CN109037092A - A kind of wafer visual inspection machine - Google Patents

A kind of wafer visual inspection machine Download PDF

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Publication number
CN109037092A
CN109037092A CN201810737002.7A CN201810737002A CN109037092A CN 109037092 A CN109037092 A CN 109037092A CN 201810737002 A CN201810737002 A CN 201810737002A CN 109037092 A CN109037092 A CN 109037092A
Authority
CN
China
Prior art keywords
fixed
gun body
station
movable plate
fixed plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810737002.7A
Other languages
Chinese (zh)
Inventor
张乔栋
孙健
陈业
李锋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangsu Nepes Semiconductor Co Ltd
Original Assignee
Jiangsu Nepes Semiconductor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiangsu Nepes Semiconductor Co Ltd filed Critical Jiangsu Nepes Semiconductor Co Ltd
Priority to CN201810737002.7A priority Critical patent/CN109037092A/en
Publication of CN109037092A publication Critical patent/CN109037092A/en
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02Cleaning by the force of jets, e.g. blowing-out cavities
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Abstract

The invention discloses a kind of wafer visual inspection machines, including cleaning plant, the cleaning plant includes fixed station, pedestal, fixed plate, the gentle pump of drifting dust gun body, the upper surface of the fixed station is installed with fixed chute, the bottom end of the fixed plate is provided with fixed fixture block, the fixed plate and fixed station are by being connected together, the top of the fixed plate is provided with movable plate, the inside of the movable plate offers fixing groove, the side of the fixing groove is provided with drifting dust gun body, and the side of the drifting dust gun body is provided with installation fixture block;The present invention passes through installation air pump and dust blower, it is delivered gas in dust blower by the air of air pump compresses, to clear up monitor station, dust blower is by being fixed on movable plate, dust blower can be unloaded and be cleared up manually, installing and dismounting is more convenient, changes the cleaning direction of dust blower by rotation movable plate, so that cleaning effect is more preferable.

Description

A kind of wafer visual inspection machine
Technical field
The invention belongs to wafer detection technique fields, and in particular to a kind of wafer visual inspection machine.
Background technique
Wafer refers to silicon chip used in silicon semiconductor production of integrated circuits, since its shape is circle, therefore referred to as wafer, Wafer is generally made into 6 inches of diameter, 8 inches or 12 inches of cylindrical bar, when producing to wafer, in order to guarantee The quality of production of wafer can detect wafer appearance by detection machine mostly.
Existing wafer detection machine when not in use, can occupy dust on monitor station, need to clear up monitor station, prevent Dust adheres on the wafer surface, when detecting, will affect the effect of detection, existing detection machine is mostly installation cleaning dress Set, when cleaning more troublesome problem, thus it is proposed that a kind of wafer visual inspection machine.
Summary of the invention
The purpose of the present invention is to provide a kind of wafer visual inspection machines, mentioned above in the background art existing to solve Wafer detection machine when not in use, dust can be occupied on monitor station, needs to clear up monitor station, dust is prevented to be adhered to crystalline substance On circular surfaces, when detecting, the effect of detection will affect, existing detection machine is mostly installation cleaning plant, and when cleaning compares Troublesome problem.
To achieve the above object, the invention provides the following technical scheme: a kind of wafer visual inspection machine, including cleaning fill It sets, the cleaning plant includes fixed station, pedestal, fixed plate, the gentle pump of drifting dust gun body, and the upper surface of the fixed station opens up It is equipped with fixed chute, the bottom end of the fixed plate is provided with fixed fixture block, and the fixed plate and fixed station, which pass through, to be connected together, institute The top for stating fixed plate is provided with movable plate, and the inside of the movable plate offers fixing groove, the side setting of the fixing groove There is drifting dust gun body, the side of the drifting dust gun body is provided with installation fixture block, and the other side setting of the drifting dust gun body There are dust blower pipette tips, the upper surface of the pedestal is provided with air pump, and the air pump is connected with drifting dust gun body by tracheae.
Preferably, it is attached between the fixed station and pedestal by support column, the upper surface setting of the fixed station There is fixed frame.
Preferably, the side of the fixed station is provided with support rod, and the outside of the support rod is provided with sliding sleeve, the cunning The inside of set is provided through stretch rod, and the side of the stretch rod is provided with observation camera lens.
Preferably, the base upper surface middle position is provided with monitor station, and the monitor station and fixed frame are closely to connect Binding structure.
Preferably, the movable plate and fixed plate are attached by bearing, and movable plate can freely revolve in fixed plate Turn.
Compared with prior art, the beneficial effects of the present invention are: the present invention passes through air pump by installation air pump and dust blower The air of compression delivers gas in dust blower, to clear up monitor station, dust blower is by being fixed in activity On plate, dust blower can be unloaded and be cleared up manually, installing and dismounting is more convenient, changes dust blower by rotation movable plate Cleaning direction so that cleaning effect is more preferable.
Detailed description of the invention
Fig. 1 is the structural diagram of the present invention;
Fig. 2 is side structure schematic view of the invention;
Fig. 3 is fixed plate structure schematic diagram of the invention;
Fig. 4 is dust blower pipette tips structural schematic diagram of the invention;
Fig. 5 is dust blower pipette tips and fixed plate attachment structure schematic diagram of the invention;
In figure: 1, stretch rod;2, fixed station;3, support column;4, pedestal;5, support rod;6, sliding sleeve;7, camera lens is observed;8, drifting dust Gun body;9, fixed plate;10, fixed frame;11, monitor station;12, dust blower pipette tips;13, fixed chute;14, air pump;15, movable Plate;16, fixing groove;17, fixed fixture block;18, fixture block is installed.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other Embodiment shall fall within the protection scope of the present invention.
Embodiment 1
Fig. 1 to Fig. 5 is please referred to, the present invention provides a kind of technical solution: a kind of wafer visual inspection machine, including cleaning plant, clearly Reason device includes fixed station 2, pedestal 4, fixed plate 9, drifting dust gun body 8 and air pump 14, and the upper surface of fixed station 2 is installed with solid Determine sliding slot 13, by being welded with fixed fixture block 17, fixed plate 9 and fixed station 2, which pass through, to be connected together for the bottom end of fixed plate 9, The top of fixed plate 9 is connected with movable plate 15 by shaft, and the inside of movable plate 15 offers fixing groove 16, and the one of fixing groove 16 Side is by the drifting dust gun body 8 that is connected together, and the side of drifting dust gun body 8 is by being welded and fixed installation fixture block 18, and dust blower sheet The other side of body 8 is connected with dust blower pipette tips 12 by shaft, and the upper surface of pedestal 4 has been bolted air pump 14, air pump 14 are connected with drifting dust gun body 8 by tracheae.
In order to which wafer is fixed, in the present embodiment, it is preferred that between fixed station 2 and pedestal 4 by support column 3 into There is fixed frame 10 in the upper surface of row connection, fixed station 2 by being connected together.
It is detected for convenience, in the present embodiment, it is preferred that the side of fixed station 2 has been bolted support rod 5, there is sliding sleeve 6 in the outside of support rod 5 by being connected together, and the inside of sliding sleeve 6 is provided through stretch rod 1, the side of stretch rod 1 It has been bolted observation camera lens 7.
In order to keep detection effect more preferable, in the present embodiment, it is preferred that 4 upper surface middle position of pedestal is bolted There is monitor station 11, monitor station 11 and fixed frame 10 are tight connecting device.
Direction is cleared up in order to can control drifting dust gun body 8, in the present embodiment, it is preferred that movable plate 15 and fixed plate 9 are logical It crosses bearing to be attached, movable plate 15 can rotate freely in fixed plate 9.
Embodiment 2
Fig. 1 to Fig. 5 is please referred to, the present invention provides a kind of technical solution: a kind of wafer visual inspection machine, including cleaning plant, clearly Reason device includes fixed station 2, pedestal 4, fixed plate 9, drifting dust gun body 8 and air pump 14, and the upper surface of fixed station 2 is installed with solid Determine sliding slot 13, by being welded with fixed fixture block 17, fixed plate 9 and fixed station 2, which pass through, to be connected together for the bottom end of fixed plate 9, The top of fixed plate 9 is connected with movable plate 15 by shaft, and the inside of movable plate 15 offers fixing groove 16, and the one of fixing groove 16 Side is by the drifting dust gun body 8 that is connected together, and the side of drifting dust gun body 8 is by being welded and fixed installation fixture block 18, and dust blower sheet The other side of body 8 is connected with dust blower pipette tips 12 by shaft, and the upper surface of pedestal 4 is by being welded with air pump 14, air pump 14 are connected with drifting dust gun body 8 by tracheae.
In order to which wafer is fixed, in the present embodiment, it is preferred that between fixed station 2 and pedestal 4 by support column 3 into There is fixed frame 10 in the upper surface of row connection, fixed station 2 by being connected together.
It is detected for convenience, in the present embodiment, it is preferred that the side of fixed station 2 is by being welded with support rod 5, there is sliding sleeve 6 in the outside of support rod 5 by being connected together, and the inside of sliding sleeve 6 is provided through stretch rod 1, the side of stretch rod 1 By being welded with observation camera lens 7.
In order to keep detection effect more preferable, in the present embodiment, it is preferred that 4 upper surface middle position of pedestal is by being welded and fixed There is monitor station 11, monitor station 11 and fixed frame 10 are tight connecting device.
Direction is cleared up in order to can control drifting dust gun body 8, in the present embodiment, it is preferred that movable plate 15 and fixed plate 9 are logical It crosses bearing to be attached, movable plate 15 can rotate freely in fixed plate 9.
14 model FKY8006 of air pump in the present invention.
The working principle of the invention and process for using: after device installation, before being detected to wafer, first to monitor station 11 surface is cleared up, prevent dust on monitor station 11 influence can wafer detection effect, when cleaning, open air pump 14, gas Pump 14 does not stop compressed air by electric power, air pressure is generated, to gas is transported in drifting dust gun body 8 by tracheae, drifting dust Gun body 8 and movable plate 15 are by being connected together, and movable plate 15 is connected with fixed plate 9 by bearing, can be lived by rotation Movable plate 15 changes the direction of the drifting dust of drifting dust gun body 8, and fixed plate 9 horizontal can be slided in fixed station 2, can basis The position of cleaning is adjusted the position of fixed plate 9, while drifting dust gun body 8 can also be unloaded, and is taken by hand to detection Platform 11 is cleared up, and is operated very convenient.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with A variety of variations, modification, replacement can be carried out to these embodiments without departing from the principles and spirit of the present invention by understanding And modification, the scope of the present invention is defined by the appended.

Claims (5)

1. a kind of wafer visual inspection machine, including cleaning plant, it is characterised in that: the cleaning plant includes fixed station (2), bottom Seat (4), fixed plate (9), drifting dust gun body (8) and air pump (14), the upper surface of the fixed station (2) are installed with fixed chute (13), the bottom end of the fixed plate (9) is provided with fixed fixture block (17), and the fixed plate (9) and fixed station (2) are connected by engaging It connecing, the top of the fixed plate (9) is provided with movable plate (15), and the inside of the movable plate (15) offers fixing groove (16), The side of the fixing groove (16) is provided with drifting dust gun body (8), and the side of the drifting dust gun body (8) is provided with installation fixture block (18), and the other side of the drifting dust gun body (8) is provided with dust blower pipette tips (12), the upper surface setting of the pedestal (4) Have air pump (14), the air pump (14) is connected with drifting dust gun body (8) by tracheae.
2. a kind of wafer visual inspection machine according to claim 1, it is characterised in that: the fixed station (2) and pedestal (4) Between be attached by support column (3), the upper surface of the fixed station (2) is provided with fixed frame (10).
3. a kind of wafer visual inspection machine according to claim 2, it is characterised in that: the side of the fixed station (2) is set It is equipped with support rod (5), the outside of the support rod (5) is provided with sliding sleeve (6), and the inside of the sliding sleeve (6) is provided through drawing Boom (1), the side of the stretch rod (1) are provided with observation camera lens (7).
4. a kind of wafer visual inspection machine according to claim 2, it is characterised in that: among pedestal (4) upper surface Position is provided with monitor station (11), and the monitor station (11) and fixed frame (10) are tight connecting device.
5. a kind of wafer visual inspection machine according to claim 1, it is characterised in that: the movable plate (15) and fixed plate (9) it is attached by bearing, movable plate (15) can rotate freely on fixed plate (9).
CN201810737002.7A 2018-07-06 2018-07-06 A kind of wafer visual inspection machine Pending CN109037092A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810737002.7A CN109037092A (en) 2018-07-06 2018-07-06 A kind of wafer visual inspection machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810737002.7A CN109037092A (en) 2018-07-06 2018-07-06 A kind of wafer visual inspection machine

Publications (1)

Publication Number Publication Date
CN109037092A true CN109037092A (en) 2018-12-18

Family

ID=64641181

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810737002.7A Pending CN109037092A (en) 2018-07-06 2018-07-06 A kind of wafer visual inspection machine

Country Status (1)

Country Link
CN (1) CN109037092A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110187486A (en) * 2019-05-05 2019-08-30 南宁聚信众信息技术咨询有限公司 It is a kind of to observe clearly heavy duty detergent chip detecting equipment
CN114146959A (en) * 2021-11-16 2022-03-08 江苏卓玉智能科技有限公司 Automatic appearance detection machine of wafer AVI

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110187486A (en) * 2019-05-05 2019-08-30 南宁聚信众信息技术咨询有限公司 It is a kind of to observe clearly heavy duty detergent chip detecting equipment
CN114146959A (en) * 2021-11-16 2022-03-08 江苏卓玉智能科技有限公司 Automatic appearance detection machine of wafer AVI

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WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20181218