CN108873605A - A kind of nano-imprint stamp and preparation method thereof - Google Patents
A kind of nano-imprint stamp and preparation method thereof Download PDFInfo
- Publication number
- CN108873605A CN108873605A CN201810737670.XA CN201810737670A CN108873605A CN 108873605 A CN108873605 A CN 108873605A CN 201810737670 A CN201810737670 A CN 201810737670A CN 108873605 A CN108873605 A CN 108873605A
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- groove
- coating zone
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- coating
- basement membrane
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- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000011248 coating agent Substances 0.000 claims abstract description 118
- 238000000576 coating method Methods 0.000 claims abstract description 118
- 239000003292 glue Substances 0.000 claims abstract description 93
- 239000000758 substrate Substances 0.000 claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 claims abstract description 23
- 210000002469 basement membrane Anatomy 0.000 claims description 44
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 238000000034 method Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 241001465805 Nymphalidae Species 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 238000002164 ion-beam lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
The invention discloses a kind of nano-imprint stamps and preparation method thereof, to improve the nano-imprint stamp of the prior art because causing to remove bad problem in the splicing higher segment difference in overlay region.The production method of the nano-imprint stamp, including：Groove is formed in the predeterminable area for coating coining glue one side of substrate film, wherein the predeterminable area is the coining glue of two neighboring coating zone in the region of splicing overlapping；In the first coating zone and groove coating coining glue, wherein be less than the depth of the groove positioned at the thickness of the coining glue of the groove；Imprint patterns are carried out to the coining glue of first coating zone；In the second coating zone and groove coating coining glue, second coating zone and first coating zone are two neighboring coating zone；Imprint patterns are carried out to the coining glue of second coating zone and the groove.
Description
Technical field
The present invention relates to technical field of semiconductors more particularly to a kind of nano-imprint stamp and preparation method thereof.
Background technique
Promotion of the development of semiconductor manufacturing industry dependent on inexpensive micrographics structure transfer techniques, but with graphic feature
The continuous reduction of size, the conventional lithographic techniques based on optical wavelength gradually seem unable to do what one wishes.Nanometer embossing (NIL) is
It is a kind of directly to be squeezed using Mechanical Contact, make to be stamped the method that material redistributes between template and substrate.With tradition
Photoetching technique compare, have the characteristics that high resolution；With high-resolution focused ion beam lithography, electron beam lithography, X-ray
The technologies such as photoetching are compared, it has again, and yield is high, at low cost, the features such as can be mass-produced, thus become the next of most prospect
Dai Guangke technology.
As shown in Figure 1, large-area nano impression block is usually to be spliced by splicing process, using eclipsed form
(overlap) splicing is common joining method, and from tens microns to millimeter etc., this joining method exists Overlap width
Overlay region S00 (area overlap) can generate the splicing segment difference D of several hundred nanometers to micron level.This segment difference can be to subsequent nanometer pressure
It is bad that removing (Peeling) is generated when printing releasing process, the object being stamped naked eyes at Peeling can be appreciated that very big splicing
Seam, as shown in Figure 2, wherein Fig. 2 left figure is to be stamped at substrate splicing seams to generate Peeling along stripping direction after coining demoulds
Undesirable optical microscope photograph, the right figure of Fig. 2 are that macroscopic splicing seams are bad.
Summary of the invention
The present invention provides a kind of nano-imprint stamp and preparation method thereof, with improve the nano-imprint stamp of the prior art because
Cause to remove bad problem in the splicing higher segment difference in overlay region.
The embodiment of the present invention provides a kind of production method of nano-imprint stamp, including：
Groove is formed in the predeterminable area for coating coining glue one side of substrate film, wherein the predeterminable area is to use
In the coining glue of two neighboring coating zone being overlapped so as to imprint the region that splicing connects；
In the first coating zone and groove coating coining glue, wherein positioned at the coining glue of the groove
Thickness is less than the depth of the groove；
Imprint patterns are carried out to the coining glue of first coating zone；
In the second coating zone and groove coating coining glue, second coating zone and first coating area
Domain is the two neighboring coating zone that the substrate film is used to coat coining glue one side；
Imprint patterns are carried out to the coining glue of second coating zone and the groove.
Optionally, the substrate film includes basement membrane and the bottoming film on the basement membrane；It is described in substrate film
Predeterminable area for coating coining glue one side forms groove, including：
The bottoming film is formed on the basement membrane；
Groove is formed in the predeterminable area away from the basement membrane one side of the bottoming film.
Optionally, the predeterminable area away from the basement membrane one side in the bottoming film forms groove, including：Institute
The predeterminable area away from the basement membrane one side for stating bottoming film forms the groove of the exposure basement membrane.
Optionally,
It is described to form the bottoming film on the basement membrane, including：Ultraviolet dry-film resist is formed on the basement membrane；
The predeterminable area away from the basement membrane one side in the bottoming film forms groove, including：It removes described pre-
If the ultraviolet dry-film resist in region.
Optionally, described to form ultraviolet dry-film resist on the basement membrane, including：On the basement membrane formed 2~
10 microns thick of ultraviolet dry-film resist.
Optionally, described to imprint glue in the first coating zone and groove coating, including：The first coating zone with
And the groove coats 1~5 micron thick of coining glue.
Optionally, the predeterminable area for coating coining glue one side in substrate film forms groove, including：In substrate
The predeterminable area for coating coining glue one side of film forms the groove that width in a first direction is 10~1000 microns,
In, the first direction is that the direction of second coating zone is directed toward by first coating zone, or, being applied by described second
Cover the direction that first coating zone is directed toward in region.
The embodiment of the present invention also provides a kind of nano impression made of production method as described in the embodiments of the present invention
Template, the nano-imprint stamp include：
The predeterminable area for coating coining glue one side of substrate film, the substrate film has groove；
Positioned at the patterned coining glue of the first coating zone, the groove and the second coating zone.
Optionally, the substrate film includes basement membrane and the bottoming film on the basement membrane, the back of the bottoming film
Predeterminable area from the basement membrane one side has the groove.
Optionally, the bottoming film is ultraviolet dry-film resist.
The embodiment of the present invention has the beneficial effect that：The production method of nano-imprint stamp provided in an embodiment of the present invention, packet
It includes first in substrate film for coat the splicing overlapping region formation groove of coining glue one side, then in first coating zone and recessed
Coating coining glue in slot, then the coating coining glue in the second coating zone and groove, control the second coating zone and groove
The coated weight of glue is imprinted, and then coining glue may be implemented and spliced in the low segment difference of groove or without segment difference, and avoid pressing
Print glue forms biggish segment difference in splicing overlapping region, and then improves because nano-imprint stamp is in the splicing higher segment difference in overlay region
Cause to remove bad problem.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the nano-imprint stamp of the prior art；
Fig. 2 is the structural schematic diagram of the film layer after nano-imprint stamp imprints of the prior art；
Fig. 3 is a kind of production process schematic diagram of nano-imprint stamp provided in an embodiment of the present invention；
Fig. 4 is in the embodiment of the present invention, and the structural schematic diagram of the nano-imprint stamp of ultraviolet dry-film resist is completed in preparation；
Fig. 5 is in the embodiment of the present invention, and the structural schematic diagram of the nano-imprint stamp of groove is completed in preparation；
Fig. 6 is that the nano-imprint stamp for completing patterning coining glue is prepared in the first coating zone in the embodiment of the present invention
Structural schematic diagram；
Fig. 7 is that the nano-imprint stamp for completing patterning coining glue is prepared in the second coating zone in the embodiment of the present invention
Structural schematic diagram.
Specific embodiment
In order to enable the purposes, technical schemes and advantages of the embodiment of the present disclosure are clearer, below in conjunction with disclosure reality
The technical solution of the embodiment of the present disclosure is clearly and completely described in the attached drawing for applying example.Obviously, described embodiment is
A part of this disclosure embodiment, instead of all the embodiments.Based on described embodiment of the disclosure, this field is common
Technical staff's every other embodiment obtained under the premise of being not necessarily to creative work, belongs to the model of disclosure protection
It encloses.
Unless otherwise defined, the technical term or scientific term that the disclosure uses should be tool in disclosure fields
The ordinary meaning for thering is the personage of general technical ability to be understood." first ", " second " used in the disclosure and similar word are simultaneously
Any sequence, quantity or importance are not indicated, and are used only to distinguish different component parts." comprising " or "comprising" etc.
Similar word means that the element or object before the word occur covers the element or object for appearing in the word presented hereinafter
And its it is equivalent, and it is not excluded for other elements or object.The similar word such as " connection " or " connected " is not limited to physics
Or mechanical connection, but may include electrical connection, it is either direct or indirectly."upper", "lower",
"left", "right" etc. is only used for indicating relative positional relationship, and after the absolute position for being described object changes, then the relative position is closed
System may also correspondingly change.
In order to keep the following explanation of the embodiment of the present disclosure to understand and concise, known function and known portion is omitted in the disclosure
The detailed description of part.
Referring to Fig. 3, the embodiment of the present invention provides a kind of production method of nano-imprint stamp, including：
Step S101, groove is formed in the predeterminable area for coating coining glue one side of substrate film, wherein predeterminable area
For for the coining glue of two neighboring coating zone being overlapped so as to imprint the region that splicing connects.
In the specific implementation, the structure that substrate film can be integrated can exist to substrate film when making groove
Predeterminable area forms groove；Substrate film be also possible to include multiple film layers composite construction, for example, substrate film can specifically include
Basement membrane and the bottoming film on basement membrane, correspondingly, in substrate film for coating the predeterminable area shape of coining glue one side
At groove, can specifically include：Bottoming film is formed on basement membrane；It is formed in the predeterminable area away from basement membrane one side of bottoming film
Groove.
Bottoming film formed groove depth, specifically can according to adjacent coat region coating coining glue thickness,
And glue overflow amount size when coining carries out comprehensive consideration.Specific groove can be the groove of exposed basement membrane, that is, by preset areas
The bottoming film in domain all removes, and the depth of this kind of situation lower groove can be controlled by the thickness to the bottoming film coated in advance
System is realized.
In the specific implementation, bottoming film is specifically as follows ultraviolet photoresists, correspondingly, bottoming film is formed on basement membrane,
Including：Ultraviolet dry-film resist is formed on basement membrane；Groove, packet are formed in the predeterminable area away from basement membrane one side of bottoming film
It includes：Remove the ultraviolet dry-film resist of predeterminable area.When bottoming film is ultraviolet photoresists, the production of groove is realized on substrate film
When, technique production is upper relatively simple, easy to accomplish.
Step S102, in the first coating zone and groove coating coining glue, wherein positioned at the thickness of the coining glue of groove
Less than the depth of groove.So that the thickness of the coining glue positioned at groove is less than the depth of groove, both may be implemented to make adjacent area
Glue is imprinted to splice in groove, when being also possible to prevent the subsequent progress imprint patterns using main mould, overflowing on boundary when due to coining
Glue may result in the situation for occurring segment difference in the position.
Step S103, imprint patterns are carried out to the coining glue of the first coating zone.In the specific implementation, main mould can be passed through
Imprint patterns are carried out to the coining glue of the first coating zone.Pattern pressure is directly carried out after the first coating zone coats coining glue
Print, rather than after each region has been coated with coining glue, then continuous multi-impression is carried out, in this way, can be to avoid due to coining
When excessive glue and the segment difference that occurs.
Step S104, in the second coating zone and groove coating coining glue, the second coating zone and the first coating zone
It is used to coat the two neighboring coating zone of coining glue one side for substrate film.It should be noted that the first coating area of the application
Domain and the second coating zone are the two neighboring coating zone in nano-imprint stamp, and simultaneously not only limit nano-imprint stamp only
There are two coating zones, that is, nano-imprint stamp not only refers to be formed by imprinting twice, but can be spelled by multi-impression
It connects to be formed.
Step S105, imprint patterns are carried out to the coining glue of the second coating zone and groove.
The production method of nano-imprint stamp provided in an embodiment of the present invention, including elder generation in substrate film for coating coining
The splicing overlapping region of glue one side forms groove, then the coating coining glue in the first coating zone and groove, then applies second
Coating coining glue in region and groove is covered, controls the coated weight of the second coating zone and groove coining glue, and then can be real
Now coining glue is spliced in the low segment difference of groove or without segment difference, and it is larger to avoid coining glue from being formed in splicing overlapping region
Segment difference, and then improve because nano-imprint stamp splicing the higher segment difference in overlay region cause to remove bad problem.
Optionally, ultraviolet dry-film resist is formed on basement membrane, including：2~10 microns of thick purples are formed on basement membrane
Outer dry-film resist.
Optionally, in the first coating zone and groove coating coining glue, including：It is applied in the first coating zone and groove
Cover 1~5 micron thick of coining glue.
Optionally, groove is formed in the predeterminable area for coating coining glue one side of substrate film, including：In substrate film
Predeterminable area for coating coining glue one side forms the groove that width in a first direction is 10~1000 microns, wherein
First direction is the direction that the second coating zone is directed toward by the first coating zone, or, being directed toward the first coating by the second coating zone
The direction in region.
For the clearer production method for understanding nano-imprint stamp provided in an embodiment of the present invention, below in conjunction with Fig. 4-
Fig. 7 is specifically described in detail.
Step 1: being coated with the bottoming film 12 of 2~10 micron thickness on basement membrane 11, bottoming film 12 is specifically as follows ultraviolet sense
Optical cement film, it is shown in Figure 4.
Step 2: defining the splicing weight that width is 10~1000 microns on ultraviolet dry-film resist by exposure technology
Folded area S0, that is, the ultraviolet dry-film resist of removal splicing overlapping region S0 forms the groove 5 of expose portion basement membrane 11, which is
Refer to the width that the second coating zone direction is directed toward by the first coating zone, alternatively, being directed toward the first coating side by the second coating direction
To width, it is shown in Figure 5.
Step 3: being coated with 1~5 micron thick coining glue 2 in the first coating zone S1 and groove 5, coining glue 2 is filled into
In groove 5, but unfilled whole grooves 5, that is, thickness of the coining glue 2 in groove 5 under the step is less than the depth of groove 5,
It is shown in Figure 6.
Step 4: imprint patterns are carried out using coining glue 2 of the main mould to the first coating zone S1, it is shown in Figure 6.
Step 5: being coated with 1~5 micron thick coining glue 2 in the second coating zone S2 and groove 5, coining glue 2 is filled into
In groove 5, unfilled groove 5 is filled and led up.It in the specific implementation, can be by controlling the glue-spread at groove 5, Yi Ji
The glue-spread of two coating zone S2 makes 2 basic bit of coining glue of the second coating zone S2, groove 5 and the first coating zone S1
In same plane.Specifically, can the first coating zone S1 and the second coating zone S2 coating same thickness coining glue,
And for that after having coated coining glue for the first time, can be imprinted according in groove 5 when for the second time to being coated at groove 5
The thickness that the thickness of glue and the difference of depth of groove and second area need to coat, is comprehensively considered the control to coated weight
System is generally aligned in the same plane final coining glue as far as possible to realize, avoids the formation of segment difference.
Step 6 carries out imprint patterns using coining glue 2 of the main mould to the second coating zone S2 and groove 5, referring to Fig. 7
It is shown.
Based on the same inventive concept, shown in Figure 7, the embodiment of the present invention also provides a kind of using such as the embodiment of the present invention
Production method production nano-imprint stamp, nano-imprint stamp includes：
The predeterminable area S0 for coating coining 2 one side of glue of substrate film 1, substrate film 1 has groove 5；
Positioned at the patterned coining glue 2 of the first coating zone S1, groove 5 and the second coating zone S2.
Optionally, substrate film 1 includes basement membrane 11 and the bottoming film 12 on basement membrane 11, and bottoming film 12 deviates from base
The predeterminable area of 11 one side of film has groove 5.
Optionally, bottoming film 12 is ultraviolet dry-film resist.
The embodiment of the present invention has the beneficial effect that：The production method of nano-imprint stamp provided in an embodiment of the present invention, packet
It includes first in substrate film for coat the splicing overlapping region formation groove of coining glue one side, then in first coating zone and recessed
Coating coining glue in slot, then the coating coining glue in the second coating zone and groove, control the second coating zone and groove
The coated weight of glue is imprinted, and then coining glue may be implemented and spliced in the low segment difference of groove or without segment difference, and avoid pressing
Print glue forms biggish segment difference in splicing overlapping region, and then improves because nano-imprint stamp is in the splicing higher segment difference in overlay region
Cause to remove bad problem.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art
Mind and range.In this way, if these modifications and changes of the present invention belongs to the range of the claims in the present invention and its equivalent technologies
Within, then the present invention is also intended to include these modifications and variations.
Claims (10)
1. a kind of production method of nano-imprint stamp, which is characterized in that including：
Form groove for coat the predeterminable area of coining glue one side in substrate film, wherein the predeterminable area be for by
The coining glue of two neighboring coating zone is overlapped so as to imprint the region that splicing connects；
In the first coating zone and groove coating coining glue, wherein positioned at the thickness of the coining glue of the groove
Less than the depth of the groove；
Imprint patterns are carried out to the coining glue of first coating zone；
It is with first coating zone in the second coating zone and groove coating coining glue, second coating zone
The substrate film is used to coat the two neighboring coating zone of coining glue one side；
Imprint patterns are carried out to the coining glue of second coating zone and the groove.
2. production method as described in claim 1, which is characterized in that the substrate film include basement membrane and be located at the basement membrane
On bottoming film；The predeterminable area for coating coining glue one side in substrate film forms groove, including：
The bottoming film is formed on the basement membrane；
Groove is formed in the predeterminable area away from the basement membrane one side of the bottoming film.
3. production method as claimed in claim 2, which is characterized in that described to deviate from the basement membrane one side in the bottoming film
Predeterminable area formed groove, including：It is formed described in exposure in the predeterminable area away from the basement membrane one side of the bottoming film
The groove of basement membrane.
4. production method as claimed in claim 3, which is characterized in that
It is described to form the bottoming film on the basement membrane, including：Ultraviolet dry-film resist is formed on the basement membrane；
The predeterminable area away from the basement membrane one side in the bottoming film forms groove, including：Remove the preset areas
The ultraviolet dry-film resist in domain.
5. production method as claimed in claim 4, which is characterized in that described to form ultraviolet photoresists on the basement membrane
Film, including：2~10 microns thick of ultraviolet dry-film resist is formed on the basement membrane.
6. production method as claimed in claim 5, which is characterized in that described to be coated in the first coating zone and the groove
Glue is imprinted, including：1~5 micron thick of coining glue is coated in the first coating zone and the groove.
7. production method as described in claim 1, which is characterized in that described to imprint glue one side for coating in substrate film
Predeterminable area forms groove, including：It is formed in a first direction in the predeterminable area for coating coining glue one side of substrate film
Width be 10~1000 microns of groove, wherein the first direction is to be directed toward described second by first coating zone
The direction of coating zone, or, being directed toward the direction of first coating zone by second coating zone.
8. a kind of nano-imprint stamp using such as the described in any item production method production of claim 1-7, which is characterized in that
The nano-imprint stamp includes：
The predeterminable area for coating coining glue one side of substrate film, the substrate film has groove；
Positioned at the patterned coining glue of the first coating zone, the groove and the second coating zone.
9. nano-imprint stamp as claimed in claim 8, which is characterized in that the substrate film includes basement membrane and is located at described
The predeterminable area away from the basement membrane one side of bottoming film on basement membrane, the bottoming film has the groove.
10. nano-imprint stamp as claimed in claim 9, which is characterized in that the bottoming film is ultraviolet dry-film resist.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810737670.XA CN108873605A (en) | 2018-07-06 | 2018-07-06 | A kind of nano-imprint stamp and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810737670.XA CN108873605A (en) | 2018-07-06 | 2018-07-06 | A kind of nano-imprint stamp and preparation method thereof |
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| Publication Number | Publication Date |
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| CN108873605A true CN108873605A (en) | 2018-11-23 |
Family
ID=64299612
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| Application Number | Title | Priority Date | Filing Date |
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| CN201810737670.XA Pending CN108873605A (en) | 2018-07-06 | 2018-07-06 | A kind of nano-imprint stamp and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110824835A (en) * | 2019-11-26 | 2020-02-21 | 京东方科技集团股份有限公司 | Spliced nano-imprint template, repair method of spliced seam of template and manufacturing method of template |
| WO2022067613A1 (en) * | 2020-09-30 | 2022-04-07 | 镭亚电子(苏州)有限公司 | Printing template and manufacturing method therefor |
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| WO2022067613A1 (en) * | 2020-09-30 | 2022-04-07 | 镭亚电子(苏州)有限公司 | Printing template and manufacturing method therefor |
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