CN109116604A - The method of display panel, display panel are made in mixed cutting - Google Patents
The method of display panel, display panel are made in mixed cutting Download PDFInfo
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- CN109116604A CN109116604A CN201811053931.2A CN201811053931A CN109116604A CN 109116604 A CN109116604 A CN 109116604A CN 201811053931 A CN201811053931 A CN 201811053931A CN 109116604 A CN109116604 A CN 109116604A
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- color blocking
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
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- Nonlinear Science (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Engineering & Computer Science (AREA)
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- Crystallography & Structural Chemistry (AREA)
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Abstract
The invention discloses a kind of mixed cuttings to make the method for display panel, display panel.This method comprises: providing first substrate and the second substrate；COA type array part and non-COA type array part are formed on the first substrate, form netrual colour color blocking optical filtering portion and colored color blocking optical filtering portion on the second substrate；The first substrate and the second substrate assemble box so that the COA type array part with the corresponding netrual colour color blocking optical filtering portion to box, and make the non-COA type array part with the corresponding colour color blocking optical filtering portion to box；The first substrate after assembling to box and the second substrate are cut, to form COA type display panel and non-COA type display panel.The otherness of color blocking making technology in the compatible mixed butt case of method of display panel is made in mixed cutting of the invention, improves the flexibility of mixed incision technology.
Description
Technical field
The invention belongs to display panels to manufacture art field, in particular, be related to a kind of mixed cutting make display panel method,
Display panel.
Background technique
With the development of advanced lines liquid crystal display panel manufacturing technology, mixing butt case becomes the effective of raising panel utilization
Approach, so-called mixed butt case are the display panel that two kinds and dimensions above specification are prepared on same glass substrate.It is existing mixed
In butt case, various sizes of display panel making technology is completely the same, can not be suitable for requiring with different making technologies
Display panel integrates.For example, only there are two types of situations at present, the first situation is only in lower substrate in the production of color blocking layer
Upper production forms color blocking layer, and second situation is that only production forms color blocking layer on upper substrate, ultimately forms each different sizes
The color blocking layer position of display panel is identical, the otherness that cannot preferably take into account making technology of butt case mixed in this way, no
Conducive to the mixed incision technology for improving advanced lines panel.
Summary of the invention
In order to solve above-mentioned the shortcomings of the prior art, the purpose of the present invention is to provide one kind, to take into account making technology poor
The method and display panel of display panel are made in anisotropic mixed cutting.
In order to achieve the above purpose, present invention employs the following technical solutions:
A kind of method that display panel is made in mixed cutting, which comprises
First substrate and the second substrate are provided；
COA type array part and non-COA type array part are formed on the first substrate, form nothing on the second substrate
Colored color blocking optical filtering portion and colored color blocking optical filtering portion；
The first substrate and the second substrate assemble box so that the COA type array part with it is corresponding described
Netrual colour color blocking optical filtering portion makes the non-COA type array part with the corresponding colored color blocking optical filtering portion to box in box；
The first substrate after assembling to box and the second substrate are cut, to form COA type display panel and non-COA
Type display panel.
Preferably, the size of the COA type display panel and the non-COA type display panel is not identical.
Preferably, if the quantity of the COA type display panel is two, the size of two COA type display panels
It is not identical；If the quantity of the COA type display panel is at least three, in at least three COA type display panels at least
Two sizes are not identical.
Preferably, if the quantity of the non-COA type display panel is two, two non-COA type display panels
Size is not identical；If the quantity of the non-COA type display panel is at least three, at least three non-COA type display surfaces
At least two size is not identical in plate.
Preferably, the region occupied on the first substrate by the COA type array part is first area, first base
The region occupied on plate by the non-COA type array part is second area；
Wherein, the method for formation COA type array part and non-COA type array part on the first substrate includes:
The first display device is formed in the first area, while forming second display in the second area
Part；
The first colored color blocking layer is only formed on first display device.
Preferably, the method that colored color blocking layer is only formed on first display device includes:
The colored color blocking layer of coating first on first display device and the second display part；
Described first colored color blocking layer is exposed and development treatment, by the part on the second display part the
One colored color blocking layer removal, and retain the colored color blocking layer in the part first on first display device.
Preferably, described that the first display device is formed in the first area, while being formed in the second area
The method of second display part includes:
It forms data line in first area and in the second area, scan line and thin film transistor (TFT), wherein the number
Arranged in a crossed manner according to line and the scan line, the source electrode of the thin film transistor (TFT) is connected to the data line, the thin film transistor (TFT)
Grid be connected to the scan line；
Form pixel electrode in the intersection region of the data line and the scan line, the pixel electrode with it is described thin
The region occupied by the netrual colour color blocking optical filtering portion in the second substrate of film transistor is third region, described second
The region occupied on substrate by the colored color blocking optical filtering portion is the fourth region；
Wherein, the method packet for forming netrual colour color blocking optical filtering portion and colored color blocking optical filtering portion on the second substrate
It includes:
Black matrix" is formed in the third region, while forming black matrix" in the fourth region；
The second colored color blocking layer is only formed in the fourth region.Drain electrode connection.
Preferably, the method that the second colored color blocking layer is only formed in the fourth region includes:
The colored color blocking layer of coating second in the third region and in the fourth region；
Described second colored color blocking layer is exposed and development treatment, the part second in the third region is color
The removal of color color blocking layer, and retain the colored color blocking layer in the part second in the fourth region.
Display panel made of the method for display panel is made above-mentioned mixed cutting the invention also discloses a kind of.
The utility model has the advantages that the method for display panel is made in the mixed cutting of offer of the invention, COA is formed on the first substrate respectively
Type array part and non-COA type array part form netrual colour color blocking optical filtering portion and colored color blocking optical filtering portion in the second substrate, so that
COA type array part and netrual colour color blocking optical filtering portion is formed box is arranged, non-COA type array part and colored color blocking optical filtering portion to box,
Finally cutting obtains COA type display panel and non-COA type display panel, the difference of color blocking making technology in compatible mixed butt case
Property, improve the flexibility of mixed incision technology.
Detailed description of the invention
Fig. 1 is the flow chart that the method for display panel is made in the mixed cutting of the embodiment of the present invention；
Fig. 2 is the top view of the first substrate of the embodiment of the present invention；
Fig. 3 is the top view of the second substrate of the embodiment of the present invention；
Fig. 4 is the sectional view of the display panel of the embodiment of the present invention；
Fig. 5 is the partial enlarged view in Fig. 4 at A；
Fig. 6 is the top view of first display device of the embodiment of the present invention.
Specific embodiment
In order to make the objectives, technical solutions, and advantages of the present invention clearer, with reference to the accompanying drawings and embodiments, right
The present invention is further described.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and do not have to
It is of the invention in limiting.
With the development of advanced lines panel technology, in order to improve the utilization rate of glass substrate, butt is generally mixed in the industry at present
Case, i.e., production forms the different sub- display panel of sizes on same sized rectangular glass substrate, is finally cut again
To obtain the panel of various sizes.The display panel that the present embodiment is previously mentioned below is to integrate a variety of various sizes of sub- displays
The uncut display panel of panel, the type of display panel include but is not limited to liquid crystal display panel and OLED display panel.
The flow chart of the method for display panel, this method packet are made in the mixed cutting that Fig. 1 shows embodiment according to the present invention
Step S1 is included to step S4:
Step S1: first substrate 10 and the second substrate 20 are provided.As a preferred embodiment, first substrate 10 and the second substrate
20 be large-sized glass substrate.
Step S2: as shown in Figures 2 and 3, COA type array part 30 and non-COA type array part are formed on first substrate 10
40, netrual colour color blocking optical filtering portion 50 and colored color blocking optical filtering portion 60 are formed in the second substrate 20.
Specifically, the region occupied on first substrate 10 by COA type array part 30 is first area 11, on first substrate 10
The region occupied by non-COA type array part 40 is second area 12.
COA type array part 30 is formed on first substrate 10 and the method for non-COA type array part 40 includes the following steps
S201 to step S202:
Step S201: as shown in figure 4, forming the first display device 31 in first area 11, while in second area 12
Interior formation second display part 32.
During actual fabrication, the first display device 31 and second display part 32 are simultaneously formed in first substrate 10
On, illustrate the manufacturing process of display device by taking the first display device 31 as an example below.
First step: as shown in Figure 5 and Figure 6,11 in first area in form data line 310, scan line 311 and film
Transistor 313, wherein data line 310 and scan line 311 are arranged in a crossed manner, and the source electrode 314 of thin film transistor (TFT) 313 is connected to data
The grid 315 of line 310, thin film transistor (TFT) 313 is connected to scan line 311.
Specifically, using physical vapour deposition (PVD) (Physical Vapor Deposition, abbreviation PVD) technique first
The first metal material is deposited on substrate 10, the material of the first metal material includes but is not limited to Al, Mo and Cu, the first metal material
With a thickness ofUsing first of masking process, processing is exposed, at development to the first metal material
Reason, wet etching treatment and removing, ultimately form grid 315 and scan line 311.
Further, using plasma enhances chemical vapor deposition (Plasma Enhanced Chemical Vapor
Deposition, abbreviation PECVD) technique deposited silicon nitride (SiN on first substrate 10 and grid 315x) to form gate insulation
Layer 320, silicon nitride with a thickness of
Further, amorphous silicon (a-si) film is sequentially depositing on gate insulation layer 320 using pecvd process and N-type is mixed
Miscellaneous amorphous silicon (n+a-si) film, amorphous silicon membrane with a thickness ofThe thickness of n-type doping amorphous silicon membrane
Degree is, using second masking process, to amorphous silicon membrane and n-type doping amorphous silicon membrane be exposed processing, development treatment,
Dry etching processing and removing, to form active layer 316, the first ohmic contact layer 317 and the second ohmic contact layer 318, first
Ohmic contact layer 317 and the second ohmic contact layer 318 are located at the opposite sides of active layer 316.
Further, using PVD process in gate insulation layer 320, the first ohmic contact layer 317, the second ohmic contact layer 318
With the second metal material is deposited on active layer 316, the material of the second metal material includes but is not limited to Al, Mo and Cu, the second gold medal
Belong to material with a thickness ofUsing third road masking process, to the second metal material be exposed processing,
Development treatment, wet etching treatment, the processing of channel dry etching and removing ultimately form to form source electrode 314,312 sum numbers of drain electrode
According to line 310.
Further, nitrogen is deposited in active layer 316, source electrode 314, drain electrode 312 and gate insulation layer 320 using pecvd process
SiClx (SiNx) film, to form passivation layer 340, the thickness of silicon nitride film
Second step: pixel electrode 330, pixel electrode are formed in the intersection region of data line 310 and scan line 311
330 connect with the drain electrode 312 of thin film transistor (TFT) 313.
Further, before forming pixel electrode 330, processing is performed etching to passivation layer 340, in passivation layer 340
Upper formation first through hole (figure is not marked), first through hole expose part drain electrode 312.Then, it is deposited on first substrate 10 transparent
Conductive material, so that transparent conductive material is deposited in data line 310 and 311 intersection region of scan line, and partially transparent conduction
Material is deposited in first through hole, and pixel electrode 330, the extension of pixel electrode 330 are formed in this way on first substrate 10
Divide and is connect across first through hole with drain electrode 312.
Step S202: the first colored color blocking layer 33 is only formed on the first display device 31.
The step specifically includes:
The colored color blocking layer 33 of coating first on the first display device 31 and second display part 32；
First colored color blocking layer 33 is exposed and development treatment, the part first on second display part 32 is color
Color color blocking layer 33 removes, and retains the colored color blocking layer 33 in the part first on the first display device 31.
Specifically, the region occupied by netrual colour color blocking optical filtering portion 50 in the second substrate 20 be third region 21, second
The region occupied on substrate 20 by colored color blocking optical filtering portion 60 is the fourth region 22.
The method that netrual colour color blocking optical filtering portion 50 and colored color blocking optical filtering portion 60 are formed in the second substrate 20 specifically includes
Step S211 to step S212:
Step S211: black matrix" 62 is formed in third region 21, while forming black matrix" in the fourth region 22
62。
Step S212: colored color blocking layer 61 is only formed in the fourth region 22
Specifically, which includes:
The colored color blocking layer 61 of coating second in the third region 21 of the second substrate 20 and in the fourth region 22；
Second colored color blocking layer 61 is exposed and development treatment, by the colored color in part second in third region 21
Resistance layer 61 removes, and retains the colored color blocking layer 61 in the part second in the fourth region 22.
Step S3: first substrate 10 and the second substrate 20 assemble box, so that COA type array part 30 and corresponding no coloured silk
Color color blocking optical filtering portion 50 makes non-COA type array part 40 with corresponding colored color blocking optical filtering portion 60 to box in box.
Step S4: it cuts to the first substrate 10 and the second substrate 20 after box assembling, to form COA type display panel and non-
COA type display panel.
It is different with the size of non-COA type display panel using COA type display panel made from the above method.If COA type is aobvious
The quantity for showing panel is two, then the size of two COA type display panels is not identical；If the quantity of the COA type display panel
It is at least three, then at least two size is not identical in at least three COA type display panels.
Further, if not the quantity of COA type display panel is two, then the size of two non-COA type display panels is not
It is identical；If not the quantity of COA type display panel is at least three, then at least two at least three non-COA type display panels
Size is not identical.
Display panel made from the method for display panel is made as above-mentioned mixed cutting the present invention also provides a kind of.
The method of display panel is made in the mixed cutting of offer of the invention, forms COA type array part on the first substrate respectively
With non-COA type array part, netrual colour color blocking optical filtering portion and colored color blocking optical filtering portion are formed in the second substrate, so that forming COA
Box is arranged in type array part and netrual colour color blocking optical filtering portion, and box is finally cut in non-COA type array part and colored color blocking optical filtering portion
COA type display panel and non-COA type display panel are obtained, the otherness of color blocking making technology in compatible mixed butt case improves
The flexibility of mixed incision technology.
A specific embodiment of the invention is described in detail above, although having show and described some implementations
Example, it will be understood by those skilled in the art that defined by the claims and their equivalents of the invention not departing from
It in the case where principle and spirit, can modify to these embodiments and perfect, these are modified and improve also should be in the present invention
Protection scope in.
Claims (10)
1. a kind of method that display panel is made in mixed cutting, which is characterized in that the described method includes:
First substrate and the second substrate are provided；
COA type array part and non-COA type array part are formed on the first substrate, form netrual colour on the second substrate
Color blocking optical filtering portion and colored color blocking optical filtering portion；
The first substrate and the second substrate assemble box, so that the COA type array part and the corresponding no coloured silk
Color color blocking optical filtering portion makes the non-COA type array part with the corresponding colored color blocking optical filtering portion to box in box；
The first substrate after assembling to box and the second substrate are cut, it is aobvious to form COA type display panel and non-COA type
Show panel.
2. the method according to claim 1, wherein the COA type display panel and the non-COA type display surface
The size of plate is not identical.
3. method according to claim 1 or 2, which is characterized in that if the quantity of the COA type display panel is two,
Then the size of two COA type display panels is not identical；If the quantity of the COA type display panel is at least three, until
At least two size is not identical in few three COA type display panels.
4. method according to claim 1 or 2, which is characterized in that if the quantity of the non-COA type display panel is two
A, then the size of two non-COA type display panels is not identical；If the quantity of the non-COA type display panel is at least three
A, then at least two size is not identical in at least three non-COA type display panels.
5. the method according to claim 1, wherein being occupied on the first substrate by the COA type array part
Region be first area, the region occupied on the first substrate by the non-COA type array part is second area；
Wherein, the method for formation COA type array part and non-COA type array part on the first substrate includes:
The first display device is formed in the first area, while second display part is formed in the second area；
The first colored color blocking layer is only formed on first display device.
6. according to the method described in claim 5, it is characterized in that, described only form colored color on first display device
The method of resistance layer includes:
The colored color blocking layer of coating first on first display device and the second display part；
Described first colored color blocking layer is exposed and development treatment, the part first on the second display part is color
The removal of color color blocking layer, and retain the colored color blocking layer in the part first on first display device.
7. method according to claim 5 or 6, which is characterized in that described to form the first display in the first area
Device, while the method for formation second display part includes: in the second area
It forms data line in first area and in the second area, scan line and thin film transistor (TFT), wherein the data line
Arranged in a crossed manner with the scan line, the source electrode of the thin film transistor (TFT) is connected to the data line, the grid of the thin film transistor (TFT)
Pole is connected to the scan line；
Pixel electrode is formed in the intersection region of the data line and the scan line, the pixel electrode and the film are brilliant
The drain electrode of body pipe connects.
8. the method according to claim 1, wherein being filtered in the second substrate by the netrual colour color blocking
The region that portion occupies is third region, and the region occupied in the second substrate by the colored color blocking optical filtering portion is the 4th area
Domain；
Wherein, the method in the formation netrual colour color blocking optical filtering portion on the second substrate and colored color blocking optical filtering portion includes:
Black matrix" is formed in the third region, while forming black matrix" in the fourth region；
The second colored color blocking layer is only formed in the fourth region.
9. according to the method described in claim 8, it is characterized in that, described only form the second colored color in the fourth region
The method of resistance layer includes:
The colored color blocking layer of coating second in the third region and in the fourth region；
Described second colored color blocking layer is exposed and development treatment, by the colored color in part second in the third region
Resistance layer removal, and retain the colored color blocking layer in the part second in the fourth region.
10. a kind of method for making display panel by the described in any item mixed cuttings of claim 1 to 9 makes the display surface formed
Plate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811053931.2A CN109116604B (en) | 2018-09-11 | 2018-09-11 | Method for manufacturing display panel through mixed cutting and display panel |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811053931.2A CN109116604B (en) | 2018-09-11 | 2018-09-11 | Method for manufacturing display panel through mixed cutting and display panel |
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| CN109116604B CN109116604B (en) | 2021-05-11 |
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| CN109613762A (en) * | 2019-01-28 | 2019-04-12 | 深圳市华星光电半导体显示技术有限公司 | Mixed for liquid crystal display panel cuts glass substrate and its glue spreading method |
| CN110316971A (en) * | 2019-07-03 | 2019-10-11 | 深圳市华星光电技术有限公司 | The mixed method for cutting glass substrate of etching |
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| CN1637486A (en) * | 2003-12-27 | 2005-07-13 | Lg.菲利浦Lcd株式会社 | Method for fabricating a liquid crystal display device |
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