CN108767042A - A kind of reflection gain type high transmittance solar battery back film and preparation method thereof - Google Patents
A kind of reflection gain type high transmittance solar battery back film and preparation method thereof Download PDFInfo
- Publication number
- CN108767042A CN108767042A CN201810506087.8A CN201810506087A CN108767042A CN 108767042 A CN108767042 A CN 108767042A CN 201810506087 A CN201810506087 A CN 201810506087A CN 108767042 A CN108767042 A CN 108767042A
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- China
- Prior art keywords
- layer
- modified
- high reflectance
- pattern layer
- reflectance pattern
- Prior art date
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- Granted
Links
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
- H01L31/049—Protective back sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
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- B32B15/00—Layered products comprising a layer of metal
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/09—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyesters
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- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
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- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/0008—Electrical discharge treatment, e.g. corona, plasma treatment; wave energy or particle radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
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Abstract
The present invention relates to a kind of reflection gain type high transmittance solar battery back film, including transparent thin film layer, the transparent thin film layer upper surface and/or lower surface are provided with high reflectance pattern layer；The high reflectance pattern layer is latticed, and the position of mesh and the position of cell piece are consistent, and the area of the mesh is less than the area of cell piece.Transparent thin film layer and high reflectance pattern layer are combined, reflection gain type transparent solar cell notacoria can be adapted for different component version types and ensure to all have high reflection function after establishment of component between piece and between string, the visible light and near infrared light mean transmissivity > 90% of 380-1280nm, and in solar cell uncovering area, the new functionalized notacoria of the visible light and near infrared light average reflectance > 90% of 380-1280nm.The component generated output gain that the solar battery back film prepared using the present invention is made is up to 5-6W.It also can significantly reduce PID phenomenons simultaneously.Also have preparation process simple, cost is to cheap advantage.
Description
Technical field
The present invention relates to area of solar cell, more particularly to a kind of reflection gain type high transmittance solar battery back film
And preparation method thereof.
Background technology
In recent years, with the further implementation of national energy conservation and emission reduction policy, photovoltaic generation is arranged with its cleaning, efficient, zero carbon
The advantages of putting is received by more and more people.According to statistics, 2017, the newly-increased photovoltaic installed capacity in the whole world reached 100GW, together
Than increasing by 43%, the accumulative installed capacity in the whole world has reached 405GW, it is contemplated that global total installed capacity amount is up to 109GW within 2018, continues
Keep the situation of high growth.As the basic unit of photovoltaic generation, the structure of solar cell module is followed successively by light from top to bottom
Lie prostrate glass, EVA packaging adhesive films, crystal silicon solar batteries piece, EVA packaging adhesive films and solar battery back film.Wherein solar-electricity
Pond notacoria mainly plays protection and support solar components, it is made to keep solar cell module in harsh natural environment
Work normally 25 years or more.
With the development of photovoltaic industry technology, the technology of solar battery back film requires also stepping up.Currently, the sun
Energy battery back film is in addition to needing to meet it in production and processing and the custom requirements of outdoor application, such as fracture strength, fault growth
Other than rate and EVA peel strengths, uv-resistance energy, wet-hot aging performance, the gain effect for considering notacoria for component power is also needed.
With the fast development of generating electricity on two sides solar battery technology, high visible light transmissivity solar battery back film becomes the market demand
One of main function notacoria.Although high transmittance solar battery back film needs to solve many technical barriers, such as it is not less than
The visible light transmittance of glass, ultraviolet tolerance performance and hydrothermal aging performance not less than conventional notacoria, however with Suzhou
Photovoltaic green wood limited liability company is the Shen of the high-tech enterprise that represents in Chinese Patent Application No. as CN201520087689.6
A kind of transparent solar cell notacoria and its component please be disclosed in case, laid for the development of high transmittance solar battery back film
Good basis.However, for generating electricity on two sides component, the notacoria transmitance of battery overlay area is not reduced and is improved not electric
The backside reflection rate of pond overlay area is that solar battery back film is badly in need of the technical barrier solved.
Invention content
Technical problem to be solved by the present invention lies in the deficiencies for overcoming the above-mentioned prior art, provide a kind of by high visible
Transmitance and high reflectivity can be integrated in the high transmittance with high reflection gain on same solar battery back film too simultaneously
Positive energy battery back film and preparation method thereof.
A kind of reflection gain type high transmittance solar battery back film provided by the invention, the main technical schemes of use
For：
A kind of reflection gain type high transmittance solar battery back film, including transparent thin film layer, which is characterized in that described
Bright film layer upper surface and/or lower surface are provided with high reflectance pattern layer；The high reflectance pattern layer is latticed, mesh
Position and the position of cell piece be consistent, the area of the mesh is less than the area of cell piece.
Reflection gain type high transmittance solar battery back film provided by the invention, further includes following attached technical scheme：
Wherein, the edge of the mesh extends internally 1-15mm along the periphery of cell piece；The mesh quadrangle is oblique angle mistake
It crosses.
Wherein, the high reflectance pattern layer is the coating that outer surface carried out plasma treatment；
The high reflectance pattern layer is the coating that thickness is 1-100 μm, and the constituent of the coating includes functionality
Fluorine modified resin, curing agent, filler and auxiliary agent；
The filler is barium sulfate and graphene.
Wherein, the high reflectance pattern layer is the film layer that outer surface carried out plasma treatment；
The high reflectance pattern layer be 60-99% to the reflectivity of 300-1250nm wavelength lights high molecular polymerization
Object film and/or metallic film；The thickness of the high molecular polymer film and/or metallic film is 1-100 μm, passes through gluing
Agent is pasted onto transparent thin film layer upper surface and/or lower surface.
Wherein, the high reflectance pattern layer includes the upper and lower；
The lower layer is the first high reflectance pattern being pasted onto on the transparent thin film layer upper surface and/or lower surface
Layer, the upper layer be coated in the second high reflectance pattern layer in the first high reflectance pattern layer, or
The lower layer is coated in the first high reflectance pattern layer on transparent thin film layer upper surface and/or lower surface, institute
It is the second high reflectance pattern layer being pasted onto in the first high reflectance pattern layer to state upper layer.
Wherein, the transparent thin film layer includes main film body and is arranged in the saturating of main film body upper surface and/or lower surface
Bright functional layer.
Wherein, it is provided with transparent functional layer on the face of the high reflectance pattern layer far from transparent thin film layer.
Wherein, the transparent thin film layer is 60%-99% to the transmitance of 300nm-1250nm wavelength lights, and thickness is
310-500μm；
The transparent thin film layer includes transparent polyethylene terephthalate, polybutylene terephthalate (PBT), poly- naphthalene
Naphthalate, polyolefin, polyamide, polyimides, polyureas, makrolon, polyacrylate derivatives, polyvinyl fluoride,
One or more of Kynoar, poly- trifluoro-ethylene, polytetrafluoroethylene (PTFE).
Wherein, preparation method includes step：
S1：It takes transparent polyethylene terephthalate to prepare main film body, is applied coated with modified poly- on main film body surface
Pvdf resin, modified daiflon, modified polytetrafluoroethylresin resin, modified tetrafluoroethene-hexafluoropropane are total
Copolymer resin, modified Teflon alkoxy resin, modified ethylene-tetrafluoroethylene copolymer resin, modified fluoroolefins-ethylene
The transparent functional layer being prepared based on one or more of base ether copolymer resin, modified daiflon,
Transparent thin film layer is made；
S2：It takes functional fluorine modified resin, curing agent, filler and auxiliary agent to be uniformly mixed, high reflectance pattern is made
The coating of layer；
S3：By coating to set the upper surface and/or lower surface that pattern is coated in prefabricated transparent thin film layer, it is put into micro-
Wave baking oven, temperature adjustment adjust microwave to 400-2500MHz to the fully crosslinked solidification of coating, form high reflectance pattern to 60-180 DEG C
Layer；
S4：High reflectance pattern layer surface is polished, is polished, pattern makes, one or more of embossed surface
Treatment process, then carry out carrying out plasma treatment to its surface.
Wherein, preparation method includes step：
S1：It takes transparent polyethylene terephthalate to prepare main film body, is applied coated with modified poly- on main film body surface
Pvdf resin, modified daiflon, modified polytetrafluoroethylresin resin, modified tetrafluoroethene-hexafluoropropane are total
Copolymer resin, modified Teflon alkoxy resin, modified ethylene-tetrafluoroethylene copolymer resin, modified fluoroolefins-ethylene
The transparent functional layer being prepared based on one or more of base ether copolymer resin, modified daiflon,
Transparent thin film layer is made；
S2：To set pattern in the upper surface of prefabricated transparent thin film layer and/or lower surface adhesive coating；
S3：Molecularly Imprinted Polymer film and/or metallic film are pasted on adhesive, are put into microwave oven, temperature adjustment to 60-
180 DEG C, tune microwave to 400-2500MHz to adhesive solvent volatilizees；
S4：It is put into thermostatic chamber, temperature adjustment keeps temperature-curable 24-96 hours to 40-80 DEG C, forms high reflectance pattern
Layer；
S5：High reflectance pattern layer surface is polished, is polished, pattern makes, one or more of embossed surface
Treatment process, then carry out carrying out plasma treatment to its surface.
Being combined transparent thin-film material and high anti-material of the invention, has prepared one kind in solar cell
The area of coverage, the visible light and near infrared light mean transmissivity > 90% of 380-1250nm, and in solar cell uncovering area,
The new functionalized notacoria of the visible light and near infrared light average reflectance > 90% of 380-1280nm.The transparent sun of reflection gain type
Energy battery back film can be adapted for different component version types and ensure to all have high reflection work(after establishment of component between piece and between string
Can, and when preventing the angled irradiation of sunlight, be irradiated to not by solar cell overlay area across transparent thin film layer 3
Edge reduces the performance of reflectivity and anti-PID (potential induction attenuation).The component generated output being made using the present invention
Gain is up to 5-6W.Meanwhile solar battery back film prepared by the present invention can significantly reduce PID (potential induction attenuation) phenomenon.
The implementation of the present invention also has preparation process simple, relative inexpensiveness, can be according to being customized of specific requirements the advantages of.
Description of the drawings
Fig. 1 is the top view illustration of the reflection gain type high transmittance solar battery back film of the application.
Fig. 2 is the cross for the reflection gain type high transmittance solar battery back film being prepared by application type notacoria semi-finished product
Schematic cross-section.
Fig. 3 is prepared by the compound notacoria semi-finished product of the functional transparent membrane material of macromolecule membrane main body both sides gluing
The cross-sectional view of reflection gain type high transmittance solar battery back film.
Fig. 4 is the close-up schematic view of Fig. 1.
In figure, 1. high reflectance pattern layers；2. the second transparent functional layer；3. transparent thin film layer；4. transparent functional layer；5. glue
Stick；6. mesh；7. chamfering；8. show money or valuables one carries unintentionally region between cell piece；9. high reflectance pattern layer is to cell piece elongated area.
Specific implementation mode
The present invention is described in detail below in conjunction with embodiment, it should be pointed out that described embodiment only purport
Convenient for the understanding of the present invention, and any restriction effect is not played to it.
As shown in Figs 1-4, according to a kind of reflection gain type high transmittance solar battery back film provided by the invention, including
Transparent thin film layer, transparent thin film layer upper surface and/or lower surface are provided with high reflectance pattern layer；High reflectance pattern layer is net
Trellis, the position of mesh and the position of cell piece are consistent, and the area of the mesh is less than the area of cell piece.
Transparent thin film layer 3 and high reflectance pattern layer 1 are combined, and set the pattern of high reflectance pattern layer 1 to
It is latticed, and make mesh area be slightly less than relative position on the battery back film by the area of solar cell overlay area to be made
Certain area is capped by the border of solar cell overlay area when direct-view, it is therefore prevented that when the angled irradiation of sunlight, wear
It crosses transparent thin film layer 3 to be irradiated to not by the edge of solar cell overlay area, reduces reflectivity and anti-PID (potential inductions
Decaying) performance.And it is applicable to different component version types and ensures to all have high reflection work(after establishment of component between piece and between string
Energy.
Present embodiment reaches, the visible light and near infrared light mean transmissivity > 90% of 380-1280nm and in the sun
Energy battery uncovering area, the effect of the visible light and near infrared light average reflectance > 90% of 380-1280nm.And use this
The component generated output gain that solar battery back film prepared by invention is made is up to 5-6W.Meanwhile prepared by the present invention
Solar battery back film can significantly reduce PID (potential induction attenuation) phenomenon.
In order to play high reflection gain and the high transmittance performance of solar battery back film simultaneously, wherein the side of mesh
Edge extends internally 1-15mm along the periphery of cell piece；Preferably, the edge of mesh extends internally 3-8mm along the periphery of cell piece；
Most preferably, the edge of mesh extends internally 4mm along the periphery of cell piece；Due to current different manufacturers photovoltaic module version type not
Unanimously, especially piece spacing and string spacing, substantially between 1-5mm, and the process not precisely aligned in component typesetting,
Therefore high reflection region needs certain error range.In preferred scope, the specific high reflection region can be adapted for
Different component version types simultaneously ensure to all have high reflection function between all solar battery sheets after establishment of component and between string.
Preferably, the chamfered transition in mesh quadrangle.
Wherein, transparent thin film layer includes main film body and the transparent work(in main film body upper surface and/or lower surface is arranged
Ergosphere.
Main film body is transparent polyethylene terephthalate, transparent polybutylene terephthalate (PBT), transparent poly- naphthalene
It is naphthalate, transparency polyolefin, transparent polyamide, clear polyimides, transparent polyureas, clear polycarbonate, transparent poly-
In acrylate derivative, transparent polyvinyl fluoride, transparent polyvinylidene fluoride, transparent poly- trifluoro-ethylene, transparent Teflon
It is prepared based on one or more.
The thickness of main film body is 20-500 μm；Preferably thickness is 310-350 μm；Concrete numerical value be chosen as 150 μm,
180μm,250μm,265μm,275μm,300μm,350μm.Under preferred thickness, notacoria semi-finished product can keep good machinery
Performance, and good iris action can be played.
Wherein, transparent functional layer thickness is 1-50 μm, to the transmitance ranging from 60%- of 300nm-1250nm wavelength lights
100%.
Transparent functional layer include fluorocarbon resin, strand contain terminal hydroxy group polyester resin, consolidate containing polyisocyanate-based
Agent；Polyester resin is modified by natural rosin；Part dicarboxylic acid anhydride is substituted with dimerization colophonium acid.
Wherein, the mass ratio of isocyanate group and the hydroxyl is 0.3~0.9, preferably isocyanate group and the hydroxyl
Base ratio is 0.6~0.9, and most preferably isocyanate group and the hydroxyl ratio are 0.8；The solid content of coating polyester resin be 40~
95%, preferably polyester resin solid content is 50~90%, and most preferably polyester resin solid content is 65%.Coating under the proportioning
Relative inexpensiveness, adhesive force, weatherability, resistance to ultraviolet, color inhibition etc., which have, is optimal different performance.
The ratio of polyester resin and fluorocarbon resin can be allocated to adjust according to the specific application environment of backboard in coating
Control stability, weatherability and the degradability of backboard.
Wherein it is preferred to polyester resin is formed by polyacid and dihydric alcohol or binary acid with polyhydric alcohol, including
Two kinds of structures of line style and branching type, the molecular weight of polyester is changeable, molecular weight distribution can width can be narrow, polyester resin can be complete
New synthetic resin can also be the modified product of existing commercial polyester resin, and wherein modification can be physical modification and chemistry
It is modified.The introducing of polyester resin improves the shortcomings that fluororesin surface can be low, with PET base material bad adhesion, while pole in coating
It is big to improve that backboard recycling degradation is difficult, the big disadvantage of environmental pollution after burning.
It is further preferred that polyester resin is modified by natural rosin, part dicarboxylic acid anhydride is substituted with dimerization colophonium acid,
Aromatic ring content is few, and weatherability is good with being pernicious to people for the resin, and resistance to ultraviolet, color inhibition can improve backboard overall performance, with
EVA peel strengths are high, easily expansion, easily with base material bonding, be not easy anti-the features such as sticking out paint, fluorine coating poor adhesive force can be solved and be not easy
Cohesive problem, and it is cheap easy for construction.
Wherein, fluorocarbon resin is the polymer containing fluorine element in molecular backbone.Polymer can be reactive with right and wrong, than
Such as PVF, PVDF, PTFE can also be reactive, such as the reactive F carbon polymer containing hydroxyl.Polymer can be with
It is homopolymer, can also be copolymer.The molecular weight of polymer is changeable, molecular weight distribution can width can be narrow.Carbon-fluorine bond can be strong,
With especially advantageous properties.Weatherability, heat resistance, lower temperature resistance, chemical resistance, and low rub with unique
Wiping property.
To further increase the weatherability of notacoria, wherein on the face of the high reflectance pattern layer far from transparent thin film layer
It is provided with transparent functional layer.
In the embodiment 1,
Wherein, high reflectance pattern layer is the coating that outer surface carried out plasma treatment；Surface carried out at plasma
It manages to improve the surface property of coating.
Wherein, the coating that the thickness of coating is 1-100 μm, preferably thickness are 1-2.5 μm.Concrete numerical value be chosen as 1 μm,
2μm,5μm,10μm,12μm,15μm,20μm,25μm.Under preferably thickness, coating both can guarantee good reflecting properties, also
It can guarantee that it has as adhesive linkage (interface coating) or weathering layer (surface coating) due performance requirement.
The constituent of coating includes functional fluorine modified resin, curing agent, filler and auxiliary agent；
Wherein, functional fluorine modified resin includes modified polyfluoroethylene resin, modified polyvinilidene fluoride resin, modified poly- three
Fluorine vinyl chloride resin, modified polytetrafluoroethylresin resin, modified tetrafluoroethene-hexafluoropropane copolymer resin, modified polytetrafluoroethyl-ne
Alkene alkoxy resin, modified fluoroolefins-vinyl ether co-polymer resin, is modified and gathers modified ethylene-tetrafluoroethylene copolymer resin
One or more of trifluorochlorethylene resin；
Curing agent selects toluene di-isocyanate(TDI), ditolyl methane diisocyanate according to the performance of functional fluorine modified resin
Ester, isofoer diisocyanate, hexamethylene diisocyanate, dicyclohexyl methyl hydride diisocyanate, naphthalene diisocyanate,
Paraphenylene diisocyanate, 1,4- cyclohexane diisocyanates, benzene dimethylene diisocyanate, two isocyanide of cyclohexanedimethyleterephthalate
Acid esters, trimethyl -1,6- hexamethylene diisocyanates, tetramethyl m-xylylene diisocyanate, norbornane two are different
Cyanate, dimethyl diphenyl diisocyanate, Methylcyclohexyl diisocyanate, dimethyl diphenylmethane diisocyanate,
Lysine diisocyanate, ethylenediamine, diethylenetriamine, triethylene tetramine, tetraethylenepentamine, dipropylenetriamine, dimethylamino
One in propylamine, diethylaminopropylamine, trimethylhexamethylenediamine, diethyl triamine, hexamethylene diamine, diethylamine, polyether diamine
The dimer or tripolymer of kind or several monomers and/or one or more；
Filler is one in kaolin, talcum powder, mica powder, silicon powder, carbon black, blanc fixe, barium sulfate and graphene
Kind is several；Preferably, filler is barium sulfate and graphene.Using barium sulfate and graphene, surface energy is big, can be dried in coating
When form reticular structure, to enhance the suction-operated of coating and base material, keep coating finer and close, coating can be improved to base material
Adhesive force helps to improve the impact resistance of coating, crocking resistance, thermal conductivity, weatherability and antiseptic property.Further carry
Rise the weatherability of application type backboard.
Auxiliary agent is one or more of levelling agent, antioxidant, auxiliary rheological agents, dispersant.
Specific preparation method includes step：
S1：It takes transparent polyethylene terephthalate to prepare main film body, is applied coated with modified poly- on main film body surface
Pvdf resin, modified daiflon, modified polytetrafluoroethylresin resin, modified tetrafluoroethene-hexafluoropropane are total
Copolymer resin, modified Teflon alkoxy resin, modified ethylene-tetrafluoroethylene copolymer resin, modified fluoroolefins-ethylene
The transparent functional layer being prepared based on one or more of base ether copolymer resin, modified daiflon,
Transparent thin film layer is made；
S2：It takes functional fluorine modified resin, curing agent, filler and auxiliary agent to be uniformly mixed, high reflectance pattern is made
The coating of layer；
S3：By coating to set the upper surface and/or lower surface that pattern is coated in prefabricated transparent thin film layer, it is put into micro-
Wave baking oven, temperature adjustment adjust microwave to 400-2500MHz to the fully crosslinked solidification of coating, form high reflectance pattern to 60-180 DEG C
Layer；
S4：High reflectance pattern layer surface is polished, is polished, pattern makes, one or more of embossed surface
Treatment process, then carry out carrying out plasma treatment to its surface.
In embodiment 2,
High reflectance pattern layer is that outer surface carried out being pasted onto on transparent thin film layer by adhesive for plasma treatment
The film layer on surface and/or lower surface；Surface carried out plasma treatment to improve the surface property of film layer.
Wherein, the coating that the thickness of coating is 1-100 μm, preferably thickness are 1-2.5 μm.Concrete numerical value be chosen as 1 μm,
2μm,5μm,10μm,12μm,15μm,20μm,25μm.Under preferably thickness, coating both can guarantee good reflecting properties, also
It can guarantee that it has as adhesive linkage (interface coating) or weathering layer (surface coating) due performance requirement.
Wherein, high reflectance pattern layer be 60-99% to the reflectivity of 300-1250nm wavelength lights polyphosphazene polymer
Close object film and/or metallic film；
Wherein, high molecular polymer film is with polyethylene terephthalate, polybutylene terephthalate (PBT), gathers
Naphthalene naphthalate, polyolefin, polyamide, polyimides, polyureas, makrolon, polyacrylate derivatives, poly- fluorine second
The one of alkene, Kynoar, poly- trifluoro-ethylene, polytetrafluoroethylene (PTFE), tetrafluoroethene-hexafluoropropane copolymer, tin indium oxide (ITO)
Kind or it is several based on be prepared；
Metallic film is to be prepared based on one or more of copper, aluminium, gold, silver, iron, tin.
Specific preparation method includes step：
S1：It takes transparent polyethylene terephthalate to prepare main film body, is applied coated with modified poly- on main film body surface
Pvdf resin, modified daiflon, modified polytetrafluoroethylresin resin, modified tetrafluoroethene-hexafluoropropane are total
Copolymer resin, modified Teflon alkoxy resin, modified ethylene-tetrafluoroethylene copolymer resin, modified fluoroolefins-ethylene
The transparent functional layer being prepared based on one or more of base ether copolymer resin, modified daiflon,
Transparent thin film layer is made；
S2：To set pattern in the upper surface of prefabricated transparent thin film layer and/or lower surface adhesive coating；
S3：Molecularly Imprinted Polymer film and/or metallic film are pasted on adhesive, are put into microwave oven, temperature adjustment to 60-
180 DEG C, tune microwave to 400-2500MHz to adhesive solvent volatilizees；
S4：It is put into thermostatic chamber, temperature adjustment keeps temperature-curable 24-96 hours to 40-80 DEG C, forms high reflectance pattern
Layer；
S5：High reflectance pattern layer surface is polished, is polished, pattern makes, one or more of embossed surface
Treatment process, then carry out carrying out plasma treatment to its surface.
In embodiment 3,
On the basis of embodiment 1 and embodiment 2, high reflectance pattern layer includes the upper and lower；
Wherein, lower layer is the first high reflectance pattern being pasted onto on the transparent thin film layer upper surface and/or lower surface
Layer, upper layer are coated in the second high reflectance pattern layer in the first high reflectance pattern layer.
Specific preparation method includes step：
S1：It takes transparent polyethylene terephthalate to prepare main film body, is applied coated with modified poly- on main film body surface
Pvdf resin, modified daiflon, modified polytetrafluoroethylresin resin, modified tetrafluoroethene-hexafluoropropane are total
Copolymer resin, modified Teflon alkoxy resin, modified ethylene-tetrafluoroethylene copolymer resin, modified fluoroolefins-ethylene
The transparent functional layer being prepared based on one or more of base ether copolymer resin, modified daiflon,
Transparent thin film layer is made；
S2：It takes functional fluorine modified resin, curing agent, filler and auxiliary agent to be uniformly mixed, high first reflectivity is made
The coating of pattern layer；
S3：By coating to set the upper surface and/or lower surface that pattern is coated in prefabricated transparent thin film layer, it is put into micro-
Wave baking oven, temperature adjustment adjust microwave to 400-2500MHz to the fully crosslinked solidification of coating, form the first high reflectance to 60-180 DEG C
Pattern layer；
S4：First high reflectance pattern layer surface is polished, is polished, pattern make, one kind in embossed surface or
Several treatment process, then carry out carrying out plasma treatment to its surface.
S5：In the first high reflectance pattern layer surface adhesive coating；
S6：Molecularly Imprinted Polymer film and/or metallic film are pasted on adhesive, are put into microwave oven, temperature adjustment to 60-
180 DEG C, tune microwave to 400-2500MHz to adhesive solvent volatilizees；
S7：It is put into thermostatic chamber, temperature adjustment keeps temperature-curable 24-96 hours to 40-80 DEG C, forms the second high reflectance
Pattern layer；
S8：Second high reflectance pattern layer surface is polished, is polished, pattern make, one kind in embossed surface or
Several treatment process, then carry out carrying out plasma treatment to its surface.
In embodiment 4,
On the basis of embodiment 1 and embodiment 2, high reflectance pattern layer includes the upper and lower；
Wherein, lower layer be coated in the first high reflectance pattern layer on transparent thin film layer upper surface and/or lower surface, on
Layer is the second high reflectance pattern layer being pasted onto in the first high reflectance pattern layer.
S1：It takes transparent polyethylene terephthalate to prepare main film body, is applied coated with modified poly- on main film body surface
Pvdf resin, modified daiflon, modified polytetrafluoroethylresin resin, modified tetrafluoroethene-hexafluoropropane are total
Copolymer resin, modified Teflon alkoxy resin, modified ethylene-tetrafluoroethylene copolymer resin, modified fluoroolefins-ethylene
The transparent functional layer being prepared based on one or more of base ether copolymer resin, modified daiflon,
Transparent thin film layer is made；
S2：To set pattern in the upper surface of prefabricated transparent thin film layer and/or lower surface adhesive coating；
S3：Molecularly Imprinted Polymer film and/or metallic film are pasted on adhesive, are put into microwave oven, temperature adjustment to 60-
180 DEG C, tune microwave to 400-2500MHz to adhesive solvent volatilizees；
S4：It is put into thermostatic chamber, temperature adjustment keeps temperature-curable 24-96 hours to 40-80 DEG C, forms the first high reflectance
Pattern layer；
S5：First high reflectance pattern layer surface is polished, is polished, pattern make, one kind in embossed surface or
Several treatment process, then carry out carrying out plasma treatment to its surface.
S6：It takes functional fluorine modified resin, curing agent, filler and auxiliary agent to be uniformly mixed, high second reflectivity is made
The coating of pattern layer；
S7：By coating to set the upper surface and/or lower surface that pattern is coated in prefabricated transparent thin film layer, it is put into micro-
Wave baking oven, temperature adjustment adjust microwave to 400-2500MHz to the fully crosslinked solidification of coating, form the second high reflectance to 60-180 DEG C
Pattern layer；
S8：Second high reflectance pattern layer surface is polished, is polished, pattern make, one kind in embossed surface or
Several treatment process, then carry out carrying out plasma treatment to its surface.
Embodiment described above, only one kind of the present invention more preferably specific implementation mode, those skilled in the art
The usual variations and alternatives that member carries out within the scope of technical solution of the present invention should be all included within the scope of the present invention.
Claims (10)
1. a kind of reflection gain type high transmittance solar battery back film, including transparent thin film layer, which is characterized in that described transparent
Film layer upper surface and/or lower surface are provided with high reflectance pattern layer；The high reflectance pattern layer be it is latticed, mesh
Position and the position of cell piece are consistent, and the area of the mesh is less than the area of cell piece.
2. a kind of reflection gain type high transmittance solar battery back film according to claim 1, which is characterized in that described
The edge of mesh extends internally 1-15mm along the periphery of cell piece；The chamfered transition in mesh quadrangle.
3. a kind of reflection gain type high transmittance solar battery back film according to claim 1 or 2, which is characterized in that
The high reflectance pattern layer is the coating that outer surface carried out plasma treatment；
The high reflectance pattern layer is the coating that thickness is 1-100 μm, and the constituent of the coating includes that functional fluorine changes
Property resin, curing agent, filler and auxiliary agent；
The filler is barium sulfate and graphene.
4. a kind of reflection gain type high transmittance solar battery back film according to claim 1 or 2, which is characterized in that
The high reflectance pattern layer is the film layer that outer surface carried out plasma treatment；
The high reflectance pattern layer be 60-99% to the reflectivity of 300-1250nm wavelength lights high molecular polymer it is thin
Film and/or metallic film；The thickness of the high molecular polymer film and/or metallic film is 1-100 μm, viscous by adhesive
It is attached to the upper surface and/or lower surface of transparent thin film layer.
5. a kind of reflection gain type high transmittance solar battery back film according to claim 1, which is characterized in that described
High reflectance pattern layer includes the upper and lower；
The lower layer is the first high reflectance pattern layer being pasted onto on the transparent thin film layer upper surface and/or lower surface, institute
State upper layer be coated in the second high reflectance pattern layer in the first high reflectance pattern layer, or
The lower layer be coated in the first high reflectance pattern layer on transparent thin film layer upper surface and/or lower surface, it is described on
Layer is the second high reflectance pattern layer being pasted onto in the first high reflectance pattern layer.
6. a kind of reflection gain type high transmittance solar battery back film according to claim 1, which is characterized in that described
Transparent thin film layer includes main film body and the transparent functional layer in main film body upper surface and/or lower surface is arranged.
7. a kind of reflection gain type high transmittance solar battery back film according to claim 6, which is characterized in that described
High reflectance pattern layer is provided with transparent functional layer on the face far from transparent thin film layer.
8. a kind of reflection gain type high transmittance solar battery back film according to claim 1, which is characterized in that described
Transparent thin film layer is 60%-99% to the transmitance of 300nm-1250nm wavelength lights, and thickness is 310-500 μm；
The transparent thin film layer includes transparent polyethylene terephthalate, polybutylene terephthalate (PBT), poly- naphthalene diacid
Glycol ester, polyamide, polyimides, polyureas, makrolon, polyacrylate derivatives, polyvinyl fluoride, gathers partially polyolefin
One or more of vinyl fluoride, poly- trifluoro-ethylene, polytetrafluoroethylene (PTFE).
9. a kind of preparation method of reflection gain type high transmittance solar battery back film according to claim 1, special
Sign is, including step：
S1：It takes transparent polyethylene terephthalate to prepare main film body, is applied coated with modified polyvinilidene fluorine on main film body surface
Vinyl, modified daiflon, modified polytetrafluoroethylresin resin, modified tetrafluoroethene-hexafluoropropane copolymer
Resin, modified Teflon alkoxy resin, modified ethylene-tetrafluoroethylene copolymer resin, modified fluoroolefins-vinyl ethers
The transparent functional layer being prepared based on one or more of copolymer resin, modified daiflon, is made
Transparent thin film layer；
S2：It takes functional fluorine modified resin, curing agent, filler and auxiliary agent to be uniformly mixed, high reflectance pattern layer is made
Coating；
S3：By coating to set the upper surface and/or lower surface that pattern is coated in prefabricated transparent thin film layer, it is put into microwave baking
Case, temperature adjustment adjust microwave to 400-2500MHz to the fully crosslinked solidification of coating, form high reflectance pattern layer to 60-180 DEG C；
S4：High reflectance pattern layer surface is polished, is polished, pattern makes, the processing of one or more of embossed surface
Technique, then carry out carrying out plasma treatment to its surface.
10. a kind of preparation method of reflection gain type high transmittance solar battery back film according to claim 1, special
Sign is, including step：
S1：It takes transparent polyethylene terephthalate to prepare main film body, is applied coated with modified polyvinilidene fluorine on main film body surface
Vinyl, modified daiflon, modified polytetrafluoroethylresin resin, modified tetrafluoroethene-hexafluoropropane copolymer
Resin, modified Teflon alkoxy resin, modified ethylene-tetrafluoroethylene copolymer resin, modified fluoroolefins-vinyl ethers
The transparent functional layer being prepared based on one or more of copolymer resin, modified daiflon, is made
Transparent thin film layer；
S2：To set pattern in the upper surface of prefabricated transparent thin film layer and/or lower surface adhesive coating；
S3：Paste Molecularly Imprinted Polymer film and/or metallic film on adhesive, be put into microwave oven, temperature adjustment to 60-180 DEG C,
Adjust microwave to 400-2500MHz to adhesive solvent volatilize；
S4：It is put into thermostatic chamber, temperature adjustment keeps temperature-curable 24-96 hours to 40-80 DEG C, forms high reflectance pattern layer；
S5：High reflectance pattern layer surface is polished, is polished, pattern makes, the processing of one or more of embossed surface
Technique, then carry out carrying out plasma treatment to its surface.
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| CN112103362A (en) * | 2020-09-30 | 2020-12-18 | 苏州福斯特光伏材料有限公司 | Photovoltaic module backboard and photovoltaic module comprising same |
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