CN108935515A - Ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent and the preparation method and application thereof - Google Patents
Ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent and the preparation method and application thereof Download PDFInfo
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- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
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Abstract
The present invention provides a kind of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent, is made of the raw material components of following concentration: ethephon (CEPHA),2-(chloroethyl) phosphonic acid mass percent concentration 1~2.5%, 50~100mg/L of concentration of proline, 10~15mg/L of manganese sulfate concentration, 10~15g/L of 8~12mg/L of beet alkali concentration and sucrose concentration；Ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent provided by the invention has good cold-resistant effect simultaneously to dendrobium candidum, and the preparation method of the cold-resistance agent is simple and effective, is not required to add any industrial chemicals, it is without causing harm to be applied to dendrobium candidum.
Description
Technical field
The present invention relates to cold-resistance agent and preparation method thereof and application method more particularly to a kind of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent and its systems
Preparation Method and application method.
Background technique
Dendrobium candidum is the traditional rare traditional Chinese medicine in China, has reinforcing stomach reg fluid, nourishing Yin and clearing heat, and immunological regulation delays to decline
It waits for a long time effect.Low temperature inhibits surviving and growing for dendrobium candidum seedling, is the principal element for influencing its existence and distribution.In the Changjiang river
Delta Area dendrobium candidum winter is difficult to survive in outdoor cropping, is the conserving culture in greenhouse.The item once greenhouse heats
Part shortcoming, dendrobium candidum just easily receive injury from low temperature.The effective way for alleviating low temperature stress is found, is current officinal dendrobium stem plantation
One of urgent problem to be solved in production.Research in terms of dendrobium candidum is more, focuses mostly in tissue culture, cultivation, medicinal etc.
Aspect；The report for improving dendrobium candidum winter resistance for addition ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent is very few.This research sprays ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent
Dendrobium candidum seedling after low temperature stress, can inquire into ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent alleviate the injury from low temperature of dendrobium candidum, mention
Its high winter resistance, to be promoted and applied on a large scale for dendrobium candidum in China and outdoor overwintering cultivation provides reference frame.
Summary of the invention
Goal of the invention: the first object of the present invention is to provide a kind of ethylene for effectively improving plant survival rate and growth quality
Sharp cold-resistance agent；The second object of the present invention is to provide the preparation method of the cold-resistance agent；It is anti-that the third object of the present invention is to provide this
The application of cold agent.
Technical solution: the present invention provides a kind of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent, is made of the raw material components of following concentration: ethephon (CEPHA),2-(chloroethyl) phosphonic acid matter
Amount percent concentration 1~2.5%, 50~100mg/L of concentration of proline, 10~15mg/L of manganese sulfate concentration, beet alkali concentration 8~
10~15g/L of 12mg/L and sucrose concentration.
Preferably, the ethephon (CEPHA),2-(chloroethyl) phosphonic acid mass percent concentration is 1~1.5%.
The preparation method of above-mentioned ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent includes the following steps: the water by the ethanol solution of proline and sucrose
Solution is mixed, and auxiliary material solution is made；The water aqueous solution of glycine betaine and manganese sulfate is mixed with auxiliary material solution, is stirred
Mixing is at first mixed object；Object will just be mixed to mix with ethephon (CEPHA),2-(chloroethyl) phosphonic acid aqueous solution, the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistant agent solution is made in stirring.
Preferably, the PRIMARY STIRRING temperature is 25~30 DEG C, and mixing time is 2~3 hours；
Further, the secondary whipping temp is 28~35 DEG C, and mixing time is 3~5 hours.
Application method of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent in dendrobium candidum cold-resistant includes the following steps: the iron sheet second
Alkene benefit cold-resistance agent applies, and is placed in culture, shading in greenhouse and simultaneously maintains constant temperature and humidity, the mass percent of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent
Concentration is 1.0~2.5%.
Further, the mass percent concentration of above-mentioned ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent is 1.0~1.5%.
Application method of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent in dendrobium candidum cold-resistant: the shading is artificial shade, controls light transmittance
It is 60~80%.
Preferably, the constant temperature is control temperature at 15~20 DEG C.
Further, the constant humidity is that watering in every 3~5 days is primary, keeps humidity 60~80%.
Ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent provided by the invention has good cold-resistant effect, ethephon (CEPHA),2-(chloroethyl) phosphonic acid quality percentage to dendrobium candidum
When specific concentration 1~2.5%, 50~100mg/L of concentration of proline, manganese sulfate 10~15mg/L of concentration, it can achieve to iron sheet
The good cold-resistant effect of dendrobium nobile；Especially, when ethephon (CEPHA),2-(chloroethyl) phosphonic acid mass percent concentration 1~1.5%, concentration of proline 50~
When 100mg/L, manganese sulfate 10~15mg/L of concentration, ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent of the present invention is the most excellent to the cold-resistant effect of dendrobium candidum
It is different.Meanwhile the preparation method of the cold-resistance agent is simple and effective, is not required to add any industrial chemicals, being applied to dendrobium candidum will not be right
It is damaged.Especially, application when using 1~1.5% dosage, cold-resistant effect is best, and will not damage to vegetation.
Specific embodiment
It is described further below for technical solution of the present invention.
The invention will be further described below.Following embodiment is only used for clearly illustrating technical side of the invention
Case, and not intended to limit the protection scope of the present invention.
Embodiment 1
The preparation and use of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent
It weighs proline 100mg to be dissolved in a small amount of 95% ethyl alcohol, distilled water 50ml is added after being completely dissolved；Weigh the sugarcane of 20g
Sugar is dissolved in 200ml distilled water, is stirred well to and is completely dissolved；Both the above solution is mixed, is stirred 2 hours at 20-25 DEG C
Auxiliary material solution is made to uniform proportion.It weighs 16mg glycine betaine and 20mg manganese sulfate is dissolved in 150 distilled water, be sufficiently stirred
To being completely dissolved；This mixed liquor is poured into auxiliary material solution, 500ml is settled to distilled water, is sufficiently stirred 2 at 28 DEG C
Just mixed object is made in hour to uniform proportion.Ethephon (CEPHA),2-(chloroethyl) phosphonic acid uses 40% ethephon agent, and 40% ethylene is measured with graduated cylinder
Sharp 25ml is settled to 500ml with distilled water.The 500ml of first mixed object is mixed with the 500ml of prepared ethephon solution, 25
It is sufficiently stirred at DEG C 2 hours and Exogenous Silicon cold-resistant agent solution is made to uniform proportion.
Ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent 1.0% obtained sprays dendrobium candidum blade face, sprays to blade and moistens completely, set
In cultivating in greenhouse, shading and to control light transmittance be 60% controls temperature at 15 DEG C, watering in every 3 days is primary, and humidity is kept to exist
60%, it is 80% by the dendrobium candidum survival rate of application dendrobium candidum cold-resistance agent.
Embodiment 2
The preparation and use of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent
It weighs proline 200mg to be dissolved in a small amount of 95% ethyl alcohol, distilled water 50ml is added after being completely dissolved；Weigh the sugarcane of 30g
Sugar is dissolved in 200ml distilled water, is stirred well to and is completely dissolved；Both the above solution is mixed, 4 hours are stirred at 25 DEG C extremely
Uniformly auxiliary material solution is made in proportion.It weighs 24mg glycine betaine and 30mg manganese sulfate is dissolved in 150 distilled water, be stirred well to
It is completely dissolved；This mixed liquor is poured into auxiliary material solution, is settled to 500ml with distilled water, it is small to be sufficiently stirred 4 at 35 DEG C
Just mixed object is made up to uniform proportion.Ethephon (CEPHA),2-(chloroethyl) phosphonic acid uses 40% ethephon agent, and 40% ethephon (CEPHA),2-(chloroethyl) phosphonic acid is measured with graduated cylinder
62.5ml is settled to 500ml with distilled water.The 500ml of first mixed object is mixed with the 500ml of prepared ethephon solution, 30
It is sufficiently stirred at DEG C 3 hours and Exogenous Silicon cold-resistant agent solution is made to uniform proportion.
Ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent 2.5% obtained sprays dendrobium candidum blade face, sprays to blade and moistens completely, set
In cultivating in greenhouse, shading and to control light transmittance be 80% controls temperature at 20 DEG C, watering in every 5 days is primary, and humidity is kept to exist
80%, it is 85% by the dendrobium candidum survival rate of application dendrobium candidum cold-resistance agent.
Embodiment 3
The preparation and use of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent
It weighs proline 150mg to be dissolved in a small amount of 95% ethyl alcohol, distilled water 50ml is added after being completely dissolved；Weigh the sugarcane of 25g
Sugar is dissolved in 200ml distilled water, is stirred well to and is completely dissolved；Both the above solution is mixed, 3 hours are stirred at 23 DEG C to equal
Auxiliary material solution is made in even proportion.It weighs 20mg glycine betaine and 25mg manganese sulfate is dissolved in 150 distilled water, be stirred well to
Fully dissolved；This mixed liquor is poured into auxiliary material solution, 500ml is settled to distilled water, is sufficiently stirred at 30 DEG C 3 hours
Just mixed object is made to uniform proportion.Ethephon (CEPHA),2-(chloroethyl) phosphonic acid uses 40% ethephon agent, and 40% ethephon (CEPHA),2-(chloroethyl) phosphonic acid is measured with graduated cylinder
50ml is settled to 500ml with distilled water.The 500ml of first mixed object is mixed with the 500ml of prepared ethephon solution, 27 DEG C
Under be sufficiently stirred 2.5 hours Exogenous Silicon cold-resistant agent solution be made to uniform proportion.
Ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent 1.5% obtained sprays dendrobium candidum blade face, sprays to blade and moistens completely, set
In cultivating in greenhouse, shading and to control light transmittance be 70% controls temperature at 18 DEG C, watering in every 4 days is primary, and humidity is kept to exist
70%, it is 87.5% by the dendrobium candidum survival rate of application dendrobium candidum cold-resistance agent.
Embodiment 4
The mass percent concentration of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent primary raw material component selects
It is respectively 1.0,1.5,2.5% that ethephon (CEPHA),2-(chloroethyl) phosphonic acid mass percent concentration, which is arranged,；Concentration of proline is respectively 50,100,
150mg/L；Manganese sulfate concentration is respectively 10,15,20mg/L；Other preparation with apply condition and method with 3 phase of embodiment
Together, as table 1 designs orthogonal test.
Influence of the 1 primary raw material component various concentration of table to ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent performance
As known from Table 1, ethephon (CEPHA),2-(chloroethyl) phosphonic acid mass percent concentration 1~2.5%, concentration of proline 50 in ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent~
When 100 mg/L, manganese sulfate 10~15mg/L of concentration, the good cold-resistant effect to dendrobium candidum can achieve；Especially,
As ethephon (CEPHA),2-(chloroethyl) phosphonic acid mass percent concentration 1~1.5%, 50~100mg/L of concentration of proline, manganese sulfate 10~15mg/L of concentration,
Ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent of the present invention is the most excellent to the cold-resistant effect of dendrobium candidum.
Embodiment 5
The application conditions and effect of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent
The preparation of material to be tested
Using the candidum tissue culturing seedling of bottle outlet cultivation 1 year as material to be tested, material to be tested is cultivated in Jiangsu agricultural occupation skill
In the garden art institute Nong Bo.Time is in December, 2017 to 2 months 2018, and outdoor minimum temperature is -6~6 DEG C during this period, most
High-temperature is 7~14 DEG C.Test uses potting mode, and by growing way, consistent, no disease and pests harm dendrobium candidum seedling is from greenhouse cultivation
It digs out, is transplanted into equipped in dendrobium candidum dedicated substrate plastic tub alms bowl, 6 plants of every basin on bed.It is placed in greenhouse and normally cultivates 15d,
The processing of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent is carried out after being placed in outdoor low temperature stress 10d.Ethephon (CEPHA),2-(chloroethyl) phosphonic acid uses the Zhejiang east Long You arna Sa Ke
Crop Science and Technology Ltd. production 40% ethephon agent handled, be arranged only spray water blank control group, 1% group,
1.5% group, 2.5% group, 3% group, 5% group of 6 mass percent concentration group.Each processing carries out 5 repetitions, 1 repetition 5
Basin, each processing have 25 basins, and every basin handle with the cold-resistant solution of identical mass percent concentration primary.Ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistant
Agent is applied in the form of foliage spray, spray to blade it is completely wet subject to, be placed on renewal cultivation in greenhouse.It is warm in greenhouse
Degree be maintained at 15~20 DEG C, using the method manually shaded, be used cooperatively with sunshade net, daily control light transmittance be 60~
80%.Watering in every 3~5 days is primary.
The statistics of plant survival condition
Dendrobium candidum routine observation vegetation growth state during renewal cultivation in greenhouse, counts each processing after one month
Dendrobium candidum n plant survival rate.Survival rate (%)=100/ plant total strain number of survival plant number *
The measurement of chlorophyll content
Measurement of the measuring method referring to the chloroplast pigment content in " plant physiology and biochemistry experimental principle and technology ".Acquisition
The leaf of falling 1-3 is cleaned, is shredded, and is weighed 0.1g or so and is placed in test tube, and 95% ethyl alcohol 20ml is added, is sealed with preservative film, dark is put
It sets to take out afterwards for 24 hours and shake up.Using 95% ethyl alcohol as blank, light absorption value is measured at wavelength 665nm and 649nm.Calculation formula: Ye Lv
Plain concentration=6.63A665+18.08A649；A665 refers to chlorophyll a maximum absorption band wavelength value in 95% ethyl alcohol；A649
Refer to chlorophyll b maximum absorption band wavelength value in 95% ethyl alcohol；Chlorophyll content (g/gFW)=C*V*/M*1000.C
For chlorophyll concentration (mg/L)；V is extracting liquid volume (ml)；M is sample quality (g)；1000 be to indicate 1L=1000ml.
The measurement of mda content
Survey of the measuring method referring to mda content in the plant tissue in " plant physiology and biochemistry experimental principle and technology "
It is fixed.The fresh and tender stem for acquiring 1-2cm long at the top of plant, cleans, shreds, and weighs 0.25g or so, 5%TCA 5ml is added, after grinding
Gained homogenate is centrifuged 10min at 3000r/min, and supernatant is sample extracting solution, measures its volume (V).Take supernatant 2ml
(V1) in test tube, add 0.67%TBA 2ml, boil 30min after mixing on boiling water bath, be centrifuged primary, supernatant after cooling again
Liquid is prepare liquid (its volume is denoted as V2).Measure light absorption value of the prepare liquid at 450nm, 532nm and 600nm.Calculation formula: C
(μm ol/L)=6.45* (A532-A600) -0.56*A450；450nm that wherein A450, A532, A600 are respectively represented,
Absorbance value under 532nm and 600nm wavelength.Sample MDA content (μm ol/gFW)=C*V2*V/M*V1*1000.C be to
Survey the concentration (μm ol/L) of MDA in liquid；V is extracting solution total volume (ml)；V1 is the sample extracting solution volume being added in prepare liquid
(ml)；V2 is prepare liquid total volume.
Test result and analysis
Influence of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent to dendrobium candidum survival rate under low temperature stress such as table 2 shows.
Table 2 sprays influence of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent to dendrobium candidum survival rate under low temperature stress
As known from Table 2, dendrobium candidum sprays ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent after low temperature stress, and survival rate is compared with the control
Variation.Wherein, under 3% and 5% ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent mass percent concentration, dendrobium candidum survival rate with compare relative different not
Significantly, extremely low.Under 2.5% ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent mass percent concentration, the survival rate of dendrobium candidum be significantly higher than control,
3% and 5% group.Under 1% and 1.5% ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent mass percent concentration, dendrobium candidum survival rate is high, extremely significant height
In control, 3% and 5% group.For dendrobium candidum after low temperature stress, plant can be made by spraying certain density ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent
Survival rate significantly improves, but the concentration of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent is not that the higher the better, is advisable with 1-2.5%.Wherein, and with 1~
1.5% is optimum range.Survival rate reflects the winter resistance of dendrobium candidum plant to a certain extent, and survival rate is higher to be illustrated to plant
Object winter resistance is better.
Influence of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent to dendrobium candidum chlorophyll content under low temperature stress is as shown in table 3.
Table 3 sprays influence of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent to dendrobium candidum chlorophyll content under low temperature stress
| Number | Chlorophyll content (g/gFW) |
| Blank control | 0.6262 |
| 1% | 1.7697 |
| 1.5% | 1.4832 |
| 2.5% | 0.9465 |
| 3% | 0.6980 |
| 5% | 0.6252 |
From table 3 it can be seen that the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent of different quality percent concentration is to dendrobium candidum leaf under low temperature stress
The general morphologictrend of chlorophyll contents is the increase with concentration, and chlorophyll content is on a declining curve.In 5 processing, 3% He
Under 5% ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent concentration, dendrobium candidum chlorophyll content with to compare relative different not significant, it is extremely low.2.5% ethylene
Under sharp cold-resistance agent concentration, the chlorophyll content of dendrobium candidum is significantly higher than control, 3% and 5% group.1% and 1.5% ethephon (CEPHA),2-(chloroethyl) phosphonic acid is anti-
Under cold agent concentration, dendrobium candidum chlorophyll content is high, extremely significant to be higher than control, 3% and 5% group.
For dendrobium candidum after low temperature stress, chlorophyll content of plant can be made by spraying certain density ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent
It significantly improves, but the concentration of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent is not that the higher the better, is advisable with 1~2.5%.Wherein, and with 1~1.5%
For optimum range.Chlorophyll content reflects the photosynthesis characteristics and upgrowth situation of dendrobium candidum to a certain extent, and chlorophyll contains
Amount is higher, and its growth of explanation is better, its more all right bright winter resistance of growth is higher.
Influence of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent to dendrobium candidum mda content under low temperature stress is as shown in table 4
Table 4 sprays influence of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent to dendrobium candidum mda content under low temperature stress
From table 4, it can be seen that the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent of different quality percent concentration is to dendrobium candidum third under low temperature stress
The general morphologictrend of dialdehyde content is as the increase of mass percent concentration is in rising trend.In 5 processing, 3% He
Under 5% ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent concentration, dendrobium candidum mda content with to compare relative different not significant, it is high.2.5% ethylene
Under sharp cold-resistance agent concentration, the mda content of dendrobium candidum is substantially less than control, 3% and 5% group.1% and 1.5% ethephon (CEPHA),2-(chloroethyl) phosphonic acid is anti-
Under cold agent concentration, dendrobium candidum mda content is high, extremely significant lower than control, 3% and 5% group.
For dendrobium candidum after low temperature stress, the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent for spraying certain mass percent concentration can make plant
Mda content significantly reduces, but the concentration of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent is not that the higher the better, is advisable with 1~2.5%.Wherein, again
It is optimum range with 1~1.5%.Plant organ tends to occur peroxidation of membrane lipids under the conditions of Chilling stress, and malonaldehyde is
One of its product usually utilizes it as Lipid peroxidation index, indicates that cell membrane lipid extent of peroxidation and plant are inverse to low temperature
The power of border conditioned response, content height are inversely proportional with plant cold resistance power.Mda content is lower, shows plant cold resistance
Property is stronger.
Three survival rate, chlorophyll content and mda content indexs are comprehensively considered, it can be said that dendrobium candidum passes through low temperature
After stress, the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent for spraying 1~2.5% mass percent concentration can significantly improve the winter resistance of dendrobium candidum,
It wherein, and with 1~1.5% is optimum range.
Claims (10)
1. a kind of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent, which is characterized in that be made of the raw material components of following concentration: ethephon (CEPHA),2-(chloroethyl) phosphonic acid mass percent is dense
Degree 1~2.5%, 50~100mg/L of concentration of proline, 10~15mg/L of manganese sulfate concentration, 8~12mg/L of beet alkali concentration and sugarcane
Sugared 10~15g/L of concentration.
2. ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent according to claim 1, it is characterised in that: the ethephon (CEPHA),2-(chloroethyl) phosphonic acid mass percent concentration is 1
~1.5%.
3. the preparation method of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent as claimed in claim 1 or 2, which comprises the steps of: by dried meat ammonia
The ethanol solution of acid and the aqueous solution of sucrose are mixed, and auxiliary material solution is made；By the aqueous solution of glycine betaine and manganese sulfate
It is mixed with auxiliary material solution, just mixed object is made in stirring；Object will just be mixed to mix with ethephon (CEPHA),2-(chloroethyl) phosphonic acid aqueous solution, the ethylene is made in stirring
Sharp cold-resistant agent solution.
4. the preparation method of Exogenous Silicon cold-resistance agent according to claim 3, it is characterised in that: the PRIMARY STIRRING temperature is 25
~30 DEG C, mixing time is 2~3 hours.
5. the preparation method of Exogenous Silicon cold-resistance agent according to claim 3, it is characterised in that: the secondary whipping temp is 28
~35 DEG C, mixing time is 3~5 hours.
6. application method of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent as claimed in claim 1 or 2 in dendrobium candidum cold-resistant, which is characterized in that packet
It includes following steps: the iron sheet ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent is applied, be placed in culture in greenhouse, shading simultaneously maintains constant temperature and humidity, described
The mass percent concentration of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent is 1.0~2.5%.
7. application method of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent in dendrobium candidum cold-resistant according to claim 6, it is characterised in that: described
The mass percent concentration of ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent is 1.0~1.5%.
8. application method of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent in dendrobium candidum cold-resistant according to claim 6, it is characterised in that: described
Shading is artificial shade, and control light transmittance is 60~80%.
9. application method of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent in dendrobium candidum cold-resistant according to claim 6, it is characterised in that: described
Constant temperature is control temperature at 15~20 DEG C.
10. application method of the ethephon (CEPHA),2-(chloroethyl) phosphonic acid cold-resistance agent in dendrobium candidum cold-resistant according to claim 6, it is characterised in that: institute
Stating constant humidity is that watering in every 3~5 days is primary, keeps humidity 60~80%.
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