CN108538769A - transmission system and method - Google Patents
transmission system and method Download PDFInfo
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- CN108538769A CN108538769A CN201710122138.2A CN201710122138A CN108538769A CN 108538769 A CN108538769 A CN 108538769A CN 201710122138 A CN201710122138 A CN 201710122138A CN 108538769 A CN108538769 A CN 108538769A
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- load port
- track
- buffering
- microscope carrier
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67727—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using a general scheme of a conveying path within a factory
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
Abstract
A kind of Transmission system and method.Transmission system includes load port, multiple first tracks, horizontally moving device, elevator, at least one second track and the first buffering microscope carrier.Load port is disposed on board related with manufacture of semiconductor.Space between at least part of first track is positioned at the surface of load port.Horizontally moving device be mobility couple the first track.Elevator is disposed on horizontally moving device.Second track has continuous first section and the second section, and the first section is the underface in the space between the first track, and the second section is the underface in the not space between the first track.First buffering microscope carrier be mobility couple the second track.
Description
Technical field
The some embodiments of this exposure are to be used for semiconductor especially with regard to one kind about a kind of Transmission system and method
The Transmission system and method for factory.
Background technology
As science and technology is grown up increasingly, integrated circuit is widely used in every field, such as：Memory body, central processing
Device (CPU), liquid crystal display device (LCD), light emitting diode (LED), laser diode or chipset, related promotion semiconductor product
Industry flourishes.Under the high competition of semiconductor industry, semiconductor element must be designed under conditions of full blast
With manufacture.Traditionally, the carrying of semiconductor element is using artificial carrying, but the increase of the wafer size with semiconductor element
And the complexity of processing procedure is promoted, artificial carry can not gradually meet demand, and manual operation easy to produce mistake, pollution and
Speed is not easy the situation promoted.Therefore, automated material delivery system (Automated Material Handling
System, AMHS) it has applied in semiconductor manufacturing factory in large quantities.
In general, automated material delivery system has overhead system transport system (Overhead Hoist
Transport System；OHTS) with multiple Storages (Stocker) or work station (Tool Station), automatically to connect
Receive, transmit and place the relevant bogey of semiconductor element.Therefore, automated material delivery system, which has, saves manpower, drop
Low stain increases the advantages that transmission speed ....
Invention content
According to some embodiments of this exposure, Transmission system includes load port, multiple first tracks, moves horizontally dress
Set, elevator, at least one second track with buffering microscope carrier.Load port is disposed on board related with manufacture of semiconductor.Extremely
Space between least a portion of first track is positioned at the surface of load port.Horizontally moving device be mobility couple
First track.Elevator is disposed on horizontally moving device.Second track have continuous first section and the second section, first
Section is the underface in the space between the first track, and the second section is that the space between the first track be not just
Lower section.First buffering microscope carrier be mobility couple the second track.
According to some embodiments of this exposure, Transmission system include load port, multiple tracks, horizontally moving device,
Elevator and buffering microscope carrier.Load port is disposed on a board related with manufacture of semiconductor.The each of track, which has, to be connected
Continuous the first section and the second section, the space between the first section are between the surface of load port, the second section
Space be not be located at load port surface.Horizontally moving device is mobility ground coupler orbit.Elevator is setting
In horizontally moving device.Buffering microscope carrier is the underface in the space between the second section.
According to some embodiments of this exposure, transmission method comprises the steps of.Judge whether load port is occupied.
When load port, which is judged, to be occupied, a mobile buffering microscope carrier a to first position, and first position is to be located at load port
Surface.An object is transmitted on the buffering microscope carrier of first position.
Description of the drawings
Reading describes in detailed below and corresponding attached drawing of arranging in pairs or groups, it may be appreciated that multiple patterns of this exposure.It need to be noted that, it is attached
Multiple features in figure simultaneously draw actual ratio not according to the standard practice in the industry field.In fact, the ruler of the feature
The very little clarity that can arbitrarily increase or decrease in favor of discussion.
Fig. 1 is the stereoscopic schematic diagram of the Transmission system of some embodiments according to this exposure；
Fig. 2 is the side view of the Transmission system of some embodiments according to this exposure；
Fig. 3 is the vertical view of the Transmission system of some embodiments according to this exposure；
Fig. 4 is the flow chart of the transmission method of some embodiments according to this exposure.
Specific implementation mode
It will clearly illustrate the spirit of this exposure with attached drawing and detailed description below, have in any technical field usual
Skill, when the technology that can be taught by this exposure, is changed and modifies, do not take off after the embodiment for understanding this exposure
Spirit and scope from this exposure.For example, narration " fisrt feature be formed in above second feature or on ", in embodiment
To have comprising fisrt feature and second feature and be in direct contact；And it will also be connect to be indirect comprising fisrt feature and second feature
It touches, there is additional feature to be formed between fisrt feature and second feature.In addition, this makes repetition disclosed in multiple examples
With element numbers and/or word.Repeat purpose be to simplify and differentiate, and itself can't determine multiple embodiments with
And/or the relationship between the configuration discussed.
Term used in herein, is only to describe specific embodiment, should not be described with this and limit this exposure.
Herein, unless being clearly dictated otherwise in context, otherwise singulative " one " and " described " also plural form to be included.Into
One step understands, the terms "include", "comprise" and " having ", in this specification in use, to indicate the feature, region,
Entirety, step, operation, the presence of element and/or ingredient, but do not preclude the presence or addition of one or more features, region, whole
Body, step, operation, element, ingredient and/or combination of the above.
In addition, orientation is with respect to vocabulary, as " ... under ", " below ", "lower", " top " or "upper" or similar to vocabulary,
It is for being illustrated in an elements or features in attached drawing to the relationship of other elements or features convenient for description herein.Orientation
Opposite vocabulary is other than for describing the orientation of device in the accompanying drawings, and it includes the different sides being installed under use or operation
Position.When device is additionally provided (be rotated by 90 ° or other towards orientation), orientation relative term used herein can with sample
Correspondingly explain.
In the manufacturing process of semiconductor element, semiconductor crystal wafer (wafer) is generally required after tens of roads or hundreds of roads
Processing procedure is to form final semiconductor element.By and large, semiconductor crystal wafer can be stored in wafer carrying unit, wafer carrying
Unit can accommodate multiple semiconductor crystal wafers, then pass through automated material delivery system (Automated Material Handling
System, AMHS) transmitting device, such as：Such as automatic guided vehicle (Automatic guided vehicle；AGV), track
Guide vehicle (Rail guided vehicle；RGV), overhead system conveying device (Overhead Hoist Shuttle；OHS) with
And overhead system lifting and transporting device (Overhead Hoist Transport；OHT) or other appropriate devices, automatically transmit
Wafer carrying unit is between different process work bench (equipment) so that process work bench can handle semiconductor crystal wafer in bulk.
That is, wafer carrying unit can be sent to different systems by the transmitting device of automated material delivery system
Between journey board.It includes at least one load end that process work bench, which can have corresponding work station (tool station), work station,
Mouth (load port), load port are connection process work bench and can be used to place or store wafer carrying unit.However, work
The quantity for the load port stood is fixed and conditional, can not be adjusted according to production capacity or the situation of processing procedure instantly
Or it changes.Therefore, when the corresponding load port of the process work bench of the be intended to processing procedure of wafer carrying unit is all occupied, wafer is held
Carrier unit just can not be transferred into the process work bench of be intended to processing procedure and rest on transmitting device, and wafer carrying unit is caused to generate
The phenomenon that " traffic congestion ", thus increase residence time of the wafer carrying unit between different process work bench, and postpone wafer carrying
The processing time of semiconductor crystal wafer in unit.Here, the residence time is to indicate semiconductor crystal wafer in the fabrication process by a system
Work station corresponding to journey board is transmitted to work station the time it takes corresponding to another process work bench.
In addition, residence time of the wafer carrying unit between process work bench can also influence the production effect of semiconductor foundry
Rate and production capacity, and when residence time of the wafer carrying unit between process work bench is long, also that is, too postponing wafer carrying
When the processing time of the semiconductor crystal wafer in unit, gaseous impurity or particle in semiconductor foundry may pollute
Semiconductor crystal wafer in wafer carrying unit especially can become to be particularly easy to meet with when semiconductor crystal wafer just terminates certain processing procedures
It is contaminated.
In view of this, a kind of Transmission system of some embodiments offer and its method of this exposure, can improve object (example
Such as：Wafer carrying unit or light shield carrier) it is transmitted in the traffic congestion phenomenon between different process work bench, and reduce object and be transmitted in
Residence time between different process work bench.
Referring to Fig.1.Fig. 1 is the stereoscopic schematic diagram of the Transmission system of some embodiments according to this exposure.It is real in part
Apply in mode, Transmission system 10 include load port 100, buffering microscope carrier 200, transmission device 300, multiple first tracks 600 with
At least one second track 900.Load port 100 is disposed on board related with manufacture of semiconductor 400.In more detail, it bears
Load port 100 be accommodate object (such as：Wafer carrying unit or light shield carrier), and load port 100 is connection board
400 connecting pin 410 (seeing Fig. 2) so that content in object can via load port 100 and connecting pin 410 and
It is transferred into board 400.First track 600 is to be adjacent to the side of board 400, and between at least partly the first track 600
Space be surface positioned at load port 100.In other words, each of the first track 600 has continuous firstth area
Section 602 and the second section 604 (also known as extension of section 604).For example, the first section 602 is the second section 604 of connection, and
The two is integrally formed.Space between first section 602 of the first track 600 is the surface for being located at load port 100,
And first track 600 the second section 604 between space be not be located at load port 100 surface.Second track 900 has
It is to be located at two first tracks 600 to have 902 and second section 904 of continuous first section, the first section 902 of the second track 900
The first section 602 between space underface, and the second section 904 be not be located at two first tracks 600 the first section
The underface in the space between 602.Buffering microscope carrier 200 is temporarily to store object, and buffer microscope carrier 200 can be classified as can
Mobile cushioning microscope carrier 210 and fixed buffering microscope carrier 220.Removable buffering microscope carrier 210 be mobility couple the second track
900.Also that is, removable buffering microscope carrier 210 is the first section 902 that can be moved to two second tracks 900 along the second track 900
Between space, or the space that is moved between the second section 904 of two second tracks 900.In other words, buffering is moved to carry
Platform 210 be movable to positioned at the surface of load port 100 position or be moved to not be located at load port 100 surface
Position.Fixed buffering microscope carrier 220 is the underface in the space between the second section 604 of the first track 600, also that is,
Fixed buffering microscope carrier 220 is the surface for not being located at load port 100.Transmission device 300 is object is transmitted in load
Between position where port 100 and the position where buffering microscope carrier 200.Furthermore, it is understood that in some embodiments, load
Port 100 may be collectively referred to herein as work station with buffering microscope carrier 200, and work station can store object.Also that is, object is optionally put
It is placed on load port 100 or buffering microscope carrier 200 (removable buffering microscope carrier 210, fixed buffering microscope carrier 220 or both of the above),
To increase object placement space selectivity.Therefore, Transmission system 10, which can help to reduce object, is transmitted in different platform 400
Between traffic congestion phenomenon, and reduce object be transmitted in the residence time between different platform 400.
In some embodiments, as shown in Figure 1, transmission device 300 can be used in load port 100 and buffering microscope carrier
Object is transmitted between 200.For example, in some embodiments, transmission device 300 can according to different situations, such as：Machine
The situation or board 400 that situation that process conditions, the load port 100 of platform 400 are occupied, buffering microscope carrier 200 are occupied its
Object blanking platform 200 of postponing is moved to load port 100 by his correlated condition ... etc.；Alternatively, by object from load port 100
It is moved to buffering microscope carrier 200, but this exposure is not limited.That is, object can be placed on via transmission device 300
On load port 100 or buffering microscope carrier 200.
Referring concurrently to Fig. 1 and Fig. 2.Fig. 2 is the side view of the Transmission system of some embodiments according to this exposure.In portion
Divide in embodiment, transmission device 300 is to be located in the first track 600, and can be moved along the first track 600.Transmission device
300 include horizontally moving device 310 and elevator 320, horizontally moving device 310 be mobility couple the first track 600,
And elevator 320 is disposed on horizontally moving device 310.Horizontally moving device 310 is D1 movements along a first direction, and is lifted
Machine 320 is moved along second direction D2, and first direction D1 intersects with second direction D2.First direction D1 is the first track 600
Length direction, also that is, the orientation of multiple load ports 100.In some embodiments, first direction D1 can be level
Direction, and second direction D2 can be vertical direction, also that is, first direction D1 and second direction D2 are substantially perpendicular.
In some embodiments, as shown in Figures 1 and 2, the level height where buffering microscope carrier 200 is to be different from load
Level height where port 100, and the level height where the first track 600 is the water being different from where buffering microscope carrier 200
Flat height.In more detail, the level height where buffering microscope carrier 200 is above the level height where load port 100, and
Level height where first track 600 is above the level height where buffering microscope carrier 200.Thus, be buffered in installation
When microscope carrier 200 and the first track 600, it is disposed on the top of load port 100 due to buffering microscope carrier 200 and the first track 600,
Therefore, the installation of buffering microscope carrier 200 and the first track 600 can't the running of interference load port 100, and will not interference load end
The running of board 400 corresponding to mouth 100.
For example, in some embodiments, transmission device 300 can be automatic guided vehicle (Automatic guided
vehicle；AGV), railway guidance vehicle (Rail guided vehicle；RGV), overhead system conveying device (Overhead
Hoist Shuttle；OHS), overhead system lifting and transporting device (Overhead Hoist Transport；OHT) or other are suitable
Work as device, object is automatically moved, but this exposure is not limited.
In some embodiments, board 400 can have the function of etch process, the function of deposition manufacture process, yellow light processing procedure
Function, the function of the function of diffusion process or other manufacture of semiconductor, but this exposure is not limited.In other embodiment party
In formula, board 400 can have measurement or detection instrument, and with progress and the relevant detecting of manufacture of semiconductor, but this exposure is not with this
It is limited.
In some embodiments, object can be wafer carrying unit, to accommodate 300mm (12inch) or 450mm
The wafer of (18inch) equidimension, for example, object can be front open type wafer box (Front Open Unified Pods；
FOUPs in), wafer cassette (PODs), wafer carrier (wafer carriers), wafer carrier (wafer carriers) or crystalline substance
Circle casket (cassette), but this exposure is not limited.In other embodiment, object can be light shield carrier, such as：Light shield
Carrier (reticle carriers) or light shield feeder (Reticle SMIF Pod；RSP), but this exposure is not limited.
In some embodiments, as shown in Fig. 2, load port 100 has adjacent supporting part 110 and interconnecting piece 120.
Supporting part 110 can be used to loaded object C.Interconnecting piece 120 protrudes from supporting part 110 and is connected to board 400, and can be used to store
Content in object C is transferred to board 400, or the content being disposed is received from board 400.Furthermore, it is understood that
The interconnecting piece 120 of load port 100 is the connecting pin 410 for connecting board 400.Connecting pin 410 includes an access aperture
(access port) 412, access aperture 412 are the opening doors (port door) 122 for the interconnecting piece 120 for being supported port 100
It is covered with.The opening door 122 of interconnecting piece 120 includes opposite outer surface and inner surface, and outer surface is exposed to semiconductor factory
Environment in, inner surface is the access aperture 412 for the connecting pin 410 for connecting board 400, and inner surface is positioned at board 400
In sealed environment.Thus, when the content material desire in the object C that load port 100 is carried enters board 400, connection
The opening door 122 in portion 120 can be opened so that the content in object C can enter via the access aperture 412 of board 400
In board 400.
For example, in some embodiments, as shown in Fig. 2, when object C is a front open type wafer box, object C can
Including a removable folder door (poddoor) 510, folder door 510 and the opening door 122 of load port 100 can interlock.Citing and
Speech, in some embodiments, 510 top of the folder door of object C has multiple holes, and the opening door 122 of load port 100
Top has the alignment bolt tool (alignmentpin) of corresponding hole.The alignment bolt tool of load port 100 can closely engage folder
The hole of door 510 so that can be closely attached between object C and load port 100.As the object C that load port 100 is carried
In content material desire when entering board 400, the folder door 510 of object C can be opened, and the opening door 122 of load port 100 is also
It is opened so that the content in object C sequentially can enter board via folder door 510, opening door 122 and access aperture 412
In 400.For example, in some embodiments, content in object C can be semiconductor crystal wafer or light shield, but this exposure
It is not limited.
Referring concurrently to Fig. 1~Fig. 3.Fig. 3 is the vertical view of the Transmission system of some embodiments according to this exposure.In portion
Dividing in embodiment, removable buffering microscope carrier 210 may include moving assembly, such as：Pulley, guiding refining, motor or other are appropriate
Driving device, but this exposure is not limited.In some embodiments, the second track 900 may include a sliding part 920,
Sliding part 920 is the removable buffering microscope carrier 210 of connection, and sliding part 920 be mobility couple the second track 900 so that
Removable buffering microscope carrier 210 is moved along the length direction of the second track 900.In some embodiments, the first track 600
Length direction intersect with the length direction of the second track 900.For example, in some embodiments, the first track 600
The length direction of length direction and the second track 900 is substantially perpendicular.Selectively, in some embodiments, the first rail
The length direction of the length direction in road 600 and the second track 900 can fold an obtuse angle or acute angle, but this exposure is not limited.
In some embodiments, the first track 600 is to be adjacent to the connecting pin 410 of board 400, and the first track 600
It is D1 (also that is, orientation of multiple load ports 100) extensions along a first direction.In other words, the of the first track 600
One section 602 and the second section 604 are D1 arrangements, and the length side of the first section 602 of the first track 600 along a first direction
Length direction to the second section 604 with the first track 600 is substantial parallel.Second track 900 is connection board 400
Connecting pin 410, and the second track 900 is along a third direction D3 (also that is, orientation of load port 100 and board 400)
Extend.In other words, the first section 902 of the second track 900 and the second section 904 are arranged along third direction D3, and the
One direction D1 intersects with third direction D3.Thus, due to the length direction (first direction D1) and second of the first track 600
The length direction (third direction D3) of track 900 intersects, and moving buffering microscope carrier 210 can be along third direction D3 in the second track
Moved on 900, transmission device 300 can move D1 on the first track 600 along a first direction, therefore transmission device 300 with it is removable
Dynamic buffering microscope carrier 210 can be located at the surface of 100 position of load port simultaneously so that transmission device 300 can be removable
Object is carried out on dynamic buffering microscope carrier 210 picks and places operation.
In some embodiments, as shown in figure 3, the length of the first section 902 of the second track 900 is not less than removable
Buffer the length of microscope carrier 210.For example, the length of the first section 902 can be greater than or equal to removable buffering microscope carrier 210 in the
The length of three direction D3.Therefore, moving buffering microscope carrier 210 can be entirely located between the first section 902 of the second track 900
Space in, and be entirely located at the surface of load port 100.In some embodiments, the secondth area of the second track 900
Length of the length of section 904 not less than removable buffering microscope carrier 210.For example, the length of the second section 904 can be more than or wait
In removable buffering microscope carrier 210 in the length of third direction D3.Therefore, second can be entirely located at by moving buffering microscope carrier 210
In space between second section 904 of track 900, and fully leave the surface of load port 100.
In some embodiments, Transmission system 10 also includes a buffering microscope carrier actuator 700, buffers microscope carrier actuator
700 be that electric connection or signal are connected to removable buffering microscope carrier 210.Buffering microscope carrier actuator 700 be control it is removable
Buffering microscope carrier 210 moves between first position P1 and second position P2.First position P1 be positioned at load port 100 just on
Side, and second position P2 is relative first position P1 far from board 400.In more detail, in some embodiments, buffering carries
Platform actuator 700 includes the first actuating unit 710, and the first actuating unit 710 is to activate removable buffering microscope carrier 210 to move
It is dynamic so that removable buffering microscope carrier 210 is moved to second position P2 from first position P1.Alternatively, buffering microscope carrier actuator 700 wraps
Containing the second actuating unit 720, the second actuating unit 720 is to activate removable buffering microscope carrier 210 to move so that removable slow
Blanking platform 210 is moved to first position P1 from second position P2, but this exposure is not limited.In some embodiments,
One actuating unit 710 and the second actuating unit 720 can be the software or firmware being installed in same actuator, in other embodiment party
In formula, the first actuating unit 710 and the second actuating unit 720 also can be two independent hardware devices.
In some embodiments, as shown in the 1st and 3 figures, Transmission system 10 also includes one first actuating module 810, electricity
Property coupling transmission device 300, the first actuating module 810 be to when buffer microscope carrier 200 be moved to a position when, control transmission dress
It sets 300 to go to this position and stop on this position, and this position is positioned at the surface of load port 100.In other words,
One actuating module 810 is to be configured to the movement of actuating transmission device 300 and transmission object.When removable buffering microscope carrier 210 be intended to from
When one second position P2 is moved to first position P1, the first actuating module 810 can assign 300 1 transmitting path of transmission device, and
Control transmission device 300 goes to first position P1 along this transmitting path.First position P1 be positioned at load port 100 just on
Side, and second position P2 is relative first position P1 far from board 400.For example, in some embodiments, when removable
When buffering microscope carrier 210 is moved to first position P1, the first actuating module 810 can control the horizontally moving device of transmission device 300
D1 is moved to first position P1 to 310 (seeing Fig. 2) along a first direction, and stops at first position P1.Then, the first actuating
Module 810 can control the elevator 320 (seeing Fig. 2) of transmission device 300 to be moved along second direction D2, and grip and movement
Object on removable buffering microscope carrier 210, but this exposure is not limited.
In some embodiments, as shown in the 1st and 3 figures, Transmission system 10 also includes one second actuating module 820, electricity
Property coupling transmission device 300.Second actuating module 820 is to when buffering microscope carrier 200 leaves first position P1, control transmits
Device 300 goes to the position at 100 place of load port from first position P1.In other words, the second actuating module 820 is to be configured
To activate the movement of transmission device 300 and transmission object.When removable buffering microscope carrier 210 is moved to the second position from first position P1
When P2, the second actuating module 820 can assign 300 1 transmitting path of transmission device, and control transmission device 300 along this transmission path
Diameter advances to load port 100 from first position P1.For example, in some embodiments, when removable buffering microscope carrier 210
When being intended to be moved to second position P2 from first position P1, the second actuating module 820 can control the elevator 320 of transmission device 300
The removable buffering microscope carrier 210 of crawl is in first position P1, the object on this removable buffering microscope carrier 210.Then, when removable
When buffering the movement of microscope carrier 210 and stopping to second position P2, the second actuating module 820 can control the elevator of transmission device 300
320 move along second direction D2 so that and elevator 320 is moved into downwards from first position P1 on load port 100, to
Help object mobile from the first position P1 of removable buffering microscope carrier 210 and be positioned on load port 100, but this exposure not with
This is limited.
In some embodiments, as shown in Figures 1 and 3, buffering microscope carrier 200 is affixed to a third place P3, and the
Three position P3 are the surfaces for not being located at load port 100.That is, fixed buffering microscope carrier 220 is to be located at the first track 600
The underface of the position at place, and it is not located at the surface of the position where load port 100.Therefore, it will not stop transmission
Under the premise of device 300 transmits object to load port 100, fixed buffering microscope carrier 220 can increase the choosing of the placement space of object
Selecting property.In some embodiments, conveyer system 10 also include third actuating module 830, third actuating module 830 be use so that
The third place P3 where dynamic transmission device 300 from fixed buffering microscope carrier 220 is moved to load port 100 or actuating transmission
Device 300 is moved to the third place P3 at fixed 220 place of buffering microscope carrier from load port 100, but this exposure is not limited.
In some embodiments, removable buffering microscope carrier 210 can and be stored in fixed buffering microscope carrier 220 in this Transmission system 10, with
Further increase the selectivity of the buffering placement space of object.
By and large, in some embodiments, the first actuating module 810, the second actuating module 820 activate mould with third
Block 830 may be collectively referred to herein as transmission device actuator 800 again.Transmission device actuator 800 can be used to control transmission device 300 and move
In buffering microscope carrier 200 (buffering microscope carrier 220 with fixed comprising removable buffering microscope carrier 210) between load port 100, also that is,
Transmission device actuator 800 can be used at least one movement of controlled level mobile device 310 with elevator 320.It is real in part
It applies in mode, transmission device actuator 800 can be electrically connected or signal is connected to transmission device 300.In some embodiments,
First actuator 710 and the second actuator 720 may be collectively referred to herein as buffering microscope carrier actuator 700 again, and buffer microscope carrier actuator 700
It can be electrically connected or signal is connected to sliding part 920, be moved to control sliding part 920 so that removable buffering microscope carrier 210 moves
It moves in first position P1 and second position P2.In some embodiments, buffering microscope carrier actuator 700 and transmission device actuator
At least one of 800 can be integrated into one or more processing units of computer.Processing unit can be central processing unit, control
The hardware element of element processed, microprocessor, servomechanism or other executable instructions.In other embodiments, buffering microscope carrier causes
At least one of dynamic device 700 and transmission device actuator 800 can be realized by the computer program of computer and be stored in storage
In device.Storage device includes non-transient computer medium capable of reading record or other devices with storage function.This is calculated
Machine program includes multiple program instructions, these program instructions can be executed by a central processing unit, to execute the work(of each module
Can, but this exposure is not limited.
In some embodiments, transmission device actuator 800 can be electrically connected or signal is connected to raw material control system
It unites (material control system, MCS).Raw material control system can connect multi-section host (host computer), and
Each host is connected to one or more boards 400.Board automated procedures (Equipment Automation can be embedded in host
Program, EAP), it is instructed with publication to transmit message between raw material control system and board, to avoid transmission device
300 possibilities for colliding (collision) when transmitting object.
With reference to Fig. 4.Fig. 4 is the flow chart of the transmission method of some embodiments according to this exposure.In part embodiment party
In formula, transmission method comprises the steps of.In step S10, judge whether load port 100 is occupied.When load port 100
When being judged as occupying, S20 is thened follow the steps；When load port 100 is judged as not being occupied, thening follow the steps S12 (will
It is described in more detail in paragraph later).In step S20, when load port 100 is judged as occupying, mobile cushioning carries
200 to one first position P1 of platform, and first position P1 is positioned at the surface of load port 100.In more detail, work as load end
When mouth 100 does not have the space of storage object, removable buffering microscope carrier 210 can be moved to first position P1, be put with providing object
Between emptying.In step S30, one object of transmission is on the buffering microscope carrier 200 of first position P1.Thus, when load
When port 100 is all occupied, object is optionally placed on buffering microscope carrier 200, therefore, can help to reduce object transmission
Traffic congestion phenomenon between different platform 400, and reduce object and be transmitted in the residence time between different process work bench.
In some embodiments, transmission method also comprises the steps of.In step S12, when load port 100 is judged to
When breaking not to be occupied, mobile cushioning microscope carrier 200 to one second position P2, second position P2 are relative first position P1 far from negative
Load port 100.In step S14, transmit on object to load port 100.Thus, which object can be according to load port instantly
100 state, and be determined and be placed on load port 100 or buffering microscope carrier 200, to increase the placement space of object
Selectivity.For example, in some embodiments, object can be wafer carrying unit, such as：Front open type wafer box
(Front Open Unified Pods；FOUPs in), wafer cassette (PODs), wafer carrier (wafer carriers), wafer
Carrier (wafer carriers) or wafer casket (cassette), but this exposure is not limited.In other embodiment,
Object can light shield carrier, such as：Light shield carrier (reticle carriers) or light shield feeder (Reticle SMIF Pod；
RSP), but this exposure is not limited.
In some embodiments, load port 100 includes also an object arrangement for detecting 130, to detect load port
Whether 100 occupied by object, and object arrangement for detecting 130 can return detected a load port state and give Transmission system 10.
Similarly, buffering microscope carrier 200 also includes an object arrangement for detecting 230, to detect whether buffering microscope carrier 200 is occupied by object,
And object arrangement for detecting 230 can return detected a buffering microscope carrier state and give Transmission system 10.For example, implement in part
In mode, object arrangement for detecting 130 and 230 may include infrared sensing device, pressure-sensing device, optical detection apparatus, again
Power sensing device further, but this exposure is not limited.
In some embodiments, as shown in Figure 1, Transmission system 10 can be combined with an automatic material transfer system 20.
Automatic material transfer system 20 may include a board internetwork transfer apparatus 22, board internetwork transfer apparatus 22 be to by object A from
One board is moved to another board, and board internetwork transfer apparatus 22 is located on transmission device 300.
For example, as shown in Figure 1, in some embodiments, when 22 moving article A of board internetwork transfer apparatus is from a machine
When platform to another board 400, if the load port 100 of board 400 is not occupied, the object of load port 100 is detected
Device 130 can transmit a load port open position S1 and give Transmission system 10 and automatic material transfer system 20.Then, exist
Under the premise of microscope carrier 200 is buffered right over load port 100, object A can be moved to negative by board internetwork transfer apparatus 22
On load port 100.
For example, in other embodiment, as shown in Fig. 2, working as board internetwork transfer apparatus 22 from a board motive objects
When part B is to another board 400, if the load port 100 of board 400 is the object of load port 100 occupied by object C
Part arrangement for detecting 130, which can transmit a load port and occupy state S2, gives Transmission system 10 and automatic material transfer system 20.
Then, Transmission system 10 can be inquired with automatic material transfer system 20 whether buffering microscope carrier 200 is occupied.If buffering microscope carrier
200 are not occupied, then buffer the object arrangement for detecting 230 of microscope carrier 200 and can transmit a buffering microscope carrier open position S3 and give biography
Defeated system 10 and automatic material transfer system 20 drive buffering microscope carrier 200 that can be moved to first along third direction D3
P1 is set, so that object B can be moved on buffering microscope carrier 200 by board internetwork transfer apparatus 22.Then, when board 400 is in the spare time
When setting state, also that is, without any object content (such as：Wafer) in board 400 execute manufacture of semiconductor when, board
400, which can return unloading completion message, gives Transmission system 10 and automatic material transfer system 20.Then, the biography of Transmission system 10
Send that the object C for completing processing procedure can be moved on removable buffering microscope carrier 210 by device 300 or transmission device 300 can will be completed to make
The object C of journey is moved on fixation buffering microscope carrier 220 or the board internetwork transfer apparatus 22 of automatic material transfer system 20 can incite somebody to action
Object C is moved to another board from load port 100, but this exposure is not limited.Therefore, object C can be from load port 100
It leaves.When load port 100 is not occupied by object, the object arrangement for detecting 130 of load port 100 can transmit a load
Port open position S1 gives Transmission system 10 and automatic material transfer system 20.Then, transmission device 300 can will be located at slow
The object B of blanking platform 200 is moved on load port 100.It is noted that be only herein illustrate when Transmission system 10 with
When automatic material transfer system 20 combines, the transfer approach of object should not limit this exposure with this.In practical application, pass
Defeated system 10 and automatic material transfer system 20 can according to situation instantly, such as：The situation of board internetwork transfer apparatus 22, machine
The situation or board 400 that situation that process conditions, the load port 100 of platform 400 are occupied, buffering microscope carrier 200 are occupied its
His correlated condition ... etc., logicality controlling transmission system 10 and automatic material transfer system 20 transmitting path, but originally take off
Dew is not limited.
In some embodiments, Transmission system 10 may include a manufacturing execution system (Manufacturing
Execution System；MES), manufacturing execution system can have the function of planning the transmitting path of object, optimize object
The functions such as the function of transmitting path or the function ... of transmitting path of record object.The buffering microscope carrier actuator of Transmission system 10
700 be the instruction sent out according to manufacturing execution system, controls removable buffering microscope carrier 210 in first position P1 and the second position
It is moved between P2.The transmission device actuator 800 of Transmission system 10 is also the instruction sent out according to manufacturing execution system, control
Transmission device 300 transmits object between load port 100 and buffering microscope carrier 200.
In some embodiments, Transmission system 10 may include an instant dispatching system (Real-Time
Dispatching System；RTD).When 400 idle state of board, also that is, object semiconductor system performed by board 400
When journey is completed, board 400 can return unloading completion message and give manufacturing execution system.Manufacturing execution system can inquire sends work immediately
Next this object of system is intended to be transported on which board.When instant dispatching system replys manufacturing execution system, manufacture executes
System transmits one and carries instruction to transmission device actuator 800.Then, transmission device actuator 800 can control transmission device
Object is moved away from load port 100 by 300.Similarly, when the return of board 400 one, which is loaded into completion message, gives manufacturing execution system,
Also that is, the content in object has been enter into board 400.Next manufacturing execution system can inquire is intended to carry to machine for which batch object
Platform 400, then instant dispatching system can give one processing procedure inventory of manufacturing execution system, wherein stating clearly the half of board 400 to be carried out
The object lists of conductor processing procedure.Then, manufacturing execution system can transmit a carrying and instruct to transmission device actuator 800, transmission
Device actuator 800 can control transmission device 300 that another object is sent on load port 100.
In one or more above-mentioned embodiments, Transmission system includes load port, multiple first tracks, moves horizontally
Device, elevator, at least one second track and buffering microscope carrier.Load port is disposed on board related with manufacture of semiconductor.
Space between at least part of first track is positioned at the surface of load port.Horizontally moving device is mobility ground coupling
Close the first track.Elevator is disposed on horizontally moving device.Second track has continuous first section and the second section, the
One section is the underface in the space between the first track, and the second section is the not space between the first track
Underface.First buffering microscope carrier be mobility couple the second track.Thus, which load port can not be located at by buffering microscope carrier
Surface, therefore object be optionally placed on load port or buffering microscope carrier on, to increase the placement space of object
Selectivity.Therefore, Transmission system can help to reduce the traffic congestion phenomenon that object is transmitted between different platform, and reduce object and pass
Send the residence time between different platform.
In multiple embodiments of this exposure, Transmission system includes load port, multiple first tracks, moves horizontally dress
Set, elevator, at least one second track with buffering microscope carrier.Load port is disposed on board related with manufacture of semiconductor.Extremely
Space between least a portion of first track is positioned at the surface of load port.Horizontally moving device be mobility couple
First track.Elevator is disposed on horizontally moving device.Second track have continuous first section and the second section, first
Section is the underface in the space between the first track, and the second section is that the space between the first track be not just
Lower section.First buffering microscope carrier be mobility couple the second track.
In multiple embodiments of this exposure, wherein the length direction phase of the length direction of the first track and the second track
It hands over.
In multiple embodiments of this exposure, wherein the length direction of the length direction of the first track and the second track is real
It is vertical in matter.
In multiple embodiments of this exposure, wherein the length of the second section of the second track is carried not less than the first buffering
The length of platform.
In multiple embodiments of this exposure, wherein the length of the first section of the second track is carried not less than the first buffering
The length of platform.
In multiple embodiments of this exposure, wherein each of the first track has an extension of section, extension of section
Between space be not be located at load port surface, and Transmission system also include one second buffering microscope carrier.Second buffering carries
Platform is the underface in the space between extension of section.In multiple embodiments of this exposure, Transmission system includes load
Port, multiple tracks, horizontally moving device, elevator and buffering microscope carrier.Load port is disposed on one to be had with manufacture of semiconductor
The board of pass.It is to be located to bear that each of track, which has continuous first section and the second section, the space between the first section,
The surface of load port, the space between the second section are the surfaces for not being located at load port.Horizontally moving device is removable
With moving property coupler orbit.Elevator is disposed on horizontally moving device.Buffering microscope carrier is the space between the second section
Underface.
In multiple embodiments of this exposure, wherein the length direction of the length direction of the first section and the second section is real
It is parallel in matter.
In multiple embodiments of this exposure, transmission method comprises the steps of.Judge whether load port is occupied.
When load port, which is judged, to be occupied, a mobile buffering microscope carrier a to first position, and first position is to be located at load port
Surface.An object is transmitted on the buffering microscope carrier of first position.
In multiple embodiments of this exposure, transmission method also comprises the steps of.When load port is judged as not
When being occupied, mobile cushioning microscope carrier a to second position, and the second position is relative first position far from load port.Transmit object
On part to load port.
It is above-mentioned to have summarized the feature of several embodiments, therefore be familiar with this those skilled in the art and can know more about the aspect of this exposure.It is ripe
Know this those skilled in the art it will be understood that its can easily utilize this exposure as basis, to design or retouch other processing procedures and structure, with
It realizes purpose identical with embodiment described herein and/or reaches identical advantage.Be familiar with this those skilled in the art it will also be appreciated that
It arrives, this kind of equalization framework is without departing from the spirit and scope of this exposure, and being familiar with this those skilled in the art can be in the essence for not departing from this exposure
Under god and range, various changes, substitution and retouching are carried out.
Claims (10)
1. a kind of Transmission system, which is characterized in that include：
One load port is set to a board related with manufacture of semiconductor；
Multiple first tracks, the surface for being spatially located at the load port between at least part of first track；
One horizontally moving device couples to mobility the multiple first track；
One elevator is set to the horizontally moving device；
There is at least one second track continuous 1 first section and one second section, first section to be located at the multiple
The underface in the space between the first track, and the second section not space between the multiple first track
Underface；And
One first buffering microscope carrier, couples to mobility second track.
2. Transmission system according to claim 1, which is characterized in that the length direction of the multiple first track with this
The length direction of two tracks intersects.
3. Transmission system according to claim 1, which is characterized in that the length direction of the multiple first track with this
The length direction of two tracks is vertical.
4. Transmission system according to claim 1, which is characterized in that the length of second section of second track is not small
In the length of the first buffering microscope carrier.
5. Transmission system according to claim 1, which is characterized in that the length of first section of second track is not small
In the length of the first buffering microscope carrier.
6. Transmission system according to claim 1, which is characterized in that each of the multiple first track has one to prolong
Section is stretched, the space between the extension of section is not located at the surface of the load port, and the transport system also includes：
One second buffering microscope carrier, the underface in the space between the extension of section.
7. a kind of Transmission system, which is characterized in that include：
One load port is set to a board related with manufacture of semiconductor；
Multiple tracks, each of the multiple track have continuous 1 first section and one second section, and described first
The surface for being spatially located at the load port between section, the space between second section are not located at the load port
Surface；
One horizontally moving device couples to mobility the multiple track；
One elevator is set to the horizontally moving device；And
One buffering microscope carrier, the underface in the space between second section.
8. according to the Transmission system described in claim the 7, which is characterized in that the length direction of first section with it is described
The length direction of second section is parallel.
9. a kind of transmission method, which is characterized in that include：
Judge whether a load port is occupied；
When the load port, which is judged, to be occupied, mobile buffering microscope carrier is to a first position, and the first position is to be located at
The surface of the load port；And
An object is transmitted on the buffering microscope carrier of the first position.
10. transmission method according to claim 9, which is characterized in that also include：
When the load port is judged as not being occupied, the mobile buffering microscope carrier is to a second position, and the second position is
The opposite first position is far from the load port；And
It transmits on the object to the load port.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710122138.2A CN108538769B (en) | 2017-03-03 | 2017-03-03 | Transmission system and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710122138.2A CN108538769B (en) | 2017-03-03 | 2017-03-03 | Transmission system and method |
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| CN108538769B CN108538769B (en) | 2020-10-20 |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1576202A (en) * | 2003-07-11 | 2005-02-09 | 台湾积体电路制造股份有限公司 | Wafer carrier load port transfer device |
| US20060257233A1 (en) * | 2005-05-16 | 2006-11-16 | Bonora Anthony C | Interface between conveyor and semiconductor process tool load port |
| CN102054725A (en) * | 2009-10-29 | 2011-05-11 | 台湾积体电路制造股份有限公司 | System and method for overhead cross-system transportation |
-
2017
- 2017-03-03 CN CN201710122138.2A patent/CN108538769B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1576202A (en) * | 2003-07-11 | 2005-02-09 | 台湾积体电路制造股份有限公司 | Wafer carrier load port transfer device |
| US20060257233A1 (en) * | 2005-05-16 | 2006-11-16 | Bonora Anthony C | Interface between conveyor and semiconductor process tool load port |
| CN102054725A (en) * | 2009-10-29 | 2011-05-11 | 台湾积体电路制造股份有限公司 | System and method for overhead cross-system transportation |
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|---|---|
| CN108538769B (en) | 2020-10-20 |
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