CN116626986A - Preparation method of novel photoetching plate - Google Patents
Preparation method of novel photoetching plate Download PDFInfo
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- CN116626986A CN116626986A CN202310633466.4A CN202310633466A CN116626986A CN 116626986 A CN116626986 A CN 116626986A CN 202310633466 A CN202310633466 A CN 202310633466A CN 116626986 A CN116626986 A CN 116626986A
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- 238000001259 photo etching Methods 0.000 title claims abstract description 25
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- 239000002105 nanoparticle Substances 0.000 claims abstract description 45
- 238000000034 method Methods 0.000 claims abstract description 44
- 239000000758 substrate Substances 0.000 claims abstract description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 33
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 21
- 229920000642 polymer Polymers 0.000 claims abstract description 14
- 239000002245 particle Substances 0.000 claims abstract description 10
- 238000007641 inkjet printing Methods 0.000 claims abstract description 9
- 239000000178 monomer Substances 0.000 claims abstract description 9
- 238000004140 cleaning Methods 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- 238000010146 3D printing Methods 0.000 claims abstract description 7
- 239000007788 liquid Substances 0.000 claims abstract description 4
- 239000000499 gel Substances 0.000 claims description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 16
- 229920002120 photoresistant polymer Polymers 0.000 claims description 15
- 238000000206 photolithography Methods 0.000 claims description 14
- 238000000151 deposition Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 239000011521 glass Substances 0.000 claims description 10
- 239000008367 deionised water Substances 0.000 claims description 9
- 229910021641 deionized water Inorganic materials 0.000 claims description 9
- 238000001338 self-assembly Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 6
- 239000000017 hydrogel Substances 0.000 claims description 6
- 238000007639 printing Methods 0.000 claims description 6
- 229910021389 graphene Inorganic materials 0.000 claims description 5
- 229920002521 macromolecule Polymers 0.000 claims description 5
- 239000011837 N,N-methylenebisacrylamide Substances 0.000 claims description 4
- 238000011161 development Methods 0.000 claims description 4
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 claims description 4
- QNILTEGFHQSKFF-UHFFFAOYSA-N n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 claims description 4
- 239000002064 nanoplatelet Substances 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- 108090000623 proteins and genes Proteins 0.000 claims description 4
- 102000004169 proteins and genes Human genes 0.000 claims description 4
- VBGGLSWSRVDWHB-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-henicosafluorodecyl-tris(trifluoromethoxy)silane Chemical compound FC(F)(F)O[Si](OC(F)(F)F)(OC(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F VBGGLSWSRVDWHB-UHFFFAOYSA-N 0.000 claims description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims description 3
- 241000252506 Characiformes Species 0.000 claims description 3
- 239000001913 cellulose Substances 0.000 claims description 3
- 229920002678 cellulose Polymers 0.000 claims description 3
- 238000003486 chemical etching Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 230000002209 hydrophobic effect Effects 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 3
- 230000004660 morphological change Effects 0.000 claims description 2
- 230000008268 response to external stimulus Effects 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- 230000004043 responsiveness Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000000059 patterning Methods 0.000 abstract description 3
- 238000003672 processing method Methods 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 39
- 239000000203 mixture Substances 0.000 description 9
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 229910052681 coesite Inorganic materials 0.000 description 6
- 229910052906 cristobalite Inorganic materials 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 229910052682 stishovite Inorganic materials 0.000 description 6
- 229910052905 tridymite Inorganic materials 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 230000009471 action Effects 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- -1 Polydimethylsiloxane Polymers 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 235000009508 confectionery Nutrition 0.000 description 2
- 238000000502 dialysis Methods 0.000 description 2
- XRWMGCFJVKDVMD-UHFFFAOYSA-M didodecyl(dimethyl)azanium;bromide Chemical compound [Br-].CCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCC XRWMGCFJVKDVMD-UHFFFAOYSA-M 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- SZVJSHCCFOBDDC-UHFFFAOYSA-N ferrosoferric oxide Chemical compound O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000002135 nanosheet Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000008213 purified water Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 229920001486 SU-8 photoresist Polymers 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 229940044631 ferric chloride hexahydrate Drugs 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- NQXWGWZJXJUMQB-UHFFFAOYSA-K iron trichloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].Cl[Fe+]Cl NQXWGWZJXJUMQB-UHFFFAOYSA-K 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000002077 nanosphere Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000006187 pill Substances 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 229920001184 polypeptide Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 238000002174 soft lithography Methods 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- RRHXZLALVWBDKH-UHFFFAOYSA-M trimethyl-[2-(2-methylprop-2-enoyloxy)ethyl]azanium;chloride Chemical compound [Cl-].CC(=C)C(=O)OCC[N+](C)(C)C RRHXZLALVWBDKH-UHFFFAOYSA-M 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Abstract
The application discloses a preparation method of a novel photoetching plate in the technical field of photoetching plates, which comprises the following steps: step 1, drawing patterns by utilizing AutoCAD; step 2, taking a quartz glass sheet as a substrate, and cleaning the quartz glass sheet for standby; step 3, drawing the pattern of the step 1 on the quartz glass sheet through 3D printing or ink-jet printing of the nano particles; step 4, solidifying the nano particles by a heating method to obtain a photomask; and 5, placing a photomask above the gel prepolymer liquid or the polymer monomer, and performing ultraviolet polymerization to obtain the double-sided microstructure gel or the double-sided microstructure polymer. The method for preparing the photomask has wide particle sources, and the processing method is flexible and various, so that the manufacturing cost of the photomask is reduced, and the method is used for rapidly preparing various patterning structures in one step.
Description
Technical Field
The application belongs to the technical field of photoetching templates, and particularly relates to a preparation method of a novel photoetching template.
Background
Photolithography refers to a technique of transferring a pattern on a photomask to a substrate having a photoresist by irradiation of light. The photomask is a substrate with an exposure area and a non-exposure area, the photoresist is a material with photosensitivity, and the like, and the photoresist is selectively exposed under the action of the photomask to enable the photoresist to have a certain reaction under the illumination condition so as to enable the material to obtain a microstructure. And transferring the pattern structure on the photoresist to a required material, such as preparation of a Polydimethylsiloxane (PDMS) microfluidic channel, by an etching technology or a reprinting technology. Photoresists are classified into positive photoresists and negative photoresists. The material of the exposure area undergoes degradation reaction to cause the material of which the left pattern is consistent with the pattern of the non-exposure area of the mask is positive photoresist, and the material of the exposure area undergoes polymerization or cross-linking reaction to cause the material of which the left pattern is consistent with the pattern of the exposure area is negative photoresist. The desired microstructure pattern can be obtained by selecting an appropriate resist and exposure method as needed.
The photoetching mask, called mask for short, is a graph mother board used in the photoetching technology commonly used in micro-nano processing technology. A mask pattern structure is formed on a transparent substrate by an opaque light-shielding film, and pattern information is transferred to a product substrate through an exposure process. The reticle to be processed is generally composed of a transparent glass or quartz plate, an opaque chrome layer and a photoresist layer. The pattern structure can be designed by an AutoCAD, and common processing equipment is direct-writing type photoetching equipment, such as a laser direct-writing photoetching machine and an electron beam photoetching machine.
A traditional photomask plate takes quartz glass as a substrate, a layer of metal chromium and photosensitive glue are plated on the quartz glass, and patterns designed by AutoCAD are exposed on the photosensitive glue and the chromium layer through an electronic laser device, so that the designed patterns can be formed on the metal chromium. The chromium layer pattern is generally completely opaque and is mainly used for manufacturing integrated circuits. However, with the development of society, the demand for patterned polymers and patterned hydrogels is increasing, and it is difficult to quickly prepare customized two-dimensional and three-dimensional patterned soft material surfaces by using the existing photomasks. Meanwhile, there are also: chromium metal is harmful to the environment and human health; the mask allows the unexposed substrate part to be completely unpolymerized, so that a three-dimensional pattern of the polymer or hydrogel is difficult to prepare, and a two-dimensional pattern is usually obtained; the mask often transfers the pattern to the high polymer substrate through a soft lithography technology, and the steps of spin coating SU-8 photoresist, pre-baking, exposure, post-baking, developing, hard baking, pouring high polymer prepolymer solution, stripping and the like are needed, so that the steps are complicated, precise large-scale equipment is needed for manufacturing the photomask, and the investment cost is high. The three-dimensional photoetching machine can also obtain the hydrogel with the three-dimensional pattern structure, but the hydrogel is used for complex and precise optical equipment, and the cost is high.
Disclosure of Invention
The application aims to provide a preparation method of a novel photoetching plate, which aims to solve the problem that a traditional photoetching plate is divided into an exposure area and a non-exposure area, an obtained structure is a positive film structure or a negative film structure, and for a negative photoresist, the non-exposure area does not react or crosslink, and a complete structure is often required to be obtained through modification of a substrate or transfer of a pattern.
In order to achieve the above object, the technical scheme of the present application is as follows: a preparation method of a novel photoetching plate comprises the following steps:
step 1, drawing patterns by utilizing AutoCAD;
step 2, taking a quartz glass sheet as a substrate, and cleaning the quartz glass sheet for standby;
step 3, drawing the pattern of the step 1 on the quartz glass sheet through 3D printing or ink-jet printing of the nano particles;
step 4, solidifying the nano particles by a heating method to obtain a photomask;
and 5, placing a photomask above the gel prepolymer liquid or the polymer monomer, and performing ultraviolet polymerization to obtain the double-sided microstructure gel or the double-sided microstructure polymer.
Further, the nanoparticles are macromolecules extracted from natural materials, and the macromolecules are cellulose and the like or proteins.
Further, the nanoparticle is an artificially synthesized nanoparticle, and the artificially synthesized nanoparticle is: siO (SiO) 2 、Fe 3 O 4 Particles, au nanoparticles, PS nanoparticles, or graphene oxide nanoplatelets.
Further, the 3D printing method includes: the nanoparticles were formulated as a 10% strength solution and 3D printed using a 32G needle, with the print layer height set to 0.1mm, the wall thickness 0.5mm, and the print speed set to 50mm/s.
Further, the method of inkjet printing is: and (3) performing ink-jet printing by using high-performance nano-deposition equipment, using a nano-particle solution as printing ink, setting the concentration to be 5%, setting the voltage of a releaser to be uniform to be 14.0V, and printing the pattern in the step (1) on the quartz glass sheet.
Further, in step 3, the method further comprises drawing the pattern of step 1 on the quartz glass sheet by a self-assembly method.
Further, the self-assembly method is as follows: parallel band structure patterns can be obtained by depositing 2% concentration nano particles on a substrate, and a cross-shaped net structure can be obtained by converting the deposition direction to carry out second deposition. .
Further, the self-assembly method is as follows: pre-templating a quartz glass sheet by photoetching and chemical etching in advance, and assembling a pattern on a substrate by using a 3% concentration nanoparticle solution according to the structure of the pre-templating; firstly cleaning a glass substrate by using acetone and ethanol, drying at 60 ℃ for 1h, then pasting a photoresist dry film on the glass substrate, exposing by using a photomask mother board for 20s, spraying 1.43w/v% sodium carbonate solution for 2min for development, and then putting the glass substrate into a buffer oxidation etching solution; washing with deionized water after etching to obtain a pre-template with a designed microstructure; carrying out hydrophilic treatment on the microstructure area by using a piranha solution, and carrying out hydrophobic treatment on the rest part by using perfluorodecyl trimethoxysilane; and (3) self-assembling the nano-particle solution with the concentration of 2% on the micro-template to obtain the micro-structure mask. .
Further, in step 5, a gel pre-polymerization solution was prepared, 0.3g of acrylamide, 0.01g of a photoinitiator I2959, and 0.03g of N, N-methylenebisacrylamide were dissolved in deionized water as the gel pre-polymerization solution, and a photomask was placed over the gel pre-polymerization solution, and irradiated with an ultraviolet lamp of 365nm for 8 minutes, thereby obtaining a double-sided microstructure gel having a pre-designed pattern. Microstructured gels of different pattern heights can be prepared with photodefinable films of different particle thicknesses.
Further, the monomer of the prepolymerization solution adopts N-isopropyl acrylamide, and a soft machine capable of generating morphological change in response to external stimulus can be obtained in one step by using a photolithography method. Further, the heating temperature is 100-400 ℃.
The principle and beneficial effect of this scheme: the particle sources for preparing the photomask are wide, the processing method is flexible and various, the manufacturing cost of the photomask is reduced, and the preparation of various patterned structures is facilitated.
By using the photomask, various patterning soft substances can be prepared in a customized manner. Including pills for children and candies, such as cartoon patterns on candies, which are convenient for children to accept.
The special functional material is used as the prepolymer, so that the storage and encryption of information, the entrapment and release of medicines and the like can be realized. The micro soft robot can also be prepared by infrared light remote control or thermal control.
Through proper design of pattern structure, the method can be used for rapidly preparing the micro-fluidic chip.
In summary, the method for realizing the photoetching plate is flexible and various, the three-dimensional patterned gel is obtained after photoetching, the difference is that the gel pattern is required to be solidified on the substrate compared with the traditional photoetching, the three-dimensional patterned gel can be prepared by the photoetching technology in one step without being connected to the substrate, the photoetching plate is a self-supporting and double-sided patterned structure, the structure and a blank part between the structures are all composed of polymers, the traditional photoetching is that the structure is attached on the substrate, and the substrate is arranged between the micropattern and the micropattern.
Drawings
FIG. 1 is a schematic diagram of a novel photomask for patterning polymer production according to an embodiment of the present application.
FIG. 2 is an optical image of a gel microstructure obtained using a photomask according to an embodiment of the present application.
FIG. 3 shows a gel soft machine with surface microstructure obtained by using a photomask according to an embodiment of the present application.
Detailed Description
The following is a further detailed description of the embodiments:
the application provides a preparation method of a novel photoetching plate, which comprises the following steps: the method comprises the following steps:
step 1, drawing patterns by utilizing AutoCAD;
step 2, taking a quartz glass sheet as a substrate, and cleaning the quartz glass sheet for standby;
step 3, drawing the pattern of the step 1 on the quartz glass sheet through 3D printing or ink-jet printing of the nano particles;
step 4, curing the nano particles by a heating method to obtain a photomask, wherein the heating temperature is 100-400 ℃ for curing treatment, and the curing temperature in the embodiment is 180 ℃;
step 5, placing a photomask above the gel pre-polymerization solution or the polymer monomer, and performing ultraviolet polymerization to obtain the double-sided microstructure gel, in this embodiment, preparing the gel pre-polymerization solution, 0.3g of acrylamide, 0.01g of photoinitiator I2959, and 0.03g of N, N-methylene bisacrylamide dissolved in deionized water as the gel pre-polymerization solution, placing the photomask above the gel pre-polymerization solution, and irradiating for 8min by using an ultraviolet lamp with 365nm to obtain the double-sided microstructure gel with the pre-designed pattern, as shown in fig. 1 and fig. 2.
Step 6, a photomask is placed above a gel pre-polymerization solution or a polymer monomer, ultraviolet polymerization is carried out to obtain a double-sided microstructure gel soft machine, in the embodiment, the gel pre-polymerization solution, 0.3g N-isopropyl acrylamide, 0.01g of photoinitiator I2959,0.03g of N, N-methylene bisacrylamide and 0.01g of gold nanoparticles are prepared and dissolved in deionized water to serve as the gel pre-polymerization solution, the photomask is placed above the gel pre-polymerization solution, and a 365nm ultraviolet lamp is used for irradiating for 8min to obtain the double-sided microstructure gel soft machine with a pre-designed pattern, and the double-sided microstructure gel soft machine can respond to external stimulus to form changes to further perform the functions of grabbing objects and the like, as shown in an attached figure 3.
In this embodiment, the nanoparticles may be macromolecules extracted from natural materials, such as cellulose, proteins, etc., or may be synthesized directly by hand.
Taking SiO2, fe3O4 particles, au nanoparticles, PS nanoparticles and Graphene Oxide (GO) nanosheets as examples, adding 10ml of tetraethyl orthosilicate, 6ml of 25% ammonia water and 80ml of ethanol into a flask in sequence, stirring at room temperature for reaction for 10 hours, obtaining SiO2 through centrifugal separation, and adjusting the size of the SiO2 by changing the proportion of ingredients to obtain nanoparticles with different sizes.
Preparation of Fe3O 4: 1.35g of ferric chloride hexahydrate was prepared by dissolving in 20mL of ethylene glycol. Then, 3.3mol/L sodium acetate solution was dissolved in 20ml ethylene glycol, and the reaction solution was added thereto, followed by stirring at 25℃for 40 minutes. Next, the homogeneous yellow mixture was transferred to a teflon substrate lined reactor and heated at 200 ℃ for 7 hours. After cooling to room temperature, the mixture is washed three times with ethanol/water mixture and deionized water, and then dried at 45 ℃ to obtain Fe3O4 nano particles.
Synthesis of Au nanoparticles: 0.0925g Didodecyl Dimethyl Ammonium Bromide (DDAB) and 0.046g HAuCl-4H 2 O was added to 10mL of toluene solution under sonication to dissolve completely. 40uL of freshly prepared aqueous NaBH4 (9.4 mol/L) was added dropwise under vigorous stirring to reduce gold ions. After 20min, 0.8mL of 1-dodecanethiol was added to the prepared solution and stirring was continued for 5min. After ethanol is added, gold nanoparticles are precipitated, and the gold nanoparticles are obtained through centrifugal separation.
Preparation of PS particles: styrene (4 mL), polyvinylpyrrolidone (216 mg), methacryloxyethyl trimethyl ammonium chloride (0.1 mL), azobisisobutyronitrile (19 mg), ethanol (40 mL) and water (4 mL) were added to a 100mL three-necked round bottom flask. Solution in N 2 And heating to 70 ℃ under the atmosphere to react for 12h. And (3) centrifugally separating the ethanol, and drying at 60 ℃ for 24 hours to finally obtain the PS nanospheres.
Preparation of Graphene Oxide (GO) nanoplatelets: 12mL of concentrated H 2 SO 4 3g of graphite was charged into a flask of 2.5. 2.5g K 2 S 2 O 8 And 2.5. 2.5g P 2 O 5 And the mixture was stirred at 80℃for 4.5h. It was diluted with 500mL of pure water. And (3) cleaning and filtering the mixed solution in the last step to obtain a filtrate without redundant water. The filtrate was transferred to 120mL of concentrated H 2 SO 4 15g KMnO was added to the mixture continuously slowly 4 While the reaction vessel was placed in an ice bath environment. The reaction mixture was diluted with 250mL of purified water and placed in an ice bath environment with stirring for 2h. The reaction was diluted again with 700mL of purified water, and 20mL of H was added thereto 2 O 2 (30%) until the mixture turns yellow. Finally, the mixture was repeatedly centrifuged and washed with pure water and dilute HCl (1 l, 10%), and the washed mixture was placed in a dialysis bag for dialysis for one week. Ultrasonic treatment of the final mixture 3And (5) obtaining the GO nano sheet layer after 0min.
SiO2, fe3O4 particles, au nanoparticles, PS nanoparticles, graphene Oxide (GO) nanoplatelets, and the like can be used as patterned substrates.
In this example, the following method is used for illustration:
taking SiO2 as an example here, siO2 nanoparticles were prepared as a 10% solution. 3D printing was performed using a 32G stylus, the print layer height was set to 0.1mm, the wall thickness was 0.5mm, and the print speed was set to 50mm/s.
Or performing ink-jet printing by using high-performance nano deposition equipment (Microplotter), using nanoparticle solution as printing ink, setting the voltage of a releaser to be uniform at 14.0V, and printing a required pattern on a glass substrate.
Or preparing a photomask by using a self-assembly method, wherein a substrate used for self-assembly can be a blank substrate, a cross-shaped net structure or a micro pattern of a parallel band structure can be assembled, a parallel band structure pattern can be obtained by depositing 2% concentration nano particles on a substrate, and a cross-shaped net structure can be obtained by converting a deposition direction and performing second deposition.
More complex structures can also be achieved by self-assembly, pre-templating the substrate using photolithography and chemical etching in advance, and then assembling the patterned substrate with a 3% concentration nanoparticle solution according to the pre-templated structure. The glass substrate is firstly cleaned by using acetone and ethanol, dried for 1h at 60 ℃, then a photoresist dry film is pasted on the glass substrate, the exposure is carried out through a photomask mother board, the exposure time is 20s, then the solution is sprayed for 2min by using 1.43w/v% sodium carbonate solution for development, and then the solution is put into a buffer oxidation etching solution (the solution of 40% NH4F and the solution of 40% HF are mixed at a ratio of 7:1, and then the solution is diluted by using deionized water with a volume of 2 times to prepare the buffer oxidation etching solution). And after etching, cleaning by using a large amount of deionized water to obtain the pre-template with the designed microstructure. And then hydrophilic treatment is carried out on the microstructure area by using a piranha solution, and the rest part is subjected to hydrophobic treatment by using perfluorodecyl trimethoxysilane. The 2% SiO2 particle solution is self-assembled on the micro template to obtain the micro-structure mask.
Some polypeptide and protein molecules can be used as gel pre-polymerization liquid, so that a patterned three-dimensional structure with biocompatibility can be obtained for the biomedical engineering field. Such as a methacryloylated gelatin (GelMA) hydrogel. As a prepolymer solution, 0.2g of GelMA and 0.01g of photoinitiator I2959 were prepared in the form of a 4% strength aqueous solution.
If the monomer is a stimulus-responsive material, gold nanoparticles and N-isopropyl acrylamide are taken as examples, an infrared and temperature remote driver with a microstructure can be obtained, and the infrared and temperature remote driver can be used in the fields of medical engineering and micro-chemical industry when the form response changes under the irradiation of infrared light or under the change of temperature.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
The foregoing is merely an embodiment of the present application, and a specific structure and characteristics of common knowledge in the art, which are well known in the scheme, are not described herein, so that a person of ordinary skill in the art knows all the prior art in the application date or before the priority date, can know all the prior art in the field, and has the capability of applying the conventional experimental means before the date, and a person of ordinary skill in the art can complete and implement the present embodiment in combination with his own capability in the light of the present application, and some typical known structures or known methods should not be an obstacle for a person of ordinary skill in the art to implement the present application. It should be noted that modifications and improvements can be made by those skilled in the art without departing from the structure of the present application, and these should also be considered as the scope of the present application, which does not affect the effect of the implementation of the present application and the utility of the patent. The protection scope of the present application is subject to the content of the claims, and the description of the specific embodiments and the like in the specification can be used for explaining the content of the claims.
Claims (10)
1. A preparation method of a novel photoetching plate is characterized by comprising the following steps: the method comprises the following steps:
step 1, drawing patterns by utilizing AutoCAD;
step 2, taking a quartz glass sheet as a substrate, and cleaning the quartz glass sheet for standby;
step 3, drawing the pattern of the step 1 on the quartz glass sheet through 3D printing or ink-jet printing of the nano particles;
step 4, solidifying the nano particles by a heating method to obtain a photomask;
and 5, placing a photomask above the gel prepolymer liquid or the polymer monomer, and performing ultraviolet polymerization to obtain the double-sided microstructure gel or the double-sided microstructure polymer.
2. The method for preparing a novel photolithography mask according to claim 1, wherein: the nanometer particles are macromolecules extracted from natural materials, and the macromolecules are cellulose and the like or proteins.
3. The method for preparing a novel photolithography mask according to claim 1, wherein: the nano particles are artificially synthesized nano particles, and the artificially synthesized nano particles are as follows: siO (SiO) 2 、Fe 3 O 4 Particles, au nanoparticles, PS nanoparticles, or graphene oxide nanoplatelets.
4. The method for preparing a novel photolithography mask according to claim 1, wherein: the 3D printing method comprises the following steps: the nanoparticles were formulated as a 10% strength solution and 3D printed using a 32G needle, with the print layer height set to 0.1mm, the wall thickness 0.5mm, and the print speed set to 50mm/s. The thickness of the photomask pattern is controlled by the print layer height and the number of layers.
5. The method for preparing a novel photolithography mask according to claim 1, wherein: the method of inkjet printing is as follows: and (3) performing ink-jet printing by using high-performance nano-deposition equipment, using a nano-particle solution as printing ink, setting the concentration to be 5%, setting the voltage of a releaser to be uniform to be 14.0V, and printing the pattern in the step (1) on the quartz glass sheet. The height of the photomask pattern is controlled at the ink jet speed.
6. The method for preparing a novel photolithography mask according to claim 1, wherein: in step 3, the method further comprises drawing the pattern of step 1 on the quartz glass sheet by a self-assembly method.
7. The method for preparing a novel photolithography mask according to claim 6, wherein: the self-assembly method comprises the following steps: parallel band structure patterns can be obtained by depositing 2% concentration nano particles on a substrate, and a cross-shaped net structure can be obtained by converting the deposition direction to carry out second deposition.
8. The method for preparing a novel photolithography mask according to claim 6, wherein: the self-assembly method comprises the following steps: pre-templating a quartz glass sheet substrate by photoetching and chemical etching in advance, and assembling a pattern on a substrate by using a 3% concentration nanoparticle solution according to the structure of the pre-templating; firstly cleaning a glass substrate by using acetone and ethanol, drying at 60 ℃ for 1h, then pasting a photoresist dry film on the glass substrate, exposing by using a photomask mother board for 20s, spraying 1.43w/v% sodium carbonate solution for 2min for development, and then putting the glass substrate into a buffer oxidation etching solution; washing with deionized water after etching to obtain a pre-template with a designed microstructure; carrying out hydrophilic treatment on the microstructure area by using a piranha solution, and carrying out hydrophobic treatment on the rest part by using perfluorodecyl trimethoxysilane; and (3) self-assembling the nano-particle solution with the concentration of 2% on the micro-template to obtain the photomask with the designed microstructure.
9. The method for preparing a novel photolithography mask according to claim 1, wherein: in step 5, a gel pre-polymerization solution is prepared, 0.3g of acrylamide, 0.01g of a photoinitiator I2959 and 0.03g of N, N-methylene bisacrylamide are dissolved in deionized water to be used as the gel pre-polymerization solution, a photomask is placed above the gel pre-polymerization solution, and a 365nm ultraviolet lamp is used for irradiating for 8min, so that the double-sided microstructure gel with the pre-designed pattern is obtained. By using photomasks of different pattern thicknesses, patterned hydrogel or polymer structures of different heights will be obtained.
10. The method for preparing a novel photolithography mask according to claim 1, wherein: the heating temperature is 100-400 ℃. The method for preparing a novel photolithography mask according to claim 1, wherein: in step 5, the monomer is replaced by a monomer with stimulus responsiveness, such as N-isopropyl acrylamide, and a soft machine capable of generating morphological change in response to external stimulus can be obtained in one step by using a photolithography method.
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