CN109254476A - A kind of optical projection method, method for sensing and object dimensional information application method - Google Patents
A kind of optical projection method, method for sensing and object dimensional information application method Download PDFInfo
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- CN109254476A CN109254476A CN201811047027.0A CN201811047027A CN109254476A CN 109254476 A CN109254476 A CN 109254476A CN 201811047027 A CN201811047027 A CN 201811047027A CN 109254476 A CN109254476 A CN 109254476A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B15/00—Special procedures for taking photographs; Apparatus therefor
- G03B15/02—Illuminating scene
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V10/00—Arrangements for image or video recognition or understanding
- G06V10/10—Image acquisition
- G06V10/12—Details of acquisition arrangements; Constructional details thereof
- G06V10/14—Optical characteristics of the device performing the acquisition or on the illumination arrangements
- G06V10/147—Details of sensors, e.g. sensor lenses
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Abstract
The application is suitable for optics and electronic technology field, and optical projection method is used to project the default light pattern for sensing on a measured target object, and the optical projection method includes the following steps: to issue the light beam for sensing along first direction；The projecting direction of the light beam is changed into the second direction different from first direction by first direction；And the light field of the light beam is subjected to rearrangement, to form the pattern beam that can project predetermined pattern on measured target object.The application also provides a kind of method for sensing sensed based on the predetermined pattern projected and the object dimensional information application method based on acquired measured target object three-dimensional information.
Description
Technical field
The application belongs to optical technical field more particularly to a kind of optical projection method, method for sensing and object dimensional letter
Cease application method.
Background technique
Existing three-dimensional (Three Dimensional, 3D) sensing system is because being necessary to ensure that enough projection light paths are usual
It can be made that comparison is thick, not meet the designer trends of current electronic device slimming.And if pressed to meet slimming design
It will affect it if the inside light path of contracting 3D sensing system again and sense effect.
Summary of the invention
Technical problems to be solved in this application are to provide a kind of optical projection method, method for sensing and object dimensional letter
Application method is ceased, slimming design requirement can be met under the premise of keeping enough light paths.
The application embodiment provides a kind of optical projection method, is used on a measured target object project for feeling
The default light pattern surveyed, the optical projection method include the following steps: to issue the light beam for sensing along first direction；By institute
The projecting direction for stating light beam is changed into the second direction different from first direction by first direction；And by the light field of the light beam into
Row rearrangement, to form the pattern beam that can project predetermined pattern on measured target object.
In some embodiments, the light field by light beam carry out rearrangement be prior to or subsequent to it is described by the light beam
Projecting direction the second direction different from first direction is changed by first direction.
In some embodiments, the optical projection method further comprises step:
Light beam is collimated；Or/and
Light beam is expanded.
In some embodiments, it is described to light beam collimated prior to or/and after in the projection by the light beam
The second direction different from first direction is changed into direction by first direction.
In some embodiments, described collimated to light beam carries out rearrangement prior to the light field by light beam.
In some embodiments, the adjustment light beam make its meet preset aperture require prior to or/and after in described
The projecting direction of the light beam is changed into the second direction different from first direction by first direction.
In some embodiments, the adjustment light beam makes it meet preset aperture requirement prior to the light by light beam
Field carries out rearrangement.
In some embodiments, the first direction is vertical with second direction.
In some embodiments, the light beam changes projecting direction by optical module.The optical module includes
Reflecting surface, the method that reflecting material is arranged using total reflection principle or on the reflecting surface will be reflected along the light beam of first direction
To projecting in a second direction.
In some embodiments, the optical module includes optical path-deflecting portion, and the optical path-deflecting portion includes described anti-
Face, incident side surface and light emission side surface are penetrated, light beam enters the optical path-deflecting portion from the incident side surface, and described
It is transmitted in optical path-deflecting portion along first direction, after total reflection occurs when being transferred to the reflecting surface or is reflected by reflecting material
It transmits in a second direction.
In some embodiments, the optical path-deflecting portion is Dove prism or prism.
In some embodiments, the light beam is by having optical alignment in optical module and/or expanding the light of function
Structure or optical element are learned to modulate dispersion angle and aperture.
In some embodiments, the light beam is infrared or near infrared light, and wave-length coverage is 750nm to 1650nm.
In some embodiments, the hair that the light source of the light beam forms for the luminescence unit of multiple irregular distributions is issued
The light field of optical arrays, the light beam carries out rearrangement by the optical microstructures being correspondingly arranged on substrate, and the optics is micro-
The light beam group that the luminescence unit that structure replication goes out multiple irregular distributions issues can be in measured target object upslide to be formed
Project the pattern beam of irregular distribution pattern.
In some embodiments, the light source for issuing the light beam is the area source or multiple evenly arranged of uniformly light-emitting
The light field of light emitting array composed by luminescence unit, the light beam carries out weight by the optical microstructures being correspondingly arranged on substrate
The formation of uniform light field rearrangement can be projected irregular distribution by new arrangement, the optical microstructures on measured target object
The pattern beam of pattern.
In some embodiments, the light source for issuing the light beam is hair composed by multiple evenly arranged luminescence units
The light field of optical arrays, the light beam carries out rearrangement by the optical microstructures being correspondingly arranged on substrate, and the optics is micro-
The light field of the luminescence unit arranged along stripe direction is mutually merged the candy strip arranged with formation rule by structure.
In some embodiments, the light source for issuing the original beam includes emitting for projecting the first of flood beam
Portion and the second emission part for projecting pattern beam, first emission part are area source or equally distributed multiple luminous lists
Element array, second emission part are the multiple array of light emitting cells being randomly distributed or equally distributed multiple luminescence unit battle arrays
The light field of column, the light beam carries out rearrangement, corresponding first hair by the optical microstructures being correspondingly arranged on substrate
The optical path setting for penetrating the issued light beam in portion has light intensity of the optical microstructures of diffusion optical effect to issue the first emission part
Uniform light beam is further diffused as the flood beam for the uniform light intensity that dispersion angle more extensively has, corresponding second emission part
What there are the optical microstructures of diffraction, refraction or reflex to be issued the second emission part for the optical path setting of issued light beam
Light beam forms the pattern beam that can project predetermined pattern.
In some embodiments, the light field of the light beam passes through the optical microstructures that are formed directly on the reflecting surface
Carry out rearrangement.
In some embodiments, the optical microstructures are selected from diffraction optics lines, microlens array, grating and its group
It closes.
The application embodiment also provides a kind of method for sensing, for sensing the spatial information of measured target object, the sense
Survey method includes the following steps: such as the step of aforementioned optical projecting method；Obtain the predetermined pattern being incident upon on measured target object
Light image；The light image for analyzing the predetermined pattern obtains the three-dimensional information of measured target object；And according to obtained tested
Three-dimensional information on object in the predetermined pattern coverage area at each position builds up the threedimensional model of measured target object.
The application embodiment also provides a kind of object dimensional information application method, and this method comprises the following steps: as before
The step of stating method for sensing；And corresponding function is executed according to the threedimensional model of constructed measured target object.
In some embodiments, performed function includes the threedimensional model according to measured target object to measured target object
Identity identified；Or after being adjusted according to the threedimensional model real-time display measured target object of constructed measured target object
3-D effect；Or body feeling interaction is realized according to the threedimensional model of constructed measured target object；Or according to constructed visual field
Three-dimensional scene models in range judge the subsequent operation of equipment by machine learning techniques.
Optical projection method provided by the application embodiment, method for sensing and object dimensional information application method pass through
Projecting light path is carried out partially deflected to reduce object dimensional information sensing optical system along the thickness of projecting direction, is conducive to make
With the slimming design of the various equipment of the optical system.
The additional aspect and advantage of the application embodiment will be set forth in part in the description, partially will be from following
Become obvious in description, or is recognized by the practice of the application embodiment.
Detailed description of the invention
Fig. 1 is the structural schematic diagram for the optical module that the application first embodiment provides.
Fig. 2 is the structural schematic diagram for the optical module that the application second embodiment provides.
Fig. 3 is the structural schematic diagram for the optical module that the application third embodiment provides.
Fig. 4 is the structural schematic diagram for the optical module that the 4th embodiment of the application provides.
Fig. 5 is the structural schematic diagram for the optical module that the 5th embodiment of the application provides.
Fig. 6 is the structural schematic diagram for the optical module that the application sixth embodiment provides.
Fig. 7 is the structural schematic diagram for the optical module that the 7th embodiment of the application provides.
Fig. 8 is the structural schematic diagram for the optical module that the 8th embodiment of the application provides.
Fig. 9 is the structural schematic diagram for the optical module that the 9th embodiment of the application provides.
Figure 10 is the structural schematic diagram for the optical projection mould group that the tenth embodiment of the application provides.
Figure 11 is the structural schematic diagram for the optical projection mould group that the 11st embodiment of the application provides.
Figure 12 is the structural schematic diagram for the optical projection mould group that the 12nd embodiment of the application provides.
Figure 13 is the structural schematic diagram for the optical projection mould group that the 13rd embodiment of the application provides.
Figure 14 is the structural schematic diagram of the light source of optical projection mould group in Figure 13.
Figure 15 is a kind of step flow chart of optical projection method provided by the present application.
Figure 16 is the structural schematic diagram for the sensing device that the 14th embodiment of the application provides.
Figure 17 is a kind of step flow chart of method for sensing provided by the present application.
Figure 18 is the structural schematic diagram for the equipment that the 15th embodiment of the application provides.
Figure 19 is a kind of step flow chart of object dimensional information application method provided by the present application.
Specific embodiment
Presently filed embodiment is described below in detail, the example of the embodiment is shown in the accompanying drawings, wherein from beginning
Same or similar element or element with the same or similar functions are indicated to same or similar label eventually.Below by ginseng
The embodiment for examining attached drawing description is exemplary, and is only used for explaining the application, and should not be understood as the limitation to the application.?
In the description of the present application, it is to be understood that term " first ", " second " are only used for describing, and should not be understood as instruction or dark
Show relative importance or implicitly indicates the quantity of indicated technical characteristic or put in order.Define as a result, " first ",
The technical characteristic of " second " can explicitly or implicitly include one or more technical characteristic.In retouching for the application
In stating, the meaning of " plurality " is two or more, unless otherwise specifically defined.
In the description of the present application, it should be noted that unless otherwise specific regulation or limit, term " installation ", " phase
Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integration connection；It can
To be mechanical connection, it is also possible to be electrically connected or is in communication with each other；It can be directly connected, the indirect phase of intermediary can also be passed through
Even, the connection inside two elements or the interaction relationship between two elements be can be.For the ordinary skill of this field
For personnel, the concrete meaning of above-mentioned term in this application can be understood as the case may be.
Following disclosure provides many different embodiments or example is used to realize the different structure of the application.In order to
Simplify disclosure herein, hereafter only to the component of specific examples and being set for describing.Certainly, they are merely examples, and
And purpose does not lie in limitation the application.In addition, the application can reuse reference number and/or reference word in different examples
Mother, this reuse are itself not indicate the various embodiments discussed to simplify and clearly state the application
And/or the particular kind of relationship between setting.In addition, the application in the following description provided by various specific techniques and material only
For the example for realizing technical scheme, but those of ordinary skill in the art should be aware that the technical solution of the application
It can be realized by other techniques for not describing hereafter and/or other materials.
Further, described feature, structure can be incorporated in one or more embodiment party in any suitable manner
In formula.In the following description, many details are provided so as to fully understand presently filed embodiment.However, this
Field technical staff will be appreciated that even if without one or more in the specific detail, or using other structures, group
Member etc. can also practice the technical solution of the application.In other cases, it is not shown in detail or describes known features or operation
To avoid the emphasis of fuzzy the application.
As shown in Figure 1, the application first embodiment provides a kind of optical module 1, for issue a light source 10
Original beam is converted into the pattern beam with predetermined pattern, and projects on the pattern beam to a measured target object, with sense
Survey the three-dimensional information of measured target object.The predetermined pattern can be the hot spot of multiple irregular distributions, or a plurality of rule
The striped then arranged, certainly, the predetermined pattern can also be other suitable patterns, and the application does not do the predetermined pattern
Specific limitation.
It can be the light beam with specific wavelength according to sensing principle and application scenarios, the original beam.In this implementation
In mode, the original beam, for example, be infrared or near infrared light, wave-length coverage be 750 nanometers (Nanometer, nm) extremely
1650nm.So, the original beam is also not limited to infrared or near infrared light, such as can also be other suitable for ultraviolet light etc.
Light beam.
Currently, 3D detection technology large-scale application is in intelligent terminal, augmented reality (Augmented Reality, AR)/void
The multiple fields such as quasi- reality (Virtual Reality, VR), intelligent security guard, robot vision, automatic Pilot, automedica.
The pattern beam is the light beam projected on measured target object during sensing the 3D information of measured target object, Ke Yi
The 3D information that preset light pattern is used to sense measured target object is projected on measured target object.Acquired measured target object
3D information has a variety of applications, for example can use the functions such as the 3D information realization face recognition.It should be noted that this Shen
Specific limitation please not done to the application of this 3D information in full.
The optical module 1 includes light beam adjustment section 12, optical path-deflecting portion 14 and pattern generation portion 16.The light source 10 is sent out
Original beam out is incident to pattern generation portion 16 after the adjustment in light beam adjustment section 12 and optical path-deflecting portion 14, to generate energy
Enough pattern beams that predetermined pattern is projected on measured target object.
The light beam adjustment section 12 is used to adjust the original beam issued from the light source 10, so that subsequent be incident on pattern
Light beam in generating unit 16 keeps collimating and meeting preset aperture requirement substantially.The light beam adjustment section 12 is sent out according to light source 10
Original beam feature out may include one or more optical textures 120, such as: if the issued original beam of light source 10
The angle of divergence is bigger, then needs to be arranged optical alignment structure 120 for original beam and be converted to approximately parallel collimated ray, can make
The range that light beam after must converting is covered will not the significant change with change in optical path length；If the issued original beam of light source 10
Aperture is too small, needs to be arranged optical beam-expanding structure 120 by the borehole enlargement of original beam, so as to cover the full pattern
Generating unit 16.The optical texture 120 can be one or more independent optical elements, can also be formed directly into optics group
On the surface of other optical elements of part 1.
The optical texture 120 can be but be not limited to non-spherical structure.As long as the optical texture 120 may be implemented
Required function, such as, but not limited to collimates or expands, and the optical texture 120 of various suitable shapes can be used.
The optical path-deflecting portion 14 for changing projecting light path direction, to meet light path of the projecting light path along specific direction
Design requirement.In order to meet the design requirement of optics module slimming, the optical path-deflecting portion 14 is by projecting light path by light source 10
Exit direction deflection special angle after project away again, to reduce thickness of the entire optics module on final projecting direction.
The optical path-deflecting portion 14 includes the incident side 140 set gradually along optical path, reflecting surface 142 and light emission side 144.Institute
It states incident side 140 to be arranged towards light source 10, the original beam issued for importing light source 10.The reflecting surface 142 is used for will
The light emission side 144 in incident light beam towards optical path-deflecting portion 14 reflects.The tilt angle of the reflecting surface 142 is according to optical path-deflecting
The light path angle to be deflected of portion 14 is configured.The light emission side 144 is arranged towards reflecting surface 142, for that will pass through reflection
Light beam after face 142 deflects projects away.
In the present embodiment, the optical path-deflecting portion 14 includes reflecting prism, and light source 10 is emitted along first direction X
Light beam deflection substantially 90 degree after in a second direction Y project away.The incident side 140 be reflecting prism towards light source 10 its
In a side surface.The reflecting surface 142 is the inclined-plane of reflecting prism, is substantially in 45 degree of settings with first direction X.The light emission side
144 be surface of the reflecting prism towards exit direction, substantially vertical with 140 surface of incident side.The light beam adjustment section 12
Including the optical texture 120 with optical alignment effect, be formed directly into respectively the reflecting prism 140 surface of incident side and
On 144 surface of light emission side.The reflecting prism is to be integrated with the integrated optical element of collimation and deflection optical path function.
The reflecting prism is optically denser medium compared to air.Correspondingly, when the light beam that light source 10 issues enters from air
It is reflected when being incident upon reflecting prism, collimating effect further can be played to incident light beam.
Therefore, in the present embodiment, optical path-deflecting portion 14 is arranged by the light emission side in light source 10 to realize projection light
The direction on road deflects, and can play converging action to the light beam of edge-diffusion.
The first direction X and the second direction are vertical.Wherein, the first direction is, for example, horizontal direction, described
Second direction Y is, for example, vertical direction.Ground is changed, the first direction X for example can also be vertical direction, the second direction
X is, for example, horizontal direction.The application does not do specific limitation to first direction X and second direction Y.
It is understood that in the present embodiment, being adjusted according to the characteristics of luminescence of the light source 10 and the light beam
Optical path length required by a pair of of optical texture 120 in portion 12, the reflecting prism can substantially tri-prismoids or trapezoidal rib
Cylinder.Such as: when above-mentioned required light path is shorter, 140 surface of incident side, reflecting surface 142 and the light out of the reflecting prism
144 surface of side, which mutually borders on, substantially forms tri-prismoid.When above-mentioned required light path is longer, the entrance prism enters light
It is separated by distance required for one section of light path along optical path direction between 140 surface of side and reflecting surface 142, the reflecting prism is substantially
Trapezoidal prism.
The reflecting prism can be anti-by the light emission side 144 in incident beam towards optical path-deflecting portion 14 using total reflection principle
It penetrates.However, changing ground, in addition to total reflection principle, reflection function can also be realized by the way that reflecting material is arranged in reflecting surface 142
Can, such as patch reflectance coating etc..
Further, in some embodiments, the reflecting surface 142 and first direction X can also be in other proper angles
Setting, it is not limited to 45 degree.
The reflecting prism can also be replaced by other appropriate members with the same function, it is not limited to prism, only
It is used for that Y is projected away in a second direction after substantially 90 degree of light beam that first direction X is emitted deflection by light source 10.
The light beam that the light source 10 is emitted does not need to be strictly defined as along first direction X yet, can also be with first direction X
The outgoing beam being at certain angle of inclination.Correspondingly, the deflection angle of light beam is also not limited to 90 degree.
It is understood that the optical module 1 can also include one or more optical elements with other function,
The incident side 140 or light emission side 144 that the deflection optical portion 14 can be corresponded to are configured to supply the optics of the light source 10 spy
The gap between optical requirement that property and projecting beam need to meet.Such as: if the relatively narrow nothing of original beam that light source 10 is issued
Method covers the full pattern generation portion 16, then the optical module 1 can also include one or more light for having and expanding function
Element is learned to be used to extend light beam to cover the full pattern generation portion 16.
The pattern generation portion 16 is used to incident light beam formation can project predetermined pattern on measured target object
Pattern beam.The pattern generation portion 16 passes through the optical microstructures 163 being correspondingly arranged and carries out weight to the light field of incident beam
New to arrange to realize above-mentioned function, the optical microstructures 163 include but is not limited to diffraction optics lines, microlens array, light
Grid and combinations thereof.
For forming the predetermined pattern of irregular distribution hot spot, if the light source 10 is the hair of multiple irregular distributions
The light emitting array of light unit composition, light beam issued itself have included multiple beamlets of irregular distribution, then the figure
The light beam group that case generating unit 16 is issued by the luminescence unit that the optical microstructures 163 replicate multiple irregular distributions,
And it is unfolded within the scope of preset expanded- angle and forms the spot pattern for being incident upon and being randomly distributed on measured target object.If
The light beam that the light source 10 is launched is the light beam of even intensity distribution, then the pattern generation portion 16 can be micro- by the optics
Light beam is carried out rearrangement by structure 163, is dispersed as that the pattern beam of irregular pattern can be projected.In present embodiment
In, the pattern generation portion 16 is the diffraction optical element (Diffractive that 14 light emission side 144 of deflection optical portion is arranged in
Optical Element,DOE).The DOE is independent optical element, including transparent substrate 160 and is formed in transparent substrate
On diffraction optics lines as optical microstructures 163.Wherein, the irregular pattern is for example including random, pseudorandom
With quasi-periodic pattern.
Ground is changed, the pattern generation portion 16 can also be thrown by forming the method for transmission pattern on the transparent substrate
Project the pattern beam with predetermined pattern.For example, forming the pattern layer made of light-proof material, institute on the transmission substrate
It states and forms the light beam with predetermined pattern in requisition for the position hollow out of light transmission in pattern layer to allow light beam to project away.
The pattern generation portion 16 is not limited to the above embodiment, and can also be other suitable structures, as long as can be real
Incident light beam is now formed to the pattern beam that predetermined pattern can be projected on measured target object.
As shown in Fig. 2, the application second embodiment provides a kind of optical module 2, in first embodiment
Optical module 1 is essentially identical, and the main distinction is that the light beam adjustment section 22 includes a pair of of optics with optical alignment effect
Structure patch 220 is bonded in respectively on 244 surface of 240 surface of incident side and light emission side of reflecting prism, and and indirect formation
Integral structure on 244 surface of 240 surface of incident side and light emission side of the reflecting prism.
In the present embodiment, the reflecting prism is right-angled trapezium prism, and wherein the inclined-plane of right-angled trapezium prism is used as
Reflecting surface.Ground is changed, the reflecting prism can also be for example triangular prism or the prism of other suitable shapes.
The optical texture patch 220 can be but be not limited to non-spherical structure.As long as the optical texture patch 220
Functions, the optical texture patch 220 of various suitable shapes such as required optical function may be implemented, such as collimate or expand all is
Can with.
As shown in figure 3, the application third embodiment provides a kind of optical module 3, in first embodiment
Optical module 1 is essentially identical, and the main distinction is that the light beam adjustment section 32 includes a pair of independent lens 320, respectively corresponds
340 surface of incident side of reflecting prism and the setting of 344 surface of light emission side.The lens 320 can be along the different location of projecting light path
It is arranged on 344 surface of 340 surface of incident side or light emission side without being directly anchored to reflecting prism.
In the present embodiment, the reflecting prism is right-angled trapezium prism, and wherein the inclined-plane of right-angled trapezium prism is used as
Reflecting surface.Ground is changed, the reflecting prism can also be for example triangular prism or the prism of other suitable shapes.
The lens 320 can be but be not limited to the lens for having the effects that optical alignment or expanding.For example, described
Mirror 320 is the lens of non-spherical lens, spherical lens or various other suitable shapes.
As shown in figure 4, the 4th embodiment of the application provides a kind of optical module 4, in third embodiment
Optical module 3 is essentially identical, and the main distinction is that the light beam adjustment section 42 includes a pair of independent lens 420, corresponding anti-
Penetrate 340 surface of the incident side setting of prism.The pattern generation portion 46 is the light out for being formed directly into the deflection optical portion 44
Optical microstructures 463 on 344 surface of side.The optical microstructures 463 carry out rearrangement to the light field of incident beam with shape
At the pattern beam that can project predetermined pattern.The optical microstructures 463 include but is not limited to diffraction optics lines, lenticule battle array
Column, grating and combinations thereof.
In the present embodiment, the reflecting prism is right-angled trapezium prism, and wherein the inclined-plane of right-angled trapezium prism is used as
Reflecting surface.Ground is changed, the reflecting prism can also be for example triangular prism or the prism of other suitable shapes.
The lens 420 can be but be not limited to the lens for having the effects that optical alignment or expanding.The lens
420, for example, can be the lens of non-spherical lens, spherical lens or various other suitable shapes.
As shown in figure 5, the 5th embodiment of the application provides a kind of optical module 5, in the 4th embodiment
Optical module 4 is essentially identical, and the main distinction is that the light beam adjustment section 52 includes being formed directly into the incident side of reflecting prism
Optical texture 520 on 540 surfaces.The pattern generation portion 56 is 544 table of light emission side for being formed in the deflection optical portion 54
Optical microstructures 563 on face.The optical microstructures 563 carry out rearrangement to the light field of incident beam can be projected with being formed
The pattern beam of predetermined pattern.The optical microstructures 563 include but is not limited to diffraction optics lines, microlens array, grating
And combinations thereof.
The optical texture 520 can be but be not limited to the optical texture of aspherical shape.As long as the optical texture
520 may be implemented required function, such as have the function of optical alignment or expand, and the optical texture 520 of various suitable shapes is all
It is possible.
It is understood that the light beam adjustment section 52 can also include the incident side of one or more corresponding reflecting prisms
The optical lens 522 of 540 surfaces setting.The optical lens 522 can be configured along the different location of projecting light path, with cooperation
The optical texture 520 on 540 surface of incident side is formed in realize preset pH effect effect.
As shown in fig. 6, the application sixth embodiment provides a kind of optical module 6, in third embodiment
Optical module 3 is essentially identical, and the main distinction is that the optical path-deflecting portion 64 includes reflecting mirror 642, passes through the reflecting mirror 642
Reflection change the direction of projecting light path to realize optical path-deflecting.The light beam adjustment section 62 includes a pair of of separate lenses
620, the incident side 640 and light emission side 644 for respectively corresponding reflecting mirror are arranged.
The lens 620 can be but be not limited to non-spherical lens, as long as required function may be implemented in the lens 620
Can, such as have the function of optical alignment or expand, the lens 620 of various suitable shapes are all possible.
Ground is changed, in other embodiments, the light beam in the optical module 1-6 of the respective embodiments described above is adjusted
Portion 12-62 also can be omitted.
As shown in fig. 7, the 7th embodiment of the application provides a kind of optical module 7, in first embodiment
Optical module 1 is essentially identical, and the main distinction is that the reflecting surface 742 is the curved surface for having both light beam adjustment function and reflection function
Structure.The light beam adjustment function includes but is not limited to the functions such as to collimate or expand.Therefore, the reflecting surface 742 is changing throwing
The function of a part of light beam adjustment section 72 can also be realized while penetrating the direction of optical path, so as to reduce the light beam
The number of elements of adjustment section 72 or the setting of optical texture.Certainly, for changing the reflection of projecting light path on the reflecting surface 742
Function can be realized by the method for total reflection principle or setting reflective coating.
As shown in figure 8, the 8th embodiment of the application provides a kind of optical module 8, in third embodiment
Optical module 3 is essentially identical, and the main distinction is that the separate lenses of the light beam adjustment section 82 correspond to the deflection optical portion 84
840 surface of incident side setting.The setting of pattern generation portion 86 is in the light beam adjustment section 82 and the deflection optical portion 84
Between.The original beam that the light source 83 issues successively forms energy after the modulation in light beam adjustment section 82 and pattern generation portion 86
It is projected away again after enough projecting the pattern beam of predetermined pattern through changing direction by deflection optical portion 84.
As shown in figure 9, the 9th embodiment of the application provides a kind of optical module 9, in the 8th embodiment
Optical module 8 is essentially identical, and the main distinction is that the pattern generation portion 96 is to be formed directly into the deflection optical portion 94
Optical microstructures 963 on reflecting surface 942.The optical microstructures 963 carry out rearrangement to the light field of incident beam with shape
At the pattern beam that can project predetermined pattern.The optical microstructures 963 include but is not limited to diffraction optics lines, lenticule battle array
Column, grating and combinations thereof.The light beam being incident on reflecting surface 942 is while being reflected in the work of the optical microstructures 963
The pattern beam injection that can project predetermined pattern is formed with lower rearrangement light field.
Expansiblely, corresponding be omitted of the light beam adjustment section in the optical module of above-mentioned each embodiment is also feasible
's.In this way, the thickness of the optics module including the optical module equally also may be implemented to be thinned.
Further, it is also possible additionally to increase certain elements in the optical module of above-mentioned each embodiment, it should all
Fall into the protection scope of the application.
As shown in Figure 10, the tenth embodiment of the application provides a kind of optical projection mould group 81 comprising light source 80 and
Optical module 1 as described in the above-mentioned first to the 7th embodiment.The light beam that the light source 80 issues passes through the optical module 1
Predetermined pattern is projected on measured target object afterwards, with the three-dimensional information for sensing measured target object.
The light source 80 is semiconductor laser.Preferably, the light source 80 is vertical cavity surface emitting laser
(Vertical Cavity Surface Emitting Laser, VCSEL), can pass through photoetching in semiconductor substrate 800
Or the techniques such as etching are made.
In the present embodiment, the light source 80 is the wide face type VCSEL of single hole.The wide face type VCSEL of single hole only has one
A lightening hole, the aperture that shines is larger, the luminous aperture of the single luminescence unit several times in general array VCSEL.The list
The light beam that the wide face type VCSEL in hole is issued is in the area source of substantially parallel outgoing after the modulation of the light beam adjustment section 12.Institute
Pattern generation portion 16 is stated, for example, the uniform light that the area source can be issued by the optical microstructures 163 of corresponding design
Field carries out rearrangement, to form the pattern beam that can project irregular pattern on measured target object.Wherein, it is described not
Regular pattern is for example including random, pseudorandom and quasi-periodic pattern.
As shown in figure 11, the 11st embodiment of the application provides a kind of optical projection mould group 91, implements with the 8th
Optical projection mould group 81 in mode is essentially identical, and the main distinction is the light source 90 for multiple VCSEL luminescence units composition
Light emitting array can including being formed in the multiple VCSEL luminescence units 902 being randomly distributed on the same semiconductor base 900
Project the spot pattern of irregular distribution.The pattern generation portion 16, for example, the optical microstructures of corresponding design can be passed through
163 copy the spot pattern of multiple irregular distributions and are incident upon on measured target object.
As shown in figure 12, the 12nd embodiment of the application provides a kind of optical projection mould group 101, implements with the 8th
Optical projection mould group 81 in mode is essentially identical, and the main distinction is the light source 100 for multiple VCSEL luminescence units composition
Light emitting array, including be formed on the same semiconductor base 1000 according to the evenly arranged multiple VCSEL hair of same intervals
Light unit 1002 can project equally distributed spot pattern.The micro- knot of optics that the pattern generation portion 16 passes through corresponding design
The equally distributed spot pattern is dispersed as the spot pattern of irregular distribution and is incident upon on measured target object by structure 163.
The pattern generation portion 16, for example, it is also possible to which the optical microstructures 163 by corresponding design shine what is arranged along preset direction
The light field of unit mutually merges the candy strip arranged with formation rule.
As shown in Figure 13 and Figure 14, the 13rd embodiment of the application provides a kind of optical projection mould group 111, with
Optical projection mould group 81 in eight embodiments is essentially identical, and the main distinction is that the light source 110 includes independently controlling
System luminous the first emission part 112 and the second emission part 114.First emission part 112 issues the first light beam and is used to form light
Strong equally distributed flood beam.The flood beam be projected on measured target object for identification the measured target object whether
For the special object for meeting default feature.For example, the flood beam can be used to identify whether the measured target object is face.
The second light beam that second emission part 114 issues is used to form the pattern beam that predetermined pattern is projected on measured target object.
The predetermined pattern is used to sense the three-dimensional information of the measured target object.First emission part 112 and the second emission part 114
It may be formed on the same semiconductor base 115 to be integrated into overall structure.In the present embodiment, first light beam and
The wavelength of two light beams is identical, and wave-length coverage is 750nm to 1650nm.
In the present embodiment, first emission part 112 includes one or more for emitting the first of the first light beam
Illuminator 1120.Second emission part 114 includes one or more for emitting the second illuminator 1140 of the second light beam.Institute
It states the first illuminator 1120 and the second illuminator 1140 is formed on the same semiconductor base 115.The semiconductor base 114
On define positioned at first light emitting region 122 at the middle part of semiconductor base 114 and be arranged around first light emitting region 122
The second light emitting region 102.First illuminator 1120 is uniform according to preset same intervals in the first light emitting region 102
Distribution.Second illuminator 1140 is irregularly arranged in the second light emitting region 122.
First illuminator 1120 and the second illuminator 1140 can be semiconductor laser.Preferably, in this implementation
In mode, first illuminator 1120 and the second illuminator 1140 are VCSEL.
In the present embodiment, first light emitting region 122 positioned at 114 middle part of semiconductor base is rectangle.It is described
Second light emitting region 102 is correspondingly arranged at four edges of the first light emitting region 122.First illuminator 1120 is second
It is uniformly arranged along two sides of each corner in the second light emitting region 102 according to same intervals four corners of light emitting region 102
Cloth multilayer, first light emitting region 122 be Figure 12 described in dotted line surround envelope the first light emitting region 102 each
Four right angle frame bar-shaped zones at right angle.Second illuminator 102 is irregularly arranged in the first light emitting region 122, is used
In the second light beam for issuing light intensity irregular distribution when lighting.
It is understood that multiple equally distributed first illuminators in each described first light emitting region 102
1120 can also be substituted by the wide face type VCSEL of a single hole.That is, each first light emitting region 102 is the wide face type of a single hole
VCSEL issues the first light beam of even intensity as area source.
It is provided with the first pad 104 connecting with first illuminator 1120 on the semiconductor base 115, described
One pad 104 is for controlling shining for the first illuminator 1120 with external circuit connection.It is arranged on the semiconductor base 115
There is the second pad 124 connecting with second illuminator 1140, second pad 124 is used to control with external circuit connection
Make shining for the second illuminator 1140.Therefore, first illuminator 1120 and the second illuminator 1140 can pass through different controls
Signal processed independently works.
Accordingly, described image generating unit 16 includes diffusion part 161 and patterning portion 162.The corresponding light of the diffusion part 161
First light emitting region 102 of source structure 100 is arranged, for issuing the first illuminator 1120 described in the first light emitting region 102
The first beam spread formed optical power detection flood beam.The second of the 162 corresponding light source structure 100 of patterning portion
Light emitting region 122 is arranged, for by second illuminator 1140 issues described in the second light emitting region 122 the second light beam by pair
The optical microstructures 163 that should be arranged replicate multiple irregular distributions the second illuminator 1140 issue light beam group, and
It is unfolded within the scope of preset expanded- angle and is formed and be incident upon the spot pattern being randomly distributed on measured target object.The pattern
Light beam, which is incident upon on measured target object, to be formed by pattern and can generate corresponding deformation because of the change in depth of measured target object, is passed through
The change in shape situation for analyzing the predetermined pattern being incident upon on measured target object can obtain the three-dimensional information of the measured target object.
As shown in figure 15, the application also provides a kind of optics that predetermined pattern is projected using the optical projection mould group 81
Projecting method.The optical projection method includes the following steps:
Step S01 issues the light beam for sensing.The light beam is required not by the interference of visible light and should be reduced to the greatest extent
Measured target object is impacted.In the present embodiment, the light beam is infrared or near infrared light, wave-length coverage 750nm
To 1650nm.
The light beam can be issued by semiconductor laser, such as VCSEL.According to the difference setting of light source 10, the light beam
Optical characteristics it is also different.Such as: if the light source 10 is shining for the luminescence unit composition of multiple irregular distributions
When array, the light beam is the light beam group that the beamlet of multiple irregular distributions forms.If the light source 10 is multiple rules
When the light emitting array of the luminescence unit composition of arrangement, the light beam is the light beam group that the beamlet of multiple regular distributions forms.Such as
When light source 10 described in fruit is single hole wide face type VCSEL, the light beam is the area source of optical power detection.
Step S02, adjusting the light beam makes it meet preset dispersion angle and aperture requirement.Because the light beam is in incidence
Need to meet specific spot size requirement when on to the optical element for forming pattern beam, so the light beam is being incident on shape
It is required at needing to meet preset dispersion angle and aperture in the communication process before the pattern generation portion 16 of pattern beam.
The mode for adjusting light beam includes that the light beam is collimated or expanded, and is had by being arranged in the optical path of light beam
The light beam adjustment element of function is collimated or expands, such as: lens, grating, DOE and combinations thereof, to realize.The light beam adjustment member
The configuration of part can be designed according to the characteristics of luminescence of light source is corresponding, and position is not limited to the specific position in projecting light path, only
It needs to adjust light beam to meeting preset condition before the light beam is incident on the pattern generation portion 16 to form pattern beam.
Step S02 is for example specifically included:
Light beam is collimated；Or/and
Light beam is expanded.
Wherein, for example being expanded to light beam can be before collimating.
It is understood that if the characteristics of luminescence of light source 10 to have met projected light beam big about dispersion angle and/or aperture
Small requirement, the then light beam that the light source 10 is issued no longer need to be adjusted, and can omit step S02.
Step S03 changes the projecting direction of light beam, to meet projecting light path along specific under the premise of keeping light path constant
The length requirement in direction.The change angle of the beam direction and change light beam position can according to the requirements of application scenarios into
Row adjustment.In the present embodiment, the beam direction changes substantially 90 degree by the direction of the launch of light source 10.The light source 10 can
Along first direction X emit light beam after change into Y injection in a second direction again, changing the position of the light beam by selection then can be
The light path length for controlling optical path Y in a second direction under the premise of light path is constant is kept, wanting for projection optics mould group slimming is met
It asks.
As previously mentioned, the first direction and the second direction are vertical.Wherein, the first direction X can be but not
It is confined to horizontal direction, the second direction Y can be but be not limited to vertical direction.
Optical module or optical element can be used to realize in the mode for changing beam direction.The optical module includes reflection
Face will reflex to edge along the light beam of first direction using the method for total reflection principle or setting reflecting material on the reflecting surface
Second direction projection.
The optical module includes optical path-deflecting portion, the optical path-deflecting portion include the reflecting surface, incident side surface and
Light emission side surface, light beam enter the optical path-deflecting portion from the incident side surface, and along first in the optical path-deflecting portion
Total reflection occurs when being transferred to the reflecting surface or transmits in a second direction after being reflected by reflecting material for direction transmission.
The optical path-deflecting portion includes but is not limited to reflecting prism and reflecting mirror.The shape of the reflecting prism is according to light beam
Optical path length before reflection can be tri-prismoid or trapezoidal prism.
It is understood that adjusting optical path because the change of optical path direction will not influence other optical characteristics of optical path
Propagation characteristic can carry out before or after changing optical path direction, realize can also dividing for optical path adjustment if it is by optical module
It is not carried out respectively before or after changing optical path direction, so the step S02 and step S03 have no specific tandem.
The light field of the light beam is carried out rearrangement by step S04, and formation can project default on measured target object
The pattern beam of pattern.The light field of the light beam carries out weight by the optical microstructures 163 being correspondingly arranged on transparent substrate 160
New arrangement.The optical microstructures 163 include but is not limited to diffraction optics lines, microlens array, grating and combinations thereof.
In above-mentioned optical projection method, it is also possible additionally to increase or decrease certain steps.For example, omitting step S2
It is also feasible.
Step S04 is for example prior to or subsequent to step S03 progress.
Step S02 for example prior to or/and after in step S03 carry out.
Step S02 is for example carried out prior to step S04.The setting of the optical microstructures 163 and 10 phase interconnection of corresponding light source
It is equipped with the pattern beam for projecting different demands.Such as: needs are projected with the feelings of the pattern beam of irregular distribution hot spot
Condition, the light source 10 can be include irregular distribution multiple VCSEL luminescence units light emitting array, the corresponding light of arranging in pairs or groups
The light beam group for learning the luminescence unit sending that micro-structure 163 replicates multiple irregular distributions can be in measured target object to be formed
On project irregular distribution hot spot pattern beam.The light source 10 is also possible to the light source of uniform intensity, such as: area source
Or light emitting array composed by multiple evenly arranged VCSEL luminescence units, the corresponding collocation optical microstructures 163 will be uniform
Light field rearrangement can project the pattern beam of irregular distribution pattern to be formed on the object of north side.
The case where striped for needing to project regular array, the light source 10 can be the illuminator of uniformly light-emitting,
Such as: light emitting array composed by multiple evenly arranged VCSEL luminescence units, the corresponding optical microstructures 163 of arranging in pairs or groups will
Light field along the luminescence unit of stripe direction arrangement mutually merges the candy strip arranged with formation rule.
The case where for needing integrated transmitting floodlight and predetermined pattern light beam, as shown in figure 12, the light source 10 can wrap
Include the first emission part 112 for projecting floodlight and the second emission part 114 for projecting pattern beam.First emission part
112 can be area source or equally distributed multiple array of light emitting cells.Second emission part 114 can be irregular distribution
Multiple VCSEL luminescence units or equally distributed multiple VCSEL array of light emitting cells.Corresponding first emission part, 112 institute
The optical path setting for issuing light beam has light intensity of the optical microstructures 163 of diffusion optical effect to issue the first emission part 112
Uniform light beam is further diffused as wider and optical power detection the flood beam of dispersion angle.Corresponding second emission part
The optical path setting of 114 issued light beams has the optical microstructures 163 of diffraction, refraction or reflex with by the second emission part
114 light beams issued form the pattern beam that can project predetermined pattern.
As shown in figure 16, the 14th embodiment of the application provides a kind of sensing device 50, is used to sense tested mesh
Mark the spatial information of object.The spatial information includes but is not limited to that the three-dimensional information on measured target object surface, measured target object exist
Other 3 D stereo information relevant to measured target object such as dimension information of location information, measured target object in space.Institute
The spatial information of the measured target object sensed can be used for identifying measured target object or construct the 3 D stereo of measured target object
Model.
The sensing device 50 include the optical projection mould group 81 as provided by above-mentioned tenth to the 13rd embodiment and
Sense mould group 500.The optical projection mould group 81 carries out sensing identification for projecting in particular beam to measured target object.It is described
Sensing mould group 500 is used to sense the specific image that the optical projection mould group 81 projects on measured target object and by analysis institute
State the correlation space information of the tested subject matter of specific image acquisition.
In the present embodiment, the sensing device 50 is to sense the three-dimensional information on measured target object surface and identify accordingly
The 3D face authentification device of measured target object identity.
The particular beam includes the flood beam of even intensity and can project default figure on measured target object
The pattern beam of case.The sensing mould group 500 according to the image that the flood beam sensed is formed on measured target object come
Identify whether close measured target object is face.The sensing mould group 500 is according to the pattern beam sensed tested
The change in shape of the predetermined pattern projected on object is to analyze the three-dimensional information on measured target object surface and accordingly to quilt
It surveys object and carries out face recognition.
As shown in figure 17, the application also provides a kind of method for sensing sensed based on the predetermined pattern projected, uses
In the spatial information of sensing measured target object.The method for sensing is similar with above-mentioned optical projection method, and difference is institute
Stating method for sensing further includes following steps:
Step S05 obtains the light image for the predetermined pattern being incident upon on measured target object.It can be cooperated by imaging sensor
Relevant lens module is realized.
Step S06, the light image for analyzing the predetermined pattern obtain the three-dimensional information of measured target object.
The predetermined pattern of the predetermined pattern of acquired measured target object and projection in the plane is mutually compared with reference to figure
It is right, and by pre-set image and pre-set image on analysis measured target object with reference to deviation situation of the figure on corresponding position obtain by
Object is surveyed in the three-dimensional information of the corresponding position.
Step S07, according to the threedimensional model of the three-dimensional information construction measured target object of measured target object.
According to the three-dimensional information construction at each position in the predetermined pattern institute coverage area being incident upon on measured target object
The threedimensional model of measured target object out.
As shown in figure 18, the 15th embodiment of the application provides a kind of equipment 60, such as mobile phone, laptop, flat
Plate computer, touch-control interaction screen, door, the vehicles, robot, automatic numerical control lathe etc..The equipment 60 includes at least one
State sensing device 50 provided by the 13rd embodiment.The equipment 60 be used for according to the sensing result of the sensing device 50 come
It is corresponding to execute corresponding function.The corresponding function unlocks after including but not limited to identifying user's identity, payment, starts and preset
Application program, avoidance, identification user's countenance after using depth learning technology judge user mood and health feelings
Any one or more in condition.
In the present embodiment, the sensing device 50 is to sense the three-dimensional information on measured target object surface and identify accordingly
The 3D face authentification device of measured target object identity.The equipment 60 is the mobile phone equipped with the 3D face authentification device, notes
Electric terminals, door, the vehicles, safety check, the entry and exit such as this computer, tablet computer, touch-control interaction screen etc. are related to passing in and out permission
Equipment.
As shown in figure 19, the application also provides a kind of application method based on acquired measured target object three-dimensional information.
The application method is similar with above-mentioned method for sensing, and difference is that the application method further includes following steps:
Step S08 executes corresponding function according to the threedimensional model of constructed measured target object.
Specifically, the identity of measured target object can be identified according to the threedimensional model of measured target object, such as:
The outpost that electric terminals, door, the vehicles, safety check, the entry and exit such as mobile phone, computer, touch-control interaction screen etc. are related to passing in and out permission is set
The function of the identity of identification measured target object is executed on standby using the threedimensional model of measured target object.
It can also be according to the threedimensional model of constructed measured target object come Computer Aided Design, such as real-time display measured target
Object 3-D effect adjusted.
It can also realize body feeling interaction according to the threedimensional model of constructed measured target object, such as according to identifying
Limb action of the measured target object in solid space triggers corresponding operation.
After can also judging equipment by machine learning techniques according to the three-dimensional scene models in constructed field range
Continuous operation, such as: automobilism is automatically controlled, machine people operation etc. is automatically controlled.
Compared with existing 3D sensing optical system, optical projection method provided herein, method for sensing and object
Three-dimensional information application method can meet slimming design requirement under the premise of keeping enough light paths.
In the description of this specification, reference term " embodiment ", " certain embodiments ", " schematically implementation
What the description of mode ", " example ", " specific example " or " some examples " etc. meant to describe in conjunction with the embodiment or example
Particular features, structures, materials, or characteristics are contained at least one embodiment or example of the application.In this specification
In, schematic expression of the above terms are not necessarily referring to identical embodiment or example.Moreover, the specific spy of description
Sign, structure, material or feature can be combined in any suitable manner in any one or more embodiments or example.
The foregoing is merely the better embodiments of the application, all the application's not to limit the application
Made any modifications, equivalent replacements, and improvements etc., should be included within the scope of protection of this application within spirit and principle.
Claims (18)
1. a kind of optical projection method is used to project the default light pattern for sensing on a measured target object, described
Optical projection method includes the following steps:
The light beam for sensing is issued along first direction；
The projecting direction of the light beam is changed into the second direction different from first direction by first direction；And
The light field of the light beam is subjected to rearrangement, to form the pattern that can project predetermined pattern on measured target object
Light beam.
2. optical projection method as described in claim 1, which is characterized in that it is first that the light field by light beam carries out rearrangement
In or after in the projecting direction by the light beam second direction different from first direction is changed by first direction.
3. optical projection method as claimed in claim 2, which is characterized in that the optical projection method further comprises step
It is rapid:
Light beam is collimated；Or/and
Light beam is expanded.
4. optical projection method as claimed in claim 3, which is characterized in that it is described to light beam collimated prior to or/and after
The second direction different from first direction is changed by first direction in the projecting direction by the light beam.
5. optical projection method as claimed in claim 4, which is characterized in that described to be collimated prior to described light beam by light
The light field of beam carries out rearrangement.
6. optical projection method as claimed in claim 3, which is characterized in that it is described to light beam expanded prior to or/and after
The second direction different from first direction is changed by first direction in the projecting direction by the light beam.
7. optical projection method as claimed in claim 6, which is characterized in that described to be expanded prior to described light beam by light
The light field of beam carries out rearrangement.
8. optical projection method as described in claim 1, which is characterized in that the first direction is vertical with second direction.
9. optical projection method as described in claim 1, which is characterized in that the light beam changes projection by optical module
Direction, the optical module include reflecting surface, and the method for total reflection principle or setting reflecting material is utilized on the reflecting surface
It is projected being reflexed to along the light beam of first direction in a second direction.
10. optical projection method as claimed in claim 9, which is characterized in that the optical module includes optical path-deflecting portion, institute
Stating optical path-deflecting portion includes the reflecting surface, incident side surface and light emission side surface, and light beam enters institute from the incident side surface
Optical path-deflecting portion is stated, and is transmitted in the optical path-deflecting portion along first direction, is all-trans when being transferred to the reflecting surface
It penetrates or is transmitted in a second direction after being reflected by reflecting material.
11. optical projection method as claimed in claim 10, which is characterized in that the optical path-deflecting portion be trapezoidal prism or
Triangular prism.
12. optical projection method as described in claim 1, which is characterized in that the light beam is infrared or near infrared light, wavelength
Range is 750nm to 1650nm.
13. optical projection method as described in claim 1, which is characterized in that issue the light source of the light beam and do not advised to be multiple
The light emitting array for the luminescence unit composition being then distributed, the light field of the light beam pass through the optical microstructures that are correspondingly arranged on substrate
Rearrangement is carried out, the light beam group that the luminescence unit that the optical microstructures copy multiple irregular distributions issues carrys out shape
At the pattern beam that can project irregular distribution pattern on measured target object；Or
The light source for issuing the light beam is to shine composed by the area source or multiple evenly arranged luminescence units of uniformly light-emitting
The light field of array, the light beam carries out rearrangement, the micro- knot of optics by the optical microstructures being correspondingly arranged on substrate
Uniform light field rearrangement is formed the pattern beam that irregular distribution pattern can be projected on measured target object by structure；Or
The light source for issuing the light beam is light emitting array composed by multiple evenly arranged luminescence units, the light field of the light beam
By the optical microstructures that are correspondingly arranged on substrate carry out rearrangement, the optical microstructures will be arranged along stripe direction
The light field of luminescence unit mutually merges the candy strip arranged with formation rule；Or
The light source for issuing the original beam includes the first emission part for projecting flood beam and for projecting pattern beam
The second emission part, first emission part be area source or equally distributed multiple array of light emitting cells, it is described second transmitting
Portion is the multiple array of light emitting cells or equally distributed multiple array of light emitting cells of irregular distribution, and the light field of the light beam is logical
It crosses the optical microstructures being correspondingly arranged on substrate and carries out rearrangement, the optical path of corresponding the issued light beam of first emission part
The optical microstructures with diffusion optical effect are arranged further to spread with the light beam for the uniform intensity for issuing the first emission part
For the flood beam for the uniform light intensity that dispersion angle more extensively has, the optical path setting of corresponding the issued light beam of second emission part
Optical microstructures with diffraction, refraction or reflex can be projected default with the light beam formation for being issued the second emission part
The pattern beam of pattern.
14. optical projection method as claimed in claim 9, it is characterised in that: the light field of the light beam is by being formed directly into
Optical microstructures on the reflecting surface carry out rearrangement.
15. optical projection method according to claim 13 or 14, which is characterized in that the optical microstructures are selected from diffraction light
Learn lines, microlens array, grating and combinations thereof.
16. a kind of method for sensing, for sensing the spatial information of measured target object, the method for sensing includes the following steps:
The step of optical projection method as described in any one of claim 1-15；
Obtain the light image for the predetermined pattern being incident upon on measured target object；
The light image for analyzing the predetermined pattern obtains the three-dimensional information of measured target object；And
It is built up according to the three-dimensional information at each position in predetermined pattern coverage area described on measured target object obtained
The threedimensional model of measured target object.
17. a kind of object dimensional information application method, this method comprises the following steps:
The step of method for sensing as claimed in claim 16；And
Corresponding function is executed according to the threedimensional model of constructed measured target object.
18. object dimensional information application method as claimed in claim 17, which is characterized in that performed function includes basis
The threedimensional model of measured target object identifies the identity of measured target object；Or
3-D effect after being adjusted according to the threedimensional model real-time display measured target object of constructed measured target object；Or
Body feeling interaction is realized according to the threedimensional model of constructed measured target object；Or
The subsequent operation of equipment is judged by machine learning techniques according to the three-dimensional scene models in constructed field range.
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