CN108761943A - 显示面板 - Google Patents

显示面板 Download PDF

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Publication number
CN108761943A
CN108761943A CN201810597481.7A CN201810597481A CN108761943A CN 108761943 A CN108761943 A CN 108761943A CN 201810597481 A CN201810597481 A CN 201810597481A CN 108761943 A CN108761943 A CN 108761943A
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transistor
data line
xth
row
rows
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CN108761943B (zh
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陈铭耀
黄国有
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AU Optronics Corp
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AU Optronics Corp
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553Reflecting elements
    • G02F1/133555Transflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553Reflecting elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1222Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
    • H01L27/1225Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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    • H01ELECTRIC ELEMENTS
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    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1251Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs comprising TFTs having a different architecture, e.g. top- and bottom gate TFTs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/24Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78651Silicon transistors
    • H01L29/7866Non-monocrystalline silicon transistors
    • H01L29/78672Polycrystalline or microcrystalline silicon transistor
    • H01L29/78675Polycrystalline or microcrystalline silicon transistor with normal-type structure, e.g. with top gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/7869Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/134309Electrodes characterised by their geometrical arrangement
    • G02F1/134345Subdivided pixels, e.g. for grey scale or redundancy
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
    • G02F2201/123Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode pixel
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00Function characteristic
    • G02F2203/09Function characteristic transflective

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Abstract

一种显示面板,包括一基板、至少一第一晶体管以及至少一第二晶体管。基板包括至少一反射区及至少一穿透区。第一晶体管配置于基板之上,且位于对应的反射区,各个第一晶体管包括一第一有源层。第二晶体管配置于基板之上,且位于对应的穿透区,各个第二晶体管包括一第二有源层。其中,第一有源层的材料不同于第二有源层的材料。

Description

显示面板
技术领域
本发明是有关于一种显示面板,且特别是有关于一种包括反射区及穿透区的显示面板。
背景技术
近来,随着可携式电子产品的普及,对于能够适用于室外环境及室内环境的显示装置的需求亦与日俱增。其中,由于半穿透半反射式液晶显示器(TRLCD)兼具穿透式及反射式液晶显示器的优点,可同时利用来自背光组件的穿透光,以及来自环境光源的反射光,使液晶显示器可在户外强烈的光线下仍可维持一定可视性,并在背光组件电源关闭时,还可藉由环境光反射显示信息,节省面板的耗电量,故已成为备受欢迎的液晶显示器的类型。
然而,由于现代人对于显示品质愈趋重视,期望面板在播放动态画面时能够更加清晰,而若顾及画面的清晰程度恐需耗费相当多的电力。因此,目前的半穿透半反射式液晶显示器仍未能达成兼顾画面品质及节省电力的需求。
发明内容
本发明有关于一种显示面板。本发明的显示面板包括反射区与穿透区,且在反射区与穿透区选用不同类型的第一晶体管及第二晶体管,藉由第一晶体管与第二晶体管的不同材料的特性,在反射区与穿透区能分别发挥省电及显示品质清晰的功效。
根据本发明的一方面,提出一种显示面板。显示面板包括一基板、至少一第一晶体管以及至少一第二晶体管。基板包括至少一反射区及至少一穿透区。第一晶体管配置于基板之上,且位于对应的反射区,各个第一晶体管包括一第一有源层。第二晶体管配置于基板之上,且位于对应的穿透区,各个第二晶体管包括一第二有源层。其中,第一有源层的材料不同于第二有源层的材料。
以下结合附图和具体实施例对本发明进行详细描述,但不作为对本发明的限定。
附图说明
图1示出根据本发明一实施例的显示面板的上视图。
图2示出根据本发明一实施例的显示面板的像素布局示意图。
图3示出根据本发明又一实施例的显示面板的像素布局示意图。
图4示出根据本发明又一实施例的显示面板的像素布局示意图。
图5示出根据本发明又一实施例的显示面板的像素布局示意图。
图6示出根据本发明又一实施例的显示面板的像素布局示意图。
图7示出根据本发明又一实施例的显示面板的像素布局示意图。
图8示出根据本发明一实施例的显示面板的局部剖面图。
图9示出根据本发明又一实施例的显示面板的局部剖面图。
图10示出根据本发明又一实施例的显示面板的局部剖面图。
图11示出根据本发明又一实施例的显示面板的局部剖面图。
其中,附图标记:
10、20、30、40、50、60、70、80、90、100:显示面板
101、201、301、401:基板
101a:表面
110、210、310、410:缓冲层
120、220、320、420:第一绝缘层
130、230、330、430:第二绝缘层
150、250、350、450:第一保护层
160、260、360、460:第二保护层
170、270、370、470:反射层
180a、181、281、381、481:第一像素电极
180b、182、282、382、482:第二像素电极
191、192、291、292、391、392、491、492:通孔
1411、2411、3411、4411:第一有源层
1412、2412、3412、4412:第一源极
1413、2413、3413、4413:第一漏极
1414、2414、3414、4414:第一栅极
1421、2421、3421、4421:第二有源层
1422、2422、3422、4422:第二源极
1423、2423、3423、4423:第二漏极
1424、2424、3424、4424:第二栅极
AA:可视区
AB:周边电路区
AC:驱动电路区
AAi:方块
D1、D2、D3、D4、D5、D6、D7:数据线
G1、G2、G3、G4:扫描线
I2,1、I4,1、I6,1、I2,2、I2,3...、I141、I241、I341、I441:第一晶体管
L1,1、L3,1、L5,1、L1,2、L1,3...、L142、L242、L342、L442:第二晶体管
M1、M2、M3、M4、M5、M6:行数
N1、N2、N3:列数
Rr:反射区
Tr:穿透区
具体实施方式
下面结合附图对本发明的结构原理和工作原理作具体的描述:
本发明有关于一种显示面板。本发明的显示面板包括反射区与穿透区,且在反射区与穿透区选用不同类型的第一晶体管及第二晶体管,由于第一晶体管所使用的材料能够降低显示面板的漏电量,第二晶体管所使用的材料能够提高显示面板的画面的更新速率,故能达到兼具省电及提升画质的效果。
图1示出根据本发明一实施例的显示面板10的上视图。
请参照图1,显示面板10包括一基板101,基板101的一表面101a上具有可视区AA,周边电路区AB以及驱动电路区AC。基板101可与另一基板(未示出)对组,且基板101与另一基板之间可具有一液晶层(未示出)。表面101a为面向液晶层及另一基板的表面,亦即是基板101的内侧。基板101的可视区AA中包括反射区Rr及穿透区Tr,如图2的一部分可视区AA的方块AAi所示。
图2示出根据本发明一实施例的显示面板10的像素布局示意图。
请参照图2,显示面板10包括第一晶体管I(例如是I2,1、I4,1、I6,1...I2,2、I4,2、I6,2...、I2,3、I4,3、I6,3...)以及第二晶体管L(例如是L1,1、L3,1、L5,1...L1,2、L3,2、L5,2...L1,3、L3,3、L5,3)。第一晶体管I配置于基板101的表面101a上,且位于对应的反射区Rr。第二晶体管L配置于基板101的表面101a上,且位于对应的穿透区Tr。第一晶体管I包括第一有源层;第二晶体管L包括第二有源层,其中第一有源层的材料可不同于第二有源层的材料。在一实施例中,第一有源层的材料包括氧化物半导体,此氧化物半导体可以是元素周期表中第II到IV族的元素的氧化物的混合物,例如是氧化铟镓锌(IGZO)、氧化铟锌锡(IZTO)、氧化铟镓锡(IGTO)、氧化铟锌(IZO)、氧化铟镓(IGO)、氧化锌锡(ZTO)及氧化锡(SnO)。第二有源层的材料包括多晶硅。换言之,第一晶体管I可以是氧化物半导体晶体管,而第二晶体管L可以是多晶硅晶体管。
多晶硅晶体管相较于氧化物半导体晶体管以及非晶硅晶体管而言,具备较高的充电速率,可提供显示面板较佳的画面更新率(frame rate),可改善残影(motion blur)的现象,呈现动态画面时的像素品质相当优异。氧化物半导体晶体管相较于多晶硅半导体晶体管以及非晶硅晶体管而言,具备更低的漏电流,在降低画面更新率的操作之下仍可维持静态画面,达到节省显示面板的耗电量的目的。在本发明中,由于对应于反射区的第一晶体管I是选用氧化物半导体晶体管,对应于穿透区的第二晶体管L是选用多晶硅晶体管,使得氧化物半导体晶体管能够藉由其低漏电的特性,在需要呈现静态画面时维持低画面更新率的操作,达到省电的需求,多晶硅晶体管则能够藉由其高充电能力的特性,在需要呈现动态画面时进行高画面更新率的操作,达成提升动画的画质的目的,故可提供兼具优异的画质及省电效能的显示面板。
请参照图2,显示面板10上包括相交错的多条数据线D1、D2、D3、D4、D5、D6、D7...以及多条扫描线G1、G2、G3、G4...,将基板101区划分成多个像素组,各个像素组包括多个像素(例如是包括红色像素R、绿色像素G及蓝色像素B(未示出))。数据线D1、D2、D3、D4、D5、D6、D7...例如是沿着Y方向延伸,且沿着X方向依序排列设置。扫描线G1、G2、G3、G4...例如是沿着X方向延伸,且沿着Y方向依序排列设置。X方向可垂直于Y方向。各个第一晶体管I2,1、I4,1、I6,1...I2,2、I4,2、I6,2...、I2,3、I4,3、I6,3...与各个第二晶体管L1,1、L3,1、L5,1...L1,2、L3,2、L5,2...L1,3、L3,3、L5,3与对应的数据线D1、D2、D3、D4、D5、D6、D7...、扫描线G1、G2、G3、G4...以及像素耦接。反射区Rr以及穿透区Tr排列成具有多行(columns)和多列(rows)的一矩阵且对应于像素。每个像素依据位于反射区Rr及穿透区Tr的不同,分别对应于第一像素电极180a及第二像素电极180b。矩阵例如是具有第M1行、第M2行、第M3行...第Mm行、第Mm+1...行,以及第N1列、第N2列、第N3列...第Nn行、第Nn+1...行。m与n为正整数。其中,每一数据线D1、D2、D3、D4、D5、D6、D7...仅耦接于第一晶体管I2,1、I4,1、I6,1...I2,2、I4,2、I6,2...、I2,3、I4,3、I6,3...或第二晶体管L1,1、L3,1、L5,1...L1,2、L3,2、L5,2...L1,3、L3,3、L5,3。例如,数据线D1仅耦接于第二晶体管L1,1、L1,2、L1,3...,并不会耦接于任何的第一晶体管I。数据线D2仅耦接于第一晶体管I2,1、I2,2、I2,3...,并不会耦接于任何的第二晶体管L。每一扫瞄线G1、G2、G3...可耦接于第一晶体管及第二晶体管。例如,扫描线G1耦接第一晶体管I2,1、I4,1、I6,1...及第二晶体管L1,1、L3,1、L5,1...。
在本发明中,数据线D1、D2、D3、D4...之间可具有顺序关系。例如,在一实施例中,数据线D1可表示第x条数据线,数据线D2可表示第x+1条数据线,数据线D3可表示第x+2条数据线,数据线D4可表示第x+3条数据线,以此类推。在另一实施例中,数据线D1可表示第x-1条数据线,数据线D2可表示第x条数据线,数据线D3可表示第x+1条数据线,数据线D4可表示第x+2条数据线,以此类推。然本发明并不以此为限。其中,x可为任何正整数。
在本实施例中,其中1个第一晶体管I2,1位于数据线D2与数据线D3之间且耦接于数据线D2。其中1个第二晶体管L3,1位于数据线D3与数据线D4之间且耦接于数据线D3。另外,第一晶体管I2,1位与第二晶体管L3,1均耦接于扫描线G1。
图3示出根据本发明又一实施例的显示面板20的像素布局示意图,类似于图2的部分可视区AA的方块AAi的区域,与图2的实施例的不同之处在于,同一行的像素可交替设置反射区Rr及穿透区Tr。
请参照图3,1个第M1行第N1列的第一晶体管I1,1以及1个第M1行第N2列的第二晶体管L1,2位于数据线D1与数据线D2之间,第M1行第N1列的第一晶体管I1,1耦接于数据线D2,第M1行第N2列的第二晶体管L1,2耦接于数据线D1。1个第M2行第N1列的第二晶体管L2,1以及1个第M2行第N2列的第一晶体管I2,2位于数据线D2与数据线D3之间,第M2行第N1列的第二晶体管L2,1耦接于数据线D3,第M2行第N2列的第一晶体管I2,2耦接于数据线D2。数据线D1仅耦接于第二晶体管L1,2...,并不会耦接于任何的第一晶体管I。数据线D2仅耦接于第一晶体管I1,1、I2,2、及I1,3...,并不会耦接于任何的第二晶体管L。相较于图2的显示面板10的像素布局而言,由于图3的显示面板20的像素布局中,同一行的像素并非皆对应于同一类型的晶体管,而是以两种不同类型的晶体管(第一晶体管及第二晶体管)相隔设置,能够具有较均匀的显示效果。
在本实施例中,每一扫瞄线G1、G2、G3...可耦接于第一晶体管及第二晶体管。例如,扫描线G1耦接第一晶体管I1,1、I3,1、I5,1...及第二晶体管L2,1、L4,1、L6,1...。
图4示出根据本发明又一实施例的显示面板30的像素布局示意图,类似于图2的部分可视区AA的方块AAi的区域,与图2的实施例的不同之处在于,同一行的像素可交替设置反射区Rr及穿透区Tr,每一数据线在同一列像素中可耦接于2个晶体管。
请参照图4,第M1行第N1列的第二晶体管L1,1、第M2行第N1列的第二晶体管L2,1、第M1行第N2列的第一晶体管I1,2、及第M2行第N2列的第一晶体管I2,2位于数据线D1与数据线D2之间。第二晶体管L2,1是通过第二晶体管L1,1耦接于数据线D1。第一晶体管I1,2是通过第一晶体管I2,2耦接于数据线D2。第M3行第N1列的第一晶体管I3,1、第M4行第N1列的第一晶体管I4,1、第M3行第N2列的第二晶体管L3,2、及第M4行第N2列的第二晶体管L4,2,位于数据线D2与数据线D3之间。第一晶体管I4,1通过第一晶体管I3,1耦接于数据线D2。第二晶体管L3,2通过第二晶体管L4,2耦接于数据线D3。数据线D1仅耦接于第二晶体管L1,1、L2,1、L1,3、L2,3...,并不会耦接于任何的第一晶体管I。数据线D2仅耦接于第一晶体管I3,1、I4,1、I1,2、I2,2...,并不会耦接于任何的第二晶体管L。
在一实施例中,每一扫瞄线G1、G2、G3...可耦接于第一晶体管及第二晶体管。例如,扫描线G1耦接第一晶体管I4,1...及第二晶体管L2,1...。第一晶体管I4,1与第二晶体管L2,1之间可间隔一像素。扫描线G2耦接第一晶体管I1,2、I3,1...及第二晶体管L1,1、L3,2...,扫描线G2位于第二晶体管L1,1与第一晶体管I1,2之间,并位于第一晶体管I3,1与第二晶体管L3,2之间。
本实施例的显示面板30是采用半源极线驱动型(half source line driving,HSD)的像素布局,相较于显示面板10及20的实施例而言,具备较少的数据线的数量,如此可降低集成电路的引脚(pin)及焊垫(pad)的用量,让显示面板的边框可具有较小的面积,更能节省成本。
图5示出根据本发明又一实施例的显示面板40的像素布局示意图,类似于图2的部分可视区AA的方块AAi的区域,与图2的实施例的不同之处在于,每一行像素中具有2个不同种类晶体管(第一晶体管I及第二晶体管L),每一数据线在相邻2列的像素中可耦接于2个晶体管。
请参照图5,1个第M2行第N2列的第一晶体管I2,2以及1个第M3行第N1列的第一晶体管I3,1,位于数据线D2与数据线D4之间,亦即,1个第M2行第N2列的第一晶体管I2,2,位于数据线D2与数据线D3之间,1个第M3行第N1列的第一晶体管I3,1,位于数据线D3与数据线D4之间,第M3行第N1列的第一晶体管I3,1通过第M2行第N2列的第一晶体管I2,2耦接于数据线D2。1个第M3行第N2列的第二晶体管L3,2以及1个第M4行第N1列的第二晶体管L4,1,位于数据线D3与数据线D5之间,亦即,1个第M3行第N2列的第二晶体管L3,2,位于数据线D3与数据线D4之间,以及1个第M4行第N1列的第二晶体管L4,1,位于数据线D4与数据线D5之间,第M4行第N1列的第二晶体管L4,1通过第M3行第N2列的第二晶体管L3,2耦接于数据线D3。
在本实施例中,每一扫瞄线G1、G2、G3...可耦接于第一晶体管及第二晶体管。例如,扫描线G1耦接第一晶体管I1,1、I3,1、I5,1...及第二晶体管L2,1、L4,1、L6,1...。扫描线G2耦接第N2列的第一晶体管I2,2、I4,2...及第二晶体管L1,2、L3,2...,且耦接第N3列的第一晶体管I2,3...及第二晶体管L1,3。
图6示出根据本发明又一实施例的显示面板50的像素布局示意图,类似于图2的部分可视区AA的方块AAi的区域,与图2的实施例的不同之处在于,每一行像素只具有一种晶体管,例如,第M1行像素中具有第二晶体管L,第M2行像素中具有第一晶体管I...,每一数据线在同一列像素中可耦接于2个晶体管。
请参照图6,1个第M3行第N1列的第一晶体管I3,1以及1个第M6行第N1列的第一晶体管I6,1,位于数据线D2与数据线D4之间,第M6行第N1列的第一晶体管I6,1通过第M3行第N1列的第一晶体管I3,1耦接于数据线D2。1个第M5行第N1列的第二晶体管L5,1以及1个第M8行第N1列的第二晶体管L8,1,位于数据线D3与数据线D5之间,第M8行第N1列的第二晶体管L8,1通过第M5行第N1列的第二晶体管L5,1耦接于数据线D3。
在一实施例中,每一扫瞄线G1、G2、G3...可耦接于第一晶体管及第二晶体管。例如,扫描线G1耦接第一晶体管I2,1、I6,1...及第二晶体管L4,1、L8,1...。扫描线G2耦接第N1列的第一晶体管I3,1、I7,1...及第二晶体管L1,1、L5,1...,且耦接第N2列的第一晶体管I3,2...及第二晶体管L1,2。
由于本实施例的显示面板50在1个像素中同时具有反射区Rr及穿透区Tr,相较于1个像素区中仅有反射区Rr或仅有穿透区Tr的显示面板10、20与30的实施例而言,具有较佳的解析度。
图7示出根据本发明又一实施例的显示面板60的像素布局示意图,类似于图2的部分可视区AA的方块AAi的区域,与图2的实施例的不同之处在于,同一行的像素可交替设置反射区Rr及穿透区Tr,每一数据线可耦接连续3个不同列像素的晶体管。其中,每条数据线D1、D2、D3、D4...中有一部分沿着X方向延伸,一部分沿着Y方向沿伸,具有蜿蜒的外型。
请参照图7,第M8行第N2列的第一晶体管I8,2位于数据线D2与数据线D3之间,第M7行第N3列的第一晶体管I7,3及第M9行第N1列的第一晶体管I9,1位于数据线D3与数据线D4之间,第一晶体管I9,1通过第一晶体管I7,3及第一晶体管I8,2耦接数据线D3。第M5行第N2列的第二晶体管L5,2位于数据线D1与数据线D2之间,第M4行第N3列的第二晶体管L4,3及第M6行第N1列的第二晶体管L6,1位于数据线D2与数据线D3之间,第二晶体管L6,1通过第二晶体管L4,3及第二晶体管L5,2耦接数据线D2。
在一实施例中,每一扫瞄线G1、G2、G3...可耦接于第一晶体管及第二晶体管。例如,扫描线G2耦接第一晶体管I1,1、I3,1、I5,1...及第二晶体管L2,1、L4,1、L6,1...。
本实施例的显示面板60是采用三分之一源极线驱动型(one third source linedriving,OTSD)的像素布局,相较于显示面板10、20及30的实施例而言,具备较少的数据线的数量,如此可降低集成电路的引脚及焊垫的用量,让显示面板的边框可具有较小的面积,更能大幅节省成本。
图8示出根据本发明一实施例显示面板70的局部剖面图。
请参照图8,其示出显示面板70中对应于第一晶体管I141及第二晶体管L142的局部剖面图。显示面板70包括基板101,缓冲层110,第一绝缘层120,第二绝缘层130,第一晶体管I141,第二晶体管L142,第一保护层150,第二保护层160,反射层170,第一像素电极181及第二像素电极182。基板101包括反射区Rr及穿透区Tr。缓冲层110形成于基板101上。第一绝缘层120形成于缓冲层110上。第二绝缘层130形成于第一绝缘层120上。第一保护层150形成于第二绝缘层130上。第一晶体管I141与第二晶体管L142配置于基板101之上,形成于缓冲层110与第一保护层150之间,且分别位于对应的反射区Rr穿透区Tr。第二保护层160形成于第一保护层150上,反射层170形成于反射区Rr的第二保护层160上,第一像素电极181形成于反射层170上。
第一晶体管I141包括第一有源层1411,第一源极1412,第一漏极1413及第一栅极1414。第一栅极1414位于第一有源层1411的下方,第一晶体管I141又称作底栅极晶体管。第二晶体管L142包括第二有源层1421,第二源极1422,第二漏极1423及第二栅极1424。第二栅极1424位于第二有源层1421的上方,第二晶体管L142又称作顶栅极晶体管。第一像素电极181及第二像素电极182分别通过通孔191及192耦接于第一漏极1413及第二漏极1423。
第一有源层1411的材料包括氧化物半导体,此氧化物半导体可以是元素周期表中第II到IV族的元素的氧化物的混合物,例如是氧化铟镓锌(IGZO)、氧化铟锌锡(IZTO)、氧化铟镓锡(IGTO)、氧化铟锌(IZO)、氧化铟镓(IGO)、氧化锌锡(ZTO)及氧化锡(SnO)。第二有源层1421的材料包括多晶硅。因此,本实施例的显示面板70在可视区AA使用底栅极的氧化物半导体晶体管搭配顶栅极的多晶硅晶体管。
在本实施例中,基板101可由玻璃所制成。缓冲层110可由无机介电材料所制成。第一绝缘层120可由氧化物所制成,例如是氧化硅。第一源极1412、第一漏极1413、第一栅极1414、第二源极1422、第二漏极1423及第二栅极1424可由金属所制成。
图9示出根据本发明又一实施例的显示面板80的局部剖面图,与图8显示面板70的实施例的不同之处可在于第一晶体管I241的结构。
请参照图9,第一晶体管I241包括第一有源层2411,第一源极2412,第一漏极2413及第一栅极2414。第一栅极2414位于第一有源层2411的上方,第一晶体管I241又称作顶栅极晶体管。第二晶体管L242包括第二有源层2421,第二源极2422,第二漏极2423及第二栅极2424。第二栅极2424位于第二有源层2421的上方,第二晶体管L242又称作顶栅极晶体管。因此,本实施例的显示面板80在可视区AA使用顶栅极的氧化物半导体晶体管搭配顶栅极的多晶硅晶体管。
图9的基板201、缓冲层210、第一绝缘层220、第二绝缘层230、第一保护层250、第二保护层260、反射层270、第一像素电极281及第二像素电极282分别是类似于图8的基板101、缓冲层110、第一绝缘层120、第二绝缘层130、第一保护层150、第二保护层160、反射层170、第一像素电极181及第二像素电极182。第一像素电极281及第二像素电极282分别通过通孔291及292耦接于第一漏极2413及第二漏极2423。
图10示出根据本发明又一实施例的显示面板90的局部剖面图,与图8显示面板70的实施例的不同之处在于第二晶体管I342的结构。
请参照图10,第一晶体管I341包括第一有源层3411,第一源极3412,第一漏极3413及第一栅极3414。第一栅极3414位于第一有源层3411的下方,第一晶体管I341又称作底栅极晶体管。第二晶体管I342包括第二有源层3421,第二源极3422,第二漏极3423及第二栅极3424。第二栅极3424位于第二有源层3421的下方,第二晶体管I242又称作底栅极晶体管。因此,本实施例的显示面板90在可视区AA使用底栅极的氧化物半导体晶体管搭配底栅极的多晶硅晶体管。
图10的基板301、缓冲层310、第一绝缘层320、第二绝缘层330、第一保护层350、第二保护层360、反射层370、第一像素电极381及第二像素电极382分别是类似于图8的基板101、缓冲层110、第一绝缘层120、第二绝缘层130、第一保护层150、第二保护层160、反射层170、第一像素电极181及第二像素电极182。第一像素电极381及第二像素电极382分别通过通孔391及392耦接于第一漏极3413及第二漏极3423。
图11示出根据本发明又一实施例的显示面板100的局部剖面图,与图8显示面板70的实施例的不同之处在于第一晶体管I441与第二晶体管L441的结构。
请参照图11,第一晶体管I441包括第一有源层4411,第一源极4412,第一漏极4413及第一栅极4414。第一栅极4414位于第一有源层4411的上方,第一晶体管I441又称作顶栅极晶体管。第二晶体管I442包括第二有源层4421,第二源极4422,第二漏极4423及第二栅极4424。第二栅极4424位于第二有源层4421的下方,第二晶体管L442又称作底栅极晶体管。因此,本实施例的显示面板100在可视区AA使用顶栅极的氧化物半导体晶体管搭配底栅极的多晶硅晶体管。
图11的基板401、缓冲层410、第一绝缘层420、第二绝缘层430、第一保护层450、第二保护层460、反射层470、第一像素电极481及第二像素电极482分别是类似于图8的基板101、缓冲层110、第一绝缘层120、第二绝缘层130、第一保护层150、第二保护层160、反射层170、第一像素电极181及第二像素电极182。第一像素电极481及第二像素电极482分别通过通孔491及492耦接于第一漏极4413及第二漏极4423。
本发明提供一种显示面板。由于本发明的显示面板包括反射区及穿透区,在对应于反射区的第一晶体管I是选用氧化物半导体晶体管,在对应于穿透区的第二晶体管L是选用多晶硅晶体管,使得氧化物半导体晶体管能够藉由其低漏电的特性,在需要呈现静态画面时维持低画面更新率的操作,达到省电的需求,多晶硅晶体管则能够藉由其高充电能力的特性,在需要呈现动态画面时进行高画面更新率的操作,达成提升动画的画质的目的,故可提供兼具优异的画质及省电效能的显示面板。
当然,本发明还可有其它多种实施例,在不背离本发明精神及其实质的情况下,熟悉本领域的技术人员当可根据本发明作出各种相应的改变和变形,但这些相应的改变和变形都应属于本发明所附的权利要求的保护范围。

Claims (10)

1.一种显示面板,其特征在于,包括:
一基板,包括至少一反射区及至少一穿透区;
至少一第一晶体管,配置于该基板之上,且位于对应的该反射区,各该第一晶体管包括一第一有源层;以及
至少一第二晶体管,配置于该基板之上,且位于对应的该穿透区,各该第二晶体管包括一第二有源层;
其中该第一有源层的材料不同于该第二有源层的材料。
2.如权利要求1所述的显示面板,其特征在于,其中该第一有源层包括氧化物半导体,该第二有源层包括多晶硅。
3.如权利要求1所述的显示面板,其特征在于,其上更包括相交错的多条数据线以及多条扫描线,将该基板划分成多个像素组,各该像素组包括多个像素,各该第一晶体管与各该第二晶体管与对应的该数据线、该扫描线以及该像素耦接,该至少一反射区及该至少一穿透区的数目均为多个,且该些反射区以及该些穿透区排列成具有多行(columns)和多列(rows)的一矩阵且对应于该些像素,其中每一该数据线仅耦接于该第一晶体管或该第二晶体管。
4.如权利要求3所述的显示面板,其特征在于,其中每一该像素组更包括:
沿一第一方向依序设置的一第x条数据线、一第x+1条数据线以及一第x+2条数据线,其中x为正整数;
1个该第一晶体管,位于该第x条数据线与该第x+1条数据线之间且耦接于该第x条数据线;以及
1个该第二晶体管,位于该第x+1条数据线与该第x+2条数据线之间且耦接于该第x+1条数据线。
5.如权利要求3所述的显示面板,其特征在于,其中每一该像素组包括:
沿一第一方向依序设置的一第x条数据线、一第x+1条数据线以及一第x+2条数据线;
1个第m行第n列的该第一晶体管以及1个第m行第n+1列的该第二晶体管,位于该第x条数据线与该第x+1条数据线之间,第m行第n列的该第一晶体管耦接于该第x+1条数据线,第m行第n+1列的该第二晶体管耦接于该第x条数据线;以及
1个第m+1行第n列的该第二晶体管以及1个第m+1行第n+1列的该第一晶体管,位于该第x+1条数据线与该第x+2条数据线之间,第m+1行第n列的该第二晶体管耦接于该第x+2条数据线,第m+1行第n+1列的该第一晶体管耦接于该第x+1条数据线,其中x、m、n为正整数。
6.如权利要求3所述的显示面板,其特征在于,其中每一该像素组包括:
沿一第一方向依序设置的一第x条数据线、一第x+1条数据线以及一第x+2条数据线;
1个第m行第n列的该第二晶体管、1个第m+1行第n列的该第二晶体管、1个第m行第n+1列的该第一晶体管、以及1个第m+1行第n+1列的该第一晶体管,位于该第x条数据线与该第x+1条数据线之间,第m+1行第n列的该第二晶体管通过第m行第n列的该第二晶体管耦接于该第x条数据线,第m行第n+1列的该第一晶体管通过第m+1行第n+1列的该第一晶体管耦接于该第x+1条数据线;以及
1个第m+2行第n列的该第一晶体管、1个第m+3行第n列的该第一晶体管、1个第m+2行第n+1列的该第二晶体管、以及1个第m+3行第n+1列的该第二晶体管,位于该第x+1条数据线与该第x+2条数据线之间,第m+3行第n列的该第一晶体管通过第m+2行第n列的该第一晶体管耦接于该第x+1条数据线,第m+2行第n+1列的该第二晶体管通过第m+3行第n+1列的该第二晶体管耦接于该第x+2条数据线,其中x、m、n为正整数。
7.如权利要求3所述的显示面板,其特征在于,其中每一该像素组包括:
沿一第一方向依序设置的一第x条数据线、一第x+1条数据线、一第x+2条数据线以及一第x+3条数据线;
1个第m行第n+1列的该第一晶体管以及1个第m+1行第n列的该第一晶体管,位于该第x条数据线与该第x+2条数据线之间,第m+1行第n列的该第一晶体管通过第m行第n+1列的该第一晶体管耦接于该第x条数据线;以及
1个第m+1行第n+1列的第二晶体管以及1个第m+2行第n列的第二晶体管,位于该第x+1条数据线与该第x+3条数据线之间,第m+2行第n列的该第二晶体管通过第m+1行第n+1列的该第二晶体管耦接于该第x+1条数据线,其中x、m、n为正整数。
8.如权利要求3所述的显示面板,其特征在于,其中每一该像素组包括:
沿一第一方向依序设置的一第x条数据线、一第x+1条数据线、一第x+2条数据线以及一第x+3条数据线;
1个第m行第n列的该第一晶体管以及1个第m+3行第n列的该第一晶体管,位于该第x条数据线与该第x+2条数据线之间,第m+3行第n列的该第一晶体管通过第m行第n列的该第一晶体管耦接于该第x条数据线;以及
1个第m+2行第n列的该第二晶体管以及1个第m+5行第n列的该第二晶体管,位于该第x+1条数据线与该第x+3条数据线之间,第m+5行第n列的该第二晶体管通过第m+2行第n列的该第二晶体管耦接于该第x+1条数据线,其中x、m、n为正整数。
9.如权利要求3所述的显示面板,其特征在于,其中每一该像素组包括:
沿一第一方向依序设置的一第x条数据线、一第x+1条数据线、一第x+2条数据线及一第x+3条数据线,其中该第x条数据线、该第x+1条数据线、该第x+2条数据线及该第x+3条数据线的延伸方向部分平行于该第一方向,部分平行于与该第一方向大致垂直的一第二方向;
第m+5行第n+1列的该第一晶体管位于该第x+1条数据线与该第x+2条数据线之间,第m+4行第n+2列的该第一晶体管及第m+6行第n列的该第一晶体管位于该第x+2条数据线与该第x+3条数据线之间,第m+6行第n列的该第一晶体管通过第m+4行第n+2列的该第一晶体管及第m+5行第n+1列的该第一晶体管耦接该第x+2条数据线;
第m+2行第n+1列的该第二晶体管位于该第x条数据线与该第x+1条数据线之间,第m+1行第n+2列的该第二晶体管及第m+3行第n列的该第二晶体管位于该第x+1条数据线与该第x+2条数据线之间,第m+3行第n列的该第二晶体管通过第m+1行第n+2列的该第二晶体管及第m+2行第n+1列的该第二晶体管耦接该第x+1条数据线,其中x、m、n为正整数。
10.如权利要求1所述的显示面板,其特征在于,更包括:
一反射层,位于该反射区;
一第一像素电极,位于该反射区,并与该第一晶体管耦接;以及
一第二像素电极,位于该穿透区,并与该第二晶体管耦接。
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220173195A1 (en) * 2020-11-30 2022-06-02 Xiamen Tianma Micro-electronics Co.,Ltd. Display panel and display device
WO2022266887A1 (zh) * 2021-06-23 2022-12-29 京东方科技集团股份有限公司 显示基板及其制备方法、显示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4269702B2 (ja) * 2003-01-24 2009-05-27 セイコーエプソン株式会社 液晶表示装置、その製造方法、及び電子機器
CN101458429A (zh) * 2007-12-12 2009-06-17 群康科技(深圳)有限公司 液晶显示器及其驱动方法
CN102566132A (zh) * 2010-12-08 2012-07-11 上海天马微电子有限公司 一种半反半透式薄膜晶体管液晶显示器
CN204464282U (zh) * 2014-02-24 2015-07-08 乐金显示有限公司 薄膜晶体管基板
CN105353551A (zh) * 2009-12-28 2016-02-24 株式会社半导体能源研究所 液晶显示装置及电子设备

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101218311B1 (ko) * 2006-03-31 2013-01-04 삼성디스플레이 주식회사 표시 기판과 이의 제조 방법, 이를 구비한 표시 장치 및구동 방법
JP2009042759A (ja) * 2007-08-07 2009-02-26 Samsung Electronics Co Ltd 液晶表示装置
US9336739B2 (en) * 2010-07-02 2016-05-10 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device
KR101502118B1 (ko) * 2010-11-01 2015-03-12 삼성디스플레이 주식회사 표시 장치
TWI471946B (zh) 2010-11-17 2015-02-01 Innolux Corp 薄膜電晶體
TWI500161B (zh) * 2011-06-02 2015-09-11 Au Optronics Corp 混合式薄膜電晶體及其製造方法以及顯示面板
US9818765B2 (en) 2013-08-26 2017-11-14 Apple Inc. Displays with silicon and semiconducting oxide thin-film transistors
TWI554808B (zh) * 2015-04-13 2016-10-21 友達光電股份有限公司 液晶顯示面板及液晶顯示器
TW201721623A (zh) * 2015-12-03 2017-06-16 群創光電股份有限公司 具有混合電晶體的主動矩陣有機發光二極體之驅動電路
US9911762B2 (en) * 2015-12-03 2018-03-06 Innolux Corporation Display device
US10180605B2 (en) * 2016-07-27 2019-01-15 Semiconductor Energy Laboratory Co., Ltd. Display device and method for manufacturing the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4269702B2 (ja) * 2003-01-24 2009-05-27 セイコーエプソン株式会社 液晶表示装置、その製造方法、及び電子機器
CN101458429A (zh) * 2007-12-12 2009-06-17 群康科技(深圳)有限公司 液晶显示器及其驱动方法
CN105353551A (zh) * 2009-12-28 2016-02-24 株式会社半导体能源研究所 液晶显示装置及电子设备
CN102566132A (zh) * 2010-12-08 2012-07-11 上海天马微电子有限公司 一种半反半透式薄膜晶体管液晶显示器
CN204464282U (zh) * 2014-02-24 2015-07-08 乐金显示有限公司 薄膜晶体管基板

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220173195A1 (en) * 2020-11-30 2022-06-02 Xiamen Tianma Micro-electronics Co.,Ltd. Display panel and display device
US11980068B2 (en) * 2020-11-30 2024-05-07 Xiamen Tianma Micro-Electronics Co., Ltd. Display panel and display device with multiplexed photosensitive and display region
WO2022266887A1 (zh) * 2021-06-23 2022-12-29 京东方科技集团股份有限公司 显示基板及其制备方法、显示装置

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