CN108873435B - Manufacturing method of array substrate, array substrate and liquid crystal display - Google Patents
Manufacturing method of array substrate, array substrate and liquid crystal display Download PDFInfo
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133357—Planarisation layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136222—Colour filters incorporated in the active matrix substrate
Abstract
The invention discloses a manufacturing method of an array substrate, which comprises the following steps: step 1: establishing an off-state emergent spectrum-box thickness correlation model; step 2: calculating a first box thickness, a second box thickness and a third box thickness which respectively correspond to the required R-band off-state emergence rate, G-band off-state emergence rate and B-band off-state emergence rate; and step 3: and manufacturing a required array substrate, wherein the side of the required array substrate facing the liquid crystal layer has different heights, so that the required liquid crystal display has a first cell thickness in an R area, a second cell thickness in a G area and a third cell thickness in a B area. The manufacturing method can control the required liquid crystal display to have the required off-state emergence rate on the red light wave band, the blue light wave band and the green light wave band simultaneously, can improve the off-state effect of the liquid crystal display, and achieves the purposes of high contrast, high NTSC and low color cast. The invention also provides an array substrate and a liquid crystal display.
Description
Technical Field
The invention relates to a display technology, in particular to a manufacturing method of an array substrate, the array substrate and a liquid crystal display.
Background
At present, the off-state output rate of a liquid crystal display can only reach an extreme value within a certain wavelength band due to the dispersion problem of liquid crystal molecules, a polarizer and the like.
Taking a normally black mode reflective liquid crystal display as an example, as shown in fig. 1 and 2, when the cell thickness is R1, the off-state reflectance spectrum of the liquid crystal display is as shown by a solid line LC _ R1, which has an extremely low off-state reflectance in the red wavelength band, but has a high off-state reflectance in both the blue wavelength band and the green wavelength band; when the cell thickness is R2, the off-state reflectance spectrum of the lcd is as shown by the solid line LC _ R2, which has a very low off-state reflectance in the green wavelength band, but a high off-state reflectance in both the blue and red wavelength bands; when the cell thickness is R3, the off-state reflectance spectrum of the lcd is very low in the blue band, but high in both the red and green bands, as shown by the solid line LC _ R3. Because the normally black mode reflective liquid crystal display cannot have extremely low off-state reflectivity in a red light waveband, a green light waveband and a blue light waveband all the time, the normally black mode reflective liquid crystal display cannot be completely black in an off state, the off-state effect is poor, the contrast ratio is low, and meanwhile, the off-state reflectivity difference between different wavebands is large, so that the normally black mode reflective liquid crystal display has a serious color cast problem and low NTSC (liquid crystal display) is caused.
Similarly, the off-state transmittance of the normally black mode lcd can only reach a very low value in a certain band, the off-state reflectance of the normally white mode lcd can only reach a very high value in a certain band, and the off-state transmittance of the normally white mode lcd can only reach a very high value in a certain band.
Disclosure of Invention
In order to overcome the above-mentioned deficiencies of the prior art, the present invention provides a method for manufacturing an array substrate, an array substrate and a liquid crystal display. The manufacturing method can control the required liquid crystal display to have the required off-state emergence rate on the red light wave band, the blue light wave band and the green light wave band simultaneously, can improve the off-state effect of the liquid crystal display, and achieves the purposes of high contrast, high NTSC and low color cast.
The technical problem to be solved by the invention is realized by the following technical scheme:
a manufacturing method of an array substrate comprises the following steps:
step 1: establishing an off-state emergent spectrum-box thickness correlation model according to the off-state emergent spectrums of a plurality of common liquid crystal displays and the corresponding box thicknesses thereof;
step 2: according to the established off-state emergent spectrum-box thickness correlation model, calculating a first box thickness, a second box thickness and a third box thickness which respectively correspond to the required R-band off-state emergent rate, G-band off-state emergent rate and B-band off-state emergent rate;
and step 3: and manufacturing a required array substrate according to the calculated first cell thickness, second cell thickness and third cell thickness, wherein the surface of the required array substrate facing the liquid crystal layer has different heights in an R region corresponding to the R sub-pixel, a G region corresponding to the G sub-pixel and a B region corresponding to the B sub-pixel, so that the required liquid crystal display has the first cell thickness in the R region, the second cell thickness in the G region and the third cell thickness in the B region.
Further, in step 3, the TFT array layer of the required array substrate is covered with a transparent planarization layer, and the transparent planarization layer has different material thicknesses in the R region, the G region and the B region, respectively, so that the side of the required array substrate facing the liquid crystal layer has different heights in the R region, the G region and the B region, respectively.
Further, step 3 comprises:
step 3.1: calculating the material thickness difference of the transparent flat layer among the R area, the G area and the B area according to the calculated first box thickness, second box thickness and third box thickness;
step 3.2: and manufacturing the transparent flat layer of the required array substrate according to the calculated material thickness difference.
Further, step 1 comprises:
step 1.1: respectively solving and obtaining Jones matrixes of a plurality of common liquid crystal displays, wherein each common liquid crystal display has different box thicknesses;
step 1.2: calculating the off-state emergent spectrum of each common liquid crystal display according to each obtained Jones matrix;
step 1.3: and establishing an off-state emergent spectrum-box thickness correlation model according to the obtained off-state emergent spectrum and the corresponding box thickness.
Further, the off-state emergent spectrum-box thickness correlation model comprises an R-waveband off-state emergent rate-box thickness correlation model, a G-waveband off-state emergent rate-box thickness correlation model and a B-waveband off-state emergent rate-box thickness correlation model after light passes through an unpowered common liquid crystal display.
Further, step 1.3 comprises:
step 1.3.1: respectively obtaining R-band off-state emergence rate, G-band off-state emergence rate and B-band off-state emergence rate of each common liquid crystal display from each obtained off-state emergence spectrum;
step 1.3.2: and respectively establishing an R-waveband off-state emergence rate-box thickness correlation model, a G-waveband off-state emergence rate-box thickness correlation model and a B-waveband off-state emergence rate-box thickness correlation model by adopting regression equations according to the obtained R-waveband off-state emergence rate, G-waveband off-state emergence rate, B-waveband off-state emergence rate and the corresponding box thickness discrete points.
An array substrate, the side of which facing a liquid crystal layer has different heights on an R region corresponding to an R sub-pixel, a G region corresponding to a G sub-pixel and a B region corresponding to a B sub-pixel respectively, so that a required liquid crystal display has a first cell thickness in the R region, a second cell thickness in the G region and a third cell thickness in the B region to simultaneously have required R-band off-state emergence rate, G-band off-state emergence rate and B-band off-state emergence rate.
Further, a transparent flat layer covers the TFT array layer, and the transparent flat layer has different material thicknesses on the R area, the G area and the B area respectively, so that the side, facing the liquid crystal layer, of the array substrate has different heights on the R area, the G area and the B area respectively.
A liquid crystal display comprises the array substrate.
The invention has the following beneficial effects: the manufacturing method is characterized in that the side, facing the liquid crystal layer, of the required array substrate is made to be different in height, so that the box thickness of the required liquid crystal display is not uniform and equal everywhere, and the corresponding sub-pixels are matched to control the required liquid crystal display to have the required off-state emergence rate on a red light wave band, a blue light wave band and a green light wave band simultaneously.
Drawings
FIG. 1 is a schematic diagram of a conventional common LCD with a uniform cell thickness throughout;
FIG. 2 is an off-state reflectance spectrum of the conventional LCD of FIG. 1 with different cell thicknesses;
FIG. 3 is a block diagram illustrating a method for fabricating an array substrate according to the present invention;
FIG. 4 is a schematic diagram of a liquid crystal display according to the present invention;
FIG. 5 is an off-state reflectance spectrum of a liquid crystal display according to the present invention.
Detailed Description
The present invention will be described in detail below with reference to the accompanying drawings and examples.
Example one
As shown in fig. 3, a method for manufacturing an array substrate 2 includes:
step 1: establishing an off-state emergent spectrum-box thickness correlation model according to the off-state emergent spectrums of a plurality of common liquid crystal displays and the corresponding box thicknesses thereof;
in this step 1, the cell thickness refers to the thickness of the liquid crystal layer 3 in the liquid crystal display.
The off-state emergent spectrum refers to an emergent rate curve of light rays on different wave bands after passing through an unpowered liquid crystal display (a normally black mode is a black state, and a normally white mode is a white state), and comprises an off-state reflectivity curve and an off-state transmittance curve.
As shown in fig. 1 and 4, the liquid crystal display includes a color film substrate 1 and an array substrate 2 which are attached to each other in an up-down opposite manner, a liquid crystal layer 3 is filled between the color film substrate 1 and the array substrate 2, an RGB color film layer 12 is disposed on a surface of a first substrate 11 of the color film substrate 1 facing the array substrate 2, and a TFT array layer 22 is disposed on a surface of a second substrate 21 of the array substrate 2 facing the color film substrate 1; the RGB color film layer 12 includes a plurality of RGB pixels, each of which is composed of an R sub-pixel, a G sub-pixel, and a B sub-pixel.
As shown in fig. 1, the general liquid crystal display refers to a conventional liquid crystal display whose cell thickness (thickness of the liquid crystal layer 3) is uniformly equal everywhere between the R region corresponding to the R sub-pixel, the G region corresponding to the G sub-pixel, and the B region corresponding to the B sub-pixel.
The step 1 specifically comprises:
step 1.1: respectively solving and obtaining Jones matrixes of a plurality of common liquid crystal displays, wherein each common liquid crystal display has different box thicknesses;
in step 1.1, if the manufactured required array substrate 2 is applied to the normally black mode, the normal liquid crystal display for solving the jones matrix is also in the normally black mode, and if the manufactured required array substrate 2 is applied to the normally white mode, the normal liquid crystal display for solving the jones matrix is also in the normally white mode.
When solving the Jones matrix, firstly, optical parameters (such as transmittance curve of a polaroid, dispersion curve of a compensation film, dispersion curve of liquid crystal and the like) of materials required by calculation of the Jones matrix in each common liquid crystal display are detected and obtained, then the optical parameters of the required materials are input into Jones matrix calculation software, and the Jones matrix corresponding to each common liquid crystal display is solved by the software.
Step 1.2: calculating the off-state emergent spectrum of each common liquid crystal display according to each obtained Jones matrix;
as described above, the estimated off-state emission spectrum substantially has two spectral curves, one is an off-state reflectance curve, and the other is an off-state transmittance curve.
Taking a normally black mode reflective liquid crystal display as an example, as shown in fig. 2, the solid lines LC _ R1, LC _ R2, and LC _ R3 are the off-state reflectance spectra of the conventional liquid crystal display corresponding to the estimated cell thicknesses R1, R2, and R3, respectively.
Step 1.3: and establishing an off-state emergent spectrum-box thickness correlation model according to the obtained off-state emergent spectrum and the corresponding box thickness.
In step 1.3, the off-state emergent spectrum-box thickness correlation model includes an R-band off-state emergent rate-box thickness correlation model, a G-band off-state emergent rate-box thickness correlation model and a B-band off-state emergent rate-box thickness correlation model after light passes through an unpowered common liquid crystal display.
In a specific modeling method, the step 1.3 specifically includes:
step 1.3.1: respectively obtaining R-band off-state emergence rate, G-band off-state emergence rate and B-band off-state emergence rate of each common liquid crystal display from each obtained off-state emergence spectrum;
in the step 1.3.1, if the manufactured required array substrate 2 is applied to a reflection type, the obtained reflection rates are the off-state reflection rate of the R waveband, the off-state reflection rate of the G waveband and the off-state reflection rate of the B waveband; if the manufactured required array substrate 2 is applied to a transmission type, the R-band off-state transmittance, the G-band off-state transmittance and the B-band off-state transmittance are obtained.
For convenience of calculation, if the manufactured required array substrate 2 is applied to the normally black mode, the minimum or average off-state reflection/transmittance of each wavelength band in the off-state emission spectrum can be, but is not limited to, used as the off-state emission rate of the corresponding wavelength band, such as: taking the lowest or average off-state reflection/transmittance of a red light waveband as the off-state emergence rate of the R waveband, taking the lowest or average off-state reflection/transmittance of a green light waveband as the off-state emergence rate of the G waveband, and taking the lowest or average off-state reflection/transmittance of a blue light waveband as the off-state emergence rate of the B waveband; if the manufactured desired color film is applied to the normally white mode, the highest or average off-state reflection/transmittance of each wavelength band in the off-state emission spectrum thereof may be, but is not limited to, used as the off-state emission rate of the corresponding wavelength band, for example: the highest or average off-state reflection/transmittance of the red light band is taken as the off-state emission rate of the R band, the highest or average off-state reflection/transmittance of the green light band is taken as the off-state emission rate of the G band, and the highest or average off-state reflection/transmittance of the blue light band is taken as the off-state emission rate of the B band.
Of course, the off-state emergence rate of the R-band, the off-state emergence rate of the G-band, and the off-state emergence rate of the B-band for modeling are not limited to the minimum value, the maximum value, or the average value, and different selection methods, such as weighting, may be adopted according to actual requirements.
Step 1.3.2: and respectively establishing an R-waveband off-state emergence rate-box thickness correlation model, a G-waveband off-state emergence rate-box thickness correlation model and a B-waveband off-state emergence rate-box thickness correlation model by adopting regression equations according to the obtained R-waveband off-state emergence rate, G-waveband off-state emergence rate, B-waveband off-state emergence rate and the corresponding box thickness discrete points.
In this step 1.3.2, the discrete points for modeling include: r-band off-state emittance-box thick discrete points, G-band off-state emittance-box thick discrete points, and B-band off-state emittance-box thick discrete points.
Specifically, the regression equation established by discrete points is only one specific modeling method listed for the convenience of understanding the present application, and the scope of the present application shall include other existing modeling methods.
Step 2: according to the established off-state emergent spectrum-box thickness correlation model, when the required R-band off-state emergence rate, G-band off-state emergence rate and B-band off-state emergence rate are respectively achieved, a first box thickness h1, a second box thickness h2 and a third box thickness h3 which correspond to each other are calculated;
in the step 2, if the manufactured required array substrate 2 is applied to a reflection type in a normally black mode, the required reflectance is extremely low R-band off-state reflectance, G-band off-state reflectance and B-band off-state reflectance; if the manufactured required array substrate 2 is applied to a transmission type in a normally black mode, extremely low R-band off-state transmittance, G-band off-state transmittance and B-band off-state transmittance are required; if the manufactured required array substrate 2 is applied to a normally white mode reflection type, the required reflectivity is extremely high R-band off-state reflectivity, G-band off-state reflectivity and B-band off-state reflectivity; if the array substrate 2 is applied to a transmission type in a normally white mode, the required transmittance is very high R-band off transmittance, G-band off transmittance, and B-band off transmittance.
In order to optimize the off-state effect of the required liquid crystal display, when the first box thickness h1, the second box thickness h2 and the third box thickness h3 are calculated, optimally, the R-band off-state emergence rate, the G-band off-state emergence rate and the B-band off-state emergence rate all adopt the lowest value or the highest value of the off-state reflection/transmittance in the off-state emergence spectrum-box thickness correlation model.
However, in the specific implementation, the process precision of each manufacturer is different, and therefore, the R-band off-state emergence rate, the G-band off-state emergence rate, and the B-band off-state emergence rate used in calculating the box thickness may also be lower values or higher values of the off-state reflectance/transmittance in the off-state emission spectrum-box thickness correlation model, where if the manufactured required array substrate 2 is applied to the normally black mode, the lower value of the off-state reflectance/transmittance is preferably between 0% and 10%, and if the manufactured required array substrate 2 is applied to the normally white mode, the higher value of the off-state reflectance/transmittance is preferably between 90% and 100%, depending on the process precision of each manufacturer.
Taking a normally black mode reflective liquid crystal display as an example, if the three off-state reflection spectra shown in fig. 2 are used to fabricate the desired array substrate 2, it can be seen that when the cell thickness is R1, the off-state reflectivity of the normal liquid crystal display in the red wavelength band is very low, when the cell thickness is R2, the off-state reflectivity of the normal liquid crystal display in the green wavelength band is very low, and when the cell thickness is R3, the off-state reflectivity of the normal liquid crystal display in the blue wavelength band is very low, then in order to make the desired liquid crystal display using the desired array substrate 2 have very low off-state reflectivities in the red wavelength band, the green wavelength band, and the blue wavelength band at the same time, the transparent planarization layer 23 of the desired array substrate 2 can be fabricated according to the first cell thickness h1= R1, the second cell thickness h2= R2, and the third cell thickness h3= R3 of the desired liquid crystal display.
And step 3: the desired array substrate 2 is fabricated according to the calculated first, second, and third cell thicknesses h1, h2, and h3, and a side of the desired array substrate 2 facing the liquid crystal layer 3 has different heights in an R region corresponding to the R sub-pixel, a G region corresponding to the G sub-pixel, and a B region corresponding to the B sub-pixel, respectively, so that the desired liquid crystal display has the first cell thickness h1 in the R region, the second cell thickness h2 in the G region, and the third cell thickness h3 in the B region.
In step 3, the required lcd refers to an lcd using the required array substrate 2, and the materials such as the polarizer, the substrate glass, the liquid crystal molecules, the ITO, and the RGB ink have the same specifications as those of a general lcd except that the thicknesses of the cells in the R region, the G region, and the B region are not uniform.
Taking a normally black mode reflective lcd as an example, when the R region of the desired lcd has a first cell thickness h1= R1, the G region has a second cell thickness h2= R2, and the B region has a third cell thickness h3= R3, the off-state reflectance spectrum of the desired lcd is as shown in fig. 5, the solid line LC _ R is the off-state reflectance spectrum of the R region, the solid line LC _ G is the off-state reflectance spectrum of the G region, and LR _ B is the off-state reflectance spectrum of the B region, and it can be seen that the R region, the G region, and the B region all maintain extremely low off-state reflectance in the red, green, and blue wavelength bands simultaneously.
In one embodiment, as shown in fig. 4, the TFT array layer 22 of the desired array substrate 2 is covered with a transparent planarization layer 23, and the transparent planarization layer 23 has different material thicknesses in the R region, the G region and the B region, respectively, so that the side of the desired array substrate 2 facing the liquid crystal layer 3 has different heights in the R region, the G region and the B region, respectively.
The step 3 specifically comprises:
step 3.1: calculating the difference in material thickness of the transparent planarization layer 23 between the R region, the G region, and the B region according to the calculated first, second, and third cell thicknesses h1, h2, and h 3;
step 3.2: and manufacturing the transparent flat layer 23 of the required array substrate 2 according to the calculated material thickness difference.
In the specific implementation of step 3.2, the material thickness of the transparent flat layer 23 corresponding to the maximum cell thickness region may be used as a reference, and then the material thicknesses of the transparent flat layers 23 corresponding to the other two regions may be calculated according to the material thickness difference. If the calculated first cell thickness h1 is the maximum, the material thicknesses of the transparent planarization layer 23 corresponding to the G region and the B region are calculated based on the material thickness difference with respect to the material thickness (preferably 0) of the transparent planarization layer 23 corresponding to the R region, and finally the transparent planarization layer 23 of the desired array substrate 2 is fabricated.
The transparent flat 23 layer is preferably, but not limited to, OC glue.
The manufacturing method is characterized in that the surface of the required array substrate 2 facing the liquid crystal layer 3 is made to be different in height, so that the box thickness of the required liquid crystal display is not uniform and equal everywhere, and the corresponding sub-pixels are matched to control the required liquid crystal display to have the required off-state emergence rate on a red light wave band, a blue light wave band and a green light wave band simultaneously.
The manufacturing method is especially suitable for twisted liquid crystal displays with off-state effect sensitive to the cell thickness, but is also suitable for non-twisted liquid crystal displays.
Example two
As shown in fig. 4, an array substrate 2, a side of which facing a liquid crystal layer 3 has different heights on an R region corresponding to an R sub-pixel, a G region corresponding to a G sub-pixel, and a B region corresponding to a B sub-pixel, respectively, so that a desired liquid crystal display has a first cell thickness h1 in the R region, a second cell thickness h2 in the G region, and a third cell thickness h3 in the B region to simultaneously have desired R-band off-state exitance, G-band off-state exitance, and B-band off-state exitance.
The required liquid crystal display refers to a liquid crystal display using the array substrate 2, and materials such as a polarizer, substrate glass, liquid crystal molecules, ITO, and RGB ink, etc. are used in the same specification as those of a general liquid crystal display except that the cell thickness is not uniform among the R region, the G region, and the B region.
In one embodiment, the TFT array layer 22 of the array substrate 2 is covered with a transparent planarization layer 23, and the transparent planarization layer 23 has different material thicknesses in the R region, the G region and the B region, respectively, so that the side of the array substrate 2 facing the liquid crystal layer 3 has different heights in the R region, the G region and the B region, respectively.
The transparent planarization layer 23 is preferably, but not limited to, OC glue.
EXAMPLE III
As shown in fig. 4, a liquid crystal display includes the array substrate 2 described in the second embodiment.
The above-mentioned embodiments only express the embodiments of the present invention, and the description is more specific and detailed, but not understood as the limitation of the patent scope of the present invention, but all the technical solutions obtained by using the equivalent substitution or the equivalent transformation should fall within the protection scope of the present invention.
Claims (6)
1. A manufacturing method of an array substrate is characterized by comprising the following steps:
step 1: establishing an off-state emergent spectrum-box thickness correlation model according to the off-state emergent spectrums and the corresponding box thicknesses of a plurality of common liquid crystal displays, wherein each common liquid crystal display has different box thicknesses;
step 2: according to the established off-state emergent spectrum-box thickness correlation model, calculating a first box thickness, a second box thickness and a third box thickness which respectively correspond to the required R-band off-state emergent rate, G-band off-state emergent rate and B-band off-state emergent rate;
and step 3: and manufacturing a required array substrate according to the calculated first cell thickness, second cell thickness and third cell thickness, wherein the surface of the required array substrate facing the liquid crystal layer has different heights in an R region corresponding to the R sub-pixel, a G region corresponding to the G sub-pixel and a B region corresponding to the B sub-pixel, so that the required liquid crystal display has the first cell thickness in the R region, the second cell thickness in the G region and the third cell thickness in the B region.
2. The method for manufacturing the array substrate according to claim 1, wherein in step 3, the TFT array layer of the desired array substrate is covered with a transparent planarization layer, and the transparent planarization layer has different material thicknesses in the R region, the G region and the B region, respectively, so that the side of the desired array substrate facing the liquid crystal layer has different heights in the R region, the G region and the B region, respectively.
3. The method for manufacturing the array substrate according to claim 2, wherein the step 3 comprises:
step 3.1: calculating the material thickness difference of the transparent flat layer among the R area, the G area and the B area according to the calculated first box thickness, second box thickness and third box thickness;
step 3.2: and manufacturing the transparent flat layer of the required array substrate according to the calculated material thickness difference.
4. The method for manufacturing the array substrate according to any one of claims 1 to 3, wherein the step 1 comprises:
step 1.1: respectively solving and obtaining Jones matrixes of a plurality of common liquid crystal displays, wherein each common liquid crystal display has different box thicknesses;
step 1.2: calculating the off-state emergent spectrum of each common liquid crystal display according to each obtained Jones matrix;
step 1.3: and establishing an off-state emergent spectrum-box thickness correlation model according to the obtained off-state emergent spectrum and the corresponding box thickness.
5. The method for manufacturing the array substrate according to any one of claims 1 to 3, wherein the off-state emission spectrum-box thickness correlation model comprises an R-band off-state emission rate-box thickness correlation model, a G-band off-state emission rate-box thickness correlation model and a B-band off-state emission rate-box thickness correlation model of a normal liquid crystal display with no power on.
6. The method for manufacturing the array substrate according to claim 4, wherein the step 1.3 comprises:
step 1.3.1: respectively obtaining R-band off-state emergence rate, G-band off-state emergence rate and B-band off-state emergence rate of each common liquid crystal display from each obtained off-state emergence spectrum;
step 1.3.2: and respectively establishing an R-waveband off-state emergence rate-box thickness correlation model, a G-waveband off-state emergence rate-box thickness correlation model and a B-waveband off-state emergence rate-box thickness correlation model by adopting regression equations according to the obtained R-waveband off-state emergence rate, G-waveband off-state emergence rate, B-waveband off-state emergence rate and the corresponding box thickness discrete points.
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