CN108873435A - Production method, array substrate and the liquid crystal display of array substrate - Google Patents
Production method, array substrate and the liquid crystal display of array substrate Download PDFInfo
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- CN108873435A CN108873435A CN201810757590.0A CN201810757590A CN108873435A CN 108873435 A CN108873435 A CN 108873435A CN 201810757590 A CN201810757590 A CN 201810757590A CN 108873435 A CN108873435 A CN 108873435A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133357—Planarisation layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136222—Colour filters incorporated in the active matrix substrate
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- Crystallography & Structural Chemistry (AREA)
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- Engineering & Computer Science (AREA)
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Abstract
The invention discloses a kind of production methods of array substrate, including:Step 1:Establish OFF state outgoing spectrum-box thickness correlation model;Step 2:It calculates when respectively reaching required R wave band OFF state exitance, G-band OFF state exitance and B wave band OFF state exitance, corresponding first box is thick, the second box is thick and third box is thick;Step 3:The one side of array substrate needed for making, required array substrate towards liquid crystal layer has different height so that required liquid crystal display Zone R domain have the first box it is thick, the region G have the second box it is thick and in B area with third box thickness.The production method, which can control required liquid crystal display, all while having required OFF state exitance on red spectral band, blue wave band and green light band, can improve the OFF state effect of liquid crystal display, achieve the purpose that high contrast, high NTSC, low colour cast.The present invention also provides a kind of array substrate and liquid crystal displays.
Description
Technical field
The present invention relates to display technology more particularly to a kind of production methods of array substrate, array substrate and liquid crystal display
Device.
Background technique
Currently, the OFF state exitance of liquid crystal display can only be a certain due to the chromatic dispersion problem of liquid crystal molecule, polaroid etc.
Reach an extreme value in wave band.
By taking the reflection LCD of normally black mode as an example, as illustrated in fig. 1 and 2, when box thickness is R1, liquid crystal display
OFF state reflectance spectrum as shown in solid line LC_R1, the OFF state reflectivity in red spectral band is extremely low, but in blue wave band and
OFF state reflectivity in green light band is higher;When box thickness is R2, the OFF state reflectance spectrum of liquid crystal display such as solid line LC_R2
Shown, the OFF state reflectivity in green light band is extremely low, but the OFF state reflectivity in blue wave band and in red spectral band is equal
It is higher;When box thickness is R3, pass of the OFF state reflectance spectrum of liquid crystal display as shown in solid line LC_R3, in blue wave band
State reflectivity is extremely low, but the OFF state reflectivity in red spectral band and in green light band is higher.Due to always can not be in feux rouges
There is extremely low OFF state reflectivity, the reflection LCD of normally black mode simultaneously in wave band, green light band and blue wave band
It can not accomplish complete black in OFF state, OFF state effect is bad to cause its contrast lower, simultaneously as between different-waveband
OFF state difference in reflectivity it is larger so that it has more serious colour cast, and cause NTSC lower.
Similarly, the OFF state transmitance of the permeation type liquid crystal display of normally black mode can only reach extremely low in a certain wave band
Value, the OFF state reflectivity of the reflection LCD of normal white mode can only reach extremely high value, normal white mode in a certain wave band
The OFF state transmitance of permeation type liquid crystal display can only reach extremely high value in a certain wave band.
Summary of the invention
In order to solve above-mentioned the deficiencies in the prior art, the present invention provides a kind of production method of array substrate, array substrate
And liquid crystal display.The production method can control required liquid crystal display on red spectral band, blue wave band and green light band
All simultaneously there is required OFF state exitance, the OFF state effect of liquid crystal display can be improved, reach high contrast, high NTSC,
The purpose of low colour cast.
The technical problems to be solved by the invention are achieved by the following technical programs:
A kind of production method of array substrate, including:
Step 1:OFF state according to multiple regular liquid crystal displays is emitted spectrum and its corresponding box is thick, establishes OFF state emergent light
Spectrum-box thickness correlation model;
Step 2:It is emitted spectrum-box thickness correlation model according to the OFF state established, is calculated and is respectively reached required R wave band OFF state and go out
When penetrating rate, G-band OFF state exitance and B wave band OFF state exitance, corresponding first box is thick, the second box is thick and third box
It is thick;
Step 3:, second box thickness thick according to calculated first box and third box are thick, array substrate needed for making, required array base
The one side of plate towards liquid crystal layer in the Zone R domain corresponding to R sub-pixel, the region G corresponding to G sub-pixel and corresponds to B sub-pixel
B area on be respectively provided with different height so that required liquid crystal display has in Zone R domain, the first box is thick, has in the region G
Second box is thick and has third box thick in B area.
Further, in step 3, a transparent planar layer is covered on the tft array layer of required array substrate, it is described
Bright flatness layer is respectively provided with different material thickness in Zone R domain, the region G and B area, so that required array substrate is towards liquid crystal
The one side of layer is respectively provided with different height in Zone R domain, the region G and B area.
Further, step 3 includes:
Step 3.1:, second box thickness thick according to calculated first box and third box are thick, calculate the transparent planar layer in Zone R
Differences in material thickness between domain, the region G and B area;
Step 3.2:According to calculated differences in material thickness, the transparent planar layer of array substrate needed for making.
Further, step 1 includes:
Step 1.1:The Jones matrix for obtaining multiple regular liquid crystal displays is solved respectively, and each regular liquid crystal display has not
Same box is thick;
Step 1.2:According to each Jones matrix obtained, the OFF state outgoing spectrum of each regular liquid crystal display is extrapolated;
Step 1.3:It is thick according to each OFF state outgoing spectrum obtained and its corresponding box, establish OFF state outgoing spectrum-box thickness phase
Close model.
Further, the OFF state outgoing spectrum-box thickness correlation model includes that light is aobvious by the common liquid crystals being not powered on
R wave band OFF state exitance-box thickness correlation model, G-band OFF state exitance-box thickness correlation model and B wave band OFF state after showing device
Exitance-box thickness correlation model.
Further, step 1.3 includes:
Step 1.3.1:From each OFF state of acquisition outgoing spectrum, the R wave band for respectively obtaining each regular liquid crystal display is closed
State exitance, G-band OFF state exitance and B wave band OFF state exitance;
Step 1.3.2:According to obtained each R wave band OFF state exitance, G-band OFF state exitance and B wave band OFF state exitance
And its discrete point of corresponding box thickness, establish R wave band OFF state exitance-box thickness correlation model, G-band respectively using regression equation
OFF state exitance-box thickness correlation model and B wave band OFF state exitance-box thickness correlation model.
A kind of array substrate, towards liquid crystal layer one side correspond to R sub-pixel Zone R domain, corresponding to G sub-pixel
It is respectively provided with different height in the region G and B area corresponding to B sub-pixel, so that required liquid crystal display has in Zone R domain
First box is thick, have the second box thick in the region G and has that third box is thick in B area, with and meanwhile there is required R wave band OFF state to go out
Penetrate rate, G-band OFF state exitance and B wave band OFF state exitance.
Further, a transparent planar layer is covered on tft array layer, the transparent planar layer is in Zone R domain, the region G
The different material thickness with being respectively provided in B area so that the array substrate towards liquid crystal layer one side Zone R domain, the region G and
Different height is respectively provided in B area.
A kind of liquid crystal display, including above-mentioned array substrate.
The present invention has the advantages that:The production method being fabricated on one side towards liquid crystal layer by required array substrate
Different height, so that the box thickness of required liquid crystal display is equal for non-uniform throughout, then corresponding sub-pixel of arranging in pairs or groups, with control
Liquid crystal display needed for making all has required OFF state exitance, phase simultaneously on red spectral band, blue wave band and green light band
Than the regular liquid crystal display equal in the thick uniform throughout of existing box, the OFF state effect of liquid crystal display can be improved, so that
The liquid crystal display of the liquid crystal display of normally black mode more black, normal white mode in OFF state is whiter in OFF state, reaches high comparison
The purpose of degree, high NTSC, low colour cast.
Detailed description of the invention
Fig. 1 is the schematic diagram of the equal regular liquid crystal display of existing box thickness uniform throughout;
Fig. 2 is OFF state reflectance spectrum when regular liquid crystal display shown in FIG. 1 has different box thickness;
Fig. 3 is the step block diagram of the production method of array substrate provided by the invention;
Fig. 4 is the schematic diagram of liquid crystal display provided by the invention;
Fig. 5 is the OFF state reflectance spectrum of liquid crystal display provided by the invention.
Specific embodiment
The present invention will be described in detail with reference to the accompanying drawings and examples.
Embodiment one
As shown in figure 3, a kind of production method of array substrate 2, including:
Step 1:OFF state according to multiple regular liquid crystal displays is emitted spectrum and its corresponding box is thick, establishes OFF state emergent light
Spectrum-box thickness correlation model;
In the step 1, the box thickness refers to 3 thickness of liquid crystal layer in liquid crystal display.
The OFF state outgoing spectrum refers to that light passes through the liquid crystal display being not powered on(Normally black mode is black state, Chang Bai
Mode is white state)Exitance curve on different-waveband afterwards, including OFF state reflectance curve and OFF state transmittance curve, due to
It can be converted mutually by certain numerical value between OFF state reflectance curve and OFF state transmittance curve, OFF state reflectance curve
It can also be indicated mutually between OFF state transmittance curve, and reflection LCD refers to using OFF state reflectivity as OFF state
Mark, permeation type liquid crystal display is using OFF state transmitance as OFF state index, and therefore, this case is emitted spectrum using OFF state to state.
Wherein, as shown in figs. 1 and 4, liquid crystal display includes up and down with respect to the color membrane substrates 1 and array substrate 2 being bonded, institute
It states between color membrane substrates 1 and array substrate 2 filled with liquid crystal layer 3, the first underlay substrate 11 of the color membrane substrates 1 is towards described
It is provided with RGB coloured silk film layer 12 in the one side of array substrate 2, the second underlay substrate 21 of the array substrate 2 is towards the color film
Tft array layer 22 is provided in the one side of substrate 1;The RGB coloured silk film layer 12 include multiple rgb pixels, each rgb pixel by
One R sub-pixel, a G sub-pixel and a B sub-pixel group at.
As shown in Figure 1, regular liquid crystal display refers to that it corresponds to the Zone R domain of R sub-pixel, the G corresponding to G sub-pixel
Region and thick corresponding to the box between the B area of B sub-pixel(3 thickness of liquid crystal layer)The equal custom liquid crystals of uniform throughout are shown
Device.
The step 1 specifically includes:
Step 1.1:The Jones matrix for obtaining multiple regular liquid crystal displays is solved respectively, and each regular liquid crystal display has not
Same box is thick;
In the step 1.1, if the required array substrate 2 of production is applied to normally black mode, solve common used in Jones matrix
Liquid crystal display is also normally black mode, if the required array substrate 2 of production is applied to normal white mode, is solved used in Jones matrix
Regular liquid crystal display be also normal white mode.
When solving Jones matrix, first detection, which obtains, to be related to needed for calculating Jones matrix in each regular liquid crystal display
The optical parameter of material(The transmittance curve of such as polaroid, the dispersion curve of compensation film, liquid crystal dispersion curve), then will
The optical parameter of required material is input in Jones matrix software for calculation, and it is corresponding to solve each regular liquid crystal display by software
Jones matrix.
Step 1.2:According to each Jones matrix obtained, the OFF state emergent light of each regular liquid crystal display is extrapolated
Spectrum;
As described above, the OFF state outgoing spectrum extrapolated substantially has two curves of spectrum, one is OFF state reflectance curve, separately
One is OFF state transmittance curve.
By taking the reflection LCD of normally black mode as an example, as shown in Fig. 2, solid line LC_R1, LC_R2 and LC_R3 are exactly
The OFF state reflectance spectrum of the box thickness extrapolated corresponding regular liquid crystal display when being respectively R1, R2 and R3.
Step 1.3:It is thick according to each OFF state outgoing spectrum obtained and its corresponding box, establish OFF state outgoing spectrum-box
Thick correlation model.
In the step 1.3, the OFF state outgoing spectrum-box thickness correlation model includes that light passes through the common liquid crystals being not powered on
R wave band OFF state exitance-box thickness correlation model, G-band OFF state exitance-box thickness correlation model and B wave band after display close
State exitance-box thickness correlation model.
In a kind of specific modeling method, which is specifically included:
Step 1.3.1:From each OFF state of acquisition outgoing spectrum, the R wave band for respectively obtaining each regular liquid crystal display is closed
State exitance, G-band OFF state exitance and B wave band OFF state exitance;
In step 1.3.1, if the required array substrate 2 of production is applied to reflection-type, what is obtained is the reflection of R wave band OFF state
Rate, G-band OFF state reflectivity and B wave band OFF state reflectivity;If the required array substrate 2 of production is applied to infiltration type, obtain
Be R wave band OFF state transmitance, G-band OFF state transmitance and B wave band OFF state transmitance.
It can be, but not limited to Jiang Qiguan if the required array substrate 2 of production is applied to normally black mode in order to facilitate calculating
State is emitted the minimum of each wave band in spectrum or average OFF state reflection/transmission rate corresponds to the OFF state exitance of wave band as it,
Such as:Using the minimum of red spectral band or average OFF state reflection/transmission rate as its R wave band OFF state exitance, with green light band
Minimum or average OFF state reflection/transmission rate as its G-band OFF state exitance, it is anti-with the minimum of blue wave band or average OFF state
Penetrate/transmitance is as its B wave band OFF state exitance;If the required color film of production is applied to normal white mode, can be, but not limited to
Go out using the highest for each wave band that its OFF state is emitted in spectrum or average OFF state reflection/transmission rate as its OFF state for corresponding to wave band
Rate is penetrated, such as:Using the highest of red spectral band or average OFF state reflection/transmission rate as its R wave band OFF state exitance, with green light wave
The highest of section or average OFF state reflection/transmission rate as its G-band OFF state exitance, with the highest of blue wave band or average OFF state
Reflection/transmission rate is as its B wave band OFF state exitance.
Certainly, the R wave band OFF state exitance, G-band OFF state exitance and B wave band OFF state exitance of modeling are not limited to
In above-mentioned minimum, peak or average value, different choosing methods can be used according to actual demand, for example take weighted value
Deng.
Step 1.3.2:Go out according to obtained each R wave band OFF state exitance, G-band OFF state exitance and B wave band OFF state
The discrete point for penetrating rate and its corresponding box thickness establishes R wave band OFF state exitance-box thickness correlation model, G using regression equation respectively
Wave band OFF state exitance-box thickness correlation model and B wave band OFF state exitance-box thickness correlation model.
In step 1.3.2, the discrete point of modeling includes:R wave band OFF state exitance-box thickness discrete point, G-band
OFF state exitance-box thickness discrete point and B wave band OFF state exitance-box thickness discrete point.
It illustrates, regression equation is established by discrete point only to facilitate understand that this case enumerates wherein one
The specific modeling pattern of kind, the protection scope of this case should include other existing modeling patterns.
Step 2:It is emitted spectrum-box thickness correlation model according to the OFF state established, calculates and respectively reaches required R wave band pass
When state exitance, G-band OFF state exitance and B wave band OFF state exitance, corresponding first box thickness h1, the second box thickness h2 and
Third box thickness h3;
In the step 2, if the required array substrate 2 of production is applied to the reflection-type of normally black mode, it is desirable for extremely low R wave
Section OFF state reflectivity, G-band OFF state reflectivity and B wave band OFF state reflectivity;If the required array substrate 2 of production is applied to normally-black
The infiltration type of mode is then desirable for extremely low R wave band OFF state transmitance, G-band OFF state transmitance and B wave band OFF state and penetrates
Rate;If the required array substrate 2 of production is applied to the reflection-type of normal white mode, it is desirable for high R wave band OFF state reflection
Rate, G-band OFF state reflectivity and B wave band OFF state reflectivity;If the required array substrate 2 of production is applied to the transmission of normal white mode
Type is then desirable for high R wave band OFF state transmitance, G-band OFF state transmitance and B wave band OFF state transmitance.
In order to keep the OFF state effect of required liquid crystal display best, the first box thickness h1, the second box thickness h2 and third are being calculated
When box thickness h3, optimally, R wave band OFF state exitance, G-band OFF state exitance and B wave band OFF state exitance are all made of OFF state and go out
Penetrate the minimum or peak of the OFF state reflection/transmission rate in spectrum-box thickness correlation model.
But in specific implementation, the processing procedure precision of various manufacturers is different, and therefore, the R wave band that when calculation box thickness uses closes
State exitance, G-band OFF state exitance and B wave band OFF state exitance may be in OFF state outgoing spectrum-box thickness correlation model
OFF state reflectivity/transmitance lower value or high value, wherein if production required array substrate 2 be applied to normally black mode,
Then the lower value of OFF state reflection/transmission rate is advisable between 0-10%, if the required array substrate 2 of production is applied to normal white mode,
Then the high value of OFF state reflection/transmission rate is advisable in 90-100%, specifically depending on the processing procedure precision of various manufacturers.
By taking the reflection LCD of normally black mode as an example, made according to three OFF state reflectance spectrums shown in Fig. 2
If array substrate 2 needed for making, it can could see, when box thickness is R1, OFF state of the regular liquid crystal display in red spectral band
Reflectivity is extremely low, and when box thickness is R2, OFF state reflectivity of the regular liquid crystal display in green light band is extremely low, when box thickness is R3
When, OFF state reflectivity of the regular liquid crystal display in blue wave band is extremely low, then, in order to make to apply required array substrate 2
Required liquid crystal display there is extremely low OFF state reflectivity simultaneously in red spectral band, green light band and blue wave band, so that it may
To make required battle array according to first box thickness h1=R1, second box thickness h2=R2 and the third box thickness h3=R3 of required liquid crystal display
The transparent planar layer 23 of column substrate 2.
Step 3:According to calculated first box thickness h1, the second box thickness h2 and third box thickness h3, array substrate needed for making
2, required array substrate 2 towards liquid crystal layer 3 one side correspond to R sub-pixel Zone R domain, corresponding to G sub-pixel the region G and
Different height is respectively provided in B area corresponding to B sub-pixel, so that required liquid crystal display has the first box in Zone R domain
Thick h1, the region G with the second box thickness h2 and B area have third box thickness h3.
In the step 3, required liquid crystal display refers to having used the liquid crystal display of required array substrate 2, in addition to R
Box thickness ununiformity between region, the region G and B area it is even it is equal except, polaroid, base plate glass, liquid crystal molecule, ITO and RGB
The materials such as ink are all made of specification identical with regular liquid crystal display.
By taking the reflection LCD of normally black mode as an example, when the Zone R domain of required liquid crystal display has the first box thick
When h1=R1, the region G have third box thickness h3=R3 with second box thickness h2=R2 and B area, the OFF state of the required liquid crystal display
For reflectance spectrum as shown in figure 5, solid line LC_R is the OFF state reflectance spectrum in Zone R domain, solid line LC_G is the OFF state reflected light in the region G
Spectrum, LR_B be B area OFF state reflectance spectrum, can could see, Zone R domain, the region G and B area simultaneously red spectral band,
Extremely low OFF state reflectivity is maintained in green light band and blue wave band.
In one embodiment, as shown in figure 4, to be covered with one on the tft array layer 22 of required array substrate 2 transparent flat
Smooth layer 23, the transparent planar layer 23 is respectively provided with different material thickness in Zone R domain, the region G and B area, so that required
The one side of array substrate 2 towards liquid crystal layer 3 is respectively provided with different height in Zone R domain, the region G and B area.
The step 3 specifically includes:
Step 3.1:According to calculated first box thickness h1, the second box thickness h2 and third box thickness h3, the transparent planar is calculated
Differences in material thickness of the layer 23 between Zone R domain, the region G and B area;
Step 3.2:According to calculated differences in material thickness, the transparent planar layer 23 of array substrate 2 needed for making.
The step 3.2 in specific implementation, can be first thick with the material of the corresponding transparent planar layer 23 of box thickness maximum region
On the basis of degree, then foundation differences in material thickness calculates the material thickness of the corresponding transparent planar layer 23 in other two region.If
Calculated first box thickness h1 is maximum, then with the material thickness of the corresponding transparent planar layer 23 in Zone R domain(Preferably 0)As base
Standard calculates the material thickness in the region G and the corresponding transparent planar layer 23 of B area according to differences in material thickness, needed for finally making
The transparent planar layer 23 of array substrate 2.
23 layers of the transparent planar is preferably but not limited to as OC glue.
Required array substrate 2 is fabricated to different height towards liquid crystal layer 3 by the production method on one side, so that required liquid
The box thickness of crystal display is equal for non-uniform throughout, then corresponding sub-pixel of arranging in pairs or groups, to control required liquid crystal display red
All there is required OFF state exitance simultaneously on optical band, blue wave band and green light band, it is equal everywhere compared to existing box thickness
Even equal regular liquid crystal display can improve the OFF state effect of liquid crystal display, so that the liquid crystal display of normally black mode
In OFF state, the liquid crystal display of more black, normal white mode is whiter in OFF state, reaches the mesh of high contrast, high NTSC, low colour cast
's.
The production method is particularly suitable for OFF state effect to the thick sensitive distortion type liquid crystal display of box, but to non-distorted type
Liquid crystal display is equally applicable.
Embodiment two
As shown in figure 4, a kind of array substrate 2, towards liquid crystal layer 3 one side in the Zone R domain for corresponding to R sub-pixel, correspond to G
It is respectively provided with different height in the region G of sub-pixel and the B area corresponding to B sub-pixel, so that required liquid crystal display is in R
Region has third box thickness h3 with the second box thickness h2 and in B area with the first box thickness h1, in the region G, to have an institute simultaneously
R wave band OFF state exitance, G-band OFF state exitance and the B wave band OFF state exitance needed.
Required liquid crystal display refers to having used the liquid crystal display of the array substrate 2, in addition to Zone R domain, the region G and
Box thickness ununiformity between B area it is even it is equal except, the materials such as polaroid, base plate glass, liquid crystal molecule, ITO and RGB ink are equal
Using specification identical with regular liquid crystal display.
In one embodiment, a transparent planar layer 23 is covered on the tft array layer 22 of the array substrate 2, it is described
Transparent planar layer 23 is respectively provided with different material thickness in Zone R domain, the region G and B area, so that its court of array substrate 2
Different height is respectively provided in Zone R domain, the region G and B area to the one side of liquid crystal layer 3.
The transparent planar layer 23 is preferably but not limited to as OC glue.
Embodiment three
As shown in figure 4, a kind of liquid crystal display, including array substrate 2 described in embodiment two.
Embodiments of the present invention above described embodiment only expresses, the description thereof is more specific and detailed, but can not
Therefore limitations on the scope of the patent of the present invention are interpreted as, as long as skill obtained in the form of equivalent substitutions or equivalent transformations
Art scheme should all be fallen within the scope and spirit of the invention.
Claims (9)
1. a kind of production method of array substrate, which is characterized in that including:
Step 1:OFF state according to multiple regular liquid crystal displays is emitted spectrum and its corresponding box is thick, establishes OFF state emergent light
Spectrum-box thickness correlation model;
Step 2:It is emitted spectrum-box thickness correlation model according to the OFF state established, is calculated and is respectively reached required R wave band OFF state and go out
When penetrating rate, G-band OFF state exitance and B wave band OFF state exitance, corresponding first box is thick, the second box is thick and third box
It is thick;
Step 3:, second box thickness thick according to calculated first box and third box are thick, array substrate needed for making, required array base
The one side of plate towards liquid crystal layer in the Zone R domain corresponding to R sub-pixel, the region G corresponding to G sub-pixel and corresponds to B sub-pixel
B area on be respectively provided with different height so that required liquid crystal display has in Zone R domain, the first box is thick, has in the region G
Second box is thick and has third box thick in B area.
2. the production method of array substrate according to claim 1, which is characterized in that in step 3, required array substrate
Tft array layer on be covered with a transparent planar layer, the transparent planar layer is respectively provided in Zone R domain, the region G and B area
Different material thickness, so that the one side of required array substrate towards liquid crystal layer is respectively provided in Zone R domain, the region G and B area
Different height.
3. the production method of array substrate according to claim 2, which is characterized in that step 3 includes:
Step 3.1:, second box thickness thick according to calculated first box and third box are thick, calculate the transparent planar layer in Zone R
Differences in material thickness between domain, the region G and B area;
Step 3.2:According to calculated differences in material thickness, the transparent planar layer of array substrate needed for making.
4. the production method of array substrate according to claim 1 to 3, which is characterized in that step 1 includes:
Step 1.1:The Jones matrix for obtaining multiple regular liquid crystal displays is solved respectively, and each regular liquid crystal display has not
Same box is thick;
Step 1.2:According to each Jones matrix obtained, the OFF state outgoing spectrum of each regular liquid crystal display is extrapolated;
Step 1.3:It is thick according to each OFF state outgoing spectrum obtained and its corresponding box, establish OFF state outgoing spectrum-box thickness phase
Close model.
5. the production method of array substrate according to claim 1 to 3, which is characterized in that the OFF state emergent light
Spectrum-box thickness correlation model includes that R wave band OFF state exitance-box of the light after the regular liquid crystal display being not powered on is thick related
Model, G-band OFF state exitance-box thickness correlation model and B wave band OFF state exitance-box thickness correlation model.
6. the production method of array substrate according to claim 4, which is characterized in that step 1.3 includes:
Step 1.3.1:From each OFF state of acquisition outgoing spectrum, the R wave band for respectively obtaining each regular liquid crystal display is closed
State exitance, G-band OFF state exitance and B wave band OFF state exitance;
Step 1.3.2:According to obtained each R wave band OFF state exitance, G-band OFF state exitance and B wave band OFF state exitance
And its discrete point of corresponding box thickness, establish R wave band OFF state exitance-box thickness correlation model, G-band respectively using regression equation
OFF state exitance-box thickness correlation model and B wave band OFF state exitance-box thickness correlation model.
7. a kind of array substrate, which is characterized in that it is corresponding to the Zone R domain of R sub-pixel, corresponding to towards the one side of liquid crystal layer
It is respectively provided with different height in the region G of G sub-pixel and the B area corresponding to B sub-pixel, so that required liquid crystal display exists
Zone R domain is thick with the first box, have the second box thick in the region G and has that third box is thick in B area, with and meanwhile there is required R
Wave band OFF state exitance, G-band OFF state exitance and B wave band OFF state exitance.
8. array substrate according to claim 7, which is characterized in that a transparent planar layer is covered on its tft array layer,
The transparent planar layer is respectively provided with different material thickness in Zone R domain, the region G and B area, so that the array substrate direction
The one side of liquid crystal layer is respectively provided with different height in Zone R domain, the region G and B area.
9. a kind of liquid crystal display, which is characterized in that including array substrate described in claim 7 or 8.
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CN104157217A (en) * | 2014-07-22 | 2014-11-19 | 四川虹视显示技术有限公司 | OLED (organic light emitting diode) device without circular polarizer |
CN106094322A (en) * | 2016-08-16 | 2016-11-09 | 京东方科技集团股份有限公司 | A kind of color membrane substrates and preparation method thereof |
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EP0821261B1 (en) * | 1992-06-26 | 2001-11-14 | Sharp Kabushiki Kaisha | Reflective type liquid crystal display device |
CN1270326A (en) * | 1999-04-12 | 2000-10-18 | 松下电器产业株式会社 | Reflective color liquid crystal display unit |
CN103033969A (en) * | 2013-01-05 | 2013-04-10 | 北京三五九投资有限公司 | Method for preparing printed flexible display module based on double-layer PDLC (Polymer Dispersed Liquid Crystal) |
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