CN108745803A - A kind of photoresist spinner - Google Patents
A kind of photoresist spinner Download PDFInfo
- Publication number
- CN108745803A CN108745803A CN201810892007.7A CN201810892007A CN108745803A CN 108745803 A CN108745803 A CN 108745803A CN 201810892007 A CN201810892007 A CN 201810892007A CN 108745803 A CN108745803 A CN 108745803A
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- China
- Prior art keywords
- photoresist
- controller
- gluing platform
- photoresist spinner
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 116
- 239000000758 substrate Substances 0.000 claims abstract description 76
- 238000004026 adhesive bonding Methods 0.000 claims abstract description 70
- 239000000523 sample Substances 0.000 claims description 18
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 11
- 238000009825 accumulation Methods 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 8
- 238000000576 coating method Methods 0.000 abstract description 8
- 238000000034 method Methods 0.000 description 22
- 239000003292 glue Substances 0.000 description 15
- 230000008569 process Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 238000001259 photo etching Methods 0.000 description 7
- 238000010422 painting Methods 0.000 description 6
- 238000004528 spin coating Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 230000006870 function Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 238000007664 blowing Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 206010038743 Restlessness Diseases 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/06—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface with a blast of gas or vapour
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1039—Recovery of excess liquid or other fluent material; Controlling means therefor
Abstract
Include the gluing platform for placing substrate, motor and exhaust fan the invention discloses a kind of photoresist spinner；The motor is fixedly connected with the gluing platform, and the motor is used to drive the gluing platform to be rotated along the circumferential direction of the gluing platform；The exhaust fan is located above the gluing platform, and the air outlet of the exhaust fan is towards the gluing platform.Said motor can drive gluing platform circumferentially rotatable, and fan can dry when sprawling photoresist to substrate, to form the air-flow with certain wind direction in substrate surface, the air-flow can give photoresist one additional thrust, photoresist is helped to sprawl, to reduce in coating photoresist since photoresist accumulation is formed by the width of frame.
Description
Technical field
The present invention relates to chip manufacturing fields, more particularly to a kind of photoresist spinner.
Background technology
As the continuous progress of science and technology, the preparation process of chip have obtained great development, wherein photoetching process in recent years
Play the role of the most important thing in chip preparing process.
At this stage, the pattern on various circuit patterns and mask plate in chip is to pass through photoetching at this stage
Technology etches in chip or mask plate, and the growth of the integrated level of chip and aspect of performance mainly has benefited from photoetching technique
It constantly brings forth new ideas and progress.During carrying out photoetching, need photoresist even spread on the surface of the substrate, to ensure photoetching
When pattern it is accurate.
In the prior art, it is the photoresist film that uniform smooth is set on the surface of the substrate by photoresist spinner, principle
It is to be spread out photoresist using centrifugal force caused by high speed rotation substrate.But it in the prior art can side on the surface of the substrate
Photoresist is accumulated to form frame in edge region, and the thickness of photoresist would generally be higher than the thickness of the photoresist film of needs at frame
Go out 0.5 times or more.It can not be used since the thickness of photoresist film at frame is higher, so the region also becomes dead space, this is not
Conducive to the use of substrate；The photoresist accumulated at frame simultaneously can be hardened in baking, and be taken off in the transmittance process of processing procedure
The problems such as falling to form particle, polluting equipment used in subsequent technique, cause pattern lacks.
So how to reduce in coating photoresist since to be formed by the width of frame be this field skill for photoresist accumulation
Art personnel's urgent problem.
Invention content
The object of the present invention is to provide a kind of photoresist spinners, can effectively reduce the width that frame is formed by during gluing
Degree.
In order to solve the above technical problems, the present invention provides a kind of photoresist spinner, which is characterized in that include for placing substrate
Gluing platform, motor and exhaust fan；
The motor is fixedly connected with the gluing platform, and the motor is for driving the gluing platform along the painting
The circumferential direction of glue platform rotates；The exhaust fan is located above the gluing platform, and the air outlet direction of the exhaust fan
The gluing platform.
Optionally, the exhaust fan is located at the surface of the gluing Platform center.
Optionally, the gluing platform includes the photoresist spinner pedestal being fixedly connected with the motor, and is located at the painting
Glue platform base upper surface, and the chuck being fixedly connected with the photoresist spinner pedestal, the chuck is for fixing the substrate.
Optionally, the chuck has a groove for accommodating the substrate, and the depth of the groove is not more than the base
The thickness of plate.
Optionally, the photoresist spinner further includes scrap rubber bowl, exhaust pipe and extractor fan；
The gluing platform is located in the inner cavity of the scrap rubber bowl, and the scrap rubber bowl inner wall has first through hole, the row
The air intake vent of tracheae is connected with the first through hole, and the air outlet of the exhaust pipe is provided with the extractor fan, the pumping
Wind apparatus is used to detach air from the air outlet.
Optionally, the photoresist spinner further includes the outer cover positioned at the scrap rubber bowl opening, and the outer cover is located at the painting
It is located at the exhaust fan between glue platform and the exhaust fan, in the outer cover and the opposed area of the gluing platform is provided with
Second through-hole.
Optionally, there are the scrap rubber bowl inner wall multiple first through hole, multiple first through hole to surround the painting
Glue platform is uniformly distributed.
Optionally, the photoresist spinner further includes capacity control assembly, and the capacity control assembly includes traffic probe
Device, the first controller and second controller；
The flow probe is used to measure the capacity in the scrap rubber bowl；First controller and the exhaust fan
It is connected, first controller is used to control the power of the exhaust fan according to the capacity；The second controller with
The extractor fan is connected, and the second controller is used to control the power of the extractor fan according to the capacity.
Optionally, the extractor fan includes positioned at the air door of the air outlet and for detaching air from the air outlet
Wind turbine.
Optionally, the second controller includes the first sub-controller being connect with the air door and is connect with the wind turbine
The second sub-controller；
First sub-controller is used for according to the capacity by controlling the linear drive apparatus of the air door to control
Make the stroke of the air door；Second sub-controller is used to control the power of the wind turbine according to outer signals.
A kind of photoresist spinner provided by the present invention, includes the gluing platform for placing substrate, motor and exhaust fan, wherein
Motor can drive gluing platform circumferentially rotatable, and fan can dry when sprawling photoresist to substrate, in substrate surface
The air-flow with certain wind direction is formed, which can give photoresist one additional thrust, help photoresist to sprawl, to subtract
Less in coating photoresist since photoresist accumulation is formed by the width of frame.
Description of the drawings
It, below will be to embodiment or existing for the clearer technical solution for illustrating the embodiment of the present invention or the prior art
Attached drawing is briefly described needed in technology description, it should be apparent that, the accompanying drawings in the following description is only this hair
Some bright embodiments for those of ordinary skill in the art without creative efforts, can be with root
Other attached drawings are obtained according to these attached drawings.
A kind of structural schematic diagram for photoresist spinner that Fig. 1 is provided by the embodiment of the present invention；
Fig. 2 is the structural schematic diagram of chuck in Fig. 1；
A kind of structural schematic diagram for specific photoresist spinner that Fig. 3 is provided by the embodiment of the present invention；
A kind of structure diagram for capacity control assembly that Fig. 4 is provided by the embodiment of the present invention.
In figure：1. gluing platform, 11. photoresist spinner pedestals, 12. chucks, 121. grooves, 2. substrates, 3. motors, 4. air drafts
Fan, 5. scrap rubber bowls, 6. exhaust pipes, 7. extractor fans, 71. air doors, 72. wind turbines, 8. outer covers, 81. second through-holes, 9. traffic probes
Device, 10. first controllers, 11. second controllers, 111. first sub-controllers, 112. second sub-controllers.
Specific implementation mode
Core of the invention is to provide a kind of photoresist spinner.In the prior art, it is that substrate surface is sprawled by centrifugal force
Photoresist.But since photoresist by centrifugation force effect in addition to radially being spread out, also suffer from the resistance of viscous force, surface tension
Hinder.High speed whirl coating latter stage, centrifugal force reach balance with resistance, and sub-fraction photoresist can be caused to be accumulated in substrate edges, to
Form the frame of 2mm to 10mm or so.
And a kind of photoresist spinner provided by the present invention, include the gluing platform for placing substrate, motor and exhaust fan,
Middle motor can drive gluing platform circumferentially rotatable, and fan can dry when sprawling photoresist to substrate, in substrate table
Face forms the air-flow with certain wind direction, which can give photoresist one additional thrust, and photoresist is helped to sprawl, to
It reduces in coating photoresist since photoresist accumulation is formed by the width of frame.
In order to enable those skilled in the art to better understand the solution of the present invention, with reference to the accompanying drawings and detailed description
The present invention is described in further detail.Obviously, described embodiments are only a part of the embodiments of the present invention, rather than
Whole embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art are not making creative work premise
Lower obtained every other embodiment, shall fall within the protection scope of the present invention.
It please refers to Fig.1 and a kind of structural schematic diagram of photoresist spinner that Fig. 2, Fig. 1 are provided by the embodiment of the present invention；Fig. 2 is
The structural schematic diagram of chuck in Fig. 1.
Referring to Fig. 1, in embodiments of the present invention, the photoresist spinner includes the gluing platform 1 for placing substrate 2, motor 3
With exhaust fan 4；The motor 3 is fixedly connected with the gluing platform 1, and the motor 3 is for driving 1 edge of gluing platform
The circumferential direction of the gluing platform 1 rotates；The exhaust fan 4 is located above the gluing platform 1, and the exhaust fan 4
Air outlet is towards the gluing platform 1.
Aforesaid substrate 2 can be the photomask for needing to be arranged photoresist, can also be the wafer for needing to be arranged photoresist,
Specific type in relation to substrate 2 in embodiments of the present invention and is not specifically limited.Above-mentioned gluing platform 1 needs commonly used in carrying
The substrate 2 of photoresist to be coated, substrate 2 are typically secured to the upper surface of gluing platform 1, and gluing platform 1 is generally horizontal puts
It sets so that the substrate 2 for being fixed on 1 upper surface of gluing platform will not run-off the straight.
The needs of said motor 3 are fixedly connected with gluing platform 1, and motor 3 can drive gluing platform 1 and be fixed on gluing
The circumferential direction of upper edge gluing platform 1 and substrate 2 rotates the substrate 2 on 1 surface of platform in the horizontal direction.Tool in relation to motor 3
Body structure is referred to the prior art, in embodiments of the present invention and is not specifically limited.
Specifically, above-mentioned gluing platform 1 includes the photoresist spinner pedestal 11 being fixedly connected with the motor 3, and it is located at institute
11 upper surface of photoresist spinner pedestal, and the chuck 12 being fixedly connected with the photoresist spinner pedestal 11 are stated, the chuck 12 is for fixing
The substrate 2.
Above-mentioned photoresist spinner pedestal 11 is usually plate-like, and the output shaft of motor 3 is fixedly connected with photoresist spinner pedestal 11, with band
Dynamic photoresist spinner pedestal 11 is circumferentially rotatable；The upper surface of photoresist spinner pedestal 11 can be fixed on for the chuck 12 of fixed substrate 2.
Referring to Fig. 2, in order to reduce the influence that photoresist flow to 2 back side of substrate and reduction Bernoulli effect, as preferred
, the chuck 12 has a groove 121 for accommodating the substrate 2, and the depth of the groove 121 in embodiments of the present invention
No more than the thickness of the substrate 2.I.e. above-mentioned chuck 12 is preferably embedded chuck 12, the chuck 12 in embodiments of the present invention
With one for accommodating the groove 121 of substrate 2, and substrate 2 be put into the upper surface of the metacoxal plate 2 of the groove 121 can be with chuck 12
Upper surface it is concordant, or the upper surface of setting substrate 2 can protrude the upper surface of chuck 12 so that substrate 2 will not recessed chuck
12.Certainly, when the depth of the groove 121 is equal with the thickness of the substrate 2, i.e. the upper surface of substrate 2 and chuck 12
When upper surface is concordant, the influence of Bernoulli effect can be further reduced, prevents from being formed at four angles on surface on a substrate 2
Swirl shape decorative pattern.It should be noted that the shape needs of above-mentioned groove 121 are corresponding with the shape of substrate 2 so that substrate 2 is not
It can be subjected to displacement in groove 121.In spin coating photoresist, above-mentioned embedded chuck 12 can reduce photoresist to the greatest extent and flow to base
The back side of plate 2 and the influence of Bernoulli effect.
In embodiments of the present invention, the exhaust fan 4 is located at 1 top of the gluing platform, and the outlet air of the exhaust fan 4
Mouthful towards the gluing platform 1.
Said exhaust fan 4 air outlet towards gluing platform 1 allow in the operating condition exhaust fan 4 to be fixed on painting
The substrate 2 on 1 surface of glue platform provides the air-flow for blowing to substrate 2, and the air flow contacts are to can be to four when substrate 2 and gluing platform 1
Week diffusion, to become the air-flow moved in the horizontal direction, which can push photoresist to sprawl.In relation to the specific of exhaust fan 4
Structure is referred to the prior art, in embodiments of the present invention and is not specifically limited, as long as the exhaust fan 4 can be towards gluing
Platform 1 provides air-flow.
In order to ensure that photoresist uniformly can be spread over 2 surface of substrate by the air-flow that said exhaust fan 4 is provided, simultaneously
So that 2 surface of substrate accumulated by photoresist made of frame even width, preferably, said exhaust fan 4 can be located at
The surface at 1 center of gluing platform, so that the air-flow that exhaust fan 4 is provided can be with face gluing platform 1 either
Be arranged at the center of the substrate 2 on 1 surface of gluing platform so that the air-flow can uniformly from the center of substrate 2 around
Diffusion so that 2 surface of substrate accumulated by photoresist made of frame even width.
A kind of photoresist spinner that the embodiment of the present invention is provided includes the gluing platform 1 for placing substrate 2, motor 3 and row
Fan 4, wherein motor 3 can drive gluing platform 1 circumferentially rotatable, and fan can dry when sprawling photoresist to substrate 2, from
And the air-flow with certain wind direction is formed on 2 surface of substrate, which can give photoresist one additional thrust, help photoetching
Glue is sprawled, to reduce in coating photoresist since photoresist accumulation is formed by the width of frame.
In order to avoid photoresist splashes above-mentioned photoresist spinner at work, while avoiding in environment air-flow to spin coating photoetching
The photoresist film on 2 surface of substrate impacts when glue, and the photoresist spinner that can be further provided foregoing invention embodiment carries out
Optimization, detailed content will be described in detail in following inventive embodiments.
It please refers to Fig.3 and a kind of structural schematic diagram of specific photoresist spinner that Fig. 4, Fig. 3 are provided by the embodiment of the present invention；
A kind of structure diagram for capacity control assembly that Fig. 4 is provided by the embodiment of the present invention.
It is different from foregoing invention embodiment, the embodiment of the present invention is on the basis of foregoing invention embodiment, further
The structure of photoresist spinner is specifically limited.Remaining content is described in detail in foregoing invention embodiment, herein not
It is repeated again.
In embodiments of the present invention, the photoresist spinner further includes scrap rubber bowl 5, exhaust pipe 6 and extractor fan 7；The gluing
Platform 1 is located in the inner cavity of the scrap rubber bowl 5, and 5 inner wall of scrap rubber bowl has first through hole, the air intake vent of the exhaust pipe 6
It is connected with the first through hole, the air outlet of the exhaust pipe 6 is provided with the extractor fan 7, and the extractor fan 7 is used for
Air is detached from the air outlet.
Above-mentioned scrap rubber bowl 5 has an inner cavity, while scrap rubber bowl 5 also has an opening.Above-mentioned gluing platform 1 can be arranged useless
In the inner cavity of glue bowl 5, while the upper surface of gluing platform 1 can be towards the opening of scrap rubber bowl 5.In working condition, from substrate 2
The photoresist that surface is thrown away can be fallen in scrap rubber bowl 5, to avoid the splashing of photoresist.Under normal conditions, said exhaust fans 4 meetings
Air-flow is provided from the opening of scrap rubber bowl 5 to gluing platform 1.
Since above-mentioned scrap rubber bowl 5 can form the space of an opposing seal around gluing platform 1, if directly by above-mentioned
Exhaust fan 4 is dried to substrate 2, and reflection can occur at the inner wall of scrap rubber bowl 5 for air-flow to form sinuous flow.In order to avoid above-mentioned feelings
The generation of condition is additionally provided with a first through hole at the inner wall of above-mentioned scrap rubber bowl 5 in embodiments of the present invention, above-mentioned exhaust pipe 6
Air intake vent is connected with above-mentioned first through hole, so that the inner cavity of exhaust pipe 6 and the introversion of scrap rubber bowl 5 are interconnected.Simultaneously
Can at the air outlet of above-mentioned exhaust pipe 6 be arranged extractor fan 7, by the extractor fan 7 can from the inner cavity of exhaust pipe 6 to
The external world detaches air, to ensure that the air-flow for being blown to 2 surface of substrate from exhaust fan 4 can be in the region court close to 5 side wall of scrap rubber bowl
It is flowed to above-mentioned first through hole, and outwardly eventually by 6 row of exhaust pipe, to avoid the side-walls in scrap rubber bowl 5 from forming unrest
Stream, to avoid the sinuous flow from impacting the photoresist for being spin-coated on 2 surface of substrate.
In order to ensure being uniformly distributed for air-flow in above-mentioned scrap rubber bowl 5, preferably, 5 inner wall of scrap rubber bowl have it is more
A first through hole, multiple first through hole are uniformly distributed around the gluing platform 1.At this time from substrate 2 to scrap rubber bowl 5
The distance that the gas of sidewall diffusion flows to first through hole is of substantially equal, while suffered by the above-mentioned air-flow for being diffused into 5 side wall of scrap rubber bowl
The power of above-mentioned extractor fan 7 also can be relatively uniform, thereby may be ensured that being uniformly distributed for air-flow in scrap rubber bowl 5.
Preferably, in order to exclude in external environment air-flow in spin coating photoresist to the photoresist film on 2 surface of substrate
It has an impact, the photoresist spinner can also include the outer cover 8 positioned at 5 opening of scrap rubber bowl, institute in embodiments of the present invention
Outer cover 8 is stated between the gluing platform 1 and the exhaust fan 4, the exhaust fan 4 and the painting are located in the outer cover 8
The opposed area of glue platform 1 is provided with the second through-hole 81.
Above-mentioned outer cover 8 can make the inner cavity of scrap rubber bowl 5 be in the environment of opposing seal so that external air flow only can be with
Entered in scrap rubber bowl 5 by the second through-hole 81 in outer cover 8, to effectively avoid the air-flow in external environment in spin coating photoresist
When the photoresist film on 2 surface of substrate is had an impact.It should be noted that the air-flow that said exhaust fan 4 is provided can be by upper
It states the second through-hole 81 being arranged in outer cover 8 in the opposed area of exhaust fan 4 and gluing platform 1 and flows to 2 surface of substrate.Due to logical
Said exhaust fan 4 is located at the surface at 1 center of gluing platform in the case of often, and corresponding above-mentioned second through-hole 81 needs to be located at outer cover
8 center.Certainly, it the diameter for the second through-hole 81 and is not specifically limited in embodiments of the present invention, depending on concrete condition
It is fixed.
Referring to Fig. 4, due to needing to carry out strictly for the air-flow in scrap rubber bowl 5 when by photoresist spinner spin coating photoresist
Control, in order to further accurately control the air-flow in scrap rubber bowl 5, preferably, in embodiments of the present invention, the gluing
Platform further includes capacity control assembly, and the capacity control assembly includes flow probe 9, the control of the first controller 10 and second
Device 11 processed；The flow probe 9 is used to measure the capacity in the scrap rubber bowl 5；First controller 10 and the row
Fan 4 is connected, and first controller 10 is used to control the power of the exhaust fan 4 according to the capacity；Described second
Controller 11 is connected with the extractor fan 7, and the second controller 11 is used to control the exhausting according to the capacity
The power of device 7.
Above-mentioned flow probe 9 is one kind of inductor, can measure in scrap rubber bowl 5 that flow to first from gluing platform 1 logical
The capacity of the air-flow in hole.Flow probe 9 can be arranged in the inner cavity of scrap rubber bowl 5 under normal conditions.Above-mentioned first controller
10 are connected with exhaust fan 4, while the first controller 10 is also connected with above-mentioned flow probe 9.When above-mentioned flow probe 9
When measuring the capacity in scrap rubber bowl 5, capacity current in scrap rubber bowl 5 can be sent to the first controller 10, the first control
Device 10 processed can compare capacity current in scrap rubber bowl 5 with the target exhaust amount being stored in the first controller 10, and
The power that exhaust fan 4 is controlled according to comparing result, so as to adjust the capacity in current scrap rubber bowl 5.
Similar with the first controller 10, above-mentioned second controller 11 is connected with extractor fan 7, while second controller
11 are also connected with above-mentioned flow probe 9.When above-mentioned flow probe 9 measures the capacity in scrap rubber bowl 5, can will give up
Current capacity is sent to second controller 11 in glue bowl 5, second controller 11 can by capacity current in scrap rubber bowl 5 with
The target exhaust amount being stored in second controller 11 is compared, and the power of extractor fan 7 is controlled according to comparing result, from
And adjust the capacity in current scrap rubber bowl 5.
Related above-mentioned first controller 10 and 11 specific control flow of second controller are referred to the prior art,
It is no longer described in detail in the embodiment of the present invention.
In embodiments of the present invention, above-mentioned extractor fan 7 includes being located at the air door 71 of the air outlet and being used for from described
Air outlet detaches the wind turbine 72 of air.Above-mentioned wind turbine 72 is mainly used for control and outwardly discharges air-flow from 6 air outlet of exhaust pipe
Maximum capacity, and above-mentioned air door 71 be mainly used for controlling outwardly discharged from 6 air outlet of exhaust pipe air-flow when front row
Tolerance, above-mentioned air door 71 include a linear drive apparatus, which can control the stroke of air door 71, to control
The current exhaust amount of air-flow is outwardly discharged in 6 air outlet of exhaust pipe.Above-mentioned air door 71 needs to cooperate with wind turbine 72, to
Realize the effect of air-flow in adjustment scrap rubber bowl 5.
Correspondingly, above-mentioned second controller 11 include the first sub-controller 111 being connect with the air door 71 and with it is described
The second sub-controller 112 that wind turbine 72 connects；First sub-controller 111 according to the capacity for passing through described in control
The linear drive apparatus of air door 71 is to control the stroke of the air door 71；Second sub-controller 112 is used to be believed according to the external world
The power of number control wind turbine 72.
Above-mentioned first sub-controller 111 in above-mentioned air door 71 front driving device be connected, while this first son control
The needs of device 111 processed are connected with above-mentioned flow probe 9, and the first sub-controller 111 can be according to the row sent by flow probe 9
Tolerance controls the stroke of air door 71, so as to adjust the capacity in scrap rubber bowl 5.Specifically, above-mentioned linear drive apparatus is usually
Cylinder either oil cylinder.
Above-mentioned second sub-controller 112 is used to control the power of the wind turbine 72 according to outer signals.For variety classes
Photoresist, since the characteristics such as its viscosity, solid content, advection are different, capacity in the scrap rubber bowl 5 needed for different process process
Size must re-optimization.For example, the photoresist difference of flowability of photoresist and 50CP that adherency is 10CP is larger, if the two
The capacity of same size is used during being spin-coated to substrate 2, then the photoresist edge accumulation area of 50CP significantly increases.?
In adjustment process, not only needs to adjust exhaust fan 4 and air door 71 by program to optimize capacity, also wind is adjusted by program
Machine 72 could realize the minimum of edge bead accumulation area to increase the gross exhaust gas of exhaust pipe 6.
Again in specific coating technique, after substrate 2 is placed in chuck 12, first exhaust fan 4 can be removed, and pass through drop
Jiao Zui drips glue on 2 surface of substrate, and the drop Jiao Zui usually regulating valves with control rubber quality and resorption function accurately control glue amount
With prevent residue glue from dripping.While dripping glue, motor 3 can be in low speed rotation so that photoresist is covered with the big portion of 2 upper surface of substrate
Subregion.
Drop Jiao Zui can be removed later, above-mentioned outer cover 8 and exhaust fan 4 are moved to preset position, to be carried out to substrate 2
Blowing.The high speed rotation of the meeting of motor 3 at this time, to sprawl the photoresist on 2 surface of substrate.The air-flow in scrap rubber bowl 5 can be to substrate 2 at this time
The thickness and form of the photoresist on surface play the role of conclusive, pass through above-mentioned flow probe 9,10 and of the first controller
Second controller 11 may be implemented to accurately control air-flow in scrap rubber bowl 5, inclined to prevent the air-flow in scrap rubber bowl 5 from occurring
Difference.
After high speed whirl coating, motor 3 can drive substrate 2 to rotate with lower rotating speed, make the solvent in photoresist abundant
Volatilization, ensures the stability of subsequent technique.Above-mentioned flow probe 9, the first controller 10 and second controller 11 can be after simultaneously
Continuous work makes photoresist edge heap to provide lasting radial air flow on 2 surface of substrate by exhaust fan 4 and extractor fan 7
Long-pending region minimizes.
A kind of photoresist spinner that the embodiment of the present invention is provided is controlled by flow probe 9, the first controller 10 and second
Device 11 can be accurately controlled the air-flow in scrap rubber bowl 5, to ensure the minimum of 2 photomask surface glue of substrate accumulation；By upper
Stating air door 71 and wind turbine 72 can make above-mentioned photoresist spinner adapt to the spin coating proceeding of a variety of photoresists.
Each embodiment is described by the way of progressive in this specification, the highlights of each of the examples are with it is other
The difference of embodiment, just to refer each other for same or similar part between each embodiment.For being filled disclosed in embodiment
For setting, since it is corresponded to the methods disclosed in the examples, so description is fairly simple, related place is referring to method part
Explanation.
Professional further appreciates that, unit described in conjunction with the examples disclosed in the embodiments of the present disclosure
And algorithm steps, can be realized with electronic hardware, computer software, or a combination of the two, in order to clearly demonstrate hardware and
The interchangeability of software generally describes each exemplary composition and step according to function in the above description.These
Function is implemented in hardware or software actually, depends on the specific application and design constraint of technical solution.Profession
Technical staff can use different methods to achieve the described function each specific application, but this realization is not answered
Think beyond the scope of this invention.
The step of method described in conjunction with the examples disclosed in this document or algorithm, can directly be held with hardware, processor
The combination of capable software module or the two is implemented.Software module can be placed in random access memory (RAM), memory, read-only deposit
Reservoir (ROM), electrically programmable ROM, electrically erasable ROM, register, hard disk, moveable magnetic disc, CD-ROM or technology
In any other form of storage medium well known in field.
Finally, it is to be noted that, herein, relational terms such as first and second and the like be used merely to by
One entity or operation are distinguished with another entity or operation, without necessarily requiring or implying these entities or operation
Between there are any actual relationship or orders.Moreover, the terms "include", "comprise" or its any other variant meaning
Covering non-exclusive inclusion, so that the process, method, article or equipment including a series of elements includes not only that
A little elements, but also include other elements that are not explicitly listed, or further include for this process, method, article or
The intrinsic element of equipment.In the absence of more restrictions, the element limited by sentence "including a ...", is not arranged
Except there is also other identical elements in the process, method, article or apparatus that includes the element.
A kind of photoresist spinner provided by the present invention is described in detail above.Specific case used herein is to this
The principle and embodiment of invention is expounded, the explanation of above example is only intended to help understand the present invention method and
Its core concept.It should be pointed out that for those skilled in the art, in the premise for not departing from the principle of the invention
Under, it can be with several improvements and modifications are made to the present invention, these improvement and modification also fall into the protection of the claims in the present invention
In range.
Claims (10)
1. a kind of photoresist spinner, which is characterized in that include the gluing platform for placing substrate, motor and exhaust fan；
The motor is fixedly connected with the gluing platform, and the motor is for driving the gluing platform flat along the gluing
The circumferential direction of platform rotates；The exhaust fan is located above the gluing platform, and the air outlet of the exhaust fan is described in
Gluing platform.
2. photoresist spinner according to claim 1, which is characterized in that the exhaust fan is being located at the gluing Platform center just
Top.
3. photoresist spinner according to claim 1, which is characterized in that the gluing platform includes being fixedly connected with the motor
Photoresist spinner pedestal, and be located at the photoresist spinner base upper surface, and the chuck being fixedly connected with the photoresist spinner pedestal, institute
Chuck is stated for fixing the substrate.
4. photoresist spinner according to claim 3, which is characterized in that the chuck has a groove for accommodating the substrate,
And the depth of the groove is not more than the thickness of the substrate.
5. according to the photoresist spinner described in any one of Claims 1-4 claim, which is characterized in that the photoresist spinner further includes
Scrap rubber bowl, exhaust pipe and extractor fan；
The gluing platform is located in the inner cavity of the scrap rubber bowl, and the scrap rubber bowl inner wall has at least one first through hole, institute
The air intake vent for stating exhaust pipe is connected with the first through hole, and the air outlet of the exhaust pipe is provided with the extractor fan, institute
Extractor fan is stated for detaching air from the air outlet.
6. photoresist spinner according to claim 5, which is characterized in that the photoresist spinner further includes being located at the scrap rubber bowl to be open
The outer cover at place, the outer cover between the gluing platform and the exhaust fan, in the outer cover be located at the exhaust fan and
The opposed area of the gluing platform is provided with the second through-hole.
7. photoresist spinner according to claim 5, which is characterized in that the scrap rubber bowl inner wall has multiple described first to lead to
Hole, multiple first through hole are uniformly distributed around the gluing platform.
8. photoresist spinner according to claim 5, which is characterized in that the photoresist spinner further includes capacity control assembly, institute
It includes flow probe, the first controller and second controller to state capacity control assembly；
The flow probe is used to measure the capacity in the scrap rubber bowl；First controller is connected with the exhaust fan
It connects, first controller is used to control the power of the exhaust fan according to the capacity；The second controller with it is described
Extractor fan is connected, and the second controller is used to control the power of the extractor fan according to the capacity.
9. photoresist spinner according to claim 8, which is characterized in that the extractor fan includes the wind positioned at the air outlet
Door and the wind turbine for detaching air from the air outlet.
10. photoresist spinner according to claim 9, which is characterized in that the second controller includes being connect with the air door
The first sub-controller and the second sub-controller for being connect with the wind turbine；
First sub-controller is used for according to the capacity by controlling the linear drive apparatus of the air door to control
State the stroke of air door；Second sub-controller is used to control the power of the wind turbine according to outer signals.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810892007.7A CN108745803A (en) | 2018-08-07 | 2018-08-07 | A kind of photoresist spinner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810892007.7A CN108745803A (en) | 2018-08-07 | 2018-08-07 | A kind of photoresist spinner |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108745803A true CN108745803A (en) | 2018-11-06 |
Family
ID=63969094
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810892007.7A Pending CN108745803A (en) | 2018-08-07 | 2018-08-07 | A kind of photoresist spinner |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108745803A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110007380A (en) * | 2019-04-25 | 2019-07-12 | 李翠荣 | The manufacturing method of optical mirror slip |
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| JPH0938564A (en) * | 1995-05-24 | 1997-02-10 | Tokyo Electron Ltd | Resist coating apparatus |
| JPH11144330A (en) * | 1997-11-06 | 1999-05-28 | Ricoh Co Ltd | Optical master disk and method and device for coating photoresist |
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| US6716285B1 (en) * | 2002-10-23 | 2004-04-06 | The United States Of America As Represented By The Secretary Of The Air Force | Spin coating of substrate with chemical |
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| CN110007380A (en) * | 2019-04-25 | 2019-07-12 | 李翠荣 | The manufacturing method of optical mirror slip |
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