CN108663293A - Particulate matter detection means and particle detection method - Google Patents
Particulate matter detection means and particle detection method Download PDFInfo
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- CN108663293A CN108663293A CN201810499262.5A CN201810499262A CN108663293A CN 108663293 A CN108663293 A CN 108663293A CN 201810499262 A CN201810499262 A CN 201810499262A CN 108663293 A CN108663293 A CN 108663293A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
- G01N15/06—Investigating concentration of particle suspensions
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Abstract
The present invention relates to technical field of manufacturing semiconductors more particularly to a kind of particulate matter detection means and particle detection methods.The particulate matter detection means, including：Particulate matter analyzer, for analyzing the particulate matter information in gas；Sampling conduit, including the first end and second end that is oppositely arranged；The first end with the exhaust outlet of semiconductor processing chamber for being connected to, and the second end with the particulate matter analyzer for being connected to；The sampling conduit is used for the gas transport in the semiconductor processing chamber to the particulate matter analyzer.The present invention realizes the real-time detection to semiconductor processing chamber internal particle principle condition, improves efficiency and the accuracy of particle analyte detection, it is ensured that lasting, the stable progress of manufacture of semiconductor.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors more particularly to a kind of particulate matter detection means and particle analyte detection sides
Method.
Background technology
With the development of plane flash memories, the production technology of semiconductor achieves huge progress.But recently
Several years, the development of plane flash memory encountered various challenges：Physics limit, the existing developing technique limit and storage electron density
Limit etc..In this context, to solve the difficulty that encounters of planar flash memory and pursue being produced into for lower unit storage unit
This, a variety of different three-dimensional (3D) flash memories structures are come into being, such as 3D NOR (3D or non-) flash memories and 3D NAND
(3D with non-) flash memory.
Wherein, storage element is used three dimensional pattern layer by 3D nand memories using its small size, large capacity as starting point
Folded highly integrated of layer heap is design concept, produces the memory of high unit area storage density, efficient storage unit performance,
Have become the prevailing technology of emerging memory design and producing.
In the manufacturing process of the semiconductor devices such as 3D nand memories, it is often necessary to semiconductor processing equipment inside
Particulate matter (Particle, PA) situation be detected, with ensure manufacture of semiconductor continue, stablize progress.But it is existing
Particle detection method, for the semiconductor equipment for needing to carry out treatment process using low pressure or vacuum environment,
The detection method operation of its internal environment particulate matter situation is all relatively complicated, and detection efficiency is relatively low.So as to cause in semiconductor
During processing procedure carries out, the frequency that particulate matter event of failure (PADefect Case) occurs is quite high, has seriously affected semiconductor device
The production efficiency and yield rate of part.
Therefore, how efficiently, accurately the particulate matter situation inside semiconductor production equipment is detected, it is ensured that partly lead
The progress that system journey continues, stablizes, is a technical problem to be solved urgently.
Invention content
The present invention provides a kind of particulate matter detection means and particle detection method, to solve in the prior art cannot be high
The problem of imitating, accurately the particulate matter situation inside semiconductor production equipment be measured in real time, to ensure manufacture of semiconductor
The progress continue, stablized.
To solve the above-mentioned problems, the present invention provides a kind of particulate matter detection means, including：
Particulate matter analyzer, for analyzing the particulate matter information in gas；
Sampling conduit, including the first end and second end that is oppositely arranged；The first end is used for and semiconductor processing chamber
Exhaust outlet connection, the second end with the particulate matter analyzer for being connected to；
The sampling conduit is used for the gas transport in the semiconductor processing chamber to the particulate matter analyzer.
Preferably, the exhaust outlet of the semiconductor processing chamber includes standard exhaust port and spare exhaust outlet, the standard
Exhaust outlet is used to exclude the gas in the semiconductor processing chamber；
The first end of the sampling conduit with the spare exhaust outlet for being connected to.
Preferably, further include discharge duct；
The exhaust outlet of the semiconductor processing chamber includes standard exhaust port and spare exhaust outlet, and the standard exhaust port is used
Air in the exclusion semiconductor processing chamber；
One end of the discharge duct with the standard exhaust port for being connected to, the other end is used to be connected to vacuum pump；
There is a thief hatch, the first end of the sampling conduit with the thief hatch for being connected on the discharge duct.
Preferably, further include valve；The valve is set in the sampling conduit, for controlling at the semiconductor
Whether reason chamber is connected with the particulate matter analyzer.
Preferably, further include host computer；The particulate matter analyzer, including analysis cavity and controller；
The analysis cavity, the particulate matter in gas for being transmitted to the sampling conduit are analyzed；
The controller connects the analysis cavity, and institute is transmitted to for analyzing the analysis cavity to obtain particulate matter information
State host computer.
Preferably, the particulate matter information includes particle size and particle concentration.
To solve the above-mentioned problems, the present invention also provides a kind of particle detection method, include the following steps：
A sampling conduit is provided, the sampling conduit includes the first end and second end being oppositely arranged；The first end with
The exhaust outlet of semiconductor processing chamber is connected to, and the second end is connected to particulate matter analyzer；The particulate matter analyzer is used for
Analyze the particulate matter information in gas；
Sample gas is obtained, the sample gas is to be transmitted to institute through the sampling conduit from the semiconductor processing chamber
State particulate matter analyzer；
Analyze the particulate matter information in the sample gas.
Preferably, the exhaust outlet of the semiconductor processing chamber includes standard exhaust port and spare exhaust outlet, the standard
Exhaust outlet is used to exclude the gas in the semiconductor processing chamber；The exhaust outlet of the first end and semiconductor processing chamber connects
Logical specific steps include：
It is connected to the first end and the spare exhaust outlet.
Preferably, the particulate matter analyzer includes the analysis cavity for analytical sampling gas；Before acquisition sample gas
Further include following steps：
Exclude the gas in the analysis cavity.
Preferably, it further includes before following steps to obtain sample gas：
A valve is provided, the valve is installed in the sampling conduit；
Judge whether to receive the instruction for opening the valve, if so, controlling the valve opening, conducting is described partly to be led
Body processing chamber housing and the particulate matter analyzer.
Preferably, further include following steps：
Sampling interval is set, the instruction for opening the valve is sent out according to the sampling interval.
Preferably, the particulate matter information analyzed in the sample gas further includes later following steps：
The particulate matter information is transmitted to host computer.
Preferably, the particulate matter information includes particle size and particle concentration.
Particulate matter detection means provided by the invention and particle detection method are connected to semiconductor processes by sampling conduit
Chamber and particulate matter analyzer so that during being detected to the particulate matter situation in semiconductor processing chamber, be not required to
Semiconductor equipment is shut down, realize the real-time detection to semiconductor processing chamber internal particle principle condition, improve
The efficiency of particle analyte detection and accuracy, it is ensured that lasting, the stable progress of manufacture of semiconductor.
Description of the drawings
Attached drawing 1 is the structural schematic diagram of particulate matter detection means in the specific embodiment of the invention；
Attached drawing 2 is the structure diagram of particulate matter detection means in the specific embodiment of the invention；
Attached drawing 3 is the flow chart of particle detection method in the specific embodiment of the invention.
Specific implementation mode
Below in conjunction with the accompanying drawings to the specific embodiment party of particulate matter detection means provided by the invention and particle detection method
Formula elaborates.
In semiconductor fabrication, semiconductor equipment internal particle principle condition is to ensure that manufacture of semiconductor is normally carried out
Essential condition.Therefore, it is necessary to be detected to the particulate matter information inside semiconductor equipment.Due to most of semiconductor equipment
When carrying out semiconductor processing procedures, need to be in closed vacuum or low pressure state, at this point, semiconductor processes chamber cannot be opened
The chamber door of room carries out particulate matter condition monitoring.Currently, the method for detection semiconductor equipment internal particle object information needs
Semiconductor equipment carries out in the state of shutting down, therefore, it is impossible to the particulate matter inside semiconductor equipment during manufacture of semiconductor
Situation is monitored in real time.Even if however, under shutdown status, particulate matter analyzer also can not be acquired directly in semiconductor equipment
The gas in portion, but will be by using CW (Continuous Wave, continuous wave) to being taken out out of described semiconductor equipment crystalline substance
The case where circular surfaces, is analyzed, and the particulate matter situation inside indirect gain semiconductor equipment is carried out in conjunction with particulate matter analyzer.This
Kind of mode, there are following four in terms of defect：First, need the downtime for additionally increasing semiconductor equipment, influence partly to lead
The lasting progress of system journey, reduces the production efficiency of semiconductor；Second, CW cost are higher, lead to semiconductor manufacturing cost
Increase；Third, cannot be in semiconductor equipment operational process, the particulate matter situation of internal environment be measured in real time, and is caused
The reliability of testing result reduces；4th, the method for obtaining particulate matter situation by indirect mode, reliability is relatively low, cannot
The accurately particulate matter situation inside reflection semiconductor equipment.
To solve the above-mentioned problems, present embodiment provides a kind of particulate matter detection means, and attached drawing 1 is the present invention
The structural schematic diagram of particulate matter detection means in specific implementation mode, attached drawing 2 are particle quality testings in the specific embodiment of the invention
Survey the structure diagram of device.As shown in Figure 1, 2, the particulate matter detection means that present embodiment provides, including particulate matter point
Analyzer 11 and sampling conduit 13.
The particulate matter analyzer 11, for analyzing the particulate matter information in gas；The sampling conduit 13, including it is opposite
The first end and second end of setting；The first end with the exhaust outlet 111 of semiconductor processing chamber 10 for being connected to, and described second
End with the particulate matter analyzer 11 for being connected to；The sampling conduit 13 is used for the gas in the semiconductor processing chamber 10
Body is transmitted to the particulate matter analyzer 11.Preferably, the particulate matter information includes particle size and particle concentration.This
Particulate matter described in specific implementation mode is preferably the particulate matter that grain size is greater than or equal to 0.06 micron.Using the above structure,
It is not necessary that additional opening is arranged on the semiconductor processing chamber 10, but utilize the semiconductor processing chamber 10 existing
Exhaust outlet 111 is used as gas sampling mouth.After the sampling conduit 13 is connected to the exhaust outlet 111, you can in real time described in acquisition
Gas inside semiconductor processing chamber 10, to realize to the real-time of 10 internal particle principle condition of the semiconductor processing chamber
Detection.
Wherein, the semiconductor processing chamber 10 refers to the chamber that process is carried out to semiconductor devices.This is specific real
It can be dry etching chamber, wet etching chamber, chemical vapor deposition chamber, physics to apply the semiconductor processing chamber in mode
Vapor deposition chamber etc..
It specifically, can when needing to be detected analysis to the particulate matter situation in the semiconductor processing chamber 10
By the sampling conduit 13 particulate matter will be transmitted to after the gas in the semiconductor processing chamber 10 directly sampling
Analyzer 11 is analyzed.Whole process need not carry out shutdown processing to semiconductor processing device, without expensive
CW equipment realizes the real-time detection to the particulate matter situation of semiconductor processing chamber internal environment, it is ensured that manufacture of semiconductor
The progress continue, stablized.
In order to reduce the cost of the particulate matter detection means, and treatment process is not influenced in semiconductor processing chamber just
It often carries out, it is preferred that the exhaust outlet of the semiconductor processing chamber 10 includes standard exhaust port and spare exhaust outlet, the standard
Exhaust outlet is used to exclude the air in the semiconductor processing chamber；The first end of the sampling conduit 13 be used for it is described spare
Exhaust outlet is connected to.
Specifically, being normally carried out in order to ensure 10 internal semiconductor treatment process of semiconductor processing chamber often needs
10 inside of the semiconductor processing chamber is made to keep vacuum or low pressure environment.The standard exhaust port is just used to exclude described
Air in semiconductor processing chamber 10 so that the air pressure in the semiconductor processing chamber reaches preset value.And it is described spare
Exhaust outlet, the standard exhaust port can normal exhaust when, whether go out inside the semiconductor processing chamber 10 for detecting
Existing gas leakage；And the standard exhaust port can not normal exhaust when, be additionally operable to assist the standard exhaust port to exclude institute
The air inside semiconductor processing chamber 10 is stated, and the quantity of spare exhaust outlet is usually multiple.Therefore, in order to not influence described
The first end of the normal exhaust of semiconductor processing chamber 10, the sampling conduit 13 is preferably connected to the spare exhaust outlet.
In order to not influence the normal exhaust of the semiconductor processing chamber, it is preferred that the particulate matter detection means are also wrapped
Include discharge duct 14；The exhaust outlet of the semiconductor processing chamber 10 includes standard exhaust port and spare exhaust outlet, the standard
Exhaust outlet is used to exclude the air in the semiconductor processing chamber；One end of the discharge duct 14 is used to arrange with the standard
Gas port connection, the other end are for being connected to vacuum pump 12；There is a thief hatch 141, the sampling conduit on the discharge duct 14
13 first end with the thief hatch 141 for being connected to.Wherein, the vacuum pump 12 is for extracting the semiconductor processing chamber out
Air in 10 so that the technique in the semiconductor processing chamber 10 carries out under vacuum.By by the sampling pipe
The first end in road 13 is connected to the thief hatch 141 on the discharge duct 14, can be with by the effect of the vacuum pump 12
More quickly by the gas transport in the semiconductor processing chamber 10 to the particulate matter analyzer 11.
In order to further increase the flexibility of the semiconductor chamber internal particle object condition monitoring, it is preferred that described
Grain analyte detection device further includes valve 15；The valve 15 is set in the sampling conduit 13, for controlling the semiconductor
Whether processing chamber housing 10 is connected with the particulate matter analyzer 11.Wherein, the valve 15 can be manually-operated gate, can also be
Automatic valve, those skilled in the art may set according to actual needs.The setting of the valve 15 so that staff
The whole of the particulate matter detection means can be reduced as needed to 10 internal gas environmental sampling of the semiconductor processing chamber
Body power consumption.
In specific detection process, staff can keep 15 normally open of the valve as needed, in order to
The particulate matter situation inside the semiconductor processing chamber 10 is detected in real time；The valve can also be periodically closed as needed
15, the particulate matter situation of property performance period detected inside the semiconductor processing chamber 10.
In order to enable staff being capable of the intuitive and accurate particle principle understood inside the semiconductor processing chamber 10
Condition, it is preferred that the particulate matter detection means further include host computer 23；The particulate matter analyzer 11, including 21 He of analysis cavity
Controller 22；The analysis cavity 21, the particulate matter in gas for being transmitted to the sampling conduit 13 are analyzed；The control
Device 22 processed, connects the analysis cavity 21, and the host computer is transmitted to for the analysis of the analysis cavity 21 to be obtained particulate matter information
23.Wherein, the particulate matter information is transmitted to the concrete mode of the host computer 23 by the controller 22, can be wired biography
It is defeated, can also be wireless transmission.
Specifically, the analysis cavity 21 includes vacuum pump, particle size sensors and concentration sensor.The vacuum pump is used for
Extract the gas in the semiconductor processing chamber 10；The particle size sensors, for the grain size of particulate matter in detection gas, example
Such as laser particle size sensor；The concentration sensor is used to detect the concentration of particulate matter in the gas.The host computer 23 can
It is shown in the display screen of the host computer 23 in the form of word or chart by the particulate matter information that will be received, so as to the people that works
Member open-and-shut can know the environmental aspect inside the semiconductor processing chamber 10.The host computer 23 can also be to institute
The controller 22 stated in particulate matter analyzer 11 transmits control instruction.The controller 22 refers to according to the control received
It enables, the vacuum pump controlled in the analysis cavity 21 carries out gas sampling to the semiconductor processing chamber.
To solve the above-mentioned problems, present embodiment additionally provides a kind of particle detection method, and attached drawing 3 is this hair
The flow chart of particle detection method in bright specific implementation mode.As shown in figure 3, the particle quality testing that present embodiment provides
Survey method, includes the following steps：
Step S31, provides a sampling conduit 13, and the sampling conduit 13 includes the first end and second end being oppositely arranged；
The first end is connected to the exhaust outlet of semiconductor processing chamber 10, and the second end is connected to particulate matter analyzer 11；It is described
Particulate matter analyzer 11 is used to analyze the particulate matter information in gas.The sampling conduit 13, the semiconductor processing chamber 10
Connection relation between the particulate matter analyzer 11 is referring to Fig. 1,2.
Step S32 obtains sample gas, and the sample gas is from the semiconductor processing chamber 10 through the sampling pipe
Road 13 is transmitted to the particulate matter analyzer 11.
Step S33 analyzes the particulate matter information in the sample gas.
In order to reduce the cost of the particulate matter detection means, and treatment process is not influenced in semiconductor processing chamber just
It often carries out, the exhaust outlet of the semiconductor processing chamber 10 includes standard exhaust port and spare exhaust outlet, the standard exhaust port
For excluding the gas in the semiconductor processing chamber 10；The first end is connected to the exhaust outlet of semiconductor processing chamber 10
Specific steps include：
It is connected to the first end and the spare exhaust outlet.
In order to avoid 11 internal residual of particulate matter analyzer gas componant to the semiconductor processing chamber inside
The influence of particulate matter situation analysis, it is preferred that the particulate matter analyzer 11 includes the analysis cavity 21 for analytical sampling gas；
It further includes before following steps to obtain sample gas：
Exclude the gas in the analysis cavity 21.
In order to further increase the flexibility of the semiconductor chamber internal particle object condition monitoring, it is preferred that acquisition is adopted
Further include following steps before sample gas：
(a) valve 15 is provided, the valve 15 is installed in the sampling conduit 13；
(b) judge whether to receive the instruction for opening the valve 15, if so, controlling the unlatching of the valve 15, conducting
The semiconductor processing chamber 10 and the particulate matter analyzer 11.
It is furthermore preferred that the particle detection method further includes following steps：
Sampling interval is set, the instruction for opening the valve 15 is sent out according to the sampling interval.
Wherein, the concrete numerical value in sampling interval, those skilled in the art may set according to actual needs, such as root
According to the semiconductor technology type that 10 inside of the semiconductor processing chamber is carried out, present embodiment is not construed as limiting this.
In this way, staff can be according to multiple intermittent sampling analysis as a result, obtaining during semiconductor technology carries out, described half
Particulate matter situation of change inside conductor processing chamber housing 10 improves finished semiconductor performance for improvement semiconductor technology processing procedure,
Reference role is provided.
In order to enable staff being capable of the intuitive and accurate particle principle understood inside the semiconductor processing chamber 10
Condition, it is preferred that the particulate matter information analyzed in the sample gas further includes later following steps：
The particulate matter information is transmitted to host computer.
The particulate matter detection means and particle detection method that present embodiment provides pass through sampling conduit connection half
Conductor processing chamber housing and particulate matter analyzer so that in the process being detected to the particulate matter situation in semiconductor processing chamber
In, semiconductor equipment need not be shut down, realize the real-time detection to semiconductor processing chamber internal particle principle condition,
Improve efficiency and the accuracy of particle analyte detection, it is ensured that lasting, the stable progress of manufacture of semiconductor.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
Member, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications also should be regarded as
Protection scope of the present invention.
Claims (13)
1. a kind of particulate matter detection means, which is characterized in that including：
Particulate matter analyzer, for analyzing the particulate matter information in gas；
Sampling conduit, including the first end and second end that is oppositely arranged；The first end is for the row with semiconductor processing chamber
Gas port is connected to, and the second end with the particulate matter analyzer for being connected to；
The sampling conduit is used for the gas transport in the semiconductor processing chamber to the particulate matter analyzer.
2. particulate matter detection means according to claim 1, which is characterized in that the exhaust outlet of the semiconductor processing chamber
Including standard exhaust port and spare exhaust outlet, the standard exhaust port is used to exclude the air in the semiconductor processing chamber；
The first end of the sampling conduit with the spare exhaust outlet for being connected to.
3. particulate matter detection means according to claim 1, which is characterized in that further include discharge duct；
The exhaust outlet of the semiconductor processing chamber includes standard exhaust port and spare exhaust outlet, and the standard exhaust port is for arranging
Except the air in the semiconductor processing chamber；
One end of the discharge duct with the standard exhaust port for being connected to, the other end is used to be connected to vacuum pump；The exhaust
There is a thief hatch, the first end of the sampling conduit with the thief hatch for being connected on pipeline.
4. particulate matter detection means according to claim 1, which is characterized in that further include valve；The valve, is set to
In the sampling conduit, for controlling whether the semiconductor processing chamber is connected with the particulate matter analyzer.
5. particulate matter detection means according to claim 1, which is characterized in that further include host computer；The particulate matter point
Analyzer, including analysis cavity and controller；
The analysis cavity, the particulate matter in gas for being transmitted to the sampling conduit are analyzed；
The controller connects the analysis cavity, for by the analysis cavity analyze to obtain particulate matter information be transmitted to it is described
Position machine.
6. particulate matter detection means according to claim 1, which is characterized in that the particulate matter information includes particulate matter grain
Diameter and particle concentration.
7. a kind of particle detection method, which is characterized in that include the following steps：
A sampling conduit is provided, the sampling conduit includes the first end and second end being oppositely arranged；The first end with partly lead
The exhaust outlet of body processing chamber housing is connected to, and the second end is connected to particulate matter analyzer；
The particulate matter analyzer is used to analyze the particulate matter information in gas；
Sample gas is obtained, the sample gas is to be transmitted to described through the sampling conduit from the semiconductor processing chamber
Grain object analyzer；
Analyze the particulate matter information in the sample gas.
8. particle detection method according to claim 7, which is characterized in that the exhaust outlet of the semiconductor processing chamber
Including standard exhaust port and spare exhaust outlet, the standard exhaust port is used to exclude the gas in the semiconductor processing chamber；
The specific steps that the first end is connected to the exhaust outlet of semiconductor processing chamber include：
It is connected to the first end and the spare exhaust outlet.
9. particle detection method according to claim 7, which is characterized in that the particulate matter analyzer includes for dividing
Analyse the analysis cavity of sample gas；It further includes before following steps to obtain sample gas：
Exclude the gas in the analysis cavity.
10. particle detection method according to claim 7, which is characterized in that obtain sample gas before further include as
Lower step：
A valve is provided, the valve is installed in the sampling conduit；
Judge whether to receive the instruction for opening the valve, if so, controlling the valve opening, be connected at the semiconductor
Manage chamber and the particulate matter analyzer.
11. particle detection method according to claim 10, which is characterized in that further include following steps：Setting sampling
Interval, the instruction for opening the valve is sent out according to the sampling interval.
12. particle detection method according to claim 7, which is characterized in that analyze the particle in the sample gas
Further include following steps after object information：
The particulate matter information is transmitted to host computer.
13. particle detection method according to claim 7, which is characterized in that the particulate matter information includes particulate matter
Grain size and particle concentration.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201810499262.5A CN108663293A (en) | 2018-05-23 | 2018-05-23 | Particulate matter detection means and particle detection method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810499262.5A CN108663293A (en) | 2018-05-23 | 2018-05-23 | Particulate matter detection means and particle detection method |
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Family
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| CN201810499262.5A Pending CN108663293A (en) | 2018-05-23 | 2018-05-23 | Particulate matter detection means and particle detection method |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US20230065080A1 (en) * | 2021-08-30 | 2023-03-02 | Taiwan Semiconductor Manufacturing Company Ltd. | Method and apparatus for real-time tool defect detection |
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| CN103276368A (en) * | 2013-04-28 | 2013-09-04 | 上海华力微电子有限公司 | Particle pollution monitoring system and chemical vapor deposition device |
| CN104407161B (en) * | 2014-11-24 | 2016-01-13 | 汇众翔环保科技河北有限公司 | Smoke on-line monitoring system and monitoring method |
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