CN109126918B - Device for producing acoustic fluid forceps - Google Patents
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- CN109126918B CN109126918B CN201811217163.XA CN201811217163A CN109126918B CN 109126918 B CN109126918 B CN 109126918B CN 201811217163 A CN201811217163 A CN 201811217163A CN 109126918 B CN109126918 B CN 109126918B
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Abstract
The embodiment of the invention discloses a device for generating acoustic fluid forceps, which comprises: the at least one bulk acoustic wave generating component comprises a bottom electrode, a piezoelectric layer and a top electrode which are sequentially arranged from bottom to top; an acoustic wave reflecting portion provided in contact with one surface of the bulk acoustic wave generating member; the overlapping area of the bottom electrode, the piezoelectric layer, the top electrode and the acoustic wave reflecting part forms a bulk acoustic wave generating area; a backing layer for supporting the bulk acoustic wave generating member; at least one flow channel, wherein a partial area of the flow channel cavity covers an acoustic wave action area of at least one bulk acoustic wave generation area; wherein the acoustic fluid forceps further comprise a passivation layer; the passivation layer covers a portion of the piezoelectric layer where the top electrode is not provided. From the above, the above-mentioned device of this application produces the sound fluid tweezers and can realize carrying out accurate operation to molecules, nano-particles and micrometer scale object.
Description
Technical Field
The invention relates to the field of microelectronic devices, in particular to a device for generating acoustic fluid tweezers.
Background
Capturing and accurately manipulating tiny particles, even single molecules, has spawned many methods for biomedical physical process research, with significant impact on facilitating basic science and application research in the relevant fields. Over the past several decades, a wide variety of particle capture and manipulation techniques have been developed, such as optical tweezers, acoustic tweezers, magnetic tweezers, and some of the column techniques based on electric field control. The optical tweezers are most widely applied, and the advantages of high precision, controllability and the like in micro-nano particle operation enable the optical tweezers to be developed into an important particle operation tool in basic research. However, the optical tweezers have the defects of low operation efficiency, obvious temperature effect, complex equipment operation and the like. For this reason, in some applications, other types of micro-nanoparticle "tweezer" techniques have been developed in place of optical tweezers. For example, the acoustic tweezers have the characteristics of low cost and simple operation, and are verified in applications such as particle sorting and capturing. In addition, the fluid field control based on low Reynolds number can also realize accurate control on micrometer scale or even quantum dots. Meanwhile, the technology has the technical bottlenecks that the further practical application is hindered, such as low operation sample size, relatively complex operation, less realization functions and the like. In recent years, fluid driving force is generated by utilizing attenuation of sound waves in liquid to form vortex, and further capture and operation of particles are gradually attracted by utilizing vortex with special shape, so that great application potential is shown in practical use. Among them, a vortex generation mode of earlier research of generating a vortex by using surface vibration of microbubbles is limited by short operational life of microbubbles, particularly instability in fluids. The eddy current generated in the micro-nano flow channel width direction by adopting the surface acoustic wave device with higher frequency has been started to be used for online capturing and screening of micro-nano particles. However, the size of the vortex is larger, the accuracy of particle control is low, the application requirements of more similar optical tweezers operation cannot be met, and the online screening of particles is limited at present. Therefore, it is a current urgent need to be solved to generate eddy currents of desired shape and size and to use the eddy currents to realize various operations on micro-nano particles.
Thus, there is a need for a device for generating acoustic fluid tweezers by which to achieve accurate manipulation of micro-nano scale fluids, as well as molecules, nanoparticles and micro-scale objects.
Disclosure of Invention
In view of the above, a primary object of the present invention is to provide a device for generating acoustic fluid tweezers, so as to achieve precise manipulation of micro-nano scale fluids, as well as molecules, nanoparticles and micro-scale objects by the acoustic fluid tweezers.
The invention provides a device for producing acoustic fluid forceps, comprising:
the at least one bulk acoustic wave generating component comprises a bottom electrode, a piezoelectric layer and a top electrode which are sequentially arranged from bottom to top;
an acoustic wave reflecting portion provided in contact with one surface of the bulk acoustic wave generating member;
the overlapping area of the bottom electrode, the piezoelectric layer, the top electrode and the acoustic wave reflecting part forms a bulk acoustic wave generating area;
a backing layer for supporting the bulk acoustic wave generating member;
at least one flow channel, wherein a partial area of the flow channel cavity covers an acoustic wave action area of at least one bulk acoustic wave generation area;
wherein the acoustic fluid forceps further comprise a passivation layer; the passivation layer covers a portion of the piezoelectric layer where the top electrode is not provided.
By the above, the device of the application utilizes a three-dimensional vortex array which can be generated by ultra-high frequency sound waves and is used for realizing ultra-rapid mixing in a micro-nano fluid system. The micro-nano particle can be operated by utilizing the regulation and control of the vortex array. In addition, the application sets up a passivation layer, sets up the benefit of this passivation layer and is: (1) The use of the passivation layer effectively makes the generated vortex more regular in shape, is more suitable for the operation of micro-nano particles, and improves the operation effect of the micro-nano particles; (2) The existence of the passivation layer can make the bonding of the runner structure and the substrate very convenient (the bonding of the silicon dioxide surface and PDMS, glass capillary and the like is more convenient). (3) The piezoelectric layer is protected from being damaged by liquid in the flow channel (particularly corrosion of alkaline solution), and the application adaptability of the device is improved (the working adaptability of the system is wider in object range).
The present application also provides an apparatus for producing acoustic fluid forceps, comprising:
at least one bulk acoustic wave generating member comprising: a bottom electrode, a piezoelectric layer, and a top electrode;
wherein the bottom electrode and the top electrode are respectively arranged at the lower side and the upper side of the piezoelectric layer, and the bottom electrode and the top electrode are not overlapped in the vertical direction; and a gap is formed between the part of the piezoelectric layer, which is overlapped with the bottom electrode, and the top electrode;
an acoustic wave reflecting portion provided in contact with one surface of the bulk acoustic wave generating member;
the overlapping area of the bottom electrode, the piezoelectric layer, the top electrode and the acoustic wave reflecting part forms a bulk acoustic wave generating area;
a backing layer for supporting the bulk acoustic wave generating member;
at least one flow channel, wherein a partial area of the flow channel cavity covers an acoustic wave action area of at least one bulk acoustic wave generation area;
and the passivation layer covers the part, which is arranged on the piezoelectric layer and is not covered by the top electrode.
By the above, the gap in the above device of the present application can be such that the sound field is controlled in the gap so that the eddy current is distributed in the gap. The size of the gap can be adjusted according to the requirement, and a novel vortex generating structure is provided. Moreover, the strength of the vortex can be regulated by the size of the gap, which is more beneficial to improving the convenience of regulation. The passivation layer functions in the same manner as described above and will not be described again here.
The present application also provides an apparatus for producing acoustic fluid forceps, comprising:
at least one bulk acoustic wave generating member comprising: a bottom electrode, a piezoelectric layer, and a top electrode;
the bottom electrode and the top electrode are arranged on the upper side of the piezoelectric layer, and the bottom electrode and the top electrode are arranged on the same horizontal layer; a gap is formed between the bottom electrode and the top electrode;
an acoustic wave reflecting portion provided in contact with one surface of the bulk acoustic wave generating member;
the overlapping area of the bottom electrode, the piezoelectric layer, the top electrode and the acoustic wave reflecting part forms a bulk acoustic wave generating area;
a backing layer for supporting the bulk acoustic wave generating member;
at least one flow channel, the partial area of the flow channel cavity covers the sound wave action area of at least one bulk sound wave generation area.
From above, the top electrode and the bottom electrode of the device of the present application are both disposed on the upper side of the piezoelectric layer. The device processing is more convenient, and the process steps are reduced. And a gap is also arranged in the device, so that the sound field is controlled in the gap, and the vortex is distributed in the gap. The size of the gap can be adjusted according to the requirement, and a novel vortex generating structure is provided. Moreover, the strength of the vortex can be regulated by the size of the gap, which is more beneficial to improving the convenience of regulation.
Preferably, the device further comprises:
and the suspension electrode is arranged at the bottom of the piezoelectric layer and is overlapped with the gap and the piezoelectric layer in the vertical direction.
From this, the existence of the suspension electrode changes the electric field distribution of the gap, so that the electric field existing mainly in the gap moves toward the signal electrode. The regulation and control of the electric field in another form are realized, and then the regulation and control of the generated acoustic fluid forceps are realized. Thus, the suspended electrodes make the sound field achieved by the structure of fig. 5 substantially the same as that of fig. 2. But the device structure shown in fig. 5 is simpler and the process flow is less.
Preferably, the device further comprises:
and the microfluidic sample injection system is connected with the flow channel cavity and used for controlling the injection quantity of the microfluid flowing into the flow channel cavity and controlling the injection speed of the microfluid.
By controlling the injection amount of the microfluid and the speed for controlling the injection of the microfluid, the above is achieved. The method is more beneficial to generating the acoustic fluid forceps for accurately controlling molecules, nano particles and objects with micrometer dimensions.
Preferably, the acoustic wave reflecting portion includes: a low acoustic impedance layer and a high acoustic impedance layer disposed between the bulk acoustic wave generating member and the substrate;
the low acoustic impedance layer and the high acoustic impedance layer are overlapped alternately;
the low acoustic impedance layer and the high acoustic impedance layer are adjacent in a group, and the number of the groups is set to be greater than or equal to three.
Thus, better sound wave reflection is facilitated.
Preferably, the acoustic wave reflecting portion includes: and a cavity formed on the substrate, wherein the cavity is opened on the surface facing away from the bulk acoustic wave generating component or is closed by the substrate.
In this way, the acoustic wave reflecting portion may be a cavity formed in the base material, and the acoustic wave may be reflected by the cavity.
Preferably, the flow path is provided on a surface of the bulk acoustic wave generating member opposite to the acoustic wave reflecting portion.
By the arrangement, the sound wave reflected by the sound wave reflecting part acts on the liquid in the flow channel to generate the acoustic fluid tweezers.
Preferably, the ratio of the horizontal plane projection area of the flow channel cavity to the horizontal plane projection area of the bulk acoustic wave generation region is greater than or equal to 100%;
the height of the flow channel cavity is 2-5 times of the diameter of the micro-nano particles, or the height range of the flow channel cavity is 10nm-10mm or 10 mu m-10mm.
From the above, the ratio of the horizontal plane projection area of the flow channel cavity to the horizontal plane projection area of the bulk acoustic wave generation area is greater than or equal to 100%; is a numerical value comprehensively considering the processing difficulty of an actual device and the control effect of the generated acoustic fluid forceps. From the above, the height of the runner cavity is 2-5 times of the diameter of the micro-nano particles, and the acoustic fluid tweezers with better control effect can be generated in the range of the interval. The height range of the runner cavity is 10nm-10mm or 10 mu m-10mm. In the interval range, the acoustic fluid forceps with better control effect can be produced.
Preferably, the passivation layer is made of silicon dioxide or silicon nitride;
the bulk acoustic wave generating component is a thin film bulk acoustic wave resonator or a lamb acoustic wave resonator with the working frequency set to be 0.5-50GHz.
The passivation layer is made of silicon dioxide or silicon nitride; (1) The generated vortex is more regular in shape and more suitable for the operation of micro-nano particles, so that the operation effect of the micro-nano particles is improved; (2) The bonding of the runner structure and the substrate can be very convenient (the bonding of the silicon dioxide surface and PDMS, glass capillary and the like is more convenient). (3) The piezoelectric layer is protected from being damaged by liquid in the flow channel (particularly corrosion of alkaline solution), and the application adaptability of the device is improved (the working adaptability of the system is wider in object range). The bulk acoustic wave generating component is a thin film bulk acoustic wave resonator or a lamb acoustic wave resonator with the working frequency set to be 0.5-50GHz. In this frequency range, acoustic fluid forceps with a good manipulation effect can be produced.
From the above, the acoustic fluid forceps for micro-nano scale fluid and particle manipulation provided by the invention can realize accurate operation on molecules, nano particles and micro-scale objects.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions of the prior art, the drawings that are needed in the embodiments or the description of the prior art will be briefly described below, it will be obvious that the drawings in the following description are some embodiments of the present invention, and that other drawings can be obtained according to these drawings without inventive effort to a person skilled in the art.
FIG. 1 is a schematic perspective view of an apparatus for producing acoustic fluid forceps according to an embodiment of the invention;
FIG. 2 is a schematic diagram of a first embodiment of an apparatus for producing acoustic fluid forceps according to an embodiment of the invention;
FIG. 3 is a schematic diagram of a second embodiment of an apparatus for producing acoustic fluid forceps according to an embodiment of the invention;
FIG. 4 is a schematic diagram of a third embodiment of an apparatus for producing acoustic fluid forceps according to an embodiment of the invention;
FIG. 5 is a schematic diagram of a fourth embodiment of an apparatus for producing acoustic fluid forceps according to an embodiment of the invention;
FIG. 6 is a schematic diagram of a fifth embodiment of an apparatus for producing acoustic fluid forceps according to an embodiment of the invention;
FIG. 7 is a top view of an acoustic fluid tweezer produced by the apparatus of the present invention and implementing a portion of the functionality of micro-nano particle manipulation;
FIG. 8 is a top view of a flow channel and a bulk acoustic wave generating region according to an embodiment of the present invention;
FIG. 9a is a schematic diagram of finite element simulation of a flow field of a device generating vortices in accordance with an embodiment of the present invention;
FIG. 9b is a simulated velocity field profile of FIG. 9 a;
fig. 10a is a schematic diagram of a size and shape analysis of the swirl holes of fig. 9 b.
FIG. 10b is a schematic diagram of the relationship between vortex pore size and liquid level.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. All other embodiments, which can be made by one of ordinary skill in the art without undue burden on the person of ordinary skill in the art based on embodiments of the present invention, are intended to be within the scope of the present invention.
In order to overcome the defects in the prior art, the invention provides a device for generating acoustic fluid tweezers, which can realize accurate operation on molecules, nano particles and objects with micrometer dimensions.
Example 1
In the implementation process of this embodiment, the feature scale of the flow channel is mainly in the micron level, so the flow channel is also called a micro-flow channel. The micro-channel is a basic component unit of a microfluidic system and is a fluid-operated carrier. Fig. 1 is a three-dimensional schematic diagram of an apparatus for producing acoustic fluid forceps according to the present invention. Different fluid samples enter the micro-channel from the I port and flow out from the H port. The fluid flows over the bulk acoustic wave generation region (i.e., the square region shown in the microchannel in fig. 1). Fig. 2 is a schematic cross-sectional view of the bulk acoustic wave generation region of fig. 1 taken along a direction perpendicular to the direction of microfluidic flow in the fluidic channel. As shown in fig. 2, the apparatus for producing acoustic fluid forceps includes:
the base layer 210 may be made of: silicon, silicon dioxide, glass, gallium arsenide, PDMS, parylene and the like.
An acoustic wave reflecting layer 220 disposed on the backing layer 210; the acoustic wave reflecting layer in this embodiment is an acoustic impedance layer. The acoustic impedance layer includes: a high acoustic impedance layer 221 and a low acoustic impedance layer 222. The low acoustic impedance layer and the high acoustic impedance layer are overlapped alternately. One of the low acoustic impedance layers and one of the high acoustic impedance layers are a group, and the number of the groups is set to be greater than or equal to three. The high acoustic impedance layer 221 and the low acoustic impedance layer 222 may be made of materials such as silicon, silicon dioxide, aluminum nitride, molybdenum, etc. with different acoustic impedances. If a high-low acoustic impedance multilayer combination is used as the acoustic wave reflecting structure, the thickness of each layer is correspondingly adjusted along with the change of the design working frequency, so that the wavelength of the acoustic wave in each layer of acoustic impedance layer is one quarter wavelength.
A bottom electrode layer 230 disposed on the acoustic wave reflecting layer 220; the bottom electrode layer 203 may be made of gold, aluminum, molybdenum, iron, titanium, copper, or other metals and alloys thereof. The bottom electrode layer has a thickness of 1000A, where the chinese name of the thickness unit a is angstrom, which means that 1A is equal to one tenth of a nanometer.
A piezoelectric layer 240 disposed on the bottom electrode layer 230; the piezoelectric layer 240 may be made of a piezoelectric material such as aluminum nitride, zinc oxide, lead zirconate titanate, lithium niobate, or the like. The thickness of the piezoelectric layer is 100A-100000A, and the Chinese name of the thickness unit A is angstrom, which means that 1A is equal to one tenth of nanometer.
A top electrode layer 250 disposed on the piezoelectric layer. The top electrode layer 250 may be composed of metals such as gold, aluminum, molybdenum, iron, titanium, copper, and alloys thereof. The top electrode has a thickness of 2000A, where the chinese name of the thickness unit a is angstrom, which means that 1A is equal to one tenth of a nanometer.
At least one flow channel structure 260; the runner cavity 261 of the runner structure is disposed in contact with the bulk acoustic wave generating region 270 formed by stacking the acoustic wave reflecting layer 220, the bottom electrode layer 230, the piezoelectric layer 240, and the top electrode layer 250.
Wherein the number of the bulk acoustic wave generation regions is 1 or more.
Wherein the acoustic fluid forceps further comprise a passivation layer 280; the passivation layer covers a portion of the piezoelectric layer where the top electrode is not provided.
The passivation layer has the advantages that: (1) The use of the passivation layer effectively makes the generated vortex more regular in shape, is more suitable for the operation of micro-nano particles, and improves the operation effect of the micro-nano particles; (2) The existence of the passivation layer can make the bonding of the runner structure and the substrate very convenient (the bonding of the silicon dioxide surface and PDMS, glass capillary and the like is more convenient). (3) The piezoelectric layer is protected from being damaged by liquid in the flow channel (particularly corrosion of alkaline solution), and the application adaptability of the device is improved (the working adaptability of the system is wider in object range).
As shown in fig. 8, the thin film bulk acoustic microfluidic hybrid device is shown in top view. Fig. 8 shows a proportional relationship between the projected area of the bulk acoustic wave generating region 82 in the horizontal direction and the projected area of the micro flow channel 81, and a manner of setting the relative positions of the bulk acoustic wave generating regions, specifically:
when the number of the bulk acoustic wave generating regions is 2, the relative positions of the bulk acoustic wave generating regions are set in such a manner that:
are arranged side by side along the flow direction of the fluid in the flow channel according to a specified distance; or alternatively, the first and second heat exchangers may be,
are arranged side by side according to a specified distance in a direction perpendicular to the flow direction of the fluid in the flow channel; or alternatively, the first and second heat exchangers may be,
are arranged side by side at a specified distance in a 45 degree angular direction along the flow direction of the fluid in the flow channel and in the middle of the flow direction of the fluid perpendicular to the flow direction of the fluid in the flow channel.
When the number of the bulk acoustic wave generating regions is greater than 2, the arrangement modes of the relative positions of the bulk acoustic wave generating regions at least include, but are not limited to, one of the following:
are arranged side by side along the flow direction of the fluid in the flow channel according to a specified distance;
are arranged side by side according to a specified distance in a direction perpendicular to the flow direction of the fluid in the flow channel;
and/or,
are arranged side by side at a specified distance in a 45 degree angular direction along the flow direction of the fluid in the flow channel and in the middle of the flow direction of the fluid perpendicular to the flow direction of the fluid in the flow channel.
The ratio of the projection area of the flow channel cavity in the horizontal direction to the projection area of the bulk acoustic wave generation area in the horizontal direction is more than or equal to 100%.
Wherein the height of the flow channel cavity is 10nm-10mm. Within this interval, the mixing effect is remarkable. Preferably, the height of the runner cavity is 10um-1mm. In the interval range between 10um and 1mm, the significance of the manipulation effect of the acoustic fluid tweezers increases with the increase of the height.
The working frequency of the device for generating the bulk acoustic wave in the bulk acoustic wave generating region is 0.5-50GHz. In this frequency range, a significant manipulation effect of the acoustic fluid forceps can be achieved.
The processing modes of the micro-flow channel mainly comprise two modes. The first is to bond or press a micro flow channel structure made of glass, metal, and an organic polymer such as PDMS, PMMA, hydrogel to the surface of a thin film bulk acoustic wave generating device. The second is to fill the sacrificial layer in the micro-channel cavity in advance, then deposit silicon dioxide, aluminum nitride, parylene, SU-8, and metal oxide on the sacrificial layer to form the micro-channel structure 260.
When different fluid samples flow over the bulk acoustic wave generation region, by applying an electrical excitation signal to the device for generating acoustic fluid tweezers, the multilayer structure of the device for generating acoustic fluid tweezers (namely, energizing the bottom electrode layer 23 and the top electrode layer 23 to act on the piezoelectric layer 24) can generate closed vortex by the acoustic wave acting on the fluid over the bulk acoustic wave generation region, so that rapid and efficient mixing of microfluidics is realized. The mixed fluid flows above the bulk acoustic wave generating region.
Experimental effect
As shown in fig. 7, a top view of the acoustic fluid tweezers for micro-nano scale fluid and particle manipulation and a portion of the functionality to achieve micro-nano particle manipulation is illustrated. Micro-nano scale eddy currents (arrays) 3 are generated at the edges of the acoustic wave device 2. Arrow 5 represents the flow direction of the fluid and the micro-nano particles 4 in the micro-nano flow channel 1. The shape combinations of other shapes and the topology structures thereof are all embodiments of the special protection scope based on the micro-nano particle operation function realized by the principle of the patent.
Furthermore, in an embodiment not shown, due to practical needs, a flow channel cavity without a top cover may be packaged above the bulk acoustic wave generating region, and the functions achieved by the present invention may be achieved as well. It is therefore within the scope of the present invention for the device to create acoustic fluid tweezers to be formed without capped microchannels.
Example two
As shown in fig. 3, an embodiment of the present application further provides an apparatus for generating acoustic fluid forceps, including:
a bulk acoustic wave generating member comprising: a bottom electrode 330, a piezoelectric layer 340, and a top electrode 350;
wherein the bottom electrode 330 and the top electrode 350 are respectively disposed at both lower and upper sides of the piezoelectric layer 340, and the bottom electrode 330 and the top electrode 350 have no overlapping portion in a vertical direction; and a gap 370 of a designated size is formed between the portion of the piezoelectric layer 340 overlapping the bottom electrode 330 and the top electrode 350;
an acoustic wave reflecting portion 320 provided in contact with one surface of the bulk acoustic wave generating member;
the overlapping area of the bottom electrode 330, the piezoelectric layer 340, the top electrode 350 and the acoustic wave reflecting portion 320 forms a bulk acoustic wave generating area;
a backing layer 310 for supporting the bulk acoustic wave generating member;
the flow channel 360 has a partial region of the flow channel cavity 361 covering the acoustic wave action region of at least one bulk acoustic wave generating region.
A passivation layer 380 covers the portion of the piezoelectric layer 340 not covered by the top electrode 350.
By virtue of the above, the gap 370 in the above-described device of the present application can be such that the sound field is controlled in the gap so that the eddy currents are distributed in the gap. The size of the gap can be adjusted according to the requirement, and a novel vortex generating structure is provided. Moreover, the strength of the vortex can be regulated by the size of the gap, which is more beneficial to improving the convenience of regulation.
Since the arrangement and materials of the other parts are the same as those of the first embodiment, the description thereof will not be repeated here. FIG. 9a is a schematic diagram of finite element simulation of a flow field of a device generating eddy currents according to an embodiment of the present invention; fig. 9b is a simulated velocity field profile of fig. 9 a. The N direction indicates a large speed, and the M direction indicates a speed decreasing direction. It is apparent that there is a region of small velocity hole shape in the center of the vortex. Wherein fig. 10a is a schematic diagram of size and shape analysis of the swirl holes in fig. 9 b. FIG. 10b is a schematic diagram of the relationship between vortex pore size and liquid level.
Example III
As shown in fig. 4, an embodiment of the present application further provides an apparatus for generating acoustic fluid forceps. Comprising the following steps:
a bulk acoustic wave generating member comprising: a bottom electrode 440, a piezoelectric layer 430, and a top electrode 450;
wherein the bottom electrode 440 and the top electrode 450 are disposed on the upper side of the piezoelectric layer 430, and the bottom electrode 440 and the top electrode 450 are on the same horizontal layer; and a gap 470 is formed between the bottom electrode 440 and the top electrode 450;
an acoustic wave reflecting portion 420 provided in contact with one surface of the bulk acoustic wave generating member;
the overlapping area of the bottom electrode 440, the piezoelectric layer 430, the top electrode 450, and the acoustic wave reflecting portion 420 forms a bulk acoustic wave generating area;
a backing layer 410 for supporting the bulk acoustic wave generating member;
the flow channel 460 has a partial region of the flow channel cavity 461 covered with at least one acoustic wave action region of the bulk acoustic wave generating region.
From above, the top electrode and the bottom electrode of the device of the present application are both disposed on the upper side of the piezoelectric layer. The device processing is more convenient, and the process steps are reduced. And a gap is also arranged in the device, so that the sound field is controlled in the gap, and the vortex is distributed in the gap. The size of the gap can be adjusted according to the requirement, and a novel vortex generating structure is provided. Moreover, the strength of the vortex can be regulated by the size of the gap, which is more beneficial to improving the convenience of regulation.
Example IV
As shown in fig. 5, an embodiment of the present application further provides an apparatus for generating acoustic fluid forceps. Comprising the following steps:
a bulk acoustic wave generating member comprising: a bottom electrode 540, a piezoelectric layer 530, and a top electrode 550;
wherein the bottom electrode 540 and the top electrode 550 are disposed on the upper side of the piezoelectric layer 530, and the bottom electrode 540 and the top electrode 550 are on the same horizontal layer; and a gap 570 is formed between the bottom electrode 540 and the top electrode 550;
an acoustic wave reflecting portion 520 provided in contact with one surface of the bulk acoustic wave generating member;
the overlapping area of the bottom electrode 540, the piezoelectric layer 530, the top electrode 550 and the acoustic wave reflecting portion 520 forms a bulk acoustic wave generating area;
a backing layer 510 for supporting the bulk acoustic wave generating member;
the flow channel 560 has a partial region of the flow channel cavity 561 covering the acoustic wave action region of at least one bulk acoustic wave generating region.
On the basis, the device also comprises: the suspension electrode 580 is disposed at the bottom of the piezoelectric layer and vertically overlaps the gap and the piezoelectric layer.
The presence of the suspended electrode changes the electric field distribution of the gap such that the electric field that is predominantly present in the gap moves towards the signal electrode. The regulation and control of the electric field in another form are realized, and then the regulation and control of the generated acoustic fluid forceps are realized. Thus, the suspended electrodes make the sound field achieved by the structure of fig. 5 substantially the same as that of fig. 2. But the device structure shown in fig. 5 is simpler and the process flow is less.
The arrangement and materials of the other parts are the same as those of the embodiment, so that the description is omitted here.
Example five
As shown in fig. 6, an embodiment of the present application also provides an apparatus for producing acoustic fluid forceps. Comprising the following steps:
a backing layer 610, an acoustic wave reflecting layer 620 disposed within the backing layer; a bottom electrode layer 630 disposed on the acoustic wave reflecting layer 620 in contact therewith; a piezoelectric layer 640 disposed on the bottom electrode layer; a top electrode layer 650 disposed on the piezoelectric layer;
at least one flow channel structure 660; the flow channel cavity 661 of the flow channel structure is arranged in a covering contact manner on the bulk acoustic wave generating region 670 formed by overlapping the acoustic wave reflecting layer 620, the bottom electrode layer 630, the piezoelectric layer 640 and the top electrode layer 650.
A passivation layer 690 covers the portion of the piezoelectric layer 640 not covered by the top electrode layer 650.
As shown in fig. 6, the hybrid device in this embodiment is different from that in the first embodiment in the position and shape of the acoustic wave reflecting layer 620. This is mainly because the two are processed in different ways. The acoustic wave reflecting layer 620 (air cavity reflecting layer) is processed as follows: an air cavity is first processed on the underlayer 610 by wet or dry etching; then filling a sacrificial layer in the air cavity; and then sequentially processing to finish the subsequent layers. Finally, the material in the sacrificial layer is released, forming a lower closed air cavity, i.e., acoustic wave reflecting layer 620.
Since the arrangement and materials of the other parts are the same as those of the first embodiment, the description thereof will not be repeated here.
In summary, the device for generating acoustic fluid tweezers provided by the invention generates vortex with ideal shape and size in liquid in a micro-channel by utilizing sound waves, and realizes accurate control on molecules, nano particles and objects with micrometer scale by utilizing the vortex.
The foregoing description of the preferred embodiments of the invention is not intended to be limiting, but rather is intended to cover all modifications, equivalents, alternatives, and improvements that fall within the spirit and scope of the invention.
Claims (8)
1. An apparatus for producing acoustic fluid forceps, comprising:
the at least one bulk acoustic wave generating component comprises a bottom electrode, a piezoelectric layer and a top electrode which are sequentially arranged from bottom to top;
an acoustic wave reflecting portion provided in contact with one surface of the bulk acoustic wave generating member;
the overlapping area of the bottom electrode, the piezoelectric layer, the top electrode and the acoustic wave reflecting part forms a bulk acoustic wave generating area;
a backing layer for supporting the bulk acoustic wave generating member;
at least one flow channel, wherein a partial area of the flow channel cavity covers an acoustic wave action area of at least one bulk acoustic wave generation area;
and the passivation layer covers the part, which is arranged on the piezoelectric layer and is not covered by the top electrode.
2. An apparatus for producing acoustic fluid forceps, comprising:
at least one bulk acoustic wave generating member comprising: a bottom electrode, a piezoelectric layer, and a top electrode;
wherein the bottom electrode and the top electrode are respectively arranged at the lower side and the upper side of the piezoelectric layer, and the bottom electrode and the top electrode are not overlapped in the vertical direction; and a gap with a specified size is formed between the part of the piezoelectric layer, which is overlapped with the bottom electrode, and the top electrode;
an acoustic wave reflecting portion provided in contact with one surface of the bulk acoustic wave generating member;
the overlapping area of the bottom electrode, the piezoelectric layer, the top electrode and the acoustic wave reflecting part forms a bulk acoustic wave generating area;
a backing layer for supporting the bulk acoustic wave generating member;
at least one flow channel, wherein a partial area of the flow channel cavity covers an acoustic wave action area of at least one bulk acoustic wave generation area;
and the passivation layer covers the part, which is arranged on the piezoelectric layer and is not covered by the top electrode.
3. The apparatus according to any one of claims 1-2, further comprising:
and the microfluidic sample injection system is connected with the flow channel cavity and used for controlling the injection quantity of the microfluid flowing into the flow channel cavity and controlling the injection speed of the microfluid.
4. The apparatus according to any one of claims 1 to 2, wherein the acoustic wave reflecting portion includes: a low acoustic impedance layer and a high acoustic impedance layer disposed between the bulk acoustic wave generating member and the substrate;
the low acoustic impedance layer and the high acoustic impedance layer are overlapped alternately;
the low acoustic impedance layer and the high acoustic impedance layer are adjacent in a group, and the number of the groups is set to be greater than or equal to three.
5. The apparatus according to any one of claims 1 to 2, wherein the acoustic wave reflecting portion includes: and a cavity formed on the substrate, wherein the cavity is opened on the surface facing away from the bulk acoustic wave generating component or is closed by the substrate.
6. The apparatus according to any one of claims 1 to 2, wherein the flow path is provided on a surface of the bulk acoustic wave generating member opposite to the acoustic wave reflecting portion.
7. The apparatus of any one of claims 1-2, wherein a ratio of a horizontal plane projected area of the flow channel cavity to a horizontal plane projected area of the bulk acoustic wave generation region is greater than or equal to 100%;
the height of the flow channel cavity is 2-5 times of the diameter of the micro-nano particles, or the height range of the flow channel cavity is 10nm-10mm or 10 mu m-10mm.
8. The device of any of claims 1-2, wherein the passivation layer is silicon dioxide or silicon nitride;
the bulk acoustic wave generating component is a thin film bulk acoustic wave resonator or a lamb acoustic wave resonator with the working frequency set to be 0.5-50GHz.
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| CN112076808B (en) * | 2019-06-13 | 2024-06-28 | 安行生物技术有限公司 | Method and apparatus for controlling movement of particles in solution using ultra-high frequency sound waves |
| WO2021037002A1 (en) * | 2019-08-23 | 2021-03-04 | 安行生物技术有限公司 | Solution sample processing device, apparatus and system, and use thereof |
| CN111013518B (en) * | 2019-12-12 | 2020-12-08 | 深圳先进技术研究院 | Sound tweezers device and particle control method |
| CN112746012B (en) * | 2020-01-31 | 2023-01-03 | 天津大学 | Single cell manipulation system and method, monoclonal cell line construction method, single cell droplet generation system and method |
| CN112916058B (en) * | 2021-01-20 | 2022-04-29 | 天津大学 | Acoustic microfluidic device for sorting micro-nano particles |
| CN113411061B (en) * | 2021-06-10 | 2022-09-09 | 天津大学 | Three-dimensional microarray forming device and method based on bulk acoustic wave resonator parasitic mode |
| CN113926221A (en) * | 2021-10-11 | 2022-01-14 | 天津大学 | Quantum dot solution purification method and purification system |
| CN116351352A (en) * | 2021-12-28 | 2023-06-30 | 彩科(苏州)生物科技有限公司 | Transistor optical tweezers with symmetrical leakage current and microfluidic device comprising same |
| CN116909117B (en) * | 2023-09-11 | 2023-11-24 | 成都理工大学工程技术学院 | Three-dimensional imaging device and imaging method for variable-distance optical tweezers |
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