CN109182967A - The preparation method of mask plate and evaporation coating device, substrate - Google Patents
The preparation method of mask plate and evaporation coating device, substrate Download PDFInfo
- Publication number
- CN109182967A CN109182967A CN201811217652.5A CN201811217652A CN109182967A CN 109182967 A CN109182967 A CN 109182967A CN 201811217652 A CN201811217652 A CN 201811217652A CN 109182967 A CN109182967 A CN 109182967A
- Authority
- CN
- China
- Prior art keywords
- mask plate
- occlusion part
- support
- ontology
- support rod
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The embodiment of the present invention provides the preparation method of a kind of mask plate and evaporation coating device, substrate, be related to evaporation coating technique field, it can be achieved that display panel viewing area aperture design.A kind of mask plate, including mask plate ontology, the mask plate ontology include at least one opening area；The mask plate further includes at least one occlusion part；Each open region corresponds at least one described occlusion part, and the direction of the plane locating for the vertical open region, the projection of the occlusion part are completely covered by the projection of the open region；The occlusion part is fixedly connected by support frame with the mask plate ontology；Support frame as described above is connected and composed by multiple support rods；The support rod connecting in the multiple support rod with mask plate ontology is extended by the mask plate ontology, positioned at the side of the mask plate ontology.
Description
Technical field
The present invention relates to evaporation coating technique field more particularly to the preparation methods of a kind of mask plate and evaporation coating device, substrate.
Background technique
Organic Light Emitting Diode (Organtic Light Emitting Diode, abbreviation OLED) display device is due to tool
Have the advantages that simple structure, high response, high contrast, easily formation is flexible and visual angle is wide, thus by extensive concern.
Summary of the invention
The embodiment of the present invention provides the preparation method of a kind of mask plate and evaporation coating device, substrate, it can be achieved that display panel
The design of aperture in viewing area.
In order to achieve the above objectives, the embodiment of the present invention adopts the following technical scheme that
On the one hand, a kind of mask plate, including mask plate ontology are provided, the mask plate ontology includes at least one opening
Area；The mask plate further includes at least one occlusion part；Each open region corresponds at least one described occlusion part, and along vertical
The direction of plane locating for the straight open region, the projection of the occlusion part are completely covered by the projection of the open region；It is described
Occlusion part is fixedly connected by support frame with the mask plate ontology；Support frame as described above is connected and composed by multiple support rods；It is described
The support rod connecting in multiple support rods with mask plate ontology is extended by the mask plate ontology, is located at the mask plate ontology
Side.
Optionally, the sheltering part is in the open region；It is connect in the multiple support rod with the occlusion part
Support rod is extended by the occlusion part, positioned at the side of the mask plate ontology；The support being connect with the mask plate ontology
Bar and the support rod connecting with the occlusion part are located at the same side of the mask plate ontology.
Further alternative, support frame as described above includes at least three support sub-portions；Each support sub-portion includes three
A support rod, and three support rods are sequentially connected end to end into U-shaped shape.
Further alternative, the support sub-portion is four；In four support sub-portions, branch chapelet described in two of them
Portion is located in the first plane, other two described support sub-portion is located in the second plane, and first plane and described second
Plane is vertical.
Optionally, the sheltering part is in the side of the open region；Support frame as described above includes at least three support sub-portions,
Each support sub-portion includes two support rods, and two support rods are sequentially connected end to end l-shaped shape.
Further alternative, the support sub-portion is four；In four support sub-portions, branch chapelet described in two of them
Portion is located in the first plane, other two described support sub-portion is located in the second plane, and first plane and described second
Plane is vertical.
Optionally, the sheltering part is in the side of the open region；The support rod being connect with mask plate ontology, it is another
End is connect with the occlusion part.Support rod is of a straight line type.
Optionally, the occlusion part includes occlusion part ontology and the through-hole through the occlusion part ontology, the through-hole
Positioned at the middle position of the occlusion part ontology；Or；The occlusion part includes occlusion part ontology, nothing in the occlusion part ontology
Through the through-hole of the occlusion part ontology.
In another aspect, a kind of evaporation coating device is provided, including above-mentioned mask plate.
Optionally, the evaporation coating device further includes evaporation source；The evaporation source is line evaporation source or point evaporation source.
On the other hand, a kind of preparation method of substrate is provided, comprising: above-mentioned evaporation coating device is utilized, in the display of substrate
Upper evaporation material is deposited in area, forms evaporation material layer；Wherein, an open region of mask plate is one corresponding in the evaporation coating device
The viewing area of the substrate.
The present invention provides a kind of mask plate and the preparation method of evaporation coating device, substrate passes through support frame for the mask plate
It is fixedly connected with occlusion part with mask plate ontology, the fixation problem of occlusion part Yu mask plate ontology can be solved, to can realize aobvious
Show panel in the design of viewing area aperture.Wherein, the setting of occlusion part can carry out evaporation material vapor deposition using the mask plate
When, it avoids that upper evaporation material is deposited in the glass cement overlay area of substrate.Support frame is set to connect structure by multiple support rods
At, and extend the support rod connecting in multiple support rods with mask plate ontology by mask plate ontology, and it is located at mask plate sheet
The side of body can make the open region of the support rod for constituting support frame and mask plate ontology not in the same plane.To utilize steaming
Through obstruction path the characteristic of diffraction can occur for plating material molecule, make what evaporation material was vaporized on substrate to be supported bar covering
Vapor deposition homogeneity is improved in region.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
It obtains other drawings based on these drawings.
Fig. 1 is the structural representation after a kind of viewing area in display panel that the embodiment of the present invention provides is punched
Figure；
Fig. 2 a is that the structure for the encapsulation region formation glass cement around hole to be formed that the embodiment of the present invention provides is shown
It is intended to；
Fig. 2 b be in Fig. 2 a AA ' to schematic cross-sectional view；
Fig. 2 c is to carry out laser sintered schematic diagram on the basis of Fig. 2 b；
Fig. 2 d be on the basis of Fig. 2 c it is laser sintered after schematic diagram；
Fig. 3 is a kind of structural schematic diagram for mask plate that the embodiment of the present invention provides；
Fig. 4 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Fig. 5 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Fig. 6 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Fig. 7 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Fig. 8 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Fig. 9 is support rod and sheltering part in the structural schematic diagram of the mask plate of approximately the same plane；
Figure 10 is the structural schematic diagram that local bright line occurs in display panel；
Figure 11 is diffraction principle schematic diagram；
Figure 12 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Figure 13 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Figure 14 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Figure 15 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Figure 16 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Figure 17 is the structural schematic diagram for another mask plate that the embodiment of the present invention provides；
Figure 18 is a kind of structural schematic diagram for evaporation coating device that the embodiment of the present invention provides；
Figure 19 is the structural schematic diagram for another evaporation coating device that the embodiment of the present invention provides.
Detailed description of the invention:
The hole 01-；02- glass cement；03- organic material layer；10- mask plate ontology；The open region 20-；30- occlusion part；31- hides
Stopper ontology；32- through-hole；40- support frame；41- support rod；411- first support bar；412- second support bar；413- third branch
Strut；The 4th support rod of 414-；The 5th support rod of 415-；42- supports sub-portion；51- line evaporation source；52- point evaporation source.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
It for the comprehensive screen products for designing real meaning, can be punched by the viewing area in display panel, thus will
Earpiece, camera etc. are integrated in the product.
In addition, can also be punched in the viewing area of display panel according to the different demands of client.For example, one kind is arranged
Wrist-watch comprising display panel, and it is additionally provided with mechanical indicator on a display panel.To place mechanical indicator, need showing
It is punched the center of panel.
It by taking OLED display panel as an example, is punched in the viewing area of OLED display panel, as shown in Figure 1, first need to be
(such as formed glass cement 02) is packaged around hole 01 to be formed, after preventing from being formed hole 01, water oxygen through hole and into
Enter in OLED display panel.On this basis, after to be packaged, the part within encapsulation region is all hollowed out, to form hole 01.
Wherein, when being packaged around hole 01 to be formed, as shown in Figure 2 a and 2 b, glass first is formed in encapsulation region
Glass glue (Frit) 02, later, as shown in Figure 2 c, by laser (Laser) sintered glass glue 02, to connect array substrate and envelope
Substrate is filled, realizes the function of isolation water oxygen.However, as shown in Figure 2 d, high temperature will lead to array when laser sintered glass cement 02
Organic matter on substrate in the organic material layer 03 of glass cement overlapping region resolves into water and oxygen.The water and oxygen of decomposition can be to displays
The service life of area pixel and brightness impact.In addition, organic matter, which will also result in glass cement 02 by thermal decomposition, is unable to reach bonding
Ratio, influences the connection of array substrate and package substrate, to influence the encapsulation performance of OLED display panel.
Based on it is above-mentioned it is laser sintered during leads to the problem of, even if by adjusting laser energy (Laser Power)
It is unable to get improvement.
And as the above analysis, the basic reason for causing organic matter to decompose is, 02 overlapping region of glass cement on substrate
The presence of evaporation material can avoid the above problem if removing evaporation material in 02 overlapping region of glass cement.
Wherein, by being designed to mask plate, in evaporation material on substrate, glass cement overlapping region is hidden
Gear can avoid that upper evaporation material is deposited in glass cement overlapping region.
For Opening mask plate (open mask), occlusion part 30 is set in open region to block glass cement overlapping
Region need to consider the problem how occlusion part 30 is fixed.
Based on this, the embodiment of the present invention provides a kind of mask plate, as shown in figures 3-8, including mask plate ontology 10, mask
Plate ontology 10 includes at least one opening area 20.On this basis, mask plate further includes at least one occlusion part 30；Each opening
Area 20 corresponds at least one occlusion part 30, and the direction of the plane locating for the vertical openings area 20, the projection of occlusion part 30 are opened
The projection of mouth region 20 is completely covered.Occlusion part 30 is fixedly connected by support frame 40 with mask plate ontology 10；Support frame 40 is by more
A support rod 41 connects and composes；The support rod 41 connecting in multiple support rods 41 with mask plate ontology 10 is prolonged by mask plate ontology 10
It stretches out, positioned at the side of mask plate ontology 10.
One open region 20 can correspond to the viewing area of a substrate, i.e., the mask plate is Opening mask plate.Based on the opening
Area 20 can be deposited such as organic material, cathode material by evaporation process in the viewing area of substrate.
During forming substrate, to avoid that upper evaporation material is deposited in glass cement overlapping region, using of the invention real
When applying the mask plate evaporation material of example offer, cover glass glue weight is answered in orthographic projection of the occlusion part 30 on the substrate of material to be deposited
Folded region (that is, encapsulation region).
For support frame 40, other than occlusion part 30 can be made to be fixedly connected with mask plate ontology 10, it can also rise
To the effect of support occlusion part 30, to guarantee the stability of occlusion part 30.
The support rod 41 connecting in multiple support rods 41 due to constituting support frame 40 with mask plate ontology 10 is by mask plate
Ontology 10 extends, and therefore being located at the side of mask plate ontology 10 will realize that support frame 40 makes occlusion part 30 and mask plate sheet
Body 10 is fixedly connected, then all support rods 41 for constituting support frame 40 and open region 20 are not in the same plane.
As shown in figure 9, relative to the support rod 41 for constituting support frame 40 and open region 20 is generally aligned in the same plane (in this feelings
Under condition, support rod 41 is located in open region 20) so that the occlusion part 30 being located in open region 20 is connect with mask plate ontology 10.
Since support rod 41 is located in open region 20, when carrying out evaporation material vapor deposition, support rod 41 is equivalent to obstruction, can hinder to steam
The vapor deposition of material is plated, thus, it can make 41 overlay area of substrate upper support bar that evaporation material can not be deposited, influence to be deposited uniform
Property.To cause finally formed display panel the problem of local concealed wire or bright line (as shown in Figure 10) occur.
And the embodiment of the present invention passes through the support rod 41 for making to constitute support frame 40 and open region 20 not in the same plane, it can
The characteristic that diffraction can be occurred through obstruction path using evaporation material molecule, is vaporized on substrate around support rod 41, from
And realizing support frame 40 not influences the purpose that homogeneity is deposited.
Wherein, the diffraction principle of material vapor deposition process, as shown in figure 11.During vapor deposition, evaporation material by thermal evaporation,
Evaporation material molecule meets with obstruction object (that is, support rod 41), and part evaporation material molecule is vaporized on obstruction around obstruction
Orthographic projection region on substrate, so that upper evaporation material is all deposited in all areas on substrate.
In the mask plate that the embodiment of the present invention provides, keep occlusion part 30 and mask plate ontology 10 solid by support frame 40
Fixed connection, can solve the fixation problem of occlusion part 30 Yu mask plate ontology 10, so that display panel can be realized in viewing area aperture
Design.Wherein, the setting of occlusion part 30 can avoid the glass in substrate when carrying out evaporation material vapor deposition using the mask plate
Upper evaporation material is deposited in glass glue overlay area.Support frame 40 is set as being connected and composed by multiple support rods 41, and makes multiple
The support rod 41 connecting in strut 41 with mask plate ontology 10 is extended by mask plate ontology 10, and is located at mask plate ontology 10
Side can make the open region 20 of the support rod 41 for constituting support frame 40 and mask plate ontology 10 not in the same plane.To benefit
The characteristic of diffraction can occur through obstruction path with evaporation material molecule, make what evaporation material was vaporized on substrate to be supported bar 41
Vapor deposition homogeneity is improved in the region of covering.
Optionally, support rod 41 is linear type support rod 41.
Optionally, as shown in Figure 3 and Figure 4, occlusion part 30 is located in open region 20, in multiple support rods 41 with occlusion part 30
The support rod 41 of connection is extended by occlusion part 30, positioned at the side of mask plate ontology 10；The branch being connect with mask plate ontology 10
Strut 41 and the support rod 41 connecting with occlusion part 30 are located at the same side of mask plate ontology 10.
Since the support rod 41 connecting with mask plate ontology 10 and the support rod 41 connecting with occlusion part 30 all extend to
The same side of mask plate ontology 10, so that the support rod 41 of open region 20 is projected in support frame 40 far from open region 20, thus,
Be conducive to the characteristic that diffraction can occur through obstruction path using evaporation material molecule, realize vapor deposition homogeneity.
On this basis, occlusion part 30 is set in open region 20, on the one hand, can not influence between mask plate and substrate
Distance.On the other hand, some materials are because diffraction path changes during can avoid vapor deposition, and are deposited and arrive occlusion part 30
View field on substrate.
Optionally, as shown in figure 3, support frame 40 includes at least three support sub-portions 42；Each support sub-portion 42 includes
Three support rods 41, and three support rods 41 are sequentially connected end to end into U-shaped shape.
In some embodiments, as shown in figure 3, each support sub-portion 42 includes three support rods 41, and three branch
Strut 41 is sequentially connected end to end into the U-shaped shape in right angle.
As shown in figure 3, three support rods 41 in each support sub-portion 42 are respectively the branch connecting with mask plate ontology 10
Strut 41 (hereinafter referred to as first support bar 411), 41 (the hereinafter referred to as second support bar of support rod being connect with occlusion part 30
412) and connection first support bar 411 and second support bar 412 third support rod 413.First support bar 411, third branch
Strut 413 and second support bar 412 are sequentially connected end to end into the U-shaped shape in right angle.
In some embodiments, first support bar 411 and the plane at equal 20 place of vertical openings area of second support bar 412 are set
It sets, third support rod 413, which is parallel in the plane at 20 place of open region, to be arranged.In the case, can make third support rod 413 with
The distance of mask plate ontology 10 is in Centimeter Level, so that diffracting effect when evaporation material is by third support rod 413 is more preferable, vapor deposition
Material is deposited more evenly.
When support frame 40 includes at least three support sub-portions 42, it is ensured that the stability of occlusion part 30.Sub-portion will be supported
42 are arranged to the U-shaped shape in right angle, can guarantee the equal of vapor deposition by control third support rod 413 at a distance from mask plate ontology 10
One property.
On this basis, optionally, as shown in figure 4, support sub-portion 42 is four；In four support sub-portions 42, wherein two
A support sub-portion 42 is located in the first plane, other two support sub-portion 42 is located in the second plane, and the first plane and second
Plane is vertical.
When support frame 40 includes four support sub-portions 42, enough support forces can be provided.It is flat orthogonal first
Two support sub-portions 42 are respectively set in face and the second plane, so that support sub-portion 42 is uniformly distributed, evaporation material can be made to pass through branch
It is deposited more evenly after 41 diffraction of strut.
Optionally, as it can be seen in figures 5 and 6, occlusion part 30 is located at the side of open region 20；Support frame 40 includes at least three
Chapelet portion 42；Each support sub-portion 42 includes two support rods 41, and two support rods 41 are sequentially connected end to end l-shaped shape
Shape.
Occlusion part 30 is located at the side of open region 20, that is, occlusion part 30 and open region 20 be not in same plane.
As it can be seen in figures 5 and 6, two support rods 41 in support sub-portion 42 are respectively the support connecting with mask plate ontology 10
Bar 41 (hereinafter referred to as the 4th support rod 414), the support rod 41 (hereinafter referred to as the 5th support rod 415) being connect with occlusion part 30.
4th support rod 414 and the 5th support rod 415 are sequentially connected end to end l-shaped shape.
In the case, it can make the 5th support rod 415 at a distance from mask plate ontology 10 in Centimeter Level, so that evaporation material
Diffracting effect when by third support rod 413 is more preferable, and evaporation material is deposited more evenly.
When support frame 40 includes at least three support sub-portions 42, it is ensured that the stability of occlusion part 30.Sub-portion will be supported
42 setting l-shaped shapes can guarantee the homogeneity of vapor deposition by the 5th support rod 415 of control at a distance from mask plate ontology 10.
On this basis, optionally, as shown in fig. 6, support sub-portion 42 is four, in four support sub-portions 42, wherein two
A support sub-portion 42 is located in the first plane, other two support sub-portion 42 is located in the second plane, and the first plane and second
Plane is vertical.
When support frame 40 includes four support sub-portions 42, enough support forces can be provided.It is flat orthogonal first
Two support sub-portions 42 are respectively set in face and the second plane, so that support sub-portion 42 is evenly distributed, evaporation material can be made to pass through branch
It is deposited more evenly after 41 diffraction of strut.
Optionally, as shown in FIG. 7 and 8, occlusion part 30 is located at the side of open region 20；The branch being connect with mask plate ontology 10
Strut 41, the other end are connect with occlusion part 30.Support rod 41 is of a straight line type.
Since the both ends of support rod 41 are directly connected to mask plate ontology 10 and occlusion part 30, support rod 41 can give occlusion part
30 provide stronger support force, and stability is more preferable.
Optionally, as shown in Figure 12-17, occlusion part 30 includes occlusion part ontology 31 and leading to through occlusion part ontology 31
Hole 32, through-hole 32 are located at the middle position of occlusion part ontology 31.
When occlusion part ontology 31 includes through-hole 32, the structure of occlusion part ontology 31 is lighter, save the cost, and can subtract
The support force that few support rod 41 provides, reduces the requirement to support rod 41.
Alternatively, optional, as shown in figures 3-8, occlusion part 30 includes occlusion part ontology 31, and nothing runs through in occlusion part ontology 31
The through-hole 32 of occlusion part ontology 31.
Based on foregoing description, optionally, the cross sectional shape of support rod 41 can be circle, and the diameter of cross sectional shape is in micron
Grade.Alternatively, the cross sectional shape of support rod 41 is rectangle, the side length of cross sectional shape is in the micron-scale.
Optionally, the material of support rod 41 can be stainless steel (SUS) or invar alloy (Invar).
The embodiment of the present invention also provides a kind of evaporation coating device, including above-mentioned mask plate.The evaporation coating device has and covers
The identical beneficial effect of template, details are not described herein.
Optionally, the evaporation coating device further includes evaporation source；As shown in figure 18, evaporation source is line evaporation source 51, alternatively, such as
Shown in Figure 19, evaporation source is point evaporation source 52.
In the case where evaporation source is line evaporation source 51, what the size of occlusion part 30 can need to be arranged with viewing area on substrate
Encapsulation region size is of substantially equal.
In the case where evaporation source is point evaporation source 52, according to the encapsulation region area for needing to be arranged on substrate, evaporation source is put
52 with the vertical range of 20 place plane of open region, and the position of point evaporation source 52, occlusion part 30 can be calculated and need to be arranged
Size.
The embodiment of the present invention also provides a kind of preparation method of substrate, comprising: above-mentioned evaporation coating device is utilized, in substrate
Viewing area upper evaporation material is deposited, form evaporation material layer；Wherein, an open region 20 of mask plate is corresponding in evaporation coating device
The viewing area of one substrate.
Based on this, the substrate of formation, comprising: substrate, the evaporation material layer on substrate, the evaporation material layer is in substrate
On orthographic projection be located at viewing area encapsulation region no overlap.
When using evaporation source evaporation material, point vapor deposition source position is constant, more equal to make to be deposited material on substrate
Even, film forming is more preferable, and substrate can be made to rotate with the board in evaporation coating device.
When using line evaporation source evaporation material, substrate is not rotated, after making evaporation material that diffraction occur by support rod 41
More evenly, film forming is more preferable, and line evaporation source can be made to be moved along itself longer sides direction for vapor deposition.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any
Those familiar with the art in the technical scope disclosed by the present invention, can easily think of the change or the replacement, and should all contain
Lid is within protection scope of the present invention.Therefore, protection scope of the present invention should be based on the protection scope of the described claims.
Claims (10)
1. a kind of mask plate, which is characterized in that including mask plate ontology, the mask plate ontology includes at least one opening area；
The mask plate further includes at least one occlusion part；Each open region corresponds at least one described occlusion part, and edge
The direction of plane locating for the vertical open region, the projection of the occlusion part are completely covered by the projection of the open region；
The occlusion part is fixedly connected by support frame with the mask plate ontology；Support frame as described above connects structure by multiple support rods
At；The support rod connecting in the multiple support rod with mask plate ontology is extended by the mask plate ontology, is covered positioned at described
The side of stencil body.
2. mask plate according to claim 1, which is characterized in that the sheltering part is in the open region；
The support rod connecting in the multiple support rod with the occlusion part is extended by the occlusion part, is located at the mask plate
The side of ontology；
The support rod connecting with the mask plate ontology and the support rod connecting with the occlusion part are located at the mask plate ontology
The same side.
3. mask plate according to claim 2, which is characterized in that support frame as described above includes at least three support sub-portions；
Each support sub-portion includes three support rods, and three support rods are sequentially connected end to end into U-shaped shape.
4. mask plate according to claim 1, which is characterized in that the sheltering part is in the side of the open region；
Support frame as described above includes at least three support sub-portions；
Each support sub-portion includes two support rods, and two support rods are sequentially connected end to end l-shaped shape.
5. mask plate according to claim 1, which is characterized in that the sheltering part is in the side of the open region；
The support rod connecting with mask plate ontology, the other end are connect with the occlusion part；Support rod is of a straight line type.
6. mask plate according to claim 3 or 4, which is characterized in that the support sub-portion is four；
In four support sub-portions, support sub-portion described in two of them is located in the first plane, other two described branch chapelet
Portion is located in the second plane, and first plane and second plane are vertical.
7. mask plate according to claim 1-6, which is characterized in that the occlusion part include occlusion part ontology with
And the through-hole through the occlusion part ontology, the through-hole are located at the middle position of the occlusion part ontology；Or；
The occlusion part includes occlusion part ontology, without the through-hole for running through the occlusion part ontology in the occlusion part ontology.
8. a kind of evaporation coating device, which is characterized in that including the described in any item mask plates of claim 1-7.
9. evaporation coating device according to claim 8, which is characterized in that further include evaporation source；The evaporation source is line vapor deposition
Source or point evaporation source.
10. a kind of preparation method of substrate characterized by comprising
Using evaporation coating device described in claim 8 or 9, upper evaporation material is deposited in the viewing area of substrate, forms evaporation material
Layer；
Wherein, in the evaporation coating device the corresponding substrate in an open region of mask plate viewing area.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811217652.5A CN109182967B (en) | 2018-10-18 | 2018-10-18 | Mask plate, evaporation device and preparation method of substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811217652.5A CN109182967B (en) | 2018-10-18 | 2018-10-18 | Mask plate, evaporation device and preparation method of substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109182967A true CN109182967A (en) | 2019-01-11 |
| CN109182967B CN109182967B (en) | 2020-08-11 |
Family
ID=64945567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811217652.5A Active CN109182967B (en) | 2018-10-18 | 2018-10-18 | Mask plate, evaporation device and preparation method of substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109182967B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114015978A (en) * | 2021-11-09 | 2022-02-08 | 昆山国显光电有限公司 | Shield, mask assembly, vapor deposition device, and vapor deposition method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0955791A1 (en) * | 1997-10-15 | 1999-11-10 | Toray Industries, Inc. | Process for manufacturing organic electroluminescent device |
| CN204361134U (en) * | 2014-12-22 | 2015-05-27 | 信利（惠州）智能显示有限公司 | A kind of OLED evaporation mask plate bracing frame |
| CN105449126A (en) * | 2015-12-22 | 2016-03-30 | 上海天马有机发光显示技术有限公司 | Evaporation mask plate and manufacturing method thereof |
| CN108588640A (en) * | 2018-04-25 | 2018-09-28 | 京东方科技集团股份有限公司 | The production method and display device of a kind of mask plate, display device |
| CN108611600A (en) * | 2018-08-17 | 2018-10-02 | 京东方科技集团股份有限公司 | Mask structure |
-
2018
- 2018-10-18 CN CN201811217652.5A patent/CN109182967B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0955791A1 (en) * | 1997-10-15 | 1999-11-10 | Toray Industries, Inc. | Process for manufacturing organic electroluminescent device |
| CN204361134U (en) * | 2014-12-22 | 2015-05-27 | 信利（惠州）智能显示有限公司 | A kind of OLED evaporation mask plate bracing frame |
| CN105449126A (en) * | 2015-12-22 | 2016-03-30 | 上海天马有机发光显示技术有限公司 | Evaporation mask plate and manufacturing method thereof |
| CN108588640A (en) * | 2018-04-25 | 2018-09-28 | 京东方科技集团股份有限公司 | The production method and display device of a kind of mask plate, display device |
| CN108611600A (en) * | 2018-08-17 | 2018-10-02 | 京东方科技集团股份有限公司 | Mask structure |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114015978A (en) * | 2021-11-09 | 2022-02-08 | 昆山国显光电有限公司 | Shield, mask assembly, vapor deposition device, and vapor deposition method |
| CN114015978B (en) * | 2021-11-09 | 2024-01-26 | 昆山国显光电有限公司 | Shielding piece, mask assembly, vapor deposition device and vapor deposition method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109182967B (en) | 2020-08-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106086782B (en) | A kind of mask plate component and its installation method, evaporation coating device | |
| CN106591776B (en) | Fine mask plate and preparation method thereof | |
| CN109713162A (en) | Display panel and display device | |
| CN109166976A (en) | The production method and display device of display panel, mask plate, display panel | |
| US10571730B2 (en) | Spliced display and menufacturing method thereof | |
| JP6403184B2 (en) | Vapor deposition apparatus and mask assembly applied thereto | |
| CN101798670B (en) | Mask assembly and deposition apparatus using the same for flat panel display | |
| CN104201289B (en) | Pixel unit and production method for same, display panel, and display device | |
| CN208136315U (en) | Vapor deposition substrate and evaporated device | |
| CN104112761B (en) | Organic light emitting diode display | |
| CN108269839A (en) | A kind of display screen and the electronic equipment with display screen | |
| CN103774087A (en) | Deposition mask assembly manufacturing apparatus for flat display device | |
| CN205556762U (en) | Mask plate, mother board, mask plate manufacture equipment and display substrates coating by vaporization system | |
| CN105586568A (en) | Mask frame assembly, evaporation method and array substrate | |
| CN109753185A (en) | A kind of manufacturing method and touch display unit of touch display unit | |
| CN109887411B (en) | Display panel and display device | |
| CN109182967A (en) | The preparation method of mask plate and evaporation coating device, substrate | |
| CN108359935A (en) | Mask plate and preparation method thereof, evaporation coating method | |
| CN105589246A (en) | Curved display device | |
| CN109686744A (en) | TFT substrate, OLED display panel and manufacturing method | |
| CN111826608A (en) | Mask plate, preparation method of mask plate and evaporation device | |
| CN112002734A (en) | OLED display panel | |
| CN109713163A (en) | Organic light emitting display panel and preparation method thereof, display device | |
| CN109976038A (en) | A kind of surface light source device and preparation method thereof, display device | |
| CN117418193A (en) | Mask plate preparation method and mask plate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |