heating, vaporizing and volatilizing the Ag in the grid area under the action of the laser to remove the Ag, and forming an Ag grid by the unremoved Ag layer. The pulse width of the laser beam is 1 ns, the wavelength is 532nm, the repetition frequency is 1 kHz, and the laser energy density is 0.8J/cm2Finally taking out the overlapped Ag grid/glass transparent electrode, blowing off the splashes on the surface layer by using an aurilave to obtain the overlapped Ag grid/glass transparent electrode, wherein the optical microscope pictures of the overlapped Ag grid/glass transparent electrode are respectively shown as figures 2(a), 2(b) and 2(c), and detecting to obtain the overlapped conventional periodic Ag grid/glass transparent electrode with the grid spacing of 1.8 mm, wherein the average light transmittance of the overlapped conventional periodic Ag grid/glass transparent electrode at the waveband of 400-800 nm is (light transmittance is: (the scanning speed is 15 mm/s), and the scanning area is 15 mm × 15 mm)T av) 86.17%, square resistance (R sh) 11.1. omega./sq, quality factor: (quality factor)F TC=T av 10/R sh) Is 2.03 × 10-2Ω-1(ii) a The average light transmittance of the prepared superposed conventional periodic Ag grid/glass transparent electrode with the grid spacing of 0.8mm in a waveband of 400-800 nm is (T av) 80.41%, square resistance (R sh) 7.6 omega/sq, and the quality factor is 1.49 × 10-2Ω-1(ii) a The average light transmittance of the prepared superposed square two-level fractal Ag grid/glass transparent electrode in a 400-800 nm wave band is (T av) 84.45%, square resistance: (R sh) Is 8.3 omega/sq, and the quality factor is 2.22 × 10-2Ω-1(ii) a Compared with the stacked conventional periodic Ag grid/glass transparent electrode, the stacked square two-level fractal Ag grid/glass transparent electrode has the advantage that the comprehensive photoelectric property is obviously improved.
Example 2
The method comprises the steps of using quartz glass as a substrate, placing a glass substrate with the area of 15 mm × 15 mm into deionized water, acetone and absolute ethyl alcohol in sequence, carrying out ultrasonic cleaning for 10 min, taking out, drying for later use by a nitrogen gun, placing the glass substrate on a sample table of a magnetron sputtering coating machine, sputtering Ag with the thickness of 200 nm on the surface of the glass under the sputtering power of 30W, the sputtering pressure of 15 Pa and the atmosphere of argon (the purity of an Ag target is 99.99%), placing the Ag/glass substrate on the sample table of a laser, adjusting the position of the sample table, enabling the focal point of a laser beam emitted by the laser after being focused by a lens to be 1.2 mm above the surface of the Ag/glass, drawing a conventional periodic grid pattern with the grid width of 0.2 mm and the grid spacing of 1.8 mm by EZCAD software respectively as shown in a figure 3(a), drawing a conventional periodic grid pattern with the grid spacing of 0.8mm as shown in a figure 3(b), drawing a conventional periodic grid pattern with the grid spacing of 0.3 mm as shown in a figure 3 (c), drawing a square with the three-level diagonal lines of three-divided into two square points, and dividing the other three-level-three-dimensional square patterns into two-three-dimensional square points as shown in the other three-dimensional square points, and dividing the three-dimensional square pattern.
And guiding the drawn pattern into a laser control system, sequentially scanning a laser beam on the surface of the Ag/glass according to the grid pattern, rapidly heating, vaporizing and volatilizing the Ag in the grid area under the action of the laser to remove the Ag, and forming an Ag grid by the unremoved Ag layer. The pulse width of the laser beam is 5-8 ns, the wavelength is 1064 nm, and the weight is highThe complex frequency is 10 Hz, and the laser energy density is 1.0J/cm2The scanning speed is 10 mm/s, the scanning area is 15 mm × 15 mm, finally, the splashes on the surface layer are blown off by an aurilave to obtain a stacked Ag grid/glass transparent electrode, the optical microscope pictures of which are respectively shown in figures 4(a), 4(b), 4(c) and 4(d), and the average light transmittance of the stacked conventional periodic Ag grid/glass transparent electrode with the grid spacing of 1.8 mm in a 400-800 nm wave band is detected (the average light transmittance is shown in the specification)T av) 86.17%, square resistance (R sh) 11.1 omega/sq, and the quality factor is 2.03 × 10-2Ω-1(ii) a The average light transmittance of the prepared superposed conventional periodic Ag grid/glass transparent electrode with the grid spacing of 0.8mm in a waveband of 400-800 nm is (T av) 80.41%, square resistance (R sh) 7.6 omega/sq, and the quality factor is 1.49 × 10-2Ω-1(ii) a The average light transmittance of the prepared superposed conventional periodic Ag grid/glass transparent electrode with the grid spacing of 0.3 mm in a waveband of 400-800 nm is (T av) 67.27%, square resistance (R sh) Is 4.4 omega/sq, and the quality factor is 0.43 × 10-2Ω-1(ii) a The average light transmittance of the prepared superposed square three-level fractal Ag grid/glass transparent electrode in a wave band of 400-800 nm is (T av) 83.25%, square resistance (R sh) 7.1 omega/sq, and the quality factor is 2.25 × 10-2Ω-1. Compared with the stacked conventional periodic Ag grid/glass transparent electrode, the stacked square three-level fractal Ag grid/glass transparent electrode has the advantage that the comprehensive photoelectric property is obviously improved.
Example 3
An FTO film is selected as a substrate, the FTO substrate with the area of 15 mm × 15 mm is sequentially placed into deionized water, acetone and absolute ethyl alcohol for ultrasonic cleaning for 10 min, then taken out and dried for standby by a nitrogen gun, a layer of 10 wt% PVP/ethanol mixed solution is spin-coated on the surface of the FTO substrate by a spin coater, the rotation speed of the spin coater is controlled to be 1000 rpm during the spin coating process, the spin coating time is 1min, after the spin coating is finished, the spin coating is placed in an oven for drying for 20 min (50 ℃, 40W) to remove residual ethanol, the PVP/FTO substrate is obtained, then the PVP/FTO substrate is placed on a sample stage of a laser, the position of the sample stage is adjusted, the focus of a laser beam emitted by the laser is positioned 1.3 mm above the PVP/FTO surface after being focused by a lens, regular periodic grid patterns with the side length of 1.0mm are respectively drawn by EZCAD software, as shown in a regular periodic grid pattern of a regular hexagon with the side length of 1.0mm as shown in figure 5(a), a regular periodic grid pattern with the regular hexagonal grid pattern with the side length of 0.5 mm as shown in figure 5(b), and a secondary fractal regular grid pattern with three adjacent hexagonal patterns with the same side length as a small hexagonal pattern of a two-two adjacent regular hexagonal regular grid.
And guiding the drawn pattern into a laser control system, and sequentially etching the laser beam on the surface of the PVP/FTO according to the grid pattern to obtain uniform and regular grid grooves. The pulse width of the laser beam is 1 ns, the wavelength is 532nm, the repetition frequency is 1 kHz, and the laser energy density is 0.8J/cm2Scanning speed is 10 mm/s, scanning area is 15 mm × 15 mm, after laser beam scanning is finished, an ear washing ball is used for blowing splash and broken foam on the surface, then the laser beam is placed on a sample stage of a magnetron sputtering coating instrument, Cu with the thickness of 500nm (the purity of a Cu target is 99.995%) is sputtered on the surface of PVP/FTO and in a groove under the sputtering power of 90W, the sputtering pressure of 15 Pa and the argon atmosphere, the Cu/PVP/FTO is taken out and then placed in ethanol (analytically pure) for soaking for 2 h, finally the Cu/PVP/FTO is taken out and repeatedly washed by deionized water and dried in nitrogen flow, and the embedded regular hexagonal periodic Cu grid/FTO transparent electrode is obtained, the optical microscopic pictures of the embedded regular hexagonal periodic Cu grid/FTO transparent electrode are respectively shown in figures 6(a), 6(b) and 6(c), and detection shows that the average light transmittance of the embedded regular hexagonal periodic Cu grid/FTO transparent electrode with the side length of 1.0mmT av) 77.36%, square resistance (R sh) 4.3 omega/sq, and the quality factor is 1.79 × 10-2Ω-1(ii) a The average light transmittance of the embedded regular hexagonal periodic Cu grid/FTO transparent electrode with the side length of 0.5 mm in a wave band of 400-800 nm (T av) 69.30%, square resistance: (R sh) 1.9 omega/sq, and a quality factor of 1.34 × 10-2Ω-1(ii) a The average light transmittance of the embedded regular hexagon second-level fractal Cu grid/FTO transparent electrode at the wave band of 400-800 nm is (T av) 74.66%, square resistance (R sh) 2.2 omega/sq, and a quality factor of 2.45 × 10-2Ω-1Compared with the embedded regular hexagonal periodic Cu grid/FTO transparent electrode, the comprehensive photoelectric property of the embedded regular hexagonal secondary fractal Cu grid/FTO transparent electrode is obviously improved.
Example 4
The method comprises the steps of taking flexible PET as a substrate, placing the flexible PET substrate with the area of 15 mm × 15 mm into deionized water and absolute ethyl alcohol in sequence, carrying out ultrasonic cleaning for 10 min, taking out, drying for later use by a nitrogen gun, placing the flexible PET substrate on a sample table of a magnetron sputtering coating machine, sputtering 100 nm thick Ag (the purity of an Ag target is 99.99%) on the surface of glass under the conditions of 30W sputtering power, 15 Pa sputtering pressure and argon atmosphere, then placing the Ag/PET substrate on a sample table of a laser, adjusting the position of the sample table, enabling the focus of a laser beam emitted by the laser after being focused by a lens to be 1.2 mm above the surface of the Ag/PET, drawing a square two-stage periodic grid pattern with the grid width of 0.15 mm and the grid spacing of 1.3 mm by EZCAD software respectively as shown in a figure 7(a), drawing a square two-stage combined fractal grid pattern with the grid spacing of 0.8mm as shown in a figure 7(c), drawing a square with two-stage combined fractal grid patterns with the grid spacing of 1.3 mm and two-stage two-stage combined fractal square diagonals, and dividing the two-stage combined fractal grid pattern into nine-stage square patterns.
And guiding the drawn pattern into a laser control system, sequentially scanning a laser beam on the surface of the Ag/PET, rapidly heating and vaporizing the Ag in the grid area under the action of the laser, volatilizing and removing the Ag, and forming an Ag grid by the unremoved Ag layer. The pulse width of the laser beam is 1 ns, the wavelength is 532nm, the repetition frequency is 1 kHz, and the laser energy density is 0.4J/cm2Scanning speed of 15 mm/s, scanning area15 mm × 15 mm, finally taking out and blowing off the splashes on the surface layer by using an aurilave to obtain the stacked Ag grid/PET transparent electrode, wherein the optical microscope pictures of the stacked Ag grid/PET transparent electrode are respectively shown as figures 8(a), 8(b) and 8(c), and the average light transmittance of the stacked Ag grid/PET transparent electrode with the grid spacing of 1.3 mm in the 400-800 nm wave band is detected (the average light transmittance is measured)T av) 80.25%, square resistance: (R sh) Is 14.7 omega/sq, and the quality factor is 0.75 × 10-2Ω-1(ii) a The average light transmittance of the prepared superposed conventional periodic Ag mesh/PET transparent electrode with the mesh spacing of 0.8mm in a waveband of 400-800 nm is (T av) 71.59%, square resistance (R sh) 6.6 omega/sq, and the quality factor is 0.54 × 10-2Ω-1(ii) a The average light transmittance of the prepared superposed square two-level period combined fractal Ag grid/PET transparent electrode in a 400-800 nm wave band is (T av) 77.81%, square resistance (R sh) 9.4 omega/sq, and the quality factor is 0.87 × 10-2Ω-1Compared with the superposed conventional periodic Ag grid/PET transparent electrode, the superposed square two-level periodic combined fractal Ag grid/PET transparent electrode has obviously improved comprehensive photoelectric properties.
Example 5
The method comprises the steps of taking quartz glass as a substrate, placing the glass substrate with the area of 15 mm × 15 mm into deionized water, acetone and absolute ethyl alcohol in sequence, carrying out ultrasonic cleaning for 10 min, taking out, drying for later use by a nitrogen gun, placing the glass substrate on a sample table of a magnetron sputtering coating instrument, sputtering Ag with the thickness of 300 nm on the surface of the glass under the sputtering power of 30W, the sputtering pressure of 15 Pa and the atmosphere of argon (the purity of an Ag target is 99.99%), placing the Ag/glass substrate on the sample table of a laser, adjusting the position of the sample table, enabling the focal point of a laser beam emitted by the laser to be 1.0mm above the surface of the Ag/glass after being focused by a lens, drawing equilateral triangle periodic grid patterns with the grid width of 0.2 mm and the side length of 2.3 mm by EZCAD software, drawing equilateral triangle periodic grid patterns with the equilateral triangle period of 1.0mm as shown in figure 9(a), drawing equilateral triangle periodic grid patterns with the equilateral triangle period as shown in figure 9(b), drawing secondary equilateral triangles with the equilateral triangles respectively with the sides of 2.3 mm and the equilateral triangles respectively as shown in figure 9(c), connecting four secondary fractal patterns in sequence, and forming four secondary fractal triangles with the same side length.
And guiding the drawn pattern into a laser control system, sequentially scanning a laser beam on the surface of the Ag/glass according to a periodic grid pattern, rapidly heating, vaporizing and volatilizing the Ag in the grid area under the action of the laser to remove the Ag, and forming an Ag grid by the unremoved Ag layer. The pulse width of the laser beam is 1 ns, the wavelength is 532nm, the repetition frequency is 1 kHz, and the laser energy density is 0.8J/cm2Scanning speed is 15 mm/s, scanning area is 15 mm × 15 mm, finally taking out and blowing off the splashes on the surface layer by using an ear washing ball to obtain the Ag mesh/glass transparent electrode, wherein optical microscope pictures of the Ag mesh/glass transparent electrode are respectively shown in figures 10(a) and 10(b), and through detection, the average light transmittance of the prepared superposed equilateral triangle period Ag mesh/glass transparent electrode with the side length of 2.3 mm in a 400-800 nm wave band (the average light transmittance is shown in the specification)T av) 81.25%, square resistance: (R sh) 5.2 omega/sq, and the quality factor is 2.41 × 10-2Ω-1(ii) a The average light transmittance of the prepared superposed equilateral triangle periodic Ag grid/glass transparent electrode with the side length of 1.0mm in a wave band of 400-800 nm is (T av) 67.32%, square resistance: (R sh) 2.2 omega/sq, and the quality factor is 0.87 × 10-2Ω-1。
When scanning equilateral triangle secondary fractal geometric patterns, completely removing the Ag layer once to obtain a single-layer fractal Ag grid, firstly removing a 100 nm thick Ag layer according to the primary fractal grid of the secondary fractal geometric patterns, and then completely removing the rest 200 nm thick Ag layer according to the secondary fractal geometric patterns to obtain a double-layer fractal Ag grid, wherein optical microscopic images of the double-layer fractal Ag grid are respectively shown in fig. 10(c) and (d). Through detection, the average light transmittance of the prepared single-layer superposed equilateral triangle secondary fractal Ag grid/glass transparent electrode in the 400-800 nm wave band is (T av) 77.69%, square resistance (R sh) 3.2 omega/sq, and the quality factor is 2.50 × 10-2Ω-1And is superimposed withCompared with the formula equilateral triangle period Ag grid/glass transparent electrode, the comprehensive photoelectric property of the single-layer superposed formula equilateral triangle two-stage fractal Ag grid/glass transparent electrode is obviously improved; the average light transmittance of the prepared double-layer superposed equilateral triangle two-level fractal Ag grid/glass transparent electrode in a 400-800 nm wave band is (T av) 79.38%, square resistance: (R sh) 3.8 omega/sq, and the quality factor is 2.61 × 10-2Ω-1. Compared with the superposed equilateral triangle period Ag grid/glass transparent electrode and the single-layer superposed equilateral triangle secondary fractal Ag grid/glass transparent electrode, the comprehensive photoelectric property of the double-layer superposed equilateral triangle secondary fractal Ag grid/glass transparent electrode is obviously improved.
The present invention is not limited to the above-described embodiments, and any obvious improvements, substitutions or modifications can be made by those skilled in the art without departing from the spirit of the present invention.
Claims (4)
1. A metal grid type transparent electrode designed by utilizing a fractal geometric principle is characterized in that a metal grid layer with a fractal grid pattern is deposited on a metal grid type transparent electrode substrate, the grid pattern part and the whole have self-similarity, the metal grid layer is a single layer or multiple layers, and the single layer means that all levels of fractal patterns of the metal grid are on the same layer; the multilayer means that all levels of fractal patterns of the metal grid are on different layers, and the first level of fractal grid is on the uppermost layer; the fractal grid pattern is a fractal geometric pattern which is constructed into a regular polygon based on a fractal geometric theory method, and is expanded according to the apparent size of the transparent electrode by taking the fractal geometric pattern as a basic unit; the regular polygon is an equilateral triangle, a square or a regular hexagon, the fractal geometric pattern comprises any one or the combination of two of different periods, different stages and geometric figures, and the fractal geometric pattern is a two-stage period combined fractal geometric pattern; the two-stage period combined type fractal geometric pattern is characterized in that a square is averagely divided into four large squares, two large squares in diagonal distribution are randomly selected and averagely divided into four middle squares, and the other two large squares in diagonal distribution are averagely divided into nine small squares.
2. The metal mesh type transparent electrode designed by utilizing the fractal geometric principle as claimed in claim 1, wherein the substrate is glass, polyethylene terephthalate, TCO/glass or TCO/polyethylene terephthalate; the TCO material comprises zinc oxide, tin oxide, indium oxide and a doping system; the doping system is aluminum-doped zinc oxide, fluorine-doped tin oxide and tin-doped indium oxide.
3. The metal mesh type transparent electrode designed according to the fractal geometry principle of claim 1, wherein the metal mesh layer is a layer formed of any one or more alloys of silver, copper, gold, platinum, nickel, and aluminum.
4. The metal mesh type transparent electrode designed by utilizing the fractal geometry principle as claimed in claim 1, wherein the electrode is suitable for various metal mesh type transparent electrode preparation processes.
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| CN106898864A (en) * | 2015-12-17 | 2017-06-27 | 天津理工大学 | Magnetic based on point shape triangle strengthens nano-antenna |
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| KR100803560B1 (en) * | 2006-05-25 | 2008-02-15 | 삼성탈레스 주식회사 | Multi-resonant antenna |
| CN106898864A (en) * | 2015-12-17 | 2017-06-27 | 天津理工大学 | Magnetic based on point shape triangle strengthens nano-antenna |
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| Farzaneh Afshinmanesh et al..Transparent Metallic Fractal Electrodes for Semiconductor Devices.《Nano Letters》.2014,第14卷S068-S074. * |
| Fractal design concepts for stretchable electronics;Jonatha A. Fan et al.;《NATURE COMMUNICATIONS 》;20140207;1-8 * |
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