CN108636086A - A kind of heating plant of purification manufacture of semiconductor exhaust gas - Google Patents
A kind of heating plant of purification manufacture of semiconductor exhaust gas Download PDFInfo
- Publication number
- CN108636086A CN108636086A CN201810753931.7A CN201810753931A CN108636086A CN 108636086 A CN108636086 A CN 108636086A CN 201810753931 A CN201810753931 A CN 201810753931A CN 108636086 A CN108636086 A CN 108636086A
- Authority
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- China
- Prior art keywords
- reaction chamber
- exhaust gas
- thermal reaction
- heating plant
- purification
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 43
- 238000000746 purification Methods 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 239000004065 semiconductor Substances 0.000 title claims abstract description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 63
- 238000006243 chemical reaction Methods 0.000 claims abstract description 51
- 239000007789 gas Substances 0.000 claims abstract description 47
- 238000010992 reflux Methods 0.000 claims abstract description 23
- 239000002912 waste gas Substances 0.000 claims abstract description 8
- 238000007789 sealing Methods 0.000 claims description 4
- 230000004044 response Effects 0.000 claims description 2
- 239000000126 substance Substances 0.000 abstract description 10
- 239000000428 dust Substances 0.000 abstract description 7
- 239000012535 impurity Substances 0.000 abstract description 4
- 238000009825 accumulation Methods 0.000 abstract description 3
- 238000011161 development Methods 0.000 abstract description 3
- 239000007787 solid Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 238000004887 air purification Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 230000009102 absorption Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 239000002440 industrial waste Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000003809 water extraction Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/76—Gas phase processes, e.g. by using aerosols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/005—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by heat treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/346—Controlling the process
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24H—FLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
- F24H1/00—Water heaters, e.g. boilers, continuous-flow heaters or water-storage heaters
- F24H1/0072—Special adaptations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
Abstract
The present invention provides a kind of heating plant of purification manufacture of semiconductor exhaust gas, is related to heating plant technical field.The heating plant of the purification manufacture of semiconductor exhaust gas, including thermal reaction chamber, the inside of the thermal reaction chamber is installed with inner cavity, the upper end outer surface of the thermal reaction chamber is installed with exhaust gas entrance, the right side outer surface of the thermal reaction chamber is installed with waste gas outlet, the interior surface of the thermal reaction chamber is provided with filter plate, and the inner wall of the thermal reaction chamber is installed with reflux line, the first water pump is installed on the left of the exhaust gas entrance.The heating plant of the purification manufacture of semiconductor exhaust gas, water resource is allowed to be recycled, be conducive to sustainable development, vapor is coordinated to purify the harmful substance in exhaust gas simultaneously, improve the purification efficiency to harmful substance, it prevents from, in the excessive dust of thermal reaction chamber inner accumulation and impurity, influencing the running of the heating plant.
Description
Technical field
The present invention relates to heating plant technical field, specially a kind of heating plant of purification manufacture of semiconductor exhaust gas.
Background technology
During semiconductor production, a large amount of industrial waste gas is will produce, these exhaust gas are divided into acid, alkaline, organic
And poisonous fume, it is general using the methods of washing, oxidation, burning, absorption, dissociation and condensation, if without good processing
It is discharged, serious problem will be caused, not only endanger the health of people, deteriorated atmospheric environment, cause environmental pollution.
And the mode of hot-air purification exhaust gas is usually used in traditional manufacture of semiconductor exhaust gas heating plant, draws from the external world
Enter high-temperature hot air, allow high-temperature hot air and exhaust gas to generate and react, wherein harmful substance is purified, without recycling
Effect, certain waste is caused to resource.
Invention content
In view of the deficiencies of the prior art, it the present invention provides a kind of heating plant of purification manufacture of semiconductor exhaust gas, solves
The hot-air purification exhaust gas that above-mentioned background technology proposes does not have the problem of recycling effect.
Technical solution
In order to achieve the above object, the present invention is achieved by the following technical programs：A kind of purification manufacture of semiconductor exhaust gas
Heating plant, including thermal reaction chamber, the inside of the thermal reaction chamber is installed with inner cavity, outside the upper end of the thermal reaction chamber
Surface is installed with exhaust gas entrance, and the right side outer surface of the thermal reaction chamber is installed with waste gas outlet, the thermal response
The interior surface of room is provided with filter plate, and the inner wall of the thermal reaction chamber is installed with reflux line, a left side for the exhaust gas entrance
Side is installed with the first water pump, and heat source room, the inner bottom of the heat source room are installed on the right side of the thermal reaction chamber
It is installed with heating machine, water cavity is installed with above the heating machine, pumping is installed at the top of the heat source room
The lower end outer surface of wind turbine, the exhaust fan is installed with air intake duct, and the inner wall top of the thermal reaction chamber is installed with
The inside left position of escape pipe, the heat source room is installed with water outlet, and the left outer surface of the heat source room fixes peace
Equipped with the second water pump, a side external surface of the filter plate is installed with sliding block, and the inner wall of the thermal reaction chamber is installed with
The leading exterior surface of sliding slot, the filter plate is installed with handle, and the outer surface of the thermal reaction chamber is movably installed with safety door,
The right side outer surface of the safety door is movably installed with lock.
Further, be fixedly connected between first water pump and reflux line, the reflux line and the second water pump it
Between be fixedly connected, and be fixedly connected between reflux line and heat source room, be fixedly connected between the water outlet and reflux line.
Further, the upper end outer surface of the water cavity is communicated with water inlet, and is fixedly mounted between water cavity and heating machine
There is heat-conducting layer.
Further, it is fixedly connected between the escape pipe and exhaust fan, the rear end of the exhaust fan is installed with electricity
Machine.
Further, it is flexibly connected between the sliding block and sliding slot, the outer surface of the filter plate offers filter hole, filtering
The quantity in hole is several groups.
Further, sealing ring, the lock and thermal reaction chamber are installed at the inner surface edge of the safety door
Between be flexibly connected.
Further, the left outer surface of the thermal reaction chamber is installed with controller, and the inside of the heat source room is solid
Dingan County is equipped with temperature sensor, and the output end of controller and the input terminal of temperature sensor are electrically connected.
Advantageous effect
Compare the prior art：
1, the heating plant of the purification manufacture of semiconductor exhaust gas passes through inner cavity, reflux line, the first water pump, heating machine, water
The cooperation of chamber, exhaust fan, air intake duct, escape pipe and the second water pump, heating machine heat water cavity, are then set when temperature reaches
After definite value, temperature sensor senses simultaneously send a signal to controller, and vapor is then generated inside water cavity, and controller controls exhausting
Machine is opened, and steam is then extracted into thermal reaction chamber, while delivery is entered reflux line by the second water pump, in thermal reaction chamber
At wall after one circle of cycle, by the first water pump by delivery backwater cavity, continues to heat, so recycle, to thermal reaction chamber inside
Temperature improved, allow water resource to be recycled, be conducive to sustainable development, while coordinating vapor to exhaust gas
In harmful substance purified, improve the purification efficiency to harmful substance.
2, the heating plant of the purification manufacture of semiconductor exhaust gas, passes through matching for filter plate, sliding block, sliding slot, safety door and lock
It closes, solid dust and the solid residue of harmful substance is will produce during to waste gas purification, filter plate is collected it, so
While maintenance personnel carries out periodic maintenance to the heating plant afterwards, opens safety door and filter plate is pulled out into sliding slot, filter plate is carried out
Cleaning, prevents from, in the excessive dust of thermal reaction chamber inner accumulation and impurity, influencing the running of the heating plant.
Description of the drawings
Fig. 1 is overall structure of the present invention；
Fig. 2 is the thermal reaction chamber front view of the present invention；
Fig. 3 is the filter-plate structure figure of the present invention.
In figure：1 thermal reaction chamber, 2 inner cavities, 3 exhaust gas entrances, 4 waste gas outlets, 5 filter plates, 6 reflux lines, 7 first water pumps, 8
Heat source room, 9 heating machines, 10 water cavities, 11 exhaust fans, 12 air intake ducts, 13 escape pipes, 14 water outlets, 15 second water pumps, 16 sliding blocks,
17 sliding slots, 18 handles, 19 safety doors, 20 locks.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
As shown in Figs. 1-3, the embodiment of the present invention provides a kind of heating plant of purification manufacture of semiconductor exhaust gas, including heat is instead
Room 1, the left outer surface of thermal reaction chamber 1 is answered to be installed with controller, the inside of heat source room 8 is installed with temperature sensing
Device, the output end of controller and the input terminal of temperature sensor are electrically connected, and the inside of thermal reaction chamber 1 is installed with inner cavity 2,
The upper end outer surface of thermal reaction chamber 1 is installed with exhaust gas entrance 3, and the right side outer surface of thermal reaction chamber 1 is installed with exhaust gas
Outlet 4, the interior surface of thermal reaction chamber 1 is provided with filter plate 5, and the inner wall of thermal reaction chamber 1 is installed with reflux line 6, exhaust gas
The left side of entrance 3 is installed with the first water pump 7, is fixedly connected between the first water pump 7 and reflux line 6, reflux line 6 and
It is fixedly connected between two water pumps 15, and is fixedly connected between reflux line 6 and heat source room 8, between water outlet 14 and reflux line 6
It being fixedly connected, the right side of thermal reaction chamber 1 is installed with heat source room 8, and the inner bottom of heat source room 8 is installed with heating machine 9,
The top of heating machine 9 is installed with water cavity 10, and the upper end outer surface of water cavity 10 is communicated with water inlet, and water cavity 10 and heating machine
Heat-conducting layer is installed between 9, the top of heat source room 8 is installed with exhaust fan 11, and the lower end outer surface of exhaust fan 11 is solid
Dingan County is equipped with air intake duct 12, and the inner wall top of thermal reaction chamber 1 is installed with escape pipe 13, between escape pipe 13 and exhaust fan 11
It is fixedly connected, the rear end of exhaust fan 11 is installed with motor, is fixedly connected between escape pipe 13 and exhaust fan 11, exhaust fan 11
Rear end be installed with motor, the inside left position of heat source room 8 is installed with water outlet 14, outside the left side of heat source room 8
Surface is installed with the second water pump 15, passes through inner cavity 2, reflux line 6, the first water pump 7, heating machine 9, water cavity 10, exhaust fan
11, the cooperation of air intake duct 12, escape pipe 13 and the second water pump 15, exhaust gas enter from exhaust gas entrance 3 in inner cavity 2, and heating machine 9 is to water
Chamber 10 is heated, and then after temperature reaches setting value, temperature sensor senses simultaneously send a signal to controller, then water cavity
10 inside generate vapor, and controller controls exhaust fan 11 and opens, and steam is then extracted into thermal reaction chamber 1, while the second water pump
Delivery is entered reflux line 6 by 15, after one circle of cycle at 1 inner wall of thermal reaction chamber, is returned delivery by the first water pump 7
In water cavity 10, continue to heat, so recycles, the temperature inside thermal reaction chamber 1 is improved, water resource is allowed to be recycled
It utilizes, is conducive to sustainable development, while vapor being coordinated to purify the harmful substance in exhaust gas, improves to nuisance
One side external surface of the purification efficiency of matter, filter plate 5 is installed with sliding block 16, is flexibly connected between sliding block 16 and sliding slot 17, filter
The outer surface of plate 5 offers filter hole, and the quantity of filter hole is several groups, and the inner wall of thermal reaction chamber 1 is installed with sliding slot 17,
The leading exterior surface of filter plate 5 is installed with handle 18, and the outer surface of thermal reaction chamber 1 is movably installed with safety door 19, safety door
It is installed with sealing ring at 19 inner surface edge, is flexibly connected between lock 20 and thermal reaction chamber 1, the right side of safety door 19
Outer surface is movably installed with lock 20, by filter plate 5, sliding block 16, sliding slot 17, safety door 19 and the cooperation for latching 20, to useless
It will produce solid dust and the solid residue of harmful substance in gas purification process, filter plate 5 is collected it, then safeguards people
While member carries out periodic maintenance to the heating plant, opens safety door 19 and filter plate 5 is pulled out into sliding slot 17, filter plate 5 is carried out clearly
It washes, prevents from, in the excessive dust of 1 inner accumulation of thermal reaction chamber and impurity, influencing the running of the heating plant, after the completion of purification, reaching
After discharge standard, opens waste gas outlet 4 and exhaust gas is discharged.
Operation principle：Heating machine 9 is internally heated water cavity 10 first, after water reaches suitable temperature, temperature sensing
Device senses signal and is sent to controller, and then controller control exhaust fan is opened, by the vapor that hot water generates convey into
Enter in inner cavity 2, while exhaust gas enters from exhaust gas entrance 3 in inner cavity 2, vapor and exhaust gas interreaction, to harmful in exhaust gas
Substance is purified, while hot water is pumped into from water cavity 10 in reflux line 6 by the second water pump 15, and then the first water pump 7 again will be warm
Water extraction reflux line 6, which is poured into again in water cavity 10, to be heated, and is so recycled, hot water is in cyclic process to thermal reaction chamber 1
Internal temperature is further heated, and accelerates the purification efficiency of exhaust gas, water resource is allowed to be recycled, and is conducive to hold
Supervention exhibition, will produce many solid-state harmful substance residuals during waste gas purification and dust, filter plate 5 are collected it, tie up
Shield personnel are while periodically safeguarding the heating plant, by opening safety door 19, the sealing ring of 19 inside of safety door
There is good leakproofness to 1 inside of thermal reaction chamber, filter plate 5 is extracted out from sliding slot 17, it is cleared up, is prevented hot anti-
It answers chamber interior to accumulate excessive dust and impurity, influences the purification efficiency of exhaust gas and influence the running of the heating plant, purified
Cheng Hou after reaching discharge standard, opens waste gas outlet 4 and exhaust gas is discharged.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
Understanding without departing from the principles and spirit of the present invention can carry out these embodiments a variety of variations, modification, replace
And modification, the scope of the present invention is defined by the appended.
Claims (7)
1. a kind of heating plant of purification manufacture of semiconductor exhaust gas, including thermal reaction chamber (1), it is characterised in that：The thermal response
The inside of room (1) is installed with inner cavity (2), and the upper end outer surface of the thermal reaction chamber (1) is installed with exhaust gas entrance
(3), the right side outer surface of the thermal reaction chamber (1) is installed with waste gas outlet (4), the inside table of the thermal reaction chamber (1)
Face is provided with filter plate (5), and the inner wall of the thermal reaction chamber (1) is installed with reflux line (6), the exhaust gas entrance (3)
Left side is installed with the first water pump (7), and heat source room (8), the heat source room are installed on the right side of the thermal reaction chamber (1)
(8) inner bottom is installed with heating machine (9), and water cavity (10), the heat are installed with above the heating machine (9)
Exhaust fan (11) is installed at the top of source chamber (8), the lower end outer surface of the exhaust fan (11) is installed with air intake duct
(12), the inner wall top of the thermal reaction chamber (1) is installed with escape pipe (13), the inside left position of the heat source room (8)
It sets and is installed with water outlet (14), the left outer surface of the heat source room (8) is installed with the second water pump (15), the filter
One side external surface of plate (5) is installed with sliding block (16), and the inner wall of the thermal reaction chamber (1) is installed with sliding slot (17),
The leading exterior surface of the filter plate (5) is installed with handle (18), and the outer surface of the thermal reaction chamber (1) is movably installed with peace
The right side outer surface of air cock (19), the safety door (19) is movably installed with lock (20).
2. a kind of heating plant of purification manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：Described first
It is fixedly connected between water pump (7) and reflux line (6), is fixedly connected between the reflux line (6) and the second water pump (15), and
It is fixedly connected between reflux line (6) and heat source room (8), is fixedly connected between the water outlet (14) and reflux line (6).
3. a kind of heating plant of purification manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：The water cavity
(10) upper end outer surface is communicated with water inlet, and is installed with heat-conducting layer between water cavity (10) and heating machine (9).
4. a kind of heating plant of purification manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：The outlet
It is fixedly connected between pipe (13) and exhaust fan (11), the rear end of the exhaust fan (11) is installed with motor.
5. a kind of heating plant of purification manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：The sliding block
(16) it is flexibly connected between sliding slot (17), the outer surface of the filter plate (5) offers filter hole, and the quantity of filter hole is several
Group.
6. a kind of heating plant of purification manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：The safety
It is installed with sealing ring at the inner surface edge of door (19), is flexibly connected between lock (20) and the thermal reaction chamber (1).
7. a kind of heating plant of purification manufacture of semiconductor exhaust gas according to claim 1, it is characterised in that：The heat is anti-
The left outer surface of room (1) is answered to be installed with controller, the inside of the heat source room (8) is installed with temperature sensor,
The output end of controller and the input terminal of temperature sensor are electrically connected.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810753931.7A CN108636086A (en) | 2018-07-11 | 2018-07-11 | A kind of heating plant of purification manufacture of semiconductor exhaust gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810753931.7A CN108636086A (en) | 2018-07-11 | 2018-07-11 | A kind of heating plant of purification manufacture of semiconductor exhaust gas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108636086A true CN108636086A (en) | 2018-10-12 |
Family
ID=63751556
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810753931.7A Pending CN108636086A (en) | 2018-07-11 | 2018-07-11 | A kind of heating plant of purification manufacture of semiconductor exhaust gas |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108636086A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110252108A (en) * | 2019-05-19 | 2019-09-20 | 南京汇科高分子材料有限公司 | Modified isocyanate exhaust gas adsorption tower |
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|---|---|---|---|---|
| US20050175521A1 (en) * | 2004-02-09 | 2005-08-11 | Wu-Niang Feng | Method for cleaning harmful materials in semiconductor waste gas |
| CN102824827A (en) * | 2012-09-04 | 2012-12-19 | 德清天皓环保科技有限公司 | Low-temperature plasma organic waste gas purifying device |
| CN206160556U (en) * | 2016-10-28 | 2017-05-10 | 王越 | Reation kettle heat recovery heat pump system with clean function of waste water |
| CN106799114A (en) * | 2015-11-26 | 2017-06-06 | 东服企业股份有限公司 | Method and device for purifying fluoride in waste gas of semiconductor process |
| CN206304373U (en) * | 2016-11-02 | 2017-07-07 | 现代（三河）工程塑料有限公司 | A kind of thermal-insulating type chemical industry concentration evaporator for being easy to clean |
| CN208678773U (en) * | 2018-07-11 | 2019-04-02 | 安徽京仪自动化装备技术有限公司 | A kind of heating plant purifying manufacture of semiconductor exhaust gas |
-
2018
- 2018-07-11 CN CN201810753931.7A patent/CN108636086A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050175521A1 (en) * | 2004-02-09 | 2005-08-11 | Wu-Niang Feng | Method for cleaning harmful materials in semiconductor waste gas |
| CN102824827A (en) * | 2012-09-04 | 2012-12-19 | 德清天皓环保科技有限公司 | Low-temperature plasma organic waste gas purifying device |
| CN106799114A (en) * | 2015-11-26 | 2017-06-06 | 东服企业股份有限公司 | Method and device for purifying fluoride in waste gas of semiconductor process |
| CN206160556U (en) * | 2016-10-28 | 2017-05-10 | 王越 | Reation kettle heat recovery heat pump system with clean function of waste water |
| CN206304373U (en) * | 2016-11-02 | 2017-07-07 | 现代（三河）工程塑料有限公司 | A kind of thermal-insulating type chemical industry concentration evaporator for being easy to clean |
| CN208678773U (en) * | 2018-07-11 | 2019-04-02 | 安徽京仪自动化装备技术有限公司 | A kind of heating plant purifying manufacture of semiconductor exhaust gas |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110252108A (en) * | 2019-05-19 | 2019-09-20 | 南京汇科高分子材料有限公司 | Modified isocyanate exhaust gas adsorption tower |
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| PB01 | Publication | ||
| PB01 | Publication | ||
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181012 |