CN108897158A - A kind of liquid crystal flat-panel structure and liquid crystal flat-panel processing method - Google Patents
A kind of liquid crystal flat-panel structure and liquid crystal flat-panel processing method Download PDFInfo
- Publication number
- CN108897158A CN108897158A CN201810991480.0A CN201810991480A CN108897158A CN 108897158 A CN108897158 A CN 108897158A CN 201810991480 A CN201810991480 A CN 201810991480A CN 108897158 A CN108897158 A CN 108897158A
- Authority
- CN
- China
- Prior art keywords
- liquid crystal
- crystal flat
- panel
- layer
- glass body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3482—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising silicon, hydrogenated silicon or a silicide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
Abstract
The present invention provides a kind of liquid crystal flat-panel processing method of liquid crystal flat-panel technical field, and the procedure of processing of the liquid crystal flat-panel processing method is：Base glass is cut into multiple pieces of glass ontology according to being sized, edge grind processing is carried out to every piece of glass body edge using edge polisher respectively；By glass body batch investment LCD cleaning machine, wave glass body batch is cleaned；Glass body is taken out from LCD cleaning machine, is put into vacuum coating equipment, and vacuum coating equipment carries out coating film treatment to glass body surface by magnetron sputtering membrane process, to plate multiple groups optical thin film on glass body surface, completes liquid crystal flat-panel processing.Liquid crystal flat-panel processing method of the present invention, step is simple, liquid crystal flat-panel overall performance can be effectively improved, so that the light transmittance of liquid crystal flat-panel, hardness performance index General Promotion, liquid crystal flat-panel processing efficiency is effectively improved simultaneously, complicated filming equipment is no longer needed, manufacturing cost is reduced, promotes product yield.
Description
Technical field
The invention belongs to liquid crystal flat-panel (liquid crystal display) technical fields, are to be related to a kind of liquid crystal flat-panel more specifically
Processing method.
Background technique
With the improvement of living standards, people are higher and higher to the appearance and performance requirement of electronic product, and existing electricity
Sub- product, in the prior art, liquid crystal flat-panel impact resistant capability are poor, the contact of some hard objects such as nail, pen tip, or use cloth to wipe with examination all
It is possible that scratching liquid crystal screen surfaces, the trace that can not be wiped all the life is left.There is also the excessively high problems of reflectivity simultaneously.And existing skill
Superhard multilayer AR film in art mainly passes through Batch filming equipment HSP-160 and carries out plated film, and such equipment processing efficiency is very
Low, at high cost, and use IN-LINE filming equipment, efficiency is very high, at low cost, but IN-LINE plated film plating multi-player super-hard film have with
Lower problem：1, the gas circuit design of multilayer optical film successive sedimentation is the plant issue being difficult；2, multilayer optical film continuously sinks
Long-pending sputtering target material arrangement is the plant issue being difficult；3, the membrane uniformity control of multilayer optical film large-area coating film is very
Difficult technological problems；4, the Film Design of multilayer optical film and film thickness monitoring, material selection is the technological problems being difficult, can not
Meet demand.
Summary of the invention
The technical problem to be solved by the present invention is to：In view of the deficiencies of the prior art, it is simple to provide a kind of step, Neng Gouyou
Effect improves liquid crystal flat-panel overall performance, so that the light transmittance of liquid crystal flat-panel, hardness performance index General Promotion, effectively improve simultaneously
Liquid crystal flat-panel processing efficiency, it is no longer necessary to which complicated filming equipment reduces manufacturing cost, and the liquid crystal flat-panel for promoting product yield adds
Work method.
Solve the problems, such as techniques discussed above, the technical scheme adopted by the invention is as follows：
The present invention is a kind of liquid crystal flat-panel processing method, and liquid crystal flat-panel includes glass body, the setting plating of glass body surface
The procedure of processing of film layer, the liquid crystal flat-panel processing method is：1) base glass is cut into muti-piece glass according to being sized
Glass ontology carries out edge grind processing to every piece of glass body edge using edge polisher, so that glass body edge Cheng Yuan respectively
Arc structure；2) by glass body batch investment LCD cleaning machine, LCD cleaning machine cleans wave glass body batch；3) from LCD
Glass body is taken out in cleaning machine, is put into vacuum coating equipment, and vacuum coating equipment is by magnetron sputtering membrane process to glass
Glass body surface carries out coating film treatment, to plate multiple groups optical thin film on glass body surface, completes liquid crystal flat-panel processing.
When the LCD cleaning machine cleans wave glass body batch, the cleaning solution in LCD cleaning machine uses low natron
Cleaning agent, when LCD cleaning machine cleans wave glass body batch, the temperature of cleaning solution is controlled between 35 DEG C of -45 DEG C of ranges.
When the vacuum coating equipment carries out coating film treatment to glass body surface by magnetron sputtering membrane process, glass
Glass ontology controls between 40min-60min range in the time for carrying out coating film treatment in vacuum coating equipment, after coating film treatment
The four layers of optical thin film formed.
It is right after the vacuum coating equipment carries out coating film treatment to glass body surface by magnetron sputtering membrane process
The liquid crystal flat-panel of formation carries out visual examination in environment purification；
The single-side multi-layer AR light transmittance of the liquid crystal flat-panel is set as >=94%；The wavelength band control of liquid crystal flat-panel exists
Between 400nm-700nm；The hardness of liquid crystal flat-panel is set as >=9H.
The invention further relates to a kind of structure is simple, liquid crystal flat-panel overall performance can be effectively improved, so that liquid crystal flat-panel
Light transmittance, hardness performance index General Promotion, while effectively improving liquid crystal flat-panel processing efficiency, it is no longer necessary to complicated plated film is set
It is standby, reduce the liquid crystal flat-panel structure of cost.
The liquid crystal flat-panel structure includes multiple groups optical thin film, and the optical thin film of multiple groups optical thin film includes Si3N4 layers
I, SiO2 layer I, Si3N4 layer II, SiO2 layer II, multiple groups optical thin film is followed successively by the Si3N4 positioned at first layer from outside to inside
Layer I, the SiO2 layer I positioned at the second layer, the Si3N4 layer II positioned at third layer, positioned at the 4th layer of SiO2 layer II, multiple groups are optically thin
The overall thickness size Control of film is between 220nm-250nm range.
The multiple groups optical thin film be located at the Si3N4 layer I of first layer thickness control 30nm-35nm range it
Between, the thickness positioned at the SiO2 layer I of the second layer controls between 30nm-35nm range, positioned at the Si3N4 layer II of third layer
Thickness control between 60nm-70nm range, positioned at the 4th layer of SiO2 layer II thickness control in 100nm-
Between 110nm range.
Using technical solution of the present invention, beneficial effect below can be obtained：
Liquid crystal flat-panel processing method of the present invention, can be on the basis of base glass, and efficient high texture processes
When can effectively solve the problem that the IN-LINE filming equipment processing liquid crystal flat-panel proposed in background technique there are the problem of liquid crystal it is flat
Plate, and liquid crystal flat-panel processing efficiency is improved comprehensively, cost is greatly reduced, and make the light transmission of liquid crystal flat-panel processed
Rate, hardness performance index General Promotion, effectively improve product competitiveness in the market.Liquid crystal flat-panel processing method of the present invention,
Step is simple, can effectively improve liquid crystal flat-panel overall performance, so that the light transmittance of liquid crystal flat-panel, hardness performance index mention comprehensively
It rises, while effectively improving liquid crystal flat-panel processing efficiency, it is no longer necessary to which complicated filming equipment reduces manufacturing cost, promotes product
Yield.
Detailed description of the invention
Brief description is made to content expressed by each attached drawing of this specification and the label in figure below：
Fig. 1 is the liquid crystal flat-panel (superhard AR) of processing method of the present invention production and the glass for not carrying out coating film treatment
Ontology (element glass) penetrates rate score contrast schematic diagram；
Fig. 2 is the schematic cross-sectional view of liquid crystal flat-panel structure of the present invention；
Attached drawing acceptance of the bid, which is remembered, is respectively：1, Si3N4 layer I；2, SiO2 layer I；3, Si3N4 layer II；4, multiple groups optical thin film；5,
Si3N4 layer II.
Specific embodiment
Below against attached drawing, by the description of the embodiment, to for example related each structure of a specific embodiment of the invention
The works such as the shape of part, construction, the mutual alignment between each section and connection relationship, the effect of each section and working principle are further
Detailed description：
As shown in Fig. 1, the present invention is a kind of liquid crystal flat-panel processing method, and liquid crystal flat-panel includes glass body, glass sheet
Film plating layer is arranged in body surface face, and the procedure of processing of the liquid crystal flat-panel processing method is：1) by base glass according to being sized
It is cut into multiple pieces of glass ontology, edge grind processing is carried out to every piece of glass body edge using edge polisher respectively, so that glass
Body edges are at convex structure；2) glass body batch is put into LCD (Liquid Crystal Display) cleaning machine,
LCD cleaning machine cleans wave glass body batch；3) glass body is taken out from LCD cleaning machine, is put into vacuum coating equipment,
Vacuum coating equipment carries out coating film treatment to glass body surface by magnetron sputtering membrane process, thus on glass body surface
Multiple groups optical thin film is plated, liquid crystal flat-panel processing is completed.Above-mentioned steps, can be on the basis of base glass, and processing can
Effectively solve the problems, such as the liquid crystal flat-panel existed when the IN-LINE filming equipment proposed in background technique processes liquid crystal flat-panel, and
And liquid crystal flat-panel processing efficiency is improved comprehensively, cost is greatly reduced, and make the light transmittance, hard of the liquid crystal flat-panel processed
Performance indicator General Promotion is spent, product competitiveness in the market is effectively improved.Liquid crystal flat-panel processing method of the present invention, step letter
It is single, liquid crystal flat-panel overall performance can be effectively improved, so that the light transmittance of liquid crystal flat-panel, hardness performance index General Promotion, together
When effectively improve liquid crystal flat-panel processing efficiency, it is no longer necessary to complicated filming equipment, reduce manufacturing cost, promoted product yield.
When the LCD cleaning machine cleans wave glass body batch, the cleaning solution in LCD cleaning machine uses low natron
Cleaning agent, when LCD cleaning machine cleans wave glass body batch, the temperature of cleaning solution is controlled between 35 DEG C of -45 DEG C of ranges.On
The selection of cleaning solution and the selection of cleaning solution temperature are stated, can realize the batch cleaning to glass body within a short period of time, from
And cleaning speed is effectively improved, meet production equipment production line rhythm.
When the vacuum coating equipment carries out coating film treatment to glass body surface by magnetron sputtering membrane process, glass
Glass ontology controls between 40min-60min range in the time for carrying out coating film treatment in vacuum coating equipment, after coating film treatment
The 4 layers of optical thin film formed.
It is right after the vacuum coating equipment carries out coating film treatment to glass body surface by magnetron sputtering membrane process
The liquid crystal flat-panel of formation carries out visual examination in environment purification；
Single-side multi-layer AR (AR film, anti-reflection film) light transmittance of the liquid crystal flat-panel is set as >=94%；Liquid crystal flat-panel
Wavelength band controls between 400nm-700nm；The hardness of liquid crystal flat-panel is set as >=9H.
The invention further relates to a kind of structure is simple, liquid crystal flat-panel overall performance can be effectively improved, so that liquid crystal flat-panel
Light transmittance, hardness performance index General Promotion, while effectively improving liquid crystal flat-panel processing efficiency, it is no longer necessary to complicated plated film is set
It is standby, reduce the liquid crystal flat-panel structure of cost.
The liquid crystal flat-panel structure includes multiple groups optical thin film, and the optical thin film of multiple groups optical thin film 4 includes Si3N4
(silicon nitride) layer I 1, SiO2 (silica) layer I 2, Si3N4 layer 3, SiO2 layer 5, multiple groups optical thin film 4 from outside to inside according to
It is secondary for the Si3N4 layer I 1 positioned at first layer, the SiO2 layer I 2 positioned at the second layer, positioned at the Si3N4 layer 3 of third layer, positioned at the 4th
The SiO2 layer 5 of layer, the overall thickness size Control of multiple groups optical thin film 4 is between 220nm-250nm range.
The thickness that the multiple groups optical thin film 4 is located at the Si3N4 layer I 1 of first layer is controlled in 30nm-35nm range
Between, the thickness positioned at the SiO2 layer I 2 of the second layer controls between 30nm-35nm range, positioned at the Si3N4 of third layer
The thickness of layer II 3 controls between 60nm-70nm range, and the thickness control positioned at the 4th layer of SiO25 layer II exists
Between 100nm-110nm range.
Liquid crystal flat-panel processing method of the present invention, can be on the basis of base glass, and efficient high texture processes
When can effectively solve the problem that the IN-LINE filming equipment processing liquid crystal flat-panel proposed in background technique there are the problem of liquid crystal it is flat
Plate, and liquid crystal flat-panel processing efficiency is improved comprehensively, cost is greatly reduced, and make the light transmission of liquid crystal flat-panel processed
Rate, hardness performance index General Promotion, effectively improve product competitiveness in the market.Liquid crystal flat-panel processing method of the present invention,
Step is simple, can effectively improve liquid crystal flat-panel overall performance, so that the light transmittance of liquid crystal flat-panel, hardness performance index mention comprehensively
It rises, while effectively improving liquid crystal flat-panel processing efficiency, it is no longer necessary to which complicated filming equipment reduces manufacturing cost, promotes product
Yield.
Above in conjunction with attached drawing, an exemplary description of the invention, it is clear that concrete implementation of the present invention is not by above-mentioned
The limitation of mode, as long as using the various improvement that the inventive concept and technical scheme of the present invention carry out, or not improved by this
The conception and technical scheme of invention directly apply to other occasions, are within the scope of the invention.
Claims (7)
1. a kind of liquid crystal flat-panel processing method, liquid crystal flat-panel includes glass body, and film plating layer, feature is arranged in glass body surface
It is：The procedure of processing of the liquid crystal flat-panel processing method is：1) base glass is cut into muti-piece glass according to being sized
Glass ontology carries out edge grind processing to every piece of glass body edge using edge polisher, so that glass body edge Cheng Yuan respectively
Arc structure；2) by glass body batch investment LCD cleaning machine, LCD cleaning machine cleans wave glass body batch；3) from LCD
Glass body is taken out in cleaning machine, is put into vacuum coating equipment, and vacuum coating equipment is by magnetron sputtering membrane process to glass
Glass body surface carries out coating film treatment, to plate multiple groups optical thin film on glass body surface, completes liquid crystal flat-panel processing.
2. liquid crystal flat-panel processing method according to claim 1, it is characterised in that：The LCD cleaning machine is to wave glass
When ontology batch cleans, the cleaning solution in LCD cleaning machine uses low bubble alkaline cleaner, and LCD cleaning machine is to wave glass body batch
When amount cleaning, the temperature of cleaning solution is controlled between 35 DEG C of -45 DEG C of ranges.
3. liquid crystal flat-panel processing method according to claim 1 or 2, it is characterised in that：The vacuum coating equipment is logical
When crossing magnetron sputtering membrane process to glass body surface progress coating film treatment, glass body is plated in vacuum coating equipment
The time of film process controls between 40min-60min range, the four layers of optical thin film formed after coating film treatment.
4. liquid crystal flat-panel processing method according to claim 1 or 2, it is characterised in that：The vacuum coating equipment is logical
Cross after magnetron sputtering membrane process carries out coating film treatment to glass body surface, to the liquid crystal flat-panel of formation in environment purification into
Row visual examination.
5. liquid crystal flat-panel processing method according to claim 1 or 2, it is characterised in that：The single side of the liquid crystal flat-panel
Multilayer AR light transmittance is set as >=94%；The wavelength band of liquid crystal flat-panel controls between 400nm-700nm；Liquid crystal flat-panel it is hard
Degree is set as >=9H.
6. a kind of liquid crystal flat-panel structure, it is characterised in that：The liquid crystal flat-panel structure includes multiple groups optical thin film, multiple groups optics
The optical thin film of film (4) includes Si3N4 layer I (1), SiO2 layer I (2), Si3N4 layer II (3), SiO2 layer II (5), multiple groups optics
Film (4) is followed successively by the Si3N4 layer I (1) positioned at first layer from outside to inside, the SiO2 layer I (2) positioned at the second layer, is located at
The Si3N4 layer II (3) of third layer, positioned at the 4th layer of SiO2 layer II (5), the overall thickness size Control of multiple groups optical thin film (4)
Between 220nm-250nm range.
7. liquid crystal flat-panel structure according to claim 6, it is characterised in that：The multiple groups optical thin film (4) is located at the
The thickness of one layer of Si3N4 layer I (1) controls between 30nm-35nm range, positioned at the thickness of the SiO2 layer I (2) of the second layer
Size Control is spent between 30nm-35nm range, and the thickness positioned at the Si3N4 layer II (3) of third layer is controlled in 60nm-
Between 70nm range, the thickness positioned at the 4th layer of SiO2 layer II (5) is controlled between 100nm-110nm range.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810991480.0A CN108897158A (en) | 2018-08-29 | 2018-08-29 | A kind of liquid crystal flat-panel structure and liquid crystal flat-panel processing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810991480.0A CN108897158A (en) | 2018-08-29 | 2018-08-29 | A kind of liquid crystal flat-panel structure and liquid crystal flat-panel processing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108897158A true CN108897158A (en) | 2018-11-27 |
Family
ID=64358506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810991480.0A Pending CN108897158A (en) | 2018-08-29 | 2018-08-29 | A kind of liquid crystal flat-panel structure and liquid crystal flat-panel processing method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108897158A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103936298A (en) * | 2014-04-10 | 2014-07-23 | 南通繁华玻璃金属制品有限公司 | Novel method for producing off-line low-emissivity coated glass |
| CN104553126A (en) * | 2014-12-24 | 2015-04-29 | 宜昌南玻显示器件有限公司 | Antireflection glass and preparation method thereof |
| CN106116176A (en) * | 2016-06-24 | 2016-11-16 | 中建材光电装备（太仓）有限公司 | A kind of coral magnetron sputtering low radiation coated glass production technology |
| CN106966608A (en) * | 2017-04-07 | 2017-07-21 | 东莞市银通玻璃有限公司 | A kind of preparation method of high transmission rate low radiation coated glass |
| CN206956143U (en) * | 2017-06-29 | 2018-02-02 | 福建省辉锐电子技术有限公司 | Coated cover-plate prepared by a kind of continuous magnetron sputtering sedimentation |
| CN208621866U (en) * | 2018-08-29 | 2019-03-19 | 芜湖长信科技股份有限公司 | A kind of liquid crystal flat-panel structure |
-
2018
- 2018-08-29 CN CN201810991480.0A patent/CN108897158A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103936298A (en) * | 2014-04-10 | 2014-07-23 | 南通繁华玻璃金属制品有限公司 | Novel method for producing off-line low-emissivity coated glass |
| CN104553126A (en) * | 2014-12-24 | 2015-04-29 | 宜昌南玻显示器件有限公司 | Antireflection glass and preparation method thereof |
| CN106116176A (en) * | 2016-06-24 | 2016-11-16 | 中建材光电装备（太仓）有限公司 | A kind of coral magnetron sputtering low radiation coated glass production technology |
| CN106966608A (en) * | 2017-04-07 | 2017-07-21 | 东莞市银通玻璃有限公司 | A kind of preparation method of high transmission rate low radiation coated glass |
| CN206956143U (en) * | 2017-06-29 | 2018-02-02 | 福建省辉锐电子技术有限公司 | Coated cover-plate prepared by a kind of continuous magnetron sputtering sedimentation |
| CN208621866U (en) * | 2018-08-29 | 2019-03-19 | 芜湖长信科技股份有限公司 | A kind of liquid crystal flat-panel structure |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101954463B1 (en) | Anti-glare glass sheet having compressive stress equipoise and methods thereof | |
| US20150175478A1 (en) | Textured glass surface and methods of making | |
| KR102378656B1 (en) | Substrate having antifouling film | |
| CN111470780A (en) | Preparation method of glass panel, display screen and display device | |
| TW201716349A (en) | Glass sheet with antifouling layer | |
| JP2017019723A (en) | Glass substrate, cover glass for electronic apparatus, and method for producing glass substrate | |
| US10081569B2 (en) | Process for producing glass substrate, and glass substrate | |
| TW201438893A (en) | Glass laminate, optical imaging member, and method of manufacturing the same and glass plate | |
| CN101321443A (en) | Production method of non-conventional glass as outer casing, and its application in electronic product | |
| CN110712399A (en) | Glass laminate, front plate for display, display device, and method for producing glass laminate | |
| US20130122254A1 (en) | Method for manufacturing a patterned layer of compressive stress on a glass substrate and the glass substrate manufacturing by the method | |
| CN110885180A (en) | Processing method of high-strength ultrathin glass | |
| WO2014112297A1 (en) | Transparent substrate | |
| CN116253500A (en) | Glass article | |
| CN103934756B (en) | The processing technology of glare proof glass | |
| CN208621866U (en) | A kind of liquid crystal flat-panel structure | |
| JPH1070294A (en) | Substrate for solar cell and production thereof | |
| TW201514128A (en) | A method of analyzing a sapphire article background of the invention | |
| CN105110655B (en) | A kind of planar arc glass periphery film removing device | |
| CN108897158A (en) | A kind of liquid crystal flat-panel structure and liquid crystal flat-panel processing method | |
| CN105923996A (en) | Glass light guide plate and manufacturing method thereof | |
| CN112062476B (en) | Vertical glass anti-dazzling treatment system and treatment process | |
| CN116282942A (en) | Anti-glare glass, preparation method, application, display device and electronic equipment | |
| CN114538787A (en) | Glass front etching electroplating method | |
| WO2021012144A1 (en) | Anti-reflective glass, and preparation method therefor and application thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |