CN109272216B - Statistical process control method for zero excess particle number in ultra-clean room - Google Patents

Statistical process control method for zero excess particle number in ultra-clean room Download PDF

Info

Publication number
CN109272216B
CN109272216B CN201811013365.2A CN201811013365A CN109272216B CN 109272216 B CN109272216 B CN 109272216B CN 201811013365 A CN201811013365 A CN 201811013365A CN 109272216 B CN109272216 B CN 109272216B
Authority
CN
China
Prior art keywords
particle number
particle
obtaining
control
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201811013365.2A
Other languages
Chinese (zh)
Other versions
CN109272216A (en
Inventor
游海龙
张金力
田文星
贾新章
顾铠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xidian University
Original Assignee
Xidian University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xidian University filed Critical Xidian University
Priority to CN201811013365.2A priority Critical patent/CN109272216B/en
Publication of CN109272216A publication Critical patent/CN109272216A/en
Application granted granted Critical
Publication of CN109272216B publication Critical patent/CN109272216B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00Administration; Management
    • G06Q10/06Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
    • G06Q10/063Operations research, analysis or management
    • G06Q10/0639Performance analysis of employees; Performance analysis of enterprise or organisation operations
    • G06Q10/06395Quality analysis or management
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q50/00Systems or methods specially adapted for specific business sectors, e.g. utilities or tourism
    • G06Q50/04Manufacturing
    • GPHYSICS
    • G07CHECKING-DEVICES
    • G07CTIME OR ATTENDANCE REGISTERS; REGISTERING OR INDICATING THE WORKING OF MACHINES; GENERATING RANDOM NUMBERS; VOTING OR LOTTERY APPARATUS; ARRANGEMENTS, SYSTEMS OR APPARATUS FOR CHECKING NOT PROVIDED FOR ELSEWHERE
    • G07C3/00Registering or indicating the condition or the working of machines or other apparatus, other than vehicles
    • G07C3/005Registering or indicating the condition or the working of machines or other apparatus, other than vehicles during manufacturing process
    • GPHYSICS
    • G07CHECKING-DEVICES
    • G07CTIME OR ATTENDANCE REGISTERS; REGISTERING OR INDICATING THE WORKING OF MACHINES; GENERATING RANDOM NUMBERS; VOTING OR LOTTERY APPARATUS; ARRANGEMENTS, SYSTEMS OR APPARATUS FOR CHECKING NOT PROVIDED FOR ELSEWHERE
    • G07C3/00Registering or indicating the condition or the working of machines or other apparatus, other than vehicles
    • G07C3/14Quality control systems
    • G07C3/146Quality control systems during manufacturing process
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30Computing systems specially adapted for manufacturing

Abstract

The invention discloses a statistical process control method for the number of particles with excessive zero in an ultra-clean room, which mainly solves the problem that the existing statistical process control technology has excessive false alarm or can not give an alarm in time when the zero proportion of the number of particles in the ultra-clean room is more than 50 percent. The implementation steps are as follows: 1. collecting the particle number in the air by using a particle number counter, wherein the collected data at least comprises 90 non-zero data; 2. obtaining the probability of different particle numbers; 3. calculating the estimated values of the parameters c and T in the threshold Poisson distribution by using an iterative method to obtain an upper control limit; 4. according to the drawing method of the Huhart control chart, drawing the particle number and the control line into the corresponding control chart; 6. whether the particle number in the ultra-clean room is controlled or not is judged by observing whether the control chart slightly exceeds the upper control line or not, whether production is continued or not is really carried out, so that timely early warning when the particle number is out of control is realized, the product quality is improved, the economic loss caused by out of control is reduced, and the method can be used for quality monitoring of semiconductor production.

Description

Statistical process control method for zero excess particle number in ultra-clean room
Technical Field
The invention belongs to the technical field of semiconductors, and particularly relates to a statistical process control method which can be used for monitoring whether the particle number is in a controlled state when the particle number in an ultra-clean room is excessive and zero.
Background
"statistical process control" is today one of the most popular and effective quality improvement methods. The statistical process control technology mainly refers to monitoring the quality characteristics of products in each stage, namely working procedures, in the production process by using a Huhart process control theory, namely a control chart, analyzing the trend of the quality characteristics according to the point distribution condition on the control chart, and taking preventive measures to ensure that the production process is in a statistical control state, thereby achieving the purposes of improving and ensuring the quality.
As chip density increases and the feature size of semiconductor devices decreases in semiconductor manufacturing, particle contamination has an increasing impact on device yield, performance, and reliability, and therefore, there is a need for close monitoring of airborne particles to ensure that airborne particles are in a controlled state. The number of particles in air has different diameters, the larger the diameter the greater the impact on device yield, performance and reliability, while certain particles with particularly small diameters have little impact on the device, and therefore, generally only particles with diameters larger than a certain value are of interest. The method comprises the following steps: the particle counter is used for measuring the number of particles with the particle diameter larger than a set value in the air, and then the control chart is used for monitoring. The c control map, which is the control map that is most easily conceivable when selecting the control map, is used on the premise that the particle count can better comply with the poisson distribution. In the case where the particle diameter of interest is relatively large or the environmental cleanliness is extremely high, the proportion of particles with a zero number is high, typically more than 50%, and this phenomenon is called the zero excess phenomenon. In this case the particle count does not follow the poisson distribution well, which would lead to excessive false alarms if the c-control map is still used. In addition, in practical application, the phenomenon that the Neyman model and the Gamma-Poisson model which are widely applied to describing the defect number cannot well describe the phenomenon that the particle number is excessive and zero is found, and if corresponding control charts are still used, early warning cannot be timely realized.
The prior art explains the zero-over phenomenon as a process that is so advanced that it reaches the "near-zero defect" level where defects only occasionally appear, and Rider (1962) defines this distribution as a zero-inflected distribution. Under the explanation, some zero-affected models such as ZIP, ZINB and GZIP are proposed, but the effect is not ideal when the control chart corresponding to the ZIP, ZINB and GZIP models is used for carrying out statistical process control in the monitoring of zero excess particle number.
Disclosure of Invention
The invention aims to provide a statistical process control method of the number of the excessive zero particles in the ultra-clean room aiming at the defects of the prior art, so as to accurately monitor the number of the excessive zero particles in the ultra-clean room and improve the yield, the performance and the reliability of the semiconductor device.
The technical scheme of the invention is realized as follows:
technical principle
Actual particle number X considered by the inventionASubject to a Poisson distribution, and the measured particle diameter set value corresponds to a counting threshold T, the measurement data X obtained by the particle counterB=max(XA-T,0),
The true particle number is assumed to be the poisson distribution obeying a mean value c:
Figure BDA0001785575950000021
from XB=max(XA-T,0) knowing:
Figure BDA0001785575950000022
p(XB=m)=p(XA=m+T),m=1,2,…
namely, it is
Figure BDA0001785575950000023
In the present invention, called XBThe obeyed distribution is threshold Poisson distribution, model parameters c and T are estimated according to sample data, and then a control chart is established according to the establishment principle of the control chart, so that the statistical process control of the number of the excessive zero particles in the ultra-clean room is completed.
Second, implementation scheme
According to the principle, the implementation steps of the invention comprise the following steps:
(1) collecting a sample: measuring the number of particles with the diameter larger than a set value in the air once every other time by using a particle number counter, wherein the obtained sample data at least comprises 90 non-zero data;
(2) obtaining sample data according to the step (1), and obtaining the sample probability p with the particle number of mmAnd sample probability mean
Figure BDA0001785575950000024
(3) Obtaining parameter estimation values of a real particle number mean value c and a threshold value T in a threshold Poisson distribution model by using an iterative method according to sample probabilities and sample probability mean values of different particle numbers:
3a) setting an initial value T of a count threshold T0=0;
3b) According to T0Obtaining the initial value c of the mean value c of the number of real particles0
Figure BDA0001785575950000031
Wherein the content of the first and second substances,
Figure BDA0001785575950000032
represents a degree of freedom of 2 (T)0+1) χ2P of distribution0A lower quantile;
3c) obtaining T by the following formula0And c0Corresponding theoretical probability value p of m particle number0m
Figure BDA0001785575950000033
3d) According to pmAnd p obtained in step 4c)0mObtaining an iteration point T0And c0Corresponding decision coefficient R2(T0,c0):
Figure BDA0001785575950000034
3e) Let T next iteration point T1=T0+1, according to T1Value, obtaining the corresponding next iteration point c of c1
Figure BDA0001785575950000035
Wherein the content of the first and second substances,
Figure BDA0001785575950000036
represents a degree of freedom of 2 (T)1+1) χ2P of distribution0A lower quantile;
3f) obtaining T by the following formula1And c1Corresponding theoretical probability value p of m particle number1m
Figure BDA0001785575950000037
3g) According to pmAnd p obtained in step 4f)1mCalculating an iteration point T1And c1Corresponding decision coefficient R2(T1,c1);
Figure BDA0001785575950000041
3h) R obtained in the above is2(T0,c0) And R2(T1,c1) And (3) comparison:
if R is2(T0,c0)≤R2(T1,c1) Then let T0=T1,R2(T0,c0)=R2(T1,c1) Returning to the step 3 e);
if R is2(T0,c0)>R2(T1,c1) Then, stopping iteration to obtain estimated values of c and T: t ═ T0,,c=c0
(4) From the estimated values of c and T, the upper control line UCL of the control map is obtained:
Figure BDA0001785575950000042
(5) drawing the upper control line obtained in the step (4) and the sample data acquired in the step (1) into a control chart according to a drawing method of a Huhart control chart;
(6) judging whether the particle number in the ultra-clean room is controlled according to the control chart obtained in the step (5):
if the data point falls below the upper control line, it indicates that the particle count in the ultraclean is controlled and production continues;
if the data point is above the upper control line, the particle number in the ultra-clean room is out of control, the production needs to be stopped, the out-of-control reason is searched, and corresponding measures are taken.
The invention has the following advantages:
1. distribution of over zero particles
Compared with the existing Poisson distribution, ZIP, GZIP, Neyman and Gamma-Poisson, the threshold Poisson distribution provided by the invention can better describe the distribution with excessive zero particle number.
2. Accurate parameter estimation
The parameter estimation method provided by the invention iterates according to the zero-occupation ratio to obtain the estimated value of the parameter, so that the parameter estimation is influenced little when abnormal points exist, namely certain measured values are extremely large, and the parameter estimation is more accurate.
Drawings
FIG. 1 is a flow chart of an implementation of the present invention;
fig. 2 is a control chart drawn according to the collected sample in the present invention.
Detailed Description
The invention will be further described with reference to the drawings, which take the number of particles collected in an ultra-clean room of an integrated circuit manufacturing company as an example.
Referring to fig. 1, the implementation steps of this example are as follows:
step 1: a sample is collected.
A Lasair II-100 particle counter is used for collecting the number of particles with the particle diameter larger than 0.5um in an ultra-clean room with the cleanliness of 100 grades, and data are collected once per minute. After 250 samples are continuously collected, the obtained zero data is 90, and the sample data is shown in table 1.
TABLE 1 sample data with zero excess particle count
Figure BDA0001785575950000051
Figure BDA0001785575950000061
Step 2: obtaining sample data according to the step (1), and obtaining the sample probability p with the particle number of mmAnd sample probability mean
Figure BDA0001785575950000071
2a) Counting the sample data in table 1 to obtain the sample data with the total number k of 250, the maximum value M of the particle number of 5 and the number k of the sample with the particle number of Mm
2b) Calculating the sample probability p of the number of particles mm
Figure BDA0001785575950000072
The calculation results of step 2b) above are shown in table 2:
TABLE 2 particle count statistics
Number of particles (m) 0 1 2 3 4 5
Number of samples km 160 49 27 11 2 1
Sample probability pm 0.640 0.196 0.108 0.044 0.008 0.004
2c) Obtaining mean values of sample probabilities of different particle counts from the data of Table 2
Figure BDA0001785575950000073
Figure BDA0001785575950000074
And step 3: sample probability and sample probability mean value according to different particle numbers in table 2
Figure BDA0001785575950000075
Obtaining the parameter estimation values of the mean value c of the number of real particles and the threshold T in the threshold Poisson distribution model by using an iterative method:
the specific implementation of this step is as follows:
3a) setting an initial value T of a count threshold T0=0;
3b) According to T0Obtaining the initial value c of the mean value c of the number of real particles0
Figure BDA0001785575950000076
Wherein the content of the first and second substances,
Figure BDA0001785575950000077
represents a degree of freedom of 2 (T)0+1) χ2P of distribution0A lower quantile;
3c) obtaining T by the following formula0And c0Corresponding theoretical probability value p of m particle number0m
Figure BDA0001785575950000081
3d) According to pmAnd p obtained in step 3c)0mObtaining an iteration point T0And c0Corresponding decision coefficient R2(T0,c0):
Figure BDA0001785575950000082
3e) Let T next iteration point T1=T0+1, according to T1Value of c, obtaining the next of the corresponding cIteration point c1
Figure BDA0001785575950000083
Wherein the content of the first and second substances,
Figure BDA0001785575950000084
represents a degree of freedom of 2 (T)1+1) χ2P of distribution0A lower quantile;
3f) obtaining T by the following formula1And c1Corresponding theoretical probability value p of m particle number1m
Figure BDA0001785575950000085
3g) According to pmAnd p obtained in step 3f)1mCalculating an iteration point T1And c1Corresponding decision coefficient R2(T1,c1);
Figure BDA0001785575950000086
3h) R obtained in the above is2(T0,c0) And R2(T1,c1) And (3) comparison:
if R is2(T0,c0)≤R2(T1,c1) Then let T0=T1,R2(T0,c0)=R2(T1,c1) Returning to the step 3 e);
if R is2(T0,c0)>R2(T1,c1) Then, stopping iteration to obtain estimated values of c and T: t ═ T0,,c=c0
T2 and c 2.1357 are calculated.
And 4, step 4: and calculating an upper control line of the control chart according to the result obtained in the step 3:
Figure BDA0001785575950000091
and 5: and drawing a control chart.
5a) Newly building a plane rectangular coordinate system A, and drawing the upper control line UCL obtained in the step (4) in the plane rectangular coordinate system A;
5b) and (3) marking the sample data obtained in the step (1) on a coordinate system A according to a measurement sequence, and then connecting the data points by using a broken line according to the measurement sequence to obtain a graph which is a control graph, as shown in the attached figure 2.
Step 6: and determining the production condition according to the particle number in the ultra-clean room.
By observing fig. 2, it is judged whether the number of particles in the ultra-clean room is controlled:
if the data point falls below the upper control line, indicating that the particle count in the ultraclean is controlled, production continues;
if the data point is above the upper control line, which indicates that the particle number in the ultra-clean room is out of control, the production is stopped, the reason for the out of control is searched, and corresponding measures are taken.
This example can be seen in fig. 2, all data points are below the upper control line, so the control chart is normal, indicating that the production process is controlled and production can continue.
The effect of the present invention can be illustrated by the sample data collected by 15 Lasair II-100 particle counters in a clean room of an IC manufacturing company:
sample data collected by 15 Lasair II-100 particle counters are shown in Table 3:
TABLE 3 sample data
Particle counter numbering Number k of samples having particle number mm
A-1 k0=1067,k1=73,k2=26,k3=11,k4=1
A-2 k0=880,k1=166,k2=87,k3=38,k4=1,k5=1,k10=1,k11=1
A-3 k0=793,k1=129,k2=84,k3=63,k4=3,k5=2,k6=2,k12=1
A-4 k0=959,k1=86,k2=24,k3=5
A-5 k0=620,k1=40,k2=17,k3=6,k4=1
A-6 k0=506,k1=84,k2=49,k3=40,k4=3,k5=1,k10=1
A-7 k0=588,k1=53,k2=19,k3=10
A-8 k0=500,k1=79,k2=54,k3=32,k4=3
A-9 k0=186,k1=65,k2=27,k3=17,k4=4,k5=0,k6=1,k7=1,k8=1,k9=1
A-10 k0=167,k1=28,k2=23,k3=9,k4=5,k5=1,k6=2,k7=2,k8=1,k10=2,k13=1,k21=1
A-11 k0=164,k1=36,k2=17,k3=7,k4=8,k5=2,k6=2,k7=1,k11=1,k30=1
A-12 k0=139,k1=45,k2=26,k3=7,k4=6,k5=4,k6=2,k9=1,k12=1,k17=1,k19=1,k20=1,k40=1
A-13 k0=136,k1=37,k2=25,k3=6,k4=5,k5=4,k6=1,k8=1,k9=1,k10=1,k13=1,k19=1
A-14 k0=137,k1=34,k2=19,k3=9,k4=6,k5=1,k10=1,k11=1,k12=1,k13=1,k26=1,k27=1,k51=1
A-15 k0=140,k1=37,k2=14,k3=5,k4=6,k5=1,k6=2,k8=3,k9=2,k10=1,k14=1
The data in table 3 should be compared and analyzed by using the threshold Poisson distribution provided by the invention and Poisson distribution in the prior art, namely ZIP, GZIP, Neyman and Gamma-Poisson, so as to prove that the threshold Poisson distribution provided by the invention is superior to other models.
The quality of the model can be evaluated through a judgment coefficient, the Chichi information content AIC and the Bayesian information content BIC: the closer the decision coefficient is to 1, the better the model is, the smaller the AIC, the better the model is, and the smaller the BIC, the better the model is.
The data in table 3 were analyzed to obtain the corresponding decision coefficients, AIC and BIC of each model, and the results are shown in tables 4, 5 and 6.
TABLE 4 decision coefficients for each model
Particle counter numbering Threshold Poisson distribution of the invention Poisson distribution ZIP GZIP(n=2) GZIP(n=3) Neyman Gamma-poisson
A-1 1.0000 0.9923 1.0000 0.9981 0.9981 1.0000 0.9996
A-2 0.9997 0.9451 0.8159 0.9872 0.9872 0.9995 0.9974
A-3 0.9986 0.8842 0.9983 0.9915 0.9915 0.9983 0.9895
A-4 1.0000 0.9957 1.0000 0.9962 0.9962 1.0000 0.9998
A-5 1.0000 0.9908 1.0000 0.9984 0.9984 1.0000 0.9995
A-6 0.9986 0.8891 0.9982 0.9908 0.9908 0.9981 0.9901
A-7 0.9999 0.9860 0.9999 0.9972 0.9972 0.9998 0.9992
A-8 0.9989 0.8945 0.9975 0.9929 0.9929 0.9930 0.9826
A-9 0.9974 0.8899 0.9510 0.9557 0.9565 0.9789 0.9986
A-10 0.9986 0.6552 0.8997 0.9916 0.9916 0.9145 0.9947
A-11 0.9981 0.7304 0.8354 0.9839 0.9839 0.8445 0.9713
A-12 0.9970 0.5814 0.5813 0.9681 0.9681 0.5948 0.8909
A-13 0.9971 0.7075 0.8094 0.9759 0.9759 0.8434 0.9833
A-14 0.9987 0.4642 0.6962 0.9832 0.9832 0.7010 0.9087
A-15 0.9954 0.7187 0.8747 0.9738 0.9738 0.8987 0.9939
Mean value of decision coefficient 0.9985 0.8217 0.8972 0.9856 0.9857 0.9176 0.9799
Standard deviation of decision coefficients 0.0014 0.1677 0.1294 0.0124 0.0123 0.1254 0.0337
As can be seen from table 4, the minimum value of the decision coefficient is 0.9954, which indicates that the threshold poisson distribution provided by the present invention can well describe real data, and meanwhile, the comparison with other models shows that the average value of the corresponding decision coefficient is the largest, the standard deviation is the smallest, which indicates that the threshold poisson distribution provided by the present invention is superior to other models.
TABLE 5 AIC for each model
Particle counter numbering Threshold Poisson distribution of the invention Poisson distribution ZIP GZIP(n=2) GZIP(n=3) Neyman Gamma-poisson
A-1 940.52 1052.63 938.83 970.96 974.96 942.42 945.82
A-2 1980.93 2168.48 1995.28 2048.08 2052.08 1985.57 1990.55
A-3 1976.83 2265.15 1972.02 2008.55 2012.55 1966.83 1999.53
A-4 894.16 941.80 893.12 1035.22 1039.22 893.89 897.10
A-5 547.96 624.44 549.10 642.25 646.25 549.58 554.70
A-6 1239.67 1413.71 1235.53 1292.95 1296.95 1233.83 1252.97
A-7 652.22 722.35 653.51 759.09 763.09 652.49 657.63
A-8 1157.24 1284.82 1142.76 1227.66 1231.66 1154.29 1175.62
A-9 717.01 783.01 742.95 744.89 734.57 717.65 725.88
A-10 624.09 868.03 800.50 587.26 591.26 723.99 577.80
A-11 628.90 818.86 984.22 599.38 594.57 883.96 563.83
A-12 953.53 1142.07 1788.36 683.51 687.51 1579.48 698.63
A-13 634.90 781.83 794.85 610.48 614.48 708.31 574.23
A-14 938.87 1224.97 2178.30 602.96 606.96 1986.25 609.39
A-15 608.18 731.71 673.38 587.86 591.86 616.77 518.49
As can be seen from table 5, the AIC corresponding to the threshold poisson distribution proposed by the present invention is smaller than that of other models in most cases, which can show that the threshold poisson distribution proposed by the present invention is superior to that of other models.
TABLE 6 BIC for each model
Particle counter numbering Threshold Poisson distribution of the invention Poisson distribution ZIP GZIP(n=2) GZIP(n=3) Neyman Gamma-poisson
A-1 950.67 1062.77 948.98 991.25 1005.39 952.57 955.96
A-2 1991.07 2178.62 2005.41 2068.35 2082.49 1995.71 2000.69
A-3 1986.79 2275.11 1981.98 2028.48 2042.44 1976.79 2009.49
A-4 904.12 951.76 903.07 1055.14 1069.10 903.85 907.06
A-5 557.02 633.49 558.16 660.37 673.42 558.64 563.75
A-6 1248.73 1422.77 1244.59 1311.06 1324.12 1242.89 1262.03
A-7 661.24 731.37 662.53 777.12 790.13 661.50 666.64
A-8 1166.25 1293.82 1151.77 1245.68 1258.69 1163.30 1184.63
A-9 724.44 790.44 750.38 759.75 756.85 725.08 733.30
A-10 631.07 875.01 807.48 601.22 612.19 730.96 584.78
A-11 635.85 825.81 991.17 613.29 615.43 890.91 570.78
A-12 960.45 1148.99 1795.28 697.35 708.27 1586.40 705.55
A-13 641.68 788.61 801.62 624.04 634.82 715.09 581.00
A-14 945.59 1231.70 2185.02 616.41 627.13 1992.98 616.11
A-15 614.89 738.42 680.10 601.28 612.00 623.48 525.20
As can be seen from table 6, the BIC corresponding to the threshold poisson distribution proposed by the present invention is smaller than that of other models in most cases, which indicates that the threshold poisson distribution proposed by the present invention is superior to that of other models.

Claims (3)

1. A statistical process control method for zero excess particle number in ultra-clean room is characterized by comprising the following steps:
(1) collecting a sample: measuring the number of particles with the diameter larger than a set value in the air once every other time by using a particle number counter, wherein the obtained sample data at least comprises 90 non-zero data;
(2) obtaining sample data according to the step (1), and obtaining the sample probability p with the particle number of mmAnd sample probability mean
Figure FDA0003167457630000015
(3) Obtaining parameter estimation values of a real particle number mean value c and a threshold value T in a threshold Poisson distribution model by using an iterative method according to sample probabilities and sample probability mean values of different particle numbers:
3a) setting an initial value T of a count threshold T0=0;
3b) According to T0Obtaining the initial value c of the mean value c of the number of real particles0
Figure FDA0003167457630000011
Wherein the content of the first and second substances,
Figure FDA0003167457630000012
represents a degree of freedom of 2 (T)0+1) χ2P of distribution0A lower quantile;
3c) obtaining T by the following formula0And c0Corresponding theoretical probability value p of m particle number0m
Figure FDA0003167457630000013
3d) According to pmAnd p obtained in step 3c)0mObtaining an iteration point T0And c0Corresponding decision coefficient R2(T0,c0):
Figure FDA0003167457630000014
3e) Let T next iteration point T1=T0+1, according to T1Value, obtaining the corresponding next iteration point c of c1
Figure FDA0003167457630000021
Wherein the content of the first and second substances,
Figure FDA0003167457630000022
represents a degree of freedom of 2 (T)1+1) χ2P of distribution0A lower quantile;
3f) obtaining T by the following formula1And c1Corresponding theoretical probability value p of m particle number1m
Figure FDA0003167457630000023
3g) According to pmAnd p obtained in step 3f)1mCalculating an iteration point T1And c1Corresponding decision coefficient R2(T1,c1);
Figure FDA0003167457630000024
3h) R obtained in the above is2(T0,c0) And R2(T1,c1) And (3) comparison:
if R is2(T0,c0)≤R2(T1,c1) Then let T0=T1,R2(T0,c0)=R2(T1,c1) Returning to the step 3 e);
if R is2(T0,c0)>R2(T1,c1) Then, stopping iteration to obtain estimated values of c and T: t ═ T0,c=c0
(4) From the estimated values of c and T, the upper control line UCL of the control map is obtained:
Figure FDA0003167457630000025
(5) drawing the upper control line obtained in the step (4) and the sample data acquired in the step (1) into a control chart according to a drawing method of a Huhart control chart;
(6) judging whether the particle number in the ultra-clean room is controlled according to the control chart obtained in the step (5):
if the data point falls below the upper control line, it indicates that the particle count in the ultraclean is controlled and production continues;
if the data point is above the upper control line, the particle number in the ultra-clean room is out of control, the production needs to be stopped, the out-of-control reason is searched, and corresponding measures are taken.
2. The method of claim 1, wherein step (2) is performed by:
2a) counting the sample data obtained in the step (1), recording the total number of the sample data as k, recording the maximum value of the sample data as M, and recording the number of the samples with the particle number of M as km,m=0,1,…,M;
2b) Calculating the sample probability p of the number of particles mm
Figure FDA0003167457630000031
2c) Obtaining mean values of sample probabilities of different particle counts
Figure FDA0003167457630000032
Figure FDA0003167457630000033
3. The method of claim 1, wherein step (5) is performed by:
5a) newly building a plane rectangular coordinate system A, and drawing the upper control line UCL obtained in the step (4) in the plane rectangular coordinate system A;
5b) and (3) marking the sample data obtained in the step (1) on a coordinate system A according to the measurement sequence, and then connecting the data points by using a broken line according to the measurement sequence.
CN201811013365.2A 2018-08-31 2018-08-31 Statistical process control method for zero excess particle number in ultra-clean room Active CN109272216B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201811013365.2A CN109272216B (en) 2018-08-31 2018-08-31 Statistical process control method for zero excess particle number in ultra-clean room

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811013365.2A CN109272216B (en) 2018-08-31 2018-08-31 Statistical process control method for zero excess particle number in ultra-clean room

Publications (2)

Publication Number Publication Date
CN109272216A CN109272216A (en) 2019-01-25
CN109272216B true CN109272216B (en) 2021-09-10

Family

ID=65155014

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811013365.2A Active CN109272216B (en) 2018-08-31 2018-08-31 Statistical process control method for zero excess particle number in ultra-clean room

Country Status (1)

Country Link
CN (1) CN109272216B (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1360339A (en) * 2000-08-21 2002-07-24 株式会社东芝 Method and device for searching flaw aggregation in mfg. semiconductor device, and program thereby
CN104159311A (en) * 2014-08-21 2014-11-19 哈尔滨工业大学 Method of united resource allocation of cognitive heterogeneous network based on convex optimization method
CN105676817A (en) * 2016-01-14 2016-06-15 西安电子科技大学 Statistical process control method of mean-standard deviation control charts of samples of different sizes
CN107340487A (en) * 2016-11-24 2017-11-10 北京确安科技股份有限公司 A kind of method checked test system and be in actual processing ability under stable state

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1360339A (en) * 2000-08-21 2002-07-24 株式会社东芝 Method and device for searching flaw aggregation in mfg. semiconductor device, and program thereby
CN104159311A (en) * 2014-08-21 2014-11-19 哈尔滨工业大学 Method of united resource allocation of cognitive heterogeneous network based on convex optimization method
CN105676817A (en) * 2016-01-14 2016-06-15 西安电子科技大学 Statistical process control method of mean-standard deviation control charts of samples of different sizes
CN107340487A (en) * 2016-11-24 2017-11-10 北京确安科技股份有限公司 A kind of method checked test system and be in actual processing ability under stable state

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Attribute control charts using generalized zero-inflated Poisson Distribution;Nan Chen,et al.;《Quality and Reliability Engineering international》;20080602;第24卷(第7期);第793-806页 *
CUSUM Charts for Monitoring a Zero-inflated Poisson Process;Shuguang He,et al.;《Quality and Reliability Engineering international》;20110622;第28卷(第2期);第181-192页 *

Also Published As

Publication number Publication date
CN109272216A (en) 2019-01-25

Similar Documents

Publication Publication Date Title
JP6285494B2 (en) Measurement sample extraction method with sampling rate determination mechanism and computer program product thereof
KR101799603B1 (en) Automatic fault detection and classification in a plasma processing system and methods thereof
TWI451336B (en) Method for screening samples for building prediction model and computer program product thereof
TW201301074A (en) Method of fault detection classification for semiconductor process and system structure thereby
CN113920096A (en) Method for detecting metal packaging defects of integrated circuit
CN111652518B (en) Method and apparatus for analyzing process data and computer readable medium
CN113994453A (en) Semiconductor device manufacturing system and semiconductor device manufacturing method
CN113918642A (en) Data filtering, monitoring and early warning method based on power Internet of things equipment
US20200233401A1 (en) Method of making semiconductor devices and a control system for performing the same
CN109272216B (en) Statistical process control method for zero excess particle number in ultra-clean room
CN114997256A (en) Method and device for detecting abnormal power of wind power plant and storage medium
TW201830334A (en) Diagnostic methods for the classifiers and the defects captured by optical tools
CN1279600C (en) Online quality detecting parametric analysis method
CN109308395B (en) Wafer-level space measurement parameter anomaly identification method based on LOF-KNN algorithm
CN108090635A (en) A kind of pavement performance Forecasting Methodology based on Cluster Classification
CN115905802A (en) Semiconductor wafer test yield analysis method based on thermodynamic diagram
CN106873365A (en) A kind of extrusioning blowing process optimization method of comprehensive quality target and equipment performance
US10146215B2 (en) Monitor system and method for semiconductor processes
TWI399660B (en) A method of detecting variance by regression model
CN109063218A (en) A kind of control method and system of statistic processes
CN105302036A (en) Method and system for monitoring process state running according to multiple process schemes
CN110849794B (en) Method for identifying and improving weather and climate simulation based on unactivated particles in CCN measurement
CN109446481A (en) A kind of lognormal type cell life estimation of distribution parameters method
WO2022052540A1 (en) Inspection method and inspection system for determining whether newly-added production tool is qualified
TWI262571B (en) Wafer yield detect method

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant