CN109336048B - Preparation method of super-hydrophobic surface with directional transportation function - Google Patents
Preparation method of super-hydrophobic surface with directional transportation function Download PDFInfo
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- CN109336048B CN109336048B CN201811018550.0A CN201811018550A CN109336048B CN 109336048 B CN109336048 B CN 109336048B CN 201811018550 A CN201811018550 A CN 201811018550A CN 109336048 B CN109336048 B CN 109336048B
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Abstract
The invention discloses a preparation method of a super-hydrophobic surface with a directional transportation function, which comprises the following steps: firstly, spin-coating a first layer of ultraviolet photoetching positive photoresist, and carrying out first ultraviolet photoetching; secondly, spin-coating a second layer of ultraviolet photoetching negative photoresist, and inclining the substrate to carry out second ultraviolet photoetching; thirdly, dip-coating the low surface energy nano particles; and fourthly, evaporating a hydrophilic metal film in vacuum to generate a required directional transportation track, and obtaining the super-hydrophobic surface with the directional transportation function. According to the invention, through twice ultraviolet photoetching, on one hand, the specific surface area of the microstructure is increased, so that the roughness is enough after the low surface energy nano particles are dipped and coated, and on the other hand, when the second photoetching is carried out, the substrate is intentionally inclined for exposure, so that a unidirectional inclined structure with a certain inclination angle is obtained, and thus, the rolling direction is preset. The preset rolling direction is combined with a hydrophilic transportation rail obtained by later evaporation, so that the directional transportation of the liquid drops is better realized.
Description
Technical Field
The invention relates to the field of super-hydrophobic surface processing treatment, in particular to a preparation method of a super-hydrophobic surface with a directional transportation function.
Background
The super-hydrophobic surface is a bionic functional surface which is inspired by the lotus leaf effect, and the contact angle of a water drop is usually more than 150 degrees, and the rolling angle is less than 10 degrees. The nanometer structure is also arranged on the micrometer mastoid structure on the surface of the lotus leaf, the micro-nano composite structure has important influence on super-hydrophobicity, and water drops can freely roll off on the surface of the lotus leaf due to the existence of the micro-nano composite structure, so that the lotus leaf has good self-cleaning performance.
The directional water drop transportation means that the water drops roll along a designed track on the super-hydrophobic surface, and the directional water drop transportation has great potential value in the field of liquid drop diversion. In the prior art, a hydrophilic track is arranged on a super-hydrophobic surface in a knife scraping mode to realize directional transportation of water drops, but the method has low controllability and poor universality.
According to the existing method for preparing the super-hydrophobic surface of the bionic micro-nano composite structure by adopting a chemical etching method, the prepared super-hydrophobic surface micro-nano composite structure is single in form, and a microstructure which can be freely regulated and controlled and has a certain inclination angle cannot be formed; and the roll-ability of the droplets on the surface is poor.
Specifically, in the prior art, a superhydrophobic surface is prepared by a chemical etching method, and then a certain track is scraped on the superhydrophobic surface by a knife to realize directional transportation of liquid drops. The preparation steps are as follows: (1) constructing a rough micro-nano composite structure on a substrate by adopting a chemical etching method; (2) carrying out hydrophobic modification on a substrate by using a low-surface-energy substance so as to prepare a super-hydrophobic surface; (3) and scraping the superhydrophobic surface by a knife to form a track for directional transportation according to actual needs to realize directional transportation of the liquid drops.
The prior art has the following defects:
firstly, a rough micro-nano composite structure is constructed on a substrate by adopting a chemical etching method, the structure can only be vertically generated on the substrate, a unidirectional inclined structure with a certain inclination angle cannot be formed, and the appearance of the generated microstructure cannot be regulated and controlled.
And secondly, the micro-nano composite structure is constructed on the substrate by adopting a chemical etching method, and the generated micro-scale structure and the nano-scale structure are not adjustable, so that the two structures cannot be effectively matched, and the rolling performance of liquid drops on the surface is poor although the surface presents super-hydrophobicity.
Thirdly, the super-hydrophobic surface is scraped to form a certain track by a knife according to actual needs to realize directional transportation of the liquid drops, but the scraping force is uncontrollable, so that the scraped track and the track needing directional transportation come in and go out, directional transportation of the liquid drops cannot be effectively realized, and the controllability is poor.
Disclosure of Invention
Based on the technical problem, the invention provides a preparation method of a super-hydrophobic surface with a directional transportation function, which comprises the steps of spin-coating ultraviolet photoresist twice on a silicon substrate, combining conventional ultraviolet lithography (vertical lithography) and inclined substrate ultraviolet lithography to construct a micron-sized structure, dip-coating a low-surface-energy nanoparticle suspension to construct a super-hydrophobic surface with a micro-nano composite structure, and finally evaporating a hydrophilic metal film on a track which is designed in advance on the super-hydrophobic surface with the inclined structure and is along the inclined direction of the structure by adopting an evaporation method to realize directional transportation of liquid drops.
The technical solution adopted by the invention is as follows:
a preparation method of a super-hydrophobic surface with a directional transportation function comprises the following steps:
the first step, spin coating the first layer of positive UV-photoetching glue, and carrying out the first UV-photoetching
(1) Designing a pattern to be photoetched in advance according to needs;
(2) taking a silicon substrate, ultrasonically cleaning the silicon substrate by acetone, ethanol and deionized water in sequence, and drying the silicon substrate by using nitrogen;
(3) putting a clean silicon substrate on a spin coater, dripping a proper amount of ultraviolet positive photoresist on the silicon substrate by using a micropipette, and setting the rotation speed and time of the spin coater to spin the photoresist;
(4) horizontally fixing the silicon substrate after the glue homogenizing is finished on an ultraviolet photoetching machine for ultraviolet photoetching;
(5) after photoetching is finished, immediately putting the photoresist into positive photoresist developing solution for developing, and after developing is finished, washing the photoresist with deionized water and drying the photoresist;
second, spin-coating the second layer of UV-photo negative resist, and tilting the substrate for second UV-photo-etching
(1) Putting the silicon substrate subjected to the first step of photoetching on a spin coater again, dripping a proper amount of ultraviolet photoetching negative glue on the silicon substrate by using a micropipettor, and setting the rotating speed and time of the spin coater to spin the glue;
(2) obliquely fixing the silicon substrate after the glue homogenizing is finished on an ultraviolet photoetching machine, and carrying out ultraviolet photoetching;
(3) after photoetching is finished, immediately putting the photoresist into a negative photoresist developing solution for developing, and washing and drying the photoresist by using deionized water after developing is finished;
thirdly, dip-coating the low surface energy nano-particles
(1) Ultrasonically dispersing a suspension containing low-surface-energy nano particles into deionized water to prepare a dispersion liquid;
(2) soaking the silicon substrate subjected to ultraviolet lithography in the dispersion liquid for a certain time, and then slowly taking out the silicon substrate;
(3) naturally drying the soaked silicon substrate at room temperature, and then transferring the silicon substrate into a vacuum drying oven for heating and curing;
(4) after solidification, cooling to room temperature to obtain a super-hydrophobic surface with a micro-nano composite structure;
fourthly, evaporating a hydrophilic metal film in vacuum to generate the required directional transportation track
Evaporating a hydrophilic metal film on a track which is designed in advance on the super-hydrophobic surface with an inclined structure and is along the inclined direction of the structure by adopting an evaporation method to realize the directional transportation of liquid drops;
(1) on the prepared super-hydrophobic surface, designing a track for directional transportation according to actual needs, exposing the track, and wrapping other parts with tinfoil for later use;
(2) a cold water circulating device of the vacuum evaporation equipment is arranged;
(3) opening a vacuum cover, putting the hydrophilic metal target to be evaporated into an evaporation boat, and placing and fixing the silicon substrate treated by the tinfoil in the step (1) on a substrate table;
(4) vacuumizing operation;
(5) setting coating parameters and starting coating operation;
(6) and after the film coating is finished, taking out the silicon substrate after the hydrophilic metal film is evaporated according to the directional transportation track, and obtaining the super-hydrophobic surface with the directional transportation function.
Firstly, the invention carries out twice ultraviolet photoetching by spin-coating twice ultraviolet photoresist, namely, the substrate is inclined to carry out the second ultraviolet photoetching on the basis of the conventional ultraviolet photoetching (substrate level), so that a layer of one-way inclined structure with a certain inclination angle is added on the conventional ultraviolet photoetching pattern, and then the low surface energy nano particle suspension is dip-coated to construct the micro-nano composite structure. The prepared micro-nano composite structure can be freely regulated and controlled, is rough enough, and improves the super-hydrophobic property of the surface.
Secondly, the microstructure of the super-hydrophobic surface prepared by the invention is inclined relative to the substrate, and as the microstructure and the substrate have an inclination angle which is equivalent to a preset rolling direction, the liquid drop on the super-hydrophobic surface can roll before the inclination angle of the substrate reaches the rolling angle of the conventional super-hydrophobic surface, so that the liquid drop on the super-hydrophobic surface is more favorable for rolling towards the direction of the inclination of the structure (for example, when the right side of the silicon substrate is lifted during inclined photoetching, the formed liquid drop on the super-hydrophobic surface is more favorable for rolling from right to left), and the rolling performance of the liquid drop on the super-hydrophobic surface is improved.
And thirdly, evaporating a hydrophilic metal film on a track which is designed in advance along the structure inclination direction on the super-hydrophobic surface with the inclined structure by adopting an evaporation method to realize the directional transportation of the liquid drops. The metal film of coating by vaporization and the adhesion performance of basement are better, and the membrane thickness is even controllable to the position of coating by vaporization is more accurate, can effectively realize the directional transportation of liquid drop.
Preferably, the ultraviolet positive photoresist is AZ5214E, and the corresponding developing solution is AZ developing solution; the ultraviolet photoresist negative film is SU8-3050, and the corresponding developing solution is SU 8. The invention carries out two times of ultraviolet lithography, and adopts two types of ultraviolet photoresists during the two times of ultraviolet lithography so as to avoid the influence of the developing solution of the second time of ultraviolet lithography on the ultraviolet photoresist which is spun for the first time, or avoid the influence on the pattern which is developed for the first time during the second time of development.
Preferably, the suspension containing the low surface energy nano-particles is polytetrafluoroethylene nano-particle suspension, and the step of reducing the surface energy through fluorination is omitted by dip-coating the polytetrafluoroethylene nano-particles.
Preferably, the ultraviolet lithography pattern can be a circular column array, a square column array or a diamond column array arranged in a regular polygonal array. Of course, other shapes for other array arrangements may be used.
Preferably, the evaporated hydrophilic metal target is selected from any one of silver, aluminum, copper, iron, nickel, chromium and magnesium.
The above-mentioned directional transportation track can also be adjusted according to the actual need.
The beneficial technical effects of the invention are as follows:
firstly, a micron-scale rough structure is constructed on a substrate by adopting an ultraviolet lithography technology, the substrate is tilted on the basis of conventional ultraviolet lithography for the second ultraviolet lithography (the first lithography is conventional lithography, namely, the substrate is horizontally placed for exposure, and the second lithography is tilted for exposure, so that a unidirectional tilting microstructure with a certain tilt angle is obtained), a layer of unidirectional tilting structure with a certain tilt angle is added on a conventional ultraviolet lithography pattern, the specific surface area of the microstructure is increased, and then the micro-nano composite structure is constructed by dip-coating a low-surface-energy nano particle suspension. The prepared micro-nano composite structure can be freely regulated and controlled, is rough enough, and improves the super-hydrophobic property of the surface.
The microstructure of the super-hydrophobic surface prepared by the invention is inclined relative to the substrate, and the inclination angle between the microstructure and the substrate is equivalent to a preset rolling direction, so that the liquid drop on the microstructure can roll before the inclination angle of the substrate reaches the rolling angle of the conventional super-hydrophobic surface, and the liquid drop on the super-hydrophobic surface is more beneficial to rolling towards the inclined direction of the structure, thereby increasing the rolling performance of the liquid drop on the super-hydrophobic surface.
And thirdly, designing a directional transportation pattern according to actual needs, exposing the pattern, wrapping other parts with tinfoil, and then evaporating a hydrophilic metal film on a track which is designed in advance on the super-hydrophobic surface with an inclined structure and is along the inclined direction of the structure by adopting an evaporation method to realize directional transportation of liquid drops. The metal film of coating by vaporization and the adhesion performance of basement are better, and the membrane thickness is even controllable to the position of coating by vaporization is more accurate, can effectively realize the directional transportation of liquid drop, has improved directional transportation's accuracy nature and controllability.
In summary, the invention increases the specific surface area of the microstructure through two times of ultraviolet lithography, so that the roughness is enough after the low surface energy nano particles are dipped, and on the other hand, the substrate is intentionally inclined to carry out exposure during the second time of lithography, so that a unidirectional inclined structure with a certain inclination angle is obtained, thereby being equivalent to a preset rolling direction. The preset rolling direction is combined with a hydrophilic transportation track obtained by later evaporation (a layer of metal film is evaporated on the micro-nano super-hydrophobic surface to change the wetting behavior of the micro-nano super-hydrophobic surface into a hydrophilic track, the wetting behavior of the area around the track is not changed, and the area is still a super-hydrophobic area), so that the directional transportation of liquid drops is better realized.
Drawings
The invention will be further described with reference to the following detailed description and drawings:
FIG. 1 is a method for preparing a super-hydrophobic surface with a directional transportation function according to the present invention;
FIG. 2 is a schematic view of a vacuum resistance evaporation coating apparatus used in the present invention;
FIG. 3 is a schematic view of a partial track after a metal film is evaporated by the method of the present invention;
FIG. 4 is a schematic rolling diagram of water droplets on the superhydrophobic surface with directional transport function prepared by the present invention; the direction of rolling of the water droplets on the obtained superhydrophobic surface is indicated by arrows in the figure.
In the figure: 1-a silicon substrate; 2-ultraviolet positive photoresist; 3-ultraviolet negative photoresist; 4-polytetrafluoroethylene nanoparticles; 5-evaporated copper film; 6-vacuum cover; 7-a substrate table; 8-evaporating the boat; 9-copper target material; 10-tinfoil; 11-water droplets; a-vapor deposition of metal film regions (hydrophilic regions); b-regions of non-evaporated metal film (regions covered by tinfoil, i.e., regions of super-hydrophobicity).
Detailed Description
The invention provides a method for constructing a super-hydrophobic surface of a micro-nano composite structure, which has a certain inclination angle, is inclined in a single direction and can freely regulate and control a microstructure; further, a method for accurately generating a directional transportation track is provided, directional transportation of liquid drops on the silicon substrate is achieved, and rolling performance of the liquid drops on the super-hydrophobic surface is improved.
The invention relates to a method for preparing a super-hydrophobic surface with a micro-nano composite structure, which comprises the steps of spin-coating ultraviolet photoresist twice on a silicon substrate, carrying out ultraviolet lithography twice, namely combining conventional lithography and inclined silicon substrate lithography to construct a micron-sized structure, dip-coating nano particles with low surface energy to construct a super-hydrophobic surface with a micro-nano composite structure, and finally evaporating a hydrophilic metal film on a track which is designed in advance on the super-hydrophobic surface with an inclined structure and is along the inclined direction of the structure by adopting an evaporation method to realize the directional transportation of liquid drops.
The following is a more specific description by way of specific examples.
Example 1
With the attached drawings, the preparation method of the super-hydrophobic surface with the directional transportation function comprises the following steps:
the first step, spin coating UV photoresist (positive photoresist), performing a first UV lithography
(1) Designing a pattern to be photoetched in advance according to needs;
(2) taking a silicon substrate 1 with the size of 25mm multiplied by 25mm, sequentially ultrasonically cleaning the silicon substrate 1 with acetone, ethanol and deionized water for 10min, and drying the silicon substrate with nitrogen;
(3) putting a clean silicon substrate 1 on a spin coater, dripping a proper amount of ultraviolet photoresist 2 (positive photoresist) with the model of AZ5214E on the silicon substrate 1 by using a micropipette, setting the rotation speed and time of pre-spin coating to be 500rpm and 10s respectively, and setting the rotation speed and time of spin coating to be 4000rpm and 30s respectively, and carrying out spin coating;
(4) horizontally fixing the silicon substrate 1 after the glue homogenizing is finished on a photoetching machine for exposure;
(5) and immediately placing the photoresist into AZ developing solution for 40s after photoetching is finished, and washing the photoresist with deionized water and drying the photoresist after developing is finished.
Second, spin coating UV photoresist (negative photoresist), and tilting the substrate for second UV lithography
(1) Placing the silicon substrate 1 subjected to the first step of photoetching on a spin coater, dripping a proper amount of ultraviolet photoresist 3 (negative photoresist) on the silicon substrate 1 by using a micropipette, wherein the model is SU8-3050, the rotation speed and time of pre-spin coating are respectively set to be 500rpm and 20s, and the rotation speed and time of spin coating are respectively set to be 3000rpm and 30s, and carrying out spin coating;
(2) fixing the silicon substrate 1 after the glue homogenizing is finished on a photoetching machine in an inclined manner of 5 degrees for exposure;
(3) and immediately placing the substrate into SU8 developing solution for 2min after photoetching is finished, and washing the substrate with deionized water and drying the substrate after developing is finished.
Thirdly, dip-coating the polytetrafluoroethylene nanoparticle suspension
(1) Ultrasonically dispersing 1g of polytetrafluoroethylene nanoparticle 4 suspension liquid with the weight of 60% into 5ml of deionized water to prepare dispersion liquid;
(2) soaking the silicon substrate 1 subjected to ultraviolet lithography in the dispersion liquid for 5min, and then slowly taking out;
(3) after the soaked silicon substrate 1 is naturally dried at room temperature, the silicon substrate is moved into a vacuum drying oven and is heated and cured for 30min at 120 ℃;
(4) after the solidification is completed, cooling to room temperature.
Fourthly, evaporating a layer of hydrophilic metal film on a track which is designed in advance on the super-hydrophobic surface with an inclined structure and is along the inclined direction of the structure by adopting an evaporation method to realize the directional transportation of the liquid drops
(1) On the prepared super-hydrophobic surface, as shown in fig. 3, the circular arc track A is exposed, and the other parts B are wrapped by tinfoil 10 for standby;
(2) a cold water circulating device of the vacuum evaporation equipment is arranged;
(3) as shown in fig. 2, the vacuum hood 6 is opened, the copper target 9 to be evaporated is placed in the evaporation boat 8, and the substrate wrapped by the tinfoil 10 in the step (1) is placed on the substrate table 7 and fixed;
(4) vacuumizing operation;
(5) setting coating parameters and starting coating operation;
(6) and after the coating is finished, taking the substrate out of the vacuum evaporation equipment, taking the tin foil around the circular arc track down to finish the coating operation, evaporating a layer of metal film on the inclined structure of the circular arc track to form a hydrophilic area, wherein the position covered by the tin foil is still a super-hydrophobic area without the metal film.
In this embodiment, a directional transport track along the structure inclination direction is designed in advance on the superhydrophobic surface having an inclined structure, a layer of metal film is evaporated by an evaporation method to change the wetting behavior of the metal film, so that the designed directional transport track is changed into a hydrophilic track, while the wetting behavior of the area around the track is not changed, and is still a superhydrophobic area.
The silicon substrate of the present invention may be replaced with a glass substrate, a plastic substrate, a metal substrate, or the like. The ultraviolet lithography pattern may be any one of a circular column array, a square column array, and a diamond column array arranged in a regular polygonal array. The evaporated hydrophilic metal target material can also be selected from one of silver, aluminum, iron, nickel, chromium, magnesium and the like. Of course, the above-mentioned directional transportation track can also be adjusted according to actual needs.
Parts not described in the above modes can be realized by adopting or referring to the prior art.
It is intended that any equivalents, or obvious variations, which may be made by those skilled in the art in light of the teachings herein, be considered within the scope of the present invention.
Claims (5)
1. A preparation method of a super-hydrophobic surface with a directional transportation function is characterized by comprising the following steps:
the first step, spin coating the first layer of positive UV-photoetching glue, and carrying out the first UV-photoetching
(1) Designing a pattern to be photoetched in advance according to needs;
(2) taking a silicon substrate, ultrasonically cleaning the silicon substrate by acetone, ethanol and deionized water in sequence, and drying the silicon substrate by using nitrogen;
(3) putting a clean silicon substrate on a spin coater, dripping a proper amount of ultraviolet positive photoresist on the silicon substrate by using a micropipette, and setting the rotation speed and time of the spin coater to spin the photoresist;
(4) horizontally fixing the silicon substrate after the glue homogenizing is finished on an ultraviolet photoetching machine for ultraviolet photoetching;
(5) after photoetching is finished, immediately putting the photoresist into positive photoresist developing solution for developing, and after developing is finished, washing the photoresist with deionized water and drying the photoresist;
second, spin-coating the second layer of UV-photo negative resist, and tilting the substrate for second UV-photo-etching
(1) Putting the silicon substrate subjected to the first step of photoetching on a spin coater again, dripping a proper amount of ultraviolet photoetching negative glue on the silicon substrate by using a micropipettor, and setting the rotating speed and time of the spin coater to spin the glue;
(2) obliquely fixing the silicon substrate after the glue homogenizing is finished on an ultraviolet photoetching machine, and carrying out ultraviolet photoetching;
(3) after photoetching is finished, immediately putting the photoresist into a negative photoresist developing solution for developing, and washing and drying the photoresist by using deionized water after developing is finished;
thirdly, dip-coating the low surface energy nano-particles
(1) Ultrasonically dispersing a suspension containing low-surface-energy nano particles into deionized water to prepare a dispersion liquid;
(2) soaking the silicon substrate subjected to ultraviolet lithography in the dispersion liquid for a certain time, and then slowly taking out the silicon substrate;
(3) naturally drying the soaked silicon substrate at room temperature, and then transferring the silicon substrate into a vacuum drying oven for heating and curing;
(4) after solidification, cooling to room temperature to obtain a super-hydrophobic surface with a micro-nano composite structure;
fourthly, evaporating a hydrophilic metal film in vacuum to generate the required directional transportation track
(1) On the prepared super-hydrophobic surface, designing a track for directional transportation according to actual needs, exposing the track, and wrapping other parts with tinfoil for later use;
(2) a cold water circulating device of the vacuum evaporation equipment is arranged;
(3) opening a vacuum cover, putting the hydrophilic metal target to be evaporated into an evaporation boat, and placing and fixing the silicon substrate treated by the tinfoil in the step (1) on a substrate table;
(4) vacuumizing operation;
(5) setting coating parameters and starting coating operation;
(6) and after the film coating is finished, taking out the silicon substrate after the hydrophilic metal film is evaporated according to the directional transportation track, and obtaining the super-hydrophobic surface with the directional transportation function.
2. The method for preparing the superhydrophobic surface with the directional transportation function according to claim 1, wherein the method comprises the following steps: the ultraviolet photoresist is AZ5214E, and the corresponding developing solution is AZ developing solution; the ultraviolet photoresist negative film is SU8-3050, and the corresponding developing solution is SU 8.
3. The method for preparing the superhydrophobic surface with the directional transportation function according to claim 1, wherein the method comprises the following steps: the suspension containing the low surface energy nano-particles is polytetrafluoroethylene nano-particle suspension.
4. The method for preparing the superhydrophobic surface with the directional transportation function according to claim 1, wherein the method comprises the following steps: the pattern is a circular column array, a square column array or a rhombic column array which are arranged in a regular polygon array.
5. The method for preparing the superhydrophobic surface with the directional transportation function according to claim 1, wherein the method comprises the following steps: the evaporated hydrophilic metal target is selected from any one of silver, aluminum, copper, iron, nickel, chromium and magnesium.
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| CN110082063A (en) * | 2019-03-04 | 2019-08-02 | 中国科学院化学研究所 | The method and purposes of rotary motion after a kind of control droplet collision |
| CN110745897B (en) * | 2019-10-29 | 2020-07-14 | 广东工业大学 | Bionic structure for realizing continuous bubble transmission underwater and processing method thereof |
| CN111379767B (en) * | 2020-02-17 | 2021-12-07 | 常熟理工学院 | Surface structure for non-drop height directional liquid transportation |
| CN111282528B (en) * | 2020-02-28 | 2021-08-27 | 苏州大学 | Micro-reactor and method based on liquid drop tweezers |
| CN111690161A (en) * | 2020-05-21 | 2020-09-22 | 天津大学 | Anisotropic wettability combined asymmetric net material for unidirectional liquid conduction and preparation method |
| CN112588540A (en) * | 2020-11-24 | 2021-04-02 | 江苏大学 | Hydrophilic-hydrophobic heterogeneous patterned surface for enhancing dropwise condensation and preparation method thereof |
| CN115350733B (en) * | 2022-07-13 | 2023-12-22 | 中国科学院上海微系统与信息技术研究所 | Microfluidic chip with single-layer inclined structure liquid drop storage cavity and preparation method thereof |
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| CN103885300B (en) * | 2014-03-19 | 2016-01-27 | 南京晶奥微光电技术有限公司 | A kind of hydrophobic surface photoetching process |
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