CN108950672A - Superconducting tape electrochemical polishing system - Google Patents
Superconducting tape electrochemical polishing system Download PDFInfo
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- CN108950672A CN108950672A CN201810906848.9A CN201810906848A CN108950672A CN 108950672 A CN108950672 A CN 108950672A CN 201810906848 A CN201810906848 A CN 201810906848A CN 108950672 A CN108950672 A CN 108950672A
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- rinsing bowl
- water
- superconducting tape
- rinsing
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a kind of superconducting tape electrochemical polishing systems, including alkali cleaning area, electrobrightening area, passivation region, ultrasonic cleaning area and the water wash zone set gradually；It is equipped with the first rinsing bowl in the alkali cleaning area, the second rinsing bowl is equipped in the electrobrightening area, is equipped with third rinsing bowl in the passivation region；Discharge outlet, the discharge outlet of the second rinsing bowl, the discharge outlet of third rinsing bowl of first rinsing bowl pass through respective drainage pipeline and are connected to circulating water chennel, and the water outlet of the circulating water chennel is connect with the water inlet of the first rinsing bowl, the second rinsing bowl and third rinsing bowl respectively by pipeline；The 4th rinsing bowl is equipped in the water wash zone, the water being passed through in the 4th rinsing bowl is ultrapure water；The discharge outlet of 4th rinsing bowl is connected to collecting tank by pipeline, and the collecting tank connects circulating water chennel by pipeline.Superconducting tape electrochemical polishing system of the invention can reduce the sewage quantity of polishing process generation under the premise of not influencing surface quality of strips.
Description
Technical field
The invention belongs to superconducting tape production technical fields, are related to a kind of superconducting tape electrochemical polishing system, specifically relate to
And a kind of superconducting tape electrochemical polishing system that can reduce quantity of wastewater effluent.
Background technique
The preparation of second-generation high-temperature superconductor, selected substrate band are Hastelloy base band, the backing tape of buying
Material is often influenced by production technology, and surface dirt, greasy dirt are more.Meanwhile it entirely being produced in second-generation high-temperature superconductor
In process flow, the requirement of substrate is stringent, and surface must be extremely smooth, as the location parameter of identification surface quality, surface
Roughness Ra, using atomic force microscope at 5x5 μm2Measurement range in, it is desirable that Ra < 1nm.Therefore, Hastelloy used
Base band first has to be surface-treated.Currently, maximally efficient processing method, that is, use electrochemical polishing process.Electrochemistry is thrown
Light technology is that in specific electrolyte and under appropriate current density, the principle of anodic solution occurs using the microcosmic salient point in metal surface
A kind of technique polished.Electrochemical polishing process process generally has following steps: alkaline degreasing-scouring-washing-electrolysis is thrown
The electrochemical polishing process of light-washing-passivation (cleaning of Strong oxdiative cleaning agent)-washing-ultrasound washing-washing, superconducting tape needs
A large amount of ultrapure water is used to be washed, for how to reduce the sewage generated during polished and cleaned band, meanwhile, not shadow
The quality problems of Hastelloy base band in production are rung, currently, domestic research or blank in this respect.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of superconducting tape electrochemical polishing systems, are not influencing band table
The sewage quantity of polishing process generation can be reduced under the premise of the quality of face.
In order to solve the above-mentioned technical problems, the present invention provides a kind of superconducting tape electrochemical polishing systems, including successively
Alkali cleaning area, electrobrightening area, passivation region, ultrasonic cleaning area and the water wash zone of setting；The first washing is equipped in the alkali cleaning area
Slot is equipped with the second rinsing bowl in the electrobrightening area, is equipped with third rinsing bowl in the passivation region；First rinsing bowl
Discharge outlet, the discharge outlet of the second rinsing bowl, the discharge outlet of third rinsing bowl pass through respective drainage pipeline and are connected to recirculated water
The water outlet of slot, the circulating water chennel passes through the pipeline water inlet with the first rinsing bowl, the second rinsing bowl and third rinsing bowl respectively
Mouth connection；The 4th rinsing bowl is equipped in the water wash zone, the water being passed through in the 4th rinsing bowl is ultrapure water；4th water
The discharge outlet of washing trough is connected to collecting tank by pipeline, and the collecting tank connects circulating water chennel by pipeline.
It further comprise the water outlet connection outfall sewer of the circulating water chennel, institute in a preferred embodiment of the present invention
State the first rinsing bowl, the second rinsing bowl, third rinsing bowl water inlet pass through respective water inlet pipe respectively and the water outlet is total
Pipe connection.
Further comprise that the outfall sewer is equipped with water circulating pump in a preferred embodiment of the present invention, it is each it is described into
Inlet valve is equipped on water branch pipe.
It further comprise that alkaline bath and the 5th washing are additionally provided in the alkali cleaning area in a preferred embodiment of the present invention
Slot, the alkaline bath, the 5th rinsing bowl and the first rinsing bowl are set gradually, and are passed through in the 5th rinsing bowl for rinsing band
Tap water.
It further comprise being additionally provided with electrolytic cell and the 5th water in the electrobrightening area in a preferred embodiment of the present invention
Washing trough, the electrolytic cell, the 6th rinsing bowl and the second rinsing bowl are set gradually, and are passed through in the 6th rinsing bowl and are same as flushed zone
The tap water of material；Polishing fluid is passed through in the electrolytic cell.
In a preferred embodiment of the present invention, further comprise the polishing fluid temperature be 50 DEG C~60 DEG C, polishing electricity
Stream is 70A, and polishing speed is 0.8~1.2m/min.
It further comprise that deactivation slot is additionally provided in the passivation region in a preferred embodiment of the present invention, the deactivation slot
It is set gradually with third rinsing bowl, nitric acid cleaning agent is passed through in the deactivation slot.
It further comprise it further include band traction mechanism in a preferred embodiment of the present invention, the band dragger
Structure includes the first rotating tape guide and the second rotating tape guide, and first rotating tape guide and the second rotating tape guide are separately positioned on the rear end in alkali cleaning area
With the front end of water wash zone, first rotating tape guide and the second rotating tape guide being rotated by power source draw the superconductive tape
Material sequentially enters alkali cleaning area, electrobrightening area, passivation region, ultrasonic cleaning area and water wash zone.
In a preferred embodiment of the present invention, further comprises that the circulating water chennel has water supplement port and discharge outlet, pass through
The water supplement port feeds ultrapure water into circulating water chennel, and the recirculated water in circulating water chennel is discharged by discharge outlet.
It further comprise that ultrasonic cleaner is equipped in the ultrasonic cleaning area in a preferred embodiment of the present invention,
Ultrasonic cleaning solution and supersonic wave cleaning machine are equipped in the ultrasonic cleaner.
Superconducting tape electrochemical polishing system of the invention, can reduce throwing under the premise of not influencing surface quality of strips
The sewage quantity that light technology generates.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of superconducting tape electrochemical polishing system in the preferred embodiment of the present invention；
Fig. 2 is using the strip surface formation state test chart after superconducting tape electrochemical polishing system of the present invention polishing；
Fig. 3 is the strip surface shape appearance figure under metallographic microscope, after polishing treatment；
Fig. 4 is under atomic force microscope, in 5*5um2Range, the test chart of band after polishing.
Wherein: 1- superconducting tape, the first rinsing bowl of 2-, the second rinsing bowl of 4-, 6- third rinsing bowl, 8- circulating water chennel, 10-
4th rinsing bowl, 12- collecting tank, 14- outfall sewer, 16- water inlet pipe, 18- water circulating pump, 20- inlet valve, 22- alkaline bath,
The 5th rinsing bowl of 24-, 26- electrolytic cell, the 6th rinsing bowl of 28-, 30- deactivation slot, the first rotating tape guide of 32-, the second rotating tape guide of 34-,
36- water supplement port, 37- discharge outlet, 38- ultrasonic cleaner.
Specific embodiment
The present invention will be further explained below with reference to the attached drawings and specific examples, so that those skilled in the art can be with
It more fully understands the present invention and can be practiced, but illustrated embodiment is not as a limitation of the invention.
Embodiment
As shown in Figure 1, present embodiment discloses a kind of superconducting tape electrochemical polishing systems, including the alkali cleaning set gradually
Area, electrobrightening area, passivation region, ultrasonic cleaning area and water wash zone；
Alkaline bath 22, the 5th rinsing bowl 24 and the first rinsing bowl 2 are successively arranged in above-mentioned alkali cleaning area；In above-mentioned alkaline bath 22
It is passed through lye, is passed through tap water in above-mentioned 5th rinsing bowl 24.
Electrolytic cell 26, the 6th rinsing bowl 28 and the second rinsing bowl 4 are successively arranged in above-mentioned electrobrightening area；Above-mentioned electrolytic cell
Polishing fluid is passed through in 26, the temperature for controlling polishing fluid is 50~60 DEG C；Tap water is passed through in above-mentioned 6th rinsing bowl 28.
Deactivation slot 30 and third rinsing bowl 6 are successively arranged in above-mentioned passivation region；Nitric acid cleaning agent in above-mentioned deactivation slot 30.
Ultrasonic cleaner 38 is equipped in above-mentioned ultrasonic cleaning area, it is clear to be equipped with ultrasonic wave in above-mentioned ultrasonic cleaner 38
Washing lotion and supersonic wave cleaning machine.
It is equipped with the 4th rinsing bowl 10 in above-mentioned water wash zone, is passed through ultrapure water in above-mentioned 4th rinsing bowl 10.
Above-mentioned alkaline bath 22, the 5th rinsing bowl 24, the first rinsing bowl 2, electrolytic cell 26, the washing of the 6th rinsing bowl 28, second
Slot 4, deactivation slot 30, third rinsing bowl 6, ultrasonic cleaner 38, the 4th rinsing bowl 10 are set gradually.To the super of electrochemical polish
Conduction band material comes into alkaline bath 22, the 5th rinsing bowl 24, the first rinsing bowl 2, electrolytic cell 26, the 6th rinsing bowl 28, the second water
Washing trough 4, deactivation slot 30, third rinsing bowl 6, ultrasonic cleaner 38, the 4th rinsing bowl 10 complete dynamic electrochemical polish, in alkali
The greasy dirt of removal strip surface in washing trough 22, tap water rinses band, recirculated water in the first rinsing bowl 2 in the 5th rinsing bowl 24
Band is cleaned, strip surface is polished based on electrochemical polishing process in electrolytic cell 26, control polishing electric current is 70A, is thrown
Optical speed is 0.8~1.2m/min；Tap water rinses band, recirculated water cleaning tape in the second rinsing bowl 4 in 6th rinsing bowl 28
Material, nitric acid cleaning agent cleans band as Strong oxdiative cleaning agent in deactivation slot 30, and recirculated water cleans band in third rinsing bowl 6,
Band is cleaned based on ultrasonic equipment in ultrasonic cleaner, ultrapure water cleans band in the 4th rinsing bowl 8.
First rinsing bowl 2, the second rinsing bowl 4, the recirculated water in third rinsing bowl 6 clean in the 4th rinsing bowl 10
The water being discharged after band, the specific implementation process is as follows: the draining of the discharge outlet of above-mentioned first rinsing bowl 2, the second rinsing bowl 4
Mouthful, the discharge outlet of third rinsing bowl 6 passes through respective drainage pipeline and is connected to circulating water chennel 8, the water outlet of above-mentioned circulating water chennel 8
Mouth is connect with the water inlet of the first rinsing bowl 2, the second rinsing bowl 4 and third rinsing bowl 6 respectively by pipeline；Above-mentioned 4th washing
The water being passed through in slot 10 is ultrapure water；The discharge outlet of above-mentioned 4th rinsing bowl 10 is connected to collecting tank 12, above-mentioned receipts by pipeline
Collect slot 12 and circulating water chennel 8 is connected by pipeline.
The system for being conventionally used to electrochemical polish superconducting tape, due to structure design it is unreasonable, whole system be used for water
The cleaning solution for washing band all must be ultrapure water, the length of Hastelloy base band generally at 1000 meters or more, electrochemical polish
In the case where 0.8~1.2m/min, the time of foundation belt surface processing at 20 hours or so, terminates speed control for 20 hours
The ultrapure water for washing band will be re-replaced afterwards, and the water after cleaning is as sewage discharge, sewage in this case
Discharge amount it is extremely big, on the one hand cause the polishing cost of enterprise high, on the other hand these sewage will be by processing
It could discharge, cause the pressure of sewage treatment very big.In the present embodiment technical solution, the whole design of optimization system, super
Sound wave cleans and uses ultrapure water in the rinsing bowl of back segment, does not use ultrapure water in the rinsing bowl of ultrasonic cleaning front end, will surpass
The sewage that ultrapure water in the rinsing bowl of sound wave cleaning back segment is reused, and cleaning polishing band outlet is generated is concentrated
It after collection, is recycled for multiple times, the sewage quantity of polishing process generation can be reduced under the premise of not influencing surface quality of strips,
About 500 tons of quantity of wastewater effluent of polished and cleaned band generation can be reduced every year, meanwhile, as shown in Fig. 2, using superconductive tape of the present invention
Strip surface formation state test chart after the polishing of material electrochemical polishing system, under laser on-line checking, Hastelloy after polishing
Base band integral smoothness is preferable.Wherein, lack part at 0~130 meter, 430~440 meters, be laser on-line measuring device system
Caused by software is stagnated.
As shown in figure 3, for the strip surface shape appearance figure under metallographic microscope, after polishing treatment；In metallography microscope
Under mirror, the surface condition of Hastelloy base band two ends sampling observation after polishing, strip surface is without not clean spot.Such as figure
It is under atomic force microscope, in 5*5um shown in 42Range, the test chart of band after polishing；Under atomic force microscope, in 5*5um2
Range, Hastelloy base band surface roughness is less than 1 after polishing, quality requirement of the compound lower road technique to sand belt.Therefore, originally
The superconducting tape electrochemical polishing system of invention can reduce polishing process generation under the premise of not influencing surface quality of strips
Sewage quantity.
Specifically, the water outlet of above-mentioned circulating water chennel 8 connects outfall sewer 14, above-mentioned first rinsing bowl 2, the second rinsing bowl
4, the water inlet of third rinsing bowl 6 passes through respective water inlet pipe 16 respectively and is connected to above-mentioned outfall sewer 14.Above-mentioned water outlet is total
Pipe 14 is equipped with water circulating pump 18, is equipped with inlet valve 20 on each above-mentioned water inlet pipe 16.
It further includes band traction mechanism, and above-mentioned band traction mechanism includes the first rotating tape guide 32 and the second rotating tape guide 34,
Above-mentioned first rotating tape guide 32 and the second rotating tape guide 34 are separately positioned on the rear end in alkali cleaning area and the front end of water wash zone, and above-mentioned first leads
Belt wheel 32 and the second being rotated by power source of rotating tape guide 34 draw above-mentioned superconducting tape and sequentially enter alkali cleaning area, electrolysis
Polishing area, passivation region, ultrasonic cleaning area and water wash zone.
Above-mentioned circulating water chennel 8 has water supplement port 36 and discharge outlet 37, is fed by above-mentioned water supplement port 36 into circulating water chennel 8
The recirculated water in circulating water chennel 8 is discharged by discharge outlet 37 for ultrapure water.
Embodiment described above is only to absolutely prove preferred embodiment that is of the invention and being lifted, protection model of the invention
It encloses without being limited thereto.Those skilled in the art's made equivalent substitute or transformation on the basis of the present invention, in the present invention
Protection scope within.Protection scope of the present invention is subject to claims.
Claims (10)
1. a kind of superconducting tape electrochemical polishing system, it is characterised in that: including set gradually alkali cleaning area, electrobrightening area,
Passivation region, ultrasonic cleaning area and water wash zone；The first rinsing bowl is equipped in the alkali cleaning area, equipped with the in the electrobrightening area
Two rinsing bowls, the passivation region is interior to be equipped with third rinsing bowl；The draining of the discharge outlet, the second rinsing bowl of first rinsing bowl
Mouthful, the discharge outlet of third rinsing bowl passes through respective drainage pipeline and is connected to circulating water chennel, the water outlet of the circulating water chennel
It is connect respectively with the water inlet of the first rinsing bowl, the second rinsing bowl and third rinsing bowl by pipeline；It is equipped in the water wash zone
4th rinsing bowl, the water being passed through in the 4th rinsing bowl are ultrapure water；The discharge outlet of 4th rinsing bowl is connected by pipeline
It is connected to collecting tank, the collecting tank connects circulating water chennel by pipeline.
2. superconducting tape electrochemical polishing system as described in claim 1, it is characterised in that: the water outlet of the circulating water chennel
Connect outfall sewer, first rinsing bowl, the second rinsing bowl, third rinsing bowl water inlet pass through respective water inlet respectively and prop up
Pipe is connected to the outfall sewer.
3. superconducting tape electrochemical polishing system as claimed in claim 2, it is characterised in that: the outfall sewer is equipped with and follows
Ring water pump is equipped with inlet valve on each water inlet pipe.
4. superconducting tape electrochemical polishing system as described in claim 1, it is characterised in that: be additionally provided with alkali in the alkali cleaning area
Washing trough and the 5th rinsing bowl, the alkaline bath, the 5th rinsing bowl and the first rinsing bowl are set gradually, and are led in the 5th rinsing bowl
Enter the tap water for rinsing band.
5. superconducting tape electrochemical polishing system as described in claim 1, it is characterised in that: also set in the electrobrightening area
There are electrolytic cell and the 6th rinsing bowl, the electrolytic cell, the 6th rinsing bowl and the second rinsing bowl are set gradually, the 6th rinsing bowl
Inside it is passed through the tap water for being same as rinsing band；Polishing fluid is passed through in the electrolytic cell.
6. superconducting tape electrochemical polishing system as claimed in claim 5, it is characterised in that: the temperature of the polishing fluid is 50
DEG C~60 DEG C, polishing electric current is 70A, and polishing speed is 0.8~1.2m/min.
7. superconducting tape electrochemical polishing system as described in claim 1, it is characterised in that: be additionally provided in the passivation region blunt
Change slot, the deactivation slot and third rinsing bowl are set gradually, and nitric acid cleaning agent is passed through in the deactivation slot.
8. such as the described in any item superconducting tape electrochemical polishing systems of claim 1-7, it is characterised in that: it further includes band
Traction mechanism, the band traction mechanism include the first rotating tape guide and the second rotating tape guide, first rotating tape guide and the second conduction band
The front end of the rear end and water wash zone that are separately positioned on alkali cleaning area, first rotating tape guide and the second rotating tape guide are taken turns in the drive of power source
Dynamic lower rotation, draws the superconducting tape and sequentially enters alkali cleaning area, electrobrightening area, passivation region, ultrasonic cleaning area and washing
Area.
9. superconducting tape electrochemical polishing system as described in claim 1, it is characterised in that: the circulating water chennel has moisturizing
Mouthful and discharge outlet, ultrapure water is fed into circulating water chennel by the water supplement port, by discharge outlet by the circulation in circulating water chennel
Water discharge.
10. superconducting tape electrochemical polishing system as described in claim 1, it is characterised in that: in the ultrasonic cleaning area
Equipped with ultrasonic cleaner, ultrasonic cleaning solution and supersonic wave cleaning machine are equipped in the ultrasonic cleaner.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810906848.9A CN108950672B (en) | 2018-08-10 | 2018-08-10 | Superconducting tape electrochemical polishing system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810906848.9A CN108950672B (en) | 2018-08-10 | 2018-08-10 | Superconducting tape electrochemical polishing system |
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| Publication Number | Publication Date |
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| CN108950672A true CN108950672A (en) | 2018-12-07 |
| CN108950672B CN108950672B (en) | 2019-09-10 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201810906848.9A Active CN108950672B (en) | 2018-08-10 | 2018-08-10 | Superconducting tape electrochemical polishing system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114318488A (en) * | 2021-12-30 | 2022-04-12 | 武汉奥绿新生物科技股份有限公司 | Metal surface treatment equipment and method for increasing corrosion resistance of metal surface |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103374743A (en) * | 2012-04-26 | 2013-10-30 | 富葵精密组件(深圳)有限公司 | Electroplating system and waste water treatment method |
| CN104419957A (en) * | 2013-09-04 | 2015-03-18 | 天津市大港镀锌厂 | Nickel electroplating assembly line pretreatment device |
| CN106702469A (en) * | 2015-08-07 | 2017-05-24 | 大全集团有限公司成套分公司 | Two-end tin-plating automatic production line |
-
2018
- 2018-08-10 CN CN201810906848.9A patent/CN108950672B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103374743A (en) * | 2012-04-26 | 2013-10-30 | 富葵精密组件(深圳)有限公司 | Electroplating system and waste water treatment method |
| CN104419957A (en) * | 2013-09-04 | 2015-03-18 | 天津市大港镀锌厂 | Nickel electroplating assembly line pretreatment device |
| CN106702469A (en) * | 2015-08-07 | 2017-05-24 | 大全集团有限公司成套分公司 | Two-end tin-plating automatic production line |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114318488A (en) * | 2021-12-30 | 2022-04-12 | 武汉奥绿新生物科技股份有限公司 | Metal surface treatment equipment and method for increasing corrosion resistance of metal surface |
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| CN108950672B (en) | 2019-09-10 |
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