CN108807496A - Organic EL display panel and display device - Google Patents
Organic EL display panel and display device Download PDFInfo
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- CN108807496A CN108807496A CN201810871655.4A CN201810871655A CN108807496A CN 108807496 A CN108807496 A CN 108807496A CN 201810871655 A CN201810871655 A CN 201810871655A CN 108807496 A CN108807496 A CN 108807496A
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- pixel electrode
- passivation layer
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/123—Connection of the pixel electrodes to the thin film transistors [TFT]
Abstract
The present invention relates to a kind of organic EL display panels, including passivation layer and pixel electrode;Pixel electrode is formed on the passivation layer;At least one pixel electrode is partially submerged into the passivation layer.In this way, by being partially submerged into pixel electrode in passivation layer, it on the one hand can effective dispersive stress when display panel is impacted or is bent;On the other hand the contact area between pixel electrode and passivation layer is increased, to make that there is preferably binding force between pixel electrode and passivation layer, is adhered to by Van der Waals force compared between film layer in existing design, improves the adhesiveness of electrode.In this way, effectively avoiding pixel electrode that fracture occurs or is partially stripped, effectively improves the counter-bending of OLED display panel and bears to fall the reliability of impact strength.A kind of display device is also provided.
Description
Technical field
The present invention relates to display technology fields, more particularly to a kind of organic EL display panel and display device.
Background technology
In recent years, with the progress of the development and science and technology of society, the technology development of intelligent terminal and wearable device
Make rapid progress, the requirement for FPD is also gradually increased, and demand is also more and more diversified.OLED(Organic Light-
Emitting Diode, organic LED display device) display device is due to lower in power consumption compared with liquid crystal display
While there is higher brightness and response speed, and advantage flexible, that flexibility is good, therefore answered more and more widely
For in the smart terminal products such as mobile phone, tablet computer even TV, becoming the main flow display of display field.
To pursue more preferably visual experience and sense of touch experience, to effective display surface of OLED organic EL display panels
Product and thickness requirement are higher and higher, but as the increase of effective display area and its thickness are thinning, ORGANIC ELECTROLUMINESCENCE DISPLAYS face
The intensity of plate decreases, especially flexibility OLED organic EL display panels in multiple bending or curly course and
When bearing to fall shock, it is bent region and is hit region and full-color cannot show the displays such as blackspot, speck, variegation easily occur not
It is good.
Therefore, the intensity reliability for how improving OLED organic EL display panels, be those skilled in the art urgently
Problem to be solved.
Invention content
Based on this, it is necessary to easily be shown in being bent and bearing to fall shock for organic EL display panel
Bad problem provides a kind of organic EL display panel and display device improving the above problem.
A kind of organic EL display panel, including:
The thin film transistor (TFT) being set on underlay substrate;
Passivation layer, the passivation layer formation are configured to have the exposure film brilliant on the thin film transistor (TFT)
The contact hole of the drain electrode of body pipe;
Pixel electrode, the pixel electrode are formed on the passivation layer, and are connected to by the contact hole described thin
The drain electrode of film transistor;
Wherein, at least one pixel electrode is partially submerged into the passivation layer.
Optionally, the organic EL display panel further includes the first recessed portion being formed on the passivation layer;
The part of the pixel electrode is located in first recessed portion.
Optionally, the depth of first recessed portion is more than the pixel electrode being located in first recessed portion
Thicknesses of layers.
Optionally, the organic EL display panel further includes pixel defining layer;
The pixel defining layer is formed on the passivation layer, and define for exposing the pixel electrode at least one
Partial pixel definition opening;
The pixel electrode has by the effective coverage of pixel definition opening exposure;Described in the pixel electrode insertion
The part of passivation layer is located at least in the effective coverage of the pixel electrode.
Optionally, the organic EL display panel further includes pixel defining layer;
The pixel defining layer is formed on the passivation layer, and define for exposing the pixel electrode at least one
Partial pixel definition opening;
The pixel defining layer is partially submerged into the passivation layer.
Optionally, the organic EL display panel further includes the groove being formed on the passivation layer;The picture
Plain definition layer is covered in the groove;
At least part setting of each groove around a pixel electrode.
Optionally, the organic EL display panel further includes pixel defining layer, and is covered in the pixel and determines
Cathode on adopted layer;
The cathode is partially submerged into the pixel defining layer.
Optionally, the organic EL display panel further includes being formed in the pixel defining layer to deviate from the passivation
Second recessed portion of one side surface of layer;
The part of the cathode is located in second recessed portion.
Optionally, the organic EL display panel further includes the first recessed portion being formed on the passivation layer;
The part of the pixel electrode is located in first recessed portion;
Second recessed portion towards the passivation layer orthographic projection, it is spaced with first recessed portion.
Display device includes such as the organic EL display panel in above-described embodiment.
Above-mentioned organic EL display panel and display device, by being partially submerged into pixel electrode in passivation layer,
It on the one hand can effective dispersive stress when display panel is impacted or is bent;On the other hand pixel electrode and passivation layer are increased
Between contact area, to make that there is preferably binding force between pixel electrode and passivation layer, compared to film layer in existing design
Between by Van der Waals force adhere to, improve the adhesiveness of electrode.In this way, effectively avoiding pixel electrode that fracture or generation office occurs
Portion is removed, and is effectively improved the counter-bending of OLED display panel and is born to fall the reliability of impact strength.
Description of the drawings
Subpixel area when cathode is not formed for the organic EL display panel in one embodiment of the invention by Fig. 1
Schematic cross-section;
Fig. 2 is that the section of subpixel area when organic EL display panel shown in FIG. 1 is formed with cathode is illustrated
Figure;
Fig. 3 is the flow diagram of the production method of the organic EL display panel in one embodiment of the invention.
Specific implementation mode
To facilitate the understanding of the present invention, below with reference to relevant drawings to invention is more fully described.In attached drawing
Give the preferred embodiment of the present invention.But the present invention can realize in many different forms, however it is not limited to herein
Described embodiment.Keep the understanding to the disclosure more saturating on the contrary, purpose of providing these embodiments is
It is thorough comprehensive.
Unless otherwise defined, all of technologies and scientific terms used here by the article and belong to the technical field of the present invention
The normally understood meaning of technical staff is identical.Used term is intended merely to description tool in the description of the invention herein
The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term " and or " used herein includes one or more phases
Any and all combinations of the Listed Items of pass.
When describing position relationship, unless otherwise defined, when an element such as layer, film or substrate are regarded as another
When element "upper", intermediary element can may be present directly in other elements or also.Furtherly, when layer is regarded as in another layer
When "lower", one or more middle layers can also may be present directly in lower section.It can also understand, when layer is regarded as at two layers
" between " when, can be the sole layer between two layers, or one or more middle layers also may be present.
Using " comprising " described herein, " having " and "comprising", unless having used specific restriction
Term, such as " only ", " by ... form " etc., it otherwise can also add another component.Unless refer on the contrary, otherwise singular shape
The term of formula may include plural form, and it is one that can not be interpreted as its quantity.
It will be appreciated that though various elements can be described using term " first ", " second " etc. herein, but these yuan
Part should not be limited by these terms.These terms are only used to distinguish an element and another element.For example, not taking off
In the case of the scope of the present invention, first element can be referred to as second element, and similarly, and second element can be claimed
For first element.
It is to be further understood that when explaining element, although not being expressly recited, element is construed to include error model
It encloses, which should be in the acceptable deviation range of particular value identified by the skilled person.For example, " big
About ", it " approximation " or " substantially " may mean that in one or more standard deviations, be not limited thereto.
In addition, in the description, phrase " plane distribution schematic diagram " refers to the attached drawing when target part viewed from above,
Phrase " schematic cross-section " refers to attached drawing when passing through the vertically section of cutting target part interception from side.
In addition, attached drawing is not 1:1 ratio is drawn, and the relative size of each element is in the accompanying drawings only illustratively to paint
System, and not necessarily drawn according to actual proportions.
It is wide with flexible, good flexible characteristic with the fast development of OLED display panel technology
General application, compared to traditional TFT-LCD technologies, a big advantage of OLED is can to make the product of folding/rollable.In order to
The flexibility for realizing OLED display panel, must make the substrate of deflection first, secondly, be sealed compared to widely used glass cover-plate
Dress mode, for flexible OLED display panel, thin-film package (Thin Film Encapsulation, TFE) is more closed
It is suitable.
Usually in this encapsulating structure, thin-film encapsulation layer entirely covered cathode, and with the array layer of display panel
(Array) the frame region contact except display area (Active area, AA).But it is limited to structure and material, OLED is aobvious
Show that the counter-bending of panel and the reliability for bearing to fall impact strength be not high.
For bearing to fall bump test, when the falling sphere (steel ball of a diameter of 20mm using 32.65g;Falling height
When 2cm-62.5cm) hitting OLED display panel, thin-film encapsulation layer will be bent downwardly along force direction, and then stress is passed
The structure being handed in thin-film encapsulation layer.Since the stress concentration for being hit moment by falling sphere can not disperse, when falling height is more than
When 10cm, display panel is highly prone to damage, and the region hit is likely to full-color not show, blackspot, speck, variegation occurs
Etc. bad phenomenons.
To solve the problems, such as this in existing design, a kind of mode is to make buffer layer far from screen body emission side, for example, showing
Show and fill Optical transparent adhesive between panel and cover board, but so cause shield body thickness increase to a certain extent, cannot be satisfied compared with
Good visual experience and sense of touch experience, and increase technological process and manufacture difficulty.
Therefore, it is necessary to provide a kind of guarantee thickness and display effect, and flexural strength and bear to fall impact strength
Preferable display panel.
OLED display panel generally includes array substrate, the anode (pixel electrode) in array substrate, OLED and shines
Device and cathode.The principle of luminosity of OLED is semi-conducting material and luminous organic material under electric field driven, is noted by carrier
Enter and composite guide photoluminescence.Specially under certain voltage driving, electrons and holes are respectively from cathode and anode injection migration
To OLED luminescent devices, and it is compounded to form exciton wherein and light emitting molecule is made to excite, the latter sends out by radiative relaxation can
It is light-exposed.
In existing design, each sub-pixel is to be shone or do not shone by tft array circuit control, each sub-pixel
A corresponding anode, cathode is that whole face is covered in pixel defining layer, to provide electronics for OLED luminescent devices.The study found that positive
Pole and cathode are typically to stack to be formed by vacuum deposition in the way of, between layers mostly be attached to each other by Van der Waals force, and
This adhesive force is very weak, but relative stress is stronger.When panel is hit or repeatedly in bending process, thin-film encapsulation layer will be along
Force direction is bent downwardly, and impact force is transferred to the film layers such as cathode, pixel defining layer, anode, passivation layer, to cause to show
The phenomenon that showing panel itself unbalanced stress, anode, cathode is caused to be partially stripped causes to tear what is more, causes to show bad.This
Sample significantly limits the scope of application and bending mode of flexible OLED display panel.
The pixel defining layer is partially submerged by being partially submerged into pixel electrode in passivation layer, cathode in the present invention
It is interior, it on the one hand can effective dispersive stress when display panel is impacted or is bent;On the other hand it is fixed with pixel to increase cathode
The contact area between contact area and pixel electrode and passivation layer between adopted layer, to make cathode and pixel defining layer,
And there is preferably binding force between pixel electrode and passivation layer, it is viscous by Van der Waals force compared between film layer in existing design
It is attached, improve the adhesiveness of electrode.
In this way, effectively avoiding cathode, pixel electrode that fracture occurs or is partially stripped, OLED display panel is effectively improved
It is counter-bending and bear to fall the reliability of impact strength.
It is understood that display panel provided in an embodiment of the present invention, mainly it is applied to screen comprehensively or Rimless
Display panel, naturally it is also possible to which being applied to commonly has in frame or the display panel of narrow frame.
Before being illustrated to the organic EL display panel in the present invention, some terms are explained first
Explanation:
Array substrate:That is TFT (Thin-film transistor, thin film transistor (TFT)) array substrate, refers at least being formed
There is the underlay substrate (for example, substrate that PI materials are formed) of tft array.
Passivation layer:Passivation layer formation is on thin film transistor (TFT), can be by such as silicon oxynitride for example, in some embodiments
The formation of silicon nitride single inorganic layer or multiple inorganic layers formed;In other embodiments, passivation layer can be by organic material
The single-layer or multi-layer that material and/or inorganic material are formed.Specifically, on the one hand passivation layer can be used for protective film transistor, separately
On the one hand since thin film transistor (TFT) has complicated layer structure, top surface may be not to be flat, and passivation layer may be used also
To form sufficiently flat top surface.After the passivation layer is formed, contact hole can be formed in the passivation layer, with exposed film crystalline substance
The source electrode or drain electrode of body pipe.
Fig. 1 shows sub-pixel when cathode is not formed in the organic EL display panel in one embodiment of the invention
The schematic cross-section in region;For ease of description, attached drawing illustrates only and the relevant structure of the embodiment of the present invention.
Refering to attached drawing, which includes array substrate 12, passivation layer 14, pixel electrode 16, has
Machine luminescence unit 19, cathode 11 and encapsulated layer (not shown).
Array substrate 12 includes underlay substrate 122 (for example, PI materials are formed), and is set to the thin of underlay substrate 122
Film transistor (figure is not marked).Certainly, which can also include the film layers such as interlayer insulating film, buffer layer, not make herein
It limits.Passivation layer 14 is formed on thin film transistor (TFT), and is configured to the contact hole with the drain electrode of exposed film transistor.This
On the one hand sample can be used for protective film transistor, on the other hand can also form sufficiently flat top surface.
Pixel electrode 16, i.e. anode are formed on passivation layer 14, and are connected to thin film transistor (TFT) by contact hole above-mentioned
Drain electrode;For ease of description, will be illustrated by taking pixel electrode 16 as an example below.Array substrate 12 has multiple sub-pixel areas
Domain, for example, in some embodiments, array substrate 12 has the second son for emitting the first sub-pixel area domain of feux rouges, emitting blue light
Pixel region, and transmitting green light third subpixel area, one group of the first sub-pixel area domain, the second subpixel area and the
Three subpixel areas may make up a pixel region.
It is appreciated that in some other embodiment, each pixel region also may include other subpixel areas, herein not
It is construed as limiting, for example, may also include the 4th subpixel area of transmitting white light.
In some embodiments, pixel electrode 16 can be transparent electrode, semitransparent electrode or reflecting electrode.For example, working as pixel
Electrode 16 is transparent electrode, and pixel electrode 16 may include such as indium tin oxide (ITO), indium-zinc oxide, zinc oxide, three oxidations
Two indiums, indium potassium oxide or aluminium zinc oxide etc..When pixel electrode 16 be reflecting electrode when, may include silver, magnesium, aluminium, platinum,
The materials such as gold, nickel.
In some embodiments, organic EL display panel further includes pixel defining layer 18, the formation of pixel defining layer 18
In on passivation layer 14, and at least part of each pixel electrode of exposure 16.For example, pixel defining layer 18 can cover each pixel
At least part at the edge of electrode 16, to which at least part of each pixel electrode 16 to be exposed.In this way, pixel is fixed
Adopted layer 18 defines multiple pixel definition openings and the interval region (figure is not marked) between each pixel definition opening, pixel
The middle section of electrode 16 or all parts are open via the pixel definition to be exposed.
In this way, pixel defining layer 18 can increase the end of each pixel electrode 16, and it is formed in each pixel electrode 16
On the distance between opposite electrode (cathode 11), and the antireflection that can prevent the end of pixel electrode 16 from occurring.
It is appreciated that in other embodiments, passivation layer 14 can also be used to limit light-emitting zone, not limit herein
It is fixed.Specifically, passivation layer 14 may be structured to the marginal portion of covering pixel electrode to define pixel definition opening, with limit
Make light-emitting zone;At this point, pixel defining layer 18 need not then be arranged to limit light-emitting zone.
Organic light-emitting units 19 are filled in pixel definition opening.Usually, organic light-emitting units 19, which include at least, shines
Layer, for example, in some embodiments, organic light-emitting units 19 can also include hole injection layer, hole transmission layer, electronic blocking
The film layers such as layer, hole blocking layer, electron transfer layer and electron injecting layer, are not limited thereto.Organic light-emitting units 19 can be with
Such as it is formed using various methods, such as vacuum deposition method, spin-coating method, casting, Langmuir-Blodgett (LB) method, spray
Ink print method, laser printing method, laser induced thermal imaging (LITI) method etc., are not limited thereto.
In some embodiments, cathode 11 can whole face be covered in pixel defining layer 18, in other embodiments, cathode 11 is also
Can whole face be covered on passivation layer 14.Certainly, cathode 11 also can graphically be formed in pixel defining layer in yet other embodiments,
18 or passivation layer 14 on, be not limited thereto.It is lower that silver, lithium, magnesium, calcium, strontium, aluminium, indium constant power function can be used in cathode 11
Metal, or be made of metallic compound or alloy material.For example, pixel definition opening can be covered by the method for vapor deposition
Interval region between interior organic light-emitting units 19 and each pixel definition opening.
Encapsulated layer is set to the side that organic light-emitting units 19 deviate from array substrate 12.It is easily understood that due to organic
Luminous material layer is very sensitive to external environments such as steam and oxygen, if the organic light emitting material in display panel exposed
In having the environment of steam or oxygen, the performance of display panel can be caused drastically to decline or damage completely.Encapsulated layer can be
Organic light-emitting units 19 stop air and steam, to ensure the reliability of display panel.
It is understood that encapsulated layer can be one or more layers structure, it can be organic film or inorganic film, also may be used
It is the laminated construction of organic film and inorganic film.For example, in some embodiments, encapsulated layer may include two layers of inorganic film and one
Layer is located at the organic film between two layers of inorganic film.
In the embodiment of the present invention, at least one pixel electrode 16 is partially submerged into passivation layer 14.In some embodiments,
The first recessed portion 142 is formed on passivation layer 14;The part of pixel electrode 16 is located in the first recessed portion 142, to form picture
The damascene structures of plain electrode 16 being partially submerged into passivation layer 14.Specifically, the first recessed portion 142 may include hole, hole, slot or
At least one of crackle, for example, in some embodiments, it can be by forming multiple insertions in 14 graphical treatment of passivation layer
Then hole carries out the spatter film forming of pixel electrode 16, to make pixel electrode 16 that can be partially submerged into passivation layer 14.Other realities
It applies in example, can form depth can be identical or different, and intersection or disjoint a plurality of groove also can make pixel electrode 16 can portion
Divide in embedded passivation layer 14.
In this way, the contact area between pixel electrode 16 and passivation layer 14 is increased, to increase knot between the two
With joint efforts.When display panel bears to fall shock, impact force is transferred to oled layer, can reduce since outer force effect causes film layer to be shelled
From the problem of, improve in this way display panel flexural strength and bear to fall impact strength.
It is understood that when display panel absorbs impact, impact force is transferred to the film layer mechanism in encapsulated layer.Pixel
Electrode 16 is partially submerged into passivation layer 14, be may also function as the effect of release stress, is further decreased since outer force effect causes
Film layer is removed or the risk of fracture, improves the ability of the resistance to stress of itself of pixel electrode 16.
It will also be appreciated that pixel electrode 16 is multiple with organic light-emitting units 19 and is arranged in a one-to-one correspondence, at this
In technical concept, at least one pixel electrode 16 has above-mentioned Embedded structure.Certainly in some embodiments, also may be used
To be that all pixel electrodes 16 all have above-mentioned Embedded structure, i.e., each pixel electrode 16 is partially submerged into passivation layer 14
It is interior.
It should be pointed out that the first recessed portion 142 also can not exclusively run through passivation layer 14 completely through passivation layer 14,
It is not limited thereto.For example, in some embodiments, the first recessed portion 142 is hole, can be completely through passivation layer 142 or endless
Run through passivation layer 142 entirely;In other embodiment, the first recessed portion 142 includes a plurality of groove, is at this time guarantee passivation layer
Intensity, the first recessed portion 142 can not exclusively run through passivation layer 142.But it should be noted that in the first recessed portion 142 through blunt
Change layer 14 when, should ensure that will not be conducted between pixel electrode 16 and thin film transistor (TFT) and caused by it is bad.
In some embodiments, the depth of the first recessed portion 142 is more than the pixel electrode 16 being located in the first recessed portion 142
Thicknesses of layers.For example, the first recessed portion 142 is groove, in 16 spatter film forming of pixel electrode, pixel electrode 16 is simultaneously not filled by full
Groove, to make pixel electrode 16 also form a recess portion away from the side of passivation layer 14.So it is being subsequently formed pixel defining layer
18 and when organic light-emitting units 19, equally also form the damascene structures of embedded pixel electrode 16.
In this way, the binding force between pixel electrode 16 and pixel defining layer 18 and organic light-emitting units 19 is also added, when
When display panel bears to fall shock, impact force is transferred to oled layer, can reduce since outer force effect leads to asking for film layer stripping
Topic improves the flexural strength of display panel and bears to fall impact strength in this way.
In some embodiments of the present invention, pixel electrode 16 has by the effective coverage of pixel definition opening exposure;Pixel
The part that electrode 16 is embedded in passivation layer 14 is located at least in the effective coverage.
It is readily appreciated that, pixel defining layer 18 defines multiple pixel definition openings, to expose the part area of pixel electrode 16
Domain.Organic light-emitting units 19 are set in pixel definition opening, and the subregion exposed with pixel electrode 16 is in contact, therefore
The region that pixel electrode 16 is in contact with organic light-emitting units 19 is the effective coverage of pixel electrode 16.And by pixel defining layer 18
Due to not contacted with organic light-emitting units 19, this subregion is then known as the non-of pixel electrode 16 in 16 region of pixel electrode of covering
Effective coverage.
Present inventor has found that in the falling sphere reliability test of soft screen, steel ball hits screen in the course of the research,
The bad problem of the display such as the region moment hit full-color cannot show, blackspot occurs in display area, speck, variegation.Mainly
It is because weight is hit moment, stress concentration can not disperse to lead to damaging components, and wherein critically important reason is falling sphere concentration
It is easily peeling-off between the film layer of poor adhesion when panel, it is especially easily peelable between organic light-emitting units 19 and pixel electrode 16,
It shows and fails so as to cause product.
Therefore, the part of the insertion of pixel electrode 16 passivation layer 14 is located at least in the effective coverage of pixel electrode 16, can be preferable
Organic light-emitting units 19 and the contact area of pixel electrode 16 are protected in ground, reduce since outer force effect causes film layer to be removed
The problem of.
In some embodiments of the present invention, pixel defining layer 18 is partially submerged into passivation layer 14, for example, some embodiments
In, fluted 144 are formed on passivation layer 14, pixel defining layer 18 is covered in groove 144.In this way, pixel defining layer can be enhanced
18 with the bond strength of passivation layer 14, further reduce the problem of causing film layer to be removed due to outer force effect, improve display
It the flexural strength of panel and bears to fall impact strength.
It may be noted that pixel defining layer 18 is usually formed by organic material, for example, polyimides, polyamide, phenylpropyl alcohol ring fourth
The organic materials such as alkene, acryl resin or phenolic resin.In some embodiments, passivation layer 14 can be by such as silicon oxynitride or nitrogen
The single inorganic layer or multiple inorganic layers of the formation of SiClx are formed;In other embodiments, passivation layer 14 can be by organic material
And/or the single-layer or multi-layer that inorganic material is formed.It is readily appreciated that, the binding force between inorganic material, generally stronger than organic material
The binding force between binding force and inorganic material and organic material between material.Therefore in some embodiments, pixel defining layer 18
Also organic and/or inorganic materials can be adulterated, for example, tin oxide, silicon nitride and/or nitrogen oxidation tin.During actual fabrication, it can be increased
Deviate from the engaging force of 12 1 side surface of array substrate with passivation layer 14.
It may also be noted that the groove 144 also can not exclusively run through passivation layer 14 completely through passivation layer 14,
This is not construed as limiting.
In some embodiments, at least part setting of each groove 144 around a pixel electrode 16.Inventor studies
It was found that forming groove 144 around pixel electrode 16 in passivation layer 14, and pixel defining layer 18 is made to be partially submerged into groove 144.When
When display panel bears to fall shock, impact force is transferred to pixel defining layer 18 and passivation layer 14, pixel defining layer 18 and passivation
Layer 14 is expanded to its extension direction.Groove 144 is arranged around pixel electrode 16, is similar to enclosure wall shape structure, can play and release
The effect of stress is put, the expansion of pixel defining layer 18 and passivation layer 14 is reduced, to effectively avoid squeezing pixel caused by stress
Electrode 16 and organic light-emitting units 19 and lead to its failure.In addition, when above-mentioned display panel is flexible display panels, additionally it is possible to
Preferably promote the flexibility of flexible display panels.
It is appreciated that in some embodiments, before can surrounding setting one or more around each pixel electrode 16
The groove 144 stated;In other embodiments, one or more grooves above-mentioned can be also set only around partial pixel electrode 16
144, it is not limited thereto.Wherein, multiple refers to being more than or equal to two.
It is to be appreciated that 144 numbers of groove around each pixel electrode 16 can be identical, and it also can be different, it does not limit herein
It is fixed.For bearing to fall shock, in falling bump test, falling sphere is easy to hit among the effective display area domain of display panel
Position, then 144 quantity of groove being located at around the pixel electrode 16 in effective display area domain centre position is more, and is effectively showing
Groove 144 quantity of the region around the pixel electrode 16 of frame region can be reduced suitably.For being repeatedly bent, it is being bent
144 quantity of groove around the pixel electrode 16 in region is more, and the groove 144 around the pixel electrode 16 in un-flexed region counts
Amount can be reduced suitably.
It will also be appreciated that each groove 144 is arranged around a pixel electrode 16, which can be one continuous
The groove 144 of formation also may include multiple sub- grooves 144 that the circumferential intermittent along pixel electrode 16 is arranged, can realize and reduce picture
Plain definition layer 18 and passivation layer 14 bear to hit the purpose of the expansion generated, are not limited thereto.
Sub-pixel when cathode 11 is formed with Fig. 2 shows the organic EL display panel in one embodiment of the invention
The schematic cross-section in region;For ease of description, attached drawing illustrates only and the relevant structure of the embodiment of the present invention.
Referring to Fig.2, in some embodiments of the present invention, cathode 11 is partially submerged into pixel defining layer 18.For example, pixel
Definition layer 18 is formed with the second recessed portion 182 away from a side surface of passivation layer 14;The part of cathode 11 is located at the second recessed portion
In 182, to form the damascene structures of cathode 11 being partially submerged into pixel defining layer 18.Specifically, the second recessed portion 182
It may include at least one of hole, hole, slot or crackle, for example, in some embodiments, it can be by 18 figure of pixel defining layer
Change processing forms multiple embedded holes, 11 layers of cathode is then formed, to make cathode 11 that can be partially submerged into pixel defining layer 18.Separately
In some embodiments, can form depth can be identical or different, and intersection or disjoint a plurality of groove also can make cathode 11 can
It is partially submerged into pixel defining layer 18.
For present inventor the study found that in existing design, each sub-pixel is sent out by tft array circuit control
Light does not shine, each sub-pixel corresponds to a pixel electrode 16, and to be whole face the be covered in pixel defining layer 18 of cathode 11 and
Organic light-emitting units 19, to provide electronics for OLED luminescent devices.The study found that being hit or multiple bending process in panel
In, encapsulated layer will be bent downwardly along force direction, and the probability that cathode 11 is hit is almost 100%, easily lead to cathode 11
The film layer fracture of layer, or it is peeling-off with 16 layers of organic light-emitting units 19 and pixel electrode, it causes to show bad.
By the way that the second recessed portion 182 is arranged in pixel defining layer 18, so that 11 layer segment of cathode is embedded in, enhance cathode 11
With the binding force between pixel defining layer 18, while the combination between organic light-emitting units 19 and cathode 11 is also enhanced indirectly
Power, and then stripping causes to show bad problem between organic light-emitting units 19 and cathode 11 when improving outer force effect, to
It improves the flexural strength of display panel and bears to fall impact strength.
In some embodiments, the second recessed portion 182 towards passivation layer 14 orthographic projection, each other with the first recessed portion 142
Every.For example, in some embodiments, the first recessed portion 142 includes the first groove of the extension of a plurality of lengthwise;Second recessed portion 182
Second groove of the extension including a plurality of lengthwise, the first groove are mutually parallel with the second groove.Second groove is towards passivation layer 14
Interval region of the orthographic projection between each first groove.
It should be understood that for bearing to fall bump test, when the falling sphere (steel of a diameter of 20mm using 32.65g
Ball;Falling height 2cm-62.5cm) when hitting OLED display panel, encapsulated layer will be bent downwardly along force direction, in turn
By the film layer in stress transfer to thin-film encapsulation layer, and if the orthographic projection of the first groove and the second groove on passivation layer 14 each other
It overlaps or partially overlaps, then stress may be caused quickly to be transmitted downwards along the corresponding region of groove, and can not play good
Discharge the effect of stress.Therefore, the orthographic projection when the second recessed portion 182 towards passivation layer 14 and the first recessed portion 142 are mutual
Every, the problem of can reach the effect of preferably release stress, cause film layer to be removed due to outer force effect to further reduce,
It improves the flexural strength of display panel and bears to fall impact strength.
For ease of further understanding technical scheme of the present invention, the embodiment of the present invention also provides a kind of organic electroluminescent
The production method of display panel.
Fig. 3 shows the flow diagram of the production method of the organic EL display panel in one embodiment of the invention;
Refering to attached drawing, the production method of the organic EL display panel in one embodiment of the invention, including:
Step S120:Form passivation layer 14;
Passivation layer 14 is formed in array substrate 12, and specifically, passivation layer 14 is formed on thin film transistor (TFT).For example, one
In a little embodiments, it can be formed by the single inorganic layer or multiple inorganic layers of the formation of such as silicon oxynitride or silicon nitride;It is another
In a little embodiments, single-layer or multi-layer that passivation layer 14 can be formed by organic material and/or inorganic material.
Step S130:Pixel electrode 16 is formed on passivation layer 14;Wherein, pixel electrode 16 is partially submerged into passivation layer 14
It is interior;
For example, embedded hole can be formed by being patterned on passivation layer 14, then spatter film forming forms pixel electrode 16,
16 part of pixel electrode is set to be located in embedded hole.Embedded hole can be used patterning processes and be patterned to obtain to passivation layer 14, example
It such as, can be by mask exposure and then developing passivation layer 14, to form embedded hole above-mentioned, at other in some embodiments
In embodiment, etching technics can be used and form the embedded hole.It is appreciated that patterning processes can also be other forms, including but not
It is limited to two kinds of forms of the example above.
In some embodiments, further include after step S130:
Step S140:Pixel defining layer 18 and cathode 11 are formed on passivation layer 14;The pixel that is partially submerged into of cathode 11 is determined
In adopted layer 18.
In some embodiments, pixel defining layer 18 covers at least part at the edge of each pixel electrode 16, defines
The pixel definition opening of each 16 part of pixel electrode of exposure.Pixel defining layer 18 can be organic material layer, for example, such as polyamides
The organic materials such as imines, polyamide, phenylpropyl alcohol cyclobutane, acryl resin or phenolic resin are formed.It can be beaten by coating or ink-jet
Print technique is formed on passivation layer 14, and is patterned and formed multiple pixel definition openings.
Meanwhile patterning processes can be used, pixel defining layer 18 is patterned to obtain the second recessed portion 182, for example, one
In a little embodiments, then can be developed pixel defining layer 18 by mask exposure, to form the second recessed portion 182, at other
In embodiment, etching technics can be used and form the second recessed portion 182.It is appreciated that patterning processes can also be other forms, including
But it is not limited to two kinds of forms of the example above.
Cathode 11 can whole face be covered in pixel defining layer 18, and 11 material of cathode is also formed in the second recessed portion 182
Material, to make cathode 11 be partially submerged into pixel defining layer 18.
It is understood that in some embodiments, between step S130 and step S140 can also on passivation layer 14 shape
At groove 144, so that pixel defining layer 18 is partially submerged into passivation layer 14.
In some embodiments, this method further includes:
Step S110:Array basal plate 12 is provided;
Array substrate 12 includes underlay substrate 122 and thin film transistor (TFT).
By taking flexible display panels as an example, underlay substrate 122 is formed on bearing substrate.Underlay substrate 122 is flexible base
Plate is optionally organic polymer, silicon nitride and silica and is formed, for example, organic polymer can be polyimide substrate, gather
One kind in amide substrate, polycarbonate substrate, Poly-s 179 substrate etc..In some embodiments, underlay substrate 122 can pass through
The coating polyimide glue on bearing substrate is cured to obtain to polyimides later.
Thin film transistor (TFT) is formed on underlay substrate 122, in some embodiments, can before forming thin film transistor (TFT),
The other layer of such as buffer layer is formed on underlay substrate 122.Buffer layer can be formed in 122 whole surface of underlay substrate
On, it can also be formed by patterning.
It includes suitable material in the materials such as PET, PEN polyacrylate and/or polyimides that buffer layer, which can have, with
The form that single-layer or multi-layer stacks forms layer structure.Buffer layer can also be formed by silicon oxide or silicon nitride, or can be wrapped
Include organic material layer and/or the composite layer of inorganic material.
Thin film transistor (TFT) can control the transmitting of each sub-pixel, or can control and emit when each sub-pixel emissive
Amount.Thin film transistor (TFT) may include semiconductor layer, gate electrode, source electrode and drain electrode.Semiconductor layer can be by amorphous silicon layer, gold
Belong to oxide or polysilicon layer is formed, or can be formed by organic semiconducting materials.In some embodiments, semiconductor layer includes
Channel region and the source region doped with dopant and drain region.
Gate insulating layer can be utilized to cover semiconductor layer, gate electrode can be arranged on gate insulating layer.Generally, grid
Insulating layer can cover the whole surface of underlay substrate 122.In some embodiments, gate insulator can be formed by patterning
Layer.In view of the formability and profile pattern of bonding, stacking destination layer with adjacent layer, gate insulating layer can be by aoxidizing
Silicon, silicon nitride or other insulation organic or inorganic materials are formed.Gate electrode can be by by silica, silicon nitride and/or other conjunctions
The interlayer insulating film covering that suitable insulation organic or inorganic material is formed.The one of gate insulating layer and interlayer insulating film can be removed
Part forms contact hole with the presumptive area of exposed semiconductor layer after the removal.Source electrode and drain electrode can be via contact
Hole contacts semiconductor layer.
Based on above-mentioned organic EL display panel, the embodiment of the present invention also provides a kind of display device, some
In embodiment, which can be display terminal, such as tablet computer, and in further embodiments, which also may be used
For mobile communication terminal, such as mobile phone terminal.
In some embodiments, which includes organic EL display panel and control unit, the control unit
For to display panel transmitting display signal therefor.
Above-mentioned organic EL display panel and display device, by the way that pixel electrode 16 is partially submerged into passivation layer 14
Interior, cathode 11 is partially submerged into the pixel defining layer 18, on the one hand can be effective when display panel is impacted or is bent
Dispersive stress;On the other hand increase contact area between cathode 11 and pixel defining layer 18 and pixel electrode 16 with it is blunt
Change the contact area between layer 14, to make between cathode 11 and pixel defining layer 18 and pixel electrode 16 and passivation layer 14
With preferably binding force, is adhered to by Van der Waals force compared between film layer in existing design, improve the adhesiveness of electrode.This
Sample effectively avoids cathode 11, pixel electrode 16 that fracture occurs or is partially stripped, effectively improves the bending resistance of OLED display panel
It is bent and bear to fall the reliability of impact strength.
Each technical characteristic of embodiment described above can be combined arbitrarily, to keep description succinct, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, it is all considered to be the range of this specification record.
Several embodiments of the invention above described embodiment only expresses, the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the protection of the present invention
Range.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (10)
1. a kind of organic EL display panel, which is characterized in that including:
The thin film transistor (TFT) being set on underlay substrate;
Passivation layer, the passivation layer formation are configured to have the exposure thin film transistor (TFT) on the thin film transistor (TFT)
Drain electrode contact hole;
Pixel electrode, the pixel electrode are formed on the passivation layer, and are connected to the film crystalline substance by the contact hole
The drain electrode of body pipe;
Wherein, at least one pixel electrode is partially submerged into the passivation layer.
2. organic EL display panel according to claim 1, which is characterized in that the ORGANIC ELECTROLUMINESCENCE DISPLAYS
Panel further includes the first recessed portion being formed on the passivation layer;
The part of the pixel electrode is located in first recessed portion.
3. organic EL display panel according to claim 2, which is characterized in that the depth of first recessed portion
Degree is more than the thicknesses of layers for the pixel electrode being located in first recessed portion.
4. according to claims 1 to 3 any one of them organic EL display panel, which is characterized in that the Organic Electricity
Photoluminescence display panel further includes pixel defining layer;
The pixel defining layer is formed on the passivation layer, and defines at least part for exposing the pixel electrode
Pixel definition opening;
The pixel electrode has by the effective coverage of pixel definition opening exposure;The pixel electrode is embedded in the passivation
The part of layer is located at least in the effective coverage of the pixel electrode.
5. according to claims 1 to 3 any one of them organic EL display panel, which is characterized in that the Organic Electricity
Photoluminescence display panel further includes pixel defining layer;
The pixel defining layer is formed on the passivation layer, and defines at least part for exposing the pixel electrode
Pixel definition opening;
The pixel defining layer is partially submerged into the passivation layer.
6. organic EL display panel according to claim 5, which is characterized in that the ORGANIC ELECTROLUMINESCENCE DISPLAYS
Panel further includes the groove being formed on the passivation layer;The pixel defining layer is covered in the groove;
At least part setting of each groove around a pixel electrode.
7. according to claims 1 to 3 any one of them organic EL display panel, which is characterized in that the Organic Electricity
Photoluminescence display panel further includes pixel defining layer, and the cathode being covered in the pixel defining layer;
The cathode is partially submerged into the pixel defining layer.
8. organic EL display panel according to claim 7, which is characterized in that the ORGANIC ELECTROLUMINESCENCE DISPLAYS
Panel further includes the second recessed portion for being formed in the pixel defining layer and deviating from one side surface of the passivation layer;
The part of the cathode is located in second recessed portion.
9. organic EL display panel according to claim 8, which is characterized in that the ORGANIC ELECTROLUMINESCENCE DISPLAYS
Panel further includes the first recessed portion being formed on the passivation layer;
The part of the pixel electrode is located in first recessed portion;
Second recessed portion towards the passivation layer orthographic projection, it is spaced with first recessed portion.
10. a kind of display device, which is characterized in that including such as claim 1~9 any one of them ORGANIC ELECTROLUMINESCENCE DISPLAYS
Panel.
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