CN109212824B

CN109212824B - Display panel and manufacturing method thereof

Info

Publication number: CN109212824B
Application number: CN201811317066.8A
Authority: CN
Inventors: 杨济纶
Original assignee: AU Optronics Corp
Current assignee: AU Optronics Corp
Priority date: 2018-08-13
Filing date: 2018-11-07
Publication date: 2022-02-18
Anticipated expiration: 2038-11-07
Also published as: CN109212824A; TWI710834B; TW202009570A

Abstract

A display panel comprises a first substrate, a second substrate, a display medium layer, a color filter element, a peripheral color filter element, a frame glue, a spacer and a peripheral spacer. The display medium layer and the frame glue surrounding the display medium layer are positioned between the first substrate and the second substrate. The color filter element comprises a first filter pattern, a second filter pattern and a third filter pattern. The peripheral color filter element includes at least two of a first peripheral filter pattern, a second peripheral filter pattern, and a third peripheral filter pattern. The spacers are disposed on at least one of the first, second and third filter patterns. The peripheral spacers are disposed on at least one of the first peripheral filter pattern, the second peripheral filter pattern and the third peripheral filter pattern.

Description

Display panel and manufacturing method thereof

Technical Field

The present invention relates to a semiconductor and a method for fabricating the same, and more particularly, to a display panel and a method for fabricating the same.

Background

Generally, in a process of forming a display panel, a sealant is disposed at a non-display region of the display panel to surround a display medium layer together with two oppositely disposed substrates, so as to prevent the display medium layer from overflowing. In order to avoid that the height of the space filled with the display medium layer is too small when two oppositely arranged substrates are pressed, a gap material with hardness is usually doped into the frame glue. However, since the color filter pattern is disposed in the display region (not disposed in the non-display region), the display region and the non-display region of the assembled display panel are prone to have a step difference. In addition, how to reduce the cost of manufacturing the display panel is also an important issue.

Disclosure of Invention

The invention provides a display panel, wherein a display area and a non-display area of the display panel do not have the condition of high-low level difference.

The invention provides a manufacturing method of a display panel, wherein the display area and the non-display area of the display panel manufactured by the manufacturing method do not have the condition of height difference, and the cost for manufacturing the display panel can be reduced.

The display panel of the invention is provided with a display area and a non-display area, and comprises a first substrate, a second substrate, a display medium layer, a color filter element, a peripheral color filter element, frame glue, at least one spacer and at least one peripheral spacer. The second substrate is arranged opposite to the first substrate. The display medium layer is arranged in the display area and is positioned between the first substrate and the second substrate. The color filter element is arranged between the first substrate and the second substrate and is positioned in the display area. The color filter element comprises at least one first filter pattern, at least one second filter pattern and at least one third filter pattern. The peripheral color filter element is arranged between the first substrate and the second substrate and is positioned in the non-display area. The peripheral color filter element includes at least two of at least one first peripheral filter pattern, at least one second peripheral filter pattern and at least one third peripheral filter pattern. The frame glue is arranged between the first substrate and the second substrate. The frame glue is positioned in the non-display area and surrounds the display medium layer. The at least one spacer is disposed on at least one of the at least one first filtering pattern, the at least one second filtering pattern and the at least one third filtering pattern. At least one peripheral spacer is disposed on at least one of the first, second and third peripheral filter patterns. The peripheral color filter element and at least one peripheral gap are arranged in the frame glue.

The manufacturing method of the display panel of the invention comprises the following steps. A second substrate is provided. At least one first filtering pattern in the display area and at least one first peripheral filtering pattern in the non-display area are formed on the second substrate through the mask. At least one second filtering pattern in the display area and at least one second peripheral filtering pattern in the non-display area are formed on the second substrate through the same mask. At least one third filtering pattern in the display area is formed. At least one spacer located in the display area and at least one peripheral spacer located in the non-display area are formed. The at least one gap is located on at least one of the at least one first filtering pattern, the at least one second filtering pattern and the at least one third filtering pattern. At least one peripheral gap is located on at least one of the at least one first peripheral filtering pattern and the at least one second peripheral filtering pattern. And arranging the frame glue on the second substrate. The frame glue is positioned in the non-display area and surrounds the display area. The at least one first peripheral filtering pattern, the at least one second peripheral filtering pattern and the at least one peripheral gap are located in the frame glue. And combining the second substrate with the first substrate.

Based on the above, the present invention can reduce the manufacturing cost because it saves the use of a mask in the process of manufacturing the display panel. In addition, because the spacers and the peripheral spacers are arranged on the filter patterns exposed by the same mask, and the heights of the filter patterns exposed by the same mask are relatively consistent, the condition that the non-display area and the display area of the display panel are different in height caused by the fact that the top surfaces of the spacers and the top surfaces of the peripheral spacers are not cut to be uniform can be avoided.

In order to make the aforementioned and other features and advantages of the invention more comprehensible, embodiments accompanied with figures are described in detail below.

Drawings

Fig. 1A to 1G are cross-sectional flow diagrams of a method for manufacturing a display panel according to a first embodiment of the invention.

Fig. 2 is a schematic cross-sectional view of a display panel according to a second embodiment of the invention.

Fig. 3 is a schematic cross-sectional view of a display panel according to a third embodiment of the invention.

Fig. 4 is a schematic cross-sectional view of a display panel according to a fourth embodiment of the invention.

Description of reference numerals:

10a, 10b, 10c, 10 d: display panel

100: first substrate

110 a: first light filtering pattern

110 b: first peripheral light-filtering pattern

120 a: second light filtering pattern

120 b: second peripheral light-filtering pattern

130 a: third light filtering pattern

130 b: third peripheral light-filtering pattern

140 a: spacer

140 b: peripheral spacer

150: frame glue

160: display medium layer

200: second substrate

300: mask and method for manufacturing the same

400: color filter element

500: peripheral color filter element

AR: display area

c1, c2, c3, c4, c5, c6, c7, c8, h1, h2, h3, h4, h5, h6, h7, h 8: height

d1, d2, X, Y: direction of rotation

D: distance between each other

NR: non-display area

p: sub-pixel pitch

P, P1, P2, P3, P4, P5, P6: width of

R1, R2, R3, R4, R5: repeating unit

Detailed Description

In order to make the features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. As those skilled in the art will recognize, the described embodiments may be modified in various different ways, without departing from the spirit or scope of the present invention.

In the drawings, the thickness of various elements and the like are exaggerated for clarity. Like reference numerals refer to like elements throughout the specification. It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" or "overlapping" another element, it can be directly on or connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physically and/or electrically connected.

It will be understood that, although the terms first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, and/or sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a "first element," "component," "region," "layer," or "portion" discussed below could be termed a second element, component, region, layer, or portion without departing from the teachings herein.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms, including "at least one", unless the content clearly indicates otherwise. "or" means "and/or". As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items. It will be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of stated features, regions, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, regions integers, steps, operations, elements, components, and/or groups thereof.

Furthermore, relative terms, such as "lower" or "bottom" and "upper" or "top," may be used herein to describe one element's relationship to another element, as illustrated. It will be understood that relative terms are intended to encompass different orientations of the device in addition to the orientation depicted in the figures. For example, if the device in one of the figures is turned over, elements described as being on the "lower" side of other elements would then be oriented on "upper" sides of the other elements. Thus, the exemplary term "lower" can include both an orientation of "lower" and "upper," depending on the particular orientation of the figure. Similarly, if the device in one of the figures is turned over, elements described as "below" or "beneath" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "below" or "beneath" can encompass both an orientation of above and below.

As used herein, "about", "substantially", or "approximately" includes the stated value and the average value within an acceptable range of deviation of the specified value as determined by one of ordinary skill in the art, taking into account the measurement in question and the specified amount of error associated with the measurement (i.e., the limitations of the measurement system). For example, "about" may mean within one or more standard deviations of the stated value, or within ± 30%, ± 20%, ± 10%, ± 5%.

Unless defined otherwise, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and the present invention and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

Exemplary embodiments are described herein with reference to cross-sectional views that are schematic illustrations of idealized embodiments. Thus, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, are to be expected. Thus, the embodiments described herein should not be construed as limited to the particular shapes of regions as illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, a region shown or described as flat may generally have rough and/or nonlinear features. Further, the acute angles shown may be rounded. Thus, the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the precise shape of a region and are not intended to limit the scope of the claims.

Referring to fig. 1A, a second substrate 200 is provided. The second substrate 200 has, for example, a display region AR and a non-display region NR. Note that only a part of the second substrate 200 is illustrated in fig. 1A. In one embodiment, the non-display area NR surrounds the display area AR. The second substrate 200 may include a rigid substrate or a flexible substrate, and the material thereof may be, for example, glass, plastic, or other suitable materials, or a combination thereof, but not limited thereto.

Referring to fig. 1B, at least one first filter pattern 110a in the display region AR and at least one first peripheral filter pattern 110B in the non-display region NR are formed on the second substrate 200 through the mask 300. For example, in the present embodiment, the first filter patterns 110a and the first peripheral filter patterns 110b are red filter patterns, but the present invention is not limited thereto, and the first filter patterns 110a and the first peripheral filter patterns 110b may also be other colors, for example, the first filter patterns 110a and the first peripheral filter patterns 110b may be green filter patterns, or the first filter patterns 110a and the first peripheral filter patterns 110b may be blue filter patterns. In the present embodiment, the forming of the at least one first filter pattern 110a and the at least one first peripheral filter pattern 110b may include the following steps, for example. First, a first filter layer (not shown) is formed on the second substrate 200. Next, a patterning process is performed on the first filter layer using a mask 300. The patterning process may include, for example, an exposure process and a development process, but is not limited thereto. In the present embodiment, the width P of the first filter pattern 110a formed in the display area AR and the width P of the first peripheral filter pattern 110b formed in the non-display area NR are equal to the sub-pixel pitch, but not limited thereto, the width P of the first peripheral filter pattern 110b may be different from the sub-pixel pitch.

Referring to fig. 1C, at least one second filter pattern 120a in the display region AR and at least one second peripheral filter pattern 120b in the non-display region NR are formed on the second substrate 200 through the mask 300. For example, the second filter patterns 120a and the second peripheral filter patterns 120b are green filter patterns, but not limited thereto, the second filter patterns 120a and the second peripheral filter patterns 120b may be other colors, for example, the second filter patterns 120a and the second peripheral filter patterns 120b may be red filter patterns, or the second filter patterns 120a and the second peripheral filter patterns 120b may be blue filter patterns, etc. In the present embodiment, the forming of the at least one second filter pattern 120a and the at least one second peripheral filter pattern 120b may include the following steps, for example. First, a second filter layer (not shown) is formed on the second substrate 200. Next, the mask 300 is moved by a distance of N × P in the first direction d1 with respect to the second substrate 200, so that the mask 300 is aligned with the positions where the second filter patterns 120a and the second peripheral filter patterns 120b are to be formed. In the present embodiment, N is 2. That is, the mask 300 is moved in the first direction d1 by a distance of two sub-pixel pitches, i.e., a distance of the widths P of the two first peripheral filter patterns 110b, with respect to the second substrate 200. The moving step may be, for example, fixing the second substrate 200 and moving the mask 300 in the first direction d1, but not limited thereto. In other words, the moving step may be to fix the mask 300 and move the second substrate 200 in a direction opposite to the first direction d 1. Thereafter, the second filter layer is subjected to a patterning process using the mask 300. Since the second peripheral filter patterns 120b and the first peripheral filter patterns 110b are formed using the same mask, the second peripheral filter patterns 120b have the same width P as the first peripheral filter patterns 110b (the width of the second filter patterns 120a is the same, and thus the description thereof is omitted).

Referring to fig. 1D, at least one third filter pattern 130a located in the display area AR is formed. In one embodiment, at least one third filter pattern 130a in the display area AR and at least one third peripheral filter pattern 130b in the non-display area NR may be formed respectively. In the present embodiment, the third filter patterns 130a and the third peripheral filter patterns 130b are blue filter patterns, but the present invention is not limited thereto, and the third filter patterns 130a and the third peripheral filter patterns 130b may be other colors, for example, the third filter patterns 130a and the third peripheral filter patterns 130b may be red filter patterns, or the third filter patterns 130a and the third peripheral filter patterns 130b may be green filter patterns. In this embodiment, the forming of the at least one third filter pattern 130a may include the following steps, for example. First, a third filter layer (not shown) is formed on the second substrate 200. Next, the mask 300 is moved by a distance of N × P in the second direction d2 with respect to the second substrate 200, and the mask 300 is returned to the position where the first filter pattern 110a and the first peripheral filter pattern 110b are formed. In the present embodiment, N is 2. That is, the mask 300 is moved in the second direction d2 by a distance of two sub-pixel pitches, i.e., a distance of the widths P of the two first peripheral filter patterns 110b, with respect to the second substrate 200. Then, the mask 300 is continuously moved by a distance of N × P in the second direction d2 with respect to the second substrate 200. In the present embodiment, N is 2. That is, the mask 300 is moved by a distance of two sub-pixel pitches, i.e., a distance of the widths P of the two first peripheral filter patterns 110b, in the second direction d2 relative to the second substrate 200, so that the mask 300 is aligned with the positions where the

third filter patterns

130a and 130b are to be formed. In the present embodiment, the second direction d2 is opposite to the first direction d 1. The moving step may be, for example, fixing the second substrate 200 and moving the mask 300 in the second direction d2, but not limited thereto. In other words, the moving step may be to fix the mask 300 and move the second substrate 200 in the first direction d1 opposite to the second direction d 2. Thereafter, the third filter layer is subjected to a patterning process using the mask 300. Since the third peripheral filter pattern 130b and the first peripheral filter pattern 110b are formed by using the same mask, the third peripheral filter pattern 130b has a width P equal to that of the first peripheral filter pattern 110b (the width of the third filter pattern 130a is the same, and thus the description thereof is omitted). However, the manner of forming the at least one third filter pattern 130a is not limited to the above-mentioned process. In other words, in another embodiment, another mask (not shown) may be used to form at least one third filter pattern 130a only in the display area AR (i.e., the third peripheral filter pattern 130b is not formed in the non-display area NR).

In this embodiment, the pitch of two adjacent first, second and

third filter patterns

110a, 120a and 130a is p, that is, the pitch of the sub-pixels is p, and the pitch of two adjacent first, second and third

peripheral filter patterns

110b, 120b and 130b is D, where D is n · p, and n is a positive integer. In this embodiment, n is 2, but not limited thereto.

In some embodiments, a black matrix (not shown) may be selectively disposed on the second substrate 200 before the filter patterns (the first filter pattern 110a, the second filter pattern 120a, and the third filter pattern 130a) and the peripheral filter patterns (the first peripheral filter pattern 110b, the second peripheral filter pattern 120b, and the third peripheral filter pattern 130b) are formed. The material of the black matrix may be, for example, a black resin, a metal having a low reflectance (e.g., chrome), or other suitable material. The black matrix may have a plurality of openings to expose the filter pattern and the peripheral filter pattern.

In the present embodiment, since the same mask 300 is used at least when forming the first filter pattern 110a and the first peripheral filter pattern 110b and the second filter pattern 120a and the second peripheral filter pattern 120b, it is not necessary to use a plurality of masks to form each color filter pattern. That is, the present invention can save the use of masks and thus reduce the manufacturing cost.

Referring to fig. 1E, at least one spacer 140a in the display region AR and at least one peripheral spacer 140b in the non-display region NR are formed. Forming the at least one spacer 140a and the at least one peripheral spacer 140b may, for example, comprise the following steps. First, a spacer layer (not shown) is formed on the second substrate 200. Then, a patterning process is performed on the spacer layer. The spacers 140a and the peripheral spacers 140b are, for example, Photo Spacers (PS). That is, the material of the spacer 140a and the peripheral spacer 140b is, for example, a photosensitive resin. At least one spacer 140a is disposed on at least one of the at least one first filtering pattern 110a, the at least one second filtering pattern 120a and the at least one third filtering pattern 130a, and at least one peripheral spacer 140b is disposed on at least one of the at least one first peripheral filtering pattern 110b and the at least one second peripheral filtering pattern 120 b. In this embodiment, at least one spacer 140a is disposed on at least one first filtering pattern 110a, and at least one peripheral spacer 140b is disposed on at least one first filtering pattern 110 b. In detail, the at least one spacer 140a is, for example, overlapped with the at least one first filtering pattern 110a, and the at least one peripheral spacer 140b is, for example, overlapped with the at least one first peripheral filtering pattern 110 b. In the present embodiment, the stacking order of the overlapped first filter patterns 110a and spacers 140a along the normal direction of the second substrate 200 is substantially the same as the stacking order of the overlapped first peripheral filter patterns 110b and spacers 140b along the normal direction of the second substrate 200. In one embodiment, the height of the first filter pattern 110a overlapping the spacer 140a is c1, and the height of the first peripheral filter pattern 110b overlapping the peripheral spacer 140b is c2, and c1 is substantially the same as c 2. In addition, in an embodiment, the height of the at least one spacer 140a and the first filter pattern 110a overlapped with each other is h1, and the height of the at least one peripheral spacer 140b and the at least one first peripheral filter pattern 110b overlapped with each other is h2, and h1 and h2 are substantially the same. In detail, the top surfaces of the spacers 140a are substantially aligned with (i.e., located at substantially equal heights) the top surfaces of the peripheral spacers 140 b.

In the present embodiment, the peripheral spacers 140b are disposed in the non-display area NR, and the spacers 140a and the peripheral spacers 140b are disposed on the filter layers (i.e., the first filter pattern 110a and the first peripheral filter pattern 110b) exposed by using the same mask 300 to expose the same color, because the heights of the filter layers exposed by using the same mask 300 to expose the same color are relatively consistent, the situation that the non-display area NR and the display area AR of the display panel are different from each other due to the misalignment between the top surfaces of the spacers 140a and the peripheral spacers 140b can be avoided.

Referring to fig. 1F, a sealant 150 is disposed on the second substrate 200. Specifically, the sealant 150 is disposed in the non-display area NR and surrounds the display area AR, for example. Moreover, the at least one first peripheral filter pattern 110b, the at least one second peripheral filter pattern 120b and the at least one peripheral spacer 130b are located in the sealant 150, but the invention is not limited thereto. In detail, in other embodiments, the sealant 150 may also be disposed on the first substrate 100. Then, a display medium layer 160 is disposed on the second substrate 200. In detail, the display medium layer 160 is filled in the space surrounded by the sealant 150 (i.e., located in the display area AR), for example. The display medium layer 160 may include non-self-luminescent materials such as: examples of liquid crystal molecules, electrophoretic display media, or other suitable media include, but are not limited to, liquid crystal molecules, electrophoretic display media, and other suitable media. In other embodiments, the display medium layer 160 may include self-emissive materials such as: inorganic, organic, or other suitable materials, or combinations of the foregoing, or combinations with non-self-emissive materials.

Referring to fig. 1G, the second substrate 200 is paired with the first substrate 100 to form the display panel 10 a. In the present embodiment, the at least one first filter pattern 110a, the at least one second filter pattern 120a and the at least one third filter pattern 130a are color filter elements 400 of the display panel 10a, and the at least one first peripheral filter pattern 110b, the at least one second peripheral filter pattern 120b and the at least one third peripheral filter pattern 130b are peripheral color filter elements 500 of the display panel 10a, but not limited thereto. The peripheral color filter element 500 may include at least two of at least one first peripheral filter pattern 110b, at least one second peripheral filter pattern 120b, and at least one third peripheral filter pattern 130 b. For example, the peripheral color filter element 500 may only include at least one first peripheral filter pattern 110b and at least one second peripheral filter pattern 120 b. The first substrate 100 may be, for example, a Thin Film Transistor (TFT) Array substrate, but is not limited thereto. In detail, the first substrate 100 may include, for example, a plurality of switching elements (not shown), a plurality of signal lines (not shown), and a plurality of pixel electrodes (not shown). The switching element may be, for example, various semiconductor elements. For example, the switching element is a semiconductor element such as a transistor or a diode, and the material of the switching element is, for example, polysilicon, single crystal silicon, nanocrystalline silicon, microcrystalline silicon, amorphous silicon, carbon nanotubes/rods, an organic semiconductor material, an oxide semiconductor, or other suitable materials, or a combination of the foregoing materials. In one embodiment, the switching element includes a gate, a source, a channel layer, and a drain. A gate insulating layer is disposed between the gate and the channel layer. The switching elements may be top-gate transistors, bottom-gate transistors, stereo channel transistors, or other suitable types. The signal line may be at least one of at least one scan line, at least one data line, at least one common electrode line, and at least one power supply line, for example. The signal line is electrically connected to the switching element, for example. For example, the scan line is electrically connected to the gate, the source and the drain are respectively electrically connected to the channel layer, the data line is electrically connected to the source, and the common electrode line is coupled to the pixel electrode and electrically connected to the drain. The pixel electrode can be electrically connected with the switch element. The pixel electrode can be, for example, a transmissive pixel electrode, a reflective pixel electrode, or a transflective pixel electrode. The transmissive pixel electrode may be a single layer or multiple layers, and the material of the transmissive pixel electrode includes indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium germanium zinc oxide, carbon nanotubes/rods, metal or alloy with a thickness of less than 60 angstroms, or other suitable materials. The reflective pixel electrode may be a single layer or multiple layers, and the material thereof includes metal, alloy, or other suitable materials.

Referring to fig. 2, fig. 2 is a schematic cross-sectional view of a display panel according to a second embodiment of the invention. The embodiment of fig. 2 is similar to the embodiment of fig. 1G and some elements and descriptions of fig. 2 and technical effects thereof are omitted, and reference is made to the above description for brevity. In the present embodiment, the widths P1 of the first, second and

third filter patterns

110a, 120a and 130a are respectively greater than the widths P2 of the first, second and third

peripheral filter patterns

110b, 120b and 130 b. In addition, in the present embodiment, by adjusting the distance that the mask 300 moves during the patterning process (please refer to the embodiments shown in fig. 1B to 1D), the filter patterns and the peripheral filter patterns can have the following configuration relationship: the third filtering pattern 130b located in the non-display area NR partially overlaps the first filtering pattern 110b, and the third filtering pattern 130a located in the display area AR is located between the first filtering pattern 110a and the second filtering pattern 120 a. In addition, in the present embodiment, at least one spacer 140a is disposed on at least one second filter pattern 120a, and at least one peripheral spacer 140b is disposed on at least one second peripheral filter pattern 120 b. In detail, the at least one spacer 140a is, for example, overlapped with the at least one second filtering pattern 120a, and the at least one peripheral spacer 140b is, for example, overlapped with the at least one second peripheral filtering pattern 120 b. In the present embodiment, the stacking sequence of the overlapped second filter patterns 120a and spacers 140a along the normal direction of the second substrate 200 is substantially the same as the stacking sequence of the overlapped second peripheral filter patterns 120b and spacers 140b along the normal direction of the second substrate 200. In one embodiment, the height of the second filter pattern 120a overlapping with the spacer 140a is c3, and the height of the second peripheral filter pattern 120b overlapping with the peripheral spacer 140b is c4, and c3 is substantially the same as c 4. In addition, in one embodiment, the height of the at least one overlapped spacer 140a and the second filter pattern 120a is h3, and the height of the at least one overlapped peripheral spacer 140b and the at least one overlapped second peripheral filter pattern 120b is h4, and h3 and h4 are substantially the same. In detail, the top surfaces of the spacers 140a are substantially aligned with (i.e., located at substantially equal heights) the top surfaces of the peripheral spacers 140 b.

In some embodiments, a pitch of two adjacent first, second, and

third filtering patterns

110a, 120a, and 130a is p, that is, a sub-pixel pitch is p, and a pitch of two adjacent first, second, and third filtering patterns 130b is D, where D is n · p, and n is a positive integer. In this embodiment, n is 1, but not limited thereto.

Referring to fig. 3, fig. 3 is a schematic cross-sectional view of a display panel according to a third embodiment of the invention. The embodiment of fig. 3 is similar to the embodiment of fig. 1G and some elements and descriptions of fig. 3 and technical effects thereof are omitted, and reference is made to the above description for brevity. In the present embodiment, the widths P3 of the first, second and

third filter patterns

110a, 120a and 130a are respectively greater than the widths P4 of the first, second and third

peripheral filter patterns

110b, 120b and 130 b. In addition, in the present embodiment, by adjusting the distance that the mask 300 moves during the patterning process (please refer to the embodiments shown in fig. 1B to 1D), the filter patterns and the peripheral filter patterns can have the following configuration relationship: for example, the third peripheral filter pattern 130b located in the non-display area NR partially overlaps the first peripheral filter pattern 110b, the second filter pattern 120a located in the display area AR partially overlaps the first filter pattern 110a, and the third filter pattern 130a located in the display area AR partially overlaps the first filter pattern 110a and the second filter pattern 120 a. In addition, in the present embodiment, at least one spacer 140a is disposed on at least one third filtering pattern 130a, and at least one peripheral spacer 140b is disposed on at least one third filtering pattern 130 b. In detail, the at least one spacer 140a is, for example, overlapped with the at least one third filtering pattern 130a and the at least one first filtering pattern 110a (i.e., located on the third filtering pattern 130a partially overlapped with the first filtering pattern 110 a), and the at least one peripheral spacer 140b is, for example, overlapped with the at least one third filtering pattern 130b and the at least one first peripheral filtering pattern 110b (i.e., located on the third filtering pattern 130b partially overlapped with the first peripheral filtering pattern 11 b). In the present embodiment, the stacking sequence of the overlapped first filter pattern 110a, the third filter pattern 130a and the spacers 140a along the normal direction of the second substrate 200 is substantially the same as the stacking sequence of the overlapped first peripheral filter pattern 110b, the third peripheral filter pattern 130b and the spacers 140b along the normal direction of the second substrate 200. In one embodiment, the height of the third filter pattern 130a overlapping the spacer 140a and the first filter pattern 110a is c5, and the height of the third peripheral filter pattern 130b overlapping the peripheral spacer 140b and the first peripheral filter pattern 110b is c6, and c5 and c6 are substantially the same. In addition, in one embodiment, the height of the overlapped spacers 140a, the third filter pattern 130a and the first filter pattern 110a is h5, and the height of at least one of the overlapped spacers 140b, the third filter pattern 130b and the first filter pattern 110b is h6, and h5 and h6 are substantially the same. In detail, the top surfaces of the spacers 140a are substantially aligned with (i.e., located at substantially equal heights) the top surfaces of the peripheral spacers 140 b.

In some embodiments, a pitch of adjacent two of the first, second, and

third filtering patterns

110a, 120a, and 130a is p, that is, a pitch of the sub-pixels is p, and a pitch of adjacent two of the first, second, and third filtering patterns 130b is D, where D is n · p, and n is a positive integer. In this embodiment, n is 1, but not limited thereto.

In the above embodiment, the first peripheral filter pattern 110b, the second peripheral filter pattern 120b and the third peripheral filter pattern 130b are disposed in the sealant 150, but not limited thereto, for example, the sealant 150 may also be disposed with only the first peripheral filter pattern 110b and the third peripheral filter pattern 130b without the second peripheral filter pattern 120 b.

Referring to fig. 4, fig. 4 is a schematic cross-sectional view illustrating a display panel according to a fourth embodiment of the invention. The embodiment of fig. 4 is similar to the embodiment of fig. 1G and some elements and descriptions of fig. 4 and technical effects thereof are omitted, and reference is made to the above description for brevity. In the present embodiment, the widths P5 of the first, second and

third filter patterns

110a, 120a and 130a are respectively greater than the widths P6 of the first, second and third

peripheral filter patterns

110b, 120b and 130 b. In addition, in the present embodiment, by adjusting the distance that the mask 300 moves during the patterning process (please refer to the embodiments shown in fig. 1B to 1D), the filter patterns and the peripheral filter patterns can have the following configuration relationship: the first, second and third

peripheral filter patterns

110b, 120b and 130b located in the non-display region NR are alternately arranged in sequence, and the first, second and

third filter patterns

110a, 120a and 130a located in the display region AR are alternately arranged in sequence. In addition, in the present embodiment, at least one spacer 140a is disposed on at least one third filtering pattern 130a, and at least one peripheral spacer 140b is disposed on at least one third filtering pattern 130 b. In detail, the at least one spacer 140a is, for example, overlapped with the at least one third filtering pattern 130a, and the at least one peripheral spacer 140b is, for example, overlapped with the at least one third filtering pattern 130 b. In one embodiment, the height of the third filter pattern 130a overlapping the spacer 140a is c7, and the height of the third peripheral filter pattern 130b overlapping the peripheral spacer 140b is c8, and c7 is substantially the same as c 8. In addition, in one embodiment, the height of the overlapped spacers 140a and the third filter pattern 130a is h7, and the height of the overlapped spacers 140b and the third filter pattern 130b is h8, and h7 and h8 are substantially the same. In detail, the top surfaces of the spacers 140a are substantially aligned with (i.e., located at substantially equal heights) the top surfaces of the peripheral spacers 140 b.

In some embodiments, a pitch of adjacent two of the first, second, and

third filtering patterns

In summary, since the same mask is used for forming at least the first filter pattern and the first peripheral filter pattern and the second peripheral filter pattern, it is not necessary to use a plurality of masks to form each color filter pattern. That is, the present invention can save the use of masks and thus reduce the manufacturing cost. In addition, because the filter patterns arranged in the display area and the peripheral filter patterns arranged in the non-display area have similar arrangement relationship, and the spacers and the peripheral spacers are arranged on the filter patterns exposed by using the same mask to expose the same color, and because the heights of the filter patterns exposed by using the same mask to expose the same color are relatively consistent, the condition that the non-display area and the display area have height difference in a subsequent assembled display panel due to the fact that the top surfaces of the spacers and the peripheral spacers are not aligned can be avoided.

Although the present invention has been described with reference to the above embodiments, it should be understood that various changes and modifications can be made therein by those skilled in the art without departing from the spirit and scope of the invention.

Claims

1. A display panel comprises a display area and a non-display area, and the display panel comprises:

a first substrate;

a second substrate arranged opposite to the first substrate;

a display medium layer arranged in the display region and between the first substrate and the second substrate;

a color filter element disposed between the first substrate and the second substrate and located in the display region, the color filter element including at least one first filter pattern, at least one second filter pattern, and at least one third filter pattern;

a peripheral color filter element disposed between the first substrate and the second substrate and located in the non-display region, the peripheral color filter element including at least two of at least one first peripheral filter pattern, at least one second peripheral filter pattern, and at least one third peripheral filter pattern;

the frame glue is arranged between the first substrate and the second substrate, is positioned in the non-display area and surrounds the display medium layer;

at least one spacer disposed on at least one of the first filter pattern, the second filter pattern and the third filter pattern; and

at least one peripheral spacer disposed on at least one of the first, second and third peripheral filter patterns, wherein the peripheral color filter element and the at least one peripheral spacer are disposed in the sealant,

wherein the height of the overlapped color filter element and the at least one spacer is substantially the same as the height of the overlapped peripheral color filter element and the at least one peripheral spacer,

the distance between two adjacent ones of the at least one first filtering pattern, the at least one second filtering pattern and the at least one third filtering pattern is p, the distance between two adjacent ones of the at least one first peripheral filtering pattern, the at least one second peripheral filtering pattern and the at least one third peripheral filtering pattern is D, D is n.p, and n is a positive integer.

2. The display panel of claim 1, wherein a stacking order of the color filter elements and the at least one spacer stacked together along a normal direction of the display panel is substantially the same as a stacking order of the peripheral color filter elements and the at least one peripheral spacer stacked together along the normal direction of the display panel.

3. The display panel of claim 2, wherein the color filter elements in superimposition with the spacers comprise the at least one first filter pattern, and the peripheral color filter elements in superimposition with the peripheral spacers comprise the at least one first peripheral filter pattern, the first filter pattern being the same color as the at least one first peripheral filter pattern.

4. The display panel of claim 2, wherein the color filter elements in superimposition with the spacers include the at least one first filter pattern and the at least one second filter pattern, the peripheral color filter elements in superimposition with the peripheral spacers include the at least one first peripheral filter pattern and the at least one second peripheral filter pattern, the first filter pattern and the at least one first peripheral filter pattern are the same color, and the at least one second filter pattern and the at least one second peripheral filter pattern are the same color.

5. The display panel of claim 1, wherein the spacers comprise a photosensitive resin.

6. The display panel of claim 1, wherein a height of the color filter elements in superimposition with the gaps and a height of the peripheral color filter elements in superimposition with the peripheral gaps are substantially the same.

7. The display panel of claim 1, wherein the peripheral color filter elements include the at least one first peripheral filter pattern, the at least one second peripheral filter pattern, and the at least one third peripheral filter pattern.

8. The display panel of claim 1, wherein the first, second and third filter patterns are different in color and the color is selected from the group consisting of red, green and blue.

9. The display panel of claim 1, wherein the first filter pattern has a same color as the first peripheral filter pattern, the second filter pattern has a same color as the second peripheral filter pattern, and the third filter pattern has a same color as the third peripheral filter pattern.

10. A manufacturing method of a display panel, the display panel including a display area and a non-display area, the manufacturing method comprising:

providing a first substrate and a second substrate;

forming at least one first filtering pattern in the display area and at least one first peripheral filtering pattern in the non-display area on the second substrate through a mask;

forming at least one second light filtering pattern in the display region and at least one second peripheral light filtering pattern in the non-display region on the second substrate through the mask;

forming at least one third light filtering pattern in the display area and at least one third peripheral light filtering pattern in the non-display area;

forming at least one spacer in the display region and at least one peripheral spacer in the non-display region, the at least one spacer being located on at least one of the at least one first filtering pattern, the at least one second filtering pattern and the at least one third filtering pattern, the at least one peripheral spacer being located on at least one of the at least one first peripheral filtering pattern and the at least one second peripheral filtering pattern;

arranging a frame glue on the first substrate or the second substrate, wherein the frame glue is positioned in the non-display area and surrounds the display area; and

the second substrate is paired with the first substrate, wherein the at least one first peripheral filter pattern, the at least one second peripheral filter pattern and the at least one peripheral spacer are located in the sealant,

wherein the at least one spacer overlaps the at least one first filtering pattern, the at least one peripheral spacer overlaps the at least one first filtering pattern, the height of the at least one spacer and the first filtering pattern being substantially the same as the height of the at least one peripheral spacer and the at least one first filtering pattern,

11. The method according to claim 10, wherein the step of forming the at least one third filter pattern in the display area comprises:

and forming the at least one third light filtering pattern in the display area and the at least one third peripheral light filtering pattern in the non-display area through the mask.

12. The method according to claim 10, wherein the at least one spacer overlaps the at least one first filtering pattern and the at least one second filtering pattern, the at least one peripheral spacer overlaps the at least one first filtering pattern and the at least one second filtering pattern, and a height of the at least one spacer, the at least one first filtering pattern, and the at least one second filtering pattern is substantially the same as a height of the at least one peripheral spacer, the at least one first filtering pattern, and the at least one second filtering pattern.