CN109298604A - A kind of method of contactless exposure - Google Patents
A kind of method of contactless exposure Download PDFInfo
- Publication number
- CN109298604A CN109298604A CN201811458666.6A CN201811458666A CN109298604A CN 109298604 A CN109298604 A CN 109298604A CN 201811458666 A CN201811458666 A CN 201811458666A CN 109298604 A CN109298604 A CN 109298604A
- Authority
- CN
- China
- Prior art keywords
- load bearing
- bearing component
- exposure
- glass load
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
This application discloses a kind of methods of contactless exposure, comprising: provides a glass load bearing component, carries out to the glass load bearing component physical toughened；Pattern layer is set on glass load bearing component surface, forms exposure mold；The exposure mold is placed in the substrate upper space that surface has photoresist, the pattern layer is irradiated towards the photoresist, and on the top of the exposure mold, and light exposes to form target pattern after penetrating the pattern layer on the surface of the substrate.The method of above-mentioned contactless exposure can be avoided exposure mold and sagging problem occur under the effect of gravity, promote exposing patterns in the Line-width precision uniformity of each position of substrate, the pattern for being suitble to production line width finer promotes production yield.
Description
Technical field
The invention belongs to electronic products manufacturing technology fields, more particularly to a kind of method of contactless exposure.
Background technique
Present electronic product is smaller and smaller, but function is stronger and stronger, mainly has benefited from constantly mentioning for manufacturing process
It rises, so that electronic circuit is more and more finer.Wherein, electronic circuit can be made by way of exposure, and exposure sources master
It is divided into two kinds: contact exposure and contactless exposure.Contact exposure exposes mold (chromium plate) and substrate gap is 0,
Contact with each other the method being exposed between the two, and design line width (mold draw above case line width) and reality may be implemented in this way
The pattern that exposure comes out is consistent, and the line width uniformity of each position of entire pattern is fine；The side of above-mentioned contactless exposure
As shown in FIG. 1, FIG. 1 is the normal condition schematic diagrames of existing contactless exposure for method, and exposing mold (chromium plate) includes chromium pattern 1
With load bearing component 2, when exposure, is placed in chromium pattern downward below light source, and this load bearing component 2 it is contactless be placed in base
The upper space of material 3, and the upper surface of substrate 3 has photoresist 4, places illuminace component 5 in the upper space of exposure mold
(can be, but not limited to as incandescent lamp), the light that illuminace component 5 issues is aimed downwardly, across the gap of load bearing component 2 and chromium pattern 1
Later, the position of photoresist 4 is reached, and since chromium pattern in certain positions forms blockings, thus in the selection of the surface of substrate 3
Photoresist 4 is etched the pattern to match with chromium pattern 1 by property, it should be noted that in this method, 2 He of load bearing component
The gap of photoresist 4 is not 0, the advantage that be that can make than the thinner lines of design mold, but the disadvantage is that is obtained is whole
The line width uniformity of each position is not so good as contact exposure mode in a pattern, the reason is as follows that:
Load bearing component 2 in exposure mold used by above-mentioned exposure process is generally soda glass or quartz glass, right
In the higher producing line of some production algebra, the size for exposing mold is larger, and by taking 4.5G as an example, the size for exposing mold is 760mm*
980mm, as shown in Fig. 2, Fig. 2 is that load bearing component is placed on the top view on bracket, it is seen then that the load bearing component 2 for exposing mold is put
It sets on the bracket 6 in exposure machine, bracket 6, which has, encloses four frames of getting up, wherein the front end edge of the bracket 6 and rear end
While there is pneumatic element 7, load bearing component 2 can be clamped, and load bearing component 2 itself is thicker, there is certain weight, due to the original of gravity
Cause, central area can bend sagging, inherently there was only about 100 microns minimum between load bearing component 2 and photoresist 4
Gap, therefore after the bending of barycentric area, gap between the two, which has, largely to be changed, as shown in figure 3, Fig. 3 is existing
The exposure mold for the contactless exposure having bend after schematic diagram, it is sagging due to load bearing component 2, chromium pattern 1 with
Gap between photoresist 4 on substrate 3 at various locations is inconsistent, and such illuminace component 5 is irradiated to after chromium pattern 1, from
The amount light and desired quantity that different location penetrates occur as soon as difference, and the light transmission angle of different location is also changed,
The precision of this each position of the pattern for resulting in exposure to come out on substrate 3 is inconsistent, so as to cause production yield decline.
Summary of the invention
To solve the above problems, can be avoided exposure mold the present invention provides a kind of method of contactless exposure and exist
Gravity issues vertical problem of giving birth to, and promotes exposing patterns in the Line-width precision uniformity of each position of substrate, is suitble to production
The finer pattern of line width promotes production yield.
A kind of method of contactless exposure provided by the invention, comprising:
One glass load bearing component is provided, the glass load bearing component is carried out physical toughened；
Pattern layer is set on glass load bearing component surface, forms exposure mold；
The exposure mold is placed in the substrate upper space that surface has photoresist, the pattern layer is towards the photoetching
Glue, and irradiated on the top of the exposure mold, light exposes to be formed on the surface of the substrate later through the pattern layer
Target pattern.
Preferably, in the method for above-mentioned contactless exposure, to the glass load bearing component carry out it is physical toughened it
Afterwards, further includes:
The surface of the glass load bearing component is polished.
Preferably, in the method for above-mentioned contactless exposure, it is described glass carrying is carried out physical toughened include:
The glass load bearing component is placed in annealing furnace and is heated to 600 DEG C to 700 DEG C, continues the first preset time；
The glass load bearing component is uniformly quickly cooled down, the second preset time is continued.
Preferably, in the method for above-mentioned contactless exposure, the surface to the glass load bearing component is thrown
Light includes:
The polishing that depth is 5 microns to 20 microns is carried out to the surface of the glass load bearing component.
Preferably, in the method for above-mentioned contactless exposure, the surface of the glass load bearing component is carried out polishing it
Afterwards, further includes:
The glass load bearing component is heated to 250 DEG C to 300 DEG C, and continues third preset time, examines the glass
Whether load bearing component is qualified.
Preferably, in the method for above-mentioned contactless exposure, first preset time is 240 seconds to 360 seconds.
Preferably, in the method for above-mentioned contactless exposure, second preset time is 150 seconds to 200 seconds.
Preferably, in the method for above-mentioned contactless exposure, the third preset time is 3 hours to 4 hours.
As can be seen from the above description, the method for above-mentioned contactless exposure provided by the invention, due to first to the glass
Load bearing component progress is physical toughened, and pattern layer then is arranged on glass load bearing component surface, forms exposure mold, finally will
The exposure mold is placed in the substrate upper space that surface has photoresist, and the pattern layer is towards the photoresist, and in institute
The top irradiation of exposure mold is stated, light exposes to form target pattern on the surface of the substrate later through the pattern layer,
The surface of glass load bearing component after tempering has higher compression, in this way in the case where bearing same pressure, itself
Bending degree it is smaller, this can improve glass load bearing component and occur due to own wt when placing on bracket toward sagging
Phenomenon, therefore, the method for this contactless exposure be able to ascend exposing patterns each position of substrate Line-width precision it is equal
Even property, the pattern for being suitble to production line width finer, promotes production yield.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
The embodiment of invention for those of ordinary skill in the art without creative efforts, can also basis
The attached drawing of offer obtains other attached drawings.
Fig. 1 is the normal condition schematic diagram of existing contactless exposure；
Fig. 2 is that load bearing component is placed on the top view on bracket；
Fig. 3 is the schematic diagram after the exposure mold of existing contactless exposure bends；
Fig. 4 is a kind of schematic diagram of the method for contactless exposure provided by the present application.
Specific embodiment
Core of the invention is to provide a kind of method of contactless exposure, can be avoided exposure mold under the effect of gravity
Sagging problem occurs, promotes exposing patterns in the Line-width precision uniformity of each position of substrate, is suitble to production line width more smart
Thin pattern promotes production yield.
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
A kind of embodiment of the method for contactless exposure provided by the present application is as shown in figure 4, Fig. 4 is provided by the present application
A kind of schematic diagram of the method for contactless exposure, this method comprises the following steps:
S1: providing a glass load bearing component, carries out to glass load bearing component physical toughened；
Specifically, first by glass sawing sheet, obtain with the matched glass load bearing component of target size, then carry out edging, then
Into tempering step, it can be, but not limited to that first glass load bearing component is placed in annealing furnace and be heated to 600 DEG C to 700 DEG C, continue
Then glass load bearing component is uniformly quickly cooled down by the first preset time, continue the second preset time, and this first it is default when
Between can be preferably 240 seconds to 360 seconds, which can be preferably 150 seconds to 200 seconds, this physical toughened
Technique will not introduce other impurities to glass load bearing component, so that the cleaning during guaranteeing post-exposure, will not give photoresist
Bring pollution.
S2: pattern layer is set on glass load bearing component surface, forms exposure mold；
Specifically, the pattern layer can be arranged on glass load bearing component surface using existing equipment and technique, generally may be used
The pattern-making layer by the way of exposure can also be utilized laser to draw this pattern layer, is not intended to limit herein, and this
The material that pattern layer generally uses is chromium, but this is a preferred material, can also select other materials according to actual needs,
It does not limit herein.
S3: mold will be exposed and be placed in the substrate upper space that surface has photoresist, pattern layer is being exposed towards photoresist
The top of gloss mold is irradiated, and light exposes to form target pattern on the surface of substrate later through pattern layer.
The step can also continue to reference to Fig. 1, when specific operation, first exposure die flip comes, makes pattern layer downward,
It is placed on bracket, and places substrate in the lower part of exposure mold, substrate upper surface has photoresist, is then turned on and is located at exposure
The irradiation part on gloss mold top is irradiated, to form target pattern in substrate surface.
As can be seen from the above description, the method for above-mentioned contactless exposure provided by the present application, due to first being carried to glass
Component progress is physical toughened, and pattern layer then is arranged on glass load bearing component surface, forms exposure mold, will finally expose mold
It is placed in the substrate upper space that surface has photoresist, pattern layer is irradiated towards photoresist, and on the top of exposure mold, light
It exposes to form target pattern on the surface of substrate through after pattern layer, the surface of the glass load bearing component after tempering has higher
Compression, in this way in the case where bearing same pressure, the bending degree of itself is smaller, this can improve glass supporting part
Part when being placed on bracket due to own wt and there is a phenomenon where toward sagging, the method energy of this contactless exposure
Exposing patterns are enough promoted in the uniformity of the Line-width precision of each position of substrate, the pattern for being suitble to production line width finer mentions
Rise production yield.
It in a preferred embodiment, can also include as follows after physical toughened to the progress of glass load bearing component
Step: polishing the surface of glass load bearing component, and the flatness of glass load bearing component itself can be mentioned after being polished
It rises, the precision of post-exposure technique can be made higher in this way.
Further, it can specifically include: to glass supporting part that the above-mentioned surface to glass load bearing component, which polishes,
The surface of part carries out the polishing that depth is 5 microns to 20 microns, and it is most of can to remove glass load bearing component surface in this way
Protrusion or pit, obtained plane are closer perfect.
Moreover, can also include a following steps after being polished to the surface of glass load bearing component:
Glass load bearing component is heated to 250 DEG C to 300 DEG C, and continues third preset time, examines glass load bearing component
It is whether qualified, it is preferred that third preset time can be 3 hours to 4 hours.
It should be noted that whether inspection glass load bearing component mentioned here is qualified, mainly observation glass is held in advance
It carries whether component can be revealed in the environment of this continuous high temperature, illustrates that steel process is unqualified if self-destruction, need
It takes measures on customs clearance to avoid this phenomenon, if do not revealed, can continue the glass load bearing component being applied to subsequent exposure
In light technology, the safety of exposure technology is ensured that in this way, reduces the probability that accident occurs.
The foregoing description of the disclosed embodiments enables those skilled in the art to implement or use the present invention.
Various modifications to these embodiments will be readily apparent to those skilled in the art, as defined herein
General Principle can be realized in other embodiments without departing from the spirit or scope of the present invention.Therefore, of the invention
It is not intended to be limited to the embodiments shown herein, and is to fit to and the principles and novel features disclosed herein phase one
The widest scope of cause.
Claims (8)
1. a kind of method of contactless exposure characterized by comprising
One glass load bearing component is provided, the glass load bearing component is carried out physical toughened；
Pattern layer is set on glass load bearing component surface, forms exposure mold；
The exposure mold is placed in the substrate upper space that surface has photoresist, the pattern layer towards the photoresist,
And irradiated on the top of the exposure mold, light exposes to form target on the surface of the substrate later through the pattern layer
Pattern.
2. the method for contactless exposure according to claim 1, which is characterized in that the glass load bearing component into
After row is physical toughened, further includes:
The surface of the glass load bearing component is polished.
3. the method for contactless exposure according to claim 1, which is characterized in that described carry to the glass carries out
It is physical toughened to include:
The glass load bearing component is placed in annealing furnace and is heated to 600 DEG C to 700 DEG C, continues the first preset time；
The glass load bearing component is uniformly quickly cooled down, the second preset time is continued.
4. the method for contactless exposure according to claim 1, which is characterized in that described to the glass load bearing component
Surface carry out polishing include:
The polishing that depth is 5 microns to 20 microns is carried out to the surface of the glass load bearing component.
5. the method for contactless exposure according to claim 2 or 4, which is characterized in that the glass load bearing component
Surface polished after, further includes:
The glass load bearing component is heated to 250 DEG C to 300 DEG C, and continues third preset time, the glass is examined to carry
Whether component is qualified.
6. the method for contactless exposure according to claim 3, which is characterized in that first preset time is 240
Second was to 360 seconds.
7. the method for contactless exposure according to claim 3, which is characterized in that second preset time is 150
Second was to 200 seconds.
8. the method for contactless exposure according to claim 5, which is characterized in that the third preset time is 3 small
Up to 4 hours.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811458666.6A CN109298604A (en) | 2018-11-30 | 2018-11-30 | A kind of method of contactless exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811458666.6A CN109298604A (en) | 2018-11-30 | 2018-11-30 | A kind of method of contactless exposure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109298604A true CN109298604A (en) | 2019-02-01 |
Family
ID=65142291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811458666.6A Pending CN109298604A (en) | 2018-11-30 | 2018-11-30 | A kind of method of contactless exposure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109298604A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114643180A (en) * | 2022-02-28 | 2022-06-21 | 长电集成电路(绍兴)有限公司 | Photoresist curing device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1448785A (en) * | 2002-04-04 | 2003-10-15 | 显像制造服务株式会社 | Large-area light shield and exposure system with the same large-area light shield |
| CN104843979A (en) * | 2015-05-29 | 2015-08-19 | 安徽省实防新型玻璃科技有限公司 | Processing technology for tempered glass |
| CN107994136A (en) * | 2017-12-08 | 2018-05-04 | 信利（惠州）智能显示有限公司 | Mask plate and preparation method thereof |
-
2018
- 2018-11-30 CN CN201811458666.6A patent/CN109298604A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1448785A (en) * | 2002-04-04 | 2003-10-15 | 显像制造服务株式会社 | Large-area light shield and exposure system with the same large-area light shield |
| CN104843979A (en) * | 2015-05-29 | 2015-08-19 | 安徽省实防新型玻璃科技有限公司 | Processing technology for tempered glass |
| CN107994136A (en) * | 2017-12-08 | 2018-05-04 | 信利（惠州）智能显示有限公司 | Mask plate and preparation method thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114643180A (en) * | 2022-02-28 | 2022-06-21 | 长电集成电路(绍兴)有限公司 | Photoresist curing device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI430018B (en) | A substrate for a mask, a forming member for a substrate for a mask, a method for manufacturing a mask for a mask, a photomask, and an exposure method using a mask | |
| CN106458693B (en) | Method and apparatus for cutting multiple radii in flexible thin glass | |
| KR101301507B1 (en) | Semiconductor heater manufacturing method and heater thereusing | |
| CN102094220B (en) | Method for repairing titanium mother board | |
| CN1304312C (en) | Glass substrate and glass cutting method | |
| JP2014139122A (en) | Method and device for manufacturing cover glass for display | |
| TW202017877A (en) | Cutting method for forming chamfered corners | |
| CN104854044B (en) | The method and apparatus for removing sheet glass peripheral part | |
| WO2006109921A1 (en) | Manufacturing method of slanted-pyramid microlens and its application to light guide plate | |
| CN109298604A (en) | A kind of method of contactless exposure | |
| CN112456766A (en) | Curved ultrathin glass, manufacturing method thereof and folding device | |
| JP2019194142A (en) | Chemically reinforced glass sheet, portable information terminal, and manufacturing method of chemically reinforced glass sheet | |
| US20150253681A1 (en) | Exposure apparatus and exposure system | |
| CN111624695A (en) | Transparent glass light guide plate and manufacturing method thereof | |
| JP2005121916A (en) | Method for manufacturing base plate with recessed part for lenticular lens, base plate with recessed part for lenticular lens, lenticular lens base plate, transmission type screen and rear type projector | |
| JP5332085B2 (en) | Manufacturing method of glass substrate for flat panel display | |
| JP2008175996A (en) | Manufacturing method of light guide plate | |
| KR20120086705A (en) | Glass substrate for display and method for manufacturing the glass substrate | |
| JP2012246182A (en) | Method for producing cover glass for portable device | |
| CN109678332A (en) | Glass board material 3D curved surface noncontact processing system and method | |
| JP6450105B2 (en) | Imprint apparatus and article manufacturing method | |
| CN111003931B (en) | Production method of bent tempered glass with Low-E surface capable of contacting roller way of tempering furnace | |
| JP2000016840A5 (en) | ||
| CN109769348B (en) | Manufacturing process of copper-buried plate | |
| JP2006215115A (en) | Manufacturing method of light diffusion reflective plate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190201 |