CN108950618B - Method for obtaining high-purity titanium superhard surface modified layer - Google Patents

Method for obtaining high-purity titanium superhard surface modified layer Download PDF

Info

Publication number
CN108950618B
CN108950618B CN201810913731.3A CN201810913731A CN108950618B CN 108950618 B CN108950618 B CN 108950618B CN 201810913731 A CN201810913731 A CN 201810913731A CN 108950618 B CN108950618 B CN 108950618B
Authority
CN
China
Prior art keywords
workpiece
purity titanium
brush
plating
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201810913731.3A
Other languages
Chinese (zh)
Other versions
CN108950618A (en
Inventor
柴林江
王婷婷
陈可
夏吉莺
吴昊
刘成龙
黄伟九
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sun Fengling
Original Assignee
Chongqing University of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chongqing University of Technology filed Critical Chongqing University of Technology
Priority to CN201810913731.3A priority Critical patent/CN108950618B/en
Publication of CN108950618A publication Critical patent/CN108950618A/en
Application granted granted Critical
Publication of CN108950618B publication Critical patent/CN108950618B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C25D5/06—Brush or pad plating
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F3/00—Changing the physical structure of non-ferrous metals or alloys by special physical methods, e.g. treatment with neutrons
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F17/00—Multi-step processes for surface treatment of metallic material involving at least one process provided for in class C23 and at least one process covered by subclass C21D or C22F or class C25
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

The invention discloses a method for obtaining a high-purity titanium superhard surface modification layer, which comprises the following steps: 1) polishing, cleaning and drying a high-purity titanium workpiece by using sand paper, and brush-plating a 15-35 mu m Cr layer on the surface of the high-purity titanium workpiece by using an electric brush plating method; 2) pulsed laser processing of the workpiece: carrying out laser surface alloying treatment on the high-purity titanium workpiece subjected to room-temperature brush Cr plating, wherein the process parameters are as follows: the laser power is 100-800W, the pulse width is 3-8 ms, the defocusing amount is 2-6 mm, and the scanning speed is 8-25 mm/s; 3) and taking out the workpiece subjected to laser surface alloying treatment, and polishing the surface of the workpiece to be flat. The high-purity titanium treated by the pulse laser surface alloying Cr provided by the invention can greatly refine the microstructure and greatly improve the microhardness and strength, thereby improving the surface performance of the titanium, and the titanium surface alloying Cr has the advantages of convenience in operation, simple equipment, economy, practicality, reliable technology, high efficiency, stable quality and the like.

Description

Method for obtaining high-purity titanium superhard surface modified layer
Technical Field
The invention belongs to the field of laser surface treatment of metal processing, and particularly relates to a method for obtaining a high-purity titanium superhard surface modification layer.
Background
The laser surface modification technology is a product combining a laser technology and metal heat treatment, and is characterized in that extremely high energy is applied to the surface of a material to cause the material to generate physical and chemical changes, so that the surface hardness, the wear resistance, the corrosion resistance and the high-temperature performance of the material are obviously changed. In recent years, laser surface alloying has also received much attention from researchers, which rapidly fuses one or more alloying elements to the surface of a substrate by a high-energy beam laser, thereby changing the chemical composition of the metal and alloy surfaces.
Pure titanium has excellent corrosion resistance, good weldability and manufacturability, and excellent biocompatibility. Therefore, pure titanium is commonly used as a engineering material and widely applied to industries such as power generation, chemistry, spacecraft, biomedicine and the like. However, its strength is relatively low compared to other high-strength titanium alloys, which hinders its further application. With the increasing use of pure titanium in industry, higher requirements are put on the performance of pure titanium materials, including corrosion resistance, biocompatibility, mechanical properties and the like. These properties of pure titanium are closely related to its microstructure (e.g., grain size and second phase particle size, distribution, structure, etc.). A large number of researches show that the obtained uniform, fine and randomly oriented crystal grains have a very key effect on improving the strength of the pure titanium material. In addition, the pure titanium material often shows low tribological performance in service, and rapid surface wear failure occurs, so that the surface modification treatment of the pure titanium material is required.
Disclosure of Invention
The invention provides a method for obtaining a high-purity titanium superhard surface modification layer, which has the advantages of convenient operation, simple equipment, economy, practicality, reliable technology and high efficiency in the strengthening treatment process, so as to achieve the aim of obtaining a Cr-rich superfine/nanocrystalline structure by carrying out surface modification treatment on a high-purity titanium material with a preset Cr layer by adopting pulse laser equipment, and further improving mechanical properties such as microhardness, strength and the like of the surface of the high-purity titanium material.
The technical scheme for realizing the purpose is as follows:
a method for obtaining a high-purity titanium superhard surface modification layer comprises the following steps:
1) preparation of workpiece and brush plating Cr treatment: polishing, brightening, cleaning and drying a high-purity titanium workpiece by using sand paper, brush-plating a 15-35 mu m Cr layer on the surface of the high-purity titanium workpiece by using an electric brush plating method, wherein the technological parameters of electric brush plating Cr treatment are as follows: the brush plating time is 8-12 min, and the brush plating voltage is 8-12V;
2) pulsed laser processing of the workpiece: carrying out laser surface alloying treatment on the high-purity titanium workpiece subjected to room-temperature brush Cr plating by using inert gas as protective gas, wherein the process parameters of the pulse laser surface alloying treatment are as follows: the laser power is 100-800W, the pulse width is 3-8 ms, the defocusing amount is 2-6 mm, and the scanning speed is 8-25 mm/s;
3) and taking out the workpiece subjected to laser surface alloying treatment, and polishing the surface of the workpiece to be flat.
In the step 1), a 15-30 mu m Cr layer is brush-plated on the surface of the workpiece by using a brush plating method, and the technological parameters of the brush plating Cr treatment are as follows: the brush plating time is 10min, and the brush plating voltage is 10V.
The process parameters of the pulse laser surface alloying treatment in the step 2) are as follows: the laser power is 100-500W, the pulse width is 3-6 ms, the defocusing amount is 2-6 mm, and the scanning speed is 8-15 mm/s.
The invention has the beneficial effects that: a modified layer containing Cr with a certain depth is prepared on the surface of a high-purity titanium material by using a pulse laser surface alloying method, and the content of Cr in the modified layer can be effectively controlled by adjusting laser processing parameters and presetting the thickness of a Cr layer. According to the invention, a Cr-rich superfine/nanocrystalline structure is formed on the surface of a high-purity titanium material subjected to surface alloying of Cr by pulse laser, wherein the content of Cr is more than 1 wt.%, the size of a nanometer twin crystal is less than 100nm, the depth of a modified layer reaches more than 1mm, the hardness reaches 450-500 HV, and the pure titanium substrate is improved by more than 3 times. The test result shows that the laser surface alloying Cr treatment method provided by the invention conforms to the property change rule of the high-purity titanium material, and can effectively improve the mechanical properties such as microhardness, strength and the like of the high-purity titanium, so that the depth and the structure of a hardened layer are finer and more uniform. The strengthening treatment process is convenient to operate, simple in equipment, economical, practical, reliable in technology, high in efficiency and stable in quality, and better economic benefits can be realized.
Drawings
FIG. 1 shows the electron micrograph and the composition test results of the brush plating Cr layer on the surface of the high purity titanium in example 1, wherein (a) is an electron micrograph and (b) is the composition test result.
FIG. 2 is the electron micrograph of the ultra-fine crystal nucleus nano-twin crystal of the high purity titanium surface alloying Cr modified layer obtained in example 1.
FIG. 3 shows the hardness test results of the high purity titanium surface alloyed Cr modified layer obtained in example 1.
FIG. 4 is the electron micrograph of the ultra-fine crystal nucleus nano-twin crystal of the high purity titanium surface alloying Cr modified layer obtained in example 2.
FIG. 5 shows the hardness test results of the high purity titanium surface alloyed Cr modified layer obtained in example 2.
Detailed Description
The invention is further illustrated by the following examples, which are not intended to be limiting.
The experimental procedures in the following examples are conventional unless otherwise specified.
Example 1
Selecting a prepared high-purity titanium sample with the thickness of 15 multiplied by 30mm, and firstly sequentially selecting 400#, 800#, 1000#, 1200#, 2000# and 3000# sandpaper to polish the sample to be bright. And cleaning the sample by using absolute ethyl alcohol after polishing, and finally drying the surface of the sample. The sample with the cleaned surface is clamped on a special fixture, and a 24-micron Cr layer is brush-plated on the surface of the sample by a room-temperature brush plating method. The main parameter ranges of the electric brush Cr plating treatment are as follows: the brush plating time is 10min, and the brush plating voltage is 10V. The Cr layer is composed of small node units which are uniformly distributed, the node size is 10-28 μm, the node is composed of Cr particles smaller than 100nm, and the Cr layer is continuously and uniformly distributed on the surface of the sample, and an electron micrograph thereof is shown in FIG. 1 (a).
And clamping the sample subjected to surface cleaning treatment on a special fixture, placing the sample on a working station of a working chamber of pulse laser equipment, and filling argon with the purity of 99.9% into the working chamber to serve as protective gas. Starting the pulse laser device, applying a voltage, toThe surface of the high-purity titanium material is subjected to pulse laser surface alloying Cr treatment. The main parameter ranges of the pulse laser surface alloying treatment are as follows: laser power of 100W and energy density of 12.5J/mm2Pulse width 5ms, defocus 2mm, and scanning speed 8 mm/s.
The electron microscopic and component test results of the brush plating Cr layer on the surface of the high-purity titanium are shown in figure 1, and it can be seen from the figure that no alloying effect is generated on the Ti substrate in the process of brush plating Cr; tests show that the high-purity titanium surface treated by the surface alloying treatment method forms a Cr-rich superfine/nanocrystalline structure modified layer, wherein the content of Cr is more than 1 wt%, and the depth of the modified layer reaches more than 1 mm; the electron microscopic result of the superfine crystal nucleus nano-twin crystal is shown in figure 2, and the size of the nano-twin crystal is less than 100 nm; the hardness test results are shown in FIG. 3, the hardness is as high as 450-500 HV (the hardness of pure titanium matrix is about 120 HV), which is improved by more than 3 times than that of the matrix.
Example 2
Selecting a prepared high-purity titanium sample with the thickness of 15 multiplied by 30mm, and firstly sequentially selecting 400#, 800#, 1000#, 1200#, 2000# and 3000# sandpaper to polish the sample to be bright. And cleaning the sample by using absolute ethyl alcohol after polishing, and finally drying the surface of the sample. The sample with the cleaned surface is clamped on a special fixture, and a Cr layer with the thickness of 15 mu m is brush-plated on the surface of the sample by utilizing a room-temperature brush plating method. The main parameter ranges of the electric brush Cr plating treatment are as follows: the brush plating time is 8min, and the brush plating voltage is 8V. And clamping the sample subjected to surface cleaning treatment on a special fixture, placing the sample on a working station of a working chamber of pulse laser equipment, and filling argon with the purity of 99.9% into the working chamber to serve as protective gas. And starting pulse laser equipment, loading voltage, and carrying out pulse laser surface alloying Cr treatment on the surface of the high-purity titanium material. The main parameter ranges of the pulse laser surface alloying treatment are as follows: laser power 200W, energy density 20J/mm2Pulse width 3ms, defocus 4mm, and scanning speed 10 mm/s.
Tests show that the high-purity titanium surface treated by the surface alloying treatment method forms a Cr-rich superfine/nanocrystalline structure modified layer, wherein the content of Cr is more than 1 wt%, and the depth of the modified layer reaches more than 1 mm; the electron microscopic result of the superfine crystal nucleus nano-twin crystal is shown in figure 4, and the size of the nano-twin crystal is less than 100 nm; the hardness test result is shown in FIG. 5, the hardness is as high as 450-500 HV, which is more than 3 times higher than that of the substrate.
Example 3
Selecting a prepared high-purity titanium sample with the thickness of 15 multiplied by 30mm, and firstly sequentially selecting 400#, 800#, 1000#, 1200#, 2000# and 3000# sandpaper to polish the sample to be bright. And cleaning the sample by using absolute ethyl alcohol after polishing, and finally drying the surface of the sample. The sample with the cleaned surface is clamped on a special fixture, and a 30-micron Cr layer is brush-plated on the surface of the sample by a room-temperature brush plating method. The main parameter ranges of the electric brush Cr plating treatment are as follows: the brush plating time is 12min, and the brush plating voltage is 12V. And clamping the sample subjected to surface cleaning treatment on a special fixture, placing the sample on a working station of a working chamber of pulse laser equipment, and filling argon with the purity of 99.9% into the working chamber to serve as protective gas. And starting pulse laser equipment, loading voltage, and carrying out pulse laser surface alloying Cr treatment on the surface of the high-purity titanium material. The main parameter ranges of the pulse laser surface alloying treatment are as follows: laser power 500W, energy density 25J/mm2Pulse width 6ms, defocus 4mm, and scanning speed 20 mm/s.
Tests show that the high-purity titanium surface treated by the surface alloying treatment method forms a Cr-rich superfine/nano-crystal structure modified layer, wherein the Cr content is more than 1 wt%, the nano twin crystal size is less than 100nm, the depth of the modified layer is more than 1mm, the hardness is as high as 450-500 HV, and the Cr-rich superfine/nano-crystal structure modified layer is improved by more than 3 times compared with a matrix.
Example 4
Selecting a prepared high-purity titanium sample with the thickness of 15 multiplied by 30mm, and firstly sequentially selecting 400#, 800#, 1000#, 1200#, 2000# and 3000# sandpaper to polish the sample to be bright. And cleaning the sample by using absolute ethyl alcohol after polishing, and finally drying the surface of the sample. The sample with the cleaned surface is clamped on a special fixture, and a 35-micron Cr layer is brush-plated on the surface of the sample by a room-temperature brush plating method. The main parameter ranges of the electric brush Cr plating treatment are as follows: the brush plating time is 12min, and the brush plating voltage is 12V. Clamping the sample with the surface cleaned on a special fixture, placing the fixture on a working station of a working chamber of pulse laser equipment, and filling the working chamber with a purity of 99.9% argon was used as the shielding gas. And starting pulse laser equipment, loading voltage, and carrying out pulse laser surface alloying Cr treatment on the surface of the high-purity titanium material. The main parameter ranges of the pulse laser surface alloying treatment are as follows: laser power 800W, energy density 32J/mm2Pulse width 8ms, defocus 6mm, and scanning speed 25 mm/s.
Tests show that the high-purity titanium surface treated by the surface alloying treatment method forms a Cr-rich superfine/nano-crystal structure modified layer, wherein the Cr content is more than 1 wt%, the nano twin crystal size is less than 100nm, the depth of the modified layer is more than 1mm, the hardness is as high as 450-500 HV, and the Cr-rich superfine/nano-crystal structure modified layer is improved by more than 3 times compared with a matrix.

Claims (2)

1. A method for obtaining a high-purity titanium superhard surface modification layer is characterized by comprising the following steps:
1) preparation of workpiece and brush plating Cr treatment: polishing, brightening, cleaning and drying a high-purity titanium workpiece by using sand paper, brush-plating a 15-35 mu m Cr layer on the surface of the high-purity titanium workpiece by using an electric brush plating method, wherein the technological parameters of electric brush plating Cr treatment are as follows: the brush plating time is 8-12 min, and the brush plating voltage is 8-12V;
2) pulsed laser processing of the workpiece: carrying out laser surface alloying treatment on the high-purity titanium workpiece subjected to room-temperature brush Cr plating by using inert gas as protective gas, wherein the process parameters of the pulse laser surface alloying treatment are as follows: the laser power is 100-500W, the pulse width is 3-6 ms, the defocusing amount is 2-6 mm, and the scanning speed is 8-15 mm/s;
3) and taking out the workpiece subjected to laser surface alloying treatment, and polishing the surface of the workpiece to be flat.
2. The method of obtaining a high purity titanium superhard surface modification layer of claim 1, wherein: in the step 1), a 15-30 mu m Cr layer is brush-plated on the surface of the workpiece by using a brush plating method, and the technological parameters of the brush plating Cr treatment are as follows: the brush plating time is 10min, and the brush plating voltage is 10V.
CN201810913731.3A 2018-08-13 2018-08-13 Method for obtaining high-purity titanium superhard surface modified layer Active CN108950618B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810913731.3A CN108950618B (en) 2018-08-13 2018-08-13 Method for obtaining high-purity titanium superhard surface modified layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810913731.3A CN108950618B (en) 2018-08-13 2018-08-13 Method for obtaining high-purity titanium superhard surface modified layer

Publications (2)

Publication Number Publication Date
CN108950618A CN108950618A (en) 2018-12-07
CN108950618B true CN108950618B (en) 2020-01-14

Family

ID=64469523

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810913731.3A Active CN108950618B (en) 2018-08-13 2018-08-13 Method for obtaining high-purity titanium superhard surface modified layer

Country Status (1)

Country Link
CN (1) CN108950618B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110344052A (en) * 2019-07-30 2019-10-18 重庆理工大学 A method of superhard Ti10CoCrNiFeNbx high entropy alloy coating is prepared on high purity titanium surface

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4738756A (en) * 1987-07-28 1988-04-19 The Boeing Company Method of brush chrome plating using tank chrome plating solutions
CN101280439A (en) * 2008-01-09 2008-10-08 西安理工大学 Bright brush plating nano-chromium solution and preparation thereof
CN104454661A (en) * 2013-09-16 2015-03-25 上海伟阳纸业有限公司 Low-noise centrifugal fan
CN105648516A (en) * 2016-01-18 2016-06-08 重庆理工大学 Method for obtaining ultra-hard surface modification layers of zirconium alloy
CN105714225A (en) * 2016-04-25 2016-06-29 重庆理工大学 Method for obtaining high-density nanometer two crystals in zirconium materials for nuclear power
CN105951021A (en) * 2016-07-06 2016-09-21 重庆理工大学 Method for obtaining double-peak batten structure from zirconium alloy
CN106282868A (en) * 2016-09-09 2017-01-04 重庆理工大学 The method that high/low temperature mixes non-equilibrium microstructure mutually is obtained in zircaloy
CN107313086A (en) * 2017-06-26 2017-11-03 重庆理工大学 A kind of composite-making process of Ultra-fine Grained/nanocrystalline Cr coatings

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4738756A (en) * 1987-07-28 1988-04-19 The Boeing Company Method of brush chrome plating using tank chrome plating solutions
CN101280439A (en) * 2008-01-09 2008-10-08 西安理工大学 Bright brush plating nano-chromium solution and preparation thereof
CN104454661A (en) * 2013-09-16 2015-03-25 上海伟阳纸业有限公司 Low-noise centrifugal fan
CN105648516A (en) * 2016-01-18 2016-06-08 重庆理工大学 Method for obtaining ultra-hard surface modification layers of zirconium alloy
CN105714225A (en) * 2016-04-25 2016-06-29 重庆理工大学 Method for obtaining high-density nanometer two crystals in zirconium materials for nuclear power
CN105951021A (en) * 2016-07-06 2016-09-21 重庆理工大学 Method for obtaining double-peak batten structure from zirconium alloy
CN106282868A (en) * 2016-09-09 2017-01-04 重庆理工大学 The method that high/low temperature mixes non-equilibrium microstructure mutually is obtained in zircaloy
CN107313086A (en) * 2017-06-26 2017-11-03 重庆理工大学 A kind of composite-making process of Ultra-fine Grained/nanocrystalline Cr coatings

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Microstructural Modification of Brush-plated Nanocrystalline Cr by High Current Pulsed Electron Beam Irradiation;Jianjun Hu et al;《Journal of Nano Research》;20160504;第41卷;第87-98页 *
钛表面激光强化及其摩擦学性能研究;郭纯;《万方学位论文》;20121231;第27-37页 *

Also Published As

Publication number Publication date
CN108950618A (en) 2018-12-07

Similar Documents

Publication Publication Date Title
Mao et al. Characteristics and removal mechanism in laser cutting of cBN–WC–10Co composites
Peng et al. Hard and wear-resistant titanium nitride films for ceramic cutting tools by pulsed high energy density plasma
Beri et al. Surface quality modification using powder metallurgy processed CuW electrode during electric discharge machining of Inconel 718
Kumari et al. Ceramic-metal composite coating on steel using a powder compact tool electrode by the electro-discharge coating process
Kumar et al. Investigating surface properties of cryogenically treated titanium alloys in powder mixed electric discharge machining
Tijo et al. Hard and wear resistance TiC-composite coating on AISI 1020 steel using powder metallurgy tool by electro-discharge coating process
CN108950618B (en) Method for obtaining high-purity titanium superhard surface modified layer
Ageeva et al. X-ray spectral analysis of sintered products made of electroerosive materials obtained from X17 alloy waste in lighting kerosene
RU2418074C1 (en) Procedure for strengthening items out of metal materials for production of nano structured surface layers
Muttamara Comparison performances of EDM on Ti6Al4V with two graphite grades
Verbitchi et al. Electro-spark coating with special materials
CN104775118A (en) Laser cladding powder presetting method
Bhattacharya et al. Surface modification of high carbon high chromium, EN31 and hot die steel using powder mixed EDM process
CN111172532B (en) Method for preparing medium-entropy alloy coating on surface of pure titanium plate
CN114086176A (en) Electric spark deposition preparation method of self-lubricating coating containing tantalum oxide
Pyachin et al. Formation of intermetallic coatings by electrospark deposition of titanium and aluminum on a steel substrate
Zhang et al. Effects of graphite particle size on microstructure and properties of in-situ Ti-V carbides reinforced Fe-based laser cladding layers
Samotugin et al. The influence of plasma surface modification process on the structure and phase composition of cutting-tool hardmetals
CN111607755A (en) Method for plasma cladding titanium alloy coating
CN106400010A (en) Metal surface mechanically-assisted electric heat alloying preparation method
CN102644075A (en) Preparation process for electrospark surface strengthening on excellent surface quality of titanium alloy TC4
Das et al. Surface alloying of titanium di-boride (TiB2) and silicon carbide (SiC) on aluminium al 5052 using electric discharge processing
Ivanov et al. Effect of electron-beam treatment on the structure and properties of (B+ Cr) film deposited on a high-entropy alloy AlCrFeCoNi
Krastev et al. Surface modification of steels by electrical discharge treatment in electrolyte
Suresh et al. Study of the influence of electron beam irradiation on the microstructural and mechanical characteristics of titanium-coated Al-Si alloy

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20220908

Address after: Room 205, Building 4, Hubin Century Garden, Moling Street, Jiangning District, Nanjing City, Jiangsu Province, 211100

Patentee after: Sun Fengling

Address before: No. 69, Hongguang Avenue, Jiulongpo District, Chongqing 400054

Patentee before: Chongqing University of Technology