CN108693707A - Black-colored photosensitive resin composition and the display device manufactured using it - Google Patents

Black-colored photosensitive resin composition and the display device manufactured using it Download PDF

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Publication number
CN108693707A
CN108693707A CN201810159216.0A CN201810159216A CN108693707A CN 108693707 A CN108693707 A CN 108693707A CN 201810159216 A CN201810159216 A CN 201810159216A CN 108693707 A CN108693707 A CN 108693707A
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alkyl
phenyl
interposed therebetween
halogen
black
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朴颂基
金勋植
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Optical Filters (AREA)
  • Graft Or Block Polymers (AREA)
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Abstract

The display device for including the black-colored photosensitive resin composition of one or more of compound selected from chemical formula 1 the present invention relates to its Photoepolymerizationinitiater initiater and being manufactured using it.The black-colored photosensitive resin composition of the present invention has the following advantages that:When manufacturing organic light-emitting display device, during high pressure is deposited the dissolution of the fatal exhaust gas composition of driving for organic illuminating element can be reduced.In addition, having the advantages that contrast and brightness are excellent using the display device of the black-colored photosensitive resin composition manufacture of the present invention.

Description

Black-colored photosensitive resin composition and the display device manufactured using it
Technical field
The display device manufactured the present invention relates to black-colored photosensitive resin composition and using it.
Background technology
As one of panel display apparatus organic light-emitting display device be emissive type, therefore with liquid crystal display device phase Than angle of visibility, contrast etc. are excellent, can be light and thin type due to not needing backlight, also advantageous in terms of power consumption. In addition, DC low-voltage driving can be carried out, fast response time, since whole elements of composition are solid, resistance to external impact, Not only use temperature range is wide, but also also has the advantages that in terms of manufacturing expense cheap.
Particularly, the manufacturing process of organic light-emitting display device and liquid crystal display device, PDP (plasma display panel) Difference by being formed repeatedly with encapsulating process for vapor deposition/etching work procedure, therefore has the advantages that process is very simple.
Such organic light-emitting display device includes the boundary between dividing each pixel and the pixel of their insulation is made to define Film (PDL, Pixel Defined Layer) layer and defined in above-mentioned pixel film lower flat formed and special with insulation The planarization layer of property.At this point, above-mentioned pixel defines film layer by photo-mask process by accurate pattern.
KR published patent the 2015-0072581st is related to OLED display photosensitive polymer combination, it includes By at least one siloxanes (SiO3/2) polysiloxanes that links repeatedly, it discloses the following contents:Above-mentioned photoresist group Closing object can use as planarization layer, which divides the boundary between each pixel of OLED display and make them The PDL layers of insulation and formed in above-mentioned PDL layers of lower flat and have insulation characterisitic.
But above-mentioned photosensitive polymer combination is transparent composition, therefore in the case of external bright position, comparison Degree is poor, and the cathode plane of organic illuminating element is made of the excellent metal of reflectivity, therefore there are the following problems:It has been externally entering The light of the inside of machine light-emitting component is mixed in the cathode plane reflection of organic illuminating element with the light come out from luminescent layer.
In order to solve above-mentioned this problem, present almost all of organic illuminating element passes through in the lower part of transparent substrate Circular polarizer is formed, to reduce the reflection for the external incident light that cathode generates.That is, using above-mentioned circular polarizer, in outside When light incidence, its half is blocked, remaining half is blocked when cathode reflects, so as to inhibit exterior light to cause Contrast reduction.
But the previous organic illuminating element on the transparent substrate adhering to circular polarizer makes cathode generate as described above The reflection of external incident light while significantly reduce, or even the photoresist dissipated from organic luminous layer to outside is broken, therefore Although there is a problem of that contrast improves but brightness reduces problem 50% or more and that cost requirements are high.
Therefore, to solve the above-mentioned problems, the black picture that external incident light is absorbed and contrast is made to improve can be formed Element defines film.Black picture element defines film by photo-mask process by accurate pattern, it is desirable that in the picture for making organic illuminating element The fatal exhaust gas composition of the driving to element, which should not dissolve out aspect, in the high pressure vapor deposition process of element has reliability.
But in the case of the BM (black matrix) used in previous liquid crystal display device photosensitive polymer combinations, The fatal exhaust gas composition of the driving to organic illuminating element is molten in making the high pressure of pixel of organic illuminating element vapor deposition process Go out, therefore there are problems that brightness reduces or even cannot carry out the driving of organic illuminating element.
Therefore, when manufacturing organic light-emitting display device, it is desirable that study following photosensitive polymer combinations:It will be high The dissolution of the fatal exhaust gas composition of driving of organic illuminating element is minimized during pressure vapor deposition, can be manufactured with excellent The organic light-emitting display device of contrast and brightness.
Existing technical literature
Patent document
(patent document 1) KR published patent the 2015-0072581st (2015.06.30.)
Invention content
The subject that the invention solves
The purpose of the present invention is to provide black-colored photosensitive resin compositions, when manufacturing organic light-emitting display device, The dissolution of the fatal exhaust gas composition of driving of organic illuminating element is reduced during high pressure can be made to be deposited, outside can be absorbed Incident light and so that contrast and brightness is improved.
In addition, the purpose of the present invention is to provide defined comprising the pixel that above-mentioned black-colored photosensitive resin composition is utilized The display device of film.
Means for solving the problems
Black-colored photosensitive resin composition of the present invention for achieving the above object, which is characterized in that photopolymerization Initiator includes one or more of the compound selected from following chemical formulas 1.
[Chemical formula 1]
In addition, the present invention provides the display device for defining film comprising pixel, it includes above-mentioned black sense which, which defines film, The solidfied material of photosensitive resin composition.
The effect of invention
The black-colored photosensitive resin composition of the present invention can be in organic illuminating element or the picture of quantum dot light emitting element Element defines to be used in the formation of film, is had the following advantages that:Include organic illuminating element or quantum dot light emitting element in manufacture When display device, it can reduce fatal to the driving of organic illuminating element or quantum dot light emitting element during high pressure is deposited The dissolution of exhaust gas composition.
Therefore, including defining the organic light emission member of film using the pixel of the black-colored photosensitive resin composition manufacture of the present invention Part, quantum dot light emitting element and display device comprising above-mentioned organic illuminating element or quantum dot light emitting element have brightness, The excellent advantage such as driven nature and durability.
Specific implementation mode
The present invention is explained in detail below.
Include not only the feelings that certain component connects with another component when certain component is located at another component "upper" in the present invention Shape, is also contained between two components that there is also the situations of other components.
In the present invention, when certain part "comprising" inscape, as long as without particularly opposite record, it means that can Also include other inscapes with being not excluded for other inscapes.
< black-colored photosensitive resin compositions >
One embodiment of the present invention is related to black-colored photosensitive resin composition, and which contain toner, binder resin, light Polymerizable compound, Photoepolymerizationinitiater initiater and solvent, above-mentioned Photoepolymerizationinitiater initiater include to be selected to be indicated by following chemical formulas 1 One or more of compound.Preferably, black-colored photosensitive resin composition of the invention can be used in organic illuminating element or The pixel of quantum dot light emitting element defines the formation of film.
&#91;Chemical formula 1&#93;
In above-mentioned chemical formula 1,
R1,R2,R3,R4Independently of one another hydrogen, C1-C20Alkyl, OR15, halogen or NO2;
Or R1And R2,R2And R3,R3And R4It is together independently of each otherAccompanying by them Carbon atom form 6 membered rings together;
R11,R12,R13,R14Independently of one another hydrogen, it is unsubstituted or by 1 or more halogen, phenyl, CN, OH, SH, C1-C4Alkoxy, (CO) OH replace or by (CO) O (C1-C4Alkyl) substitution C1-C20Alkyl;
Or R11,R12,R13,R14Independently of one another unsubstituted phenyl or by 1 or more C1-C6Alkyl, halogen Element, CN, OR15Or by NR17R18Substituted phenyl;
Or R11,R12,R13,R14Independently of one another halogen, CN, OR15,SR16,SOR16,SO2R16Or NR17R18, wherein Substituent group OR15,SR16Or NR17R18Arbitrarily pass through group R together with 1 in the carbon atom of naphthalene ring15,R16,R17And/or R18Form 5- membered rings or 6- membered rings;
R5It is unsubstituted or by 1 or more halogen, R15,COOR15,OR15,SR16,CONR17R18,NR17R18Substitution C1-C20Alkyl;
Or R5For 1 or more O, S, SO, SO2,NR23Or the C that CO is interposed therebetween2-C20Alkyl, or to be not inserted into Or 1 or more O, CO or NR23The C being interposed therebetween2-C12Alkenyl,
Wherein, the C being inserted into2-C20Alkyl and the C for being not inserted into or being inserted into2-C12Alkenyl it is unsubstituted or by 1 or more halogen substitution;
Or R5For C4-C8Cycloalkenyl group, C2-C12It alkynyl or is not inserted into or 1 or more O, S, CO or NR23It is inserted into it Between C3-C10Naphthenic base;
Or R5For phenyl or naphthyl, each is unsubstituted or by 1 or more OR15,SR16,NR17R18, COR22,CN,NO2, halogen, C1-C20Alkyl, C1-C4Halogenated alkyl, 1 or more O, S, CO or NR23The C being interposed therebetween2-C20 Alkyl replaces or each is by C3-C10Naphthenic base or by 1 or more O, S, CO or NR24The C being interposed therebetween3-C10Ring Alkyl replaces;
R6,R7,R8,R9,R10For hydrogen, phenyl-C1-C3Alkyl, it is unsubstituted or by 1 or more halogen, OH, SH, CN, C3-C6Alkenyloxy group, OCH2CH2CN,OCH2CH2(CO)O(C1-C4Alkyl), O (CO)-(C1-C4Alkyl), O (CO)-(C2-C4) alkene Base, O (CO)-phenyl, (CO) OH, (CO) O (C1-C4Alkyl), C3-C20Naphthenic base, SO2-(C1-C4Halogenated alkyl), O (C1-C4Halogen Substituted alkyl) or the C that is interposed therebetween by 1 or more O3-C20The C of naphthenic base substitution1-C20Alkyl;
Or R6,R7,R8,R9,R10For 1 or more O, S or NR24The C being interposed therebetween2-C20Alkyl;
Or R6,R7,R8,R9,R10For (CH2CH2O)n+1H,(CH2CH2O)n(CO)-(C1-C8Alkyl), C1-C8Alkanoyl, C2-C12Alkenyl, C3-C6It enoyl- or is not inserted into or 1 or more O, S, CO or NR23The C being interposed therebetween3-C20Cycloalkanes Base;
Or R6,R7,R8,R9,R10For the C being not inserted into or 1 or more O is interposed therebetween1-C8Alkyl-C3-C10Cycloalkanes Base;
Or R6,R7,R8,R9,R10It is unsubstituted or by 1 or more C1-C6Alkyl, halogen, OH or C1-C3Alcoxyl The benzoyl of base substitution;
Or R6,R7,R8,R9,R10For phenyl, naphthalene or C3-C20Heteroaryl, each it is unsubstituted or by 1 with On halogen, OH, C1-C12Alkyl, C1-C12Alkoxy, CN, NO2, phenyl-C1-C3Alkoxy, phenoxy group, C1-C12Alkyl sulfane Base, Phenylsulfanyl, N (C1-C12Alkyl)2, diphenyl amino substitution;
R15For hydrogen, phenyl-C1-C3It is alkyl, unsubstituted or by 1 or more halogen, OH, SH, CN, C3-C6Alkene oxygen Base, OCH2CH2CN,OCH2CH2(CO)O(C1-C4Alkyl), O (CO)-(C1-C4Alkyl), O (CO)-(C2-C4) alkenyl, O (CO)- Phenyl, (CO) OH, (CO) O (C1-C4Alkyl), C3-C20Naphthenic base, SO2-(C1-C4Halogenated alkyl), O (C1-C4Halogenated alkyl) or The C that person is interposed therebetween by 1 or more O3-C20The C of naphthenic base substitution1-C20Alkyl;
Or R15For 1 or more O, S or NR23The C being interposed therebetween2-C20Alkyl;
Or R15For (CH2CH2O)n+1H,(CH2CH2O)n(CO)-(C1-C8Alkyl), C1-C8Alkanoyl, C2-C12Alkenyl, C3-C6It enoyl- or is not inserted into or 1 or more O, S, CO or NR23The C being interposed therebetween3-C20Naphthenic base;
Or R15For the C being not inserted into or 1 or more O is interposed therebetween1-C8Alkyl-C3-C10Naphthenic base;
Or R15It is unsubstituted or by 1 or more C1-C6Alkyl, halogen, OH or C1-C3The benzene of alkoxy substitution Formoxyl;
Or R15For phenyl, naphthalene or C3-C20Heteroaryl, each it is unsubstituted or by 1 or more halogen, OH,C1-C12Alkyl, C1-C12Alkoxy, CN, NO2, phenyl-C1-C3Alkoxy, phenoxy group, C1-C12Alkyl alkylthio base, phenyl sulphur Alkyl, N (C1-C12Alkyl)2, diphenyl amino orSubstitution;
R16For hydrogen, C2-C12Alkenyl, C3-C20Naphthenic base or phenyl-C1-C3Alkyl, wherein C2-C12Alkenyl, C3-C20Cycloalkanes Base or phenyl-C1-C3Alkyl is not inserted into or 1 or more O, S, CO, NR23Or COOR15It is interposed therebetween;
Or R16It is unsubstituted or by 1 or more OH, SH, CN, C3-C6Alkenyloxy group, OCH2CH2CN,OCH2CH2 (CO)O(C1-C4Alkyl), O (CO)-(C2-C4) alkenyl, O (CO)-(C1-C4Alkyl), O (CO)-phenyl or (CO) OR15Substitution C1-C20Alkyl;
Or R16For 1 or more O, S, CO, NR23Or COOR15The C being interposed therebetween2-C20Alkyl;
Or R16For (CH2CH2O)nH,(CH2CH2O)n(CO)-(C1-C8Alkyl), C2-C8Alkanoyl or C3-C6Enoyl-;
Or R16It is unsubstituted or by 1 or more C1-C6Alkyl, halogen, OH, C1-C4Alkoxy or C1-C4Alkyl The benzoyl of sulfanyl substitution;
Or R16For phenyl, naphthalene or C3-C20Heteroaryl, each it is unsubstituted or by 1 or more halogen, C1-C12Alkyl, C1-C4Halogenated alkyl, C1-C12Alkoxy, CN, NO2, phenyl-C1-C3Alkoxy, phenoxy group, C1-C12Alkyl sulfide Alkyl, Phenylsulfanyl, N (C1-C12Alkyl)2, diphenyl amino, (CO) O (C1-C8Alkyl), (CO)-C1-C8Alkyl, (CO) N (C1-C8Alkyl)2OrSubstitution;
R17And R18Independently of one another hydrogen, C1-C20Alkyl, C2-C4Hydroxy alkyl, C2-C10Alkoxyalkyl, C2-C5Alkene Base, C3-C20Naphthenic base, phenyl-C1-C3Alkyl, C1-C8Alkanoyl, C1-C8Alkanoyloxy, C3-C12Enoyl-, SO2-(C1-C4Halogen Substituted alkyl) or benzoyl;
Or R17And R18For phenyl, naphthalene or C3-C20Heteroaryl, each are unsubstituted or by 1 or more halogen Element, C1-C4Halogenated alkyl, C1-C20Alkoxy, C1-C12Alkyl, benzoyl or C1-C12Alkoxy replaces;
Or R17And R18It is not inserted into or O, S or NR with being formed together with the N- atoms accompanying by them15It is interposed therebetween 5- or 6- members are saturated or unsaturation ring, and above-mentioned 5- or 6- members saturation or unsaturation ring are unsubstituted or by 1 or more C1-C20 Alkyl, C1-C20Alkoxy ,=O, OR15,SR16,NR19R20,(CO)R21,NO2, halogen, C1-C4Halogenated alkyl, CN, phenyl take In generation, is not inserted into or 1 or more O, S, CO or NR15The C being interposed therebetween3-C20Naphthenic base replaces;
Or R17And R18It is unsubstituted or by 1 or more C with being formed together with the N- atoms accompanying by them1-C20Alkane Base, C1-C4Halogenated alkyl, C1-C20Alkoxy ,=O, OR15,SR16,NR19R20,(CO)R21, halogen, NO2, CN, phenyl or by It is not inserted into or 1 or more O, S, CO or NR15The C being interposed therebetween3-C20The heteroaromatic ring system of naphthenic base substitution;
R19And R20Independently of one another hydrogen, C1-C20Alkyl, C1-C4Halogenated alkyl, C3-C10Naphthenic base or phenyl;
Or R19And R20It is not inserted into or O, S or NR with being formed together with the N- atoms accompanying by them23It is interposed therebetween 5- or 6- members are saturated or unsaturation ring, and above-mentioned 5- or 6- members saturation or unsaturation ring are not condensed or phenyl ring made to condense in above-mentioned 5- or 6- members are saturated or unsaturation ring;
R21For hydrogen, OH, C1-C20Alkyl, C1-C4Halogenated alkyl is not inserted into or 1 or more O, CO or NR24It is inserted into C therebetween2-C20Alkyl is not inserted into or O, S, CO or NR24The C being interposed therebetween3-C20Naphthenic base,
Or R21For phenyl, naphthalene, phenyl-C1-C4Alkyl, OR15,SR16Or NR19R20;
R22For C6-C20Aryl or C3-C20Heteroaryl, each are unsubstituted or by 1 or more phenyl, halogen Element, C1-C4Halogenated alkyl, CN, NO2,OR15,SR16,NR17R18Or by 1 or more O, S or NR23The C being interposed therebetween1-C20 Either each is unsubstituted or by 1 or more halogen, COOR for alkyl substitution15,CONR17R18, phenyl, C3-C8Cycloalkanes Base, C3-C20Heteroaryl, C6-C20Aryloxycarbonyl, C3-C20Heteroaryloxycarbonyl, OR15,SR16Or NR17R181 or more of substitution C1-C20Alkyl replaces;
Or R22For hydrogen, unsubstituted or by 1 or more halogen, phenyl, OH, SH, CN, C3-C6Alkenyloxy group, OCH2CH2CN,OCH2CH2(CO)O(C1-C4Alkyl), O (CO)-(C1-C4Alkyl), O (CO)-phenyl, (CO) OH or (CO) O (C1- C4Alkyl) substitution C1-C20Alkyl;
Or R22For 1 or more O, S or NR24The C being interposed therebetween2-C12Alkyl;
Or R22For (CH2CH2O)n+1H,(CH2CH2O)n(CO)-(C1-C8Alkyl), C2-C12Alkenyl or C3-C8Naphthenic base;
Or R22For by SR16Substituted phenyl, wherein group R16It indicates for COR22Carbazole moiety accompanying by base Phenyl or naphthyl ring is bound directly;
N is 1-20;
R23For hydrogen, C1-C20Alkyl, C1-C4The C that halogenated alkyl, 1 or more O or CO are interposed therebetween2-C20Alkyl, or For phenyl-C1-C4Alkyl is not inserted into or C that 1 or more O or CO is interposed therebetween3-C8Naphthenic base, or be (CO) R17, Or it is unsubstituted or by 1 or more C1-C20Alkyl, halogen, C1-C4Halogenated alkyl, OR15,SR16,NR17R18OrSubstituted phenyl;
R24For hydrogen, C1-C20Alkyl, C1-C4The C that halogenated alkyl, 1 or more O or CO are interposed therebetween2-C20Alkyl, or For phenyl-C1-C4Alkyl is not inserted into or C that 1 or more O or CO is interposed therebetween3-C8Naphthenic base, or be (CO) R17, It is either unsubstituted or by 1 or more C1-C20Alkyl, halogen, C1-C4Halogenated alkyl, OR15,SR16,NR17R18OrSubstituted phenyl.
Above-mentioned Photoepolymerizationinitiater initiater preferably comprises R in above-mentioned chemical formula 11,R2,R3,R4Independently of one another hydrogen, C1-C20Alkane Base, OR15, halogen or NO2Compound.
Above-mentioned Photoepolymerizationinitiater initiater preferably comprises R in above-mentioned chemical formula1And R2,R2And R3,R3And R4Independently of each other together ForWith the compound for forming 6- membered rings together with the carbon atom accompanying by them.
Above-mentioned Photoepolymerizationinitiater initiater preferably comprises:R in above-mentioned chemical formula 11,R2,R3,R4Independently of one another hydrogen, C1-C20 Alkyl, OR15, halogen or NO2Compound;And R1And R2,R2And R3,R3And R4It is together independently of each otherWith the compound for forming 6- membered rings together with the carbon atom accompanying by them.
Total weight of such Photoepolymerizationinitiater initiater relative to black-colored photosensitive resin composition, can be with 0.01~10 weight It measures % to use, preferably be used with 0.01~5 weight %.Such content range is the photopolymerization for considering photopolymerizable compound Speed and the physical property of finally obtained film and determination, if less than above range, polymerization speed is low, therefore whole works The sequence time can extend, and in the case of being more than above range on the contrary, due to excessive reaction, the physical property of film can reduce instead, because This is preferably suitably used within the above range.
In turn, black-colored photosensitive resin composition of the invention can further include photopolymerization initiation adjuvant, preferably The compound of one or more of compound selected from amine compound and carboxylic serials can be caused adjuvant by ground for photopolymerization.
Above-mentioned amine compound aliphatic amine such as can enumerate triethanolamine, methyl diethanolamine and triisopropanolamine Compound;4- dimethylaminobenzoic acids methyl esters, ethyl 4-dimethylaminobenzoate, 4- dimethylaminobenzoic acid isoamyls Ester, 4- dimethylaminobenzoic acid 2- ethylhexyls, benzoic acid 2- dimethylamino ethyl esters, N, N- dimethyl-p-toluidines, 4, 4 '-bis- (dimethylamino) benzophenone and 4, aromatic amines compounds such as 4 '-bis- (diethylamino) benzophenone etc., wherein Optimization aromatic amine compounds.
Above-mentioned carboxylic acid based compound can for example enumerate thiophenyl acetic acid, methylphenyl-sulfanyl acetic acid, ethylthiophenyl acetic acid, Methylethyl thiophenyl acetic acid, dimethyl benzene sulfenyl acetic acid, Methoxv-phenylsulfanvl acetic acid, dimethoxyphenylthio acetic acid, chlorobenzene Sulfenyl acetic acid, dichloro thiophenyl acetic acid, N-phenylglycine, phenoxyethanoic acid, naphthalene sulfenyl acetic acid, N- naphthalenes glycine and naphthalene oxygen Miscellaneous acetate type of the aromatic series such as base acetic acid etc..
In the case of causing adjuvant using these photopolymerization, it is equivalent to 1 mole of Photoepolymerizationinitiater initiater, is rubbed usually using 10 You in the range of 0.01~5 mole hereinafter, it is preferred that use.If in above-mentioned range, black-colored photosensitive resin combination The sensitivity of object further increases, and there is the pixel formed using the composition and defines the productivity Ti Gao Pour of film to therefore excellent Choosing.
In one embodiment of the black-colored photosensitive resin composition of the present invention, black-colored photosensitive resin composition also includes Ingredient selected from one or more of colorant, binder resin, photopolymerizable compound, solvent and additive.Below to these Ingredient specifically describes.
Colorant
The colorant used in the present invention can include a kind in black pigment or dyestuff and organic pigment or dyestuff More than.
The colorant used in the present invention can be that its own is black as black pigment or dyestuff, and also including will be more Kind pigments or dyes mix and obtain the situation of black.As long as there are light-proofness in luminous ray for colorant, then and especially limit System.
As above-mentioned black pigment, well known black pigment is can be used without special restrictions, specifically, benzene can be used Amido black, lactams be black, black, carbon black, chromium oxide, iron oxide and titanium are black etc., these can a kind be used alone or by 2 kinds Use to combination of the above.As above-mentioned carbon black, channel black, furnace black, pyrolytic carbon black, lampblack etc. can be enumerated.
If necessary, for electrical insulating property, can use makes resin-coated carbon black on surface.It is above-mentioned resin-coated Carbon black there is no coating carbon black with resin compared with, electric conductivity is low, therefore with when black matrix or pixel define the formation of film The advantages of excellent electrical insulating property can be assigned.
With regard to used in colorant black pigment or dyestuff and organic pigment or dyestuff for, can be suitble to pixel circle The mode of the characteristic required by film is determined to adjust content.Above-mentioned colorant is relative to above-mentioned black-colored photosensitive resin composition entirety 100 weight % can contain 1~50 weight %, preferably comprise 5~40 weight %.Colorant content less than above range In the case of, light-proofness is insufficient, and in the case larger than the above-mentioned range, the quality of the pattern obtained after patterning is possible to drop It is low.
Black-colored photosensitive resin composition of the present invention in addition to this, can further include and lead in this field One or more of binder resin, photopolymerizable compound, solvent and additive used in often.
Binder resin
In one embodiment of the present invention, binder resin can include to pass through the compound containing following chemical formulas 2 The copolymer that the copolyreaction of (hereinafter referred to as A1) obtains.
&#91;Chemical formula 2&#93;
In above-mentioned chemical formula 2,
R25For hydrogen atom;Or it is optionally substituted by a hydroxyl group or unsubstituted C1~C4Alkyl,
R26For singly-bound;Or with or without heteroatomic C1~C20Aliphatic or aromatic hydrocarbyl.
In the present invention, abovementioned alkyl can be straight chain or branched chain, such as can be methyl, ethyl, n-propyl, isopropyl Base, normal-butyl, isobutyl group, tertiary butyl, sec-butyl, but it is not limited to these.
In the present invention, hetero atom can be selected from N, O and S.
In the present invention, aliphatic alkyl can include linear aliphatic hydrocarbon groups and branch's chain aliphatic hydrocarbon rest, saturated fat The whole of race's alkyl and unsaturated fatty hydrocarbons base.Such as there is methyl, ethyl, n-propyl, isopropyl, normal-butyl, sec-butyl, different The alkyl such as butyl, tertiary butyl, amyl, hexyl;The such alkenyl with double bond of styryl;With as acetenyl have three The alkynyl of key, but not only it is defined in this.
In the present invention, aromatic hydrocarbyl monocyclic aromatic ring such as having phenyl, xenyl, terphenyl and naphthalene, Polycycles aromatic ring such as anthryl, pyrenyl, base etc., but not only it is defined in this.
In another embodiment of the present invention, binder resin can include copolymer, which passes through comprising above-mentioned The compound (A1) of chemical formula 2 and also include selected from the monomer (hereinafter referred to as A2) containing unsaturated carboxylic acid and can be with above-mentionedization The compound (A1) of formula 2 and containing unsaturated carboxylic acid monomer (A2) copolymerization the compound with unsaturated bond (hereinafter referred to as For A3) one or more of obtained using copolyreaction.
The structure list derived from above-mentioned (A1) of whole molal quantitys of structural unit relative to above-mentioned binder resin (A) The ratio of member is preferably 20~90 moles of %, can more preferably contain 40~70 moles of %.Containing above-mentioned less than 20 moles of % (B1) in the case of, exhaust yield is made to reduce not sufficiently effective, more than 90 moles of %, for the molten of developer solution Xie Du is reduced, and leads to the problem of the formation difficulty of pattern, therefore not preferably.
In the case of containing above-mentioned (A2) in above-mentioned binder resin (A), the knot relative to above-mentioned binder resin (A) The ratio of structural unit derived from above-mentioned (A2) of total molal quantity of structure unit is preferably more than 0 and 70 mole of % or less. In the case of containing above-mentioned (A3) in above-mentioned binder resin (A), structural unit relative to above-mentioned binder resin (A) The ratio of structural unit derived from above-mentioned (A3) of total molal quantity is preferably more than 0 and 70 mole of % or less.In above-mentioned model Containing in the case of above-mentioned (A2) and (A3) in enclosing, the solubility of developer solution is increased, it is readily excellent to have figuratum formation Point, therefore preferably.
Above-mentioned binder resin (A) means to have the function of based on light, the reactivity of heat and alkali-solubility, as with The decentralized medium of solid constituent headed by toner plays a role, and plays the function of binding resin.
As the above-mentioned unsaturated monomer (A2) containing carboxyl, such as unsaturated monocarboxylic, unsaturated dicarboxyl can be enumerated The unsaturated carboxylic acid etc. in the molecule with 1 or more carboxyl such as acid, unsaturated tricarboxylic acids.
As above-mentioned unsaturated monocarboxylic, for example, can enumerate acrylic acid, methacrylic acid, crotonic acid, α-chloroacrylic acid, Cinnamic acid etc..
As above-mentioned unsaturated dicarboxylic, such as maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid can be enumerated Deng.
Above-mentioned unsaturation polybasic carboxylic acid, which can be acid anhydrides, specifically can enumerate maleic anhydride, itaconic anhydride, citraconic anhydride Deng.In addition, above-mentioned unsaturation polybasic carboxylic acid can be its single (2- methacryloxyalkyls) ester, such as amber can be enumerated Sour single (2- acryloyl-oxyethyls) ester, mono succinate (2- methacryloxyethyls) ester, phthalic acid list (2- propylene Trimethylammonium) ester, phthalic acid list (2- methacryloxyethyls) ester etc..Above-mentioned unsaturation polybasic carboxylic acid can be it List (methyl) acrylate of two end dicarboxyl based polyalcohols, for example, can enumerate ω-carboxy-polycaprolactone mono acrylic ester, ω-carboxy-polycaprolactone monomethacrylates etc..
The above-mentioned monomer containing carboxyl can respectively be used alone or be used in mixed way two or more.
As the compound (A3) with unsaturated bond that can be copolymerized with above-mentioned (A1) and (A2), such as benzene second can be enumerated Alkene, α-methylstyrene, o- vinyltoluene, m- vinyltoluene, p- vinyltoluene, p- chlorostyrene, o- methoxy Base styrene, m- methoxy styrene, p-methoxystyrene, o- vinyl benzyl methyl ether, m- vinyl benzyl first Base ether, p- vinyl benzyl methyl ether, o- vinylbenzyl glycidyl base ether, m- vinylbenzyl glycidyl base ether, The aromatic ethenyl compounds such as p- vinylbenzyl glycidyl base ether, indenes;Methyl acrylate, methyl methacrylate, third Olefin(e) acid ethyl ester, ethyl methacrylate, n-propyl, n propyl methacrylate, isopropyl acrylate, methacrylic acid Isopropyl ester, n-butyl acrylate, n-BMA, isobutyl acrylate, Isobutyl methacrylate, acrylic acid Zhong Ding The secondary butyl ester of ester, methacrylic acid, tert-butyl acrylate, Tert-butyl Methacrylate, acrylic acid 2- hydroxy methacrylates, methacrylic acid 2- hydroxy methacrylates, acrylic acid 2- hydroxy propyl esters, methacrylic acid 2- hydroxy propyl esters, acrylic acid 3- hydroxy propyl esters, methacrylic acid 3- hydroxy propyl esters, acrylic acid 2- hydroxybutyls, methacrylic acid 2- hydroxybutyls, acrylic acid 3- hydroxybutyls, methacrylic acid 3- hydroxybutyls, acrylic acid 4- hydroxybutyls, methacrylic acid 4- hydroxybutyls, allyl acrylate, methacrylic acid allyl Ester, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, methyl-prop Olefin(e) acid phenyl ester, acrylic acid 2- methoxy acrylates, methacrylic acid 2- methoxy acrylates, acrylic acid 2- phenoxy ethyls, methyl-prop Olefin(e) acid 2- phenoxy ethyls, methoxyl group diethylene glycol (DEG) acrylate, methoxyl group diethylene glycol (DEG) methacrylate, methoxy triglycol third Olefin(e) acid ester, methoxy triglycol methacrylate, methoxypropylene glycol acrylate, methoxypropylene glycol methacrylic acid Ester, methoxyl group dipropylene glycol acrylate, methoxyl group dipropylene glycol methyl acrylate, isobornyl acrylate, metering system Sour isobornyl thiocyanoacetate, acrylic acid dicyclopentadienyl ester, methacrylic acid dicyclopentadienyl ester, acrylic acid 2- hydroxyl -3- phenoxy groups third The unsaturation carboxylic such as ester, methacrylic acid 2- hydroxyl -3- phenoxy-propyls, glycerol mono-acrylate, glycerin monomethyl acrylic ester Esters of gallic acid;Acrylic acid 2- amino ethyl esters, methacrylic acid 2- amino ethyl esters, acrylic acid 2- dimethylamino ethyl esters, metering system Sour 2- dimethylamino ethyl esters, acrylic acid 2- amino propyl ester, methacrylic acid 2- amino propyl ester, acrylic acid 2- dimethylaminos third Ester, methacrylic acid 2- dimethylaminos propyl ester, acrylic acid 3- amino propyl ester, methacrylic acid 3- amino propyl ester, acrylic acid 3- The unsaturated carboxylic acids aminoalkyl esters such as dimethylamino propyl ester, methacrylic acid 3- dimethylamino propyl ester;Acrylic acid shrinks The unsaturated carboxylic acids glycidol esters such as glyceride, glycidyl methacrylate;Vinylacetate, vinyl propionate, fourth The generating vinyl carboxylates esters such as vinyl acetate, vinyl benzoate;Vinyl methyl ether, vinyl ethyl ether, allyl glycidol The unsaturated ethers such as base ether;The vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloro-acrylonitrile, inclined cyano vinyl;Propylene Amide, Methacrylamide, α-chloroacrylamide, N-2- hydroxyethyl acrylamides, N-2- hydroxyethyl methacrylamides Equal unsaturated acyls amine;The unsaturated acyls imines such as maleimide, N-phenylmaleimide, N- N-cyclohexylmaleimides Class;The aliphatic conjugated dienes class such as 1,3- butadiene, isoprene, chlorobutadiene;With polystyrene, polymethyl acrylate, Polymethyl methacrylate, polyacrylic acid N-butyl, Vinalac 5920, polysiloxanes polymer molecular chain end Holding has the macromonomer class etc. of single acryloyl group or monomethacrylate acyl group.These monomers can respectively be used alone or Two or more is used in mixed way.
For above-mentioned binder resin (A), relative to total 100 weight % of black-colored photosensitive resin composition, energy Enough use 5~80 weight %, preferably 5~50 weight %.Such content is the solubility considered in many aspects for developer solution The range for being formed etc. and being selected with pattern, it is abundant for the dissolubility of developer solution within the above range in the case of use, therefore The formation of pattern is easy, and when development prevents the film of the pixel portion of exposure portion from reducing, and the deciduous of non-pixel portion becomes good.
In addition, in another embodiment of the present invention, binder resin can use generally to be made in the technical field Cardo systems resin.Above-mentioned Cardo systems resin specifically can be by bis- (4- hydroxy phenyls) sulfones, bis- (4- hydroxyls -3,5- bis- Aminomethyl phenyl) sulfone and bis- (4- hydroxyl -3,5- dichlorophenyls) sulfones, bis- (4- hydroxy phenyls) hexafluoropropane, bis- (4- hydroxyls -3,5- 3,5-dimethylphenyl) hexafluoropropane and bis- (4- hydroxyl -3,5- dichlorophenyls) hexafluoropropane, bis- (4- hydroxy phenyls) dimethyl-silicons It is alkane, bis- (4- hydroxyl -3,5- 3,5-dimethylphenyls) dimethylsilanes and bis- (4- hydroxyl -3,5- dichlorophenyls) dimethylsilanes, double (4- hydroxy phenyls) methane, bis- (4- hydroxyl -3,5- dichlorophenyls) methane and bis- (4- hydroxyl -3,5- dibromo phenyls) methane, 2, Bis- (4- hydroxyl -3,5- 3,5-dimethylphenyls) propane of bis- (4- hydroxy phenyls) propane of 2-, 2,2-, the bis- (4- hydroxyl -3,5- dichloros of 2,2- Phenyl) propane, bis- (the 4- hydroxy-3-methyls phenyl) propane of 2,2- and bis- (4- hydroxyl -3- chlorphenyls) propane of 2,2-, bis- (4- hydroxyls Base phenyl) ether, bis- (4- hydroxyl -3,5- 3,5-dimethylphenyls) ethers and bis- (4- hydroxyl -3,5- dichlorophenyls) ethers, bis- (the 4- hydroxyls of 9,9- Base phenyl) fluorenes, bis- (the 4- hydroxy-3-methyls phenyl) fluorenes of 9,9-, bis- (4- hydroxyl -3- chlorphenyls) fluorenes of 9,9-, bis- (the 4- hydroxyls of 9,9- Base -3- bromophenyls) fluorenes, bis- (4- hydroxyl -3- fluorophenyls) fluorenes of 9,9-, bis- (the 4- hydroxy 3-methoxybenzenes base) fluorenes of 9,9-, 9,9- be bis- Bis- (4- hydroxyl -3,5- dichlorophenyls) fluorenes of (4- hydroxyl -3,5- 3,5-dimethylphenyls) fluorenes, 9,9- and the bis- (4- hydroxyls -3,5- two of 9,9- Bromophenyl) fluorenes etc. obtains, and but not limited to this.
In the case that above-mentioned Cardo systems resin is used as binder resin, the content of binder resin is with the present invention Black-colored photosensitive resin composition feline amount on the basis of, 10~80 weight % preferably can be used, more preferably 10~70 weight % can be used in ground.In the case where the content of above-mentioned binder resin meets 10~80 weight % ranges, development The dissolubility of liquid is abundant, therefore the formation of pattern is easy, and when development prevents the film of the pixel portion of exposure portion from reducing, non-pixel portion The deciduous divided becomes good, therefore preferably.
Photopolymerizable compound
Photopolymerizable compound is not particularly limited, the polymerization selected from the unsaturated monomer containing carboxyl can be used The copolymer and combination thereof of object, the unsaturated monomer containing carboxyl and the monomer with unsaturated bond that can be copolymerized with it One or more of.
As the above-mentioned unsaturated monomer containing carboxyl, unsaturated monocarboxylic, unsaturated dicarboxylic, unsaturation three can be used Carboxylic acid etc..Specifically, as unsaturated monocarboxylic, such as acrylic acid, methacrylic acid, crotonic acid, α-chloropropene can be enumerated Acid, cinnamic acid etc..As unsaturated dicarboxylic, such as fumaric acid, mesaconic acid, itaconic acid, citraconic acid can be enumerated etc..It is unsaturated Polybasic carboxylic acid, which can be acid anhydrides, specifically can enumerate maleic anhydride, itaconic anhydride, citraconic anhydride etc..In addition, unsaturated polynary Carboxylic acid can be the list for the polymer that two ends such as ω-carboxy-polycaprolactone list (methyl) acrylate have carboxyl and hydroxyl (methyl) esters of acrylic acid, monomethyl maleic acid, 5- norbornene -2- carboxylic acids, the mono- 2- of phthalic acid ((methyl) acryloyls Oxygroup) ethyl ester, mono succinate -2- ((methyl) acryloxy) ethyl ester salt etc..These have the compound energy of unsaturated carboxyl It is enough to be respectively used alone or two or more is applied in combination, wherein the copolyreaction of acrylic acid and methacrylic acid and right It is excellent in the dissolubility of developer solution, therefore can be it is preferable to use.
In addition, as the monomer that can be copolymerized with the unsaturated monomer containing carboxyl, usable aromatic ethenyl compound, Unsaturated carboxylic ester compound, unsaturated aminoalkylcarboxylate's compound, vinyl cyanide compound, unsaturated oxetanes Carboxylate compound etc., they can a kind be used alone or two or more be applied in combination.
Specifically, as above-mentioned copolymerizable monomer, styrene, α-methylstyrene, vinyltoluene etc. can be enumerated Aromatic ethenyl compound;Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, acrylic acid Butyl ester, butyl methacrylate, acrylic acid 2- hydroxy methacrylates, 2-hydroxyethyl methacrylate, benzyl acrylate, metering system The unsaturated carboxylic ester compounds such as acid benzyl ester;Unsaturation aminoalkylcarboxylate's compound such as acrylate;Methyl-prop The unsaturated carboxylic acids epihydric alcohol ester compound such as olefin(e) acid ethylene oxidic ester;The vinyl carboxylates such as vinyl acetate, vinyl propionate Compound;The vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloro-acrylonitrile;3- methyl -3- acryloyloxymethyl oxygen Azetidine, 3- methyl -3- methacryloxymethyls oxetanes, 3- ethyl -3- acryloyloxymethyl oxa- rings Butane, 3- ethyl -3- methacryloxymethyls oxetanes, 3- methyl -3- acryloyl-oxyethyls oxetanes, 3- methyl -3- methacryloxyethyls oxetanes, 3- methyl -3- acryloyl-oxyethyls oxetanes, 3- first Oxetanes unsaturated carboxylic ester compounds such as base -3- methacryloxyethyl oxetanes etc..
The foregoing illustrative other monomers that can be copolymerized with the unsaturated compound with carboxyl can respectively be used alone Or two kinds of combination of the above are used.
Solvent
There is no particular restriction for solvent contained in black-colored photosensitive resin composition to the present invention, can use black sense The various organic solvents used in the field of photosensitive resin composition.As its concrete example, can enumerate ethylene glycol single methyl ether, The ethylene glycol monoalkyl ethers class such as ethylene glycol monomethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether;Diethylene glycol dimethyl base The diethylene glycol (DEG)s dialkyl ethers such as ether, diethylene glycol diethyl ether, diethylene glycol (DEG) dipropyl ether, diethylene glycol dibutyl ether;Methyl cellosolve The ethylene glycol alkyl ethers acetate esters such as acetic acid esters, ethyl cellosolve acetate;Propylene glycol monomethyl ether, propylene glycol list second The aklylene glycols alkane such as base ether acetic acid ester, propylene glycol monopropyl ether acetic acid esters, methoxy butyl acetate and acetic acid methoxyl group pentyl ester Base ether acetic acid esters;Benzene,toluene,xylene, mesitylene etc. are aromatic hydrocarbon;Methyl ethyl ketone, acetone, methyl amyl ketone, methyl The ketones such as isobutyl ketone, cyclohexanone;The alcohols such as ethyl alcohol, propyl alcohol, butanol, hexanol, cyclohexanol, ethylene glycol, glycerine;3- ethoxy-cs The esters such as acetoacetic ester, 3- methoxy methyl propionates;Ring-type esters such as gamma-butyrolacton etc..In above-mentioned solvent, from coating, drying Property in terms of set out, it is 100 DEG C~200 DEG C of organic solvent that can preferably enumerate above-mentioned solvent mid-boiling point, can more preferably be enumerated Go out the esters such as aklylene glycol alkylether acetates class, ketone, 3- ethoxyl ethyl propionates, 3- methoxy methyl propionates, into one Step preferably, can enumerate propylene glycol monomethyl ether, propylene glycol monoethyl acetic acid esters, cyclohexanone, 3- ethoxy-cs Acetoacetic ester, 3- methoxy methyl propionates etc..These solvents can respectively be used alone or be used in mixed way two kinds or more.
Above-mentioned solvent can be used as surplus and contain so that black-colored photosensitive resin composition meets 100 weight %.It is such Content is the range of the process easiness (such as coating) in the dispersion stabilization and manufacturing process for consider composition and selection.
Additive
The present invention black-colored photosensitive resin composition in, also can as needed by filler, other high-molecular compounds, The additives such as pigment dispersing agent, closely sealed accelerating agent, antioxidant, ultra-violet absorber, anti-flocculating agent are used in combination.
As the specific example of filler, glass, silica, aluminium oxide etc. can be illustrated.As other macromolecules Compound, specifically, can enumerate the curable resins such as epoxy resin, maleimide resin, polyvinyl alcohol, polyacrylic acid, Thermoplastic resins such as polyalkylene glycol monoalkyl ether, polyacrylic acid fluothane base ester, polyester, polyurethane etc..As pigment dispersing agent, energy It is enough to utilize commercially available surfactant, such as silicon systems, fluorine system, ester system, cationic system, anionic system, nonionic can be enumerated The surfactant etc. of system, both sexes etc..They can respectively be used alone or two or more is applied in combination.
As above-mentioned surfactant, such as there are polyoxyethylene alkyl ether class, polyoxyethylene alkyl phenyl ether class, poly- second Diol diesters class, sorbitan fatty acid ester class, fatty acid modified polyesters, tertiary-amine modified polyurethanes, polyethyleneimine Class etc. is indicated with trade name in addition to this, can enumerate KP (SHIN-ETSU HANTOTAI's chemical industry (strain) manufacture), POLYFLOW (common prosperity societies Learn (strain) manufacture), EFTOP (manufacture of TOCHEM PRODUCTS companies), MEGAFAC (big Japan Chemical Industry (strain) manufacture), Flourad (Sumitomo 3M (strain) manufactures), Asahi guard, Surflon (being manufactured above for Asahi Glass (strain)), SOLSPERSE (ZENECA (strain) manufactures), EFKA (manufacture of EFKA chemical companies), PB 821 (aginomoto (strain) manufacture) etc..
As closely sealed accelerating agent, such as vinyltrimethoxysilane, vinyltriethoxysilane, ethylene can be enumerated Base three (2- methoxy ethoxies) silane, N- (2- amino-ethyls) -3- aminopropylmethyldimethoxysilanes, N- (2- amino Ethyl) -3- TSL 8330s, 3-aminopropyltriethoxysilane, 3- glycidoxypropyl trimethoxies Base silane, 3- glycidoxypropyls dimethoxysilane, 2- (3,4- epoxycyclohexyls) ethyl trimethoxy silane, 3- chloropropylmethyldimethoxysilanes, 3- r-chloropropyl trimethoxyl silanes, 3- methacryloxypropyl trimethoxy silicon Alkane, 3-mercaptopropyi trimethoxy silane etc..As antioxidant, 2,2 '-thiobis (4- methyl -6- can be specifically enumerated Tert-butyl phenol), 2,6- di-tert-butyl -4- methylphenols etc..
As ultra-violet absorber, 2- (3- tert-butyl -2- hydroxy-5-methyl bases phenyl) -5- chlorobenzenes can be specifically enumerated And triazole, alkoxy benzophenone etc..
As anti-flocculating agent, Sodium Polyacrylate etc. can be specifically enumerated.
Above-mentioned additive can be added suitably by those skilled in the art in a range that does not hinder the effect of the present invention It uses.
< display devices >
Another embodiment of the present invention is related to defining the display device of film comprising pixel, and it includes above-mentioned which, which defines film, The solidfied material of black-colored photosensitive resin composition.Display device of the present invention can include containing organic illuminating element or The display device of quantum dot light emitting element.
The common patterning process that film is defined using the formation pixel of photolithography method includes the stage below:
A) black-colored photosensitive resin composition is coated on to the stage of substrate;
B) by the prebake stage of solvent seasoning;
C) so that photomask is contacted on obtained envelope, irradiate active ray and make the exposure portion cured stage;
D) carry out the stage for the developing procedure for unexposed portion being dissolved using aqueous alkali;With
E) stage for being dried and baking afterwards.
Desired thickness in order to obtain, above-mentioned coating use and roll coater, spin coater, slit and rotary coating are utilized The wet coating method of the apparatus for coating such as machine, slit coater (being otherwise referred to as molded coating machine), ink-jet carries out.
Prebake is carried out by being heated with baking oven, hot plate etc..At this point, when heating temperature in prebake and heating Between properly selected according to the solvent used, such as carried out 1~30 minute at a temperature of 80~150 DEG C.
In addition, the exposure for using exposure machine carry out after prebake, by being exposed via photomask, to only make Part corresponding with pattern is photosensitive.At this point, the light of irradiation can be such as luminous ray, ultraviolet light, X-ray and electron beam.
In order to which the photosensitive polymer combination for the part of non-exposed part not being removed is removed, the alkali after being exposed Development, by the development, forms desired pattern.As the developer solution suitable for the alkali development, for example, can use alkali metal, The aqueous solution etc. of the carbonate of alkaline-earth metal.Particularly, using containing the carbonate such as sodium carbonate, potassium carbonate, lithium carbonate 1~3 The aqueous alkali of weight % utilizes developing machine or supersonic wave cleaning machine etc. in 10~50 DEG C, preferably 20~40 DEG C of temperature It carries out.
It is baked after being carried out to improve the adaptation of patterned film and substrate, at 80~220 DEG C, 10~120 minutes Under conditions of pass through be heat-treated carry out.It bakes in the same manner as prebake afterwards, uses the progress such as baking oven, hot plate.
The pixel manufactured with the black-colored photosensitive resin composition of the present invention defines film not only optical density (OD), adaptation, electricity Physical properties excellents such as insulating properties, light-proofness, and heat resistance and solvent resistance etc. are excellent, thus can improve organic illuminating element, The reliability of quantum dot light emitting element and display device comprising above-mentioned organic illuminating element or quantum dot light emitting element.
Below in order to specifically describe the present invention, enumerates embodiment and explain in detail.But embodiment of the present invention Various other forms is can be deformed into, the scope of the present invention is not limited to aftermentioned embodiment.For ordinary skill Personnel, in order to which more completely the present invention will be described and provides the embodiment of the present invention.In addition, " % " of following presentation content " part " is then weight basis as long as no special instructions.
Production Example:The synthesis of binder resin A
The flask with blender, thermometer, reflux condensing tube, dropping funel and nitrogen ingress pipe is prepared.As monomer Dropping funel is added (methyl) acrylic acid 3,4- epoxies tristane -8- base esters and (methyl) acrylic acid 3,4- epoxy tricyclics Decane -9- base esters are with molar ratio 50:50 20 parts of the mixtures mixed, 30 parts of acrylic acid, 80 parts of N-cyclohexylmaleimide, 70 parts of 2-hydroxyethyl methacrylate, peroxide -2 ethyl hexanoic acid tert-butyl ester 4, propylene glycol monomethyl ether (PGMEA) 40 parts, stirring.As chain-transferring agent dropping bath, 6 parts of n- dodecyl mereaptan of addition, 24 parts of PGMEA, stirring.Then, in flask 395 parts of PGMEA is added, makes the atmosphere in flask after air is replaced into nitrogen, stirs and the temperature of flask is made to be warming up to 90 ℃.Then, monomer and chain-transferring agent are instilled since dropping funel.Carry out 2 hours dropping liquids respectively when maintaining 90 DEG C, 1 is small Shi Hou is warming up to 110 DEG C, maintains 5 hours, and the acid value for having obtained solid constituent is the resin of 100mgKOH/g.It is measured using GPC Polystyrene conversion weight average molecular weight be 10100, molecular weight distribution (Mw/Mn) be 2.2.
Examples 1 to 3 and comparative example 1~3:The manufacture of black-colored photosensitive resin composition
It recorded in table 1 is formed and content has manufactured black-colored photosensitive resin composition with following.
[Table 1]
In each ingredient recorded in table 1 above, in advance using the pigment as coloured material and the pigment as additive The total amount of dispersant becomes 20 mass % relative to the mixture of pigment, pigment dispersing agent and propylene glycol monomethyl ether Mode mixed, after so that pigment is fully disperseed using ball mill, ball mill is detached, further addition include propylene glycol The remaining ingredient of the surplus of monomethyl ether acetate, is mixed, has obtained photosensitive composition.
Experimental example:The evaluation of discharge characteristic
(1) making of colored substrate
It is dry after the glass substrate (Corning Incorporated) of 5cm × 5cm neutral lotion and water are cleaned.In above-mentioned glass base The black-colored photosensitive resin composition manufactured in above-described embodiment and comparative example is distinguished into spin coating so that final film thickness becomes on plate 1.5 μm, firing before being carried out at 80~120 DEG C is 1~2 minute dry, and solvent is removed.Then, with 40~100mJ/ of light exposure cm2It is exposed, forms the pattern of 1cm × 3cm, removed non-exposed portion using aqueous alkali.Next, being carried out at 220 DEG C It is burnt into after twenty minutes, has manufactured colored substrate.
(2) evaluation being vented
Implement the evaluation of exhaust with the following method:While the colored substrate of above-mentioned manufacture is made to thermally decompose 30 points at 230 DEG C Clock, while analyzing trapped compound with Py-GC/MS.Analysis result is shown in following table 2.
[Table 2]
As known to above-mentioned table 2, black-colored photosensitive resin composition, that is, Examples 1 to 3 of the present invention is utilized In the case of manufacture, compared with the situation for the photosensitive polymer combination manufacture being related to using comparative example 1~3, the exhaust of dissolution Amount substantially reduces.

Claims (15)

1. black-colored photosensitive resin composition, which contain toner, binder resin, photopolymerizable compound, photopolymerization to cause Agent and solvent, the Photoepolymerizationinitiater initiater include selected from one or more of the compound indicated by following chemical formulas 1:
&#91;Chemical formula 1&#93;
In the chemical formula 1,
R1,R2,R3,R4Independently of one another hydrogen, C1-C20Alkyl, OR15, halogen or NO2;
Or R1And R2,R2And R3,R3And R4It is together independently of each otherIt is former with the carbon accompanying by them Son forms 6 membered rings together;
R11,R12,R13,R14Independently of one another hydrogen, unsubstituted or by 1 or more halogen, phenyl, CN, OH, SH, C1- C4Alkoxy, (CO) OH replace or by (CO) O (C1-C4Alkyl) substitution C1-C20Alkyl;
Or R11,R12,R13,R14Independently of one another unsubstituted phenyl or by 1 or more C1-C6Alkyl, halogen, CN,OR15Replace or by NR17R18Substituted phenyl;
Or R11,R12,R13,R14Independently of one another halogen, CN, OR15,SR16,SOR16,SO2R16Or NR17R18, wherein replacing Base OR15,SR16Or NR17R18Arbitrarily pass through group R together with 1 in the carbon atom of naphthalene ring15,R16,R17And/or R18Shape At 5- membered rings or 6- membered rings;
R5It is unsubstituted or by 1 or more halogen, R15,COOR15,OR15,SR16,CONR17R18,NR17R18Substituted C1- C20Alkyl;
Or R5For 1 or more O, S, SO, SO2,NR23Or the C that CO is interposed therebetween2-C20Alkyl, or to be not inserted into or 1 Above O, CO or the NR23The C being interposed therebetween2-C12Alkenyl,
Wherein, the C being inserted into2-C20Alkyl and the C for being not inserted into or being inserted into2-C12Alkenyl is unsubstituted or by 1 Above halogen substitution;
Or R5For C4-C8Cycloalkenyl group, C2-C12It alkynyl or is not inserted into or 1 or more O, S, CO or NR23It is interposed therebetween C3-C10Naphthenic base;
Or R5For phenyl or naphthyl, each is unsubstituted or by 1 or more OR15,SR16,NR17R18,COR22,CN, NO2, halogen, C1-C20Alkyl, C1-C4Halogenated alkyl, 1 or more O, S, CO or NR23The C being interposed therebetween2-C20Alkyl replace or Person's each is by C3-C10Naphthenic base replaces or by 1 or more O, S, CO or NR24The C being interposed therebetween3-C10Naphthenic base takes Generation;
R6,R7,R8,R9,R10For hydrogen, phenyl-C1-C3It is alkyl, unsubstituted or by 1 or more halogen, OH, SH, CN, C3-C6 Alkenyloxy group, OCH2CH2CN,OCH2CH2(CO)O(C1-C4Alkyl), O (CO)-(C1-C4Alkyl), O (CO)-(C2-C4) alkenyl, O (CO)-phenyl, (CO) OH, (CO) O (C1-C4Alkyl), C3-C20Naphthenic base, SO2-(C1-C4Halogenated alkyl), O (C1-C4Alkyl halide Base) substitution or the C that is interposed therebetween by 1 or more O3-C20The C of naphthenic base substitution1-C20Alkyl;
Or R6,R7,R8,R9,R10For 1 or more O, S or NR24The C being interposed therebetween2-C20Alkyl;
Or R6,R7,R8,R9,R10For (CH2CH2O)n+1H,(CH2CH2O)n(CO)-(C1-C8Alkyl), C1-C8Alkanoyl, C2-C12 Alkenyl, C3-C6It enoyl- or is not inserted into or 1 or more O, S, CO or NR23The C being interposed therebetween3-C20Naphthenic base;
Or R6,R7,R8,R9,R10For the C being not inserted into or 1 or more O is interposed therebetween1-C8Alkyl-C3-C10Naphthenic base;
Or R6,R7,R8,R9,R10It is unsubstituted or by 1 or more C1-C6Alkyl, halogen, OH or C1-C3Alkoxy takes The benzoyl in generation;
Or R6,R7,R8,R9,R10For phenyl, naphthalene or C3-C20Heteroaryl, each are unsubstituted or by 1 or more Halogen, OH, C1-C12Alkyl, C1-C12Alkoxy, CN, NO2, phenyl-C1-C3Alkoxy, phenoxy group, C1-C12Alkyl alkylthio base, Phenylsulfanyl, N (C1-C12Alkyl)2, diphenyl amino substitution;
R15For hydrogen, phenyl-C1-C3It is alkyl, unsubstituted or by 1 or more halogen, OH, SH, CN, C3-C6Alkenyloxy group, OCH2CH2CN,OCH2CH2(CO)O(C1-C4Alkyl), O (CO)-(C1-C4Alkyl), O (CO)-(C2-C4) alkenyl, O (CO)-benzene Base, (CO) OH, (CO) O (C1-C4Alkyl), C3-C20Naphthenic base, SO2-(C1-C4Halogenated alkyl), O (C1-C4Halogenated alkyl) substitution Or the C being interposed therebetween by 1 or more O3-C20The C of naphthenic base substitution1-C20Alkyl;
Or R15For 1 or more O, S or NR23The C being interposed therebetween2-C20Alkyl;
Or R15For (CH2CH2O)n+1H,(CH2CH2O)n(CO)-(C1-C8Alkyl), C1-C8Alkanoyl, C2-C12Alkenyl, C3-C6Alkene It acyl group or is not inserted into or 1 or more O, S, CO or NR23The C being interposed therebetween3-C20Naphthenic base;
Or R15For the C being not inserted into or 1 or more O is interposed therebetween1-C8Alkyl-C3-C10Naphthenic base;
Or R15It is unsubstituted or by 1 or more C1-C6Alkyl, halogen, OH or C1-C3The benzoyl of alkoxy substitution Base;
Or R15For phenyl, naphthalene or C3-C20Heteroaryl, each are unsubstituted or by 1 or more halogen, OH, C1- C12Alkyl, C1-C12Alkoxy, CN, NO2, phenyl-C1-C3Alkoxy, phenoxy group, C1-C12Alkyl alkylthio base, Phenylsulfanyl, N (C1-C12Alkyl)2, diphenyl amino orSubstitution;
R16For hydrogen, C2-C12Alkenyl, C3-C20Naphthenic base or phenyl-C1-C3Alkyl, wherein C2-C12Alkenyl, C3-C20Naphthenic base or benzene Base-C1-C3Alkyl is not inserted into or 1 or more O, S, CO, NR23Or COOR15It is interposed therebetween;
Or R16It is unsubstituted or by 1 or more OH, SH, CN, C3-C6Alkenyloxy group, OCH2CH2CN,OCH2CH2(CO)O (C1-C4Alkyl), O (CO)-(C2-C4) alkenyl, O (CO)-(C1-C4Alkyl), O (CO)-phenyl or (CO) OR15Substituted C1-C20 Alkyl;
Or R16For 1 or more O, S, CO, NR23Or COOR15The C being interposed therebetween2-C20Alkyl;
Or R16For (CH2CH2O)nH,(CH2CH2O)n(CO)-(C1-C8Alkyl), C2-C8Alkanoyl or C3-C6Enoyl-;
Or R16It is unsubstituted or by 1 or more C1-C6Alkyl, halogen, OH, C1-C4Alkoxy or C1-C4Alkyl sulfane The benzoyl of base substitution;
Or R16For phenyl, naphthalene or C3-C20Heteroaryl, each are unsubstituted or by 1 or more halogen, C1-C12 Alkyl, C1-C4Halogenated alkyl, C1-C12Alkoxy, CN, NO2, phenyl-C1-C3Alkoxy, phenoxy group, C1-C12Alkyl alkylthio base, Phenylsulfanyl, N (C1-C12Alkyl)2, diphenyl amino, (CO) O (C1-C8Alkyl), (CO)-C1-C8Alkyl, (CO) N (C1-C8 Alkyl)2OrSubstitution;
R17And R18Independently of one another hydrogen, C1-C20Alkyl, C2-C4Hydroxy alkyl, C2-C10Alkoxyalkyl, C2-C5Alkenyl, C3- C20Naphthenic base, phenyl-C1-C3Alkyl, C1-C8Alkanoyl, C1-C8Alkanoyloxy, C3-C12Enoyl-, SO2-(C1-C4Alkyl halide Base) or benzoyl;
Or R17And R18For phenyl, naphthalene or C3-C20Heteroaryl, each it is unsubstituted or by 1 or more halogen, C1-C4Halogenated alkyl, C1-C20Alkoxy, C1-C12Alkyl, benzoyl or C1-C12Alkoxy replaces;
Or R17And R18It is not inserted into or O, S or NR with being formed together with the N- atoms accompanying by them15The 5- that is interposed therebetween or 6- members are saturated or unsaturation ring, and above-mentioned 5- or 6- members saturation or unsaturation ring are unsubstituted or by 1 or more C1-C20Alkane Base, C1-C20Alkoxy ,=O, OR15,SR16,NR19R20,(CO)R21,NO2, halogen, C1-C4Halogenated alkyl, CN, phenyl substitution It is either not inserted into or 1 or more O, S, CO or NR15The C being interposed therebetween3-C20Naphthenic base replaces;
Or R17And R18It is unsubstituted or by 1 or more C with being formed together with the N- atoms accompanying by them1-C20Alkyl, C1-C4Halogenated alkyl, C1-C20Alkoxy ,=O, OR15,SR16,NR19R20,(CO)R21, halogen, NO2, CN, phenyl substitution or It is not inserted into or 1 or more O, S, CO or NR15The C being interposed therebetween3-C20The heteroaromatic ring system of naphthenic base substitution;
R19And R20Independently of one another hydrogen, C1-C20Alkyl, C1-C4Halogenated alkyl, C3-C10Naphthenic base or phenyl;
Or R19And R20It is not inserted into or O, S or NR with being formed together with the N- atoms accompanying by them23The 5- that is interposed therebetween or 6- members are saturated or unsaturation ring, 5- or 6- members saturation or unsaturation ring do not condensed or make phenyl ring condense in the 5- or 6- members are saturated or unsaturation ring;
R21For hydrogen, OH, C1-C20Alkyl, C1-C4Halogenated alkyl is not inserted into or 1 or more O, CO or NR24It is interposed therebetween C2-C20Alkyl is not inserted into or O, S, CO or NR24The C being interposed therebetween3-C20Naphthenic base,
Or R21For phenyl, naphthalene, phenyl-C1-C4Alkyl, OR15,SR16Or NR19R20;
R22For C6-C20Aryl or C3-C20Heteroaryl, each are unsubstituted or by 1 or more phenyl, halogen, C1- C4Halogenated alkyl, CN, NO2,OR15,SR16,NR17R18Replace or by 1 or more O, S or NR23The C being interposed therebetween1-C20Alkane Either each is unsubstituted or by 1 or more halogen, COOR for base substitution15,CONR17R18, phenyl, C3-C8Cycloalkanes Base, C3-C20Heteroaryl, C6-C20Aryloxycarbonyl, C3-C20Heteroaryloxycarbonyl, OR15,SR16Or NR17R181 or more of substitution C1-C20Alkyl replaces;
Or R22For hydrogen, unsubstituted or by 1 or more halogen, phenyl, OH, SH, CN, C3-C6Alkenyloxy group, OCH2CH2CN,OCH2CH2(CO)O(C1-C4Alkyl), O (CO)-(C1-C4Alkyl), O (CO)-phenyl, (CO) OH or (CO) O (C1- C4Alkyl) substitution C1-C20Alkyl;
Or R22For 1 or more O, S or NR24The C being interposed therebetween2-C12Alkyl;
Or R22For (CH2CH2O)n+1H,(CH2CH2O)n(CO)-(C1-C8Alkyl), C2-C12Alkenyl or C3-C8Naphthenic base;
Or R22For by SR16Substituted phenyl, wherein group R16It indicates for COR22The phenyl of carbazole moiety accompanying by base Or naphthalene ring is bound directly;
N is 1-20;
R23For hydrogen, C1-C20Alkyl, C1-C4The C that halogenated alkyl, 1 or more O or CO are interposed therebetween2-C20Alkyl, or be benzene Base-C1-C4Alkyl is not inserted into or C that 1 or more O or CO is interposed therebetween3-C8Naphthenic base, or be (CO) R17, or It is unsubstituted or by 1 or more C1-C20Alkyl, halogen, C1-C4Halogenated alkyl, OR15,SR16,NR17R18OrSubstituted phenyl;
R24For hydrogen, C1-C20Alkyl, C1-C4The C that halogenated alkyl, 1 or more O or CO are interposed therebetween2-C20Alkyl, or be benzene Base-C1-C4Alkyl is not inserted into or C that 1 or more O or CO is interposed therebetween3-C8Naphthenic base, or be (CO) R17, or It is unsubstituted or by 1 or more C1-C20Alkyl, halogen, C1-C4Halogenated alkyl, OR15,SR16,NR17R18OrSubstituted phenyl.
2. black-colored photosensitive resin composition according to claim 1, wherein the Photoepolymerizationinitiater initiater is included in described R in chemical formula 11,R2,R3,R4Independently of one another hydrogen, C1-C20Alkyl, OR15, halogen or NO2Compound.
3. black-colored photosensitive resin composition according to claim 1, wherein the Photoepolymerizationinitiater initiater includes describedization R in formula 11And R2,R2And R3,R3And R4It is together independently of each otherIt is former with the carbon accompanying by them Son forms the compound of 6- membered rings together.
4. black-colored photosensitive resin composition according to claim 1, wherein the Photoepolymerizationinitiater initiater includes:It is above-mentioned R in chemical formula 11,R2,R3,R4Independently of one another hydrogen, C1-C20Alkyl, OR15, halogen or NO2Compound;And R1And R2, R2And R3,R3And R4It is together independently of each otherWith 6- is formed together with the carbon atom accompanying by them The compound of membered ring.
5. black-colored photosensitive resin composition according to claim 1, wherein relative to black-colored photosensitive resin composition 100 weight % of entirety, the Photoepolymerizationinitiater initiater containing 0.01~10 weight %.
6. black-colored photosensitive resin composition according to claim 5, wherein relative to black-colored photosensitive resin composition 100 weight % of entirety, contain 1~50 weight % of colorant, 5~80 weight % of binder resin, photopolymerizable compound 1~30 The solvent of weight %, Photoepolymerizationinitiater initiater 0.01~10 weight % and surplus.
7. black-colored photosensitive resin composition according to claim 1 also includes that photopolymerization causes adjuvant.
8. black-colored photosensitive resin composition according to claim 7, wherein it includes choosing that the photopolymerization, which causes adjuvant, From one or more of amine compound and carboxylic acid based compound.
9. black-colored photosensitive resin composition according to claim 1, wherein also include additive.
10. black-colored photosensitive resin composition according to claim 1, wherein the colorant includes to be selected from black face Material or dyestuff and one or more of organic pigment or dyestuff.
11. black-colored photosensitive resin composition according to claim 1, wherein the binder resin includes by containing The copolymer that the copolyreaction of the compound of following chemical formulas 2 obtains:
&#91;Chemical formula 2&#93;
In the chemical formula 2,
R25For hydrogen atom;Or with hydroxyl substitution or unsubstituted C1~C4Alkyl,
R26For singly-bound;Or containing hetero atom or be free of heteroatomic C1~C20Aliphatic or aromatic hydrocarbyl.
12. black-colored photosensitive resin composition according to claim 11, wherein the binder resin includes copolymerization Object, the copolymer by further include be selected from the monomer containing unsaturated carboxylic acid and can with the compound of above-mentioned chemical formula 2 and One or more of compound with unsaturated bond of monomer copolymerization containing unsaturated carboxylic acid is obtained using copolyreaction.
13. the black-colored photosensitive resin composition according to any one of claim 1~12, wherein the composition is used Film is defined in the pixel for forming organic illuminating element or quantum dot light emitting element.
14. display device, it includes containing the black-colored photosensitive resin composition described in any one of with good grounds claim 1~13 The pixel of solidfied material define film.
15. display device according to claim 14, wherein the display device includes organic illuminating element or quantum dot Light-emitting component.
CN201810159216.0A 2017-03-29 2018-02-26 Black-colored photosensitive resin composition and the display device manufactured using it Pending CN108693707A (en)

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