CN108654547A - A kind of photosensitive resin synthesizer - Google Patents
A kind of photosensitive resin synthesizer Download PDFInfo
- Publication number
- CN108654547A CN108654547A CN201810672528.1A CN201810672528A CN108654547A CN 108654547 A CN108654547 A CN 108654547A CN 201810672528 A CN201810672528 A CN 201810672528A CN 108654547 A CN108654547 A CN 108654547A
- Authority
- CN
- China
- Prior art keywords
- reactor
- photosensitive resin
- reactors
- resin synthesizer
- charge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011347 resin Substances 0.000 title claims abstract description 20
- 229920005989 resin Polymers 0.000 title claims abstract description 20
- 238000001514 detection method Methods 0.000 claims abstract description 4
- 239000000945 filler Substances 0.000 claims description 7
- 241000272814 Anser sp. Species 0.000 claims description 3
- 229910021536 Zeolite Inorganic materials 0.000 claims description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical group O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 3
- 239000010457 zeolite Substances 0.000 claims description 3
- 238000003756 stirring Methods 0.000 claims 1
- 239000004575 stone Substances 0.000 claims 1
- 238000005265 energy consumption Methods 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000013067 intermediate product Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000011435 rock Substances 0.000 description 2
- HBGPNLPABVUVKZ-POTXQNELSA-N (1r,3as,4s,5ar,5br,7r,7ar,11ar,11br,13as,13br)-4,7-dihydroxy-3a,5a,5b,8,8,11a-hexamethyl-1-prop-1-en-2-yl-2,3,4,5,6,7,7a,10,11,11b,12,13,13a,13b-tetradecahydro-1h-cyclopenta[a]chrysen-9-one Chemical compound C([C@@]12C)CC(=O)C(C)(C)[C@@H]1[C@H](O)C[C@]([C@]1(C)C[C@@H]3O)(C)[C@@H]2CC[C@H]1[C@@H]1[C@]3(C)CC[C@H]1C(=C)C HBGPNLPABVUVKZ-POTXQNELSA-N 0.000 description 1
- PFRGGOIBYLYVKM-UHFFFAOYSA-N 15alpha-hydroxylup-20(29)-en-3-one Natural products CC(=C)C1CCC2(C)CC(O)C3(C)C(CCC4C5(C)CCC(=O)C(C)(C)C5CCC34C)C12 PFRGGOIBYLYVKM-UHFFFAOYSA-N 0.000 description 1
- SOKRNBGSNZXYIO-UHFFFAOYSA-N Resinone Natural products CC(=C)C1CCC2(C)C(O)CC3(C)C(CCC4C5(C)CCC(=O)C(C)(C)C5CCC34C)C12 SOKRNBGSNZXYIO-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/18—Stationary reactors having moving elements inside
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0053—Details of the reactor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00076—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements inside the reactor
- B01J2219/00081—Tubes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Production Of Liquid Hydrocarbon Mixture For Refining Petroleum (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
- Polymerisation Methods In General (AREA)
Abstract
The invention discloses a kind of photosensitive resin synthesizers, including No.1 reactor and No. two reactors, are connected by the pipeline with oil pump between the No.1 reactor and No. two reactors；The No.1 reactor head is equipped with No.1 charge door, No. two charge doors and temperature detection mouth, and No.1 inside reactor is equipped with the oil pipe for being connected to external heater；No. two tops are equipped with No. three charge doors, bottom is equipped with discharge port.The configuration of the present invention is simple, design science, energy consumption is small, and floor space is small, it can be achieved that the integral type of photosensitive resin synthesizes.
Description
Technical field
The invention belongs to photosensitive material chemical technology fields, and in particular to a kind of photosensitive resin synthesizer.
Background technology
With the extension of promotion and the application of LCD Technology, the colorization of photosensitive element is also just being opened by positive
Hair, especially colored photoresist are increasingly paid close attention to by researcher.Basic framework of the resin as photoresist is that wherein accounting is most
Big component determines the main performance of photoresist after exposure.Resin typically refer to it is heated after be softened or melted range, when softening
There is liquidity preference under outer force effect, be solid-state, semisolid under room temperature, can also be the organic polymer of liquid sometimes.Numerous
In resin, photosensitive resin is the preferred material of photoresist, and photosensitive resin generally needs repeatedly to mix and heat in the preparation, tradition
Device consumes energy greatly in preparation process, takes up a large area, productivity is low.
Invention content
Goal of the invention：In view of the above-mentioned deficiencies in the prior art, it is an object of the present invention to provide a kind of photosensitive resin synthesizer.
Technical solution：In order to reach foregoing invention purpose, what the present invention was specifically performed by：A kind of photosensitive resin conjunction
At device, including No.1 reactor and No. two reactors, by with oil pump between the No.1 reactor and No. two reactors
Pipeline connects；The No.1 reactor head is equipped with No.1 charge door, No. two charge doors and temperature detection mouth, in No.1 reactor
Portion is equipped with the oil pipe for being connected to external heater；No. two tops are equipped with No. three charge doors, bottom is equipped with discharge port.
Wherein, the oil pipe outside the No.1 reactor is equipped with No.1 oil pump, facilitates the cycle of heating oil in oil pipe.
Wherein, the No.1 reactor bottom laying light filler facilitates the intermediate product in No.1 reactor can be more just
Promptly No. two reactors are pumped into pipeline；Wherein it is preferred to which the light filler is zeolite, goose soft rock or rubble grain.
Wherein, it is equipped with blender in No. two reactors, further increases mixing efficiency.
When specific works of the present invention, the material of first step reaction is added to No.1 reactor, starts heater and No.1 oil
It pumps and the heating oil in oil pipe is heated so that heating oil is recycled in No.1 reactor, controlling reaction temperature, and heating oil can
To regulate and control as needed into trip temperature（Steam heating is generally required close to 100 DEG C, can not freely be adjusted, and in photosensitive resin one
Typically up to temperature is no more than 85 DEG C when secondary heating synthesis）；When material hybrid reaction after a certain period of time, is opened in No.1 reactor
Intermediate product is imported No. two reactors and carries out secondary response by oil pump（In secondary response, temperature often only needs control 45
~ 60 °, therefore the intermediate product in No.1 reactor can flow into No. two reactors by the length of control pipeline to control it
Interior temperature need not additionally heat energy consumption）, photosensitive resin can be synthesized after a certain period of time in reaction.
Advantageous effect：The present invention has the following advantages compared with traditional technology：
（1）The configuration of the present invention is simple, design science, energy consumption is small, and floor space is small, it can be achieved that the integral type of photosensitive resin synthesizes；
（2）The present invention can further increase combined coefficient and reduce artificial input, reduce production cost；
（3）The present invention is in specific production, it is only necessary to provide the energy consumption of oil pump, blender and heater, effect is small, and environmentally friendly nothing
Pollution.
Description of the drawings
Fig. 1 is the structural diagram of the present invention.
Specific implementation mode
Embodiment 1：
A kind of photosensitive resin synthesizer as shown in Figure 1, including No.1 reactor 1 and No. two reactors 2, the No.1 reaction
It is connected by the pipeline 4 with oil pump 3 between device 1 and No. two reactors 2；1 top of the No.1 reactor is equipped with No.1 charge door
5, No. two charge doors 6 and temperature detection mouth 7, No.1 reactor 1 are internally provided with the oil pipe 9 for being connected to external heater 8；Described two
It is equipped with discharge port 11 equipped with No. three charge doors 10, bottom at the top of number, the oil pipe outside the No.1 reactor is equipped with No.1 oil
Pump 12, No. two reactors are interior to be equipped with blender 14.
Embodiment 2
Reference implementation example 1, the No.1 reactor bottom are laid with light filler 13, and light filler is zeolite, goose soft rock or rubble
Grain, in this way the advantages of design are, when pipeline is by oil pump pump oil, whirlpool can be formed positioned at pipeline and No.1 reactor junction
Whirlpool, being conducive to the conveying of material can make scroll at multiple small-sized whirlpools, be more advantageous to object after design is laid with light filler
Material mixing and conveying.
Claims (5)
1. a kind of photosensitive resin synthesizer, which is characterized in that including No.1 reactor（1）With No. two reactors（2）, described one
Number reactor（1）With No. two reactors（2）Between pass through band oil pump（3）Pipeline（4）Connection；The No.1 reactor（1）Top
Portion is equipped with No.1 charge door（5）, No. two charge doors（6）And temperature detection mouth（7）, No.1 reactor（1）It is internally provided with and is connected to
External heater（8）Oil pipe（9）；No. two tops are equipped with No. three charge doors（10）, bottom be equipped with discharge port（11）.
2. photosensitive resin synthesizer according to claim 1, which is characterized in that the oil pipe outside the No.1 reactor
It is equipped with No.1 oil pump（12）.
3. photosensitive resin synthesizer according to claim 1 or 2, which is characterized in that the No.1 reactor bottom paving
If light filler（13）.
4. photosensitive resin synthesizer according to claim 3, which is characterized in that the light filler is zeolite, goose is soft
Stone or rubble grain.
5. photosensitive resin synthesizer according to claim 3, which is characterized in that be equipped with stirring in No. two reactors
Device（14）.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810672528.1A CN108654547A (en) | 2018-06-26 | 2018-06-26 | A kind of photosensitive resin synthesizer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810672528.1A CN108654547A (en) | 2018-06-26 | 2018-06-26 | A kind of photosensitive resin synthesizer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108654547A true CN108654547A (en) | 2018-10-16 |
Family
ID=63773106
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810672528.1A Pending CN108654547A (en) | 2018-06-26 | 2018-06-26 | A kind of photosensitive resin synthesizer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108654547A (en) |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1402169A (en) * | 1971-12-09 | 1975-08-06 | Texaco Ag | Condensation resins |
| CN1861248A (en) * | 2005-05-12 | 2006-11-15 | 冯星起 | Pipeline type reactor used for organic synthesis |
| JP2010155960A (en) * | 2008-12-26 | 2010-07-15 | Songwon Industrial Co Ltd | Method for producing photosensitive polymer |
| CN102143985A (en) * | 2008-06-30 | 2011-08-03 | 巴斯夫涂料有限公司 | Process for continuous production of epoxy resins |
| CN102690408A (en) * | 2012-05-28 | 2012-09-26 | 广东德康化工实业有限公司 | Method of using swill-cooked dirty oil to synthesize photo-cured resin |
| CN202590771U (en) * | 2012-06-06 | 2012-12-12 | 江西宏特绝缘材料有限公司 | Heating device for reaction kettle |
| CN103467684A (en) * | 2013-09-19 | 2013-12-25 | 韦潇 | Rosin modified phenolic resin producing equipment |
| CN104150657A (en) * | 2014-07-25 | 2014-11-19 | 中国环境科学研究院 | Sewage three-level effluent advanced treatment device and treatment method |
| CN204762878U (en) * | 2015-06-29 | 2015-11-18 | 广东博宇集团有限公司 | Aquarium water -filtering device |
| CN106842817A (en) * | 2017-02-15 | 2017-06-13 | 上海集成电路研发中心有限公司 | A kind of photoetching compositions and preparation method thereof |
| CN206661231U (en) * | 2017-04-25 | 2017-11-24 | 山东宇世巨化工有限公司 | The phenolic resin process units of pneumatic feed |
| CN209020369U (en) * | 2018-06-26 | 2019-06-25 | 江苏博砚电子科技有限公司 | A kind of photosensitive resin synthesizer |
-
2018
- 2018-06-26 CN CN201810672528.1A patent/CN108654547A/en active Pending
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1402169A (en) * | 1971-12-09 | 1975-08-06 | Texaco Ag | Condensation resins |
| CN1861248A (en) * | 2005-05-12 | 2006-11-15 | 冯星起 | Pipeline type reactor used for organic synthesis |
| CN102143985A (en) * | 2008-06-30 | 2011-08-03 | 巴斯夫涂料有限公司 | Process for continuous production of epoxy resins |
| JP2010155960A (en) * | 2008-12-26 | 2010-07-15 | Songwon Industrial Co Ltd | Method for producing photosensitive polymer |
| CN102690408A (en) * | 2012-05-28 | 2012-09-26 | 广东德康化工实业有限公司 | Method of using swill-cooked dirty oil to synthesize photo-cured resin |
| CN202590771U (en) * | 2012-06-06 | 2012-12-12 | 江西宏特绝缘材料有限公司 | Heating device for reaction kettle |
| CN103467684A (en) * | 2013-09-19 | 2013-12-25 | 韦潇 | Rosin modified phenolic resin producing equipment |
| CN104150657A (en) * | 2014-07-25 | 2014-11-19 | 中国环境科学研究院 | Sewage three-level effluent advanced treatment device and treatment method |
| CN204762878U (en) * | 2015-06-29 | 2015-11-18 | 广东博宇集团有限公司 | Aquarium water -filtering device |
| CN106842817A (en) * | 2017-02-15 | 2017-06-13 | 上海集成电路研发中心有限公司 | A kind of photoetching compositions and preparation method thereof |
| CN206661231U (en) * | 2017-04-25 | 2017-11-24 | 山东宇世巨化工有限公司 | The phenolic resin process units of pneumatic feed |
| CN209020369U (en) * | 2018-06-26 | 2019-06-25 | 江苏博砚电子科技有限公司 | A kind of photosensitive resin synthesizer |
Non-Patent Citations (1)
| Title |
|---|
| 朱德祥等, 西安：西安交通大学出版社 * |
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|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181016 |
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| RJ01 | Rejection of invention patent application after publication |