CN108801195B - Object characterization detection method and device based on plasma - Google Patents
Object characterization detection method and device based on plasma Download PDFInfo
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- CN108801195B CN108801195B CN201810670746.1A CN201810670746A CN108801195B CN 108801195 B CN108801195 B CN 108801195B CN 201810670746 A CN201810670746 A CN 201810670746A CN 108801195 B CN108801195 B CN 108801195B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/20—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring contours or curvatures, e.g. determining profile
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Abstract
The invention discloses a plasma-based object characterization detection method and device, which utilize the interaction force between a plasma and an object to be detected to present the physical characteristics of the surface of the object to be detected.
Description
Technical Field
The invention belongs to the field of characterization and detection of materials, and particularly relates to a method for performing characterization by using plasma as a probe and detecting the surface of an object by interaction of the plasma and the surface of the object.
Background
The common electron microscope and optical microscope can only obtain the image of the microscopic object and can not obtain the specific surface characteristics of the microscopic object.
Conventional characterization and detection methods include Atomic Force Microscopy (AFM) and Scanning Tunneling microscopy (ATM). They all belong to a scanning probe microscopy tool, and a scanning tunneling microscope is a novel microscopic device which can distinguish the appearance of the surface of a solid by detecting the tunnel current of electrons in atoms on the surface of the solid according to the tunnel effect principle in quantum mechanics, and can only perform characterization detection on conductors. Atomic force microscopy, however, deflects the cantilever according to hooke's law based on the force applied by the probe tip to the sample surface. The force applied by the tip to the sample surface includes mechanical contact force, van der waals force, capillary action, chemical bonding, electrostatic force, magnetic force, and cassimel effect. When the interatomic distance is reduced to a certain degree, the interatomic force is rapidly increased. Therefore, the height of the surface of the sample can be directly converted according to the stress of the microprobe, so that the information of the surface topography of the sample can be obtained. And the atomic force microscope can measure the insulator and has the characteristics of high resolution, non-destructiveness and the like.
However, the atomic force microscope has extremely high requirements on the probe, the detection result is greatly influenced by the probe, and the pollution of the needle tip easily causes the representation error.
Disclosure of Invention
Aiming at the defects or the improvement requirements in the prior art, the invention provides a plasma-based object characterization detection method and a plasma-based object characterization detection device, so that the technical problems that an atomic force microscope has extremely high requirements on a probe, the detection result is greatly influenced by the probe, and the characterization error is easily caused by the pollution of a needle tip are solved.
To achieve the above object, according to one aspect of the present invention, there is provided a plasma-based object characterization detection method, including:
using the plasma as a probe;
and obtaining the profile of the surface of the object to be detected according to the interaction result of the probe and the surface of the object to be detected so as to realize the characterization detection of the object to be detected.
Preferably, the plasma is a low temperature plasma.
Preferably, the plasma comprises charged particles and neutral particles.
Preferably, the taking the plasma as a probe comprises the following steps:
plasma generated in the medium environment is used as a probe.
Preferably, the interaction of the plasma with the surface of the object to be measured comprises: physical adsorption of the plasma, trapping of the plasma, electrostatic forces, material surface chemical reactions, secondary electron emission, and sputtering.
According to another aspect of the present invention, there is provided a plasma-based object characterization detection apparatus, comprising: a probe and a processing module;
the probe is a plasma;
and the processing module is used for obtaining the profile of the surface of the object to be detected according to the interaction result of the probe and the surface of the object to be detected so as to realize the characterization detection of the object to be detected.
In general, compared with the prior art, the above technical solution contemplated by the present invention can achieve the following beneficial effects: according to the invention, the plasma is used as the probe, when the plasma is close to the surface of the object, the plasma interacts with the surface of the object, and the profile of the surface of the object can be obtained by measuring the influence generated by the interaction between the plasma and the surface of the object, so that the object can be characterized and detected. The influence that can effectually avoid the probe pollution to bring can reduce the experiment consumptive material effectively, reduces the indispensable condition of experiment, has reduced the cost of maintaining effectively, simplifies the testing process, avoids the error that physical probe brought.
Drawings
FIG. 1 is a schematic flow chart of a plasma-based object characterization detection method according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a method for generating a plasma according to an embodiment of the present invention;
FIG. 3 is a schematic view of a plasma generated in accordance with an embodiment of the present invention, which is approximately circular without any force;
fig. 4 is a schematic diagram illustrating deformation of a plasma when a distance between a focus point and a surface of an object to be measured is d1 according to an embodiment of the present invention;
fig. 5 is a schematic diagram of deformation of the plasma when the distance between the focal point and the surface of the sample to be measured is d2 after the object to be measured is moved according to the embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
Fig. 1 is a schematic flow chart of a plasma-based object characterization detection method according to an embodiment of the present invention, where in the method shown in fig. 1, the method includes:
s1, taking the plasma as a probe;
and S2, obtaining the surface profile of the object to be detected according to the interaction result of the probe and the surface of the object to be detected, so as to realize the characterization detection of the object to be detected.
In an alternative embodiment, the plasma is a low temperature plasma.
In an alternative embodiment, the plasma contains charged particles (including ions, electrons, clusters of ions), neutral particles, and the like.
In an alternative embodiment, the embodiment of the present invention may be implemented by generating plasma in a medium environment, or any other method for generating plasma, and the specific manner of implementing the embodiment of the present invention is not limited uniquely.
In an alternative embodiment, the medium environment of the generated plasma includes various environments such as an air environment, a gas environment, a liquid environment, and the like, and the specific manner of the embodiment of the present invention is not limited uniquely.
In an alternative embodiment, the interaction between the plasma and the surface of the object to be measured includes physical adsorption of the plasma, capture of the plasma, electrostatic force, chemical reaction of material surface, secondary electron emission, sputtering, and the like, and the interaction between the plasma and various materials.
In an alternative embodiment, the interaction between the probe and the surface of the object to be measured includes various effects caused by the interaction between the plasma and various materials.
The embodiment of the invention also provides an object characterization and detection device based on plasma, which comprises: a probe and a processing module; wherein the probe is a plasma;
and the processing module is used for obtaining the profile of the surface of the object to be detected according to the interaction result of the probe and the surface of the object to be detected so as to realize the characterization detection of the object to be detected.
The specific implementation of each module may refer to the description in the method embodiment, and the embodiment of the present invention will not be repeated.
The present invention will be described in detail below with reference to the accompanying drawings and examples.
(1) With the apparatus of fig. 2, a plasma can be obtained near the focal point by focusing with a femtosecond laser beam through a high NA objective lens after incidence, the shape of which is approximately a circle as shown in fig. 3;
in fig. 2, the light output from the laser is first passed through a half-glass, then a polarizer, and finally a half-glass, and linear polarization at any angle can be obtained. The obtained linearly polarized light changes the direction of an optical path through a total reflection mirror, and is finally focused by an objective lens with high numerical aperture, and plasma is obtained near the focal point of the objective lens.
(2) Approaching the plasma to the surface of the object to be measured to a certain degree, and when the surface of the object to be measured is away from the plasma at different distances, the plasma can deform to different degrees as shown in fig. 4 and 5;
(3) and according to the shape characteristics of the deformed plasma, the distances between the surface of the object and the plasma at different positions can be deduced, so that the representation of the object is obtained.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (6)
1. A plasma-based object characterization detection method, comprising:
light output from a laser firstly passes through a half glass slide, then passes through a polaroid and finally passes through the half glass slide to obtain linearly polarized light with any angle, the obtained linearly polarized light changes the direction of a light path through a total reflector, and finally is focused by an objective with high numerical aperture to obtain plasma near the focal point of the objective, and the obtained plasma is used as a probe;
when the object surface that awaits measuring is apart from the plasma different distances, plasma with the object surface interact that awaits measuring, plasma can take place the deformation of different degrees, according to the shape characteristic of the plasma after the deformation, conjectures the surface of object and the distance of plasma of different positions department, conjectures the surface of object of different positions department promptly with the distance of objective focus reachs the profile on object surface awaits measuring, it is right in order to realize the object that awaits measuring carries out the characterization and detects.
2. The method of claim 1, wherein the plasma is a low temperature plasma.
3. The method of claim 1 or 2, wherein the plasma comprises charged particles and neutral particles.
4. The method of claim 3, wherein said probing the plasma comprises:
plasma generated in the medium environment is used as a probe.
5. The method of claim 1, wherein the interaction of the plasma with the surface of the object to be measured comprises: physical adsorption of the plasma, trapping of the plasma, electrostatic forces, surface chemical reactions of materials, secondary electron emission, and sputtering.
6. A plasma-based object characterization detection device, comprising: a probe and a processing module; wherein the probe is generated by: light output from a laser firstly passes through a half glass slide, then passes through a polaroid and finally passes through the half glass slide to obtain linearly polarized light with any angle, the obtained linearly polarized light changes the direction of a light path through a total reflector, and finally is focused by an objective with high numerical aperture to obtain plasma near the focal point of the objective, and the obtained plasma is used as a probe;
when the object surface that awaits measuring is apart from the plasma different distances, plasma with the object surface interact that awaits measuring, plasma can take place the deformation of different degrees, processing module for according to the shape characteristic of the plasma after the deformation, the surface of surmising different positions department object and the distance of plasma, surmise different positions department object promptly the surface with the distance of objective focus reachs the profile on object surface awaits measuring, it is right in order to realize the object that awaits measuring carries out the characterization and detects.
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