CN109188683B - Method and device for correcting mode system uniformity of large-aperture beam combiner - Google Patents
Method and device for correcting mode system uniformity of large-aperture beam combiner Download PDFInfo
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- CN109188683B CN109188683B CN201811133932.8A CN201811133932A CN109188683B CN 109188683 B CN109188683 B CN 109188683B CN 201811133932 A CN201811133932 A CN 201811133932A CN 109188683 B CN109188683 B CN 109188683B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
Abstract
The invention relates to a large-aperture combined beamA method and a device for correcting the mode system uniformity of a mirror are provided, wherein the method comprises the following steps: taking N points along the radial direction of the film coating base plate, measuring the thickness of the film coating, and taking the position with the maximum film thickness as dmaxThe thinnest part is dminThe radial radius of the corresponding film coating base plate is rmax,rmin(ii) a Measuring the central angle theta of the widest position of the correction plate corresponding to the radial position with the maximum film thicknessmaxCalculating the weight factor of the film thickness along the radial distribution; taking the widest position of the correction plate as an origin to carry out contour iteration solution on the uniformity correction plate, and calculating the contour of the initial correction plate; performing coating correction by using the calculated initial correction plate, and measuring the film thickness again; calculating a new correction coefficient; calculating a new correction version outline factor; and judging whether the coating thickness uniformity meets the requirement, if not, repeating the steps until the uniformity requirement is met, and obtaining the final modified plate profile. The invention simplifies the correction method and can quickly obtain the proper outline of the correction plate.
Description
Technical Field
The invention relates to the field of optics, in particular to a method and a device for correcting film system uniformity of a large-aperture beam combiner.
Background
With the rapid development of laser technology, the research and application of the interaction between the laser technology and the substance are more and more, and the requirements on the wavelength and energy of the laser are more and more complex, wherein most of the interactions between the laser and the substance require the laser with specific wavelength and simultaneously interact with the substance, and the beam combining mirror is used as an indispensable device in the application of various laser wavelengths, and the film system of the beam combining mirror is specially designed according to different used wavelengths; meanwhile, the uniformity index of the large-aperture beam combiner is difficult to guarantee, the effect and the performance of the large-aperture beam combiner are directly influenced, and the uniformity index of the large-aperture beam combiner is promoted to be less than 0.3% by adopting the uniformity correction of the film system. However, the existing film system uniformity correction method is complex, and is not suitable for correction of large-aperture beam combining mirrors and batch correction aiming at specific film coating equipment.
Disclosure of Invention
The invention aims to provide a method and a device for correcting the uniformity of a mold system, which are suitable for large-aperture beam combining mirrors and batch production.
In order to achieve the above object, the present invention provides a method for correcting the mode system uniformity of a large-aperture beam combiner, comprising the following steps:
s1 coating filmTaking N points in the radial direction of the basal disc sheet, and measuring the thickness of the coating film as d1，d2，……，dNThe radial radius of the corresponding film coating base plate is r1,r2,……,rNTaking the maximum position of the film thickness as dmaxThe thinnest part is dminThe radial radius of the corresponding film coating base plate is rmax,rmin；
S2, measuring the central angle theta of the widest position of the correction plate corresponding to the radial position with the maximum film thicknessmaxCalculating the weight factor of the radial distribution of the film thickness1＝d1/dmax,c2＝d2/dmax，……,cN＝dN/dmax(ii) a The widest part of the correction plate is used as an origin to carry out contour iterative solution of the uniformity correction plate, and the contour iterative solution is obtained by a formula (1-theta)max/2pi)＝c1*(1-θ1/2pi)＝c2*(1-θ2/2pi)＝……＝cN*(1-θN/2pi) calculating the profile of the initial correction plate;
s3, coating correction is carried out by using the initial correction plate after calculation, and the film thickness is measured again to be d'1，d’2，……，d’ND 'is taken as the position with the maximum film thickness'max；
S4, calculating a new correction coefficient of c'1＝(1-d’1/d’max),c’2＝(1-d’2/d’max),……,c’N＝(1-d’N/d’max)；
S5, calculating the new correction profile factor as theta1，new＝c’1*θ1，current，θ2，new＝c’1*θ2，current，……，θN，new＝c’N*θN，current；
S6, according to (d'max-d’min)/(d’max+d’min) Whether the value of (3) is less than a preset value or not is judged to judge whether the coating thickness uniformity meets the requirement, if not, the steps S3-S5 are repeated until the uniformity requirement is met, and the final profile of the correction plate is obtained.
According to the technical scheme, the preset value is less than or equal to 0.3%.
The invention also provides a module uniformity correction device of the large-aperture beam combiner, which comprises a film-coated substrate disc, a plurality of beam combiners and a module uniformity correction plate for shielding incident materials;
the plurality of beam combining mirrors are arranged in concentric rings of the film coating base disc sheet, and the distance from the center of each beam combining mirror to the center of the film coating base disc is equal;
the die system uniformity correction plate is radially arranged along the film coating base disc and does not rotate along with the base disc, and the die system uniformity correction plate is obtained according to the method.
According to the technical scheme, the rotation speed of the film-coated substrate plate is not less than 300 revolutions per minute during film coating.
The invention has the beneficial effects that: the invention iterates the outline of the initial correction plate by measuring the film thickness and a corresponding formula, and then determines the new outline of the correction plate by calculating the correction coefficient of the outline, thereby simplifying the correction method, and the outline of the correction plate can be repeatedly corrected for 2-3 times in the concrete implementation so as to quickly obtain the correction plate meeting the requirement.
Drawings
FIG. 1 is a schematic diagram of a device for correcting the uniformity of a large aperture beam combiner according to an embodiment of the present invention;
FIG. 2 is a flowchart of a method for correcting the mode uniformity of a large aperture beam combiner according to an embodiment of the present invention.
Detailed Description
In order to provide a further understanding and appreciation for the structural features and advantages achieved by the present invention, the following detailed description of the presently preferred embodiments is provided:
as shown in fig. 1, the apparatus for correcting the mode-based uniformity of a large aperture beam combiner according to an embodiment of the present invention includes a coated substrate 10, a plurality of beam combiners 20, and a mode-based uniformity correcting plate 30 for blocking incident materials.
The plurality of beam combining mirrors 20 are arranged in concentric rings of the film coating base disc sheet, and the distance from the center of each beam combining mirror to the center of the film coating base disc is equal.
The die-system uniformity correcting plate 30 is installed in the radial direction of the coated base plate without rotating with the base plate, and is obtained according to the following embodiment.
When the device is used for coating, the coating base disc sheet 10 rotates at a high speed during coating and the rotating speed is not less than 300 r/min. The high-speed rotation of the film coating base plate can ensure that the film thickness is uniformly distributed on a circular ring with the same radius of the film coating base plate 10, and the film thickness distribution is only non-uniform along the radial direction. The radial distribution unevenness of the film thickness is adjusted by the uniformity correction plate, the uniformity correction plate is arranged along the radial direction, and the film thickness is adjusted by shielding a part of incident materials.
The specific correction mathematical model of the uniformity baffle is shown in fig. 1, and the calculation method of the uniformity correction plate outline model and the determination method of the uniformity correction plate on the substrate position are shown in fig. 2, and the steps are as follows:
1. initializing, setting the film thickness along the radial distribution d under the condition of no uniformity correction plate1，d2，……，dN. Taking the maximum position of the film thickness as dmaxThe thinnest part is dmin；
2. Setting the widest position of the outline of the correction plate as dmaxAt the position with the narrowest point dminThe location of the location;
3. solution of assumed uniformity correction plate profile by dmaxThe position is an origin point for iteration; measurement dmaxThe center angle of the position correction plate is set to a constant value thetamax；
4. C is taken as the weight factor of the radial distribution of the film thickness1＝d1/dmax,c2＝d2/dmax，……,cN＝dN/dmax；
5. Then represented by the formula (1-theta)max/2pi)＝c1*(1-θ1/2pi)＝c2*(1-θ2/2pi)＝……＝cN*(1-θN/2pi) the profile of the initial correction plate is calculated.
6. Performing coating correction by using an initial correction plate, and testing the thickness of the film along the radial distribution d 'after coating'1，d’2，……，d’ND 'is taken as the position with the maximum film thickness'max。
7. Calculating a new correction coefficient of c'1＝(1-d1/dmax),c’2＝(1-d’2/d’max),……,c’N＝(1-d’N/d’max)。
8. New correction profile factor theta1，new＝c’1*θ1，current，θ2，new＝c’1*θ2，current，……，θN，new＝c’N*θN，current. And calculating (d'max-d’min)/(d’max+d’min) Whether the value of (2) is less than 0.3% of a preset value or not is judged to judge whether the coating thickness uniformity meets the requirement or not, if not, the steps of 6-8 are repeated until the satisfactory uniformity is achieved and the position of the correction plate is obtained.
The correction of the module system uniformity correction plate in one embodiment of the invention comprises the following steps:
initialization is performed, and the film thickness is set to be distributed along the radial direction under the condition of no uniformity correction plate (12.7577,12.7431um,12.3922um,12.6555um,12.1712um,12.7060um,12.0318um,12.2769um,12.0462um and 12.0971 um). Taking the maximum position of the film thickness as dmax(12.7577um) with d at the thinnest pointmin(12.0318um)；
Setting the widest position of the outline of the correction plate as dmaxAt the position with the narrowest point dminThe location of the location;
solution of assumed uniformity correction plate profile by dmaxThe position is an origin point for iteration; measurement dmaxCenter angle theta of position correction platemax＝45°；
C is taken as the weight factor of the radial distribution of the film thickness1＝1.0000，c2＝0.9989c3＝0.9920，c4＝0.9540，c5＝0.9959，c6＝0.9431，c7＝0.9623，c8＝0.9442，c9＝0.9482,c10＝0.9714。
Is represented by the formula (1-theta)max/2pi)＝c1*(1-θ1/2pi)＝c2*(1-θ2/2pi)＝……＝cN*(1-θN/2pi) calculating the profile of the initial correction plate, then θ1＝45°，θ2＝44.6531°，θ3＝35.7258°，θ4＝42.4597°，θ5＝29.8113°，θ6＝43.7032°，θ7＝25.9951°，θ8＝32.6593°，θ9＝26.3842°，θ10＝27.7916°。
Performing coating correction by using an initial correction plate, and testing the thickness of the film along the radial distribution d 'after coating'1＝12.9593um，d’2＝12.5472um，d’3＝12.1386um，d’4＝12.1493um，d’5＝12.2575um，d’6＝12.8407um，d’7＝12.2543um，d’8＝12.8143um，d’9＝12.2435um，d’1012.9293 um. D 'is taken at the position with the maximum film thickness'max。
Calculating a new correction coefficient of c'1＝0，c’2＝0.0318，c’3＝0.0633，c’4＝0.0625，c’5＝0.0542，c’6＝0.0092，c’7＝0.0544，c’8＝0.0112，c’9＝0.0552,c’10＝0.0023。
New correction profile factor theta1，new＝c’1*θ1，current＝0，θ2，new＝c’1*θ2，current＝1.4200，θ3，new＝2.2614，θ4，new＝2.6537，θ5，new＝1.6158，θ6，new＝0.4021，θ7，new＝1.4141，θ8，new＝0.3658，θ9，new＝1.4564，θ10，new＝c’10*θ10，current＝0.0639。
Calculating (d'max-d’min)/(d’max+d’min) And if the thickness is 0.327 percent and is less than the preset value of 0.35 percent, the coating thickness uniformity meets the requirement, and the final profile of the correction plate is obtained.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not intended to limit the scope of the present invention, which is defined by the appended claims.
Claims (4)
1. A method for correcting the mode system uniformity of a large-aperture beam combiner is characterized by comprising the following steps:
s1, taking N points along the radial direction of the film coating base plate, and measuring the film coating thickness as d1，d2，……，dNThe radial radius of the corresponding film coating base plate is r1,r2,……,rNTaking the maximum position of the film thickness as dmaxThe thinnest part is dminThe radial radius of the corresponding film coating base plate is rmax,rmin；
S2, measuring the central angle theta of the widest position of the correction plate corresponding to the radial position with the maximum film thicknessmaxCalculating the weight factor c of the film thickness distribution in the radial direction1＝d1/dmax,c2＝d2/dmax，……,cN＝dN/dmax(ii) a The widest part of the correction plate is used as an origin to carry out contour iterative solution of the uniformity correction plate, and the contour iterative solution is obtained by a formula (1-theta)max/2pi)＝c1*(1-θ1/2pi)＝c2*(1-θ2/2pi)＝……＝cN*(1-θN/2pi) calculating the profile of the initial correction plate;
s3, coating correction is carried out by using the initial correction plate after calculation, and the film thickness is measured again to be d'1，d’2，……，d’ND 'is taken as the position with the maximum film thickness'max；
S4, calculating a new correction coefficient of c'1＝(1-d’1/d’max),c’2＝(1-d’2/d’max),……,c’N＝(1-d’N/d’max)；
S5, calculating the new correction profile factor as theta1，new＝c’1*θ1，current，θ2，new＝c’1*θ2，current，……，θN，new＝c’N*θN，current；
S6, according to (d'max-d’min)/(d’max+d’min) Whether the value of (3) is less than a preset value or not is judged to judge whether the coating thickness uniformity meets the requirement, if not, the steps S3-S5 are repeated until the uniformity requirement is met, and the final profile of the correction plate is obtained.
2. The method as claimed in claim 1, wherein the predetermined value is less than or equal to 0.3%.
3. A mode system uniformity correction device of a large-aperture beam combiner is characterized by comprising a film-coated substrate disc, a plurality of beam combiners and a mode system uniformity correction plate for shielding incident materials;
the plurality of beam combining mirrors are arranged in concentric rings of the film coating base disc sheet, and the distance from the center of each beam combining mirror to the center of the film coating base disc is equal;
the die-system uniformity correction plate is installed along the radial direction of the coated base plate without rotating with the base plate, and is obtained according to the method of claim 1.
4. The apparatus of claim 3, wherein the coated disk rotates at a speed of not less than 300 rpm during coating.
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