CN109267011A - The method of vacuum electron beam roll pressing plated film - Google Patents
The method of vacuum electron beam roll pressing plated film Download PDFInfo
- Publication number
- CN109267011A CN109267011A CN201811474633.0A CN201811474633A CN109267011A CN 109267011 A CN109267011 A CN 109267011A CN 201811474633 A CN201811474633 A CN 201811474633A CN 109267011 A CN109267011 A CN 109267011A
- Authority
- CN
- China
- Prior art keywords
- vacuum
- electron beam
- plated film
- chamber
- roll pressing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5886—Mechanical treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses the present invention relates to a kind of method of vacuum electronic roll pressing beam plated film, belong to coating technique field.The technical problem to be solved in the present invention is to provide a kind of methods of at low cost, pollution-free, high efficiency, high quality coating thick film, this method uses vacuum electron beam roll pressing plated film, it include: by Coating Materials merging vacuum electron beam in roller coating apparatus, base material temperature is heated to 400~1200 DEG C, beam power is set and is not less than 20KW, control electron beam furnace working chamber vacuum degree is 10~10~ 3Pa carries out plated film, and carries out roll pressing in coating process, and plated film is completed, and is cooled to no more than 300 DEG C, obtains plating film composite material.The method of the present invention is available, and coating film thickness is big, engaging force is big, corrosion resistant plating film composite material, has the characteristics that inexpensive, pollution-free, speed is fast and efficient.
Description
Technical field
The invention belongs to coating technique fields, and in particular to a kind of method of vacuum electron beam roll pressing plated film.
Background technique
Titanium is a kind of silvery white non-ferrous metal, it has many advantages, such as, and density is small, specific strength is high, corrosion-resistant, nontoxic, and belongs to life
Reason inert metal can be tied well with human contact without sensitization, carcinogenic, aberration inducing phenomenon with bone tissue, epithelium, connective tissue
It closes, but the metal material that biocompatibility is best.
But since there is also bigger difficulty for metallurgy and the material processing of titanium, cost is very high, so that Titanium is difficult in the people
It is widely applied with industrial.Currently, by a large amount of civilian and industrial environment resistant corrosion materials be various different models not
Become rusty steel.However in some places that environmental pollution is serious, even if such as etch resistant properties it is excellent 304 can get rusty.Especially curing
With stainless steel is also widely used as skeletal repair material, and biocompatibility and physiological-toxicity be not also highly desirable.In view of
This, stainless steel and Titanium progress is compound, upper one layer of Titanium is deposited in the surface of stainless steel as main body, it can by having
It is able to achieve " with steel for titanium ", titanium is made to obtain large-scale popularization on civilian, obtain better than the better etch resistant properties of general stainless steel；
And medical instrument, civil buildings, industrial products in terms of be applied.
However, the processing in iron, stainless steel surface at present is mainly electroplated or chemical plating.Chemical plating is mainly used in metal
Surface carries out anti-corrosion dyeing processing, and plating operation is simple, and majority can carry out at normal temperature, the disadvantage is that investment is big, generates big
Industrial wastewater is measured, it is seriously polluted, it is at high cost.Galvanization coating is thicker, and coated, Technical comparing maturation can be carried out on any substance,
The disadvantage is that investment is big, seriously polluted, at high cost, operating procedure is complicated.In addition electroplate factory's investment is big, and technical stability is poor, processing
Valuable product.
For overcome the problems, such as titanium iron-based material surface coating this, currently also use titanium steel complex method.It is cold including titanium steel
It rolls, hot rolling, titanium steel explosion welding connects, the methods of titanium steel electron beam welding.However, titanium steel rolling is difficult to compound, titanium steel explosion welding is connect
Quality is difficult to control, and titanium steel electron beam welding requires two kinds of materials extremely thick.
Therefore, developing a kind of advanced metal surface treatment technology substitution conventional plating process is trend of the times, will be
Thus titanium application extension frontier will also generate huge economic and social benefit.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of at low cost, pollution-free, high efficiency, high quality coating thick films
Method.
The technical proposal adopted by the invention to solve the above technical problems is that providing a kind of vacuum electron beam roll pressing
The method of plated film, method includes the following steps:
By Coating Materials merging vacuum electron beam in roller coating apparatus, base material temperature is heated to 400~1200
DEG C, setting beam power is not less than 20KW, and control electron beam furnace working chamber vacuum degree is 10~10~3Pa carries out plated film, and
Roll pressing is carried out in coating process, plated film is completed, is cooled to no more than 300 DEG C, obtains plating film composite material.
Wherein, in the method for vacuum electron beam roll pressing plated film described above, the electron beam furnace contains 1~3
Working chamber, it is each working chamber setting 1~2, electron gun, every 20~200KW of electron gun power.
Preferably, in the method for vacuum electron beam roll pressing plated film described above, the beam power be 20~
1200KW。
Wherein, described to heat base material temperature in the method for vacuum electron beam roll pressing plated film described above
To 400~1200 DEG C of mode are as follows: in vacuum electron beam to 1~4 vacuum chamber preposition in roller coating apparatus, each vacuum chamber
Room is arranged planar vacuum heating device and base material temperature is heated to 400~1200 DEG C by single-stage or Multi-stage heating.
Wherein, in the method for vacuum electron beam roll pressing plated film described above, the control electron beam furnace working chamber
Vacuum degree is 10~10~3The mode of Pa are as follows: vacuum electron beam to 2~8 vacuum chambers preposition in roller coating apparatus and/or
Planar vacuum device is arranged in 2~8 vacuum chambers of postposition, each vacuum chamber, by multi-stage vacuum, controls electron beam furnace work
Chamber vacuum degree is 10~10~3Pa。
Wherein, in the method for vacuum electron beam roll pressing plated film described above, the mode of the roll pressing are as follows:
Vacuum electron beam to 1~8 pair being arranged in postposition vacuum chamber in roller coating apparatus to roller, the pressure of each pair of pair of roller is 0.1~
20MPa carries out roll pressing.
Wherein, described to be cooled to no more than 300 DEG C in the method for vacuum electron beam roll pressing plated film described above
Mode are as follows: in vacuum electron beam to 2~4 vacuum chambers of postposition in roller coating apparatus, planar vacuum is arranged in each vacuum chamber
Water cooling plant, it is cooling by multistage, base material is cooled to no more than 300 DEG C.
Wherein, in the method for vacuum electron beam roll pressing plated film described above, the plating filmed metals be titanium, zirconium, hafnium,
Nickel, cobalt, chromium or vanadium.
Preferably, in the method for vacuum electron beam roll pressing plated film described above, the plating filmed metals are titanium.
Wherein, in the method for vacuum electron beam roll pressing plated film described above, the purity of the plating filmed metals is 98
~99.999%.
Wherein, in the method for vacuum electron beam roll pressing plated film described above, the base material is stainless steel, copper
Or aluminium.
Preferably, in the method for vacuum electron beam roll pressing plated film described above, the base material is stainless steel.
Wherein, in the method for vacuum electron beam roll pressing plated film described above, the mode of the plated film is using oblique
Mode is injected at angle.
Wherein, in the method for vacuum electron beam roll pressing plated film described above, the angle that the oblique angle is injected is 10
~40 degree.
Wherein, in the method for vacuum electron beam roll pressing plated film described above, the speed of the plated film is 5~
200m/min。
Wherein, in the method for vacuum electron beam roll pressing plated film described above, time of the plated film is 1~
100min。
Wherein, in the method for vacuum electron beam roll pressing plated film described above, the plated film of the plating film composite material
With a thickness of 0.01~200 μm.
In conjunction with above-mentioned vacuum electron beam roll pressing film plating process, present invention employs vacuum electron beams pair as shown in Figure 1
Roller coating apparatus comprising electron beam furnace 1, forvacuum room 2, hot donut 4, postposition vacuum chamber 3 and cooling vacuum room 5,
Forvacuum room 2 is connected to the input end in electron beam furnace 1, the connection of hot donut 4 forvacuum room 2 and electron beam furnace 1 it
Between, the connection of postposition vacuum chamber 3 is connected in the outlet end of electron beam furnace 1, cooling vacuum room 5 in postposition vacuum chamber 3 and electron beam furnace 1
Between.
It is provided in postposition vacuum chamber 3 and roller 7 suppresses workpiece 6, be rotatably connected to roller 7 by pivot structure
In postposition vacuum chamber 3, each pair of pair of roller 7 is made of upper and lower two pressure rollers, and the workpiece 6 after the completion of plated film is from the centre of two pressure rollers
Pass through, the pressure to roller 7 is 0.01~20MPa, is laminated the plated film on 6 surface of workpiece by the relative rotation to roller 7 and workpiece 6
Tightly, it flattens, to improve the conjugation of film plating layer and workpiece 6 and the surface smoothness of film plating layer.According to practical plated film needs,
1~8 pair can be set as to 7 quantity of roller, multiple pairs of rollers 7 are arranged in parallel.
When carrying out plated film work, workpiece 6 to be coated is first fed in forvacuum room 2, and forvacuum room 2 is by 2
The forvacuum chamber 21 of~8 connections forms, and is designed with planar vacuum device in each forvacuum chamber 21, passes through planar vacuum
Device realizes multi-stage vacuum；It is sent after the completion of 6 plated film of workpiece from postposition vacuum chamber 3, what postposition vacuum chamber 3 was connected to by 2~8
Postposition vacuum chamber 31 forms, and is designed with planar vacuum device in each postposition vacuum chamber 31, is realized by planar vacuum device more
Grade vacuum；It is 10~10-3Pa by the vacuum degree that forvacuum room 2 and postposition vacuum chamber 3 control electron beam furnace 1, can avoid plating
Membrane material is oxidized to oxide in air and loses metallicity, ensure that the performance of film plating layer.
When carrying out plated film work, the heating before plated film is carried out to workpiece 6 by hot donut 4, and by cooling true
Empty room 5 carries out the cooling after plated film to workpiece 6.The heating, vacuum chamber 41 that hot donut 4 is connected to by 1~4 forms, and heating is true
Planar vacuum heating device is equipped in cavity 41 to control the temperature of workpiece 6 by the single-stage or Multi-stage heating to workpiece 6
System, is heated to proper temperature for the temperature of workpiece 6, plating membrane efficiency can be improved, and step up film plating layer and the combination of workpiece 6 more
It is close, to improve the quality of film plating layer；The cooling vacuum chamber 51 that cooling vacuum room 5 is connected to by 2~4 forms, cooling vacuum chamber
Planar vacuum cooling device is equipped in 51, by carrying out multistage cooling to the workpiece 6 after the completion of plated film, to internal grain structure knot
Structure is adjusted, and further avoids film plating layer and is oxidized, while rapid cooling is conducive to workpiece 6 and takes out as early as possible, can effectively shorten
Plated film time.
The working chamber 11 that electron beam furnace 1 is connected to by 1~3 forms, and 1~2 is equipped in each working chamber 11 electron gun 12,
Coating Materials is heated using the electron beam that electron gun 12 issues, the surface of workpiece 6 is deposited on after evaporating Coating Materials
Form film plating layer.
Beneficial effects of the present invention:
The method of the present invention uses great-power electronic beam furnace, and using Multi-stage heating, multi-stage vacuum and multistage cooling control plating
Film condition reinforces the engaging force of composite material by roll pressing, can obtain that coating film thickness is big, engaging force is big, corrosion-resistant
Plating film composite material, coating film thickness reaches 0.01~200 μm；The method of the present invention have inexpensive, pollution-free, speed fastly,
High efficiency can plate the features such as object qualitative diversity, good film performance, be worthy of popularization.
Detailed description of the invention
Fig. 1 is schematic diagram of the vacuum electron beam of the invention used to roller coating apparatus.
In the figure, it is marked as 1- electron beam furnace, 11- working chamber, 12- electron gun, 2- forvacuum room, 21- forvacuum chamber,
3- postposition vacuum chamber, 31- postposition vacuum chamber, 4- hot donut, 41- heating, vacuum chamber, 5- cooling vacuum room, 51- are cooling true
Cavity, 6- workpiece, 7- are to roller.
Specific embodiment
Specifically, the method for vacuum electron beam roll pressing plated film, method includes the following steps:
By Coating Materials merging vacuum electron beam in roller coating apparatus, base material temperature is heated to 400~1200
DEG C, setting beam power is not less than 20KW, and control electron beam furnace working chamber vacuum degree is 10~10~3Pa carries out plated film, and
Roll pressing is carried out in coating process, plated film is completed, is cooled to no more than 300 DEG C, obtains plating film composite material.
Electron beam furnace is divided into 1~3 working chamber in the method for the present invention, and each working chamber is arranged 1~2, electron gun, every
20~200KW of electron gun power；Every that electron gun can be switched in plated film, control beam power is (every electron gun
Power adduction is beam power), therefore the present invention can control beam power in 20~1200KW, thus to a variety of bases
Bottom material carries out plated film using multiple coating films metal, has wide range of applications.
In the method for the present invention, in vacuum electron beam to 1~4 vacuum chamber preposition in roller coating apparatus, each vacuum chamber
Room is arranged planar vacuum heating device and base material temperature is heated to 400~1200 DEG C by single-stage or Multi-stage heating,；It adopts
With single-stage or Multi-stage heating, convenient for control base material temperature, and base material is heated to proper temperature, film plating layer can be made to combine
It is closer.
In the method for the present invention, vacuum electron beam to 2~8 vacuum chambers preposition in roller coating apparatus and/or postposition 2~
Planar vacuum device is arranged in 8 vacuum chambers, each vacuum chamber, by multi-stage vacuum, controls electron beam furnace working chamber vacuum
Degree is 10~10-3Pa avoids the plating filmed metals such as titanium, zirconium from, at oxide, losing metallicity in air oxidation.
In the method for the present invention, in vacuum electron beam to 1~8 pair being arranged in postposition vacuum chamber in roller coating apparatus to roller,
The pressure of each pair of pair of roller is 0.01~20MPa, carries out roll pressing, can flatten base band, increase the flatness of composite material；It is right
Roller may be provided in the vacuum chamber of the multi-stage vacuum of postposition, can also an individually designed vacuum chamber.
In the method for the present invention, in vacuum electron beam to 2~4 vacuum chambers of postposition, each vacuum chamber in roller coating apparatus
Planar vacuum water cooling plant is arranged in room, cooling by multistage, and base material is cooled to no more than 300 DEG C；It is cooling using multistage,
Be conducive to adjust material internal grain structure structure, carry out that plated film is avoided to aoxidize, while rapid cooling is conducive to product and takes as early as possible
Out, it shortens working hours.
The multiple coating films such as titanium, zirconium, hafnium, nickel, cobalt, chromium or vanadium gold can be used by the screening to each parameter in the method for the present invention
Belong to and carry out plated film, the purity of plating filmed metals is 98~99.999%；And it can be for a variety of base materials such as stainless steel, copper or aluminium
To carry out plated film, base material can be the forms such as piece, volume, band.
In the method for the present invention when plated film, mode is injected using 10~40 degree of oblique angles, facilitating whole beat of electron beam is needing
It wants on the material of plated film, improves plating membrane efficiency.
The method of the present invention uses great-power electronic beam furnace, and base material temperature is heated to 400~1200 DEG C, makes electron beam
Power is not less than 20KW, and controlling electron beam furnace working chamber vacuum degree by multi-stage vacuum is 10~10-3Pa carries out plated film, plated film
Speed is 5~200m/min, and plated film is high-efficient；And roll pressing is carried out in coating process, after the completion of plated film, then pass through multistage
It is cooled to and is no more than 300 DEG C, so that plated film is had the characteristics that thickness is big, engaging force is big, corrosion resistant, plate the plating of film composite material
Film thickness reaches 0.01~200 μm.
Preferably, a kind of method of vacuum electron beam roll pressing plated film, method includes the following steps:
By Coating Materials merging vacuum electron beam in roller coating apparatus, in vacuum electron beam to preposition in roller coating apparatus
1~4 vacuum chamber, planar vacuum heating device is arranged in each vacuum chamber, by single-stage or Multi-stage heating, by base material
Temperature is heated to 400~1200 DEG C, and setting beam power is 20KW~1200KW, in vacuum electron beam in roller coating apparatus
2~8 vacuum chambers of preposition 2~8 vacuum chambers and/or postposition, planar vacuum device is arranged in each vacuum chamber, by more
Grade vacuum, control electron beam furnace working chamber vacuum degree are 10~10~3Pa, control coating speed are that 5~200m/min is plated
Film, in vacuum electron beam to 1~8 pair is arranged in roller coating apparatus postposition vacuum chamber to roller, the pressure that each pair of pair of roller is arranged is
0.1~20MPa, carries out roll pressing in coating process, after the completion of plated film, in vacuum electron beam to postposition in roller coating apparatus
Planar vacuum water cooling plant is arranged in 2~4 vacuum chambers, each vacuum chamber, cooling by multistage, is cooled to no more than 300
DEG C, obtain the plating film composite material that coating film thickness is 0.01~200 μm.
Below by embodiment, invention is further described in detail, but does not therefore limit the scope of the present invention
Among the embodiment described range.
Embodiment 1
The vacuum electron beam of the present embodiment is in roller coating apparatus:
Electron beam furnace contains 1 working chamber, and each working chamber is arranged 2, electron gun；
In vacuum electron beam to 3 vacuum chambers preposition in roller coating apparatus, each vacuum chamber setting planar vacuum adds
Thermal carries out Multi-stage heating；
In vacuum electron beam to preposition in roller coating apparatus or 3 vacuum chambers of postposition, plate is arranged in each vacuum chamber
Vacuum plant carries out multi-stage vacuum；
In vacuum electron beam to 2 pairs are arranged in postposition vacuum chamber in roller coating apparatus to roller, first pair is arranged pressure to roller
Force parameter is 0.05MPa, and second pair is 0.1MPa to roller setting pressure parameter, carries out multistage roll pressing；
In vacuum electron beam to 3 vacuum chambers of postposition in roller coating apparatus, each vacuum chamber setting planar vacuum is cold
But device carries out multistage cooling；
The method of the present embodiment vacuum electron beam roll pressing plated film the following steps are included:
TA1 Titanium board is placed in electron beam furnace, using 304 stainless steel substrates as substrate, by Multi-stage heating, makes electron beam furnace
Base material temperature reaches 600 DEG C, and it is 60KW (i.e. beam power is 120KW) that every power electron gun, which is arranged, by more
Grade vacuum makes electron beam furnace working chamber vacuum degree reach 2 × 10~2Pa, control coating speed be 12m/min, plated film 2min, and
Multistage roll pressing is carried out in coating process, reinforces the engaging force of titanium steel composite board, plated film is completed, and it is cooling by multistage, make
Electron beam furnace base material temperature drops to 200 DEG C, and the titanium film thickness of acquisition is up to 62 microns of thick titanium film iron base composite material 24m.
Embodiment 2
The vacuum electron beam of the present embodiment is in roller coating apparatus:
Electron beam furnace contains 1 working chamber, and working chamber is arranged 2, electron gun；
In vacuum electron beam to 4 vacuum chambers preposition in roller coating apparatus, each vacuum chamber setting planar vacuum adds
Thermal carries out Multi-stage heating；
In vacuum electron beam to preposition in roller coating apparatus or 3 vacuum chambers of postposition, plate is arranged in each vacuum chamber
Vacuum plant carries out multi-stage vacuum；
In vacuum electron beam to 4 pairs being arranged in postposition vacuum chamber in roller coating apparatus to roller, first pair is arranged roller and presses
Force parameter is 0.1MPa, and second pair is 0.2MPa to roller setting pressure parameter, and third is 0.5MPa to pressure parameter is arranged to roller,
4th pair is 1MPa to roller setting pressure parameter, carries out multistage roll pressing；
In vacuum electron beam to 3 vacuum chambers built in roller coating apparatus, planar vacuum water cooling is arranged in each vacuum chamber
Device carries out multistage cooling；
The method of the present embodiment vacuum electron beam roll pressing plated film the following steps are included:
TA1 Titanium board is placed in electron beam furnace, using 304 stainless steel substrates as substrate, by Multi-stage heating, makes electron beam furnace
Base material temperature reaches 500 DEG C, and being arranged every electron gun power is 50KW (i.e. beam power is 100KW), passes through multistage
Vacuum makes electron beam furnace working chamber vacuum degree reach 2 × 10~2Pa, control coating speed is 20m/min, plated film 1min, and is being plated
Roll pressing is carried out in membrane process, reinforces the engaging force of titanium steel composite board, plated film is completed, and it is cooling by multistage, make electron beam
Furnace foundation bottom material temperature is dropped to 280 DEG C, and the titanium film thickness of acquisition is up to 42 microns of thick titanium film iron base composite material 20m.
Embodiment 3
The vacuum electron beam of the present embodiment is in roller coating apparatus:
Electron beam furnace contains 1 working chamber, and working chamber is arranged 2, electron gun；
In vacuum electron beam to 3 vacuum chambers preposition in roller coating apparatus, each vacuum chamber setting planar vacuum adds
Thermal carries out Multi-stage heating；
In vacuum electron beam to preposition in roller coating apparatus or 3 vacuum chambers of postposition, plate is arranged in each vacuum chamber
Vacuum plant carries out multi-stage vacuum；
In vacuum electron beam to 3 pairs are arranged in postposition vacuum chamber in roller coating apparatus to roller, first pair is arranged pressure to roller
Force parameter is 1MPa, and second pair is 2MPa to roller setting pressure parameter, and third carries out more to being 3MPa to roller setting pressure parameter
Grade roll pressing；
In vacuum electron beam to 3 vacuum chambers of postposition in roller coating apparatus, each vacuum chamber setting planar vacuum is cold
But device carries out multistage cooling；
The method of the present embodiment vacuum electron beam roll pressing plated film the following steps are included:
TA1 Titanium board merging electron beam furnace, by Multi-stage heating, is made into electron beam furnace foundation using 304 stainless steel substrates as substrate
Bottom material temperature reaches 600 DEG C, and being arranged every electron gun power be 90KW (i.e. beam power is 180KW), very by multistage
Sky makes electron beam furnace working chamber vacuum degree reach 6 × 10~2Pa, control coating speed are 8m/min, plated film 1min, and in plated film
Roll pressing is carried out in the process, reinforces the engaging force of titanium steel composite board, plated film is completed, and it is cooling by multistage, make electron beam furnace
Base material temperature drops to 200 DEG C, and the titanium film thickness of acquisition is up to 98 microns of thick titanium film iron base composite material 8m.
Embodiment 4
The vacuum electron beam of the present embodiment is in roller coating apparatus:
Electron beam furnace contains 1 working chamber, and working chamber is arranged 2, electron gun；
In vacuum electron beam to 3 vacuum chambers preposition in roller coating apparatus, vacuum chamber is arranged planar vacuum and heats dress
It sets, carries out Multi-stage heating；
In vacuum electron beam to 3 vacuum chambers preposition in roller coating apparatus, each vacuum chamber setting planar vacuum is filled
It sets, carries out multi-stage vacuum；
In vacuum electron beam to 3 pairs are arranged in postposition vacuum chamber in roller coating apparatus to roller, first pair is arranged pressure to roller
Force parameter is 2MPa, and second pair of roller setting pressure parameter is 5MPa, and third carries out multistage to being 8MPa to roller setting pressure parameter
Roll pressing；
In vacuum electron beam to 3 vacuum chambers of postposition in roller coating apparatus, planar vacuum water is arranged in each vacuum chamber
Device for cooling carries out multistage cooling；
The method of the present embodiment vacuum electron beam roll pressing plated film the following steps are included:
TA1 Titanium board merging electron beam furnace, by Multi-stage heating, is made into electron beam furnace foundation using 304 stainless steel substrates as substrate
Bottom material temperature reaches 600 DEG C, and being arranged every electron gun power is 60KW (beam power 120KW), passes through multi-stage vacuum
Electron beam furnace working chamber vacuum degree is set to reach 6 × 10~2Pa, control coating speed are 15m/min, plated film 1min, and in plated film mistake
Roll pressing is carried out in journey, reinforces the engaging force of titanium steel composite board, plated film is completed, and it is cooling by multistage, make electron beam furnace foundation
Bottom material temperature drops to 200 DEG C, and the titanium film thickness of acquisition is up to 52 microns of thick titanium film iron base composite material 15m.
Claims (10)
1. the method for vacuum electron beam roll pressing plated film, it is characterised in that: the following steps are included:
By Coating Materials merging vacuum electron beam in roller coating apparatus, base material temperature is heated to 400~1200 DEG C, if
Beam power is set not less than 20KW, control electron beam furnace working chamber vacuum degree is 10~10~3Pa carries out plated film, and in plated film
Roll pressing is carried out in the process, and plated film is completed, is cooled to no more than 300 DEG C, obtains plating film composite material.
2. the method for vacuum electron beam roll pressing plated film according to claim 1, it is characterised in that: the electron beam furnace
Containing 1~3 working chamber, working chamber is arranged 1~2, electron gun, and every electron gun power is 20~200KW.
3. the method for vacuum electron beam roll pressing plated film according to claim 1 or 2, it is characterised in that: the electronics
Beam power is 20~1200KW.
4. the method for vacuum electron beam roll pressing plated film according to claim 1, it is characterised in that: described by substrate material
Material temperature degree is heated to 400~1200 DEG C of mode are as follows: in vacuum electron beam to 1~4 vacuum chamber preposition in roller coating apparatus,
Planar vacuum heating device is arranged in each vacuum chamber, by single-stage or Multi-stage heating, base material temperature is heated to 400~
1200℃。
5. the method for vacuum electron beam roll pressing plated film according to claim 1, it is characterised in that: the control electronics
Beam furnace working chamber vacuum degree is 10~10~3The mode of Pa are as follows: in vacuum electron beam to 2~8 vacuum preposition in roller coating apparatus
Planar vacuum device is arranged in 2~8 vacuum chambers of chamber and/or postposition, each vacuum chamber, passes through multi-stage vacuum, control electricity
Beamlet furnace working chamber vacuum degree is 10~10~3Pa。
6. the method for vacuum electron beam roll pressing plated film according to claim 1, it is characterised in that: the roll pressing
Mode are as follows: vacuum electron beam in postposition vacuum chamber in roller coating apparatus be arranged 1~8 pair to roller, the pressure of each pair of pair of roller
Power is 0.1~20MPa, carries out roll pressing.
7. the method for vacuum electron beam roll pressing plated film according to claim 1, it is characterised in that: described to be cooled to not
Mode more than 300 DEG C are as follows: 2~8 vacuum chambers of postposition, each vacuum chamber in roller coating apparatus are set in vacuum electron beam
Horizontalization plate vacuum water cooling plant, it is cooling by multistage, it is cooled to no more than 300 DEG C.
8. the method for vacuum electron beam roll pressing plated film according to claim 1, it is characterised in that: the Coating Materials
For titanium, zirconium, hafnium, nickel, cobalt, chromium or vanadium；The purity of the plating filmed metals is 98~99.999%；The base material is stainless
Steel, copper or aluminium.
9. the method for vacuum electron beam roll pressing plated film according to claim 1, it is characterised in that: at least meet following
One:
The mode of the plated film is to inject mode using oblique angle；The angle that the oblique angle is injected is 10~40 degree；
The speed of the plated film is 5~200m/min, and the time is 1~100min；
The coating film thickness of the plating film composite material is 0.01~200 μm.
10. the method for described in any item vacuum electron beam roll pressing plated films according to claim 1~9, it is characterised in that: institute
Stating vacuum electron beam includes electron beam furnace (1), forvacuum room (2), postposition vacuum chamber (3), heating, vacuum to roller coating apparatus
Room (4) and cooling vacuum room (5), input end of forvacuum room (2) connection in electron beam furnace (1), postposition vacuum chamber (3)
Connection is connected between forvacuum room (2) and electron beam furnace (1) in the outlet end of electron beam furnace (1), hot donut (4),
Cooling vacuum room (5) is connected between postposition vacuum chamber (3) and electron beam furnace (1)；The electron beam furnace (1) is connected to by 1~3
Working chamber (11) composition, 1~2 is equipped in each working chamber (11) electron gun (12)；The forvacuum room (2) is by 2~8
The forvacuum chamber (21) of a connection forms, and the postposition vacuum chamber (31) that the postposition vacuum chamber (3) is connected to by 2~8 forms,
Planar vacuum device is designed in the forvacuum chamber (21) and postposition vacuum chamber (31)；It can in the postposition vacuum chamber (3)
1~8 pair of rotation setting, to roller (7), is arranged in parallel in postposition vacuum chamber (3) roller (7), the workpiece (6) after plated film is to roller
(7) intermediate to pass through；The heating, vacuum chamber (41) that the hot donut (4) is connected to by 1~4 forms, the heating, vacuum chamber
(41) planar vacuum heating device is equipped in；The cooling vacuum chamber (51) that the cooling vacuum room (5) is connected to by 2~4 forms,
Planar vacuum water cooling plant is equipped in the cooling vacuum chamber (51).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811474633.0A CN109267011A (en) | 2018-12-04 | 2018-12-04 | The method of vacuum electron beam roll pressing plated film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811474633.0A CN109267011A (en) | 2018-12-04 | 2018-12-04 | The method of vacuum electron beam roll pressing plated film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109267011A true CN109267011A (en) | 2019-01-25 |
Family
ID=65186260
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811474633.0A Pending CN109267011A (en) | 2018-12-04 | 2018-12-04 | The method of vacuum electron beam roll pressing plated film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109267011A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101649448A (en) * | 2009-08-26 | 2010-02-17 | 兰州大成自动化工程有限公司 | Continuous surface vacuum coater of metal sheet strip |
| CN201648512U (en) * | 2010-03-24 | 2010-11-24 | 深圳森丰真空镀膜有限公司 | Continuous vacuum coating device |
| CN104651792A (en) * | 2015-03-09 | 2015-05-27 | 常州工学院 | Single-sided continuous winding magnetron sputtering coating automatic production line for flexible substrate |
| CN104694903A (en) * | 2014-02-26 | 2015-06-10 | 陈庆丰 | Continuous physical vacuum coating equipment |
| CN204955637U (en) * | 2015-08-13 | 2016-01-13 | 盐城日兴企画塑业有限公司 | Static complex film preparation machine is prevented to ageing resistance |
-
2018
- 2018-12-04 CN CN201811474633.0A patent/CN109267011A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101649448A (en) * | 2009-08-26 | 2010-02-17 | 兰州大成自动化工程有限公司 | Continuous surface vacuum coater of metal sheet strip |
| CN201648512U (en) * | 2010-03-24 | 2010-11-24 | 深圳森丰真空镀膜有限公司 | Continuous vacuum coating device |
| CN104694903A (en) * | 2014-02-26 | 2015-06-10 | 陈庆丰 | Continuous physical vacuum coating equipment |
| CN104651792A (en) * | 2015-03-09 | 2015-05-27 | 常州工学院 | Single-sided continuous winding magnetron sputtering coating automatic production line for flexible substrate |
| CN204955637U (en) * | 2015-08-13 | 2016-01-13 | 盐城日兴企画塑业有限公司 | Static complex film preparation machine is prevented to ageing resistance |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10737311B1 (en) | Integrated method for forming and performance control of NiAl alloy thin-walled tubular parts | |
| CN106710767B (en) | The corrosion-resistant more coating neodymium iron borons of one kind and preparation process | |
| CN109295417A (en) | The method of serialization vacuum electron beam plated film | |
| CN105734507B (en) | Form a film uniform fine grain nickel alloy rotary target material and its hot extrusion optimization preparation method | |
| CN103071793B (en) | Molybdenum sputtering target material hot isostatic pressure production method | |
| CN102251234B (en) | Method for preparing Al2O3 coated hard alloy based on sol-gel method | |
| CN110170527B (en) | Preparation method of high-niobium porous layered titanium-aluminum alloy plate | |
| CN110512110A (en) | A kind of high-strength titanium alloy-graphene composite material and preparation method thereof | |
| CN103540931A (en) | Method and device for alloying composite processing of laser surface through mechanical vibration assisted induction heating | |
| CN112981320A (en) | Titanium alloy surface composite coating and preparation method thereof | |
| CN106835132A (en) | A kind of preparation method of double-layer high-strength corrosion resistant iron base amorphous composite coating | |
| CN110239194B (en) | Preparation method of high Nb-TiAl alloy material | |
| CN109267011A (en) | The method of vacuum electron beam roll pressing plated film | |
| CN110421004B (en) | Preparation method of aluminum oxide dispersion strengthened copper large plate belt material | |
| CN105779999B (en) | Material for high-mechanical-strength parts | |
| CN113523240A (en) | Bimetal composite board and preparation method thereof | |
| CN105506567B (en) | For the pack alloy shell aluminium base tie coat preparation method of follow-up anodized | |
| CN106920977A (en) | ITO/Nb composite modified metal double polar plates of polymer electrolyte film fuel cell and preparation method thereof | |
| CN1730440A (en) | Micrometer, nanometer (SiC)P surface entirely-cladding technology | |
| CN109267017A (en) | The method of vacuum electron beam plated film | |
| CN100355528C (en) | High-precision tungsten piece preparation method | |
| CN206692709U (en) | A kind of Powder Diffusion continuously prepares the device of high-silicon steel thin strip | |
| CN110538872B (en) | Production method of industrial pure titanium plate | |
| CN108085526A (en) | A kind of low-density niobium based composites and preparation method | |
| CN111500988A (en) | Hard nitride film and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190125 |