CN108793054A - A kind of micro-nano electrode preparation facilities and preparation method based on bidirectional pulse power supply - Google Patents
A kind of micro-nano electrode preparation facilities and preparation method based on bidirectional pulse power supply Download PDFInfo
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- CN108793054A CN108793054A CN201810730212.3A CN201810730212A CN108793054A CN 108793054 A CN108793054 A CN 108793054A CN 201810730212 A CN201810730212 A CN 201810730212A CN 108793054 A CN108793054 A CN 108793054A
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- power supply
- pulse power
- ring
- bidirectional pulse
- electrode
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- 238000002360 preparation method Methods 0.000 title claims abstract description 27
- 230000002457 bidirectional effect Effects 0.000 title claims abstract description 26
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 37
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims abstract description 11
- 239000007788 liquid Substances 0.000 claims abstract description 6
- 230000005540 biological transmission Effects 0.000 claims abstract description 4
- 238000005530 etching Methods 0.000 claims abstract description 4
- 238000009434 installation Methods 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 210000001367 artery Anatomy 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims description 3
- 238000004080 punching Methods 0.000 claims description 3
- 210000003462 vein Anatomy 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 238000009826 distribution Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 238000000992 sputter etching Methods 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000010008 shearing Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000036647 reaction Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00111—Tips, pillars, i.e. raised structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B1/00—Devices without movable or flexible elements, e.g. microcapillary devices
- B81B1/006—Microdevices formed as a single homogeneous piece, i.e. wherein the mechanical function is obtained by the use of the device, e.g. cutters
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Computer Hardware Design (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
The present invention provides a kind of micro-nano electrode preparation facilities and preparation method based on bidirectional pulse power supply.Preparation facilities includes：Working plate, electrolytic bath, convex support block, bidirectional pulse power supply, connecting shaft, platinum ring, horizontal support arm and vertical rack arm.Preparation method step includes：Potassium hydroxide solution is loaded in electrolytic bath, and makes the liquid level of potassium hydroxide solution higher than the mounting height of platinum ring；By the upper end clamping of electrode bar on collet, and the center ring hole of platinum ring, the concentric setting of center ring hole of electrode bar and platinum ring are run through in the lower end of electrode bar；The direct impulse for being alternately 100ns-150ns to collet transmission pulsewidth using the bidirectional pulse power supply period and the reverse impulse for being 150ns-160ns to platinum ring transmission pulsewidth, to be performed etching to electrode bar.The micro-nano electrode preparation facilities and preparation method are under the motion conditions for not applying any external world, can be realized only with bidirectional pulse power supply and reduce the taper for preparing nano-electrode.
Description
Technical field
The invention is related to a kind of micro-nano electrode preparation facilities and preparation method, especially a kind of to be based on bidirectional pulse
The micro-nano electrode preparation facilities and preparation method of power supply.
Background technology
The electrode of micro-nano-scale is the necessary condition for carrying out microfabrication, and the method for preparing micro-nano electrode at present is main
There are mechanical shearing, focused ion milling, Electrolyzed Processing etc..The electrode that mechanical shearing is prepared is mainly cone-shaped electrode, success
Rate it is low and prepare precision it is difficult to ensure that.Focused ion milling can prepare the electrode of various patterns, but focused ion milling
Equipment is expensive, and processing efficiency is low, and it is of high cost to prepare electrode.Electrolyzed Processing is the current preparation most common method of micro-nano electrode,
Electrode size is controllable and relatively simple.
Using electrochemical machining method, in process since the accumulation state of electrolysate so that the tool processed is electric
Pole is in up big and down small cone-shaped, and this taper electrode limits its precision for being used to process to a certain extent.According to such
Shape electrode carries out electrolysis punching, then the side wall in the hole processed then has prodigious taper.In order to reduce the electricity prepared
The taper of pole increases the draw ratio of electrode, and also often various movements are applied in process so that electrolysate distribution tends to
Uniformly.Using used in electrochemical machining process piezoelectric ceramics to electrolyte membrane into line frequency for 35HZUp-down vibration reduces and expands
Influence of the layer to electrode pattern is dissipated, to reduce the taper of nano-electrode, but this needs is additionally matched in electrode preparation facilities
Standby vibrational system.
Invention content
Additional auxiliary device is needed the technical problem to be solved by the present invention is to existing preparation facilities and preparation method, is increased
The manufacturing cost added.
It is prepared by the micro-nano electrode based on bidirectional pulse power supply that in order to solve the above technical problem, the present invention provides a kind of
Device, including working plate, electrolytic bath, convex support block, bidirectional pulse power supply, connecting shaft, platinum ring, horizontal support arm
And vertical rack arm；Electrolytic bath is set on working plate, and vertical rack arm is vertically fixedly mounted on working plate；It is horizontal
It is fixedly mounted on vertical rack arm by the first installation bolt to one end of support arm；One end of connecting shaft passes through the second installation spiral shell
Bolt is fixedly mounted on the other end of horizontal support arm；Connecting shaft is parallel with vertical rack arm；Convex support block is fixedly mounted
In electrolytic bath, platinum ring is mounted on by cantilever level on convex support block, and platinum ring is located in electrolytic bath；
It is directed toward the center ring hole of platinum ring in the lower end of connecting shaft；The folder for gripping electrode bar is equipped on the lower end of connecting shaft
Head；The positive terminal of bidirectional pulse power supply is electrically connected by water proof wire with collet；The negative pole end of bidirectional pulse power supply passes through waterproof
Conducting wire is electrically connected with platinum ring.
Further, the ring plate thickness of platinum ring is 2-3mm, a diameter of 6-7mm of center ring hole.
Further, include the following steps：
Step 1, potassium hydroxide solution is loaded in electrolytic bath, and makes the liquid level of potassium hydroxide solution higher than platinum ring
Mounting height；
Step 2, by the upper end clamping of electrode bar on collet, and the center ring of platinum ring is run through in the lower end of electrode bar
Hole, the concentric setting of center ring hole of electrode bar and platinum ring；
Step 3, using the bidirectional pulse power supply period alternately to collet send pulsewidth be 100ns-150ns direct impulse with
And the reverse impulse that pulsewidth is 150ns-160ns is sent to platinum ring, to be performed etching to electrode bar.
Further, the solubility of the potassium hydroxide solution loaded in electrolytic bath is 1.5mol/L.
The beneficial effects of the present invention are：Preferable draw ratio in order to obtain should take measures so that electric around electrode bar
Solution product distribution tends to be uniform, and the invention reside in the movements for not applying any external world, can be real only with bidirectional pulse power supply
Now reduce the taper for preparing nano-electrode；In direct impulse, electrochemical dissolution occurs for the electrode bar as anode, and product exists
It moves down and is accumulated in around electrode bar under the action of gravity, form the accumulation of taper；When reverse impulse, electrode bar is used as cathode again
Hydrogen is generated, the formation and effusion of bubble hydrogen form disturbance to accumulating in the electrolysate around electrode bar when direct impulse, makes
Product distribution tends to be uniform or is scattered in electrolyte so that conductivity tends to be uniform around electrode bar, in cycles to
So that the tool-electrode prepared has good draw ratio.
Description of the drawings
Fig. 1 is the micro-nano electrode preparation facilities overall structure diagram of the present invention；
Fig. 2 is the distribution situation of present invention electrolysate around tungsten bar in direct impulse；
Fig. 3 is the distribution situation of present invention electrolysate around tungsten bar in reverse impulse.
Specific implementation mode
As shown in Figure 1, the micro-nano electrode preparation facilities provided by the invention based on bidirectional pulse power supply includes：Workbench
Plate 1, electrolytic bath 2, convex support block 4, bidirectional pulse power supply 6, connecting shaft 9, platinum ring 12, horizontal support arm 13 and perpendicular
Allotment boom 15；Electrolytic bath 2 is set on working plate 1, and vertical rack arm 15 is vertically fixedly mounted on working plate 1；
One end of horizontal support arm 13 is fixedly mounted by the first installation bolt 14 on vertical rack arm 15；One end of connecting shaft 9 passes through
Second installation bolt 8 is fixedly mounted on the other end of horizontal support arm 13；Connecting shaft 9 is parallel with vertical rack arm 15；It is convex
Shape backbone block 4 is fixedly mounted on by screw 3 in electrolytic bath 2, and platinum ring 12 is mounted on convex support by cantilever level
On block 4, the end of cantilever is mounted on by screw 3 on convex support block 4, and platinum ring 12 is located in electrolytic bath 2；Connection
It is directed toward the center ring hole of platinum ring 12 in the lower end of axis 9；It is equipped on the lower end of connecting shaft 9 for gripping electrode bar 11
Collet 10；The positive terminal of bidirectional pulse power supply 6 is electrically connected by water proof wire 7 with collet 10；The negative pole end of bidirectional pulse power supply 6
It is electrically connected with platinum ring 12 by water proof wire 7.The ring plate thickness of platinum ring 12 be 2-3mm, center ring hole it is a diameter of
6-7mm。
Micro-nano electrode preparation method provided by the invention based on bidirectional pulse power supply, includes the following steps：
Step 1, potassium hydroxide solution is loaded in electrolytic bath 2, and the liquid level of potassium hydroxide solution 5 is made to be higher than platinum ring
The solubility of 12 mounting height, potassium hydroxide solution 5 is 1.5mol/L；
Step 2, by the upper end clamping of electrode bar 11 on collet 10, and the lower end of electrode bar 11 is through platinum ring 12
Center ring hole, the concentric setting of center ring hole of electrode bar 11 and platinum ring 12；
Step 3, using 6 period of bidirectional pulse power supply alternately the positive arteries and veins that pulsewidth is 100ns-150ns is sent to collet 10
Punching and the reverse impulse for being 150ns-160ns to the transmission pulsewidth of platinum ring 12, i.e., it is 100ns- to send pulsewidth to collet 10
After the direct impulse of 150ns, then to platinum ring 12 send pulsewidth be 150ns-160ns reverse impulse, such alternate cycles,
The amplitude of direct impulse and reverse impulse is 4V, and to be performed etching to electrode bar 11, when direct impulse, electrode bar 11 is in electricity
Since the progress of cell reaction is gradually etched in solution liquid bath 2, electrolysate is accumulated in around electrode bar 11, due to gravity
Effect form up-small and down-big distribution, as shown in Figure 2；When reverse impulse, electrode bar 11, which is equivalent to, at this time connects power supply
Cathode, generate a large amount of bubbles, due to bubble floating and explosion to around electrode bar 11 electrolysate generate disturbance so that
The distribution of 11 surrounding electrolysate of electrode bar tends to be uniformly distributed, as shown in figure 3, in cycles, to make the micro-nano electrode prepared
Taper smaller.
Claims (4)
1. a kind of micro-nano electrode preparation facilities based on bidirectional pulse power supply, which is characterized in that including working plate (1), electricity
Solve liquid bath (2), convex support block (4), bidirectional pulse power supply (6), connecting shaft (9), platinum ring (12), horizontal support arm (13)
And vertical rack arm (15)；Electrolytic bath (2) is set on working plate (1), and vertical rack arm (15) is vertically fixedly mounted
On working plate (1)；Vertical rack arm is fixedly mounted by the first installation bolt (14) in one end of horizontal support arm (13)
(15) on；One end of connecting shaft (9) is fixedly mounted on by the second installation bolt (8) on the other end of horizontal support arm (13)；
Connecting shaft (9) is parallel with vertical rack arm (15)；Convex support block (4) is fixedly mounted in electrolytic bath (2), platinum ring
(12) it is mounted on convex support block (4) by cantilever level, and platinum ring (12) is located in electrolytic bath (2)；Connecting shaft
(9) it is directed toward the center ring hole of platinum ring (12) in lower end；It is equipped on the lower end of connecting shaft (9) for gripping electrode bar
(11) collet (10)；The positive terminal of bidirectional pulse power supply (6) is electrically connected by water proof wire (7) with collet (10)；Two-way arteries and veins
The negative pole end for rushing power supply (6) is electrically connected by water proof wire (7) with platinum ring (12).
2. the micro-nano electrode preparation facilities according to claim 1 based on bidirectional pulse power supply, which is characterized in that platinum
The ring plate thickness for belonging to ring (12) is 2-3mm, a diameter of 6-7mm of center ring hole.
3. the preparation method of the micro-nano electrode preparation facilities according to claim 1 based on bidirectional pulse power supply, special
Sign is, includes the following steps：
Step 1, potassium hydroxide solution is loaded in electrolytic bath (2), and the liquid level of potassium hydroxide solution is made to be higher than platinum ring
(12) mounting height；
Step 2, by the upper end clamping of electrode bar (11) on collet (10), and platinum ring is run through in the lower end of electrode bar (11)
(12) center ring hole, the concentric setting of center ring hole of electrode bar (11) and platinum ring (12)；
Step 3, using bidirectional pulse power supply (6) period alternately the positive arteries and veins that pulsewidth is 100ns-150ns is sent to collet (10)
Punching and the reverse impulse for being 150ns-160ns to platinum ring (12) transmission pulsewidth, to be performed etching to electrode bar (11).
4. the preparation method of the micro-nano electrode preparation facilities according to claim 3 based on bidirectional pulse power supply, special
Sign is that the solubility of the potassium hydroxide solution loaded in electrolytic bath (2) is 1.5mol/L.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810730212.3A CN108793054B (en) | 2018-07-05 | 2018-07-05 | Micro-nano electrode preparation device and preparation method based on bidirectional pulse power supply |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810730212.3A CN108793054B (en) | 2018-07-05 | 2018-07-05 | Micro-nano electrode preparation device and preparation method based on bidirectional pulse power supply |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108793054A true CN108793054A (en) | 2018-11-13 |
| CN108793054B CN108793054B (en) | 2023-11-07 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110649828A (en) * | 2019-10-11 | 2020-01-03 | 昆明医科大学 | Non-invasive guide electrode and direct current power supply for providing stimulation current for non-invasive guide electrode |
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| Publication number | Publication date |
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| CN108793054B (en) | 2023-11-07 |
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