CN109212824A - Display panel and manufacturing method thereof - Google Patents
Display panel and manufacturing method thereof Download PDFInfo
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- CN109212824A CN109212824A CN201811317066.8A CN201811317066A CN109212824A CN 109212824 A CN109212824 A CN 109212824A CN 201811317066 A CN201811317066 A CN 201811317066A CN 109212824 A CN109212824 A CN 109212824A
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- filter pattern
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- substrate
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- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000000758 substrate Substances 0.000 claims abstract description 82
- 230000002093 peripheral effect Effects 0.000 claims abstract description 63
- 239000003292 glue Substances 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims description 71
- 238000000926 separation method Methods 0.000 claims description 52
- 230000003287 optical effect Effects 0.000 claims description 11
- 238000001914 filtration Methods 0.000 claims description 10
- 229920002120 photoresistant polymer Polymers 0.000 claims description 2
- 125000006850 spacer group Chemical group 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 33
- 238000000034 method Methods 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910021393 carbon nanotube Inorganic materials 0.000 description 2
- 239000002041 carbon nanotube Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 230000002269 spontaneous effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- FYQBHPUWNUUKIH-UHFFFAOYSA-N [Zn].[In].[Ge] Chemical compound [Zn].[In].[Ge] FYQBHPUWNUUKIH-UHFFFAOYSA-N 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- -1 aluminium tin-oxide Chemical compound 0.000 description 1
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical compound [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910021423 nanocrystalline silicon Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
A display panel comprises a first substrate, a second substrate, a display medium layer, a color filter element, a peripheral color filter element, a frame glue, a spacer and a peripheral spacer. The display medium layer and the frame glue surrounding the display medium layer are positioned between the first substrate and the second substrate. The color filter element comprises a first filter pattern, a second filter pattern and a third filter pattern. The peripheral color filter element includes at least two of a first peripheral filter pattern, a second peripheral filter pattern, and a third peripheral filter pattern. The spacers are disposed on at least one of the first, second and third filter patterns. The peripheral spacers are disposed on at least one of the first peripheral filter pattern, the second peripheral filter pattern and the third peripheral filter pattern.
Description
Technical field
The present invention relates to a kind of semiconductors and preparation method thereof, and in particular to a kind of display panel and preparation method thereof.
Background technique
Generally formed display panel technique in, frame glue can be set at the non-display area of display panel with two
The substrate being oppositely arranged avoids the display dielectric layer from overflowing around display dielectric layer together.It is set relatively in order to avoid pressing two
The height for being filled with the space of display dielectric layer can be allowed too small when the substrate set, it will usually which incorporation has the gap of hardness in frame glue
Object.However, due to being provided with color filter patterns (relative in non-display area and not set) in viewing area, and to assemble
Easily occurs the case where height segment difference in the viewing area of display panel afterwards and non-display area.In addition, how to reduce manufacture display
The cost of panel is also an important issue.
Summary of the invention
The present invention provides a kind of display panel, and viewing area and non-display area do not have the case where height segment difference.
The present invention provides a kind of manufacturing method of display panel, the viewing area of the display panel produced by the manufacturing method with
And do not have the case where height segment difference in non-display area, and the cost for manufacturing the display panel can be reduced.
Display panel of the invention has viewing area and non-display area, and including first substrate, the second substrate, display medium
Layer, color filter element, periphery color filter element, frame glue, at least a separation material and an at least peripheral clearance object.Second base
Plate is oppositely arranged with first substrate.Display dielectric layer is set to viewing area and between first substrate and the second substrate.It is colored
Filter element is set between first substrate and the second substrate and is located at viewing area.Color filter element includes at least one first
Filter pattern, at least one second filter pattern and at least a third filter pattern.Periphery color filter element is set to first
Between substrate and the second substrate and it is located at non-display area.Periphery color filter element includes at least one first periphery optical filtering figure
At least the two in case, at least one second periphery filter pattern and at least a third periphery filter pattern.Frame glue is set to first
Between substrate and the second substrate.Frame glue is located at non-display area and around display dielectric layer.At least a separation material is set at least
In one first filter pattern, at least one second filter pattern and at least at least one of third filter pattern.At least one
Peripheral clearance object is set in the first periphery filter pattern, the second periphery filter pattern and third periphery filter pattern at least
In one.Periphery color filter element and at least a peripheral clearance level are in frame glue.
The manufacturing method of display panel of the invention includes the following steps.The second substrate is provided.By mask in second
At least one first filter pattern being located in viewing area is formed on substrate and is filtered positioned at least one first periphery of non-display area
Pattern.By same mask at least one second filter pattern formed in the second substrate in viewing area and positioned at non-aobvious
Show at least one second periphery filter pattern in area.Form at least third filter pattern for being located at viewing area.It is formed and is located at display
An at least separation material in area and an at least peripheral clearance object positioned at non-display area.An at least separation material is located at least one first
In filter pattern, at least one second filter pattern and at least at least one of third filter pattern.Between an at least periphery
Gap level is at least one first periphery filter pattern and at least at least one of one second periphery filter pattern.Frame glue is set
In in the second substrate.Frame glue is located at non-display area and around viewing area.At least one first periphery filter pattern, at least a second week
Side filter pattern and at least a peripheral clearance level are in frame glue.By the second substrate and first substrate to group.
Based on above-mentioned, due to the present invention saves the use of mask during manufacturing display panel and can reduce manufacture at
This.Further, since the present invention is by separation material and the configuration of peripheral clearance object in the filter pattern exposed using same mask
On, since the height for the filter pattern for using same mask to expose is more consistent, can avoid separation material top surface with
The top surface of peripheral clearance object does not trim and causes subsequent assembling display panel to generate and occur height in non-display area and viewing area
The case where segment difference.
To make the foregoing features and advantages of the present invention clearer and more comprehensible, special embodiment below, and cooperate specification attached
Figure is described in detail below.
Detailed description of the invention
Figure 1A~Fig. 1 G is the section flow chart according to the manufacturing method of the display panel of the first embodiment of the present invention.
Fig. 2 is the diagrammatic cross-section according to the display panel of the second embodiment of the present invention.
Fig. 3 is the diagrammatic cross-section according to the display panel of the third embodiment of the present invention.
Fig. 4 is the diagrammatic cross-section according to the display panel of the fourth embodiment of the present invention.
Description of symbols:
10a, 10b, 10c, 10d: display panel
100: first substrate
110a: the first filter pattern
110b: the first periphery filter pattern
120a: the second filter pattern
120b: the second periphery filter pattern
130a: third filter pattern
130b: third periphery filter pattern
140a: separation material
140b: peripheral clearance object
150: frame glue
160: display dielectric layer
200: the second substrate
300: mask
400: color filter element
500: periphery color filter element
AR: viewing area
C1, c2, c3, c4, c5, c6, c7, c8, h1, h2, h3, h4, h5, h6, h7, h8: height
D1, d2, X, Y: direction
D: spacing
NR: non-display area
P: sub-pixel spacing
P, P1, P2, P3, P4, P5, P6: width
R1, R2, R3, R4, R5: repetitive unit
Specific embodiment
For the features and advantages of the present invention can be clearer and more comprehensible, special embodiment below, and Figure of description is cooperated to make
Detailed description are as follows.As the skilled person will recognize, described implementation can be modified in a variety of ways
Example, without departing from design or range of the invention.
In the accompanying drawings, for the sake of clarity, it is exaggerated the thickness of each element etc..Throughout the specification, identical attached drawing
Label indicates identical element.It should be appreciated that ought such as layer, film, region or substrate element be referred to as " on another element ",
Or when " being connected to another element ", " being overlapped in another element ", it can be connect directly on another element or with another element,
Or intermediary element can be there is also.On the contrary, working as, element is referred to as " directly on another element " or " being directly connected to " is another
When element, intermediary element is not present.As it is used herein, " connection " can refer to physics and/or electrical connection.
It will be appreciated that though term " first ", " second ", " third " etc. herein can be used for describing various elements,
Component, region, layer and/or part, but these component, assembly units, region and/or part should not be limited by these terms.This
A little terms are only used for distinguishing a component, assembly unit, region, layer or part and another component, assembly unit, region, layer or part
It opens.Therefore, " first element " discussed below, " component ", " region ", " layer " or " part " can be referred to as second element, portion
Part, region, layer or part are without departing from teaching herein.
Term used herein is used for the purpose of for the purpose of describing particular embodiments, rather than restrictive.Such as this paper institute
It uses, except non-content explicitly indicates that, otherwise singular " one ", "one" and "the" are intended to include multiple forms, including
"at least one"."or" expression " and/or ".As it is used herein, term " and/or " it include one or more related institute lists
Any and all combinations of purpose.It is also understood that when used in this manual, term " includes " and/or " comprising " are specified
The feature, region, entirety, step, operation, the presence of element and/or component, but be not excluded for one or more of the other feature,
Region entirety, step, operation, the presence or addition of component, assembly unit and/or a combination thereof.
In addition, the relative terms of such as "lower" or " bottom " and "upper" or " top " can be used to describe herein a member
The relationship of part and another element, as shown in the figure.It should be appreciated that relative terms are intended to include other than orientation shown in figure
The different direction of device.For example, being described as be in the member of the "lower" side of other elements if the device in an attached drawing is overturn
Part will be oriented at the "upper" side of other elements.Therefore, exemplary term "lower" may include the orientation of "lower" and "upper", depend on
In the specific orientation of attached drawing.Similarly, if the device in an attached drawing is overturn, be described as be in other elements " lower section " or
The element of " lower section " will be oriented in other elements " top ".Therefore, exemplary term " following " or " following " may include
Above and below orientation.
" about " used herein, " substantial " or " approximation " includes described value and determines in those of ordinary skill in the art
Particular value acceptable deviation range in average value, it is contemplated that the spy of the measurement and error relevant to measurement that are discussed
Fixed number amount (that is, limitation of measuring system).For example, " about " can indicate in one or more standard deviations of described value, or
± 30%, in ± 20%, ± 10%, ± 5%.
Unless otherwise defined, all terms (including technical and scientific term) used herein have leads with belonging to the present invention
The normally understood identical meaning of the those of ordinary skill in domain.It will be further appreciated that such as in usually used dictionary
Those of definition term should be interpreted as having and their meanings in the relevant technologies and context of the invention are consistent
Meaning, and will not be interpreted Utopian or excessively formal meaning, unless clearly definition so herein.
Exemplary embodiment is described herein with reference to the sectional view of the schematic diagram as idealized embodiments.It therefore, can be with
Anticipate the change in shape of the diagram of the result as such as manufacturing technology and/or tolerance.Therefore, embodiment as described herein is not
It should be construed as limited to the specific shape in region as shown here, but including such as form variations caused by manufacturing.Example
Such as, it is illustrated and described as flat region usually and can have coarse and/or nonlinear characteristic.Acute angle shown in addition, can be with
It is round.Therefore, region shown in figure is substantially schematical, and their shape is not intended to the essence for showing region
True shape, and not be intended to limit the scope of the claims.
Figure 1A~Fig. 1 G is the section flow chart according to the manufacturing method of the display panel of the first embodiment of the present invention.
Figure 1A is please referred to, the second substrate 200 is provided.The second substrate 200 is for example with viewing area AR and non-display area NR.
It is noted that only showing the second substrate 200 of a part in figure 1A.In one embodiment, non-display area NR is around display
Area AR.The second substrate 200 may include rigid substrate or flexible substrate, and its material such as glass, plastic cement or other suitable
Material or combination above-mentioned, but not limited to this.
Figure 1B is please referred to, by mask 300 to be located at least one first of AR in viewing area in formation in the second substrate 200
Filter pattern 110a and at least one first periphery filter pattern 110b positioned at non-display area NR.For example, in the present embodiment
In, the first filter pattern 110a and the first periphery filter pattern 110b are red filter pattern, but not limited to this, the first filter
Light pattern 110a and the first periphery filter pattern 110b also can be other colors, such as the first filter pattern 110a and first
Periphery filter pattern 110b can be green filter pattern, alternatively, the first filter pattern 110a and the first periphery filter pattern
110b can be blue filter pattern etc..In the present embodiment, at least one first filter pattern 110a and at least one first is formed
Periphery filter pattern 110b can be for example including following steps.Firstly, (not showing in forming the first filter layer in the second substrate 200
Out).Then, Patternized technique is carried out to the first filter layer using mask 300.Patternized technique can for example including exposure technology with
And developing process, but not limited to this.In the present embodiment, it is shown in the first filter pattern 110a that viewing area AR is formed in non-
Show that the width P for the first periphery filter pattern 110b that area NR is formed is equal with sub-pixel spacing, but not limited to this, the first periphery
The width P of filter pattern 110b also can be unequal with sub-pixel spacing.
Fig. 1 C is please referred to, by mask 300 at least one second formed in the AR of viewing area in the second substrate 200
Filter pattern 120a and at least one second periphery filter pattern 120b positioned at non-display area NR.For example, the second optical filtering figure
Case 120a and the second periphery filter pattern 120b is green filter pattern, but not limited to this, the second filter pattern 120a with
And second periphery filter pattern 120b also can be other colors, such as the second filter pattern 120a and the second periphery filter pattern
120b can be red filter pattern, alternatively, the second filter pattern 120a and the second periphery filter pattern 120 can be blue
Filter pattern etc..In the present embodiment, at least one second filter pattern 120a and at least one second periphery filter pattern are formed
120b can be for example including following steps.Firstly, in forming the second filter layer (not shown) in the second substrate 200.Then, make mask
300 move the distance of N × P relative to the second substrate 200 toward first direction d1, so that the alignment of mask 300 is intended to form the second optical filtering
The position of pattern 120a and the second periphery filter pattern 120b.In the present embodiment, N=2.Also that is, make mask 300 relative to
The second substrate 200 toward the distance of the mobile two sub-pixel spacing of first direction d1, i.e. two the first periphery filter pattern 110b's
The distance of width P.Above-mentioned moving step may be, for example, fixed the second substrate 200 and keep mask 300 mobile toward first direction d1,
But not limited to this.In other words, above-mentioned moving step also may be, for example, permanent mask 300 and keep the second substrate 200 past with
First direction d1 opposite direction is mobile.Later, Patternized technique is carried out to the second filter layer using mask 300.Due to second
Periphery filter pattern 120b is to be formed using identical mask, therefore the second periphery is filtered and schemed with the first periphery filter pattern 110b
(width of the second filter pattern 120a similarly, not in this case 120b has the width P equal with the first periphery filter pattern 110b
It repeats again).
Fig. 1 D is please referred to, at least third filter pattern 130a for being located at viewing area AR is formed.It in one embodiment, can be each
Self-forming is located at at least third filter pattern 130a in the AR of viewing area and at least third periphery positioned at non-display area NR
Filter pattern 130b.In the present embodiment, third filter pattern 130a and third periphery filter pattern 130b is blue filter
Light pattern, but not limited to this, third filter pattern 130a and third periphery filter pattern 130b also can be other colors, such as
Third filter pattern 130a and third periphery filter pattern 130b can be red filter pattern, alternatively, third filter pattern
130a and third periphery filter pattern 130b can be green filter pattern etc..In the present embodiment, an at least third is formed
Filter pattern 130a can be for example including following steps.Firstly, in forming third filter layer (not shown) in the second substrate 200.It connects
, make distance of the mask 300 relative to the second substrate 200 toward the mobile N × P of second direction d2, and return to mask 300 in formation
Position where when the first filter pattern 110a and the first periphery filter pattern 110b.In the present embodiment, N=2.Also that is, making
Mask 300 relative to the second substrate 200 toward the distance of the mobile two sub-pixel spacing of second direction d2, i.e. filter by two the first peripheries
The distance of the width P of light pattern 110b.Again, continue that mask 300 is made to move N toward second direction d2 relative to the second substrate 200
The distance of × P.In the present embodiment, N=2.Also that is, mask 300 is made to move two toward second direction d2 relative to the second substrate 200
The distance of a sub-pixel spacing, i.e., the distance of the width P of two the first periphery filter pattern 110b, so that the alignment of mask 300 is intended to
Form the position of third filter pattern 130a and third filter pattern 130b.In the present embodiment, second direction d2 and first
Direction d1 is opposite.Above-mentioned moving step may be, for example, fixed the second substrate 200 and keep mask 300 mobile toward second direction d2,
But not limited to this.In other words, above-mentioned moving step also may be, for example, permanent mask 300 and keep the second substrate 200 past with
Second direction d2 opposite first direction d1 is mobile.Later, Patternized technique is carried out to third filter layer using mask 300.By
It is to be formed using identical mask with the first periphery filter pattern 110b in third periphery filter pattern 130b, therefore third periphery
(width of third filter pattern 130a similarly, filter pattern 130b has the width P equal with the first periphery filter pattern 110b
It is repeated no more in this).However, the mode for forming an at least third filter pattern 130a is not limited with above-mentioned technique.In other words
It says, in another embodiment, another mask (not shown) can be used and only form the optical filtering of an at least third in the AR of viewing area
Pattern 130a (that is, third periphery filter pattern 130b is formed not in non-display area NR).
In the present embodiment, in the first filter pattern 110a, the second filter pattern 120a and third filter pattern 130a
The spacing of adjacent the two is p, i.e., the spacing of sub-pixel is p, and the first periphery filter pattern 110b, the second periphery filter pattern
The spacing of adjacent the two is D, D=np in 120b and third periphery filter pattern 130b, and n is positive integer.In this reality
It applies in example, n=2, but not limited to this.
In some embodiments, in formation filter pattern (the first filter pattern 110a, the second filter pattern 120a and third
Filter pattern 130a) and periphery filter pattern (the first periphery filter pattern 110b, the second periphery filter pattern 120b and third
Periphery filter pattern 130b) before, optionally in setting black matrix (not shown) in the second substrate 200.The material of black matrix
Material can be for example black resin, metal (such as: chromium) or other suitable materials with antiradar reflectivity.Black matrix can have multiple
Opening is to expose filter pattern and periphery filter pattern.
In the present embodiment, due at least formed the first filter pattern 110a and the first periphery filter pattern 110b with
The same mask 300 is used when the second filter pattern 120a and the second periphery filter pattern 120b, therefore can be without the use of more
A mask forms each color filter patterns.This means, the present invention can save the use of mask and then reduce manufacturing cost.
Fig. 1 E is please referred to, is formed positioned at an at least separation material 140a of viewing area AR and positioned at non-display area NR at least
One peripheral clearance object 140b.It forms an at least separation material 140a and at least a peripheral clearance object 140b can be for example including following step
Suddenly.Firstly, in forming nitride layer (not shown) in gap in the second substrate 200.Then, Patternized technique is carried out to gap nitride layer.Between
Parting 140a and peripheral clearance object 140b is, for example, photonasty separation material (Photo Spacer；PS).That is, spacer 140a and week
The material of side separation material 140b is, for example, photoresist.An at least separation material 140a is located at least one first filter pattern
On 110a, at least one second filter pattern 120a and at least at least one of third filter pattern 130a, and at least one
Peripheral clearance object 140b is located at least one first periphery filter pattern 110b and at least one second periphery filter pattern 120b
On at least one.In the present embodiment, an at least separation material 140a is located at least one first filter pattern 110a, and at least one
Peripheral clearance object 140b is located at least one first periphery filter pattern 110b.In detail, an at least separation material 140a is for example
It is superimposed at least one first filter pattern 110a, and an at least peripheral clearance object 140b for example filters at least one first periphery
Pattern 110b is superimposed.In the present embodiment, the first filter pattern 110a and separation material 140a being superimposed are along the second substrate 200
Normal direction stacking order with the first periphery filter pattern 110b for being superimposed and peripheral clearance object 140b along the second substrate
The stacking order of 200 normal direction is substantially the same.In one embodiment, first to be superimposed with separation material 140a is filtered
The height of pattern 110a is c1, and the height for the first periphery filter pattern 110b being superimposed with peripheral clearance object 140b is c2,
C1 is substantially the same with c2.In addition, in one embodiment, at least separation material 140a being superimposed and the first filter pattern 110a
Height be h1, and the height for at least peripheral clearance object 140b and at least one first periphery filter pattern 110b being superimposed is
H2, and h1 and h2 is substantially the same.In detail, the top surface of separation material 140a and the top surface of peripheral clearance object 140b are substantially cut
(that is, being located at the height being substantially equal) together.
The present embodiment configures peripheral clearance object 140b in non-display area NR, and by separation material 140a and peripheral clearance object
140b configuration is exposing whole-colored filter layer (that is, the first filter pattern 110a and first week using same mask 300
Side filter pattern 110b) on, since the height for using same mask 300 to expose whole-colored filter layer is more consistent, because
This, the top surface of the top surface and peripheral clearance object 140b that can avoid separation material 140a does not trim and subsequent assembling display panel is caused to produce
There is the case where height segment difference in raw non-display area NR and viewing area AR.
Fig. 1 F is please referred to, frame glue 150 is set in the second substrate 200.In detail, frame glue 150 is for example set to non-aobvious
Show area NR and around viewing area AR.Also, at least one first periphery filter pattern 110b, at least one second periphery filter pattern
120b and at least a peripheral clearance object 130b is located in frame glue 150, but invention is not limited thereto.In detail, another
In a little embodiments, frame glue 150 be may also set up on first substrate 100.Later, setting display dielectric layer 160 is in the second substrate 200
On.In detail, display dielectric layer 160, which is for example filled in, is surrounded in the space by frame glue 150 (that is, being located at viewing area AR
In).Display dielectric layer 160 may include non-spontaneous luminescent material, such as: liquid crystal molecule, electrophoretic display medium or other applicable
Medium be example, but not limited to this.In other embodiments, display dielectric layer 160 may include self-luminescent material, such as: nothing
Machine material, the combination of organic material or other suitable materials or previous materials or the combination with non-spontaneous luminescent material.
Fig. 1 G is please referred to, by the second substrate 200 and 100 pairs of groups of first substrate, to form display panel 10a.In this implementation
In example, at least one first filter pattern 110a, at least one second filter pattern 120a and at least a third filter pattern 130a
For the color filter element 400 of display panel 10a, and at least one first periphery filter pattern 110b, the filter of at least one second periphery
Light pattern 120b and at least a third periphery filter pattern 130b are the periphery color filter element 500 of display panel 10a, but
It is not limited.Periphery color filter element 500 may include at least one first periphery filter pattern 110b, at least one second periphery
At least the two in filter pattern 120b and at least a third periphery filter pattern 130b.For example, periphery colorized optical filtering
Element 500 can only include at least one first periphery filter pattern 110b and at least one second periphery filter pattern 120b.First
Substrate 100 may be, for example, thin film transistor (TFT) pixel array (Thin Film Transistor Array；TFT array) substrate,
But not limited to this.In detail, first substrate 100 can be for example including multiple switch element (not shown), multiple signal wires (not
Show) and multiple pixel electrode (not shown).Switch element can be for example various semiconductor elements.For example, switch member
Part is, for example, the semiconductor elements such as transistor or diode, and the material of switch element be, for example, polysilicon, it is monocrystalline silicon, nanocrystalline
Silicon, microcrystal silicon, amorphous silicon, carbon nanotubes/bar, organic semiconducting materials, oxide semiconductor or other suitable materials or
The combination of previous materials.In one embodiment, switch element includes grid, source electrode, channel layer and drain electrode.Grid and channel layer
Between be provided with gate insulating layer.Switch element can for top lock transistor npn npn, bottom lock transistor npn npn, stereo channel transistor npn npn,
Or other suitable types.Signal wire may be, for example, at least scan line, an at least data line, at least altogether with electrode wires with extremely
At least one of few power supply line.Signal wire is for example electrically connected with switch element.For example, scan line and grid
It is electrically connected, source electrode and drain electrode are respectively electrically connected with channel layer, and data line is electrically connected with the source electrode, and common electrode line can
It is coupled with pixel electrode and is electrically connected drain electrode.Pixel electrode can be electrically connected with switch element.Pixel electrode, which can be for example, to be worn
Saturating formula pixel electrode, reflective pixel electrodes or semi-penetration, semi-reflective pixel electrode.Above-mentioned penetration pixel electrode can be
Single-layer or multi-layer, and its material includes indium tin oxide, indium-zinc oxide, aluminium tin-oxide, aluminium zinc oxide, the oxidation of indium germanium zinc
Object, carbon nanotubes/bar, the metal or alloy less than 60 angstroms or other suitable materials.Above-mentioned reflective pixel electrodes can be
Single-layer or multi-layer, and its material includes metal, alloy or other suitable materials.
Fig. 2 is the diagrammatic cross-section according to the display panel of the second embodiment of the present invention.
Referring to figure 2., Fig. 2 shows the diagrammatic cross-sections of the display panel of the second embodiment of the present invention.The embodiment of Fig. 2
Subelement and description and its generated technical effect in and omission Fig. 2 similar to the embodiment of Fig. 1 G, before seeing
The description stated, in this no longer superfluous words.In the present embodiment, the first filter pattern 110a, the second filter pattern 120a and third filter
The width P1 of light pattern 130a is each greater than the first periphery filter pattern 110b, the second periphery filter pattern 120b and third periphery
The width P2 of filter pattern 130b.In addition, in the present embodiment, by adjusting mask 300 in the process for carrying out Patternized technique
Middle moved distance (please referring to embodiment shown by Figure 1B to Fig. 1 D), can for example make each filter pattern and each periphery
Filter pattern has configuration relation as described below: the third periphery filter pattern 130b positioned at non-display area NR for example can part
It is superimposed on the first periphery filter pattern 110b, and positioned at the third filter pattern 130a of viewing area AR then for example positioned at the first filter
Between light pattern 110a and the second filter pattern 120a.Also, in the present embodiment, an at least separation material 140a is located at least one
On second filter pattern 120a, and an at least peripheral clearance object 140b is located at least one second periphery filter pattern 120b.In detail
It carefully says, an at least separation material 140a is for example superimposed at least one second filter pattern 120a, and an at least peripheral clearance object
140b is for example superimposed at least one second periphery filter pattern 120b.In the present embodiment, the second filter pattern being superimposed
Stacking order and the second periphery filter pattern that is superimposed of the 120a and separation material 140a along the normal direction of the second substrate 200
120b and peripheral clearance object 140b are substantially the same along the stacking order of the normal direction of the second substrate 200.In an embodiment
In, the height for the second filter pattern 120a being superimposed with separation material 140a is c3, and be superimposed with peripheral clearance object 140b
The height of second periphery filter pattern 120b is c4, and c3 is substantially the same with c4.In addition, in one embodiment, be superimposed to
The height of a few separation material 140a and the second filter pattern 120a is h3, and at least peripheral clearance object 140b being superimposed and extremely
The height of few one second periphery filter pattern 120b is h4, and h3 and h4 is substantially the same.In detail, the top of separation material 140a
Face and the top surface of peripheral clearance object 140b substantially trim (that is, being located at the height being substantially equal).
In some embodiments, the first filter pattern 110a, the second filter pattern 120a and third filter pattern 130a
In the spacing of adjacent the two be p, i.e. sub-pixel spacing is p, and the first periphery filter pattern, the second periphery filter pattern and
The spacing of adjacent the two is D, D=np in the filter pattern 130b of third periphery, and n is positive integer.In the present embodiment, n
=1, but not limited to this.
Fig. 3 is the diagrammatic cross-section according to the display panel of the third embodiment of the present invention.
Referring to figure 3., Fig. 3 shows the diagrammatic cross-section of the display panel of the third embodiment of the present invention.The embodiment of Fig. 3
Subelement and description and its generated technical effect in and omission Fig. 3 similar to the embodiment of Fig. 1 G, before seeing
The description stated, in this no longer superfluous words.In the present embodiment, the first filter pattern 110a, the second filter pattern 120a and third filter
The width P3 of light pattern 130a will respectively be greater than the first periphery filter pattern 110b, the second periphery filter pattern 120b and third week
The width P4 of side filter pattern 130b.In addition, in the present embodiment, by adjusting mask 300 in the mistake for carrying out Patternized technique
The distance (please referring to embodiment shown by Figure 1B to Fig. 1 D) moved in journey, can for example make each filter pattern and each week
Side filter pattern has configuration relation as described below: the third periphery filter pattern 130b positioned at non-display area NR for example can portion
It point is superimposed on the first periphery filter pattern 110b, and can partially be superimposed on the positioned at the second filter pattern 120a of viewing area AR
On one filter pattern 110a, and the first filter pattern 110a can be partially superimposed on positioned at the third filter pattern 130a of viewing area AR
And second on filter pattern 120a.Also, in the present embodiment, an at least separation material 140a is located at least third optical filtering figure
On case 130a, and an at least peripheral clearance object 140b is located on an at least third periphery filter pattern 130b.In detail, at least
One separation material 140a be for example superimposed with an at least third filter pattern 130a and at least one first filter pattern 110a (that is,
On the third filter pattern 130a for being partially superimposed on the first filter pattern 110a), and at least peripheral clearance object 140b
It is such as superimposed with an at least third periphery filter pattern 130b and at least one first periphery filter pattern 110b (that is, the portion of being located at
Divide and be superimposed on the third periphery filter pattern 130b of the first periphery filter pattern 11b).In the present embodiment, to be superimposed
The stacking order of one filter pattern 110a, third filter pattern 130a and separation material 140a along the normal direction of the second substrate 200
With the first periphery filter pattern 110b, third periphery filter pattern 130b and the peripheral clearance object 140b that are superimposed along the second substrate
The stacking order of 200 normal direction is substantially the same.In one embodiment, the third being superimposed with separation material 140a filters
The height of pattern 130a and the first filter pattern 110a are c5, and the third periphery optical filtering figure being superimposed with peripheral clearance object 140b
The height of case 130b and the first periphery filter pattern 110b are c6, and c5 is substantially the same with c6.In addition, in one embodiment, phase
Separation material 140a, the third filter pattern 130a of overlapping and the height of the first filter pattern 110a are h5, and are superimposed at least
The height of one peripheral clearance object 140b, third periphery filter pattern 130b and the first periphery filter pattern 110b be h6, and h5 with
H6 is substantially the same.In detail, the top surface of separation material 140a and the top surface of peripheral clearance object 140b substantially trim (that is, position
In the height being substantially equal).
In some embodiments, the first filter pattern 110a, the second filter pattern 120a and third filter pattern 130a
In the spacing of adjacent the two be p, i.e. the spacing of sub-pixel is p, and the first periphery filter pattern, the second periphery filter pattern with
And the spacing of adjacent the two is D, D=np in the filter pattern 130b of third periphery, and n is positive integer.In the present embodiment,
N=1, but not limited to this.
In the above-described embodiments, the first periphery filter pattern 110b, the second periphery filter pattern are provided in frame glue 150
120b and third periphery filter pattern 130b, but not limited to this, for example, can also be not provided with the filter of the second periphery in frame glue 150
Light pattern 120b and the first periphery filter pattern 110b and third periphery filter pattern 130b is only set.
Fig. 4 is the diagrammatic cross-section according to the display panel of the fourth embodiment of the present invention.
Referring to figure 4., Fig. 4 shows the diagrammatic cross-section of the display panel of the fourth embodiment of the present invention.The embodiment of Fig. 4
Subelement and description and its generated technical effect in and omission Fig. 4 similar to the embodiment of Fig. 1 G, before seeing
The description stated, in this no longer superfluous words.In the present embodiment, the first filter pattern 110a, the second filter pattern 120a and third filter
The width P5 of light pattern 130a will respectively be greater than the first periphery filter pattern 110b, the second periphery filter pattern 120b and third week
The width P6 of side filter pattern 130b.In addition, in the present embodiment, by adjusting mask 300 in the mistake for carrying out Patternized technique
The distance (please referring to embodiment shown by Figure 1B to Fig. 1 D) moved in journey, can for example make each filter pattern and each week
Side filter pattern has configuration relation as described below: positioned at the first periphery filter pattern 110b, the second week of non-display area NR
Side filter pattern 120b and third periphery filter pattern 130b are sequentially arranged alternately, and are filtered and schemed positioned at the first of viewing area AR
Case 110a, the second filter pattern 120a and third filter pattern 130a are also sequentially arranged alternately.Also, in the present embodiment,
An at least separation material 140a is located on an at least third filter pattern 130a, and an at least peripheral clearance object 140b is located at least one
On the filter pattern 130b of third periphery.In detail, an at least separation material 140a for example with an at least third filter pattern 130a
It is superimposed, and an at least peripheral clearance object 140b is for example superimposed with an at least third periphery filter pattern 130b.Implement one
In example, the height for the third filter pattern 130a being superimposed with separation material 140a is c7, and is superimposed with peripheral clearance object 140b
The height of third periphery filter pattern 130b be c8, c7 is substantially the same with c8.In addition, in one embodiment, being superimposed it
The height of separation material 140a and third filter pattern 130a is h7, and the peripheral clearance object 140b being superimposed and third periphery are filtered
The height of light pattern 130b is h8, and h7 and h8 is substantially the same.In detail, the top surface of separation material 140a and peripheral clearance object
The top surface of 140b substantially trims (that is, being located at the height being substantially equal).
In some embodiments, the first filter pattern 110a, the second filter pattern 120a and third filter pattern 130a
In the spacing of adjacent the two be p, i.e. the spacing of sub-pixel is p, and the first periphery filter pattern, the second periphery filter pattern with
And the spacing of adjacent the two is D, D=np in the filter pattern 130b of third periphery, and n is positive integer.In the present embodiment,
N=1, but not limited to this.
In conclusion since the present invention is at least forming the first filter pattern and the first periphery filter pattern and the second filter
The same mask is used when light pattern and the second periphery filter pattern, therefore can form each coloured silk without the use of multiple masks
Color filter pattern.This means, the present invention can save the use of mask and then reduce manufacturing cost.Further, since of the invention sets
The filter pattern being placed in viewing area and the periphery filter pattern case being set in non-display area have similar Rankine-Hugoniot relations,
And expose separation material and the configuration of peripheral clearance object in whole-colored filter pattern using same mask, due to using
The height that same mask exposes whole-colored filter pattern is more consistent, therefore, can avoid the top surface and periphery of separation material
The top surface of separation material does not trim and causes subsequent assembling display panel to generate in non-display area and viewing area and height segment difference occur
The case where.
Although the present invention is disclosed as above with embodiment, however, it is not to limit the invention, any technical field
Middle technical staff, without departing from the spirit and scope of the invention, when can make a little variation and retouching, therefore protection of the invention
Range is subject to view as defined in claim.
Claims (15)
1. a kind of display panel, including a viewing area and a non-display area, the display panel include:
One first substrate；
One the second substrate is oppositely arranged with the first substrate；
One display dielectric layer is set to the viewing area and between the first substrate and the second substrate；
One color filter element is set between the first substrate and the second substrate and is located at the viewing area, colour filter
Optical element includes at least one first filter pattern, at least one second filter pattern and an at least third filter pattern；
One periphery color filter element is set between the first substrate and the second substrate and is located at the non-display area, should
Periphery color filter element includes at least one first periphery filter pattern, at least one second periphery filter pattern and an at least third
At least the two in the filter pattern of periphery；
One frame glue is set between the first substrate and the second substrate, which is located at the non-display area and shows around this
Show dielectric layer；
An at least separation material, be set at least one first filter pattern, at least one second filter pattern and this at least one
In at least one of third filter pattern；And
An at least peripheral clearance object is set to the first periphery filter pattern, the second periphery filter pattern and third week
In at least one of side filter pattern, wherein the periphery color filter element and an at least peripheral clearance level are in the frame glue
It is interior.
2. display panel as described in claim 1, wherein the color filter element being superimposed and an at least separation material edge
Between the stacking order of one normal direction of the display panel and the periphery color filter element being superimposed and an at least periphery
Gap object is substantially the same along the stacking order of the normal direction of the display panel.
3. display panel as claimed in claim 2, wherein with the color filter element that the separation material is superimposed include this extremely
Few one first filter pattern, includes at least one first periphery with the periphery color filter element that the peripheral clearance object is superimposed
Filter pattern, first filter pattern are identical as the color of at least one first periphery filter pattern.
4. display panel as claimed in claim 2, wherein with the color filter element that the separation material is superimposed include this extremely
Few one first filter pattern and at least one second filter pattern, the periphery colorized optical filtering being superimposed with the peripheral clearance object
Element includes at least one first periphery filter pattern and at least one second periphery filter pattern, first filter pattern with
The color of at least one first periphery filter pattern is identical, and at least one second filter pattern and at least one second periphery are filtered
The color of pattern is identical.
5. display panel as described in claim 1, wherein the color filter element being superimposed and an at least separation material
Height is substantially the same with the height of the periphery color filter element and an at least peripheral clearance object for being superimposed.
6. display panel as described in claim 1, wherein the separation material includes photoresist.
7. display panel as described in claim 1, wherein the height for the color filter element being superimposed with the separation material and
The height for the periphery color filter element being superimposed with the peripheral clearance object is substantially the same.
8. display panel as described in claim 1, wherein the periphery color filter element includes at least one first periphery filter
Light pattern, at least one second periphery filter pattern and an at least third periphery filter pattern.
9. display panel as described in claim 1, wherein first filter pattern, second filter pattern and the third filter
The color of pattern is different and the color is respectively selected from red, green and blue set.
10. display panel as described in claim 1, the wherein color of first filter pattern and the first periphery filter pattern
Identical, second filter pattern is identical as the color of the second periphery filter pattern and the third filter pattern and third week
The color of side filter pattern is identical.
11. display panel as described in claim 1, wherein at least one first filter pattern, at least one second optical filtering are schemed
In case and an at least third filter pattern spacing of adjacent the two be p, at least one first periphery filter pattern, this extremely
The spacing of adjacent the two is D, D=n in few one second periphery filter pattern and an at least third periphery filter pattern
P, and n is positive integer.
12. a kind of manufacturing method of display panel, which includes a viewing area and a non-display area, the manufacturing method
Include:
One first substrate and a second substrate are provided；
By a mask in forming at least one first filter pattern for being located at the viewing area in the second substrate and be located at that this is non-
At least one first periphery filter pattern of viewing area；
By the mask in forming at least one second filter pattern for being located at the viewing area in the second substrate and be located at that this is non-
At least one second periphery filter pattern of viewing area；
Form at least third filter pattern for being located at the viewing area；
At least separation material for being located at the viewing area and at least peripheral clearance object positioned at the non-display area are formed, this is at least
One separation material is located at least one first filter pattern, at least one second filter pattern and an at least third filter pattern
At least one of on, an at least peripheral clearance level is in at least one first periphery filter pattern and an at least second week
In at least one of side filter pattern；
One frame glue is set on the first substrate or the second substrate, wherein the frame glue is located at the non-display area and around the display
Area；And
By the second substrate and the first substrate to group, the wherein at least one first periphery filter pattern, an at least second week
Side filter pattern and an at least peripheral clearance level are in the frame glue.
13. the manufacturing method of display panel as claimed in claim 12 forms at least third filter for being located at the viewing area
The step of light pattern includes:
At least third filter pattern for being located at the viewing area is formed by the mask and positioned at least the 1 the of non-display area
Three periphery filter patterns.
14. the manufacturing method of display panel as claimed in claim 12, wherein an at least separation material and this at least one first
Filter pattern is superimposed, and at least one first periphery filter pattern is superimposed an at least peripheral clearance object with this, and what is be superimposed should
The height of an at least separation material and first filter pattern and at least peripheral clearance object being superimposed and this at least one first
The height of periphery filter pattern is substantially the same.
15. the manufacturing method of display panel as claimed in claim 12, wherein an at least separation material and this at least one first
Filter pattern and second filter pattern are superimposed, an at least peripheral clearance object and at least one first periphery filter pattern and
At least one second periphery filter pattern is superimposed for this, at least separation material that is superimposed, at least one first filter pattern and
At least height of one second filter pattern and at least peripheral clearance object, at least one first periphery optical filtering figure that are superimposed
The height of case and at least one second periphery filter pattern is substantially the same.
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| TW107128185A TWI710834B (en) | 2018-08-13 | 2018-08-13 | Display panel and method of fabricating thereof |
| TW107128185 | 2018-08-13 |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN109212824B (en) | 2022-02-18 |
| TWI710834B (en) | 2020-11-21 |
| TW202009570A (en) | 2020-03-01 |
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