CN109166715B - Vacuum continuous dipping treatment device - Google Patents

Vacuum continuous dipping treatment device Download PDF

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Publication number
CN109166715B
CN109166715B CN201810885711.XA CN201810885711A CN109166715B CN 109166715 B CN109166715 B CN 109166715B CN 201810885711 A CN201810885711 A CN 201810885711A CN 109166715 B CN109166715 B CN 109166715B
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vacuum
controller
drying device
drying
automatic detection
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CN109166715A (en
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戴振华
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Zhangjiagang Shuangcheng Electrician Equipment Co ltd
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Zhangjiagang Shuangcheng Electrician Equipment Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/005Impregnating or encapsulating

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Reinforced Plastic Materials (AREA)
  • Coating Apparatus (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

The invention discloses a vacuum continuous dipping treatment device, which comprises a vertical base, a vertical column, a vacuum dipping mechanism, a drying device, a first controller, a second controller, an automatic detection device and a cooling device, wherein the vertical column is internally provided with a circuit integrated board, the vacuum dipping mechanism and the drying device are arranged on the vertical column in a penetrating way and provided with a vacuum starter, the first controller and the second controller are arranged at the joint of the two sides of the vacuum dipping mechanism and the drying device, the automatic detection device is arranged on the right side of the drying device, the cooling device is arranged on the right side of the vacuum dipping mechanism and is connected with the first controller, a residual material recovery tank with an automatic processor is connected below the cooling device, a plurality of rows of drying holes are arranged at the upper end and the lower end in the drying device, the automatic detection device is connected with the first controller circuit, and triggering continuous processing and cooling starting according to a finished product parameter detection result of the automatic detection device, wherein the vacuum impregnation mechanism and the drying device form a square-shaped closed loop processing structure.

Description

Vacuum continuous dipping treatment device
Technical Field
The invention relates to the technical field of impregnation production equipment, in particular to a vacuum continuous impregnation treatment device.
Background
The vacuum continuous dipping treatment device is mainly used for dipping and drying workpieces such as motor coils, iron cores, transformers and the like. In practical application, the continuous treatment mainly comprises a split structure, a plurality of impregnating devices and a plurality of drying devices, so that the repeated and continuous impregnating and drying treatment is realized, the equipment volume is large and relatively large, and the working efficiency is not high as a whole. Meanwhile, the temperature and humidity required by the processes of dipping, drying and the like in different independent stages greatly consume the whole working assembly.
In view of the above, there is a need to provide a vacuum continuous immersion treatment apparatus which has a simple structure, a small volume, high efficiency, integration, and capability of meeting application requirements, integrates temperature and humidity control, adopts a closed loop structure shaped like a Chinese character 'hui' to replace a traditional linear split type treatment structure, and has a real-time detection function of finished product quality and a longer service life.
Disclosure of Invention
The invention aims to provide a vacuum continuous dipping treatment device.
In order to achieve the purpose, the invention provides the following technical scheme:
a vacuum continuous dipping treatment device comprises a base, a vertical column, a vacuum dipping mechanism, a drying device, a first controller, a second controller, an automatic detection device and a cooling device, wherein the vertical column is vertically arranged, the vertical column is internally provided with a circuit integrated board, the vacuum dipping mechanism and the drying device are arranged on the vertical column in a penetrating way, the vacuum dipping mechanism is provided with a vacuum starter, the first controller and the second controller are arranged at the joint of the two sides of the vacuum dipping mechanism and the drying device, the automatic detection device is arranged on the right side of the drying device, the cooling device is arranged on the right side of the, a residual material recovery tank with an automatic processor is connected below the cooling device, a plurality of rows of drying holes are arranged at the upper end and the lower end in the drying device, the automatic detection device is connected with the first controller circuit, and triggering continuous processing and cooling starting according to a finished product parameter detection result of the automatic detection device, wherein the vacuum impregnation mechanism and the drying device form a square-shaped closed loop processing structure.
As a further improvement of the present invention, the vacuum impregnation mechanism is provided above the drying device.
Further, the trigger is arranged above the first controller.
Further, the circuit integrated board can automatically distribute different temperatures and humidities for the vacuum impregnation mechanism and the drying device according to different processing requirements.
Furthermore, the cooling device and the excess material recovery tank are T-shaped.
Further, the automatic detection device and the excess material recovery tank are both fixedly arranged on the base.
Compared with the prior art, the invention has the advantages that: the invention has simple structure, small volume, high efficiency and integration, meets the application requirements, integrates temperature and humidity control, adopts a closed loop structure in a shape like a Chinese character 'hui' to replace the traditional linear split type processing structure, simultaneously has the real-time detection function of the quality of finished products and has longer service life.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments described in the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic plan view of a vacuum continuous immersion processing apparatus according to an embodiment of the present invention. Wherein 18 is a base, 22 is a circuit integrated board, 31 is a column, 30 is a vacuum starter, 50 is a vacuum impregnation mechanism, 10 is a drying device, 11 is a first controller, 21 is a second controller, 40 is an automatic detection device, 13 is a trigger, 20 is a cooling device, 41 is an automatic processor, 44 is a residue recovery tank, and 33 is a drying hole.
Detailed Description
The technical solutions in the embodiments of the present invention will be described in detail below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention.
The embodiment of the invention discloses a vacuum continuous dipping treatment device, and a person skilled in the art can appropriately improve the technological parameters by referring to the content. It is expressly intended that all such similar substitutes and modifications which would be obvious to one skilled in the art are deemed to be included in the invention. While the invention has been described in terms of preferred embodiments, it will be apparent to those skilled in the art that the techniques of the invention can be implemented and applied by modifying or appropriately combining the applications described herein without departing from the spirit, scope and spirit of the invention.
For a further understanding of the present invention, reference will now be made in detail to the following examples.
As shown in fig. 1, in an embodiment, a vacuum continuous dipping processing apparatus includes a vertical base 18, a vertical column 31 with a circuit board 22 therein, a vacuum dipping mechanism 50 and a drying apparatus 10 passing through the vertical column 31 and having a vacuum actuator 30, a first controller 11 and a second controller 21 disposed at a connection position of two sides of the vacuum dipping mechanism 50 and the drying apparatus 10, an automatic detection device 40 disposed at a right side of the drying apparatus 10, and a cooling apparatus 20 disposed at a right side of the vacuum dipping mechanism 50 and connected to the first controller 11 through a trigger 13, a remainder recovery tank 44 having an automatic processor 41 is connected below the cooling apparatus 20, a plurality of rows of drying holes 33 are disposed at upper and lower ends of the drying apparatus 10, the automatic detection device 40 is electrically connected to the first controller 11 and triggers continuous processing and cooling start according to a detection result of a finished product parameter of the automatic detection device 40, the vacuum impregnation mechanism 50 and the drying apparatus 10 form a closed loop processing structure of a shape of a Chinese character 'hui'.
Preferably, the vacuum impregnation mechanism 50 is provided above the drying device 10. After the vacuum impregnation mechanism 50 finishes the impregnation treatment, the second controller senses and starts the impregnation mechanism, and the impregnation mechanism enters the drying device 10 for drying treatment; after the drying device finishes the drying process, the drying device is detected by the automatic detection device 40, and the automatic detection device 40 controls the first controller 11, so that the first controller 11 determines the triggering action of the trigger 13 after sensing.
Preferably, the trigger 13 is disposed above the first controller 11. When the trigger 13 is opened, the cooling process is carried out; when the trigger 13 is turned off, the vacuum impregnation mechanism 50 is entered to perform a secondary vacuum impregnation process. Thus circulating.
Preferably, the circuit board 22 can automatically distribute different temperatures and humidities for the vacuum impregnation mechanism 50 and the drying device 10 according to different processing requirements. The circuit integrated board 22 controls the process to be performed at any time, when entering the impregnation link, the temperature and the humidity in the vacuum impregnation mechanism 50 are automatically matched, and the temperature and the humidity in the drying device 10 are monitored for the next drying; when entering the drying link, the temperature and humidity in the drying device 10 will be automatically matched, and the temperature and humidity in the vacuum impregnation mechanism 50 will be adjusted back at the same time, so as to be required for the second vacuum impregnation treatment.
Preferably, the cooling device 20 and the remainder recovery tank 44 are T-shaped.
Preferably, the automatic detection device 40 and the remainder recovery tank 44 are both fixedly arranged on the base 18.
The invention has simple structure, small volume, high efficiency and integration, meets the application requirements, integrates temperature and humidity control, adopts a closed loop structure in a shape like a Chinese character 'hui' to replace the traditional linear split type processing structure, simultaneously has the real-time detection function of the quality of finished products and has longer service life.
The embodiments of the invention shown in the drawings and described in accordance with the drawings are exemplary only, and the invention is not limited to these embodiments. It should be noted that, in order to avoid obscuring the present invention with unnecessary details, only the structures and/or processing steps closely related to the scheme according to the present invention are shown in the drawings, and other details not so relevant to the present invention are omitted. The foregoing is directed to embodiments of the present application and it is noted that numerous modifications and adaptations may be made by those skilled in the art without departing from the principles of the present application and are intended to be within the scope of the present application.

Claims (6)

1. A vacuum continuous dipping treatment device is characterized by comprising a base, a vertical column, a vacuum dipping mechanism, a drying device, a first controller, a second controller, an automatic detection device and a cooling device, wherein the vertical column is vertical to the base, the vertical column is internally provided with a circuit integrated board, the vacuum dipping mechanism and the drying device are arranged on the vertical column in a penetrating way and provided with a vacuum starter, the first controller and the second controller are arranged at the joint of the two sides of the vacuum dipping mechanism and the drying device, the automatic detection device is arranged on the right side of the drying device, the cooling device is arranged on the right side of the vacuum dipping mechanism and, a residual material recovery tank with an automatic processor is connected below the cooling device, a plurality of rows of drying holes are arranged at the upper end and the lower end in the drying device, the automatic detection device is connected with the first controller circuit, and triggering continuous processing and cooling starting according to a finished product parameter detection result of the automatic detection device, wherein the vacuum impregnation mechanism and the drying device form a square-shaped closed loop processing structure.
2. The vacuum continuous immersion processing apparatus as claimed in claim 1, wherein the vacuum immersion mechanism is provided above the drying device.
3. The vacuum continuous immersion processing apparatus as claimed in claim 1, wherein the trigger is provided above the first controller.
4. The vacuum continuous impregnation processing device of claim 1, wherein the circuit integrated board can automatically distribute different temperatures and humidities for the vacuum impregnation mechanism and the drying device according to different processing requirements.
5. A vacuum continuous impregnation treatment apparatus as claimed in claim 1, wherein said cooling means and said discard recovering tank are T-shaped.
6. The vacuum continuous immersion treatment apparatus as claimed in claim 1, wherein the automatic detection device and the excess material recovery tank are both fixed on a base.
CN201810885711.XA 2018-08-06 2018-08-06 Vacuum continuous dipping treatment device Active CN109166715B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810885711.XA CN109166715B (en) 2018-08-06 2018-08-06 Vacuum continuous dipping treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810885711.XA CN109166715B (en) 2018-08-06 2018-08-06 Vacuum continuous dipping treatment device

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CN109166715A CN109166715A (en) 2019-01-08
CN109166715B true CN109166715B (en) 2020-08-21

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1984004704A1 (en) * 1983-05-24 1984-12-06 Kjeld Holbek A method of impregnating a fibrous material
CN2526952Y (en) * 2001-10-16 2002-12-18 张家港市长城真空浸漆设备制造有限公司 Vacuum varnishing dryer
CN2829907Y (en) * 2005-08-03 2006-10-25 中山市大洋电机有限公司 High efficiency insulation paint dipping appts
CN103255591A (en) * 2013-04-28 2013-08-21 张家港市乙平化纤有限公司 Vacuum soaking and drying all-in-one machine
CN204160656U (en) * 2014-09-25 2015-02-18 安徽精新能源科技股份有限公司 A kind of vacuum impregnation plant
CN105097272A (en) * 2015-09-11 2015-11-25 中变集团上海变压器有限公司 Vacuum pressure paint-soaking process for dry-type transformer coil
CN205495926U (en) * 2016-04-13 2016-08-24 张家港市双成电工设备有限公司 Vacuum impregnation drying -machine
CN107321562A (en) * 2017-08-12 2017-11-07 迅展机械(无锡)有限公司 The cured device of upper control leaching

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1984004704A1 (en) * 1983-05-24 1984-12-06 Kjeld Holbek A method of impregnating a fibrous material
CN2526952Y (en) * 2001-10-16 2002-12-18 张家港市长城真空浸漆设备制造有限公司 Vacuum varnishing dryer
CN2829907Y (en) * 2005-08-03 2006-10-25 中山市大洋电机有限公司 High efficiency insulation paint dipping appts
CN103255591A (en) * 2013-04-28 2013-08-21 张家港市乙平化纤有限公司 Vacuum soaking and drying all-in-one machine
CN204160656U (en) * 2014-09-25 2015-02-18 安徽精新能源科技股份有限公司 A kind of vacuum impregnation plant
CN105097272A (en) * 2015-09-11 2015-11-25 中变集团上海变压器有限公司 Vacuum pressure paint-soaking process for dry-type transformer coil
CN205495926U (en) * 2016-04-13 2016-08-24 张家港市双成电工设备有限公司 Vacuum impregnation drying -machine
CN107321562A (en) * 2017-08-12 2017-11-07 迅展机械(无锡)有限公司 The cured device of upper control leaching

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