CN109211804A - A kind of production method and device of self-assembly structure - Google Patents
A kind of production method and device of self-assembly structure Download PDFInfo
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- 238000001338 self-assembly Methods 0.000 title claims abstract description 56
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 68
- 239000002105 nanoparticle Substances 0.000 claims abstract description 46
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 31
- 239000010415 colloidal nanoparticle Substances 0.000 claims abstract description 11
- 238000009415 formwork Methods 0.000 claims description 42
- 238000003491 array Methods 0.000 claims description 13
- 238000012545 processing Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 8
- 239000011343 solid material Substances 0.000 claims description 7
- 238000004140 cleaning Methods 0.000 claims description 6
- 238000005516 engineering process Methods 0.000 claims description 6
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 5
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims description 5
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 5
- 230000001276 controlling effect Effects 0.000 claims description 4
- 230000001105 regulatory effect Effects 0.000 claims description 4
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims description 3
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 claims description 3
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 229920005573 silicon-containing polymer Polymers 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 241000209094 Oryza Species 0.000 description 5
- 235000007164 Oryza sativa Nutrition 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 235000009566 rice Nutrition 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- -1 polydimethylsiloxane Polymers 0.000 description 3
- 150000003384 small molecules Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000015271 coagulation Effects 0.000 description 2
- 238000005345 coagulation Methods 0.000 description 2
- 238000002493 microarray Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 235000003283 Pachira macrocarpa Nutrition 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 240000001085 Trapa natans Species 0.000 description 1
- 235000014364 Trapa natans Nutrition 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 235000009165 saligot Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N2021/258—Surface plasmon spectroscopy, e.g. micro- or nanoparticles in suspension
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
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Abstract
The embodiment of the invention discloses the production methods and device of a kind of self-assembly structure, comprising: A, obtains a substrate for being provided with hydrophilic region and hydrophobic region；B, colloidal nanoparticle solution is dropped in the substrate, so that nanoparticle forms self-assembled structures in the hydrophilic region.By upper, the application may be implemented to be precisely controlled self-assembly position, and simple to operation.
Description
Technical field
The present invention relates to field of nanometer material technology, and in particular to a kind of production method and dress of self-assembly microarray
It sets.
Background technique
Nanoparticle (such as gold nanorods) is adsorbed on the substance meeting at its interface to the absorption quite sensitive of small molecule around
The variation for causing its surface plasma resonance frequency is embodied in the change of the optical signals such as light absorption and Surface enhanced Raman spectroscopy
Change, therefore the unmarked highly sensitive inspection to molecule may be implemented using nanoparticle as a kind of sensing element building sensor
It surveys, has played important function in small molecule detection field.Small molecule is detected there are mainly two types of in the way of by nanoparticle, it is a kind of
It is to be detected under solution environmental, one is nanoparticle is assembled on interface to detect.It is detected under solution environmental
Directly completed using colloidal nanoparticles, it is convenient and easy without doing more processing to nanoparticle, but received in solution state
Rice corpuscles is easy to be influenced by outside environmental elements and coagulation occurs, and can not be widely used in Molecular Detection.
By nanoparticle be assembled on interface carry out Molecular Detection it is possible to prevente effectively from nanoparticle coagulation bring influence,
It is solvent evaporated method that nanoparticle is fixed on to the method for being easiest to implement on interface at present, and solvent evaporated method is to receive colloid
Rice corpuscles solution drips in solid substrate, and as solvent evaporates, nanoparticle, which stays in, completes self assembly in substrate.But it utilizes molten
Nanoparticle is assembled in substrate the assembled position that can not be precisely controlled nanoparticle by agent evaporation.
Therefore, the production method and device of a kind of self-assembly structure are needed, at present to realize to nanoparticle
The accurate control of self assembly position.
Summary of the invention
In view of this, the main purpose of the present invention is to provide a kind of production method of self-assembly structure and
Device, to realize the accurate control to self-assembly position.
The present invention provides a kind of production method of self-assembly structure, comprising:
A, the substrate that a surface is provided with hydrophilic region and hydrophobic region is obtained；
B, colloidal nanoparticle solution is dropped in the substrate, so that nanoparticle is formed in the hydrophilic region from group
Assembling structure.
By upper, nanoparticle is evaporated self assembly in the hydrophilic region, forms self-assembled structures, may be implemented to receiving
The accurate control of rice corpuscles self assembly position.
Preferably, the step A, comprising:
A1, the hydrophobic Flexible formwork assembly that a bottom is plane is obtained；
A2, recess or hollowed out area are etched with by Soft lithograph technology in the Flexible formwork assembly bottom；
It A3, using a hydrophilic upper surface is planar solid material as substrate, and by the upper surface of the substrate and described
After the lower surface of Flexible formwork assembly passes through plasma cleaning, the bottom of the Flexible formwork assembly is bonded with the upper surface of the substrate；
A4, the Flexible formwork assembly and the substrate after fitting are separated so that the upper surface of the substrate formed it is hydrophilic
Region and hydrophobic region.
By upper, interfacial wettability modification is carried out to upper surface of substrate through the above steps, to obtain surface
Substrate with hydrophilic region and hydrophobic region, and the process is simple and convenient.And template bottom can be with by the processing of Soft lithograph
Obtain recess or the hollowed out area of the very small dimensions such as micron, nanometer be micro-.The corresponding region is hydrophilic region in substrate, namely
The self assembly region of nanoparticle advantageously allows nanoparticle self assembly in the region of the very small dimensions such as micron, micro-nano.
Above-mentioned substrate can be glass, be also possible to other solid materials.
Preferably, the recess of the Flexible formwork assembly bottom or hollowed out area are as follows:
The single region being arranged according to specified size；
The multiple area arrays of the same size being arranged according to specified size；Or
The multiple area arrays of different sizes being arranged according to specified size.
By upper, the shape in region can be any shape, such as round, and rectangular, diamond shape etc. is also possible to single region
Either area array.Size also can according to need setting.
Preferably, the step B further include:
According to the micro-nano self-assembled structures of required acquisition, regulate and control the temperature of the environment in the self-assembly region
And the concentration of humidity and the nano-particle solution.
Temperature and humidity and the nanoparticle by upper, by the environment in the regulation self-assembly region
The concentration of sub- solution, the micro-nano self-assembled structures of available required different shape.
The application also provides a kind of producing device of self-assembly structure, comprising:
One surface has the substrate of hydrophilic region and hydrophobic region；
One drops to colloidal nanoparticle solution the structure in the substrate.
By upper, by above-mentioned apparatus, nanoparticle forms self-assembled structures in the hydrophilic region, may be implemented to nanometer
The accurate control of particle self assembly position.
Preferably, the producing device, the surface have the production component packet of the substrate of hydrophilic region and hydrophobic region
It includes:
One bottom is the hydrophobic Flexible formwork assembly of plane；Wherein, the Flexible formwork assembly bottom etching has recess or hollow out
Region；
One upper surface is the hydrophilic substrate of planar solid material；
One plasma surface processing instrument, for passing through the lower surface of the upper surface of the substrate and the Flexible formwork assembly
Ion Cleaning so that the bottom of the Flexible formwork assembly be temporarily bonded with the upper surface of the substrate and when the two is separated with
So that the surface of the substrate has hydrophilic region and hydrophobic region.
By upper, by above structure, when substrate and Flexible formwork assembly fit together, recess or hollowed out area in template with
Substrate does not contact, and after separating (tear template after), can remain mould material with without recess or the substrate contacted without hollowed out area
The nano-level thin-membrane of formation, this film is hydrophobic, therefore hydrophobic region and hydrophilic region are produced in substrate, and simple
Fast.And recess or vacancy section of the template bottom by the very small dimensions such as the available micron of processing of Soft lithograph, nanometer be micro-
Domain.The corresponding region is the self assembly region of hydrophilic region namely nanoparticle in substrate, advantageously allows nanoparticle and exists
Self assembly in micron, the region of very small dimensions such as nanometer is micro-.
Preferably, the recess of the Flexible formwork assembly bottom or hollowed out area are as follows:
The single region being arranged according to specified size；
The multiple area arrays of the same size being arranged according to specified size；Or
The multiple area arrays of different sizes being arranged according to specified size.
By upper, the shape in region can be any shape, such as round, and rectangular, diamond shape etc. is also possible to single region
Either area array.Size also can according to need setting.
Preferably, when the area array is the array being made of border circular areas, the diameter of the border circular areas is extremely
Few includes but is not limited to following first, 10 μm, 15 μm, 20 μm or 25 μm.
By upper, the size of the diameter of border circular areas is not limited to above-mentioned diameter, needs others to size according to specific
The adjustment done is ok, all within the scope of protection of this application.
Preferably, the producing device, further includes:
Temperature humidity adjuster, the temperature and humidity of the environment in the self assembly region for regulating and controlling the nanoparticle.
Temperature and humidity and the nanoparticle by upper, by the environment in the regulation self-assembly region
The concentration of sub- solution, the micro-nano self-assembled structures of available required different shape.
Preferably, the Flexible formwork assembly is by polydimethylsiloxane or polymetylmethacrylate material system
At Flexible formwork assembly.
By upper, soft etching processing, this Shen is may be implemented in polydimethylsiloxane or polymetylmethacrylate
Flexible formwork assembly please can also be any template material for being able to carry out soft etching processing.
In conclusion the production method and producing device of the self-assembly structure of the application may be implemented to nanometer
The accurate control of particle self assembly position, and the self-assembly structure of uniform required size can be generated, and
The self-assembly structure of microsize can be generated.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is this hair
Bright some embodiments for those of ordinary skill in the art without any creative labor, can be with
It obtains other drawings based on these drawings.
Fig. 1 is a kind of flow diagram of the production method of self-assembly structure of the embodiment of the present invention；
Fig. 2 is colloidal nanoparticle solution is dropped to surface being provided with hydrophilic region and hydrophobic region for the embodiment of the present invention
Substrate schematic diagram；
Fig. 3 is that the nanoparticle of the embodiment of the present invention (is provided with hydrophilic region and dredges after interfacial wettability modification
Water area) planar substrates over-assemble complete schematic diagram；
Fig. 4 is a kind of structural schematic diagram of the producing device of self-assembly structure of the embodiment of the present invention；
Fig. 5 is the structural schematic diagram of the Flexible formwork assembly of the embodiment of the present invention；
Fig. 6 is the structural schematic diagram of the embodiment of the present invention.
Specific embodiment
In order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below in conjunction with the embodiment of the present invention
In attached drawing, technical scheme in the embodiment of the invention is clearly and completely described, it is clear that described embodiment is
A part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art
Every other embodiment obtained without creative efforts belongs to the section that the present invention protects.
Embodiment one
As shown in Figure 1, the present invention provides a kind of production method of self-assembly structure, comprising:
S101 obtains the substrate that a surface is provided with hydrophilic region and hydrophobic region；
S1011 obtains the hydrophobic Flexible formwork assembly that a bottom is plane；Wherein, the Flexible formwork assembly can be by poly- two
Template made of methylsiloxane PDMS or polymetylmethacrylate material.The Flexible formwork assembly of the application can also be energy
Enough carry out any template material of soft etching processing.
S1012 obtains the Flexible formwork assembly that a bottom is etched with recess or hollowed out area by Soft lithograph technology.Specifically
:
S1012.1 obtains the silicon template that there is micro-structure on a surface；The wafer that silicon template is 4 inches, by photoetching and etching
Technique obtains micro-structure in its surface etch；Wherein the micro-structure may is that the single region being arranged according to specified size；
The multiple area arrays of the same size being arranged according to specified size；Or according to the multiple of different sizes of specified size setting
Area array.The shape in region can be any shape, such as round, rectangular, diamond shape etc., be also possible to single region or
It is area array.Size also can according to need setting.
S1012.2 transfers to obtain the Flexible formwork assembly by the silicon template.Wherein, the bottom of the Flexible formwork assembly
Recess or hollowed out area are complementary with the micro-structure in silicon template, i.e., the structure in silicon template is protrusion, then on Flexible formwork assembly
Structure is recess；Structure in silicon template is recess, then the structure on Flexible formwork assembly is protrusion, and specific structure can be with are as follows: according to
The single region of specified size setting；The multiple area arrays of the same size being arranged according to specified size；Or according to finger
Multiple area arrays of different sizes of scale cun setting.The shape in region can be any shape, such as round, rectangular, water chestnut
Shape etc. is also possible to single region either area array.Size also can according to need setting.
One hydrophilic upper surface is planar solid material as substrate by S1013, and by the upper surface of the substrate and institute
The lower surface of Flexible formwork assembly is stated by the way that after plasma cleaning, the bottom of the template is bonded with the upper surface of the substrate.
S1014, by after fitting the Flexible formwork assembly and the substrate separate (tearing Flexible formwork assembly) so that the substrate
Upper surface form hydrophilic region and hydrophobic region.
Interfacial wettability modification is carried out to upper surface of substrate through the above steps, so that obtaining surface has parent
The substrate of water area and hydrophobic region, and the process is simple and convenient.And template bottom is available micro- by the processing of Soft lithograph
Rice, the recess for the very small dimensions such as nanometer is micro- or hollowed out area.The corresponding region is hydrophilic region namely nanoparticle in substrate
The self assembly region of son, advantageously allows nanoparticle self assembly in the region of the very small dimensions such as micron, micro-nano.
S102 drops to colloidal nanoparticle solution in the substrate, according to the micro-nano self-assembled structures of required acquisition,
Regulate and control the temperature and humidity of the environment in the self-assembly region and the concentration of the nano-particle solution, so that
Nanoparticle forms self-assembled structures in the hydrophilic region.
After colloidal nanoparticle solution is dropped in the substrate, nanoparticle forms self assembly in the hydrophilic region
The accurate control to self-assembly position may be implemented in structure.And by regulating and controlling the self-assembly region
Environment temperature and humidity and the nano-particle solution concentration, required for available it is different it is micro-nano from
Package assembly.
Specifically, as shown in Fig. 2, being provided with hydrophilic region and hydrophobic region for colloidal nanoparticle solution is dropped to surface
Substrate schematic diagram；Wherein, 21 nanoparticle is indicated；22 indicate substrate；23 indicate hydrophilic region；24 indicate hydrophobic region.
(nanoparticle uses gold nanorods in the present embodiment, is a kind of nanocrystal, has axially and radially two dimensions,
It is gold nanorods used in this specific embodiment, but is not limited to gold nanorods, any nanoparticle is all of the invention
Within protection scope)
As shown in figure 3, (being provided with hydrophilic region and hydrophobic region) after interfacial wettability modification for nanoparticle
Planar substrates over-assemble complete schematic diagram.Wherein, the self-assembled structures of 31 expression nanoparticles；32 indicate substrate.
In conclusion the production method and producing device of the self-assembly structure of the application may be implemented to nanometer
The accurate control of particle (such as gold nanorods) self assembly position, and the nanoparticle of uniform required size can be generated
Self-assembled structures, and the self-assembly structure of microsize can be generated.
Embodiment two
As shown in figure 4, the application also provides a kind of producing device of self-assembly structure, comprising:
One surface has the substrate 41 of hydrophilic region and hydrophobic region；
Structure that colloidal nanoparticle solution drops in the substrate (can be dropper or liquid-transfering gun, in figure not by one
It shows).
By above-mentioned apparatus, nanoparticle forms self-assembled structures in the hydrophilic region, may be implemented to nanoparticle
The accurate control of self assembly position.
The producing device of the application, the surface have the production component packet of the substrate of hydrophilic region and hydrophobic region
It includes:
As shown in figure 5, a bottom is the hydrophobic Flexible formwork assembly 51 of plane；Wherein, the template bottom etching has recess
Or hollowed out area 52；Wherein, the recess of the template bottom or hollowed out area are as follows: according to the single of specified size setting
Region；The multiple area arrays of the same size being arranged according to specified size；Or the multiple sizes being arranged according to specified size
Different area arrays.The shape in region can be any shape, such as round, and rectangular, diamond shape etc. is also possible to single area
Domain either area array.Size also can according to need setting.Wherein, as shown in figure 5, wherein when the area array is served as reasons
When the array of border circular areas composition, the diameter of the border circular areas be include, but is not limited to it is following first, 10 μm, 15 μm,
20 μm or 25 μm.Wherein, the size of the diameter of border circular areas is not limited to above-mentioned diameter, needs others right according to specific
The adjustment that size is done is ok, all within the scope of protection of this application.
Realization of the region of the diameter most beneficial for self-assembly.Wherein, the Flexible formwork assembly is by poly- diformazan
Template made of radical siloxane PDMS or polymetylmethacrylate material.The Flexible formwork assembly of the application can also be can
Carry out any template material of soft etching processing.
As shown in fig. 6, a upper surface is the hydrophilic substrate 61 of planar solid material；
One plasma surface processing instrument (not shown), for the upper surface of the substrate to be passed through plasma cleaning,
So that the bottom of the template is temporarily bonded and when the two separates so that the substrate with the upper surface of the substrate
Surface has hydrophilic region and hydrophobic region.
By above structure, available surface has the substrate of hydrophilic region and hydrophobic region, and method is simply, just
It is prompt.And recess or hollowed out area of the template bottom by the very small dimensions such as the available micron of processing of Soft lithograph, nanometer be micro-.
The corresponding region is the self assembly region of hydrophilic region namely nanoparticle in substrate, advantageously allows nanoparticle micro-
Self assembly in rice, the region of very small dimensions such as nanometer is micro-.
Wherein, the producing device, further includes:
Temperature humidity adjuster, the temperature and humidity of the environment in the self assembly region for regulating and controlling the nanoparticle.It is logical
Cross the temperature and humidity of the environment in the self-assembly region and the concentration of the nano-particle solution, it can
To obtain required different micro-nano self-assembled structures.
In conclusion the production method and producing device of the self-assembly structure of the application may be implemented to nanometer
The accurate control of particle self assembly position, and the self-assembly structure of uniform required size can be generated, and
The self-assembly structure of microsize can be generated.Self-assembly microarray produced by the present invention increases on surface
Strong Raman scattering, electrical testing, cell directional adherent growth and bio-sensing etc. have high application value.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all in essence of the invention
Within mind and principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
Claims (10)
1. a kind of production method of self-assembly structure characterized by comprising
A, a substrate for being provided with hydrophilic region and hydrophobic region is obtained；
B, colloidal nanoparticle solution is dropped in the substrate, so that nanoparticle forms self assembly knot in the hydrophilic region
Structure.
2. manufacturing method according to claim 1, which is characterized in that the step A, comprising:
A1, the hydrophobic Flexible formwork assembly that a bottom is plane is obtained；
A2, recess or hollowed out area are etched with by Soft lithograph technology in the Flexible formwork assembly bottom；
It A3, using a hydrophilic upper surface is planar solid material as substrate, and by the upper surface of the substrate and the flexibility
After the lower surface of template passes through plasma cleaning, the bottom of the Flexible formwork assembly is bonded with the upper surface of the substrate；
A4, the Flexible formwork assembly and the substrate after fitting are separated, so that the upper surface of the substrate forms hydrophilic region
And hydrophobic region.
3. production method according to claim 2, which is characterized in that the recess of the Flexible formwork assembly bottom or vacancy section
Domain are as follows:
The single region being arranged according to specified size；
The multiple area arrays of the same size being arranged according to specified size；Or
The multiple area arrays of different sizes being arranged according to specified size.
4. manufacturing method according to claim 1, which is characterized in that the step B further include:
According to the micro-nano self-assembled structures of required acquisition, regulate and control the temperature of the environment in the self-assembly region and wet
The concentration of degree and the nano-particle solution.
5. a kind of producing device of self-assembly structure characterized by comprising
One surface has the substrate of hydrophilic region and hydrophobic region；
One drops to colloidal nanoparticle solution the structure in the substrate.
6. producing device according to claim 5, which is characterized in that the surface has hydrophilic region and hydrophobic region
The production component of substrate includes:
One bottom is the hydrophobic Flexible formwork assembly of plane；Wherein, the Flexible formwork assembly bottom is etched with recessed by soft etching technology
Sunken or hollowed out area；
One upper surface is the hydrophilic substrate of planar solid material；
One plasma surface processing instrument, for the lower surface of the upper surface of the substrate and the Flexible formwork assembly to be passed through plasma
Cleaning so that the bottom of the Flexible formwork assembly be temporarily bonded with the upper surface of the substrate and when the two separates so that
The surface of the substrate has hydrophilic region and hydrophobic region.
7. producing device according to claim 6, which is characterized in that the recess of the Flexible formwork assembly bottom or vacancy section
Domain are as follows:
The single region being arranged according to specified size；
The multiple area arrays of the same size being arranged according to specified size；Or
The multiple area arrays of different sizes being arranged according to specified size.
8. producing device according to claim 7, which is characterized in that when the area array is made of border circular areas
When array, the diameter of the border circular areas is following first, 10 μm, 15 μm, 20 μm or 25 μm to include, but is not limited to.
9. producing device according to claim 5, which is characterized in that further include:
Temperature humidity adjuster, the temperature and humidity of the environment in the self assembly region for regulating and controlling the nanoparticle.
10. producing device according to claim 6, which is characterized in that the Flexible formwork assembly is by dimethyl silicone polymer
Flexible formwork assembly made of PDMS or polymetylmethacrylate material.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112442101A (en) * | 2019-09-05 | 2021-03-05 | 华为技术有限公司 | Method and apparatus for synthesizing oligonucleotide |
| CN113189680A (en) * | 2021-04-28 | 2021-07-30 | 太原理工大学 | Three-dimensionally arranged nanoparticle film array structure and preparation method and application thereof |
| CN114471397A (en) * | 2021-12-22 | 2022-05-13 | 天津大学 | Nucleic acid synthesis-oriented microreactor array chip and preparation method thereof |
| CN116626986A (en) * | 2023-05-31 | 2023-08-22 | 西华大学 | Preparation method of novel photoetching plate |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN209513602U (en) * | 2018-09-26 | 2019-10-18 | 天津大学 | A kind of producing device of self-assembly structure |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN209513602U (en) * | 2018-09-26 | 2019-10-18 | 天津大学 | A kind of producing device of self-assembly structure |
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| SHUANG WANG ET AL: "Precisely Lateral Alignment of Gold Nanorods Array via Hydrophilic-Hydrophobic Pattern" * |
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| CN112442101A (en) * | 2019-09-05 | 2021-03-05 | 华为技术有限公司 | Method and apparatus for synthesizing oligonucleotide |
| CN113189680A (en) * | 2021-04-28 | 2021-07-30 | 太原理工大学 | Three-dimensionally arranged nanoparticle film array structure and preparation method and application thereof |
| CN114471397A (en) * | 2021-12-22 | 2022-05-13 | 天津大学 | Nucleic acid synthesis-oriented microreactor array chip and preparation method thereof |
| CN114471397B (en) * | 2021-12-22 | 2024-04-02 | 天津大学 | Micro-reactor array chip for nucleic acid synthesis and preparation method thereof |
| CN116626986A (en) * | 2023-05-31 | 2023-08-22 | 西华大学 | Preparation method of novel photoetching plate |
| CN116626986B (en) * | 2023-05-31 | 2024-09-03 | 西华大学 | Preparation method of novel photoetching plate |
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