CN108663192B - Detection device and method of wavefront sensor - Google Patents
Detection device and method of wavefront sensor Download PDFInfo
- Publication number
- CN108663192B CN108663192B CN201710210769.XA CN201710210769A CN108663192B CN 108663192 B CN108663192 B CN 108663192B CN 201710210769 A CN201710210769 A CN 201710210769A CN 108663192 B CN108663192 B CN 108663192B
- Authority
- CN
- China
- Prior art keywords
- wavefront sensor
- interferometer
- wave
- phase difference
- wavefront
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Eye Examination Apparatus (AREA)
Abstract
The invention discloses a detection device and a method of a wavefront sensor, wherein the device comprises: an interferometer for generating a plane wave and measuring a wave aberration in an optical path; the spectroscope is used for splitting the plane wave, so that one part of the plane wave is incident to the wavefront sensor, and the other part of the plane wave is projected to the interferometer; the phase difference plate is detachably arranged in the optical path and is used for introducing fixed aberration; the beam-shrinking lens group is used for changing the aperture of the wave front of the light beam so that the detection light beam can be completely incident to the wave front sensor; and the data acquisition and analysis system is respectively connected with the interferometer and the wavefront sensor and is used for calculating the measurement precision of the wavefront sensor. The invention can realize the detection of the wave aberration measurement precision of the shack-Hartmann wavefront sensor and can effectively deduct the error of the measurement light path.
Description
Technical Field
The present invention relates to a wavefront sensor, and more particularly, to a wavefront sensor detection apparatus and method.
Background
The shack-Hartmann wavefront sensor is a wavefront detector, has simple structure and measuring light path and low requirement on the coherence of a light source, and thus has wide application in the fields of medical instruments, adaptive optics, optical surface shape detection and the like. In particular, in the field of measurement of objective lenses of photoetching machines, shack-Hartmann can realize high-precision detection of the wave aberration of the objective lenses.
The shack-Hartmann wavefront sensor mainly comprises a micro lens array and a photoelectric detector. Incident waves enter the micro lens array, the position of a convergent light spot in each sub-aperture after passing through the micro lens array is different from the position of a light spot when ideal waves enter, the position deviation of the light spot caused by different wave front inclinations in each sub-aperture of the micro lens array is different, and the wave aberration before the incidence can be calculated according to the position deviation of the light spot. Due to the fact that the micro-lens array has certain errors in the processing, installation and algorithm processing processes, the performance of the shack-Hartmann wavefront sensor is different from the theoretical design, and the measurement accuracy of the shack-Hartmann wavefront sensor is affected.
Disclosure of Invention
The invention provides a detection device and a detection method of a wavefront sensor, which are used for realizing accurate detection of the wave aberration measurement performance of a shack-Hartmann wavefront sensor.
In order to solve the above technical problem, the present invention provides a wavefront sensor detecting device, including:
an interferometer for generating a plane wave and measuring a wave aberration in an optical path;
the spectroscope is used for splitting the plane wave, so that one part of the plane wave is incident to the wavefront sensor, and the other part of the plane wave is projected to the interferometer;
the phase difference plate is detachably arranged in the optical path and is used for introducing fixed aberration;
the beam-shrinking lens group is used for changing the aperture of the wave front of the light beam so that the detected wave front can be completely incident to the wave front sensor;
and the data acquisition and analysis system is respectively connected with the interferometer and the wavefront sensor and is used for calculating the measurement precision of the wavefront sensor.
Preferably, the interferometer is a phase measurement interferometer or a fiber optic interferometer.
Preferably, the fiber optic interferometer includes: light source, collimating mirror, beam splitter, first, second mirror, semi-transparent semi-reflecting mirror, convergent mirror and measurement detector, the beam of light that the light source sent throws the beam splitter after the collimating mirror collimation to divide into two bundles by the beam splitter, a beam of light projects through first mirror reflection the beam splitter, another beam of light projects convergent mirror through second mirror and semi-transparent semi-reflecting mirror, another part projects the beam splitter, the beam splitter projects some of received light beam the convergent lens group, another part warp semi-transparent semi-reflecting mirror projects the convergent mirror, the convergent mirror projects received light beam the measurement detector, the measurement detector with data acquisition analytic system connects.
Preferably, the phase difference plate is detachably attached between the beam splitter and the first reflecting mirror.
Preferably, the phase difference plate is disposed between the phase measurement interferometer and the spectroscope.
Preferably, the phase measurement interferometer is provided with a test light source.
Preferably, the phase difference plate has one or more of coma aberration, astigmatism, spherical aberration, and high-order spherical aberration.
Preferably, the beam reduction lens group comprises a beam reduction lens and a collimating lens which are arranged in sequence.
Preferably, the optical system further comprises a position adjustment device, and the wavefront sensor is fixed on the position adjustment device.
Preferably, the wavefront sensor is a shack-hartmann wavefront sensor.
The invention also provides a detection method of the wave-front sensor, which adopts the detection device and comprises the following steps:
when the phase difference plate is installed, the interferometer and the wavefront sensor respectively measure the wave aberration of the optical path where the interferometer and the wavefront sensor are located;
when the phase difference plate is not installed, the interferometer and the wavefront sensor respectively measure the inherent wave aberration of the optical path where the interferometer and the wavefront sensor are located;
and calculating the measurement results of the interferometer and the wavefront sensor to obtain the wave aberration measurement error of the wavefront sensor.
Preferably, the step of calculating the results of the measurements of the interferometer and the wavefront sensor, and the step of obtaining the wave aberration measurement error of the wavefront sensor comprises: subtracting the two-time wave aberration measured by the interferometer and provided with the phase difference plate and without the phase difference plate to obtain the wave front difference caused by the fixed aberration on the light path where the interferometer is located; and subtracting the two wave aberrations of the wavefront sensor, which are measured by the wavefront sensor and are provided with the phase difference plate and without the phase difference plate, to obtain the wavefront difference caused by the fixed aberration on the light path where the wavefront sensor is located, and comparing the two wavefront differences to obtain the wave aberration measurement error of the wavefront sensor.
Preferably, when the interferometer adopts a phase measurement interferometer, the phase difference value of the corresponding position is calculated by 1/2 times of the wavefront difference of the optical path where the wavefront sensor is located and the wavefront difference of the optical path where the interferometer is located.
Preferably, when the interferometer is an optical fiber interferometer, the wavefront difference of the optical path where the wavefront sensor is located and the wavefront difference of the optical path where the interferometer is located are subjected to corresponding position phase difference value calculation.
Compared with the prior art, the invention has the following advantages:
1. the invention has simple structure and convenient operation;
2. the detection of the wave aberration measurement precision of the wave front sensor can be realized;
3. the wavefront sensor and the interferometer simultaneously measure the element to be measured, so that errors caused by repeated installation of the element to be measured are reduced;
4. the invention can effectively deduct the error of the measuring light path.
Drawings
Fig. 1 is a schematic structural diagram of a detection device of a wavefront sensor in embodiment 1 of the present invention;
fig. 2 is a schematic structural view of a detection device of a wavefront sensor in embodiment 1 of the present invention (with a phase difference plate removed);
FIG. 3 is a schematic structural diagram of a detecting apparatus of a wavefront sensor in embodiment 2 of the present invention;
fig. 4 is a schematic structural view of a detection device of a wavefront sensor in embodiment 2 of the present invention (with a phase difference plate removed).
Shown in FIGS. 1-2: 11-phase measurement interferometer, 12-beam splitting reflector, 13-reflector, 14-wavefront sensor, 15-position adjusting device, 16-first lens, 17-second lens, 18-phase difference plate, and 19-data acquisition and analysis system;
shown in fig. 3-4: 21-fiber optic interferometer; 211-a light source, 212-a collimating mirror, 213-a beam splitter, 214-a first reflector, 215-a second reflector, 216-a semi-transparent semi-reflecting mirror, 217-a converging mirror, 218-a measuring detector, 22-a wavefront sensor, 23-an adjusting device, 24-a third lens, 25-a fourth lens, 26-a beam splitter, 27-a phase difference plate and 28-a data acquisition and analysis system.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. It is to be noted that the drawings are in simplified form and are not to precise scale, which is provided for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
Example 1
As shown in fig. 1 and 2, the detection device of the wavefront sensor of the present embodiment includes: phase measurement interferometer 11, beam splitting reflector 12, reflector 13, beam reduction lens group and data acquisition and analysis system 19. The phase measurement interferometer 11 generates a plane wave, the beam splitting mirror 12 splits the plane wave, a part of the plane wave is condensed by the beam condensing lens group and then enters the wavefront sensor 14, the wavefront sensor 14 is a shack-hartmann wavefront sensor, and the other part of the plane wave is reflected to the phase measurement interferometer 11 by the reflecting mirror 13.
Further, the detection device of the present invention further includes a phase difference plate 18, the phase difference plate 18 is detachably installed between the phase measurement interferometer 11 and the reflective mirror 12, and has one or more of coma aberration, astigmatism and high-order spherical aberration, that is, a fixed phase difference can be generated according to actual needs, and the wave aberrations of the optical path where the phase measurement interferometer 11 is located and the optical path where the wave front sensor 14 is located can be respectively measured by the phase measurement interferometer 11 and the wave front sensor 14 when the phase difference plate 18 is installed and the phase difference plate 18 is not installed. The data acquisition and analysis system 19 is connected to the phase measurement interferometer 11 and the wavefront sensor 14, respectively, and is configured to calculate the measurement accuracy of the wavefront sensor 14.
With continued reference to fig. 1, the phase measurement interferometer 11 may be a commercial fizeau interferometer, and further, the phase measurement interferometer 11 is further provided with a test light source, and the test light source is a standard mirror with parallel light output, and generates a plane wave, which is provided to the wavefront sensor 14 as a test light source.
Further, the detection device further comprises: a position adjusting means 15 for fixing and adjusting the wavefront sensor 14. The beam-shrinking lens group comprises a first lens 16 and a second lens 17 which are sequentially arranged, the first lens 16 shrinks incident parallel light, the second lens 17 collimates the shrunk light beam into parallel light, and the parallel light can be shrunk by matching the first lens 16 with the second lens.
With continuing reference to fig. 1 and fig. 2, the present embodiment further provides a detection method of a wavefront sensor, which specifically includes:
generating a light beam by using the phase measurement interferometer 11 and projecting the light beam to the beam splitting mirror 12;
the beam splitting mirror 12 splits the light beam, one part of the light is reflected to the wavefront sensor 14, the other part of the light is transmitted to the reflecting mirror 13 and reflected to the phase measurement interferometer 11 by the reflecting mirror 13;
the wavefront sensor 14 measures the received light to obtain the inherent wave aberration W of the optical path on which the wavefront sensor 14 is locatedHb(x,y);
The phase measurement interferometer 11 measures the received light to obtain the inherent wave aberration W of the optical path where the phase measurement interferometer 11 is locatedIb(x,y);
A phase difference plate 18 is arranged between the phase measurement interferometer 11 and the light splitting reflection mirror 12, so that light beams emitted by the phase measurement interferometer 11 have fixed aberration;
the light splitting reflector 12 splits the plane wave with fixed aberration, one part of the light is reflected to the wavefront sensor 14, the other part of the light is transmitted to the reflector 13 and reflected by the reflector 13 back to the phase measurement interferometer 11;
the wavefront sensor 14 measures the received light to obtain the wave aberration W of the optical path where the wavefront sensor 14 is locatedH(x,y);
The phase measurement interferometer 11 measures the received light to obtain the wave aberration W of the optical path where the phase measurement interferometer 11 is locatedI(x,y);
Calculating the measurement results of the phase measurement interferometer 11 and the wavefront sensor 14 to obtain the wave aberration measurement error of the wavefront sensor 14, specifically: the wave aberration measured by the phase measuring interferometer 11 is subtracted from the wave aberration measured by the phase measuring interferometer 11 to obtain the wave front difference I caused by the phase difference plate 18 on the optical path where the phase measuring interferometer 11 is located, i.e. I is WI(x,y)-WIb(x,y);
The wavefront difference H caused by the fixed aberration on the optical path where the wavefront sensor 14 is located, that is, H ═ W, is obtained by subtracting the inherent wave aberration measured by the wavefront sensor 14 from the wave aberration measured by the wavefront sensor 14H(x,y)-WHb(x,y);
The two wavefront differences I and H are compared to obtain the wavefront aberration measurement error of the wavefront sensor 14.
Further, for the optical path where the phase measurement interferometer 11 is located, the light beam passes through the phase difference plate 18 twice, so that the wavefront difference H measured by the wavefront sensor 14 should be compared with 1/2 times of the wavefront difference I measured by the phase measurement interferometer 11, and the verification of the detection performance of the wavefront sensor 14 can be realized. In the embodiment, the wavefront sensor 14 and the phase measurement interferometer 11 measure the phase difference plate 18 at the same time, so that errors caused by repeatedly installing the phase difference plate 18 can be reduced, and errors of a measurement optical path can be effectively deducted through the inherent wave aberration of the measurement optical path.
Example 2
This embodiment is different from embodiment 1 in that an interferometer is used.
As shown in fig. 3 and 4, the detection device of the wavefront sensor 22 of the present embodiment includes: the fiber interferometer 21 is specifically a Mach-Zehnder type interferometer, a spectroscope 26, an adjusting device 23, a beam reduction lens group composed of a third lens 24 and a fourth lens 25, a phase difference plate 27 and a data acquisition and analysis system 28.
With continued reference to fig. 3 and 4, the fiber optic interferometer 21 includes: the device comprises a light source 211, a collimator 212, a beam splitter 213, a first reflector 214, a second reflector 215, a semi-transparent and semi-reflective mirror 216, a converging mirror 217 and a measuring detector 218, wherein light beams emitted by the light source 211 are collimated by the collimator 212 and then projected to the beam splitter 213 and are divided into two light beams by the beam splitter 213, one light beam is reflected by the first reflector 214 and projected to the beam splitter 26, and the other light beam is projected to the converging mirror 217 by the second reflector 215 and the semi-transparent and semi-reflective mirror 216; the beam splitter 26 projects a part of the received light beam to the wavefront sensor 22 through the beam reduction lens group, another part of the received light beam is projected to the converging mirror 217 through the semi-transparent and semi-reflective mirror 216, the converging mirror 217 projects the received light beam to the measurement detector 218, and the measurement detector 218 is connected with the data acquisition and analysis system 28.
Further, the phase plate difference 27 in this embodiment is detachably mounted between the beam splitter 213 and the first reflecting mirror 214, and also has one or more of coma, astigmatism, spherical aberration, and high-order spherical aberration, and a fixed phase difference can also be generated according to actual needs.
The detection method of the wavefront sensor 22 of the present embodiment is the same as that of embodiment 1:
when the phase difference plate 27 is provided, the optical fiber interferometer 21 and the wavefront sensor 22 measure the wave aberration W of the respective optical pathsI(x, y) and WH(x,y);
When the phase difference plate 27 is not provided, the optical fiber interferometer 21 and the wavefront sensor 22 measure the intrinsic wave aberration W of the respective optical pathsIb(x, y) and WHb(x, y) as background errors for the respective light paths;
similarly, the results of the measurements by the fiber interferometer 21 and the wavefront sensor 22 are calculated, and the wavefront difference I ═ W due to the phase difference plate 17 is obtainedI(x,y)-WIb(x, y) and H ═ WH(x,y)-WHb(x, y), comparing the I and the H, in this embodiment, for the optical paths where the optical fiber interferometer 21 and the wavefront sensor 22 are located, the light beams pass through the primary phase difference plate 18, so that the wavefront difference I measured by the optical fiber interferometer 21 can be directly compared with the wavefront difference H measured by the wavefront sensor 22, and the verification of the detection performance of the wavefront sensor 22 can be realized.
It will be apparent to those skilled in the art that various changes and modifications may be made in the invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (14)
1. A wavefront sensor sensing device, comprising:
an interferometer for generating a plane wave and measuring a wave aberration in an optical path;
the spectroscope is used for splitting the plane wave, so that one part of the plane wave is incident to the wavefront sensor, and the other part of the plane wave is projected to the interferometer;
the phase difference plate is detachably arranged in the light path at the upstream of the spectroscope and is used for introducing fixed aberration, and when the phase difference plate is in a detachable state, the interferometer and the wavefront sensor respectively measure the inherent wave aberration of the light path where the interferometer and the wavefront sensor are located and serve as background errors of the light path; when the phase difference plate is in an installation state, the interferometer and the wavefront sensor respectively measure the wave aberration of the optical path where the interferometer and the wavefront sensor are located;
the beam-shrinking lens group is used for changing the aperture of the wave front of the light beam so that the detected wave front can be completely incident to the wave front sensor;
and
and the data acquisition and analysis system is respectively connected with the interferometer and the wavefront sensor and is used for calculating the wave aberration measurement precision of the wavefront sensor.
2. The detecting device of a wavefront sensor as claimed in claim 1 wherein the interferometer is a phase measuring interferometer or a fiber optic interferometer.
3. The detecting device of a wavefront sensor as claimed in claim 2 wherein the optical fiber interferometer comprises: light source, collimating mirror, beam splitter, first, second mirror, semi-transparent semi-reflecting mirror, convergent mirror and measurement detector, the beam of light that the light source sent throws the beam splitter after the collimating mirror collimation to divide into two bundles by the beam splitter, a beam of light projects through first mirror reflection the beam splitter, another beam of light projects the convergent mirror through second mirror and semi-transparent semi-reflecting mirror, the beam splitter projects received light beam partly the convergent lens group, another part warp semi-transparent semi-reflecting mirror projects the convergent mirror, the convergent mirror projects received light beam the measurement detector, the measurement detector with data acquisition and analysis system connects.
4. The detecting device for a wavefront sensor as claimed in claim 3 wherein the phase difference plate is detachably mounted between the beam splitter and the first reflecting mirror.
5. The detecting device of a wavefront sensor as claimed in claim 2 wherein the phase difference plate is disposed between the phase measuring interferometer and the spectroscope.
6. The detecting device for a wavefront sensor as claimed in claim 2 wherein the phase measuring interferometer is mounted with a test light source.
7. The detecting unit for a wavefront sensor as claimed in claim 1 wherein the phase difference plate has one or more of coma aberration, astigmatism and spherical aberration.
8. The detecting device of a wavefront sensor as claimed in claim 1 wherein the beam reducing lens group comprises a beam reducing lens and a collimating lens arranged in sequence.
9. The apparatus for inspecting a wavefront sensor of claim 1 further comprising a position adjusting means, said wavefront sensor being fixed to said position adjusting means.
10. The apparatus for inspecting a wavefront sensor of claim 1 wherein the wavefront sensor is a shack-hartmann wavefront sensor.
11. A method for inspecting a wavefront sensor using the inspection apparatus according to any one of claims 1 to 10, comprising:
when the phase difference plate is installed, the interferometer and the wavefront sensor respectively measure the wave aberration of the optical path where the interferometer and the wavefront sensor are located;
when the phase difference plate is not installed, the interferometer and the wavefront sensor respectively measure the inherent wave aberration of the optical path where the interferometer and the wavefront sensor are located;
and calculating the measurement results of the interferometer and the wavefront sensor to obtain the wave aberration measurement error of the wavefront sensor.
12. The method for inspecting a wavefront sensor as claimed in claim 11 wherein the step of calculating the results of the measurements of the interferometer and the wavefront sensor to obtain the wavefront sensor measurement error comprises: subtracting the two-time wave aberration measured by the interferometer and provided with the phase difference plate and without the phase difference plate to obtain the wave front difference caused by the phase difference plate on the light path where the interferometer is located; and subtracting the two wave aberrations of the wavefront sensor, which are measured by the wavefront sensor and are provided with the phase difference plate, from the two wave aberrations of the optical path where the wavefront sensor is located, which are caused by the phase difference plate, and comparing the two wave aberrations to obtain the wave aberration measurement error of the wavefront sensor.
13. The method for detecting a wavefront sensor according to claim 12, wherein when the interferometer is a phase measurement interferometer, the calculation of the phase difference value at the corresponding position is performed on the wavefront difference of the optical path where the wavefront sensor is located and 1/2 times of the wavefront difference of the optical path where the interferometer is located.
14. The method for detecting a wavefront sensor as claimed in claim 12, wherein when the interferometer is a fiber interferometer, the wavefront difference of the optical path where the wavefront sensor is located and the wavefront difference of the optical path where the interferometer is located are calculated to obtain the corresponding position phase difference.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710210769.XA CN108663192B (en) | 2017-03-31 | 2017-03-31 | Detection device and method of wavefront sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710210769.XA CN108663192B (en) | 2017-03-31 | 2017-03-31 | Detection device and method of wavefront sensor |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108663192A CN108663192A (en) | 2018-10-16 |
CN108663192B true CN108663192B (en) | 2020-11-13 |
Family
ID=63784543
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710210769.XA Active CN108663192B (en) | 2017-03-31 | 2017-03-31 | Detection device and method of wavefront sensor |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108663192B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116294983B (en) * | 2023-02-28 | 2024-01-23 | 重庆米森科技有限公司 | Non-closed optical path wave front segmentation interferometer based on planar optical path design |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006284233A (en) * | 2005-03-31 | 2006-10-19 | Fujinon Corp | Apparatus for measuring system error and interferometer system for wavefront measurement equipped with the same |
JP2007170888A (en) * | 2005-12-20 | 2007-07-05 | Olympus Corp | Optical element testing device |
CN102889935A (en) * | 2012-09-14 | 2013-01-23 | 中国科学院光电技术研究所 | Self-adaptation optical system near-field wave-front sensor calibration device and calibration method based on phase-diversity method |
CN104236856B (en) * | 2014-09-10 | 2017-01-18 | 中国科学院上海光学精密机械研究所 | Wave aberration detection device of objective lens imaging system and system error correction method of wave aberration detection device |
CN104677507B (en) * | 2015-02-02 | 2017-12-05 | 中国科学院西安光学精密机械研究所 | Wide spectrum Shack Hartmann wave front sensor absolute calibration's device and method |
-
2017
- 2017-03-31 CN CN201710210769.XA patent/CN108663192B/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN108663192A (en) | 2018-10-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5004346A (en) | Method of examining an optical component | |
JPH08297009A (en) | Interferometer having micro-mirror | |
US6806965B2 (en) | Wavefront and intensity analyzer for collimated beams | |
CN102506750A (en) | Partial-compensation aspherical reflector surface shape detection method | |
US8400641B2 (en) | Interferometer for aspherical or spherical surface measurements | |
JP6000577B2 (en) | Aspherical surface measuring method, aspherical surface measuring device, optical element processing apparatus, and optical element manufacturing method | |
US20050179911A1 (en) | Aspheric diffractive reference for interferometric lens metrology | |
US20200173854A1 (en) | Optical measurement systems and methods thereof | |
Trivedi et al. | Measurement of focal length using phase shifted moiré deflectometry | |
CN104697464A (en) | Interference detection method for large-aperture convex non-spherical reflector based on compensating lens | |
US20030128368A1 (en) | Dispersive null-optics for aspheric surface and wavefront metrology | |
US20040174531A1 (en) | System for interferometric fit testing | |
JPH1163946A (en) | Methods for measuring shape and manufacturing high-precision lens | |
NL1035103C (en) | IMPROVED MOVEMENT MEASUREMENT SYSTEM. | |
CN108663192B (en) | Detection device and method of wavefront sensor | |
CN110736543B (en) | Shearing amount calibration device and method for grating shearing interference wavefront sensor | |
CN111256956A (en) | Wavefront measuring apparatus and wavefront measuring method | |
CN111998782A (en) | Optical measuring device and method | |
CN113984222B (en) | Online measuring device and measuring method for wavefront distortion of grating compressor | |
CN105806493B (en) | Compact non-aplanatism optical fiber point-diffraction interferometer based on spatial phase modulation | |
US20110134429A1 (en) | Birefringence measuring device and birefringence measuring method | |
CN108692819A (en) | A kind of Wave-front measurement system of wavelength tuning Hartmann sensor | |
JP2006284233A (en) | Apparatus for measuring system error and interferometer system for wavefront measurement equipped with the same | |
JPH116784A (en) | Device and method for measuring shape of aspherical surface | |
JP2000097622A (en) | Interferometer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |