CN108761600A - A kind of method that prestressing force aided nano press makes high density diffraction grating - Google Patents
A kind of method that prestressing force aided nano press makes high density diffraction grating Download PDFInfo
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- CN108761600A CN108761600A CN201810417834.0A CN201810417834A CN108761600A CN 108761600 A CN108761600 A CN 108761600A CN 201810417834 A CN201810417834 A CN 201810417834A CN 108761600 A CN108761600 A CN 108761600A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
The present invention relates to preparing grating technical fields, and for a kind of method that prestressing force aided nano press makes high density diffraction grating, steps are as follows：A, grating mother matrix is made with nano-imprint process；B, the grating pattern of the mother matrix in step a is transferred on PDMS film, makes patterned PDMS grate films；C, PDMS flexible substrates are made；D, PDMS flexible substrates are stretched to certain length；E, patterned PDMS grate films are adhered in the PDMS flexible substrates of pre-stretching；F, prestressing force is discharged.The screen periods that this method obtains can be controlled by adjusting prestressing force size, the maximum reduction gear ratio of screen periods is about 25%, the technological deficiency than mold smaller periodic dimensions cannot be made by solving Conventional nano stamping technique, while solve the problems, such as that existing nanometer grating production method device therefor is expensive, process conditions are complicated, control is difficult, cost of manufacture is high, period length.
Description
Technical field
The invention belongs to preparing grating technical field, more particularly to a kind of prestressing force aided nano press makes high density and spreads out
The method for penetrating grating.
Background technology
Diffraction grating is optical element indispensable in optical system, is widely used in advanced instrument and optical sensing neck
Domain, as integrated optics, optic communication, optical interconnection and optical measurement are required for the high density diffraction with the micron/submicron period
Grating.
Laser holographic lithography technology is a kind of maskless version photoetching technique based on coherent light interference effect, usual holographic optical
Lithography manufactures the smaller diffraction grating of measurement range.For manufacture large area from diffraction grating, need to splice by grating
Technique is realized.This means that entire production process is more complicated, the period is long, is manufactured into height.Holographic lithography manufactures grating
Range depends on facula area.Electron beam lithography is exactly directly to beat the beam spot of convergence to be coated with the substrate of photoresist on surface
On, it is not necessary to most expensive and prepare time-consuming mask in optical lithography processes.The precision of electron beam lithography depends on focused ion
The diameter of beam and the step pitch of scanning.It is self-defined less than 10nm resolution ratio that the main advantage of electron beam lithography is that it can make
Pattern.However, the efficiency of this method is very low, therefore it is only limitted to manufacture small area high dencity grating.Mechanical scratching is processing
The conventional method of female diffraction grating it is advantageous that the grating with particular groove type and high aspect ratio can be processed, but is delineated
Cutter is easy to wear, efficiency is low and manufacturing cost is high.The precision of mechanical scratching depends on the stepping spacing of the diameter and delineation of cutter.
Nano imprint lithography be it is a kind of with low cost and high-resolution manufacture high dencity grating simple process, screen periods it is big
Small and precision is determined by mask.
Nano impression is a kind of effective method of simple realization nanostructure, but the grating and mother matrix of nano impression manufacture
It is 1:1 duplication cannot obtain feature structure more smaller size of than original mould under equal dies.Under minimum scale, if you need to
The feature size of nano/submicron rank is obtained, the Die price for manufacturing minimum scale is expensive, is imprinted under minimum scale
Process parameter control it is stringenter, when demoulding, is easy to destroy mold because structure is too small.
Above-mentioned technical problem is the main difficulty that currently manufactured high density diffraction grating aspect faces.
Invention content
In order to overcome the disadvantages of the above prior art, the purpose of the present invention is to provide a kind of prestressing force aided nano press
The method for making high density diffraction grating, is manufactured under equal dies than master tooling characteristic size smaller based on nanometer embossing
Structure, period of grating can control by adjusting prestressing force parameter, have low cost, period it is short, it is simple for process, be easy to
The advantages that control, to use micron order mold manufacturing submicron/nanometer structure to provide simple scheme.
To achieve the goals above, the technical solution adopted by the present invention is：
A kind of method that prestressing force aided nano press makes high density diffraction grating, includes the following steps：
A, grating mother matrix is made with nano-imprint process；
B, the grating pattern of the mother matrix in step a is transferred on PDMS film, makes patterned PDMS grate films；
C, PDMS flexible substrates are made；
D, PDMS flexible substrates are clamped on manual micro-displacement platform and are stretched to certain length；
E, patterned PDMS grate films are adhered in the PDMS flexible substrates of pre-stretching；
F, prestressing force is discharged.
The PDMS (polydimethylsiloxane), the english abbreviation of dimethyl silicone polymer, because its is at low cost,
Using simple, with having good adhesiveness between silicon chip, and with good chemical inertness, optical clear, nontoxic and not
The features such as inflammable, becomes a kind of polymer material being widely used in micro-fluidic equal fields.PDMS of the present invention selects U.S. Dao Kang
The 184 type silicon rubber of sylgard of Ning companies production, it is made of host agent and curing agent two parts, and stirring is mixed according to a certain percentage
After closing uniformly, mixture is placed in vacuum extractor, the bubble in mixture is removed, then is heated on 100 DEG C of drying-plate
Solidification.The difference of the parameters such as the host agent and ratio of curing agent, solidification temperature and hardening time can produce the PDMS of different hardness,
The present invention is according to host agent：Curing agent is 10:1 proportional arrangement sample.
The manual micro-displacement platform is by a micro-displacement platform and a self-made clamp being fixed on optical table
Composition.Micro-displacement platform is widely used in the fields such as scientific research, gauge check instrument and equipment, industrial automation, micro-displacement of the present invention
Platform uses the NFP-2461 series multidimensional ultrahigh precision manual translation platforms for Han Guang companies production of being stood upright by Beijing, it can be with
Realize that element does the linear movement of X, Y and Z-direction, micrometer leading screw pushes displacement platform to do relative motion with fixed station.Homemade folder
Tool is fixed on the table, is bolted clamping sample.Fixed station uses accurate air supporting optical table.Sample clamping is micro-
Between displacement platform and fixture, the stretching displacement of PDMS substrates can be accurately controlled, its levelness is by adjusting micro-displacement platform
Height ensure.
Based on above-mentioned steps process, the method for the invention utilizes the elasticity of PDMS substrates, substrate is fixed on micro-displacement
It on platform, accurately controls prestretching and extends to certain length, in the state of keeping prestressing force to stretch, by the PDMS of nano impression manufacture
Grate film is adhered to middle section in PDMS substrates with liquid PDMS, and PDMS grate films will adhere to completely after spontaneous curing
In PDMS substrates, they become an entirety, discharge prestressing force at this time, and PDMS substrates are sprung back naturally, drive PDMS gratings thin
Film is shunk, and screen periods become smaller, and the manufacture of high density diffraction grating, this side are completed by simple prestressing force drawing process
Method is simple for process, easily operated, and does not need large-scale and complicated device, greatly reduces manufacturing cost and period.This method is used
Control prestressing force size is crossed to control screen periods reduced scale, can produce under same mold and have than original mould
The grating for having the more minor cycle may be implemented to use micron order mold manufacturing submicron/nanometer structure.
Compared with prior art, the method for the present invention novelty, reasonable design, simple for process, at low cost, simply and effectively solves
High density diffraction grating production method device therefor is expensive, process conditions are harsh, process is difficult to control, the period is long and cannot make
The problem of making than original mould characteristic size smaller.
Description of the drawings
Fig. 1 is present invention process schematic diagram.
Fig. 2 is the schematic diagram of step a.
Fig. 3 is the schematic diagram of step b.
Fig. 4 is the schematic diagram of step c.
Fig. 5 is the schematic diagram of step d.
Fig. 6 is the schematic diagram of step e.
Fig. 7 is the schematic diagram of step f.
Fig. 8 is diffraction grating produced by the present invention and diffraction phenomena pictorial diagram.
In figure：1. patterned PDMS grate films；2.PDMS flexible substrates；3. deep ultraviolet light；4. grating mask plate；5.
Positive photoresist；6. mother matrix substrate；7. grating mother matrix；8. ruler；9. the PDMS flexible substrates of pre-stretching；10. adhesive tape；11. carrying
Slide；12. fixture；13. manual micro-displacement platform；14. the high dencity grating of manufacture.
Specific implementation mode
The embodiment that the present invention will be described in detail with reference to the accompanying drawings and examples.
With reference to figure 1, the production method that a kind of prestressing force aided nano press of the present invention makes high density diffraction grating, including
Following steps：
A, grating mother matrix is made with nano-imprint process；
B, the grating pattern of the mother matrix in step a is transferred on PDMS film, makes patterned PDMS grate films
1；
C, PDMS flexible substrates 2 are made；
D, PDMS flexible substrates 2 are clamped on manual micro-displacement platform and are stretched to certain length；
E, patterned PDMS grate films 1 are adhered in the PDMS flexible substrates 2 of pre-stretching；
F, prestressing force is discharged.
When it is implemented, with reference to figure 2, step a：Grating caster is made with ultra-violet lithography.First, before substrate
Reason forms smooth and combines to obtain good film to ensure that photoresist can very well be pasted with crystal column surface, it is necessary to carry out surface standard
Standby, holding surface is dry and clean, cleans mother matrix substrate 6 with acetone, alcohol, deionized water respectively；Secondly, positive photoresist is applied
5, the target of gluing is to be established in crystal column surface thin, uniform, and does not have defective photoresist film；Then, front baking, front baking
Purpose be the solvent removed in glue-line, improve photoresist and the adhesion strength of substrate and the mechanical abrasion ability of glued membrane；Then, right
Accurate and exposure, using grating mask plate 4, using deep ultraviolet light 3, using the method for ultraviolet light exposure formula exposure in positive photoresist
Exposure makes grating pattern, i.e. grating motherboard 7 on 5；Then, develop, configure 0.5% NaOH solution as developer solution, will expose
The good grating mother matrix 7 of light is put to develop in developer solution, and development refers to that the pattern on grating mask plate 4 is copied to positive photoresist
On 5；Then, rear to dry, softening, expansion has occurred in developed later glued membrane, and glued membrane declines with silicon chip surface adhesion strength.In order to protect
Lower one of the etching procedure of card can be smoothed out, and positive photoresist 5 and crystal column surface is made preferably to bond, it is necessary to continue to evaporate solvent
To cure positive photoresist 5；Later, it etches, etching is to remove the work on wafer most surface layer by 5 exposed region of positive photoresist
Skill, main target are that the pattern on lithography mask version 4 is exactly transferred to crystal column surface；Finally, positive photoresist 5 is removed,
After etching, pattern becomes the permanent part in wafer most surface layer.The photoresist layer of etching barrier layer is no longer necessary, it is necessary to from
Surface is removed, and subsequent reverse mould is convenient for.
Step b, with reference to figure 3：The grating pattern of grating mother matrix 7 in step a is transferred on PDMS film, figure is made
The PDMS grate films 1 of change.The PDMS that the present embodiment uses selects the 184 type silicon rubbers of sylgard of Dow corning company production
Glue, it is made of host agent and curing agent two parts.By host agent and curing agent according to quality 10 when use:1 ratio mixing, mitigates
During be sufficiently stirred it made to be uniformly mixed, then uniformly mixed mixture is placed in vacuum extractor, vacuumizes 15
Minute completely removes the bubble in mixture；Then, PDMS is uniformly poured on the mother matrix with Grating Mechanism；Mother matrix is put
It sets to revolve on sol evenning machine and put down；Later, mother matrix is heating and curing 1 hour on 100 DEG C of baking pan；Finally, it will be fully cured
PDMS film is stripped down from grating mother matrix 7, and the grating pattern on grating mother matrix 7 has been transferred into PDMS film at this time
On, that is, complete the manufacture of patterned PDMS grate films 1.
Step c, with reference to figure 4：Make PDMS flexible substrates 2.PDMS substrates are produced by Dow corning company
184 type silicon rubber of sylgard, it is made of prepolymer and curing agent two parts；According to prepolymer：Curing agent is 10:1 ratio
Mixture, is then poured in the glass slide 11 constrained in advance with adhesive tape 10, wherein the thickness of glass slide 11 by example configuration PMDS
Width for 1mm, adhesive tape 10 is 5mm, scrapes flat surface with smooth ruler 8, is heating and curing 1 hour, waits on 95 DEG C of baking pan
Adhesive tape 10 is removed after the solidification of PDMS substrates and is stripped down from glass slide 11.Be formed as the rectangle of 18mm × 75mm × 4mm
Item.
Wherein, the length of glass slide 11 is generous is respectively：The width and thickness of 82mm × 25mm × 1mm, adhesive tape 10 is respectively：
Adhesive tape 10, is sticked to the top surface edge of glass slide 11 by 3.5mm × 4mm, and constraint forms a slot, the generous difference of length of such slot
For：It is generous respectively will just to form length by 75mm × 18mm × 4mm in liquid PDMS lead-in grooves：75mm × 18mm × 4mm's is rectangular
Shape item, as PDMS flexible substrates 2.
Step d, with reference to figure 5：PDMS flexible substrates 2 are clamped on manual micro-displacement platform 13 and are stretched to a fixed length
Degree.First, one end of 2 length direction of PDMS flexible substrates is clamped on fixture 12, by adjusting manual micro-displacement platform 13
Clip position the other end of PDMS flexible substrates 2 is clamped, and make PDMS flexibility bases by adjusting manual micro-displacement platform 13
Bottom 2 keeps horizontal, and 15mm is respectively clamped in both sides, then practical stretch zones are 45mm；Then, by the way that tensile elongation parameter, edge is arranged
Length direction accurately stretches PDMS flexible substrates 2.Finally, the position for locking manual micro-displacement platform 13 makes PDMS flexible substrates 2
It is always maintained at tensional state, the PDMS flexible substrates 9 being pre-stretched.
The a length of 75mm of original of PDMS flexible substrates 2 in experimental setup, in order to ensure the uniformity stretched, PDMS flexible substrates
2 the right and left clamping lengths are 15mm, so physical length to be tensioned is 45mm, identical sample has 5 groups altogether, presses successively
It is stretched according to certain length, tensile elongation variable quantity (Δ L) is respectively 5mm, 10mm, 15mm, 20mm, 25mm.
Step e, with reference to figure 6：Patterned PDMS grate films 1 are adhered in the PDMS flexible substrates 9 of pre-stretching.It is first
First, adhesive is configured, is the PDMS mixtures of liquid, is the 184 type silicon rubber of sylgard produced by Dow corning company,
It is made of prepolymer and curing agent two parts；According to prepolymer：Curing agent is 10:1 proportional arrangement PMDS；Then, it will mix
Close 9 center of PDMS flexible substrates that object drops in pre-stretching；Then, patterned PDMS grate films 1 are adhered to pre-stretching
9 center of PDMS flexible substrates；Later, it is constantly in prestressing force tensional state and cures 24 hours at room temperature, i.e., graphically
PDMS grate films 1 be adhered in the PDMS flexible substrates 9 of pre-stretching, they become an entirety.
Step f, with reference to figure 7：Discharge prestressing force.It slowly is back to 0 by adjusting micro-displacement platform 15 manually, in this mistake
The PDMS flexible substrates 9 of Cheng Zhong, pre-stretching are slowly sprung back, and the patterned PDMS grate films 1 adhered to it are also received therewith
Contracting, the high dencity grating 14 manufactured is respectively 5mm, 10mm, 15mm, 20mm, 25mm in tensile elongation variable quantity (Δ L)
Under conditions of, screen periods are reduced into 3.64 μm, 3.53 μm, 3.24 μm, 3.17 μm and 3 μm respectively.Grate film in Fig. 6
Primitive period is 4 μm.
The present invention tests 4 μm of initial 1 diffraction efficiencies of original grating and a high dencity grating 14 for manufacture by a definite date
Period is 3 μm.With reference to figure 8, wherein Fig. 8 (a) is the experimental provision of the diffraction property test of graphical PDMS film grating 1；Make
Diffraction image can be readily available with single wavelength light source (633nm He-Ne laser).Fig. 8 (b) shows the light of 4 μm and 3 μm
Grid diffraction image, because the distance between each rank point diffraction increases with the reduction of screen periods, it is possible to be clearly visible
Apply prestressing force fore-and-aft observing to diffraction image be entirely different.
Screen periods can be controlled by adjusting prestressing force size, and the maximum reduction gear ratio of screen periods is about 25%.
The present embodiment using Beijing stand upright Han Guang companies production NFP-2461 series multidimensional ultrahigh precision manual translation platforms.
The method is not limited to manufacture high density diffraction grating can accurately control structure by adjusting prestressing force size
Figure deformation can also manufacture the MEMS device such as fluid channel, filter.
The specific implementation mode of the present invention is described above in association with attached drawing, but these explanations cannot be understood to limit
The scope of the present invention, protection scope of the present invention are limited by appended claims, any in the claims in the present invention base
Change on plinth is all protection scope of the present invention.
Claims (8)
1. a kind of method that prestressing force aided nano press makes high density diffraction grating, which is characterized in that include the following steps：
A, grating mother matrix is made with nano-imprint process；
B, the grating pattern of the mother matrix in step a is transferred on PDMS film, makes patterned PDMS grate films；
C, PDMS flexible substrates are made；
D, PDMS flexible substrates are stretched to certain length；
E, patterned PDMS grate films are adhered in the PDMS flexible substrates of pre-stretching；
F, prestressing force is discharged.
2. the method that prestressing force aided nano press makes high density diffraction grating according to claim 1, which is characterized in that
The step of grating mother matrix is made in the step a is as follows：
1), substrate pre-treatment, to keep substrate surface dry and clean；
2) positive photoresist, is applied, is established in crystal column surface thin, uniform, and does not have defective photoresist film；
3), front baking removes the solvent in glue-line, improves photoresist and the adhesion strength of substrate and the mechanical abrasion ability of glued membrane；
4) it, is aligned and exposes, using mask plate, expose making on positive photoresist using the method that ultraviolet light exposure formula exposes
Grating pattern, i.e. grating caster；
5), develop, reticle pattern is copied on photoresist；
6), rear to dry, evaporation solvent is to cure photoresist；
7) it, etches, the pattern on lithography mask version is exactly transferred to crystal column surface；
8) photoresist, is removed.
3. the method that prestressing force aided nano press makes high density diffraction grating according to claim 1, which is characterized in that
In the step b, PDMS film is the 184 type silicon rubber of sylgard produced by Dow corning company, it by prepolymer and
Curing agent two parts form；According to prepolymer：Curing agent mass ratio is 10:1 proportional arrangement PMDS, then topples over mixture
On the mother matrix with graphical optical grating construction, spin coating thickness is heating and curing to 0.5mm on 95 DEG C of baking pan on sol evenning machine
It 1 hour, is stripped down from template after PDMS film solidification, the figure of grating mother matrix has been transferred to PMDS films at this time
On, become the PDMS film with graphical grating.
4. the method that prestressing force aided nano press makes high density diffraction grating according to claim 1, which is characterized in that
In the step c, PDMS substrates are the 184 type silicon rubber of sylgard produced by Dow corning company, it by prepolymer and
Curing agent two parts form；According to prepolymer：Curing agent mass ratio is 10:1 proportional arrangement PMDS, then topples over mixture
In the glass slide constrained in advance with adhesive tape, wherein the thickness of glass slide is 1mm, and the width of adhesive tape is 5mm, with smooth ruler
Flat surface is scraped, is heating and curing on 95 DEG C of baking pan 1 hour, adhesive tape is removed after the solidification of PDMS substrates and is removed from glass slide
Get off.The rectangular bars of 18mm × 75mm × 4mm are cut to pocket knife.
5. the method that prestressing force aided nano press makes high density diffraction grating according to claim 1, which is characterized in that
In the step d, the both sides of prefabricated PDMS substrates are clipped in respectively on manual micro-displacement platform, and be stretched to a fixed length
Degree.
6. the method that prestressing force aided nano press makes high density diffraction grating according to claim 1, which is characterized in that
In the step e, patterned PDMS grate films are adhered to the PDMS flexible substrates center of pre-stretching, adhesive is liquid
PDMS mixtures, be constantly in prestressing force tensional state and cured at room temperature 24 hours, i.e., PDMS film is adhered to
In PDMS substrates, they become an entirety.
7. the method that prestressing force aided nano press makes high density diffraction grating according to claim 1, which is characterized in that
In the step f, prestressing force is discharged, the substrate of pre-stretching is made to spring back, is adhered to graphical grate film in substrate also therewith
It shrinks, obtains more highdensity grating pattern.
8. the method that prestressing force aided nano press makes high density diffraction grating according to claim 1, which is characterized in that
Screen periods are controlled by adjusting prestressing force size, and the maximum reduction gear ratio of screen periods is 25%.
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| WO2020119469A1 (en) * | 2018-12-12 | 2020-06-18 | 深圳先进技术研究院 | Processing device and processing method for toroidal gratings |
| CN110187417A (en) * | 2019-06-27 | 2019-08-30 | 电子科技大学 | The production method of PDMS film microlens array |
| CN111257997B (en) * | 2020-03-11 | 2022-03-11 | 北京至格科技有限公司 | Method for manufacturing augmented reality grating waveguides in batch |
| CN111257997A (en) * | 2020-03-11 | 2020-06-09 | 北京至格科技有限公司 | Method for manufacturing augmented reality grating waveguides in batch |
| CN111545258A (en) * | 2020-04-26 | 2020-08-18 | 复旦大学 | Micro-fluidic chip capable of providing compression deformation and preparation method and application thereof |
| CN112230317A (en) * | 2020-10-20 | 2021-01-15 | 西安工程大学 | Photoelectric dual-drive double-layer composite flexible grating and preparation method thereof |
| CN112526660A (en) * | 2020-11-11 | 2021-03-19 | 歌尔股份有限公司 | Method for manufacturing nano-grating on curved surface, optical device and electronic equipment |
| CN112526660B (en) * | 2020-11-11 | 2022-12-09 | 歌尔股份有限公司 | Method for manufacturing nano-grating on curved surface, optical device and electronic equipment |
| CN112596251A (en) * | 2020-12-22 | 2021-04-02 | 吉林大学 | Flexible adjustable diffractive optical element for shaping laser spots, and preparation method and application thereof |
| CN112782795A (en) * | 2021-01-29 | 2021-05-11 | 鲁东大学 | Method for preparing submicron grating with half period |
| CN112782795B (en) * | 2021-01-29 | 2022-06-07 | 鲁东大学 | Method for preparing submicron grating with half period |
| CN112764145A (en) * | 2021-02-01 | 2021-05-07 | 西安交通大学 | Two-dimensional grating efficient manufacturing method based on time sequence control |
| WO2022183298A1 (en) * | 2021-03-05 | 2022-09-09 | Mcmaster University | Methods of producing nanoscale hot embossed patterns |
| CN113759451A (en) * | 2021-08-11 | 2021-12-07 | 广州先进技术研究所 | Processing device and preparation method of curved surface grating |
| CN113759451B (en) * | 2021-08-11 | 2023-11-03 | 广州先进技术研究所 | Curved surface grating processing device and preparation method |
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