CN108581817A - A kind of Fenton auxiliary three-phase flow dynamic pressure cavitation polishing SiC optical surface method and devices - Google Patents
A kind of Fenton auxiliary three-phase flow dynamic pressure cavitation polishing SiC optical surface method and devices Download PDFInfo
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- CN108581817A CN108581817A CN201810281076.4A CN201810281076A CN108581817A CN 108581817 A CN108581817 A CN 108581817A CN 201810281076 A CN201810281076 A CN 201810281076A CN 108581817 A CN108581817 A CN 108581817A
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
- B24B31/116—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using plastically deformable grinding compound, moved relatively to the workpiece under the influence of pressure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/04—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/12—Accessories; Protective equipment or safety devices; Installations for exhaustion of dust or for sound absorption specially adapted for machines covered by group B24B31/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
A kind of Fenton auxiliary three-phase flow dynamic pressure cavitation polishing SiC optical surface methods, the part by SiC workpiece without processing first is wrapped up with barrier material, then SiC workpiece is soaked in the reaction tank equipped with Fenton reagent；After reacting a period of time, workpiece is taken out and is fixed in polishing liquid container with fixture；Pose of the cylindrical polishing tool of serial-parallel mirror polished land control relative to workpiece, makes polishing tool remain that a small processing gap, tool are completely submerged in workpiece in polishing fluid with workpiece surface；Cylindrical polishing tool high speed rotation, ultrasonic bubble generating mechanism is driven constantly to adjust pose of the amplitude transformer relative to dynamic pressure region by servo motor, as polishing carries out, abrasive particle flow circulating system carries out circulation conveying to the abrasive grain in polishing container.And provide a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation polishing SiC optical surfaces.The present invention improves polishing efficiency under the premise of not causing the damage on surface and sub-surface.
Description
Technical field
The present invention relates to Ultraprecision Machining fields, it is proposed that a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation polishing SiC
Optical surface method and device.
Background technology
With the development of science and technology, electronic information manufacturing industry has become the basic and strategic industry of country, together
When the industry technical merit and development scale also become country technical innovation level and overall national strength one of mark.Light
The manufacture of electronics and microelectronics is then the current core content of electronic information manufacturing industry.The development of microelectronics and photoelectron technology makes
The performance requirement of electronic device is higher and higher.SiC as third generation semi-conducting material possesses numerous notable compared to preceding two generation
Advantage, such as：With smaller dielectric constant, big energy gap, high critical breakdown strength, high heat conductance, high electron mobility
Equal good characteristics.However atomic space structure special SiC determines that monocrystal SiC is that a kind of stable structure, hard texture are crisp, wear-resisting
Property the atomic crystal stablized of good, chemical property.Sizable fricting shearing is needed using traditional polishing method polishing SiC material
Power is easy residual microfissure, leads to that processing efficiency is low, equipment loss is fast, abrasive material selection limitation is big and high processing costs.
The main method of polishing SiC material is aoxidized in Fenton's reaction using the mechanical polishing method of Fenton auxiliary at present
Workpiece surface is polished using polishing tools such as abrasive disks on the basis of SiC workpiece surfaces.However the method is only limited to
In the SiC workpiece of surface polishing.Want polishing free form surface SiC workpiece, needs to utilize other Machining Technology of Super Smooth Surface.
Existing Machining Technology of Super Smooth Surface, is totally segmented into two classes, and one kind is in direct contact by machining tool and workpiece surface
It is processed, such as：Traditional grinding, polishing etc. carried out as tool using abrasive band, grinding wheel or other flexible materials.This
Class processing method utilizes the micro-cutting that the fine abrasive grains on tool form workpiece surface to remove micro- protuberance of workpiece surface, with
Achieve the effect that polishing.Although processing efficiency is higher, also there is certain and limitation.
1. the particle size due to abrasive grain differs, cause the Abrasive Polishing active force of tool surfaces uneven, unavoidably
Is caused to workpiece by surface and sub-surface damage for ground.
2. due to the processing method of tool contact formula, can not the workpiece more special to some contour structures be processed,
The inner wall of such as workpiece, hole position, because tool is difficult to not to be processed due to stretching into.Another kind of processing method is then not against processing
Tool is in direct contact with workpiece surface and is polished, such as：Fluid polishing, electrobrightening, chemical polishing, magnetic grinding and polishing etc..This
In a kind of processing method, fluid polishing it is most widely used.Fluid polishing is by swiftly flowing liquid and its carrying
Abrasive grain washes away workpiece surface and achievees the purpose that polishing.Current two-phase flow polishing method equally exists some disadvantages：
1. fluid flow rate is not high and flow direction is single.Fluid is unable to reach turbulence-like relative to the flow velocity of workpiece surface
State, and in the single laminar condition in flow direction, keep the abrasive grain impact direction in polishing fluid consistent, cut generated to workpiece,
Cause the damage of surface and sub-surface.
2. since abrasive grain flow direction is almost the same, causes one layer of abrasive grain for being only affixed on workpiece surface to play polishing and make
With polishing efficiency is low.
3. the recycling service efficiency of abrasive Flow is low, generate wear particle deposition in process, influence polishing effect and
Efficiency.
Invention content
In order to be easy to cause the damage of surface and sub-surface when overcoming the shortcomings of existing polishing SiC workpiece, the present invention proposes
Fenton auxiliary three-phase flow dynamic pressure cavitation polishes SiC optical surface method and devices, in the damage for not causing surface and sub-surface
Under the premise of, improve polishing efficiency.
The technical solution adopted by the present invention to solve the technical problems is：
A kind of Fenton auxiliary three-phase flow dynamic pressure cavitation polishing SiC optical surface methods, first by SiC workpiece without processing
Part is wrapped up with barrier material, and then SiC workpiece are soaked in the reaction tank equipped with Fenton reagent；It is generated in Fenton's reaction
SiC workpiece surfaces are oxidized to the SiO that hardness is softer, binding force is smaller by the hydroxyl radical free radical with strong oxidizing property2；One section of reaction
After time, workpiece is taken out and is fixed in polishing liquid container with fixture；The cylindrical buffer of serial-parallel mirror polished land control
Have the pose relative to workpiece, polishing tool is made to remain a small processing gap, tool and workpiece with workpiece surface
It is completely submerged in polishing fluid；Cylindrical polishing tool high speed rotation is driven by servo motor, the polishing fluid for being mixed with abrasive grain is made to exist
It is rotated together under the high-speed rotating effect of tool, generates dynamic pressure；Abrasive grain in polishing fluid under the action of dynamic pressure stream continually
Ground by process gap, and with the angle of level of approximation go impact workpiece surface microscopic protrusions part, workpiece is formed centainly
Material removal；Ultrasonic bubble generating mechanism constantly adjusts pose of the amplitude transformer relative to dynamic pressure region, makes amplitude transformer end
The cavitation bubble of generation is just past Hydrodynamic region；Due to dynamic pressure region pressure change, cavitation cloud is promoted to crumble and fall, production of crumbling and fall
Raw energy driving is mixed with the polishing fluid of abrasive grain, increases abrasive grain impact velocity, increases abrasive grain and impacts randomness, avoids abrasive grain single
The flowing in direction generates cut to workpiece, realizes the polishing of workpiece surface very high degree of precision；As polishing carries out, abrasive Flow cyclic system
It unites and circulation conveying is carried out to the abrasive grain in polishing container, avoid the wear particle deposition in polishing fluid.
Further, the Fenton's reaction carried out in reaction tank generates the hydroxyl radical free radical (OH) with strong oxidizing property, hydroxyl
Free radical utilizes the oxygen (O to dissociate in solution2), it is reacted with SiC and generates SiO2, water (H2) and carbon dioxide (CO O2), lead to carbon
Silicon nitride material surface oxidation, the SiO of generation2It is softer compared to SiC hardness, binding force is smaller, can be easily by three-phase flow dynamic pressure
The mechanical removal effect removal of abrasive grain in cavitation polishing process, to effectively improve polishing efficiency.
Further, SiC workpiece have used barrier material package without the part of processing, ensure workpiece be totally submerged in
When in Fenton agent, the hydroxyl radical free radical that the surfacing of part only to be processed is generated by Fenton's reaction aoxidizes, generate hardness compared with
Soft, the smaller SiO of binding force2Layer.
Further, the optimum response environment of the Fenton reagent should select pH value for the weak acid environment of 2-5.Reaction
When the pH value of environment is excessively high, the Fe generated during Fenton's reaction will be made3+It is reacted with the hydroxide ion in solution and generates Fe
(OH)3And stop reaction；When the pH value of reaction environment is too low, the acidity of solution is too strong, neutralization reaction will occur with hydrogen peroxide,
To reduce reaction speed.
Strong oxidizer hydroxyl radical free radical in the Fenton reagent, is generated by catalyst and oxidant reaction, fragrant
The catalyst to pause in reacting is ferrous sulfate FeSO4, frerrous chloride FeCl2, iron oxide Fe2O3With ferric sulfate Fe2(SO4)3, oxidation
Agent is hydrogen oxide H2O2, potassium permanganate KMNO4With hypochlorous acid HCLO.
The serial-parallel mirror polished land is made of three bar parallel connection platforms and Three Degree Of Freedom series connection platform, Three Degree Of Freedom series connection
Platform is mainly made of X, Y, Z-direction guide rail, and three bar parallel connection platforms are installed on the Z-direction guide rail of Three Degree Of Freedom series connection platform,
The guide rail in three directions is driven by motor respectively；Three bar parallel connection platforms are mainly made of moving platform and silent flatform, wherein moving platform
It is mainly made of three telescopic rods, cylindrical polishing tool, which is then connected by attachment device with servo motor, is installed on three bars simultaneously
Join platform end, tool surfaces can with groove it is also smooth；Series connection platform controls the position of tool along X, Y, Z-direction, and parallel connection is flat
Platform controls the posture of tool, and polishing tool is allow to be accurately controlled relative to the pose of workpiece.
The tool keeps microgap, servo motor to drive polishing tool high speed rotation, be mixed with abrasive grain above workpiece
Polishing fluid rotated together under the high-speed rotating effect of tool, polishing fluid by when wedge gap between tool and workpiece because
It generates and squeezes and improve pressure, generate dynamic pressure；It is incorporated in constantly approximate water under the action of dynamic pressure of the abrasive grain in polishing fluid
Flat angle goes to the part of impact workpiece surface microscopic protrusions, and forming certain material to workpiece removes.
The ultrasonic bubble generating mechanism is made of ultrasonic bubble generator with multi-degree-of-freemechanical mechanical arm.Ultrasonic wave
Bubble generator is installed on multi-degree-of-freemechanical mechanical arm end by attachment device, and is not limited to mechanical arm, adjustable ultrasonic hair
Any device of raw device end pose；Multi-degree-of-freemechanical mechanical arm constantly adjusts supersonic generator amplitude transformer relative to dynamic pressure
The pose in region makes the cavitation bubble that amplitude transformer end generates just past dynamic pressure region.When ultrasonic bubble generator works,
Amplitude transformer end generates a large amount of cavitation bubbles, and cavitation bubble is constantly expanded and received under ultrasonic wave positive pressure phase and negative pressure phase separation
Contracting, by the pressure change due to dynamic pressure region when Hydrodynamic region, cavitation bubble generation is quickly crumbled and fall.
The abrasive particle flow circulating system is made of two abrasive Flow delivery pumps with blender, two abrasive Flow delivery pumps point
It is not installed on polishing platform both sides, is connected with blender and polishing liquid container by abrasive Flow delivery hose；Abrasive Flow is followed
Loop system in polishing process ceaselessly to polishing container in abrasive Flow carry out circulation stirring with conveying, avoid wear particle deposition in
Polishing fluid container bottom improves the recycling service efficiency of abrasive Flow, to promote polishing efficiency.
A kind of Fenton auxiliary three-phase flow dynamic pressure cavitation polishing SiC optical surface devices, described device includes Three Degree Of Freedom string
Join platform, three bar parallel connection platforms, the polishing fluid for being mixed with abrasive grain, abrasive Flow delivery pump, abrasive Flow delivery hose, blender, mostly from
By degree mechanical arm, workpiece, polishing liquid container, fixture, servo motor, shaft coupling, polishing tool, ultrasonic bubble generator, peace
Be made of X, Y, Z-direction guide rail loaded on the Three Degree Of Freedom series connection platform above polishing liquid container, the guide rail in three directions respectively by
Motor drives, the position for controlling polishing tool；Three bar parallel connection platforms are made of moving platform and silent flatform, wherein moving platform master
It to be made of three telescopic rods, the posture for controlling polishing tool；It is flat that three bar parallel connection platforms are installed on Three Degree Of Freedom series connection
Serial-parallel mirror platform is formed on the Z-direction guide rail of platform, polishing tool is connected with servo motor is mounted on serial-parallel mirror mechanism end,
Make polishing tool and high speed rotation while workpiece holding microgap, generates dynamic pressure region；SiC workpiece are then fixed on by fixture
Polishing fluid container bottom, and be totally submerged in being mixed in the polishing fluid of abrasive grain；Two abrasive Flow delivery pumps are respectively arranged in throwing
Light liquid container both sides are connected by abrasive Flow delivery hose with other side blender, for avoiding the abrasive grain in polishing process heavy
Product；Ultrasonic bubble generator is installed on multi-degree-of-freemechanical mechanical arm end by attachment device, makes supersonic generator amplitude transformer
The cavitation bubble that end generates is just past dynamic pressure region.
Beneficial effects of the present invention are mainly manifested in：Under the premise of not causing the damage on surface and sub-surface, improves and throw
Light efficiency.
Description of the drawings
Fig. 1 is the overall structure diagram of three-phase flow dynamic pressure cavitation burnishing device of the present invention.
Fig. 2 is the partial structural diagram of three-phase flow dynamic pressure cavitation burnishing device of the present invention.
In figure, 1-Z traversing guides motor, 2-X traversing guides motor, 14-Y traversing guides motor, 3-Y traversing guides, 4-X
Traversing guide, 5- silent flatforms, 6- moving platforms, 7- are mixed with the polishing fluid of abrasive grain, 8 (11)-abrasive Flow delivery pump, the conveying of 9- abrasive Flows
Hose, 10- blenders, 12-Z traversing guides, 13- multi-degree-of-freemechanical mechanical arms, 15- workpiece, 16- polishings liquid container, 17- workpiece clamps
The cylindrical buffer of tool, 18- telescopic rods, 19- telescopic rods motor, 20- servo motors, 21- shaft couplings, 22- with grooves
Tool, 23- shaft couplings, 24- ultrasonic bubble generators.
Specific implementation mode
The invention will be further described below in conjunction with the accompanying drawings.
Referring to Figures 1 and 2, a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation polishes SiC optical surface methods, first by SiC
Workpiece is wrapped up without the part of processing with barrier material, and then SiC workpiece are soaked in the reaction tank equipped with Fenton reagent.It is fragrant
SiC workpiece surfaces are oxidized to that hardness is softer, binding force is smaller by the hydroxyl radical free radical with strong oxidizing property that generates in reaction
SiO2.After reacting a period of time, workpiece is taken out and is fixed in polishing liquid container with fixture.Serial-parallel mirror polished land control
Pose of the rounding cylindricality polishing tool relative to workpiece, between making polishing tool and workpiece surface remain a small processing
Gap, tool are completely submerged in workpiece in polishing fluid.Cylindrical polishing tool high speed rotation is driven by servo motor, makes to be mixed with mill
The polishing fluid of grain rotates together under the high-speed rotating effect of tool, generates dynamic pressure.The work of abrasive grain in polishing fluid in dynamic pressure stream
Under continuously by process gap, and with the angle of level of approximation go impact workpiece surface microscopic protrusions part, it is right
Workpiece forms certain material removal.Ultrasonic bubble generating mechanism constantly adjusts pose of the amplitude transformer relative to dynamic pressure region,
Make the cavitation bubble that amplitude transformer end generates just past Hydrodynamic region.Due to dynamic pressure region pressure change, promote cavitation
Cloud is crumbled and fall, and the energy driving for generation of crumbling and fall is mixed with the polishing fluid of abrasive grain, increases abrasive grain impact velocity, and it is random to increase abrasive grain impact
Property, polishing efficiency is improved, the flowing of abrasive grain single direction is avoided to generate cut to workpiece, realizes the throwing of workpiece surface very high degree of precision
Light.As polishing carries out, abrasive particle flow circulating system carries out circulation conveying to the abrasive grain in polishing container, avoids the mill in polishing fluid
Grain deposition.
Three-phase flow dynamic pressure cavitation burnishing device includes mainly serial-parallel mirror polished land, abrasive particle flow circulating system, ultrasonic wave
Bubble generating mechanism, workpiece, polishing liquid container, fixture, polishing tool, the polishing fluid for being mixed with abrasive grain.
Further, SiC workpiece have used barrier material package without the part of processing, ensure that workpiece is being totally submerged in sweet smell
When in reagent, the hydroxyl radical free radical that the surfacing of part only to be processed is generated by Fenton's reaction aoxidizes, generation hardness compared with
Soft, the smaller SiO of binding force2Layer.
The optimum response environment of the Fenton reagent should select pH value for the weak acid environment of 2-5.The pH of reaction environment
When being worth excessively high, the Fe generated during Fenton's reaction will be made3+It is reacted with the hydroxide ion in solution and generates Fe (OH)3And stop
Reaction；When the pH value of reaction environment is too low, the acidity of solution is too strong, neutralization reaction will occur with hydrogen peroxide, anti-to reduce
Answer speed.
Strong oxidizer hydroxyl radical free radical in the Fenton reagent, is generated by catalyst and oxidant reaction.It is fragrant
The catalyst to pause in reacting can select ferrous sulfate FeSO4, frerrous chloride FeCl2, iron oxide Fe2O3, ferric sulfate Fe2(SO4)3
Deng being typically chosen ferrous sulfate FeSO4As catalyst, oxidant can select hydrogen peroxide H2O2, potassium permanganate KMNO4, secondary
Chloric acid HCLO etc. is typically chosen hydrogen peroxide H2O2As oxidant.
The serial-parallel mirror polished land is made of three bar parallel connection platforms and Three Degree Of Freedom series connection platform.Three Degree Of Freedom string
Connection platform is mainly made of X, Y, Z-direction guide rail, and three bar parallel connection platforms are installed on the Z-direction guide rail of Three Degree Of Freedom series connection platform
On, the guide rail in three directions is driven by motor respectively；Three bar parallel connection platforms are mainly made of moving platform and silent flatform, wherein dynamic flat
Platform is mainly made of three telescopic rods, and cylindrical polishing tool, which is then connected by attachment device with servo motor, is installed on three bars
Parallel connection platform end, tool surfaces can with groove it is also smooth.Series connection platform controls the position of tool along X, Y, Z-direction, in parallel
The posture of platform courses tool allows polishing tool to be accurately controlled relative to the pose of workpiece.
The tool keeps microgap, servo motor to drive polishing tool high speed rotation, be mixed with abrasive grain above workpiece
Polishing fluid rotated together under the high-speed rotating effect of tool, polishing fluid by when wedge gap between tool and workpiece because
It generates and squeezes and improve pressure, generate dynamic pressure.It is incorporated in constantly approximate water under the action of dynamic pressure of the abrasive grain in polishing fluid
Flat angle goes to the part of impact workpiece surface microscopic protrusions, and forming certain material to workpiece removes.
The ultrasonic bubble generating mechanism is made of ultrasonic bubble generator with multi-degree-of-freemechanical mechanical arm.Ultrasonic wave
Bubble generator is installed on multi-degree-of-freemechanical mechanical arm end by attachment device, and is not limited to mechanical arm, adjustable ultrasonic hair
Any device of raw device end pose.Multi-degree-of-freemechanical mechanical arm constantly adjusts supersonic generator amplitude transformer relative to dynamic pressure
The pose in region makes the cavitation bubble that amplitude transformer end generates just past dynamic pressure region.When ultrasonic bubble generator works,
Amplitude transformer end generates a large amount of cavitation bubbles, and cavitation bubble is constantly expanded and received under ultrasonic wave positive pressure phase and negative pressure phase separation
Contracting, by the pressure change due to dynamic pressure region when Hydrodynamic region, cavitation bubble generation is quickly crumbled and fall.
The material removal is that Hydrodynamic and cavitation crumble and fall to grain motion state and be distributed the synthesis result changed,
Polishing efficiency is improved, workpiece surface and sub-surface damage are avoided, achievees the effect that uniformity polishes.
The abrasive particle flow circulating system is made of two abrasive Flow delivery pumps with blender.Two abrasive Flow delivery pumps point
It is not installed on polishing platform both sides, is connected with blender and polishing liquid container by abrasive Flow delivery hose.Abrasive Flow is followed
Loop system in polishing process ceaselessly to polishing container in abrasive Flow carry out circulation stirring with conveying, avoid wear particle deposition in
Polishing fluid container bottom improves the recycling service efficiency of abrasive Flow, to promote polishing efficiency.
A kind of Fenton auxiliary three-phase flow dynamic pressure cavitation polishing SiC optical surface devices, i.e. three-phase flow dynamic pressure cavitation polishing dress
It sets, including 1-Z traversing guides motor, 2-X traversing guides motor, 3-Y traversing guides, 4-X traversing guides, 5- silent flatforms, 6- dynamic
Platform, 7- are mixed with the polishing fluid of abrasive grain, 8 (11)-abrasive Flow delivery pump, 9- abrasive Flows delivery hose, 10- blenders, the side 12-Z
Direction guiding rail, 13- multi-degree-of-freemechanical mechanical arms, 14-Y traversing guides motor, 15-SiC workpiece, 16- polishings liquid container, 17- workpiece clamps
The cylindrical buffer of tool, 18- telescopic rods, 19- telescopic rods motor, 20- servo motors, 21- shaft couplings, 22- with grooves
Tool, 23- shaft couplings, 24- ultrasonic bubble generators.；The SiC workpiece 15 are fixed on polishing fluid by work piece holder 17 to be held
16 bottom of device, and be totally submerged in being mixed in the polishing fluid 7 of abrasive grain；Three Degree Of Freedom series connection platform is mainly by X-direction guide rail 4, Y
Traversing guide 3, Z-direction guide rail 12 form and are installed on 16 top of polishing liquid container, and the guide rail in three directions is respectively by guide rail
Motor 1,2,14 drives；Three bar parallel connection platforms are mainly made of silent flatform 5 and moving platform 6, and wherein moving platform 6 mainly can by three
Telescopic rod 18 forms.Three bar parallel connection platforms are installed on 12 end of the Z-direction guide rail composition serial-parallel mirror of Three Degree Of Freedom series connection platform
Platform.The cylindrical polishing tool 22 of with groove is connected with servo motor 20 is mounted on serial-parallel mirror mechanism end, makes buffer
Tool and high speed rotation while workpiece holding microgap, generate dynamic pressure region.Two abrasive Flow delivery pumps 8,11 are respectively arranged in
16 both sides of liquid container are polished, are connected with other side blender 10 by abrasive Flow delivery hose 9, for avoiding in polishing process
Wear particle deposition.Ultrasonic bubble generator 24 is installed on 13 end of multi-degree-of-freemechanical mechanical arm.
Above-described embodiment is presently preferred embodiments of the present invention, is not the limitation to technical solution of the present invention, as long as
Without the technical solution that creative work can be realized on the basis of the above embodiments, it is regarded as falling into patent of the present invention
Rights protection scope in.
Claims (10)
1. a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation polishes SiC optical surface methods, it is characterised in that：First by SiC workpiece
Part without processing is wrapped up with barrier material, and then SiC workpiece are soaked in the reaction tank equipped with Fenton reagent；Fenton is anti-
Answering the hydroxyl radical free radical with strong oxidizing property of middle generation to be oxidized to SiC workpiece surfaces, hardness is softer, binding force is smaller
SiO2；After reacting a period of time, workpiece is taken out and is fixed in polishing liquid container with fixture；Serial-parallel mirror polished land controls
Pose of the cylindrical polishing tool relative to workpiece, between making polishing tool and workpiece surface remain a small processing
Gap, tool are completely submerged in workpiece in polishing fluid；Cylindrical polishing tool high speed rotation is driven by servo motor, makes to be mixed with mill
The polishing fluid of grain rotates together under the high-speed rotating effect of tool, generates dynamic pressure；The work of abrasive grain in polishing fluid in dynamic pressure stream
Under continuously by process gap, and with the angle of level of approximation go impact workpiece surface microscopic protrusions part, it is right
Workpiece forms certain material removal；Ultrasonic bubble generating mechanism constantly adjusts pose of the amplitude transformer relative to dynamic pressure region,
Make the cavitation bubble that amplitude transformer end generates just past Hydrodynamic region；Due to dynamic pressure region pressure change, promote cavitation
Cloud is crumbled and fall, and the energy driving for generation of crumbling and fall is mixed with the polishing fluid of abrasive grain, increases abrasive grain impact velocity, and it is random to increase abrasive grain impact
Property, it avoids the flowing of abrasive grain single direction from generating cut to workpiece, realizes the polishing of workpiece surface very high degree of precision；With polish into
Row, abrasive particle flow circulating system carry out circulation conveying to the abrasive grain in polishing container, avoid the wear particle deposition in polishing fluid.
2. a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation as described in claim 1 polishes SiC optical surface methods, feature exists
In：The Fenton's reaction carried out in reaction tank generates the hydroxyl radical free radical (OH) with strong oxidizing property, and hydroxyl radical free radical utilizes molten
Oxygen (the O to dissociate in liquid2), it is reacted with SiC and generates SiO2, water (H2) and carbon dioxide (CO O2), lead to carbofrax material surface
Oxidation, the SiO of generation2It is softer compared to SiC hardness, binding force is smaller, can be ground in three-phase flow dynamic pressure cavitation polishing process
The mechanical removal effect removal of grain, to effectively improve polishing efficiency.
3. a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation as described in claim 1 polishes SiC optical surface methods, feature exists
In：SiC workpiece have used barrier material package without the part of processing, ensure workpiece when being totally submerged in Fenton agent, only
Need the hydroxyl radical free radical oxidation that the surfacing of processing section is generated by Fenton's reaction, generation hardness is softer, binding force is smaller
SiO2Layer
4. a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation as described in one of claims 1 to 3 polishes SiC optical surface methods,
It is characterized in that：The optimum response environment of the Fenton reagent should select pH value for the weak acid environment of 2-5.Reaction environment
When pH value is excessively high, the Fe generated during Fenton's reaction will be made3+It is reacted with the hydroxide ion in solution and generates Fe (OH)3And stop
Only react；When the pH value of reaction environment is too low, the acidity of solution is too strong, neutralization reaction will occur with hydrogen peroxide, to reduce
Reaction speed.
5. a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation as claimed in claim 4 polishes SiC optical surface methods, feature exists
In：Strong oxidizer hydroxyl radical free radical in the Fenton reagent, is generated by catalyst and oxidant reaction, Fenton's reaction
In catalyst be ferrous sulfate FeSO4, frerrous chloride FeCl2, iron oxide Fe2O3With ferric sulfate Fe2(SO4)3, oxidant is oxygen
Change hydrogen H2O2, potassium permanganate KMNO4With hypochlorous acid HCLO.
6. a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation as described in one of claims 1 to 3 polishes SiC optical surface methods,
It is characterized in that：The serial-parallel mirror polished land is made of three bar parallel connection platforms and Three Degree Of Freedom series connection platform, Three Degree Of Freedom
Series connection platform is mainly made of X, Y, Z-direction guide rail, and three bar parallel connection platforms are installed on the Z-direction guide rail of Three Degree Of Freedom series connection platform
On, the guide rail in three directions is driven by motor respectively；Three bar parallel connection platforms are mainly made of moving platform and silent flatform, wherein dynamic flat
Platform is mainly made of three telescopic rods, and cylindrical polishing tool, which is then connected by attachment device with servo motor, is installed on three bars
Parallel connection platform end, tool surfaces can with groove it is also smooth；Series connection platform controls the position of tool along X, Y, Z-direction, in parallel
The posture of platform courses tool allows polishing tool to be accurately controlled relative to the pose of workpiece.
7. a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation as described in one of claims 1 to 3 polishes SiC optical surface methods,
It is characterized in that：The tool keeps microgap, servo motor to drive polishing tool high speed rotation, be mixed with mill above workpiece
The polishing fluid of grain rotates together under the high-speed rotating effect of tool, when polishing fluid passes through the wedge gap between tool and workpiece
Pressure is improved because generating extruding, generates dynamic pressure；It is constantly approximate under the action of dynamic pressure to be incorporated in the abrasive grain in polishing fluid
Horizontal angle goes to the part of impact workpiece surface microscopic protrusions, and forming certain material to workpiece removes.
8. a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation as described in one of claims 1 to 3 polishes SiC optical surface methods,
It is characterized in that：The ultrasonic bubble generating mechanism is made of ultrasonic bubble generator with multi-degree-of-freemechanical mechanical arm, is surpassed
Sound wave bubble generator is installed on multi-degree-of-freemechanical mechanical arm end by attachment device, and is not limited to mechanical arm, and ultrasound is adjusted
Any device of wave producer end pose；Multi-degree-of-freemechanical mechanical arm constantly adjust supersonic generator amplitude transformer relative to
The pose in dynamic pressure region makes the cavitation bubble that amplitude transformer end generates just past dynamic pressure region；Ultrasonic bubble generator work
When making, amplitude transformer end generates a large amount of cavitation bubbles, and cavitation bubble constantly expands under ultrasonic wave positive pressure phase and negative pressure phase separation
And contraction, by the pressure change due to dynamic pressure region when Hydrodynamic region, cavitation bubble generation is quickly crumbled and fall.
9. a kind of Fenton auxiliary three-phase flow dynamic pressure cavitation as described in one of claims 1 to 3 polishes SiC optical surface methods,
It is characterized in that：The abrasive particle flow circulating system is made of two abrasive Flow delivery pumps with blender, two abrasive Flow conveyings
Pump is respectively arranged in polishing platform both sides, is connected with blender and polishing liquid container by abrasive Flow delivery hose；Abrasive grain
Flow circulating system ceaselessly carries out circulation stirring and conveying in polishing process to the abrasive Flow in polishing container, avoids abrasive grain heavy
Product improves the recycling service efficiency of abrasive Flow, to promote polishing efficiency in polishing fluid container bottom.
10. a kind of device of Fenton auxiliary three-phase flow dynamic pressure cavitation polishing SiC optical surface methods as described in claim 1,
It is characterized in that：Described device includes Three Degree Of Freedom series connection platform, three bar parallel connection platforms, the polishing fluid for being mixed with abrasive grain, abrasive Flow
Delivery pump, abrasive Flow delivery hose, blender, multi-degree-of-freemechanical mechanical arm, workpiece, polishing liquid container, fixture, servo motor, connection
Axis device, polishing tool, ultrasonic bubble generator are installed on the Three Degree Of Freedom series connection platform above polishing liquid container by X, Y, Z
Traversing guide forms, and the guide rail in three directions is driven by motor respectively, the position for controlling polishing tool；Three bar parallel connection platforms
It is made of moving platform and silent flatform, wherein moving platform is mainly made of three telescopic rods, the posture for controlling polishing tool；
Three bar parallel connection platforms are installed on the Z-direction guide rail of Three Degree Of Freedom series connection platform composition serial-parallel mirror platform, polishing tool with watch
It takes motor to be connected mounted on serial-parallel mirror mechanism end, makes polishing tool and high speed rotation while workpiece holding microgap, production
Lively intermediate pressure section；SiC workpiece are then fixed on polishing fluid container bottom by fixture, and are totally submerged in the polishing for being mixed with abrasive grain
In liquid；Two abrasive Flow delivery pumps are respectively arranged in polishing liquid container both sides, are stirred by abrasive Flow delivery hose and the other side
Device is connected, for avoiding the wear particle deposition in polishing process；Ultrasonic bubble generator is installed on mostly freely by attachment device
Mechanical arm tail end is spent, makes the cavitation bubble that supersonic generator amplitude transformer end generates just past dynamic pressure region.
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