CN108796604A - A kind of colloidal photon crystal and preparation method thereof with curved-surface structure - Google Patents
A kind of colloidal photon crystal and preparation method thereof with curved-surface structure Download PDFInfo
- Publication number
- CN108796604A CN108796604A CN201710305666.1A CN201710305666A CN108796604A CN 108796604 A CN108796604 A CN 108796604A CN 201710305666 A CN201710305666 A CN 201710305666A CN 108796604 A CN108796604 A CN 108796604A
- Authority
- CN
- China
- Prior art keywords
- photon crystal
- curved
- colloidal
- surface structure
- groove template
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/54—Organic compounds
- C30B29/58—Macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Optical Integrated Circuits (AREA)
Abstract
The invention belongs to photonic crystal preparing technical fields, are related to a kind of colloidal photon crystal and preparation method thereof with curved-surface structure.The present invention utilizes the technology of hot padding complex, and parallel semi-circular recesses array is constructed in thermoplastic polymer surface, obtains patterned groove template；Colloidal photon crystal film is grown using vertical deposition method in patterned groove template, to obtain the colloidal photon crystal with curved-surface structure (especially surface is with semi-circular recesses curved-surface structure) of the present invention.Method provided by the present invention is simple and practicable, can large area prepare, universality is good.
Description
Technical field
The invention belongs to photonic crystal fields, and in particular to a kind of side preparing the colloidal photon crystal with curved-surface structure
Method.
Background technology
Photonic crystal is that the one kind for being arranged by the different two kinds or more of material periodicities of dielectric constant and being formed exists
Composite material with photon band gap on specific direction.This periodic structure is capable of the reflection specific wavelength of selectivity
Light so that it is with a wide range of applications in optical device, sensor, anti-fake, laser or even communication field.And Colloidal photonic
Crystal be it is wherein studied most commonly used because the monodispersed colloidal solid of the raw material-of colloidal photon crystal prepare it is simple, at
Sheet is low, can largely prepare；Along with the diversification of colloidal solid assembling mode so that colloidal photon crystal becomes grinding in recent years
Study carefully hot spot.Colloidal photon crystal prepared by conventional method is mostly planar structure, therefore optical property is relatively single；For this purpose, research
Person proposes many methods for preparing curve surface photon crystal.Patent publication No. is that CN101392407 is (entitled《A kind of cylinder is empty
The preparation method of the orderly colloidal crystal of macropore of cardioid》) patent, grown cylinder hollow type in hollow thin glass tube inner wall
Colloidal photon crystal, since the process of growth colloidal photon crystal is needed using electric field and by hollow thin glass tube size
Limitation, this method are difficult to largely prepare.Patent publication No. is that CN101942700 is (entitled《Cylindrical toroidal colloid based on optical fiber
The preparation method and its crystal of crystal》) patent, grown one kind using the method for vertical deposition in cylindrical optical fiber surface
Circular colloidal photon crystal, but this method needs carry out corrosion roughening to optical fiber used, and growth course needs temperature control control
Pressure.Due to template used and growth conditions limitation, it is also difficult to the preparation of large area.Publication No. CN104193906A (titles
For《A kind of photon crystal micro-ball, preparation method and application》) patent, it is micro- to be prepared for photonic crystal using micro-fluidic technologies
Ball, including the molecular kernel of polystyrene-poly (n-isopropyl acrylamide) copolymer nano particle and hydrophobicity it is light-initiated poly-
The shell of resin composition.But the micro-fluidic technologies used in this method require harshness to process conditions, do not have universality.
Invention content
The Colloidal photonic with curved-surface structure is prepared based on patterned groove template the purpose of the present invention is to provide a kind of
The method of crystal, the method is easy to operate, efficient, at low cost, and can prepare the colloid with curved-surface structure with mass
Photonic crystal.The patterned groove template is prepared using coining (especially hot padding) technology, simple production process, institute
Relatively cheap with raw material, size, shape of the groove obtained after coining etc. can keep extraordinary homogeneity, and the party
Method can be prepared with mass.
To achieve the goals above, the application provides the following technical solutions：
A method of the colloidal photon crystal with curved-surface structure is prepared, the described method comprises the following steps：
1) patterned groove template is prepared：Using the metallic plate of metal wire winding as coining caster, thermoplastic is used
Polymer is imprinted property, complex obtains patterned groove template；
2) colloidal photon crystal with curved-surface structure is prepared：Using the patterned groove template of step 1) as substrate,
Grown photonic crystal on the substrate obtains the colloidal photon crystal with curved-surface structure.
Wherein, the metal wire described in step 1) can be copper wire or stainless steel wire.
Wherein, the cross section of the metal wire described in step 1) can be round or ellipse.
Wherein, the metallic plate described in step 1) can be aluminium alloy plate, stainless steel plate or copper coin.
Wherein, the thermoplastic polymer described in step 1) can be polystyrene, makrolon, polyurethane or polyene
Hydrocarbon (such as polyethylene, polypropylene or its copolymer).
Wherein, it is embossed to hot padding in step 1).
Wherein, the groove pattern of the groove template described in step 1) can be adjusted by metal wire.For example, selection is different
The round wire of diameter, the diameter for example can be between 100-500 μm.
According to the present invention, step 1) specifically includes following steps：
1a) prepare coining caster：The round wire of different-diameter is closely wound metallic plate, the coining is prepared and uses
Caster；
1b) prepare patterned groove template：Thermoplastic polymer plate level is placed in thermal station, then step 1a)
The coining of preparation is pressed in caster on thermoplastic polymer plate；Thermal station is opened, the glass of the thermoplastic polymer is heated to
Change on transition temperature (i.e. heat distortion temperature), after thermoplastic polymer softening, then applies pressure coining caster pressure
Enter in thermoplastic polymer plate, demoulded after being cooled to room temperature, obtains patterned groove template.
Wherein, step 1a) in round wire diameter be, for example, 100 μm, 150 μm, 200 μm, 300 μm, 400 μm or
500μm。
Wherein, step 1a) in, the metallic plate is, for example, stainless steel plate, aluminium alloy plate, copper coin etc..
Wherein, step 1a) in, the metallic plate carries out edge polishing and surface polishing treatment, is to realize gold in this way
Belong to line close-packed arrays.
Wherein, step 1a) in, further include the steps that the coining that will be obtained carries out cleaning and silicic acid anhydride with caster；
Specifically, after carrying out surface clean using ethyl alcohol, silicon fluoride (for example, perfluoro capryl trichlorosilane) is reused at reduced pressure conditions
Carry out chemical vapor deposition process.The purpose handled in this way is to avoid sticking together in coining and knockout course.
According to the present invention, the step 2) specifically includes：Using patterned groove template as substrate, monodispersed colloid is deposited
Particle obtains the colloidal photon crystal with curved-surface structure to grown photonic crystal on the substrate.
Wherein, step 2) is specially：The patterned groove template obtained in step 1) is inserted into containing monodispersed glue
In the dispersion liquid of body particle, natural evaporation at a constant temperature is after the solvent in dispersion liquid is evaporated, i.e., recessed in the patterning
It deposited one layer of colloidal photon crystal film with curved-surface structure on slot template.
Wherein, patterned groove template is inserted into the form of groove is axially perpendicular to container in the dispersion liquid.Thus,
The method of step 2) is also referred to as vertical deposition method.
Wherein, the material of the monodispersed colloidal solid is not particularly limited, it is existing can be formed it is monodispersed
The material of colloidal solid, such as can be inorganic material (such as silica) or be polymer material (such as polyphenyl second
Alkene etc.).
Wherein, in the dispersion liquid solvent for use be one or more of ethyl alcohol, methanol, water or ethylene glycol mixing
Liquid.
Wherein, the monodispersed colloidal solid can be utilizedMonodispersed SiO prepared by method2Microballoon or
It can be monodispersed polystyrene (PS) microballoon prepared using microemulsion polymerization method.
Wherein, describedMethod can refer to method disclosed in following documents：J.Colloid.Interface
Sci.1968,26,62；The microemulsion polymerization method can refer to method disclosed in following documents：Colloid
Polym.Sci.1979,257,61；Above-mentioned document is hereby incorporated by reference herein.
The present invention also provides the colloidal photon crystal being prepared by the above method, the colloidal photon crystal has curved surface
Structure.
Wherein, the colloidal photon crystal has the array structure of semi-circular recesses curved-surface structure and high-sequential.
The present invention also provides a kind of purposes of above-mentioned colloidal photon crystal, are replied since the colloidal photon crystal has
Reflection and bireflectance peak characteristic, be displayed for device, Reflex Reflector or other utilize the characteristic optical device etc..
The invention has the advantages that：
Operation is simple for preparation method provided by the present invention, can low cost, prepared in large area with curved-surface structure
Colloidal photon crystal.This method is suitable for preparing the common SiO of photonic crystal institute at present2And polymer material, it prepares
Curve surface photon crystal thickness and orientation are uniform.Patterned groove template used in this method has super because of the presence of groove
Strong capillary force, can be rapidly by colloidal solid dispersion liquid from the lower transport of template to the top of template, in dispersion liquid
Colloidal solid does not settle substantially, and therefore, groove template can be assembled more with the colloidal solid dispersion liquid of same volume
Colloidal photon crystal, and the time assembled used in the photonic crystal of same area also greatly shorten, for the profit of colloidal solid
It is greatly improved with rate.Obtained curve surface photon crystal has the characteristic of retro-reflection and bireflectance peak, in display, retro-reflection
Device and novel optical device etc. have broad application prospects.
Description of the drawings
Fig. 1 is the schematic diagram that embodiment 1 prepares patterned groove template.
Fig. 2 is sample 1 prepared by embodiment 1#Different enlargement ratios under electron scanning micrograph：(a) it is to put
It is 100 times big, (b) it is 10000 times of amplification.
Fig. 3 is sample 2 prepared by embodiment 2#5000 times of electron scanning micrograph of reflectance spectrum (a) and amplification
(b)。
Specific implementation mode
Present invention will be further explained below with reference to specific examples.It should be understood that these embodiments are merely to illustrate the present invention
Rather than it limits the scope of the invention.Furthermore, it is to be understood that after having read recorded content of the invention, this field skill
Art personnel can make various changes or modifications the present invention, and such equivalent forms equally fall within limited range of the present invention.
Embodiment 1
1) coining caster is prepared using a diameter of 300 μm of circular copper wire winding aluminium alloy plate, it is clear then carries out ethyl alcohol
It washes and silicic acid anhydride.Wherein it is preferred to which the aluminium alloy plate first carries out edge polishing before winding circular copper wire and surface is thrown
Light processing.Wherein it is preferred to which the silicic acid anhydride is to be performed under reduced pressure chemical gas using perfluoro capryl trichlorosilane
Phase deposition processes.
2) polystyrene board (hereinafter referred to as PS plates) that thickness is 2mm is lain in a horizontal plane in thermal station, then step 1)
In caster be pressed on PS plates.Thermal station is opened, is heated to 170 DEG C, after the softening of PS plates, then applies the pressure of 20N master mold
Plate is pressed into PS plates, is demoulded after being cooled to room temperature, and finally obtaining surface has the template of semi-circular recesses array.Then it can cut
Arbitrary dimension is cut into get to patterned groove template, it is spare.Detailed process is as shown in Figure 1.
3) patterned groove template in step 2) is perpendicularly inserted into monodispersed SiO2The ethyl alcohol of colloidal solid (240nm)
In dispersion liquid (0.01v%), after being dried at 35 DEG C, formed with curved-surface structure in the patterned groove template surface
SiO2Colloidal photon crystal.
Gained has the SiO of curved-surface structure2Colloidal photon crystal (number 1#) electron scanning micrograph be shown in Fig. 2
In, wherein a is 100 times of amplification, and b is 10000 times of amplification.As seen from the figure, the SiO that preparation method using the present invention obtains2Glue
Body photonic crystal has the array structure on semi-circular curvature surface and high-sequential.
Embodiment 2
1) coining caster is prepared using a diameter of 300 μm of circular copper wire winding aluminium alloy plate, it is clear then carries out ethyl alcohol
It washes and silicic acid anhydride.Wherein it is preferred to which the aluminium alloy plate first carries out edge polishing before winding circular copper wire and surface is thrown
Light processing.Wherein it is preferred to which the silicic acid anhydride is to be performed under reduced pressure chemical gas using perfluoro capryl trichlorosilane
Phase deposition processes.
2) the PS plate levels that thickness is 2mm are placed in thermal station, then the caster in step 1) is pressed on PS plates.
Thermal station is opened, is heated to 170 DEG C, after the softening of PS plates, then the pressure for applying 20N is cooled to room in caster indentation PS plates
It is demoulded after temperature, finally obtaining surface has the template of semi-circular recesses array.Then arbitrary dimension can be cut into get to figure
Case groove template, it is spare.
3) patterned groove template in step 2) is perpendicularly inserted into monodispersed SiO2The ethyl alcohol of colloidal solid (260nm)
In dispersion liquid (0.01v%), after being dried at 35 DEG C, formed with curved-surface structure in the patterned groove template surface
SiO2Colloidal photon crystal.
Gained has the SiO of curved-surface structure2Colloidal photon crystal (number 2#) optical photograph and reflectance spectrum be shown in figure
In 3, wherein a is reflectance spectrum, and b is the stereoscan photograph for amplifying 5000 times.As seen from the figure, preparation side using the present invention
The SiO that method obtains2Colloidal photon crystal has the array structure on semi-circular curvature surface and high-sequential, while also having relatively strong
Reflection peak.
Embodiment 3
1) coining caster is prepared using a diameter of 300 μm of circular copper wire winding aluminium alloy plate, it is clear then carries out ethyl alcohol
It washes and silicic acid anhydride.Wherein it is preferred to which the aluminium alloy plate first carries out edge polishing before winding circular copper wire and surface is thrown
Light processing.Wherein it is preferred to which the silicic acid anhydride is to be performed under reduced pressure chemical gas using perfluoro capryl trichlorosilane
Phase deposition processes.
2) polycarbonate plate (hereinafter referred to as PC plate) that thickness is 2mm is lain in a horizontal plane in thermal station, then step 1)
In caster be pressed in PC plate.Thermal station is opened, is heated to 200 DEG C, after PC plate softening, then applies the pressure of 20N master mold
Plate is pressed into PC plate, is demoulded after being cooled to room temperature, and finally obtaining surface has the template of semi-circular recesses array.Then it can cut
Arbitrary dimension is cut into get to patterned groove template, it is spare.
3) patterned groove template in step 2) is perpendicularly inserted into the water-dispersed of monodispersed PS colloidal solids (180nm)
In liquid (0.01v%), after being dried at 65 DEG C, the PS colloids with curved-surface structure are formed in the patterned groove template surface
Photonic crystal.
It can from the electron scanning micrograph and emission spectrum of the PS colloidal photon crystals with curved-surface structure
See, array of the PS colloidal photon crystals that preparation method using the present invention obtains with semi-circular curvature surface, high-sequential
Structure and stronger reflection peak.
More than, embodiments of the present invention are illustrated.But the present invention is not limited to the above embodiments.It is all
Within the spirit and principles in the present invention, any modification, equivalent substitution, improvement and etc. done should be included in the guarantor of the present invention
Within the scope of shield.
Claims (10)
1. a kind of method preparing the colloidal photon crystal with curved-surface structure, which is characterized in that the method includes following steps
Suddenly：
1) patterned groove template is prepared：Using the metallic plate of metal wire winding as coining caster, thermoplastic poly is used
Object is imprinted, complex obtains patterned groove template for conjunction；
2) colloidal photon crystal with curved-surface structure is prepared：Using the patterned groove template of step 1) as substrate, in institute
Grown photonic crystal in substrate is stated, the colloidal photon crystal with curved-surface structure is obtained.
2. according to the method described in claim 1, it is characterized in that, the metal wire described in step 1) is copper wire or stainless steel
Line；The cross section of the metal wire is round or ellipse；
Preferably, the metallic plate described in step 1) can be aluminium alloy plate, stainless steel plate or copper coin；
Preferably, the thermoplastic polymer described in step 1) can be polystyrene, makrolon, polyurethane or polyolefin
(such as polyethylene, polypropylene or its copolymer).
3. method according to claim 1 or 2, which is characterized in that be embossed to hot padding in step 1)；
Preferably, the groove pattern of the groove template described in step 1) can be adjusted by metal wire；
For example, the round wire of selection different-diameter, the diameter for example can be between 100-500 μm.
4. according to claim 1-3 any one of them methods, which is characterized in that step 1) specifically includes following steps：
1a) prepare coining caster：The round wire of different-diameter is closely wound metallic plate, prepares the coining master mold
Plate；
1b) prepare patterned groove template：Thermoplastic polymer plate level is placed in thermal station, then step 1a) it prepares
Coining be pressed on thermoplastic polymer plate with caster；Thermal station is opened, the vitrifying for being heated to the thermoplastic polymer turns
On temperature (i.e. heat distortion temperature), after thermoplastic polymer softening, then applies pressure and coining caster is pressed into heat
It in thermoplastic polymer plate, is demoulded after being cooled to room temperature, obtains patterned groove template.
5. according to the method described in claim 4, it is characterized in that, step 1a) in the diameter of round wire be, for example, 100 μ
M, 150 μm, 200 μm, 300 μm, 400 μm or 500 μm；
Preferably, step 1a) in, the metallic plate is, for example, stainless steel plate, aluminium alloy plate, copper coin etc.；
Preferably, step 1a) in, the metallic plate carries out edge polishing and surface polishing treatment；
Preferably, step 1a) in, further include the steps that the coining that will be obtained carries out cleaning and silicic acid anhydride with caster；Tool
Body, after carrying out surface clean using ethyl alcohol, reuse silicon fluoride (for example, perfluoro capryl trichlorosilane) at reduced pressure conditions into
Row chemical vapor deposition process.
6. according to claim 1-5 any one of them methods, which is characterized in that the step 2) specifically includes：With patterning
Groove template is substrate, deposits monodispersed colloidal solid to grown photonic crystal on the substrate, obtains with curved surface
The colloidal photon crystal of structure.
7. according to the method described in claim 6, it is characterized in that, step 2) is specially：The patterning that will be obtained in step 1)
Groove template is inserted into the dispersion liquid containing monodispersed colloidal solid, and natural evaporation at a constant temperature waits in dispersion liquid
Solvent be evaporated after, i.e., it is thin to deposited one layer of colloidal photon crystal with curved-surface structure in the patterned groove template
Film.
Preferably, patterned groove template is inserted into the form of groove is axially perpendicular to container in the dispersion liquid.
8. the method described according to claim 6 or 7, which is characterized in that the material of the monodispersed colloidal solid does not have
It is particularly limited to, the existing material that can form monodispersed colloidal solid, such as can be inorganic material (such as titanium dioxide
Silicon etc.) or be polymer material (such as polystyrene)；
Preferably, in the dispersion liquid solvent for use be one or more of ethyl alcohol, methanol, water or ethylene glycol mixing
Liquid；
It is further preferred that the monodispersed colloidal solid can be utilizedMonodispersed SiO prepared by method2Microballoon or
It can be monodispersed polystyrene (PS) microballoon prepared using microemulsion polymerization method.
9. the colloidal photon crystal being prepared by any one of claim 1-8 the methods, which is characterized in that the colloid light
Sub- crystal has curved-surface structure.
Preferably, the colloidal photon crystal has the array structure of semi-circular recesses curved-surface structure and high-sequential.
10. the purposes of the colloidal photon crystal described in claim 9, which is characterized in that the colloidal photon crystal, which has, replys
Reflection and bireflectance peak characteristic, be displayed for device, Reflex Reflector or other utilize the characteristic optical device etc..
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710305666.1A CN108796604B (en) | 2017-05-03 | 2017-05-03 | A kind of colloidal photon crystal and preparation method thereof with curved-surface structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710305666.1A CN108796604B (en) | 2017-05-03 | 2017-05-03 | A kind of colloidal photon crystal and preparation method thereof with curved-surface structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108796604A true CN108796604A (en) | 2018-11-13 |
| CN108796604B CN108796604B (en) | 2019-11-12 |
Family
ID=64054130
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710305666.1A Active CN108796604B (en) | 2017-05-03 | 2017-05-03 | A kind of colloidal photon crystal and preparation method thereof with curved-surface structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108796604B (en) |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1544308A (en) * | 2003-11-24 | 2004-11-10 | 吉林大学 | Soft lithography and tearing technology for colloid crystal microprocessing of pattern |
| CN1654311A (en) * | 2005-03-09 | 2005-08-17 | 吉林大学 | Method for constructing non-close packing colloid balls ordered arrangement using soft-graving technology |
| CN1958880A (en) * | 2006-09-30 | 2007-05-09 | 南京大学 | Method for assembling pellets in submicro to ordered structural crystal in large area |
| CN101338447A (en) * | 2008-08-29 | 2009-01-07 | 哈尔滨工业大学 | Method for self-assembling photonic crystal |
| CN101392407A (en) * | 2008-10-07 | 2009-03-25 | 南京师范大学 | Method for preparing cylinder hollow macroporous ordered colloidal crystal |
| CN101788697A (en) * | 2010-02-23 | 2010-07-28 | 南京师范大学 | Cladding type colloid crystalloid micro-structured fiber and preparation method thereof |
| CN101942700A (en) * | 2010-10-20 | 2011-01-12 | 南京师范大学 | Method for preparing circular cylindrical colloidal crystals based on optical fibers and crystals thereof |
| CN102061520A (en) * | 2011-01-24 | 2011-05-18 | 中国科学院化学研究所 | Method for preparing unary or binary patterning colloidal photonic crystal |
| CN102162136A (en) * | 2011-02-28 | 2011-08-24 | 中国科学院苏州纳米技术与纳米仿生研究所 | Method for quick preparation of large-area two-dimensional colloidal crystal |
| CN103127887A (en) * | 2013-03-14 | 2013-06-05 | 东南大学 | Unbiased-angle one-dimensional photonic crystal and preparation method thereof |
| CN105425266A (en) * | 2015-11-03 | 2016-03-23 | 同济大学 | Preparation method for photonic crystal plastic scintillator |
| CN105947970A (en) * | 2016-05-16 | 2016-09-21 | 华南师范大学 | Ordered large-area single-layer microspheres/nanospheres assisted by template and preparation method thereof |
| CN106527043A (en) * | 2016-11-22 | 2017-03-22 | 同济大学 | Method for fabricating large-area photonic crystal s scintillation body by imprinting technology |
-
2017
- 2017-05-03 CN CN201710305666.1A patent/CN108796604B/en active Active
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1544308A (en) * | 2003-11-24 | 2004-11-10 | 吉林大学 | Soft lithography and tearing technology for colloid crystal microprocessing of pattern |
| CN1654311A (en) * | 2005-03-09 | 2005-08-17 | 吉林大学 | Method for constructing non-close packing colloid balls ordered arrangement using soft-graving technology |
| CN1958880A (en) * | 2006-09-30 | 2007-05-09 | 南京大学 | Method for assembling pellets in submicro to ordered structural crystal in large area |
| CN101338447A (en) * | 2008-08-29 | 2009-01-07 | 哈尔滨工业大学 | Method for self-assembling photonic crystal |
| CN101392407A (en) * | 2008-10-07 | 2009-03-25 | 南京师范大学 | Method for preparing cylinder hollow macroporous ordered colloidal crystal |
| CN101788697A (en) * | 2010-02-23 | 2010-07-28 | 南京师范大学 | Cladding type colloid crystalloid micro-structured fiber and preparation method thereof |
| CN101942700A (en) * | 2010-10-20 | 2011-01-12 | 南京师范大学 | Method for preparing circular cylindrical colloidal crystals based on optical fibers and crystals thereof |
| CN102061520A (en) * | 2011-01-24 | 2011-05-18 | 中国科学院化学研究所 | Method for preparing unary or binary patterning colloidal photonic crystal |
| CN102162136A (en) * | 2011-02-28 | 2011-08-24 | 中国科学院苏州纳米技术与纳米仿生研究所 | Method for quick preparation of large-area two-dimensional colloidal crystal |
| CN103127887A (en) * | 2013-03-14 | 2013-06-05 | 东南大学 | Unbiased-angle one-dimensional photonic crystal and preparation method thereof |
| CN105425266A (en) * | 2015-11-03 | 2016-03-23 | 同济大学 | Preparation method for photonic crystal plastic scintillator |
| CN105947970A (en) * | 2016-05-16 | 2016-09-21 | 华南师范大学 | Ordered large-area single-layer microspheres/nanospheres assisted by template and preparation method thereof |
| CN106527043A (en) * | 2016-11-22 | 2017-03-22 | 同济大学 | Method for fabricating large-area photonic crystal s scintillation body by imprinting technology |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108796604B (en) | 2019-11-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| García Núñez et al. | Large-area self-assembly of silica microspheres/nanospheres by temperature-assisted dip-coating | |
| Sun et al. | Super black material from low-density carbon aerogels with subwavelength structures | |
| Zhang et al. | Colloidal self‐assembly meets nanofabrication: From two‐dimensional colloidal crystals to nanostructure arrays | |
| Ai et al. | Advanced colloidal lithography beyond surface patterning | |
| van de Groep et al. | Single-step soft-imprinted large-area nanopatterned antireflection coating | |
| CN101479031B (en) | Monoparticulate-film etching mask and process for producing the same, process for producing fine structure with the monoparticulate-film etching mask, and fine structure obtained by the production pro | |
| Zhang et al. | Patterning colloidal crystals and nanostructure arrays by soft lithography | |
| Wang et al. | Colloidal lithography meets plasmonic nanochemistry | |
| Li et al. | Efficient fabrication and enhanced photocatalytic activities of 3D-ordered films of titania hollow spheres | |
| Zhao | Bottom-up fabrication methods of optical metamaterials | |
| Tan et al. | Fabrication of a two-dimensional periodic non-close-packed array of polystyrene particles | |
| Huang et al. | Aligned Millineedle Arrays for Solar Power Seawater Desalination with Site‐Specific Salt Formation | |
| Li et al. | Self-assembly of carbon Black/AAO templates on nanoporous Si for broadband infrared absorption | |
| JP2011515216A (en) | Substrate coating method | |
| Hou et al. | Design and fabrication of three-dimensional chiral nanostructures based on stepwise glancing angle deposition technology | |
| JP2011515216A5 (en) | ||
| FR2893610A1 (en) | Surface structuring of glass products by plastic or viscoplastic deformation by contact and pressure against a structuring mask, for applications in buildings, automobiles and electronics | |
| Waterhouse et al. | Achieving color and function with structure: optical and catalytic support properties of ZrO2 inverse opal thin films | |
| Oliveira et al. | Colloidal lithography for photovoltaics: An attractive route for light management | |
| US20130160933A1 (en) | Method for making carbon nanotube paper | |
| TWI617507B (en) | Method for making carbon nanotube film | |
| Zhong et al. | Hollow spheres: crucial building blocks for novel nanostructures and nanophotonics | |
| WO2014082515A1 (en) | Surface plasmon filter and preparation method therefor | |
| Charconnet et al. | Mechanically Tunable Lattice‐Plasmon Resonances by Templated Self‐Assembled Superlattices for Multi‐Wavelength Surface‐Enhanced Raman Spectroscopy | |
| Jin et al. | Self-templated fabrication of robust moth-eye-like nanostructures with broadband and quasi-omnidirectional antireflection properties |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |