CN109096924B - Glass free-form surface polishing solution and preparation method and application thereof - Google Patents
Glass free-form surface polishing solution and preparation method and application thereof Download PDFInfo
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- CN109096924B CN109096924B CN201811081091.0A CN201811081091A CN109096924B CN 109096924 B CN109096924 B CN 109096924B CN 201811081091 A CN201811081091 A CN 201811081091A CN 109096924 B CN109096924 B CN 109096924B
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- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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Abstract
The invention provides a glass free-form surface polishing solution, and belongs to the field of preparation of polishing solutions. According to the glass free-form surface polishing solution provided by the invention, through introducing 20-50 parts of liquid phase carrier, 0.1-20 parts of dispersing agent, 1-30 parts of thickening additive, 80-120 parts of friction agent, 1-20 parts of rheological modifier and 0.1-20 parts of surface active substance, the components are coordinated and acted together, so that the continuous polishing effect of the polishing solution is ensured, and the technical problem of the reduction of the polishing efficiency caused by the reduction of the viscosity along with the increase of the temperature of a polishing system in the polishing process of the polishing solution in the prior art is solved. Meanwhile, the preparation method of the polishing solution for the glass free-form surface is simple and convenient to operate, the energy consumption is low, the polishing cost is greatly reduced, a polishing pad which is necessary in the traditional polishing process is not needed in the polishing process, and the polishing of a large number of glass components can be realized.
Description
Technical Field
The invention relates to the technical field of polishing materials, in particular to a glass free-form surface polishing solution and a preparation method and application thereof.
Background
The development of modern manufacturing industry puts higher requirements on surface precision processing. As an important means in the manufacturing industry, the polishing process affects not only the service performance of the product, but also the grade of the product. With the complexity of product structures and the diversification of product combinations, the application of polishing processes, especially for glass surfaces, is becoming more and more significant.
The polishing friction agent of the glass polishing solution used in the production of the glass processing enterprises at present is large-particle rare earth oxide powder, so that the overall polishing rate is low, the dispersion stability is poor, serious surface scratch is easy to cause, and the defects of low flattening polishing efficiency and the like exist. Often greatly reduced polishing efficiency of long-time polishing causes rapid wearing and tearing of polishing machine, polishing efficiency is low to and a large amount of consumptive materials consume. Particularly, in the surface polishing process of the glass free-form surface component, a single glass component needs to be processed respectively, and large-scale glass polishing cannot be realized, so that the polishing efficiency of the product is low, and the cost is high.
Disclosure of Invention
In view of the above, the present invention provides a polishing solution for a glass free-form surface, and a preparation method and applications thereof. The viscosity of the glass surface polishing solution provided by the invention is increased along with the rise of the temperature, so that the continuous polishing effect of the polishing solution is ensured, the polished glass surface is smooth and has no scratch, the polishing cost is reduced, a polishing pad which is necessary in the traditional polishing process is not needed in the polishing process, and the glass surface polishing solution is suitable for realizing industrialization.
In order to achieve the above object, the present invention provides the following technical solutions:
the polishing solution for the free-form surface of the glass comprises the following components in parts by weight:
the surfactant is N-isopropyl polyacrylamide.
Preferably, the N-isopropyl polyacrylamide has a number average molecular weight > 100000.
Preferably, the liquid phase carrier comprises one or more of water, a polyol, a polymeric alcohol, and a polymeric polyol; the mass concentration of the polyalcohol, the polymeric alcohol and the polymeric polyalcohol is independently 30-70%.
Preferably, the dispersant comprises a polyol and/or a polymeric alcohol; the mass concentration of the polyol and/or polymeric alcohol is independently < 10%.
Preferably, the polyol comprises one or more of ethylene glycol, propylene glycol, butylene glycol, hexylene glycol, neopentyl glycol and glycerol; the polymeric alcohol comprises one or more of polyethylene glycol, polypropylene glycol, polybutylene glycol, polyhexamethylene glycol, neopentyl glycol and polyglycerol.
Preferably, the thickening additive comprises one or more of starch, xanthan gum, boric acid, borate, guar gum and cellulose.
Preferably, the abrasive includes one or more of silicon oxide, aluminum oxide, iron oxide, silicon carbide, boron carbide, and rare earth oxides.
Preferably, the rheology modifier comprises an alkyd modifier and/or an acrylic modifier.
The invention also provides a preparation method of the glass free-form surface polishing solution, which comprises the following steps:
and mixing the liquid phase carrier, the dispersing agent, the friction agent, the thickening additive, the rheology modifier and the surfactant, and adjusting the pH value to obtain the glass free-form surface polishing solution.
The invention also provides application of the glass free-form surface polishing solution in the technical scheme in the field of glass free-form ultra-precise surface polishing.
The invention provides a glass free-form surface polishing solution which comprises the following components in parts by weight:
the surfactant is N-isopropyl polyacrylamide.
The viscosity of the polishing solution provided by the invention is gradually increased along with the rise of the temperature of a polishing system under the action of shearing force, so that the surface of the glass free-form surface part is instantly locally hardened to form a medium similar to a flexible consolidation polishing material, and when a rough surface is polished, different surfaces of the glass free-form surface part can be synchronously and efficiently polished, and the uniformity of the polishing effect is ensured; in the invention, the components of the polishing solution on the surface of the glass free-form curved surface are coordinated and act together, so that the continuous polishing efficiency of the polishing solution is improved, and the technical defect that the polishing efficiency is greatly reduced because the viscosity of the polishing solution is reduced along with the increase of the temperature of a polishing system in the polishing process of the polishing solution in the prior art is overcome.
Experimental results show that the glass part polished by the polishing solution for the glass free-form surface has a smooth mirror surface, no orange peel phenomenon exists, the polishing time is reduced to 30 minutes, and the polishing efficiency is remarkably improved compared with 60 minutes of polishing time without adding N-isopropyl polyacrylamide serving as a surfactant.
The preparation method of the polishing solution for the surface of the glass free curved surface is simple and easy, is convenient to operate, has low energy consumption, greatly reduces the manufacturing cost of the polishing solution, does not need a polishing pad which is necessary in the traditional polishing process in the polishing process, and can realize large-batch polishing.
Detailed Description
The invention provides a glass free-form surface polishing solution which comprises the following components in parts by weight:
the surfactant is N-isopropyl polyacrylamide.
The invention provides a glass free-form surface polishing solution, which comprises 20-50 parts by weight of a liquid-phase carrier, more preferably 30-40 parts by weight, and most preferably 35 parts by weight. In the present invention, the liquid carrier preferably comprises one or more of water, polyol, polymeric alcohol and polymeric polyol, and the mass concentration of the polyol, polymeric alcohol and polymeric polyol is independently preferably 30% to 70%, more preferably 40% to 60%, and most preferably 45% to 55%. In the present invention, the polyhydric alcohol preferably includes one or more of ethylene glycol, propylene glycol, butylene glycol, hexylene glycol, neopentyl glycol, and glycerin; the polymeric alcohol preferably comprises one or more of polyethylene glycol, polypropylene glycol, polybutylene glycol, polyhexamethylene glycol, neopentyl glycol and polyglycerol. In the present embodiment, the liquid carrier is more preferably water, polyethylene glycol or ethylene glycol. When the liquid-phase carrier is preferably a mixture, the ratio of each substance in the mixture is not particularly limited in the present invention, and any mixture may be used in any mass ratio. In the present invention, the source of the liquid phase carrier is not particularly limited, and a commercially available product may be prepared or selected by a method conventional in the art.
Based on the weight parts of the liquid phase carrier, the polishing solution for the glass free-form surface comprises 0.1-20 parts of a dispersing agent, more preferably 0.5-10 parts, and most preferably 1-5 parts. In the present invention, the dispersant preferably comprises a polyol and/or a polymeric alcohol, the mass concentration of the polyol and/or the polymeric alcohol independently preferably being < 10%. In the present invention, the polyhydric alcohol preferably includes one or more of ethylene glycol, propylene glycol, butylene glycol, hexylene glycol, neopentyl glycol, and glycerin; the polymeric alcohol preferably comprises one or more of polyethylene glycol, polypropylene glycol, polybutylene glycol, polyhexamethylene glycol, neopentyl glycol and polyglycerol. In the present embodiment, the liquid carrier is more preferably water, polyethylene glycol or ethylene glycol. When the dispersant is preferably a mixture, the proportion of each substance in the mixture is not particularly limited, and the mixture may be used in any mass ratio.
The source of the dispersant in the present invention is not particularly limited, and it may be prepared by a method conventional in the art or a commercially available product may be selected. In the invention, the introduction of the dispersing agent enables suspended particles to be dispersed more uniformly, and under the action of shearing force, the grinding particles in the suspended particles are more easily collided to form acting force resisting the shearing force.
Based on the weight parts of the liquid-phase carrier, the polishing solution for the glass free-form surface comprises 1-30 parts of a thickening additive, more preferably 5-20 parts, and most preferably 10-15 parts. In the present invention, the thickening additive preferably comprises one or more of starch, xanthan gum, guar gum, boric acid, borate and cellulose; in the present invention, the starch preferably includes one or more of cereals, beans, rhizomes and flours, and in the present embodiment, corn starch is further preferred. In the present invention, the cellulose preferably includes methyl cellulose, ethyl cellulose, hydroxypropyl methyl cellulose, hydroxyethyl cellulose, or the above-described cellulose after modification treatment, and in the present embodiment, further preferably modified ethyl cellulose. The invention has no special requirements on the modification process, and can adopt the conventional modification treatment method in the field.
When the thickening additive is preferably a mixture, the proportion of each substance in the mixture is not particularly limited, and the mixture may be used in any mass ratio. The source of the thickening additive is not particularly limited in the present invention, and the thickening additive may be prepared by a method conventional in the art or a commercially available product may be selected. In the invention, the thickening additive is introduced to form a suspension with a liquid-phase carrier, so that the suspension has non-Newtonian liquid characteristics, the viscosity of the polishing solution can be increased under the action of shearing force, when the polishing solution is disturbed due to the action of the shearing force, the grinding particles in the polishing solution collide with each other to form resistance to the disturbance, and the polishing solution is quickly hardened to efficiently flatten the rough part on the surface of the moving glass free-form surface component.
Based on the weight parts of the liquid-phase carrier, the polishing solution for the glass free-form surface comprises 80-120 parts by weight of a friction agent, and preferably 100 parts in the embodiment of the invention. In the present invention, the abrasive preferably includes one or more of silicon oxide, aluminum oxide, iron oxide, silicon carbide, boron carbide, and rare earth oxide; the rare earth oxide preferably comprises one or more of cerium oxide, lanthanum oxide and praseodymium oxide. When the friction agent is preferably a mixture, the ratio of each substance in the mixture is not particularly limited, and any mass ratio of the mixture may be used. In the present invention, the particle size of the rubbing agent is preferably 20nm to 50 μm, more preferably 100nm to 20 μm.
The source of the abrasive in the present invention is not particularly limited, and it may be prepared by a conventional method in the art or a commercially available product may be selected. In the invention, the introduction of the friction agent can generate friction with the moving glass free-form surface part under the action of shearing force, so that the rough part on the surface of the glass free-form surface part is efficiently flattened.
Based on the weight parts of the liquid phase carrier, the polishing solution for the glass free-form surface comprises 1-20 parts by weight of a rheological modifier, and more preferably 5-10 parts by weight of the rheological modifier. In the present invention, the rheology modifier preferably comprises an alkyd modifier and/or an acrylic modifier. Further preferred in embodiments of the invention is one or more of sodium polyacrylate, PVA or PVP. When the rheology modifier is preferably a mixture, the proportion of each substance in the mixture is not particularly limited, and the mixture can be used in any mass ratio.
The source of the rheology modifier is not particularly limited in the present invention, and may be prepared by a method conventional in the art or a commercially available product may be selected. In the invention, the introduction of the rheology modifier can improve the fluidity of the polishing solution and prevent the polishing solution from hardening.
Based on the weight parts of the liquid phase carrier, the glass free-form surface polishing solution comprises 0.1-20 parts of surfactant, more preferably 1-10 parts, and most preferably 2-5 parts. In the present invention, the surfactant is preferably N-isopropyl polyacrylamide. In the present invention, the number average molecular weight of the N-isopropyl polyacrylamide is preferably >100000, more preferably > 150000. The molecular weight is limited because the viscosity of the N-isopropyl polyacrylamide molecules is increased and the transition temperature is reduced with the increase of the molecular weight, so that the polishing effect of enhancing shear thickening can be exerted at a relatively low temperature.
The source of the surfactant is not particularly limited in the present invention, and the surfactant may be prepared by a method conventional in the art or a commercially available product may be selected. In the invention, the introduction of the surfactant increases the viscosity of the polishing solution along with the increase of the temperature of a polishing system in the polishing process, so that the glass free-form surface polishing solution still has the characteristic of high viscosity under the condition of the increase of the temperature of the polishing system in the polishing process, the continuous polishing effect of the polishing solution is ensured, and the technical problem of the reduction of the polishing efficiency caused by the decrease of the viscosity along with the increase of the temperature of the polishing system in the polishing process of the polishing solution in the prior art is solved.
The invention also provides a preparation method of the glass free-form surface polishing solution in the technical scheme, which comprises the following steps:
mixing a liquid phase carrier, a dispersing agent, a friction agent, a thickening additive, an oxidant and a surfactant according to parts by weight, and adjusting the pH value to obtain the glass free-form surface polishing solution.
In the present invention, the mixing is preferably performed under stirring conditions, the stirring is preferably mechanical stirring or magnetic stirring, and the rotation speed and time of the stirring are not particularly limited in the present invention, and a mixed solution may be obtained.
The adding sequence of the liquid phase carrier, the dispersing agent, the friction agent, the thickening additive, the oxidant and the surfactant during mixing is not particularly limited; in the present invention, the mixing sequence is preferably that the liquid phase carrier and the friction agent are stirred and dispersed at room temperature, the dispersant, the thickening additive and the rheology modifier are sequentially added to prepare a suspension, and then the surfactant is added.
In the invention, the adjustment range of the pH value is preferably neutral, more preferably 6.5-7.5, and most preferably 7.5. In the present invention, the pH adjusting agent is preferably an acid solution and/or an alkali solution, and when the pH adjusting agent is an acid solution, it is preferably one or more of a hydrochloric acid solution, a sulfuric acid solution, or a nitric acid solution, and in the embodiment of the present invention, it is further preferably a nitric acid solution; when the pH adjusting agent is an alkaline solution, it is preferably one or more of a sodium hydroxide solution, a potassium hydroxide solution, or an aqueous ammonia solution, and in the embodiment of the present invention, a sodium hydroxide solution is further preferable.
The invention also provides application of the glass surface polishing solution prepared by the technical scheme in the technical field of ultra-precise surface polishing of free-form surfaces of glass.
According to the invention, the polishing material is preferably fixed on a fixture and immersed in the prepared polishing solution for the surface of the glass free-form curved surface, the fixture drives the polishing material to rotate around the main shaft rapidly, and meanwhile, the polishing solution performs precise polishing on the polishing material under the reverse rotation in a container.
In the present invention, the polishing process is preferably performed under a shear force of 50Pa, and the polishing start temperature is preferably 25 ℃.
The glass surface polishing solution provided by the present invention, the preparation method and the application thereof are described in detail with reference to the following examples, but they should not be construed as limiting the scope of the present invention.
Example 1:
weighing 5kg of mixed rare earth oxide (the mass ratio of cerium oxide to lanthanum oxide is 1:1) with the particle size of 2-10 mu m, adding 1kg of ethylene glycol (the concentration is 5%), stirring and dispersing at room temperature, sequentially adding 2.5kg of water, 1kg of modified ethyl cellulose and 1kg of PVP to prepare a suspension, adding 1kg of N-isopropyl polyacrylamide to obtain a mixed solution, adjusting the pH to 7.5 with sodium hydroxide, uniformly stirring, standing to obtain the glass free-form surface polishing solution, wherein the viscosity of the static polishing solution is 2.4 Pa.s.
Fixing the glass ball frame on a fixture, immersing the glass ball frame in the prepared polishing liquid for the free-form surface of the glass, driving the glass ball to rotate around the main shaft rapidly by the fixture, and polishing the glass ball for 30 minutes by the polishing liquid which rotates reversely in a container to obtain a smooth mirror surface without any scar.
Example 2:
weighing 5kg of cerium oxide with the particle size of 20-30 mu m, adding 5g of ethylene glycol solution (with the concentration of 10%), stirring and dispersing at room temperature, sequentially adding 1kg (with the concentration of 70%) of polyethylene glycol and 50g of corn starch, adding 50g of PVA to prepare a suspension, adding 50g of N-isopropyl polyacrylamide to obtain a mixed solution, adjusting the pH to 7 by using nitric acid, stirring uniformly, standing to obtain the glass free-form surface polishing solution, wherein the viscosity of the static polishing solution is 3.1 Pa.s.
Fixing the glass ball frame on a fixture, immersing the glass ball frame in the prepared polishing liquid for the free-form surface of the glass, driving the glass ball to rotate around the main shaft rapidly by the fixture, and polishing the glass ball for 30 minutes by the polishing liquid which rotates reversely in a container to obtain a smooth mirror surface without any scar.
Example 3:
weighing 5kg of boron carbide with the particle size of 40-50 mu m, adding 0.5kg of polyethylene glycol (with the concentration of 8%), stirring uniformly at room temperature, sequentially adding 2kg of polyethylene glycol (with the concentration of 50%), 1kg of methylcellulose, adding 0.5kg of PVA to prepare a suspension, adding 0.5kg of N-isopropyl polyacrylamide to obtain a mixed solution, adjusting the pH to 6.5 by using a sodium hydroxide solution, stirring uniformly, standing to obtain the glass free-form surface polishing solution, wherein the viscosity of the static polishing solution is 1.7 Pa.S.
Fixing the glass ball frame on a fixture, immersing the glass ball frame in the prepared polishing liquid for the free-form surface of the glass, driving the glass ball to rotate around the main shaft rapidly by the fixture, and polishing the glass ball for 30 minutes by the polishing liquid which rotates reversely in a container to obtain a smooth mirror surface without any scar.
Example 4:
weighing 5kg of titanium oxide with the particle size of 20-50 nm, adding 0.1kg of polyethylene glycol solution (with the concentration of 10%), stirring and dispersing at room temperature, sequentially adding 1.5kg of polymeric polyol (with the concentration of 30%), adding 0.1kg of boric acid, adding 0.5kg of sodium polyacrylate to prepare a suspension, adding 0.5kg of N-isopropyl polyacrylamide to obtain a mixed solution, adjusting the pH to 7.0 by using a sodium hydroxide solution, stirring uniformly, standing to obtain the glass free curved surface polishing solution, wherein the viscosity of the polishing solution in a static state is 3.2 Pa.s.
Fixing the glass ball frame on a fixture, immersing the glass ball frame in the prepared polishing liquid for the free-form surface of the glass, driving the glass ball to rotate around the main shaft rapidly by the fixture, and polishing the glass ball for 30 minutes by the polishing liquid which rotates reversely in a container to obtain a smooth mirror surface without any scar.
Example 5:
weighing 5kg of silicon oxide powder with the particle size of 500-600 nm, adding 0.5kg of polyethylene glycol (with the concentration of 10%), stirring and dispersing at room temperature, sequentially adding 2.5kg of polyethylene glycol (with the concentration of 70%), 1kg of guar gum and 0.45kg of PVA to prepare a suspension, adding 1kg of N-isopropyl polyacrylamide to obtain a mixed solution, adjusting the pH to 7.5 by using nitric acid, stirring uniformly, standing to obtain the glass free-form surface polishing solution, wherein the static viscosity of the polishing solution is 2.85 Pa.s.
Fixing the glass ball frame on a fixture, immersing the glass ball frame in the prepared glass free-form surface polishing solution, driving the glass ball to rotate around the main shaft rapidly by the fixture, meanwhile, reversely rotating the polishing solution in a container, and polishing for 35 minutes to obtain a smooth mirror surface without any flaw. During polishing, under the condition of 50Pa shearing force, the viscosity of the polishing solution is increased from 10Pa.s to 15Pa.s along with the temperature increase from 25 ℃ to 50 ℃.
Comparative example 1:
weighing 5kg of silicon oxide powder with the particle size of 500-600 nm, adding 0.5kg of polyethylene glycol (with the concentration of 10%), stirring and dispersing at room temperature, sequentially adding 2.5kg of polyethylene glycol (with the concentration of 70%), 1kg of guar gum and 0.45kg of PVA to prepare a suspension to obtain a mixed solution, adjusting the pH to 7.5 by using nitric acid, uniformly stirring, standing to obtain glass free-form surface polishing solution, wherein the static viscosity of the polishing solution is 2.3 Pa.s.
And fixing the glass ball frame on a fixture, immersing the glass ball frame in the prepared glass free-form surface polishing solution, driving the glass ball to rotate around the main shaft rapidly by the fixture, and polishing the glass ball in a container for 60 minutes by the polishing solution in a reverse direction to obtain the glass ball with a smooth mirror surface and no scratch.
Compared with the polishing solution of the embodiment 5 of the invention, the polishing solution of the comparative example 1 is not added with the surfactant N-isopropyl polyacrylamide, the viscosity of the polishing solution is 10Pa.s at 25 ℃ under the condition of 50Pa of the shearing force in the polishing process, but the viscosity of the polishing solution is reduced to 5Pa.s instead along with the increase of the temperature of a polishing system to 50 ℃, and compared with the viscosity of the polishing solution of the embodiment 5 of the invention which is 15Pa.s, the dynamic viscosity of the polishing solution is reduced, so that when the same polishing effect is achieved in the comparative example 1, the polishing time is increased to 60 minutes, and the polishing efficiency is reduced.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (8)
1. The polishing solution for the free-form surface of the glass comprises the following components in parts by weight:
20-50 parts of liquid phase carrier, 0.1-20 parts of dispersant, 1-30 parts of thickening additive, 80-120 parts of friction agent, 1-20 parts of rheological modifier and 5-20 parts of surfactant,
the surfactant is N-isopropyl polyacrylamide; the number average molecular weight of the N-isopropyl polyacrylamide is more than 100000;
the thickening additive comprises one or more of starch, boric acid, borate, guar gum and cellulose;
the particle size of the abrasive is 500 nm-50 mu m;
the preparation method of the glass free-form surface polishing solution comprises the following steps:
mixing a liquid phase carrier, a dispersing agent, a friction agent, a thickening additive, a rheology modifier and a surfactant, and adjusting the pH value to obtain the glass free-form surface polishing solution;
the pH value is adjusted within the range of 6.5-7.5.
2. The glass free-form surface polishing solution according to claim 1, wherein the liquid carrier comprises one or more of water, a polyol, a polymeric alcohol, and a polymeric polyol; the mass concentration of the polyol, the polymeric alcohol and the polymeric polyol is independently 30-70%.
3. The glass free-form surface polishing solution according to claim 1, wherein the dispersant comprises a polyhydric alcohol and/or a polymeric alcohol; the mass concentration of the polyol and/or polymeric alcohol is independently < 10%.
4. The glass free-form surface polishing solution according to claim 2 or 3, wherein the polyhydric alcohol independently comprises one or more of ethylene glycol, propylene glycol, butylene glycol, hexylene glycol, neopentyl glycol, and glycerin; the polymeric alcohol independently comprises one or more of polyethylene glycol, polypropylene glycol, polybutylene glycol, polyhexamethylene glycol, neopentyl glycol, and polyglycerol.
5. The glass free-form surface polishing solution according to claim 1, wherein the abrasive includes one or more of rare earth oxides, silicon oxide, aluminum oxide, iron oxide, silicon carbide, and boron carbide.
6. The glass free-form surface polishing solution according to claim 1, wherein the rheology modifier comprises an alkyd modifier and/or an acrylic modifier.
7. The method for preparing the glass free-form surface polishing solution according to any one of claims 1 to 6, comprising the steps of:
mixing a liquid phase carrier, a dispersing agent, a friction agent, a thickening additive, a rheology modifier and a surfactant, and adjusting the pH value to obtain the glass free-form surface polishing solution;
the pH value is adjusted within the range of 6.5-7.5.
8. Use of the glass free-form surface polishing solution according to any one of claims 1 to 6 in the field of glass free-form ultra-precise surface polishing.
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| CN116970343A (en) * | 2023-08-02 | 2023-10-31 | 包头天骄清美稀土抛光粉有限公司 | Rare earth polishing solution for polishing curved glass cover plate and preparation method and application thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007086665A1 (en) * | 2006-01-25 | 2007-08-02 | Lg Chem, Ltd. | Cmp slurry and method for polishing semiconductor wafer using the same |
| CN102717325A (en) * | 2012-06-08 | 2012-10-10 | 浙江工业大学 | Ultra-precise curved surface finishing method based on non-Newtonian fluid shear thickening effect |
| CN103805069A (en) * | 2014-01-27 | 2014-05-21 | 欧普康视科技（合肥）有限公司 | Corneal contact lens polishing solution and preparation method thereof |
| CN104603227A (en) * | 2012-08-31 | 2015-05-06 | 福吉米株式会社 | Polishing composition and method for producing substrate |
-
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007086665A1 (en) * | 2006-01-25 | 2007-08-02 | Lg Chem, Ltd. | Cmp slurry and method for polishing semiconductor wafer using the same |
| CN102717325A (en) * | 2012-06-08 | 2012-10-10 | 浙江工业大学 | Ultra-precise curved surface finishing method based on non-Newtonian fluid shear thickening effect |
| CN104603227A (en) * | 2012-08-31 | 2015-05-06 | 福吉米株式会社 | Polishing composition and method for producing substrate |
| CN103805069A (en) * | 2014-01-27 | 2014-05-21 | 欧普康视科技（合肥）有限公司 | Corneal contact lens polishing solution and preparation method thereof |
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