CN109072399A - Method and apparatus to produce the partition for battery applications - Google Patents
Method and apparatus to produce the partition for battery applications Download PDFInfo
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- CN109072399A CN109072399A CN201680085183.9A CN201680085183A CN109072399A CN 109072399 A CN109072399 A CN 109072399A CN 201680085183 A CN201680085183 A CN 201680085183A CN 109072399 A CN109072399 A CN 109072399A
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- evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M50/00—Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
- H01M50/40—Separators; Membranes; Diaphragms; Spacing elements inside cells
- H01M50/403—Manufacturing processes of separators, membranes or diaphragms
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M50/00—Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
- H01M50/40—Separators; Membranes; Diaphragms; Spacing elements inside cells
- H01M50/409—Separators, membranes or diaphragms characterised by the material
- H01M50/431—Inorganic material
- H01M50/434—Ceramics
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M50/00—Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
- H01M50/40—Separators; Membranes; Diaphragms; Spacing elements inside cells
- H01M50/489—Separators, membranes, diaphragms or spacing elements inside the cells, characterised by their physical properties, e.g. swelling degree, hydrophilicity or shut down properties
- H01M50/491—Porosity
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Cell Separators (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
Abstract
A kind of method and apparatus for producing the electric insulation baffle used in electrochemical appliance.The method includes providing the flexible base board with front and back, and porous coating of the application including ceramic material at least one of the front and back of flexible base board, wherein applying porous coating includes in the crucible of induction heating by evaporation of metal.
Description
Technical field
The embodiment of present disclosure is related to a kind of film forming method and a kind of thin for being formed on flexible substrates
The equipment of film.The embodiment of present disclosure is set more particularly to a kind of method for being coated with partition (separator) and one kind
Standby, the equipment (is e.g. aoxidized for evaporating metal-containing material, and by the porous coating of the metal-containing material including evaporation
Aluminium (AlOx) and/or silica (SiOx)) it is deposited on partition for battery applications.
Background technique
Electric separator (electrical separator) for example can be described as be in partition used in battery and
Other arrangements of ionic conductivity (ion conductivity) are wherein kept while electrode must be separated from each other.
Traditionally, partition includes thin, porous and electrical isolation substance, the ion porosity (ion with height
Porosity), good mechanical strength and chemicals and solvent for being used in system (the e.g. electrolyte of battery)
Long-time stability.In the battery, partition should make cathode be electrically insulated completely with anode.In addition to this, partition should be permanent bullet
Property, and the movement in system is followed, these movements are not only caused by external loading (external load), also by electricity
Pole is caused with " breathing (breathing) " of combination and the discharge of ion.
In general, partition is for most important for the use of the determination of its system lifetim and safety.Citing comes
It says, the development of rechargeable batteries is largely influenced by the exploitation of suitable separator material.
Battery system, such as high energy battery or heavy-duty battery are used in various applications, wherein it is important that having most
A large amount of available electrical energy.High energy battery or heavy-duty battery are, for example, to be used to include portable electronic device, medical treatment, traffic fortune
(grid-connected) the massive energy memory of defeated, power grid connection, the memory of renewable energy and do not power off power supply system
In application including system (uninterrupted power supply, UPS).
In general, the partition for high energy battery or heavy-duty battery can have the property that it is very thin to ensure
Meet low particular space requirement and minimize internal resistance, have high porosity with ensure low internal resistance and lightweight with
Realize the low-gravity of battery system.
In numerous applications, the e.g. traction battery used in all-electric vehicle (fully eletric vehicle)
In (traction battery), a large amount of energy is needed.Battery in these applications is often with such as lithium or lithium compound
Etc reactive metal (reactive metal) based on, and store a large amount of energy in a completely charged state,
This energy should not discharge in an uncontrolled fashion.These battery applications have special security requirement, specifically these
The partition of battery applications has to comply with very high standard to prevent failure.
In view of this, embodiment described herein is designed to provide a kind of method and apparatus, more pacify to produce
The full partition for battery applications, especially for high energy battery or the partition of heavy-duty battery.
Summary of the invention
According to the one side of present disclosure, a kind of electric insulation baffle to produce for electrochemical appliance is provided
The method of (electrically insulating separator).The method includes providing to have the one of front and back
Flexible base board, and apply include ceramic material porous coating to flexible base board front and back at least one, wherein
Applying porous coating includes in the crucible of induction heating by evaporation of metal.
Further it is provided that a kind of evaporated device (evaporation apparatus), the evaporated device include for depositing
The porous coating of ceramic material is on the surface of flexible base board.The evaporated device includes: debatching module (un-winding
Module), debatching module is used to provide a roll of flexible base board；It is coated with drum (coating drum), coating drum is arranged to use
In towards vapor deposition chamber guide flexible base board；Gas leading-in device, gas leading-in device are arranged for controllably importing anti-
Answer gas into vapor deposition chamber；With rewinding module (re-winding module), rewinding module is for rewinding (re-
Wind) flexible base board, wherein vapor deposition chamber includes for by the crucible of at least one induction heating of evaporation of metal.
Other aspects of present disclosure, advantages and features are by apparent in dependent claims, the description and the appended drawings.
Detailed description of the invention
In order to the features described above of present disclosure is understood in detail, be referred to exemplary embodiment, obtain for
The present disclosure summarized briefly above more specifically describes.Attached drawing is related to the embodiment of present disclosure, and is described below:
Fig. 1 is shown according to embodiment described herein to deposit the porous coating including ceramic material to flexible base
The schematic diagram of evaporated device on the surface of plate.
Fig. 2 shows the magnified partial views of evaporated device shown in Fig. 1.
Fig. 3 is schematically shown according to embodiment described herein for producing electricity used in electrochemical appliance
The method of insulating barrier.
Specific embodiment
The various embodiments of present disclosure will be described in detail below, one or more example is as schemed
Show.In the description below for attached drawing, identical reference number represents identical component.In general, only for individual real
The difference for applying mode is described explanation.Each example is provided for interpretation, not to limit present disclosure.It is depicted
Out or description as embodiment a part feature, can be used for other embodiment or make in conjunction with other embodiments
With further to generate another embodiment.The content is intended to cover such modifications and changes.
As used in this, term " electrochemical appliance " can be understood as indicating electrochemical energy storage, can be with
It is chargeable or non-rechargeable.In this respect, present disclosure do not distinguish term " battery (accumulator) " with
Difference between " battery (battery) ".In the context of present disclosure, below by term " electrochemical appliance " and " electricity
Chemical cell (electrochemical cell) " is used as synonym.Electrochemical cell for example also contemplated capacitor
(capacitor).In embodiment described herein, electrochemical cell is construed as the minimum function list of energy accumulator
Member.In industrial practice, multiple electrochemical cells can be continually connected in series or in parallel to increase the gross energy of memory appearance
Amount.Herein, with reference to multiple electrochemical cells.Therefore, the battery industrially designed can have single electrochemical cell or more
A electrochemical cell connected in parallel or series.
It in general, include two electrodes with opposite polarity as the electrochemical cell of basic functional units, i.e., it is negative
Pole and anode.Two electrodes are insulated from each other by the partition of arrangement between the electrodes, to prevent short circuit.Battery is by electrolyte
Filling, that is, ion conductor are liquid, in gel or be sometimes solid-state.Partition be can ion infiltration, and filling
In electricity or discharge cycles, allow the ion exchange between anode and cathode.
For example, in lithium ion electrochemical cells, partition is usually as made by microporous polyethylene and polyolefin.It is filling
During the electrochemical reaction of electricity and discharge cycles, lithium ion is by the hole in partition between two electrodes of electrochemical cell
Transmission.High porosity can increase ionic conductivity.However, when being, for example, the ingotism for forming lithium in cyclic process
(dendrites) when making to occur between electrode short circuit, the partition of some high porosities may be influenced by electric short circuit.In order to
Electrochemical cell failure is prevented, the composition and production method of partition are quite important.
According to embodiment described herein, very thin partition can be produced.Therefore, it can reduce first and be unprofitable to electricity
The component ratio of the active electrochemical cell of chemical cell.Secondly, the increase of thickness reduced while bringing ionic conductivity.
According to the partition of embodiment described herein, the density of such as battery pack (battery stack) is allowed to increase, so that identical
Volume can store a greater amount of energy.In general, limiting electric current (limiting according to embodiment described herein
Current density) can also increase similarly by the amplification of electrode area.
According to the method for electric insulation baffle used in the production electrochemical cell of embodiment described herein, can be used for
Produce the partition separated with electrochemical cell, it can also be used to which production is directly integrated the partition into electrochemical cell, is such as
With the lithium ion battery for being integrally formed partition (integrated separator).It, can in the application for being integrally formed partition
Directly to form single layer separator or multilayer insulating panel on the electrode of electrochemical cell.
In embodiment described herein, partition may include ceramic material, this material is that non-conductive or electric conductivity is excessively poor
Metal oxide at least one, the metal be aluminium, silicon, lead, zirconium, titanium, hafnium, lanthanum, magnesium, zinc, tin, cerium, yttrium, calcium, barium, strontium
And combinations thereof.Although silicon is generally viewed as metalloid, should include as long as referring to metal in the context of present disclosure
Silicon.In general, according to embodiment described herein, for the electrochemical cell with strong alkaline electrolytes, choosing can be passed through
The input material (input material) for selecting special alkali resistant optimizes partition.For example, zirconium or titanium generation can be used
For aluminium or silicon as inorganic constituents to form porous coating.Porous coating will include that zirconium oxide or titanium oxide replace aluminium oxide or oxygen
SiClx.
According to embodiment described herein, the porous coating being deposited on flexible base board can have from about 25nm to
Thickness in the range of about 300nm, e.g. 100nm are to 200nm.Partition with this thickness allows in an electrochemical cell
Very high energy density.According to the evaporated device of embodiment described herein, for example soaked with traditional partition coating technique
Coating (dip-coating) is compared, and very high application rate is allowed.In general, application rate can be according to will be deposited on
Thickness and the type work of ceramic material on substrate change.
According to embodiment described herein, electric insulation baffle is optionally included selected from the polymeric material of the following group
Material: polyacrylonitrile (polyacrylonitrile), polyester (polyester), polyamide (polyamide), polyimides
(polyimide), polyolefin (polyolefin), polytetrafluoroethylene (PTFE) (polytetrafluoroethylene), carboxymethyl cellulose
Plain (carboxymethyl cellulose), polyacrylic acid (polyacrylic acid), polyethylene (polyethylene),
Polyethylene terephthalate (polyethylene terephthalate), gathers polyphenylene oxide (polyphenyl ether)
Vinyl chloride (polyvinyl chloride), polyvinylidene chloride (polyvinylidene chloride), polyvinylidene fluoride
(polyvinylidene fluoride), poly- (vinylidene fluoride -co- hexafluoropropene) (poly (vinylidenefluoride-
Co-hexafluoropropylene)), polylactic acid (polylactic acid), polypropylene (polypropylene), polybutene
(polybutylene), polybutylene terephthalate (PBT) (polybutylene terephthalate), polycarbonate
(polycarbonate), polytetrafluoroethylene (PTFE) (polytetrafluoroethylene), polystyrene (polystyrene), third
Alkene nitrile butadiene styrene (acrylonitrile butadiene styrene), polymethyl methacrylate (poly
(methyl methacrylate)), polyformaldehyde (polyoxymethylene), polysulfones (polysulfone), styrene-propene
Nitrile (styrene-acrylonitrile), butadiene-styrene rubber (styrene-butadiene rubber), ethylene vinyl acetate
(ethylene vinyl acetate), maleic anhydride of styrene (styrene maleic anhydride), and combinations thereof.?
Any other polymer material stable under the strong reducing condition for example in lithium-based electrochemical battery can be used.According to herein
The embodiment can pass through the input material of the special alkali resistant of selection for the electrochemical cell with strong alkaline electrolytes
Partition is optimized.For example, partition may include polyolefin or polyacrylonitrile to replace polyester.
In embodiment described herein, polymer material can have a high-melting-point, and all such as larger than 200 DEG C.Including high-melting-point
The partition of polymer material is for being beneficial with the electrochemical cell that quick charge recycles.Due to according to reality described herein
The high heat stability of the partition including high-melting-point polymer material of mode is applied, the electrochemical cell for configuring such partition is not
So thermal sensitivity (thermal sensitive), and be able to bear the temperature due to caused by quick charge and rise without producing
Raw adverse effect or damage battery to partition.Such electrochemical cell can have the charging cycle of considerably more rapid speed, this is right
It is very useful for electric vehicle, it can be fully charged within the extremely short time.
According to embodiment described herein, the partition of present disclosure can have the hole in from 10% to 90% range
Gap rate, such as in the range of from 40% to 80%.Porous barrier provides penetration route for electrolyte, and reduces the infiltration of electrolyte
The saturating time.As the porosity understood at this is related to accessibility (accessibility) or open space (open pore).One
As for, porosity can be determined by method well-known to those skilled in the art, such as pass through mercury porosimetry
(method of mercury porosimetry), or the volume and density of used material can be passed through and assume institute
Having hole is open space to calculate porosity.
Fig. 1 is shown for depositing the evaporated device on the porous coating to the surface of flexible base board 111 for including ceramic material
100 schematic diagram.Evaporated device 100 includes loading and unloading chamber 101, for flexible base board 111 to be loaded into evaporated device 100
Or flexible base board 111 is unloaded from evaporated device 100.According to embodiment described herein, loading and unloading chamber can be in flexibility
It is maintained under vacuum during the processing of substrate.Vacuum plant 190, e.g. vacuum pump are provided, loading and unloading chamber 101 is pumped into
Vacuum.
According to embodiment described herein, loading and unloading chamber 101 includes debatching module 110 and rewinding module 130.It can be
The flexible base board 111 of debatching is provided at debatching module 110.During processing, flexible base board 111 can be de-rolled (arrow 113) simultaneously
Coating drum 120 is directed to by one or more deflector rolls (guide roll) 112.After handling, flexible base board can be wound (arrow
On the first 114) rewinding roller in rewinding module 130.
Optionally, according to embodiment described herein, loading and unloading chamber 101 may include tension module (tension
Module) 180, for example, it includes one or more jockey pulleys.In embodiment described herein, loading and unloading chamber 101
It may also include pivot device (pivot device) 170, e.g. pivot arm (pivot arm).Pivot device 170 is configured to
It is removable relative to rewinding module 130.
In embodiment described herein, evaporated device 100 includes vapor deposition chamber 102, and metal can be in vapor deposition chamber 102
Evaporation.It can be used and the same vacuum plant 190 that loading and unloading chamber 101 is evacuated is evacuated chamber is deposited.Root
According to other embodiment described herein, chamber, which is deposited, can also have the vacuum holding separated with the vacuum plant of loading and unloading chamber
It sets.
Evaporated device 100 shown in Fig. 1 further comprises that can be used to the vaporising device of evaporation of metal
(evaporation device)140.According to embodiment described herein, vaporising device can be one or more inductions and add
The crucible of heat.The crucible of induction heating can be for example configured in vacuum environment, heat (RF by radio frequency induction
Induction-heating), especially by mid-frequency induction heating (MF induction-heating), by evaporation of metal.
In other embodiment described herein, metal be may be provided in interchangeable crucible, e.g. be held in one or more graphite
In device.In general, interchangeable crucible may include the insulating materials around crucible according to embodiment described herein.It can be with
One or more induction coils are wound around crucible and insulating materials.It is one according to embodiment described herein
Or multiple induction coils can be water-cooled.Using interchangeable crucible, electric wire is not required to supply to evaporated device.It can
The formula crucible of changing can be pre-placed metal, and can be with periodic replacement or filling.In general, batch, which provides metal, has accurate control
The advantages of amount of the metal evaporated.
With use resistance heating crucible with traditional method of evaporating by evaporation of metal compared with, using induction heating crucible permit
Perhaps heating process is generated inside crucible itself, is replaced via the external heat source by heat transfer.The crucible of induction heating has
The advantages of all side walls of crucible are quickly and uniformly heated very much.The evaporating temperature of metal can add compared to traditional resistance
The mode of hot crucible body more closely controls.When according to the embodiment of the present disclosure, using the crucible of induction heating, be not required to by
Crucible is heated to the evaporating temperature of metal or more, this allows the evaporation of metal more to be controlled and more efficiently, so as to be deposited on soft
Porous coating on property substrate is more evenly.A possibility that temperature of tight control crucible can also be by reducing evaporated metal splashing,
The defect of pin hole (pinhole) and through-hole (through-hole) on prevention/reduction substrate in porous coating.Needle in partition
The defect of hole and through-hole may make electrochemical cell that short circuit occur.
According to embodiment described herein, the crucible of induction heating for example can be by one or more line of induction corrals
Around.Induction coil can be a component part of the crucible of the induction heating according to embodiment described herein.It is this
In the other embodiment, the crucible of induction coil and induction heating may be provided as independently separated part.It will
The crucible of induction heating is provided separately with induction coil, allows evaporated device easy to maintain.
In embodiment described herein, evaporated device may include power supply 240 (as shown in Figure 2).Power supply 240 can be connected to
Induction coil.In general, according to embodiment described herein, power supply 240 is AC power source, is configured for providing low
Voltage but high current and high-frequency electric power.It can be for example by including resonance circuit (resonant circuit) anti-to increase
Answer power.According to embodiment described herein, other than conductive material or with substituting conductive material, the crucible of induction heating
It such as may include ferrimagnet (ferromagnetic material).Magnetic material can for example improve the heated of induction
Journey, and allow the evaporating temperature for more preferably controlling metal.
According to embodiment described herein, the coating drum 120 of evaporated device 100 can be by loading and unloading chamber 101 and steaming
Chamber 102 is plated to separate.Coating drum 120 is configured for being directed to flexible base board 111 in vapor deposition chamber 102.In general,
Coating drum is arranged in evaporated device, so that flexible base board passes through vaporising device.In embodiment described herein, coating drum
It can be cooled.
Vapor deposition chamber 102 according to embodiment described herein may include plasma source 108, plasma source 108
It is configured for generating plasma between vaporising device 140 and coating drum 120.Match for example, plasma source can be
It is set to the electron beam device that plasma is inspired with electron beam.According to other embodiment described herein, plasma
Source can be hollow anode deposition plasma source (hollow anode deposition plasma source).Plasma
Body can help to prevent/reduce the pin hole on substrate in porous coating by further decreasing a possibility that evaporated metal splashes
With the defect of through-hole.Plasma can also further excite the particle of (excite) evaporated metal.According to implementation described herein
Mode, plasma can increase the density and the uniformity of the porous coating being deposited on flexible base board.
The evaporated device 100 of Fig. 1 further comprises gas leading-in device 107, gas leading-in device 107 be arranged to
Reaction gas is controllably imported to vapor deposition chamber 102.For example, gas leading-in device may include nozzle and supply pipe
(supply tube), the supply pipe are for example connected with for providing oxygen supply source of the oxygen into vapor deposition chamber 102.
According to embodiment described herein, oxygen can for example react with evaporated metal and form pottery on flexible substrates
Porcelain coating.It for example, may include aluminium oxide according to the partition of embodiment described herein being used in electrochemical cell
(AlOx) and silica (SiOxAt least one of).The metal of such as aluminium and/or silicon etc can pass through the crucible of induction heating
Evaporation, and oxygen can be supplied to evaporated metal via gas leading-in device.According to embodiment described herein, in order to be had
There is (stoichiometric) Al of the stoichiometric(al) of large scale2O3With the SiO of stoichiometric(al)2At least one of partition, can
Correspondingly to adjust the evaporation rate of metal, the amount of oxygen, the indoor pressure of vapor deposition chamber and plasma density.
According to embodiment described herein, evaporated device may include on-line monitoring system (inline monitoring
System) 150, it is suitable for obtaining monitoring signals (monitoring signal), including more on flexible base board about being deposited on
The uniformity of hole coating and the information of composition.In embodiment described herein, on-line monitoring system for example may include an optics
Measuring device.For porous aluminas (AlOx) and silica (SiOx) coating, optical measuring device for example can be configured to about
To be operated under the wavelength of 370nm.The detection sensitivity of optical measuring device can be according to being applied to the porous of flexible base board
The type of coating adjusts.
Fig. 2 shows the amplifier sections 200 of evaporated device 100 shown in Fig. 1.According to embodiment described herein, steam
Coating apparatus 100 may include control system 220.Control system 220 can be connected to on-line monitoring system 150, gas leading-in device
107, one or more of plasma source 108 and power supply 240.According to embodiment described herein, control system is matched
Be set to the monitoring signals in response to on-line monitoring system with adjust it is following at least one: be provided to vaporising device power, provide
The reaction gas in vapor deposition chamber is directed into the power of plasma source, amount of reactant gases and by gas leading-in device
Airflow direction (orientation).
In embodiment described herein, gas leading-in device 107 can be arranged in the evaporation for being approximately parallel to metal
The air-flow of reaction gas is provided on the direction in direction 230.According to embodiment described herein, provided by gas leading-in device
Airflow direction can be adjusted according at least one of the uniformity of porous coating and composition.The evaporation for being parallel to metal is provided
The air-flow of the reaction gas in direction, which can ensure that, to react more effectively between reaction gas and evaporated metal on flexible base board 111
Form porous coating 211.Device 107 is introduced gas into be arranged to be in a direction substantially parallel to what metal was evaporated from vaporising device 140
Reaction gas is imported on the direction of evaporation direction 230, it can also be anti-with evaporated metal effect by that can precisely control
The amount of gas is answered to help coating process is more preferably controlled.
According to embodiment described herein, plasma 210 can be guided in the evaporation substantially perpendicular to metal
On the direction in direction 230.Guiding plasma can be helped further on the direction for the evaporation direction for being approximately parallel to metal
In the splashing for preventing evaporated metal any, and the needle pore defect of the porous coating on flexible base board can be reduced.
Fig. 3 is schematically shown according to embodiment described herein for producing electricity used in electrochemical appliance
The method 300 of insulating barrier.Method 300 includes the steps that providing the flexible base board 310 with front and back.According to this institute
The embodiment stated, providing flexible base board may include that guiding flexible base board is roused by coating to weight from the debatching module of evaporated device
Roll up module.
In embodiment described herein, the method can further comprise in the crucible of induction heating by evaporation of metal
Step 320.In general, aluminium and/or silicon can be evaporated by the crucible of induction heating according to embodiment described herein.
In embodiment described herein, the method further includes apply include ceramic material porous layer to flexible base board just
The step of at least one in face and the back side 330.
In general, evaporated metal can react with reaction gas and in flexible base board according to embodiment described herein
Upper formation porous coating.In embodiment described herein, metal can evaporate in vacuum environment.For example, aluminium is evaporated
It can be reacted with oxygen to form porous aluminas (AlO on flexible substratesx) layer.
According to embodiment described herein, in the crucible of induction heating by evaporation of metal can further comprise sensing gold
Belong to evaporation when evaporating temperature, and according to sensed evaporating temperature adjustment provide in the crucible of induction heating by metal
The step 340 of the power of evaporation.Monitoring and adjustment evaporating temperature can improve the energy of the method for producing electric insulation baffle
Efficiency, and help to prevent from being applied to any needle pore defect of the porous coating on flexible base board.
In embodiment described herein, the porous coating being applied on flexible base board can have from about 25nm to about
The thickness of 300nm, e.g. 100nm are to 200nm.
According to embodiment described herein, in the crucible of induction heating by evaporation of metal can further comprise provide it is anti-
Answer gas (for example, oxygen) to the step 350 of evaporated metal.In embodiment described herein, reaction gas can be in essence
On be parallel to metal evaporation direction direction on provide.
Method for producing electric insulation baffle can further comprise between evaporated metal and flexible base board provide etc. from
The step 360 of daughter.Plasma can increase the density of porous coating on flexible base board, and can also contribute to reducing more
The needle pore defect of hole coating.In general, can be by being, for example, electron beam according to the plasma of embodiment described herein
Device or hollow anode deposition plasma source are provided.The density of porous coating may subject plasma Effects of Density.
According to embodiment described herein, the method for producing electric insulation baffle can further comprise that monitoring is deposited on
The step 370 of wherein one or more in the uniformity and composition of porous coating on flexible base board.In addition, monitoring porous painting
The uniformity and composition of layer may include the pin hole and defective hole detected in porous coating.In general, according to described herein
Embodiment monitors at least one of the uniformity and composition of porous coating, can further comprise at least one below adjusting:
It is provided to the power of evaporated metal, the power for being provided to plasma, amount of reactant gases, the reaction gas for being provided to evaporated metal
Airflow direction and the rate that is guided of flexible base board, be e.g. led to rewinding mould from the debatching module of evaporated device
The rate of block.
According to embodiment described herein, it is deposited on the stoichiometry of the porous coating on flexible base board
It (stoichiometry) can be for example by the evaporation rate of metal and the amount institute shadow for the reaction gas for being provided to evaporated metal
It rings.Other may influence the aspect of the stoichiometry of the porous coating of deposition, can be big for the vapor deposition indoor vacuum of chamber and surrounding
Pressure difference between atmospheric pressure.For example, if porous coating includes excessive non-stoichiometric (non-
Stoichiometric aluminium oxide (AlO)x) and/or non-stoichiometric silica (SiOx), then it can be by changing oxygen
It measures to increase the Al of stoichiometric(al) in porous coating2O3And/or SiO2Amount.
This written narration discloses present disclosure, including optimal mode using example, and makes any technology in this field
Personnel can carry out described theme, including production and using any equipment or system and carry out any method being related to.?
Embodiment described in this provide it is a kind of for producing the improved method and apparatus of partition, the partition have high porosity with
Good ionic conductivity, compound pore structure and nothing/reduction pin hole or defective hole are obtained to inhibit short circuit, excellent heat and machine
Tool stability, and can be with low cost production.Although various specific embodiments have been disclosed as above, above embodiment
In the feature of not mutual exclusion each other can be bonded to each other.Patentability range is defined in the claims, also, if other examples
With structural detail not different with the literal language of claim, or if other examples include literal with claim
Equivalent structural elements of the language without essence difference, then these examples are intended to be included in the scope of the claims.
Claims (15)
1. a kind of method for producing electric insulation baffle used in electrochemical appliance, which comprises
Flexible base board is provided, the flexible base board has front and back；With
Apply at least one of the positive and back side for including the porous coating of ceramic material to the flexible base board；
Wherein, applying the porous coating includes in the crucible of induction heating by evaporation of metal.
2. according to the method described in claim 1, wherein in the crucible of the induction heating that the evaporation of metal is further
Including sensing the evaporating temperature when evaporation of metal, and according to the evaporating temperature sensed, adjustment is provided in the sense
By the power of the evaporation of metal in the crucible that should be heated.
3. method according to claim 1 or 2, applied in the porous coating have from about 25nm to about
The thickness of 300nm.
4. according to the method in any one of claims 1 to 3, wherein by the metal in the crucible of the induction heating
Evaporation further comprises providing the metal of reaction gas to evaporation.
5. according to the method described in claim 4, further comprise in the uniformity and composition according to the porous coating extremely
One few, adjustment is provided to the amount of reactant gases of the metal of evaporation and is provided to the reaction gas of the metal of evaporation
At least one of airflow direction of body.
6. method according to claim 4 or 5, wherein the reaction gas includes oxygen.
7. method according to any one of claim 1 to 6, wherein the metal includes selected from the group including the following
Element: aluminium, silicon, lead, zirconium, titanium, hafnium, lanthanum, magnesium, zinc, tin, cerium, yttrium, calcium, barium, strontium and combinations thereof.
8. method according to any one of claim 1 to 7 further comprises the metal in evaporation and the flexibility
Plasma is provided between substrate.
9. according to the method described in claim 8, wherein the plasma by electron beam device or hollow anode deposit etc. from
Daughter source provides.
10. method according to claim 8 or claim 9, wherein according in the uniformity and composition of the porous coating at least
One, adjustment is provided to the power of the plasma.
11. a kind of evaporated device, the evaporated device is used to deposit the porous coating including ceramic material in the table of flexible base board
On face, the evaporated device includes:
Chamber is deposited；
Debatching module, the debatching module are used to provide a roll of flexible base board；
Coating drum, the coating drum are arranged for towards the vapor deposition chamber guiding of the evaporated device flexible base
Plate；
Gas leading-in device, the gas leading-in device are arranged for controllably importing reaction gas to the vapor deposition chamber
Room；With
Rewinding module, the rewinding module is for rewinding the flexible base board；
Wherein, the vapor deposition chamber includes for by the crucible of at least one induction heating of evaporation of metal.
12. evaporated device according to claim 11 further comprises plasma source, the plasma source is configured
At for providing plasma between the crucible of the induction heating and coating drum.
13. evaporated device according to claim 12, wherein the plasma source is electron beam device or hollow anode
Deposition plasma source.
14. evaporated device described in any one of 1 to 13 according to claim 1 further comprises being suitable for generating monitoring signals
On-line monitoring system, the monitoring signals include the uniformity and composition for the porous coating being deposited on the flexible base board
In the information of wherein one or more.
15. evaporated device according to claim 14 further comprises control system, the control system is configured to
In response to the on-line monitoring system the monitoring signals and adjust it is following at least one: be provided to the earthenware of the induction heating
The power of crucible, the power for being provided to the plasma source, amount of reactant gases and institute is directed by the gas leading-in device
State the airflow direction of the reaction gas in vapor deposition chamber.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US2016/029224 WO2017188927A1 (en) | 2016-04-25 | 2016-04-25 | Method and apparatus for the production of separators for battery applications |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109072399A true CN109072399A (en) | 2018-12-21 |
Family
ID=56092979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201680085183.9A Pending CN109072399A (en) | 2016-04-25 | 2016-04-25 | Method and apparatus to produce the partition for battery applications |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2019515430A (en) |
| KR (1) | KR20190002562A (en) |
| CN (1) | CN109072399A (en) |
| TW (1) | TWI644471B (en) |
| WO (1) | WO2017188927A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110676414A (en) * | 2019-08-05 | 2020-01-10 | 东莞锂威能源科技有限公司 | Preparation method of isolating membrane ceramic coating |
| CN112144018A (en) * | 2020-08-14 | 2020-12-29 | 浙江长宇新材料有限公司 | Preparation system and method of composite material with oxide intermediate layer |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019096391A1 (en) * | 2017-11-16 | 2019-05-23 | Applied Materials, Inc. | Method and apparatus for vapor depositing an insulation layer of metal oxide on a substrate |
| CN114411140B (en) * | 2022-01-19 | 2024-01-30 | 西部宝德科技股份有限公司 | Preparation method of porous titanium coating |
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| CN110676414A (en) * | 2019-08-05 | 2020-01-10 | 东莞锂威能源科技有限公司 | Preparation method of isolating membrane ceramic coating |
| CN112144018A (en) * | 2020-08-14 | 2020-12-29 | 浙江长宇新材料有限公司 | Preparation system and method of composite material with oxide intermediate layer |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI644471B (en) | 2018-12-11 |
| WO2017188927A1 (en) | 2017-11-02 |
| KR20190002562A (en) | 2019-01-08 |
| JP2019515430A (en) | 2019-06-06 |
| TW201806215A (en) | 2018-02-16 |
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