CN108840578A - A kind of preparation method of the corrosion-resistant low-radiation film material of dense form - Google Patents
A kind of preparation method of the corrosion-resistant low-radiation film material of dense form Download PDFInfo
- Publication number
- CN108840578A CN108840578A CN201810736387.5A CN201810736387A CN108840578A CN 108840578 A CN108840578 A CN 108840578A CN 201810736387 A CN201810736387 A CN 201810736387A CN 108840578 A CN108840578 A CN 108840578A
- Authority
- CN
- China
- Prior art keywords
- parts
- corrosion
- preparation
- stirred
- film material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The present invention relates to a kind of preparation methods of the corrosion-resistant low-radiation film material of dense form, belong to technology field of membrane materials.The present invention, which uses, to be prepared tin dioxide material and plays steric hindrance in the clad that micelle surface is formed by dispersant-coated, so that intergranular Van der Waals force weakens significantly, the present invention passes through stannic oxide and the compound preparation target material of silica solution simultaneously, it is formed in silica solution by tin dioxide material through structure and in use, TiNx forms unsaturated key, it can slowly be combined to form Ti-N-O and Ti-O key with O in air, it is expanded in TiNx film, its surface generates compression, therefore TiNx film surface is fine and close, this result has closure function to coating surface, it can prevent its further oxidative attack, improve the corrosion resistance of material.Sputtering preparation will control distance between substrate and target, nitrogen flow in the present invention, control modified target as sputter power, and after sputtering modified film, pressurization is passed through nitrogen and adjusts flow.
Description
Technical field
The present invention relates to a kind of preparation methods of the corrosion-resistant low-radiation film material of dense form, belong to technology field of membrane materials.
Background technique
Low emissivity glass has obtained large-scale application due to outstanding contributions in terms of building energy efficiency, in western countries.
Continuous attention with China to energy conservation and environmental protection technology, demand of the China to low emissivity glass also gradually increase.And western countries
Technical monopoly has been carried out to the production of low emissivity glass, in order to obtain the low emissivity glass of function admirable with lower price, I
Be badly in need of developing the low emissivity glass with independent intellectual property right, function admirable.At the same time, in order to be more advantageous to Low emissivity
The large-scale industrial production of glass, we also need to explore new film structure, select new material and new process, enable compatriots
Economical low emissivity glass good, cheap using energy-saving effect early.
At present in the domestic market, mainly have online low emissivity glass, conventional offline low emissivity glass and it is novel can strange land
Process low emissivity glass these three types product.With the requirement for proposing progress strange land processing to offline low emissivity glass, gradually propose
Requirement to offline low emissivity glass mechanically and chemically stability.By one, vicennial development, the big glass of domestic contrast
Manufacturing enterprise, such as southern glass, Shanghai credit China and Grant have all been mass produced low emissivity glass, to Low emissivity glass
The universal of glass plays very big impetus, makes it using more and more extensive, makes more for building this energy conservation and produce
Product play outstanding contributions to reduce energy consumption.And silver is silver-colored not wear-resisting, also not corrosion-resistant, the low emissivity glass in low-radiation film
The effect that Low emissivity can have been gradually lost with the destruction of silverskin, so to produce the low spoke with excellent chemical stability
Glass is penetrated, to prolong its service life.Recently, with the continuous continuous development improved with coating technique of film structure, production
Provide can strange land processing offline low emissivity glass become possibility.This low emissivity glass is able to achieve long distance transportation and again
Processing, greatly reduces its use cost, plays outstanding contributions to the popularization of low emissivity glass.Therefore selection suitable material
As dielectric layer and outermost layer protective layer, prepare with excellent optical property, low radiance, excellent chemical stability
It is very important with the low emissivity glass of mechanical performance.
Titanium nitride is a kind of ganoine thin film, is corroded with high intensity, high rigidity, acid resistance and wear-resistant.And certain N/Ti
The titanium nitride membrane of atomic ratio has the golden yellow as gold.These performances are widely used titanium nitride membrane, such as
In terms of machining and manufacturing field, textile industry field of corrosion prevention and decorative coveringn.Titanium nitride also has good conduction
Property and metallic reflection ratio, and solar energy can selectively be absorbed, this makes it be used as solar control in field of solar energy
Window.Titanium nitride membrane has very high transmitance and lower resistivity in visible region, and in mid and far infrared area, there are also higher
Reflectivity, there is scholar to be used as low radiation film functional membrane, the low emissivity glass of single-layer nitride titanium produced, in near-infrared
The reflectivity in light area is up to 40% or more, and the mid and far infrared reflectivity of film is 71.5%, but Low emissivity effect is less desirable, radiation
Rate is relatively high, also needs to further decrease its radiance.
Summary of the invention
The technical problems to be solved by the invention：For the problem that existing low radiation film corrosion resistance is poor, provide
A kind of preparation method of the corrosion-resistant low-radiation film material of dense form.
In order to solve the above technical problems, the technical solution adopted by the present invention is that：
（1）According to parts by weight, 45~50 parts of dehydrated alcohols, 3~5 parts of ytterbium nitrates, 10~15 parts of stannic chlorides, 3~5 are weighed respectively
Part cetyl trimethylammonium bromide is placed in a beaker, and is stirred and stands 6~8h, collects mixed solution；
（2）In mass ratio 1：10, it is still aging after being added dropwise to complete to mixed solution and dripping ammonium hydroxide, it is centrifugated, collects
Lower layer's gel simultaneously washs, and collects coagulant liquid；
（3）According to parts by weight, 45~50 parts of dehydrated alcohols, 10~15 parts of 25% acetic acid of mass fraction and 10~15 are weighed respectively
Part butyl titanate is placed in a beaker, and is stirred to obtain matrix liquid, then according to parts by weight, weighs 45~50 parts of deionizations respectively
Water, 10~15 parts of dehydrated alcohols and 10~15 parts of 1% nitric acid of mass fraction are stirred to obtain modification liquid, then in mass ratio 1：3, it will
Modification liquid is added dropwise in matrix liquid, after being added dropwise to complete, is stirred and is stood, and matrix sol solutions are collected to obtain；
（4）In mass ratio 1：1, matrix sol solutions and coagulant liquid are stirred and are poured into mold, will be risen after mold drying
Temperature heats and keeps the temperature calcining, and standing is cooled to room temperature, and obtains modified target；
（5）It takes clean glass slide and sputters preparation, the corrosion-resistant low-radiation film material of dense form can be obtained.
Step（2）The ammonium hydroxide drop rate is 2~3mL/min.
Step（4）The heating, which is heated to be, is warming up to 1000~1100 DEG C by 10 DEG C/min.
Step（5）The sputtering be prepared as control substrate and target between distance be 10cm, background vacuum be 5 ×
10-3Pa, controlling nitrogen flow at room temperature is 1.8 × 10-3m3/ h, controlling modified target as sputter power is 500W, and sputtering is modified
After film, stands 10min and open silver-colored target radio-frequency power supply preheating, close reaction gas nitrogen, be pressurized to Ar build-up of luminance and adjust pressure
By force to 1Pa, it is passed through nitrogen and adjusts flow to 45~50mL/min, open baffle and prepare.
The present invention is compared with other methods, and advantageous effects are：
Technical solution of the present invention is using the clad for preparing tin dioxide material and being formed by dispersant-coated on micelle surface
Play steric hindrance, so that intergranular Van der Waals force weakens significantly, while technical solution of the present invention passes through stannic oxide
With the compound preparation target material of silica solution, formed in silica solution by tin dioxide material through structure and in use process
In, TiNx forms unsaturated key, can slowly be combined to form Ti-N-O and Ti-O key with O in air, in TiNx film
Expansion, surface generates compression, therefore TiNx film surface is fine and close, and this result has closure function to coating surface, can prevent
Its further oxidative attack, improves the corrosion resistance of material.
Specific embodiment
According to parts by weight, respectively weigh 45~50 parts of dehydrated alcohols, 3~5 parts of ytterbium nitrates, 10~15 parts of stannic chlorides, 3~
5 parts of cetyl trimethylammonium bromides are placed in a beaker, and are stirred juxtaposition and are stood 6~8h at room temperature, collect mixed solution
And in mass ratio 1：10, to 18% ammonium hydroxide of mixed solution and dripping mass fraction, control ammonium hydroxide drop rate is 2~3mL/min,
After being added dropwise to complete, still aging 2~3h is placed in 10~15min of centrifuge separation under 1200~1500r/min, collects lower layer
Gel is simultaneously washed 3~5 times with 50% ethanol solution of mass fraction, collects coagulant liquid；According to parts by weight, 45~50 are weighed respectively
Part dehydrated alcohol, 10~15 parts of 25% acetic acid of mass fraction and 10~15 parts of butyl titanates are placed in a beaker, and are stirred
Matrix liquid, then according to parts by weight, 45~50 parts of deionized waters, 10~15 parts of dehydrated alcohols and 10~15 parts of quality are weighed respectively
1% nitric acid of score is stirred to obtain modification liquid, then in mass ratio 1：3, modification liquid is added dropwise in matrix liquid, time for adding is controlled
It is stirred and stands after being added dropwise to complete for 25~30min, collect to obtain matrix sol solutions；In mass ratio 1：1, matrix is molten
Glue and coagulant liquid are stirred and are poured into mold, mold are placed at 75~85 DEG C dry 1~2h, then press 10 DEG C/min
1000~1100 DEG C are warming up to, heat preservation is calcined and stood and is cooled to room temperature, and modified target is obtained；It takes clean glass slide and controls base
Distance is 10cm between material and target, and background vacuum is 5 × 10-3Pa, controlling nitrogen flow at room temperature is 1.8 × 10-3m3/
H, controlling modified target as sputter power is 500W, after sputtering modified film, stands 10min and opens silver-colored target radio-frequency power supply preheating,
Reaction gas nitrogen is closed, Ar build-up of luminance is pressurized to and adjusts pressure to 1Pa, be passed through nitrogen and adjust flow to 45~50mL/
Min opens baffle and prepares, can obtain the corrosion-resistant low-radiation film material of dense form.
According to parts by weight, 45 parts of dehydrated alcohols, 3 parts of ytterbium nitrates, 10 parts of stannic chlorides, 3 parts of cetyls three are weighed respectively
Methyl bromide ammonium is placed in a beaker, and is stirred juxtaposition and is stood 6h at room temperature, collects mixed solution and in mass ratio 1：10, it is right
18% ammonium hydroxide of mixed solution and dripping mass fraction, control ammonium hydroxide drop rate is 2mL/min, after being added dropwise to complete, is stood old
Change 2h, be placed under 1200r/min and be centrifugated 10min, collect lower layer's gel and washs 3 with 50% ethanol solution of mass fraction
It is secondary, collect coagulant liquid；According to parts by weight, 45 parts of dehydrated alcohols, 10 parts of 25% acetic acid of mass fraction and 10 parts of titaniums are weighed respectively
Sour four butyl esters are placed in a beaker, and are stirred to obtain matrix liquid, then according to parts by weight, weigh 45 parts of deionized waters, 10 parts respectively
Dehydrated alcohol and 10 parts of 1% nitric acid of mass fraction are stirred to obtain modification liquid, then in mass ratio 1：3, modification liquid is added dropwise to base
In body fluid, control time for adding is that 25min is stirred and stands after being added dropwise to complete, and collects to obtain matrix sol solutions；By matter
Measure ratio 1：1, matrix sol solutions and coagulant liquid are stirred and are poured into mold, mold is placed at 75 DEG C dry 1h, then
1000 DEG C are warming up to by 10 DEG C/min, heat preservation is calcined and stood and is cooled to room temperature, and modified target is obtained；Take clean glass slide and control
Distance is 10cm between substrate and target processed, and background vacuum is 5 × 10-3Pa, at room temperature control nitrogen flow be 1.8 ×
10-3m3/ h, controlling modified target as sputter power is 500W, after sputtering modified film, stands 10min and opens silver-colored target radio-frequency power supply
Preheating closes reaction gas nitrogen, is pressurized to Ar build-up of luminance and adjusts pressure to 1Pa, be passed through nitrogen and adjust flow to 45mL/
Min opens baffle and prepares, can obtain the corrosion-resistant low-radiation film material of dense form.
According to parts by weight, 48 parts of dehydrated alcohols, 4 parts of ytterbium nitrates, 12 parts of stannic chlorides, 4 parts of cetyls three are weighed respectively
Methyl bromide ammonium is placed in a beaker, and is stirred juxtaposition and is stood 7h at room temperature, collects mixed solution and in mass ratio 1：10, it is right
18% ammonium hydroxide of mixed solution and dripping mass fraction, control ammonium hydroxide drop rate is 2mL/min, after being added dropwise to complete, is stood old
Change 2h, be placed under 1350r/min and be centrifugated 12min, collect lower layer's gel and washs 4 with 50% ethanol solution of mass fraction
It is secondary, collect coagulant liquid；According to parts by weight, 48 parts of dehydrated alcohols, 12 parts of 25% acetic acid of mass fraction and 12 parts of titaniums are weighed respectively
Sour four butyl esters are placed in a beaker, and are stirred to obtain matrix liquid, then according to parts by weight, weigh 48 parts of deionized waters, 12 parts respectively
Dehydrated alcohol and 12 parts of 1% nitric acid of mass fraction are stirred to obtain modification liquid, then in mass ratio 1：3, modification liquid is added dropwise to base
In body fluid, control time for adding is that 28min is stirred and stands after being added dropwise to complete, and collects to obtain matrix sol solutions；By matter
Measure ratio 1：1, matrix sol solutions and coagulant liquid are stirred and are poured into mold, mold is placed at 80 DEG C dry 1h, then
1050 DEG C are warming up to by 10 DEG C/min, heat preservation is calcined and stood and is cooled to room temperature, and modified target is obtained；Take clean glass slide and control
Distance is 10cm between substrate and target processed, and background vacuum is 5 × 10-3Pa, at room temperature control nitrogen flow be 1.8 ×
10-3m3/ h, controlling modified target as sputter power is 500W, after sputtering modified film, stands 10min and opens silver-colored target radio-frequency power supply
Preheating closes reaction gas nitrogen, is pressurized to Ar build-up of luminance and adjusts pressure to 1Pa, be passed through nitrogen and adjust flow to 50mL/
Min opens baffle and prepares, can obtain the corrosion-resistant low-radiation film material of dense form.
According to parts by weight, 50 parts of dehydrated alcohols, 5 parts of ytterbium nitrates, 15 parts of stannic chlorides, 5 parts of cetyls three are weighed respectively
Methyl bromide ammonium is placed in a beaker, and is stirred juxtaposition and is stood 8h at room temperature, collects mixed solution and in mass ratio 1：10, it is right
18% ammonium hydroxide of mixed solution and dripping mass fraction, control ammonium hydroxide drop rate is 3mL/min, after being added dropwise to complete, is stood old
Change 3h, be placed under 1500r/min and be centrifugated 15min, collect lower layer's gel and washs 5 with 50% ethanol solution of mass fraction
It is secondary, collect coagulant liquid；According to parts by weight, 50 parts of dehydrated alcohols, 15 parts of 25% acetic acid of mass fraction and 15 parts of titaniums are weighed respectively
Sour four butyl esters are placed in a beaker, and are stirred to obtain matrix liquid, then according to parts by weight, weigh 50 parts of deionized waters, 15 parts respectively
Dehydrated alcohol and 15 parts of 1% nitric acid of mass fraction are stirred to obtain modification liquid, then in mass ratio 1：3, modification liquid is added dropwise to base
In body fluid, control time for adding is that 30min is stirred and stands after being added dropwise to complete, and collects to obtain matrix sol solutions；By matter
Measure ratio 1：1, matrix sol solutions and coagulant liquid are stirred and are poured into mold, mold is placed at 85 DEG C dry 2h, then
1100 DEG C are warming up to by 10 DEG C/min, heat preservation is calcined and stood and is cooled to room temperature, and modified target is obtained；Take clean glass slide and control
Distance is 10cm between substrate and target processed, and background vacuum is 5 × 10-3Pa, at room temperature control nitrogen flow be 1.8 ×
10-3m3/ h, controlling modified target as sputter power is 500W, after sputtering modified film, stands 10min and opens silver-colored target radio-frequency power supply
Preheating closes reaction gas nitrogen, is pressurized to Ar build-up of luminance and adjusts pressure to 1Pa, be passed through nitrogen and adjust flow to 50mL/
Min opens baffle and prepares, can obtain the corrosion-resistant low-radiation film material of dense form.
Reference examples：The low-radiation film material of Dongguan company production.
The low-radiation film material of example and reference examples is detected, specific detection is as follows：
Square resistance：It is measured using the double electrical measurement four-point probes of the SDY-5 type of Guangzhou Semiconductor Material Inst.'s production.
Thickness：This experiment detects film thickness using the XP-100 type step instrument test of U.S. AMBIOS.
Resistance to hydrogen sulfide：At normal temperature, by film sample in certain density H2After corroding a period of time in S gas, test
Its visible transmission spectrum judges the size of extent of corrosion according to the variation of the visible transmission spectrum of corrosion front and back.
Radiance：Reference standard is for GB/T2680《Building glass visible transmission ratio, the direct transmittance of sunlight, too
The measurement of positive energy total transmittance, ultraviolet (uv) transmission when in relation to glass pane parameter》, the radiance of experiment with computing sample.
Specific testing result such as table 1.
1 performance characterization contrast table of table
As shown in Table 1, low-radiation film material prepared by the present invention has good corrosion-resistant and Low emissivity effect.
Claims (4)
1. a kind of preparation method of the corrosion-resistant low-radiation film material of dense form, it is characterised in that specifically preparation step is：
（1）According to parts by weight, 45~50 parts of dehydrated alcohols, 3~5 parts of ytterbium nitrates, 10~15 parts of stannic chlorides, 3~5 are weighed respectively
Part cetyl trimethylammonium bromide is placed in a beaker, and is stirred and stands 6~8h, collects mixed solution；
（2）In mass ratio 1：10, it is still aging after being added dropwise to complete to mixed solution and dripping ammonium hydroxide, it is centrifugated, collects
Lower layer's gel simultaneously washs, and collects coagulant liquid；
（3）According to parts by weight, 45~50 parts of dehydrated alcohols, 10~15 parts of 25% acetic acid of mass fraction and 10~15 are weighed respectively
Part butyl titanate is placed in a beaker, and is stirred to obtain matrix liquid, then according to parts by weight, weighs 45~50 parts of deionizations respectively
Water, 10~15 parts of dehydrated alcohols and 10~15 parts of 1% nitric acid of mass fraction are stirred to obtain modification liquid, then in mass ratio 1：3, it will
Modification liquid is added dropwise in matrix liquid, after being added dropwise to complete, is stirred and is stood, and matrix sol solutions are collected to obtain；
（4）In mass ratio 1：1, matrix sol solutions and coagulant liquid are stirred and are poured into mold, will be risen after mold drying
Temperature heats and keeps the temperature calcining, and standing is cooled to room temperature, and obtains modified target；
（5）It takes clean glass slide and sputters preparation, the corrosion-resistant low-radiation film material of dense form can be obtained.
2. a kind of preparation method of the corrosion-resistant low-radiation film material of dense form according to claim 1, it is characterised in that：Step
Suddenly（2）The ammonium hydroxide drop rate is 2~3mL/min.
3. a kind of preparation method of the corrosion-resistant low-radiation film material of dense form according to claim 1, it is characterised in that：Step
Suddenly（4）The heating, which is heated to be, is warming up to 1000~1100 DEG C by 10 DEG C/min.
4. a kind of preparation method of the corrosion-resistant low-radiation film material of dense form according to claim 1, it is characterised in that：Step
Suddenly（5）It is 10cm that the sputtering, which is prepared as distance between control substrate and target, and background vacuum is 5 × 10-3Pa, in room temperature
Lower control nitrogen flow is 1.8 × 10-3m3/ h, controlling modified target as sputter power is 500W, after sputtering modified film, is stood
10min simultaneously opens silver-colored target radio-frequency power supply preheating, closes reaction gas nitrogen, is pressurized to Ar build-up of luminance and adjusts pressure to 1Pa, be passed through
Nitrogen simultaneously adjusts flow to 45~50mL/min, opens baffle and prepares.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810736387.5A CN108840578A (en) | 2018-07-06 | 2018-07-06 | A kind of preparation method of the corrosion-resistant low-radiation film material of dense form |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810736387.5A CN108840578A (en) | 2018-07-06 | 2018-07-06 | A kind of preparation method of the corrosion-resistant low-radiation film material of dense form |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108840578A true CN108840578A (en) | 2018-11-20 |
Family
ID=64201227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810736387.5A Pending CN108840578A (en) | 2018-07-06 | 2018-07-06 | A kind of preparation method of the corrosion-resistant low-radiation film material of dense form |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108840578A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1675400A (en) * | 2002-06-17 | 2005-09-28 | 日本板硝子株式会社 | Article coated with titanium compound film, process for producing the article and sputtering target for use in the film coating |
| CN102320824A (en) * | 2011-06-01 | 2012-01-18 | 内蒙古工业大学 | A kind of preparation method of metal ion doped titanium dioxide target and thus obtained target |
-
2018
- 2018-07-06 CN CN201810736387.5A patent/CN108840578A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1675400A (en) * | 2002-06-17 | 2005-09-28 | 日本板硝子株式会社 | Article coated with titanium compound film, process for producing the article and sputtering target for use in the film coating |
| CN102320824A (en) * | 2011-06-01 | 2012-01-18 | 内蒙古工业大学 | A kind of preparation method of metal ion doped titanium dioxide target and thus obtained target |
Non-Patent Citations (1)
| Title |
|---|
| 蒋攀: "TiNx/Ag/TiNx低辐射膜的制备及性能研究", 《中国优秀硕士学位论文全文数据库 工程科技I辑》 * |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Du et al. | Optimization design of Ti0. 5Al0. 5N/Ti0. 25Al0. 75N/AlN coating used for solar selective applications | |
| Wang et al. | Polychromic Al–AlN cermet solar absorber coating with high absorption efficiency and excellent durability | |
| CN104961354B (en) | A kind of preparation method of high visible light transmissivity vanadium dioxide base film | |
| CN103388917B (en) | A kind of solar selectively absorbing coating and its preparation method | |
| CN104960277B (en) | Thermal-insulating heat-preserving laminated safety glass and manufacturing method thereof | |
| CN105084778B (en) | A kind of green low radiation coated glass and preparation method thereof | |
| CN104724951B (en) | Dimming glass thin-film material and preparation method thereof | |
| CN101724812A (en) | Coating and preparation method thereof | |
| CN103162452B (en) | Inoxidizability solar spectrum selective absorbing coating and preparation method thereof | |
| CN102702877A (en) | Preparation process of insulating, self-cleaning and transparent fluorocarbon coating | |
| CN104250068A (en) | Vanadium dioxide film system for intelligent energy saving window and preparation method thereof | |
| CN110627055A (en) | Vanadium dioxide and graphene composite film structure and preparation method and application thereof | |
| CN101269918B (en) | Method for preparing colorful vanadium dioxide thermo color glass | |
| CN101280413A (en) | Low temperature deposition method of hypovanadic oxide thin film on glass | |
| CN102653455B (en) | Low-emissivity, low-emissivity coated glass and preparation method thereof | |
| CN102092960A (en) | Low emissivity glass | |
| CN206157058U (en) | But high energy -conserving glass of low radiation of tempering that passes through | |
| CN102219396A (en) | Temperable gold low-emissivity coated glass and manufacturing method thereof | |
| Ehrmann et al. | The influence of process parameters and coating properties of double glazing coated with transparent conducting oxides on the efficiency of solar-thermal flat-plate collectors | |
| CN107487991B (en) | A kind of vanadium dioxide multilayer film and preparation method thereof | |
| CN108840578A (en) | A kind of preparation method of the corrosion-resistant low-radiation film material of dense form | |
| CN103032977A (en) | Medium-temperature solar energy selective absorbing coating and preparation method thereof | |
| CN103137717A (en) | Copper doped tin oxide transparent conductive membrane and preparation method thereof | |
| CN105289588A (en) | Palladium alloy catalytic membrane material and preparation method thereof | |
| CN101648778A (en) | Low-radiation glass |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20181120 |