CN108568599A - 用于激光划刻太阳能板的系统和方法及太阳能板 - Google Patents
用于激光划刻太阳能板的系统和方法及太阳能板 Download PDFInfo
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- CN108568599A CN108568599A CN201710141357.5A CN201710141357A CN108568599A CN 108568599 A CN108568599 A CN 108568599A CN 201710141357 A CN201710141357 A CN 201710141357A CN 108568599 A CN108568599 A CN 108568599A
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- 238000000034 method Methods 0.000 title claims abstract description 44
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/361—Removing material for deburring or mechanical trimming
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1876—Particular processes or apparatus for batch treatment of the devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
Claims (12)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710141357.5A CN108568599B (zh) | 2017-03-10 | 2017-03-10 | 用于激光划刻太阳能板的系统和方法及太阳能板 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201710141357.5A CN108568599B (zh) | 2017-03-10 | 2017-03-10 | 用于激光划刻太阳能板的系统和方法及太阳能板 |
Publications (2)
Publication Number | Publication Date |
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CN108568599A true CN108568599A (zh) | 2018-09-25 |
CN108568599B CN108568599B (zh) | 2020-03-03 |
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CN201710141357.5A Expired - Fee Related CN108568599B (zh) | 2017-03-10 | 2017-03-10 | 用于激光划刻太阳能板的系统和方法及太阳能板 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112599638A (zh) * | 2020-12-15 | 2021-04-02 | 华能新能源股份有限公司 | 一种激光刻线定位系统及方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1742483A (zh) * | 2003-01-22 | 2006-03-01 | 索尼株式会社 | 图像处理装置和方法、记录介质和程序 |
US7807479B1 (en) * | 2007-02-21 | 2010-10-05 | Micro Processing Technology, Inc. | Method and apparatus for improving force control in wafer scribing |
CN101999166A (zh) * | 2008-04-11 | 2011-03-30 | 应用材料股份有限公司 | 用于激光刻划、熔接或任何构图系统的动态刻划对准 |
CN106204457A (zh) * | 2016-07-19 | 2016-12-07 | 科盾科技股份有限公司 | 一种用于抓捕目标的方法和抓捕器 |
US20170057008A1 (en) * | 2012-07-13 | 2017-03-02 | Full Spectrum Laser Llc | Infinite thickness laser processing system |
-
2017
- 2017-03-10 CN CN201710141357.5A patent/CN108568599B/zh not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1742483A (zh) * | 2003-01-22 | 2006-03-01 | 索尼株式会社 | 图像处理装置和方法、记录介质和程序 |
CN100380935C (zh) * | 2003-01-22 | 2008-04-09 | 索尼株式会社 | 图像处理装置和方法 |
US7807479B1 (en) * | 2007-02-21 | 2010-10-05 | Micro Processing Technology, Inc. | Method and apparatus for improving force control in wafer scribing |
CN101999166A (zh) * | 2008-04-11 | 2011-03-30 | 应用材料股份有限公司 | 用于激光刻划、熔接或任何构图系统的动态刻划对准 |
US20170057008A1 (en) * | 2012-07-13 | 2017-03-02 | Full Spectrum Laser Llc | Infinite thickness laser processing system |
CN106204457A (zh) * | 2016-07-19 | 2016-12-07 | 科盾科技股份有限公司 | 一种用于抓捕目标的方法和抓捕器 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112599638A (zh) * | 2020-12-15 | 2021-04-02 | 华能新能源股份有限公司 | 一种激光刻线定位系统及方法 |
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CN108568599B (zh) | 2020-03-03 |
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Inventor after: Gao Jinlong Inventor after: Zhang Xiaofu Inventor after: Yang Shihang Inventor after: Zhu Jiakuan Inventor after: Wang Kefan Inventor after: Xiao Xudong Inventor before: Zhang Xiaofu Inventor before: Yang Shihang Inventor before: Gao Jinlong Inventor before: Zhu Jiakuan Inventor before: Wang Kefan Inventor before: Xiao Xudong |
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