CN101338447A - Method for Self-Assembling Photonic Crystals - Google Patents

Abstract

A method for self-assembling photonic crystals relates to a preparation method for photonic crystals. The invention solves the problem that the existing method cannot prepare large-area photonic crystals, and the prepared photonic crystals cannot be bent. The method of the present invention is as follows: 1. The surface treatment of the substrate; 2. The configuration of the colloidal solution; 3. Put the substrate into the container, then add the colloidal solution configured in step 2, and then under the constant temperature condition of 20°C-70°C The colloidal solution is volatilized, and the substrate is taken out after no substance volatilizes, and the photonic crystal is obtained. The method of the invention enables the photonic crystal to be deposited on the substrate on one side or both sides, and the photonic crystal is deposited on the substrate to the greatest extent.

Description

Method for Self-Assembling Photonic Crystals

technical field

The invention relates to a preparation method of a photonic crystal.

Background technique

Monodisperse colloidal particle self-assembled photonic crystal is a material with a three-dimensional ordered structure on the nanometer scale. Due to the spatial periodic arrangement of the dielectric constant, the photonic crystal can modulate light waves, so it is used in optical mirrors, optical switches and optical communications. has broad applications. Publication No. CN1749445 (titled "Method for Controlling Colloidal Microsphere Self-Assembly and Preparation of Two-dimensional and Three-dimensional Photonic Crystals") and Publication No. CN1936074 (titled "A Method for Growing Three-dimensional Photonic Crystal Films by Decompression Self-Assembly) and device"), in the process of preparing colloidal photonic crystals, since the substrates are mostly optical glass such as glass slides or silicon wafers, the resulting photonic crystals cannot be bent, and due to the size of the hard substrate Due to limitations, large-area photonic crystals cannot be prepared and the quality of photonic crystals at the edge of the substrate is often poor. The patent with the publication number CN101060922 (named "Colloidal Photonic Crystal Using Colloidal Nanoparticles and Its Preparation Method") prepares flexible photonic crystals by introducing elastic materials such as polyvinyl alcohol and polyacrylic acid into the colloidal solution to self-assemble. The photonic crystals of photonic crystals cannot be processed into photonic crystals with inverse opal structure because the gaps are filled with elastic materials. The patent with the publication number CN101092054 (named "Preparation Method of Non-Densely Packed Colloidal Crystal Films by Hot Pressing") uses a photonic crystal with a core-shell structure whose shell is an elastic material to prepare a flexible photonic crystal by hot pressing. This method prepares The photonic crystal has poor order. The vertical deposition method is a method for the growth of colloidal photonic crystals. The common preparation is to put the substrate into the colloidal solution vertically or at a certain angle, and through the volatilization of the solution or the pulling of the substrate, the colloidal particles are self-assembled on the substrate. Orderly arranged photonic crystals. However, since the substrate used is horizontal, the preparation of large-area photonic crystals can only be realized by increasing the area of the substrate and expanding the volume of the growth container. This causes most of the colloidal particles to grow on the container wall, and the utilization rate of raw materials is reduced.

Contents of the invention

The object of the present invention is to provide a method for self-assembling photonic crystals in order to solve the problem that the existing methods cannot prepare large-area photonic crystals and the prepared photonic crystals cannot be bent.

The first self-assembled photonic crystal method is as follows: 1. Substrate surface treatment: ultrasonically clean the substrate with deionized water for 10min-30min with acetone for 10min-30min, then blow it with nitrogen until the surface is dry or at 20°C- Dry in a drying oven at 60°C until dry, then treat with oxygen plasma for 1min-10min; 2. Colloidal solution configuration: polystyrene, polymethyl methacrylate, silicon dioxide or titanium dioxide with a spherical diameter of 50nm-5μm Add the pellets into the solvent to obtain a solution with a monodispersity of less than or equal to 5% and a mass fraction of 0.005%-5%, and then ultrasonically vibrate the resulting solution for 10min-30min to obtain a colloidal solution; 3. Put the substrate into the deionized Wash with water for 10-30 minutes, ultrasonically clean with acetone for 10-30 minutes, rinse with deionized water and dry the container, then add the colloid solution prepared in step 2, and then volatilize the colloid solution at a constant temperature of 20°C-70°C , take out the substrate when no substance volatilizes, and obtain the photonic crystal; wherein the substrate described in step 1 is a polyester substrate, polyimide substrate with a thickness of 0.01mm-1mm and the surface is coated with aluminum, silver, gold or indium tin oxide Substrate, polysulfone substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, silicone substrate or rubber substrate; in step 1, the substrate is curled into a hollow cylinder, hollow truncated cone or spiral ; The solvent described in step 2 is one or more mixed solutions of deionized water, ethanol, methanol, ethylene glycol.

The substrate in step 1 of the method is directly put into the colloid solution obtained in step 2 without processing.

The second self-assembled photonic crystal method is as follows: 1. Surface treatment of the organic substrate: put the organic substrate into an acid solution with a mass fraction of 5%-30% for 1min-30min, and then ultrasonically clean it with deionized water for 10min- 30min, dry; 2. Colloidal solution configuration: add polystyrene, polymethylmethacrylate, silicon dioxide or titanium dioxide balls with a diameter of 50nm-5μm into the solvent to obtain a monodispersity of less than or equal to 5%, A solution with a mass fraction of 0.005%-5%, and then ultrasonically oscillate the obtained solution for 10min-30min to obtain a colloidal solution; 3. Put the organic substrate into the deionized water and clean it for 10-30min, ultrasonically clean it with acetone for 10-30min, remove Rinse and dry the container with ion water, then add the colloidal solution configured in step 2, and then volatilize the colloidal solution under a constant temperature condition of 20°C-70°C, and take out the substrate after no substance volatilizes, and then obtain the photonic crystal; The organic substrate described in step 1 is a polyester substrate, polyimide substrate, polysulfone substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organic silicon substrate with a thickness of 0.01mm-1mm or a rubber substrate; the acidic solution described in step one is potassium dichromate solution; the organic substrate is curled into a hollow cylinder, hollow truncated cone or spiral in step one; the solvent described in step two is to remove One or more mixed solutions of ionized water, ethanol, methanol, and ethylene glycol.

The substrate in step 1 of the method is directly put into the colloid solution obtained in step 2 without processing.

The third method for self-assembled photonic crystals is characterized in that the method for self-assembled photonic crystals is as follows: 1. Surface treatment of organic substrates: ultrasonically clean the substrates with deionized water for 10min-30min with acetone for 10min-30min, and then Blow nitrogen to the surface to dry or bake in a drying oven at 20°C-60°C until dry, and then treat with oxygen plasma for 1min-10min; 2. Colloid solution configuration: polystyrene, poly Methyl methacrylate, silicon dioxide or titanium dioxide pellets are added to the solvent to obtain a solution with a monodispersity of less than or equal to 5% and a mass fraction of 0.005%-5%, and then the resulting solution is ultrasonically oscillated for 10min-30min to obtain a colloid solution; 3. Put the organic substrate into the container after cleaning with deionized water for 10-30min, ultrasonically cleaning with acetone for 10-30min, rinsing with deionized water and drying, then add the colloidal solution configured in step 2, and then heat the The colloidal solution is volatilized at a constant temperature of ℃-70℃, and the substrate is taken out after no substance volatilizes, and the photonic crystal is obtained; the organic substrate described in step 1 is a polyester substrate with a thickness of 0.01mm-1mm, polyimide substrate, polysulfone substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organic silicon substrate or rubber substrate; in step 1, the organic substrate is curled into a hollow cylinder, a hollow truncated cone or a spiral Form; The solvent described in step 2 is one or more mixed solutions in deionized water, ethanol, methanol, ethylene glycol.

The substrate in step 1 of the method is directly put into the colloid solution obtained in step 2 without processing.

The inventive method curls the substrate into a hollow cylinder, a hollow truncated cone or a spiral shape, so the volume of the container for the colloidal solution is reduced, and the utilization rate of the colloidal solution is improved (the photonic crystal obtained by the common method has only to grow on the hard substrate Only photonic crystals can be taken out for use, and most of the pellets are grown on the container wall, causing waste.), the substrate used in the present invention is film-like and can be directly attached to the container wall for deposition, reducing the use of limiters , the method of the present invention enables photonic crystals to be deposited on the substrate on one side or both sides, and the photonic crystals are deposited on the substrate to the greatest extent. Compared with the horizontal substrate used in the prior art, the method of the present invention increases the deposition rate of photonic crystals. At the same time, the obtained crystal can be bent, and the gap of the photonic crystal prepared by the invention is not filled with other materials, and the photonic crystal of the inverse opal structure can be prepared.

Description of drawings

Figure 1 is a schematic diagram of a hollow cylindrical substrate. FIG. 2 is a schematic diagram of a hollow frustum-shaped substrate, where 0<θ<180. Figure 3 is a schematic diagram of a spiral substrate.

Detailed ways

The technical solution of the present invention is not limited to the specific embodiments listed below, but also includes any combination of the specific embodiments.

Embodiment 1: The method for self-assembling photonic crystals in this embodiment is as follows: 1. Surface treatment of the substrate: ultrasonically clean the substrate with deionized water for 10min-30min with acetone for 10min-30min, and then blow it to the surface with nitrogen Dry or bake in a drying oven at 20°C-60°C until dry, then treat with oxygen plasma for 1min-10min; 2. Colloid solution configuration: polystyrene and polymethyl methacrylate with a spherical diameter of 50nm-5μm , silicon dioxide or titanium dioxide pellets are added to the solvent to obtain a solution with a monodispersity of less than or equal to 5% and a mass fraction of 0.005%-5%, and then the resulting solution is ultrasonically oscillated for 10min-30min to obtain a colloidal solution; 3. Put the substrate into the container after cleaning with deionized water for 10-30 minutes, ultrasonically cleaning with acetone for 10-30 minutes, rinsing with deionized water and drying, then add the colloid solution prepared in step 2, and then place it at a constant temperature of 20°C-70°C Volatilize the colloidal solution under certain conditions, and take out the substrate after no substance volatilizes to obtain the photonic crystal; wherein the substrate described in step 1 is a polyester with a thickness of 0.01mm-1mm and the surface is coated with aluminum, silver, gold or indium tin oxide substrate, polyimide substrate, polysulfone substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organic silicon substrate or rubber substrate; in step 1, the substrate is curled into a hollow cylinder, Hollow truncated cone or spiral; the solvent described in step 2 is one or a mixed solution of deionized water, ethanol, methanol, and ethylene glycol.

When the solvent described in this embodiment is a mixed solution, the components are combined in any ratio.

Embodiment 2: The difference between this embodiment and Embodiment 1 is that the substrate in Step 1 is directly put into the colloid solution obtained in Step 2 without any treatment. Others are the same as the first embodiment.

Embodiment 3: The difference between this embodiment and Embodiment 1 is that the temperature of the drying oven in Step 1 is 35°C-65°C. . Others are the same as in the first embodiment.

Embodiment 4: This embodiment is different from Embodiment 1 in that the temperature of the drying oven in step 1 is 30°C-60°C. Others are the same as in the first embodiment.

Embodiment 5: This embodiment is different from Embodiment 1 in that the temperature of the drying oven in step 1 is 35°C-45°C. Others are the same as in the first embodiment.

Embodiment 6: This embodiment is different from Embodiment 1 in that the temperature of the drying oven in step 1 is 50°C. Others are the same as in the first embodiment.

Embodiment 7: This embodiment is different from Embodiment 1 in that the mass fraction of the solution in step 2 is 0.01%-4.5%. Others are the same as in the first embodiment.

Embodiment 8: This embodiment is different from Embodiment 1 in that the mass fraction of the solution in step 2 is 0.02%-4%. Others are the same as in the first embodiment.

Embodiment 9: The difference between this embodiment and Embodiment 1 is that the mass fraction of the solution in step 2 is 0.05%-3.5%. Others are the same as in the first embodiment.

Embodiment 10: This embodiment is different from Embodiment 1 in that the mass fraction of the solution in step 2 is 0.1%-3%. Others are the same as in the first embodiment.

Embodiment 11: This embodiment is different from Embodiment 1 in that the mass fraction of the solution in step 2 is 0.5%-2.5%. Others are the same as in the first embodiment.

Embodiment 12: This embodiment is different from Embodiment 1 in that the mass fraction of the solution in step 2 is 1%-2%. Others are the same as in the first embodiment.

Specific Embodiment Thirteen: This embodiment differs from Specific Embodiment 1 in that the mass fraction of the solution in step 2 is 1.5%. Others are the same as in the first embodiment.

Embodiment 14: The difference between this embodiment and Embodiment 1 is that the temperature in step 3 is 35°C-65°C. . Others are the same as in the first embodiment.

Embodiment 15: This embodiment is different from Embodiment 1 in that the temperature described in step 3 is 50°C. Others are the same as in the first embodiment.

Specific Embodiment Sixteen: The method for self-assembling photonic crystals in this embodiment is as follows: 1. Surface treatment of the organic substrate: put the organic substrate into an acidic solution with a mass fraction of 5%-30% for 1min-30min, and then use Ultrasonic cleaning with deionized water for 10min-30min and drying; 2. Colloidal solution configuration: add polystyrene, polymethyl methacrylate, silicon dioxide or titanium dioxide pellets with a diameter of 50nm-5μm into the solvent to obtain a single Dispersion is less than or equal to 5%, and the mass fraction is 0.005%-5%, and then the obtained solution is ultrasonically oscillated for 10min-30min to obtain a colloidal solution; 3. Put the organic substrate in deionized water for 10-30min, acetone Ultrasonic cleaning for 10-30 minutes, rinsed with deionized water and dried into the container, then add the colloid solution prepared in step 2, and then volatilize the colloid solution at a constant temperature of 20°C-70°C, and take out the substrate when no substance volatilizes , to obtain photonic crystals; wherein the organic substrate described in step 1 is a polyester substrate, polyimide substrate, polysulfone substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate with a thickness of 0.01mm-1mm , polyurethane substrate, organic silicon substrate or rubber substrate; the acidic solution described in step 1 is potassium dichromate solution; in step 1, the organic substrate is curled into a hollow cylinder, hollow truncated cone or spiral; step 2 The solvent described in is one or a mixed solution of deionized water, ethanol, methanol, and ethylene glycol.

When the solvent described in this embodiment is a mixed solution, the components are combined in any ratio.

The potassium dichromate solution described in this embodiment is composed of 60g of potassium dichromate, 300ml of deionized water and 460ml of concentrated sulfuric acid with a density of 1.84g/cm ³ and a concentration of 98%.

Embodiment 17: This embodiment is different from Embodiment 16 in that the substrate in step 1 is directly put into the colloid solution obtained in step 2 without processing. Others are the same as in the sixteenth embodiment.

Embodiment 18: The difference between this embodiment and Embodiment 16 is that the mass fraction of the acidic solution in step 1 is 8%-25%. Others are the same as in the sixteenth embodiment.

Embodiment 19: The difference between this embodiment and Embodiment 16 is that the mass fraction of the acidic solution in step 1 is 10%-20%. Others are the same as in the sixteenth embodiment.

Embodiment 20: This embodiment is different from Embodiment 16 in that the mass fraction of the acidic solution in step 1 is 15%. Others are the same as in the sixteenth embodiment.

Embodiment 21: This embodiment is different from Embodiment 16 in that the mass fraction of the alkali solution in step 1 is 6%-18%. Others are the same as in the sixteenth embodiment.

Embodiment 22: The difference between this embodiment and Embodiment 16 is that the mass fraction of the alkali solution in step 1 is 8%-16%. Others are the same as in the sixteenth embodiment.

Embodiment 23: The difference between this embodiment and Embodiment 16 is that the mass fraction of the alkali solution in step 1 is 10%. Others are the same as in the sixteenth embodiment.

Embodiment 24: This embodiment is different from Embodiment 16 in that the mass fraction of the solution in step 2 is 0.01%-4.5%. Others are the same as in the sixteenth embodiment.

Embodiment 25: This embodiment is different from Embodiment 16 in that the mass fraction of the solution in step 2 is 0.02%-4%. Others are the same as in the sixteenth embodiment.

Embodiment 26: The difference between this embodiment and Embodiment 16 is that the mass fraction of the solution in step 2 is 0.05%-3.5%. Others are the same as in the sixteenth embodiment.

Embodiment 27: This embodiment is different from Embodiment 16 in that the mass fraction of the solution in step 2 is 0.1%-3%. Others are the same as in the sixteenth embodiment.

Embodiment 28: This embodiment is different from Embodiment 16 in that the mass fraction of the solution in step 2 is 0.5%-2.5%. Others are the same as in the sixteenth embodiment.

Embodiment 29: This embodiment is different from Embodiment 16 in that the mass fraction of the solution in step 2 is 1%-2%. Others are the same as in the sixteenth embodiment.

Embodiment 30: This embodiment is different from Embodiment 16 in that the mass fraction of the solution in step 2 is 1.5%. Others are the same as in the sixteenth embodiment.

Embodiment 31: The difference between this embodiment and Embodiment 16 is that the temperature in step 3 is 35°C-65°C. . Others are the same as in the sixteenth embodiment.

Embodiment 32: The difference between this embodiment and Embodiment 16 is that the temperature in step 3 is 50°C. Others are the same as in the sixteenth embodiment.

Specific Embodiment Thirty-Three: The method for self-assembling photonic crystals in this embodiment is as follows: 1. Surface treatment of organic substrates: ultrasonically clean the substrates that have been ultrasonically cleaned with deionized water for 10min-30min with acetone for 10min-30min, and then use nitrogen gas Blow to the surface to dry or dry in a drying oven at 20°C-60°C until dry, then treat with oxygen plasma for 1min-10min; 2. Colloid solution configuration: polystyrene, polymethyl Methyl acrylate, silicon dioxide or titanium dioxide pellets are added to the solvent to obtain a solution with a monodispersity of less than or equal to 5% and a mass fraction of 0.005%-5%, and then the obtained solution is ultrasonically oscillated for 10min-30min to obtain a colloidal solution; 3. Put the organic substrate into the container after cleaning with deionized water for 10-30 minutes, ultrasonically cleaning with acetone for 10-30 minutes, rinsing with deionized water and drying, then add the colloid solution prepared in step 2, and then put it in the container at a temperature of 20°C- The colloidal solution is volatilized at a constant temperature of 70°C, and the substrate is taken out after no substance volatilizes, and the photonic crystal is obtained; the organic substrate described in step 1 is a polyester substrate, polyimide substrate, Polysulfone substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, silicone substrate or rubber substrate; in step 1, the organic substrate is curled into a hollow cylinder, hollow truncated cone or spiral; The solvent described in step 2 is one or a mixed solution of deionized water, ethanol, methanol, and ethylene glycol.

In the first step of this embodiment, a plasma discharge device is used for oxygen plasma treatment, wherein the discharge power of the plasma discharge device is a plasma high-voltage pulse power supply, and the gas is controlled by a D08-1A/ZM flow controller. Fluorescence oscilloscope (Tektronix TDS3015500MHz), OOIBase32 spectrometer, JC200A static drop contact angle/interfacial tension measuring instrument.

When the solvent described in this embodiment is a mixed solution, the components are combined in any ratio.

Embodiment 34: This embodiment is different from Embodiment 33 in that the substrate in step 1 is directly put into the colloid solution obtained in step 2 without any treatment. Others are the same as in the thirty-third specific embodiment.

Embodiment 35: This embodiment is different from Embodiment 33 in that the temperature of the drying oven in step 1 is 25°C-55°C. Others are the same as in the thirty-third specific embodiment.

Embodiment 36: The difference between this embodiment and Embodiment 33 is that the temperature of the drying oven in step 1 is 30°C-50°C. Others are the same as in the thirty-third specific embodiment.

Embodiment 37: The difference between this embodiment and Embodiment 33 is that the temperature of the drying oven in step 1 is 35°C-45°C. Others are the same as in the thirty-third specific embodiment.

Embodiment 38: The difference between this embodiment and Embodiment 33 is that the temperature of the drying oven in step 1 is 40°C. Others are the same as in the thirty-third specific embodiment.

Specific Embodiment 39: The difference between this embodiment and Specific Embodiment 33 is that the mass fraction of the solution in step 2 is 0.01%-4.5%. Others are the same as in the thirty-third specific embodiment.

Embodiment 40: This embodiment differs from Embodiment 33 in that the mass fraction of the solution in step 2 is 0.02%-4%. Others are the same as in the thirty-third specific embodiment.

Embodiment 41: This embodiment differs from Embodiment 33 in that the mass fraction of the solution in step 2 is 0.05%-3.5%. Others are the same as in the thirty-third specific embodiment.

Specific Embodiment 42: This embodiment differs from Specific Embodiment 33 in that the mass fraction of the solution in step 2 is 0.1%-3%. Others are the same as in the thirty-third specific embodiment.

Embodiment 43: This embodiment differs from Embodiment 33 in that the mass fraction of the solution in step 2 is 0.5%-2.5%. Others are the same as in the thirty-third specific embodiment.

Embodiment 44: This embodiment is different from Embodiment 33 in that the mass fraction of the solution in step 2 is 1%-2%. Others are the same as in the thirty-third specific embodiment.

Embodiment 45: This embodiment differs from Embodiment 33 in that the mass fraction of the solution in step 2 is 1.5%. Others are the same as in the thirty-third specific embodiment.

Embodiment 46: The difference between this embodiment and Embodiment 33 is that the temperature in step 3 is 35°C-65°C. . Others are the same as in the thirty-third specific embodiment.

Embodiment 47: The difference between this embodiment and Embodiment 33 is that the temperature in step 3 is 50°C. Others are the same as in the thirty-third specific embodiment.

Claims (10)

1, the method for self-assembling photonic crystal, the method that it is characterized in that self-assembling photonic crystal is as follows: one, the surface treatment of substrate: will be through the substrate of deionized water ultrasonic cleaning 10min-30min acetone ultrasonic cleaning 10min-30min, blow to surface drying or in 20 ℃-60 ℃ loft drier with nitrogen then and dry by the fire, use oxygen plasma treatment 1min-10min again to dry; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate that 0.01mm-1mm and surface are coated with aluminium, silver, gold or tin indium oxide; In the step 1 described substrate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.

2, the method for self-assembling photonic crystal according to claim 1 is characterized in that substrate in the step 1 is not handled directly to put into the colloidal solution that step 2 obtains.

3, the method for self-assembling photonic crystal according to claim 1 is characterized in that the temperature described in the step 3 is 35 ℃-65 ℃.

4, the method for self-assembling photonic crystal, the method that it is characterized in that self-assembling photonic crystal is as follows: one, the surface treatment of organic substrate: the acidic solution of organic substrate being put into massfraction 5%-30% soaks 1min-30min, and then with deionized water ultrasonic cleaning 10min-30min, drying; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, organic substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the organic substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate of 0.01mm-1mm; Acidic solution described in the step 1 is a potassium bichromate solution; In the step 1 described organic radical plate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.

5, the method for self-assembling photonic crystal according to claim 4 is characterized in that substrate in the step 1 is not handled directly to put into the colloidal solution that step 2 obtains.

6, the method for self-assembling photonic crystal according to claim 4 is characterized in that the temperature described in the step 3 is 35 ℃-65 ℃.

7, the method for self-assembling photonic crystal, the method that it is characterized in that self-assembling photonic crystal is as follows: one, the surface treatment of organic substrate: will be through the substrate of deionized water ultrasonic cleaning 10min-30min acetone ultrasonic cleaning 10min-30min, blow to surface drying or in 20 ℃-60 ℃ loft drier with nitrogen then and dry by the fire, use oxygen plasma treatment 1min-10min again to dry; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, organic substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the organic substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate of 0.01mm-1mm; In the step 1 described organic radical plate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.

8, the method for self-assembling photonic crystal according to claim 7 is characterized in that substrate in the step 1 is not handled directly to put into the colloidal solution that step 2 obtains.

9, the method for self-assembling photonic crystal according to claim 8 is characterized in that the temperature described in the step 3 is 35 ℃-65 ℃.

10, the method for self-assembling photonic crystal according to claim 9 is characterized in that the temperature described in the step 3 is 50 ℃.

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