CN108461628A - Self-heating phase-change memory cell and self-heating phase change storage structure - Google Patents

Self-heating phase-change memory cell and self-heating phase change storage structure Download PDF

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Publication number
CN108461628A
CN108461628A CN201810174959.5A CN201810174959A CN108461628A CN 108461628 A CN108461628 A CN 108461628A CN 201810174959 A CN201810174959 A CN 201810174959A CN 108461628 A CN108461628 A CN 108461628A
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self
phase
heating
change memory
memory cell
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沈佳斌
朱敏
任堃
吕士龙
宋志棠
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Shanghai Institute of Microsystem and Information Technology of CAS
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Shanghai Institute of Microsystem and Information Technology of CAS
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20Multistable switching devices, e.g. memristors
    • H10N70/231Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/841Electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/881Switching materials
    • H10N70/882Compounds of sulfur, selenium or tellurium, e.g. chalcogenides

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Abstract

A kind of self-heating phase-change memory cell of present invention offer and self-heating phase change storage structure.Self-heating phase-change memory cell includes self-heating electrode and the phase change memory medium that is connected with the self-heating electrode, the self-heating electrode includes at least one layer of self-heating material layer, the phase change memory medium includes at least one layer of phase-change storage material layer, wherein, the self-heating material layer is different with the material of the phase-change storage material layer, and the self-heating material layer and the phase-change storage material layer include at least one chalcogen.The self-heating phase-change memory cell of the present invention also characteristic with low-power consumption while with rapid data write capability, and the heat between adjacent self-heating phase-change memory cell can effectively be avoided to interfere;The self-heating phase change storage structure of the present invention has very fast writing speed, and data holding ability is strong, while also having many advantages, such as low in energy consumption, and service life is long.

Description

Self-heating phase-change memory cell and self-heating phase change storage structure
Technical field
The present invention relates to semi-conducting material and field of semiconductor devices, more particularly to a kind of self-heating phase-change memory cell And self-heating phase change storage structure.
Background technology
Phase transition storage (PCRAM) is a kind of non-volatile memory device.Its basic principle is to be with chalcogenide compound Storage medium makes storage medium mutually be converted to real between crystalline state (low-resistance) and amorphous state (high resistant) using electric energy (heat) The write-in and erasing of existing information.Specifically, resistance sizes of the reading of information by measuring storage medium, it is high resistant " 1 " to compare it Or low-resistance " 0 " is realized.Since phase transition storage need not wipe pervious code or data before more fresh code is written, Therefore its speed is more advantageous than traditional NAND, access time is more balanced, and phase transition storage is not necessarily to mechanical rotation device, preserves generation Code or data do not need refresh current yet, therefore power dissipation ratio HDD, NAND, DRAM is low.In addition, phase transition storage is also proved have There is the advantages that long lifespan, storage density is high, and Radiation hardness is strong, so phase transition storage is considered as most possible substitution tradition Mainstream memory and as future memory main product.Main several large memories producers of the world are also all promptly carrying out phase The research and development of transition storage and related phase-change storage material.
From the point of view of existing research and development situation, the large-scale application of phase transition storage there is also problems have it is to be overcome. For example, how the problem of how further decreasing power consumption of phase-change memory, avoid phase-change storage material during undergoing phase transition Interference effect between the problem of phase transition storage may being caused to fail because of the variation of material volume and adjacent phase-change memory cell The problems such as device performance stability.Currently, to the research and development of phase transition storage generally concentrate on by basis phase-change material into Row doping, such as in Sb2Te3Middle doping Ti, N, Sn etc., to further increase its data retention by improving its crystallization temperature And the problems such as reducing the interference between consecutive storage unit.But the phase-change material of doping can lead to phase transformation again because melting temperature increases The power consumption of memory increases, and due to doping generates split-phase the cycle life of phase change memory device is reduced etc..Therefore, it researches and develops Go out a kind of new phase change memory device, category must to seek to balance in fact in various aspects such as its data holding ability, power consumption, phase velocities It wants.
Invention content
In view of the foregoing deficiencies of prior art, the purpose of the present invention is to provide a kind of self-heating phase-change memory cells And self-heating phase change storage structure, phase change memory list higher for solving power consumption of phase-change memory in the prior art, adjacent The problems such as heat interference is easy tod produce between member.
In order to achieve the above objects and other related objects, the present invention provides a kind of self-heating phase-change memory cell, it is described from Heating phase-change memory cell includes self-heating electrode and the phase change memory medium that is connected with the self-heating electrode, it is described from It includes at least one layer of self-heating material layer to heat electrode, and the phase change memory medium includes at least one layer of phase-change storage material layer, Wherein, the material of the self-heating material layer and the phase-change storage material layer is different, and the self-heating material layer and described Phase-change storage material layer includes at least one chalcogen.
Preferably, the self-heating phase-change material layers are in crystalline state always, and crystalline state-can occur for the phase-change storage material layer Amorphous reversible transition.
Preferably, the crystalline resistance of the phase-change storage material layer is more than 103Ohm, and the phase-change storage material layer The crystalline resistance value of crystalline resistance value and the self-heating material layer is in the same order of magnitude.
Preferably, the chemical formula of the composition of the self-heating material layer is MX2, wherein M is metallic element, and X is sulfur family Element.
It is highly preferred that the composition of the self-heating material layer is selected from by TiTe2、TiSe2、TiS2、TaSe2、MoSe2、 TaSe2、SnTe2And TaTe2It is one or more in the group constituted.
Preferably, the composition of the phase-change storage material layer is selected from by Sb2Te3、Bi2Te3、Sc2Te3、BiSbTe3、 Bi2Se3And Sc2Se3It is one or more in the group constituted.
Preferably, the self-heating electrode includes 2~5 layers of self-heating material layer, and the phase change memory medium includes 5 ~10 layers of phase-change storage material layer.
Preferably, the repeatable number of operations of the self-heating phase-change memory cell is not less than 107It is secondary.
Preferably, the writing speed of the self-heating phase-change memory cell is in nanosecond rank.
The present invention also provides a kind of self-heating phase change storage structure, the self-heating phase change storage structure is folded including at least one Layer structure, the laminated construction includes at least one self-heating phase-change memory cell as described in above-mentioned either a program.
Preferably, the laminated construction includes multiple self-heating phase-change memory cells being sequentially stacked, wherein an institute State the phase change memory medium in self-heating phase-change memory cell and another self-heating phase change memory list adjacent thereto The self-heating contact electrode in member.
It is highly preferred that the laminated construction includes 5~20 self-heating phase-change memory cells.
As described above, the self-heating phase-change memory cell and self-heating phase change storage structure of the present invention, have beneficial below Effect:The self-heating phase-change memory cell of the present invention includes self-heating electrode and phase change memory medium, and self-heating electrode is in phase Become during storage medium is undergone phase transition and do not undergo phase transition and maintain crystalline state always, so as to be entire self-heating phase transformation Storage unit provides a relatively stable heating power to maintain phase transformation, ensures self-heating phase-change memory cell with quick The also characteristic with low-power consumption while data writing capability, and can effectively avoid between adjacent self-heating phase-change memory cell Heat interference;The self-heating phase change storage structure of the present invention has very fast writing speed, and data holding ability is strong, together When, also has many advantages, such as low in energy consumption, and service life is long.
Description of the drawings
Fig. 1 be shown as the embodiment of the present invention one based on TiTe2-Sb2Te3Self-heating phase-change memory cell superlattices Structural schematic diagram.
Fig. 2 is shown as the TiTe in the embodiment of the present invention one2-Sb2Te3Superlattice structure anneals 2 under condition of different temperatures X-ray diffraction result after minute.
Fig. 3 is in the embodiment of the present invention one based on TiTe2-Sb2Te3The self-heating phase-change memory cell of superlattice structure Resistance and voltage curve.
Fig. 4 be shown as in the embodiment of the present invention one based on TiTe2-Sb2Te3The self-heating phase change memory of superlattice structure The test experiments result of the writing speed of unit.
Fig. 5 be shown as in the embodiment of the present invention one based on TiTe2-Sb2Te3The self-heating phase change memory of superlattice structure The test experiments result of the repetitive operation number of unit.
Fig. 6 is in the embodiment of the present invention one based on TiTe2-Sb2Te3The self-heating phase-change memory cell of superlattice structure Testing fatigue before and after resistance and voltage correlation curve.
Fig. 7 is shown as the self-heating phase change storage structure of the embodiment of the present invention two.
Component label instructions
1 self-heating phase-change memory cell
11 self-heating electrodes
111 self-heating material layers
12 phase change memory mediums
121 phase-change storage material layers
Specific implementation mode
Illustrate that embodiments of the present invention, those skilled in the art can be by this explanations by particular specific embodiment below Content disclosed by book understands other advantages and effect of the present invention easily.
It please refers to Fig.1 to Fig. 7.It should be clear that structure, ratio, size etc. depicted in this specification institute accompanying drawings, only to Coordinate the revealed content of specification, so that those skilled in the art understands and reads, being not limited to the present invention can be real The qualifications applied, therefore do not have technical essential meaning, the tune of the modification of any structure, the change of proportionate relationship or size It is whole, in the case where not influencing the effect of present invention can be generated and the purpose that can reach, should all still fall in disclosed skill In the range of art content can cover.Meanwhile in this specification it is cited as "upper", "lower", "left", "right", " centre " and The term of " one " etc. is merely convenient to being illustrated for narration, rather than to limit the scope of the invention, relativeness It is altered or modified, under the change of no substantial technological content, when being also considered as the enforceable scope of the present invention.
As shown in Figures 1 to 6, the present invention provides a kind of self-heating phase-change memory cell 1, the self-heating phase change memory list Member 1 includes self-heating electrode 11 and the phase change memory medium 12 being connected with the self-heating electrode 11, the self-heating electricity Pole 11 includes at least one layer of self-heating material layer 111, and the phase change memory medium 12 includes at least one layer of phase-change storage material layer 121, wherein the self-heating material layer 111 is different with the material of the phase-change storage material layer 121, more precisely, described The constitution element of the constitution element of self-heating material layer 111 and the phase-change storage material layer 121 is not exactly the same, and it is described from Heating material layer 111 and the phase-change storage material layer 121 include at least one chalcogen.
As an example, the self-heating phase-change material layers 111 are in crystalline state always, the phase-change storage material layer 121 can The amorphous reversible transition of crystalline state-occurs.When the phase-change storage material layer 121 is in crystalline state, the phase-change storage material The crystalline resistance value of layer 121 is in high value, for example is more than 103Ohm, and the crystalline resistance of the phase-change storage material layer 121 The crystalline resistance value of value and the self-heating material layer 111 is in the same order of magnitude.At the phase-change storage material layer 121 Resistance value when crystalline state and resistance when in amorphous state differ greatly, or even can differ the 4-6 order of magnitude, thus, it utilizes Electric energy (heat) makes the phase change memory medium 12, and mutually conversion can be real between crystalline state (low-resistance) and amorphous state (high resistant) The write-in and erasing of existing information.For example, the reading of information can measure the resistance sizes of the phase change memory medium 12, compare it It is high resistant " 1 " or low-resistance " 0 " to realize.And the self-heating electrode 11 is not involved in phase transformation, in entire phase transition process, always In crystalline state, thus when the phase change memory connects medium 12 and undergoes phase transition melting, in the self-heating phase-change memory cell 1 still It can go to maintain phase transformation there are one relatively stable heating power.
As an example, the chemical formula of the composition of 111 material of self-heating material layer is MX2, wherein M is metal member Element, X are chalcogen.Specifically, the composition of the self-heating material layer 111 can be selected from but be not limited only to by TiTe2、 TiSe2、TiS2、TaSe2、MoSe2、TaSe2、SnTe2Or TaTe2One or more in the group constituted, the phase transformation is deposited The composition of storage material layer 121 can be selected from but be not limited only to by Sb2Te3、Bi2Te3、Sc2Te3、BiSbTe3、Bi2Se3、 Sc2Se3It is one or more in the group constituted.One common ground of above-mentioned material composition is including at least one sulphur Race's element is further analyzed, TiTe2、TiSe2、TiS2、TaSe2、MoSe2、TaSe2、SnTe2And TaTe2There is similar atom It arranges and shows similar physics and chemical property, and Sb2Te3、Bi2Te3、Sc2Te3、BiSbTe3、Bi2Se3And Sc2Se3Have Similar Atomic Arrangement and similar physics and chemical property are shown, for example crystalline state-amorphous can occur under certain condition The reversible transition of state, it is possible thereby to as phase-change storage material, thus can be used as alternative materials use in the present invention.
As an example, the self-heating electrode 11 can with but be not limited only to include 2~5 layers of self-heating material layer 111, The phase change memory medium 12 can with but be not limited only to include 5~10 layers of phase-change storage material layer 121.The self-heating electricity The number of layers that pole 11 and the phase change memory medium 12 include is unsuitable too many or very little.For example, if the self-heating is electric The self-heating phase-change memory cell 1 can be caused excessive if 111 number of plies of self-heating material layer that pole 11 includes is too many, no Conducive to the integrated of subsequent device;If 111 number of plies of self-heating material layer that the self-heating electrode 11 includes is very little Good self-heating effect is not had then and the effect of the adjacent self-heating phase-change memory cell 1 is isolated.Likewise, if It is unfavorable for the miniaturization of device if 121 number of plies of phase-change storage material layer that the phase change memory medium 12 includes is too many, But if can cause the memory capacity of the self-heating phase-change memory cell 1 limited if very little.
For the design further illustrated the present invention, constructed based on TiTe in the present embodiment2-Sb2Te3The phase transformation of material is deposited Storage unit, wherein the TiTe2Self-heating electrode 11 of the material layer as the self-heating phase-change memory cell 1, it is described Sb2Te3Phase change memory medium 12 of the material layer as the self-heating phase-change memory cell 1, the self-heating electrode 11 and described Phase change memory medium 12 is connected and the phase change memory medium 12 is located at the surface of the self-heating electrode 11.More specifically, The TiTe2Material layer includes 4 layers of TiTe2Crystal structure, the Sb2Te3Material layer includes 8 layers of Sb2Te3Crystal structure, it is described TiTe2Material layer and the Sb2Te3Material layer has common chalcogen Te, thus the TiTe2Material layer and described Sb2Te3Lattice mismatch of the material layer at linkage interface is very small, and the TiTe2Material layer and the Sb2Te3Material layer structure It is specific as shown in Figure 1 at a superlattice structure.
Please refer to TiTe shown in Fig. 22-Sb2Te3Superlattice structure anneal 2 minutes under condition of different temperatures after X Ray diffraction results, it can be seen that the TiTe of deposited2-Sb2Te3In, Sb2Te3There is a partially crystallizable, but crystal grain very little; After 100 DEG C of heat treatment, Sb2Te3Diffraction peak intensity compared with deposited without significant change, illustrate that grain size does not have significant change;And it is hot After 200 and 300 DEG C of processing, Sb2Te3Diffraction peak intensity obviously compared with deposited and 100 DEG C of heat treated sample highers, explanation Sb2Te3Crystal grain is grown up.In this four groups of samples, TiTe2Peak position and peak intensity without significant change, show in TiTe2- Sb2Te3In superlattice structure, TiTe2It is constantly in crystalline structure, significant change does not occur.The present invention is exactly to utilize TiTe2 This characteristic construct a kind of TiTe2-Sb2Te3And it similar superlattice structure and is formed therewith using such superlattice structure Self-heating phase-change memory cell.Conventional phase-change material can have the molten state of a transient state, at this time material electricity in phase transition process Resistance can nearly an order of magnitude at least lower than crystalline resistance, because of heating power W=I2R, in melting, since resistance R drops Low, heating power can reduce;And the present invention uses multilayered structure, wherein TiTe2It is not involved in phase transformation, in entire phase transition process, It is constantly in crystalline state, even if Sb2Te3It undergoes phase transition, at this time TiTe2It is maintained as crystalline resistance, i.e., has a perseverance in phase transition process Fixed R exists, in Sb2Te3When undergoing phase transition melting, material can still go to maintain phase transformation there are one relatively stable heating power, i.e., TiTe2Layer plays self heating function, thus can also reduce the power consumption of the phase-change memory cell.And due to TiTe2Material layer is always In crystalline state, the self-heating phase-change memory cell 1 can be generated during its phase change memory medium 12 is undergone phase transition Volume change be reduced to it is minimum, so as to avoid in conventional phase change memory part, because phase-change storage material is being undergone phase transition The variation of process in which materials volume too big the problem of phase transition storage may being caused to fail.Phase-change storage material in the present embodiment The crystalline resistance of layer is more than 103Ohm, with TiTe2Crystalline resistance value be in the same order of magnitude.
Please refer to Fig. 3 based on TiTe2-Sb2Te3The self-heating phase-change memory cell of superlattices phase-change material is obtained Resistance and voltage curve.From the figure 3, it may be seen that Set (data write-in) voltages needed when 300 nanosecond and Reset voltages point It Wei not 1.4V and 2.3V.After pulse width becomes smaller, it can still carry out Set and Reset and operate, but it is electric needed for Set and Reset Pressure increased.Under 20 nanosecond pulse widths, corresponding Set has risen to 2.5V and 3.3V respectively with Reset voltages.This explanation Based on TiTe2-Sb2Te3The self-heating phase-change memory cell of superlattice structure has higher crystalline rate, can be in nanosecond number Magnitude realizes the reversible transition of amorphous state and crystalline state, passes through reversible transition of the phase change memory medium between amorphous state and crystalline state To realize the write-in and reading of data.Thus, the data write-in of the self-heating phase-change memory cell of this experiment surface present invention Speed is very fast, can reach nanosecond rank.It should be noted that in this implementation, the self-heating phase-change memory cell is in electricity Reversible transition of the phase-change storage material layer (phase change memory medium) between amorphous state and crystalline state is realized under impulse action.When So, in other examples, other mode of excitation are may be based on, for example realize the phase change memory material under the excitation of laser pulse Reversible transition of the bed of material (phase change memory medium) between amorphous state and crystalline state, specifically no longer illustrates.
Further, the test experiments result of Fig. 4 is please referred to, it can be seen that when Set voltages are 2.3V, traditional GST (Ge2Sb2Te5) phase change memory device Set speed and Sb2Te3The Set speed of phase change memory device be respectively necessary for 100 nanoseconds and 50 nanoseconds, and the present embodiment based on TiTe2-Sb2Te3The self-heating phase-change memory cell of superlattice structure only needed for 20 nanoseconds, Therefore it can prove to be based on TiTe2-Sb2Te3The service speed of the self-heating phase-change memory cell of superlattice structure is than routine GST phase transition storages are fast, than the Sb of the doping type before improvement2Te3Phase transition storage is also much faster.
Please refer to Fig. 5 based on TiTe2-Sb2Te3The repeatable operation time of the self-heating phase-change memory cell of superlattice structure Number test obtain as a result, from the figure, it can be seen that the present invention based on TiTe2-Sb2Te3The self-heating phase transformation of superlattice structure Storage unit repeats number of operations and has reached 107Number magnitude, and please continue to refer to Fig. 6 based on TiTe2-Sb2Te3 The comparison of obtained resistance and voltage curve before and after the self-heating phase-change memory cell testing fatigue of superlattice structure.By Fig. 6 It can be seen that before testing fatigue, under the conditions of 300 nanosecond pulse widths, Set and the Reset voltage of device be respectively 1.4V and 2.3V;And the preset test condition of process (such as repetitive operation 107After secondary) in the testing fatigue that carries out afterwards, same 300 nanosecond Under the conditions of pulsewidth, the Set voltages of device are only reduced to 1.3V, and corresponding Reset voltages are also only reduced to 1.9V.100 Under the conditions of nanosecond pulse width, although Set and Reset voltages are also having reduction after the testing fatigue of preset test condition, Still in operable range, show the present invention based on TiTe2-Sb2Te3The self-heating phase-change memory cell of superlattice structure With very long operation lifetime.
It should be noted that, although the experiment of the present embodiment is all based on TiTe2-Sb2Te3The self-heating of superlattice structure What phase-change memory cell carried out, but the inventors discovered that, in use and TiTe2-Sb2Te3With its of similar superlattice structure He also shows essentially identical characteristic by the self-heating phase-change memory cell of material preparation, for example, when the self-heating phase transformation is deposited The composition of the self-heating material layer of the self-heating electrode of storage unit is selected from by TiTe2、TiSe2、TiS2、TaSe2、 MoSe2、TaSe2、SnTe2And TaTe2It is one or more in the group constituted, and the phase of the phase-change memory cell The composition for becoming storage material layer is selected from by Sb2Te3、Bi2Te3、Sc2Te3、BiSbTe3、Bi2Se3And Sc2Se3The group constituted When one or more in group, the self-heating phase-change memory cell equally has previously described writing speed fast, work( Consume it is low, and the advantages that can effectively avoid the heat interference between the adjacent self-heating phase-change memory cell.Certainly, the self-heating The preferred TiTe of composition of the self-heating material layer of the self-heating electrode of phase-change memory cell2And the phase-change storage material The preferred Sb of composition of layer2Te3, because the raw material of this two classes composition are easier to obtain, preparation process is also highly developed, because And it is just easy to prepare required self-heating phase-change memory cell using existing process equipment and material.It is based on for example, preparing TiTe2-Sb2Te3Ti, Te target co-sputtering and Sb may be used in the self-heating phase-change memory cell of superlattice structure2Te3Alloys target according to Secondary sputtering is prepared, more specifically, for example, provide a substrate, on the substrate pre-production have lower electrode, with Ti, Te target Cosputtering mode is deposited on depositing Ti Te on the lower electrode2Self-heating electrode, specific sedimentation time depending on required thickness, Then Sb is used2Te3Alloys target is in the TiTe2Sb is deposited on self-heating electrode2Te3Phase-change storage material layer, likewise, when deposition Between depending on required deposition thickness.But it should be recognized that need to be continually fed into purity in whole preparation process be 99.999% Ar gas controls the sequence of growing film by switching target overhead gage.
Embodiment two
As shown in fig. 7, the present invention also provides a kind of self-heating phase change storage structure, the self-heating phase change storage structure packet An at least laminated construction is included, the laminated construction includes at least one self-heating phase-change memory cell as described in embodiment one 1.To expand the memory capacity of the self-heating phase change storage structure, the laminated construction generally includes multiple institutes being sequentially stacked State self-heating phase-change memory cell 1, wherein the phase change memory medium 12 in a self-heating phase-change memory cell 1 with The self-heating electrode 11 in another self-heating phase-change memory cell 1 adjacent thereto is in contact.In the present embodiment, institute It includes two laminated construction to state self-heating phase change storage structure, two laminated construction laid out in parallel and is provided between each other Isolated material, for example it is provided with insulating materials.
As an example, the laminated construction includes but is not limited only to 5~20 self-heating phase-change memory cells 1, institute It states 5~20 self-heating phase-change memory cells 1 to be sequentially stacked, wherein the institute in a self-heating phase-change memory cell 1 State phase change memory medium 12 and 11 phase of self-heating electrode in another self-heating phase-change memory cell 1 adjacent thereto Contact, more specifically, the phase change memory medium 12 in a self-heating phase-change memory cell 1 be located at it is adjacent thereto another The surface of the self-heating electrode 11 in the one self-heating phase-change memory cell 1, i.e., the adjacent self-heating phase transformation are deposited There is the self-heating electrode 11 to be isolated between storage unit 1, therefore the phase of the adjacent self-heating phase-change memory cell 1 Interference will not be generated mutually when undergoing phase transition by becoming storage medium 12, thus can guarantee the entire self-heating phase change memory knot The stability of structure.The quantity for the self-heating phase-change memory cell 1 that the self-heating phase change storage structure includes is gone back according to need Can there are other selections, specific structure that can also advanced optimize, and actual device architecture is also intricately more than this, specifically It is not reinflated.
In conclusion the present invention provides a kind of self-heating phase-change memory cell, including self-heating electrode and with it is described from The phase change memory medium that heating electrode is connected, the self-heating electrode include at least one layer of self-heating material layer, the phase transformation Storage medium includes at least one layer of phase-change storage material layer, wherein the self-heating material layer and the phase-change storage material layer Material it is different, and the self-heating material layer and the phase-change storage material layer include at least one chalcogen.This hair Bright self-heating phase-change memory cell includes self-heating electrode and phase change memory medium, and self-heating electrode is in phase change memory medium It is not undergone phase transition during undergoing phase transition and maintains crystalline state always, so as to be carried for entire self-heating phase-change memory cell For a relatively stable heating power to maintain phase transformation, ensure the self-heating phase-change memory cell with rapid phase transition energy Also there is low-power consumption while power, and can effectively avoid the heat interference between adjacent self-heating phase-change memory cell;The present invention's Self-heating phase change storage structure has very fast writing speed, and data holding ability is strong, at the same also have it is low in energy consumption, The advantages that service life is long.So the present invention effectively overcomes various shortcoming in the prior art and has high industrial exploitation value Value.
The above-described embodiments merely illustrate the principles and effects of the present invention, and is not intended to limit the present invention.It is any ripe The personage for knowing this technology can all carry out modifications and changes to above-described embodiment without violating the spirit and scope of the present invention.Cause This, institute is complete without departing from the spirit and technical ideas disclosed in the present invention by those of ordinary skill in the art such as At all equivalent modifications or change, should by the present invention claim be covered.

Claims (12)

1. a kind of self-heating phase-change memory cell, it is characterised in that:The self-heating phase-change memory cell includes self-heating electrode And the phase change memory medium being connected with the self-heating electrode, the self-heating electrode include at least one layer of self-heating material Layer, the phase change memory medium include at least one layer of phase-change storage material layer, wherein the self-heating material layer and the phase transformation The material of storage material layer is different, and the self-heating material layer and the phase-change storage material layer include at least one sulfur family Element.
2. self-heating phase-change memory cell according to claim 1, it is characterised in that:The self-heating material layer is located always In crystalline state, the amorphous reversible transition of crystalline state-can occur for the phase-change storage material layer.
3. self-heating phase-change memory cell according to claim 2, it is characterised in that:The crystalline substance of the phase-change storage material layer State resistance is more than 103Ohm, and the crystalline state of the crystalline resistance value of the phase-change storage material layer and self-heating material layer electricity Resistance value is in the same order of magnitude.
4. self-heating phase-change memory cell according to claim 1, it is characterised in that:The combination of the self-heating material layer The chemical formula of object is MX2, wherein M is metallic element, and X is chalcogen.
5. self-heating phase-change memory cell according to claim 4, it is characterised in that:The combination of the self-heating material layer Object is selected from by TiTe2、TiSe2、TiS2、TaSe2、MoSe2、TaSe2、SnTe2And TaTe2One kind in the group constituted or It is a variety of.
6. self-heating phase-change memory cell according to claim 5, it is characterised in that:The group of the phase-change storage material layer Object is closed to be selected from by Sb2Te3、Bi2Te3、Sc2Te3、BiSbTe3、Bi2Se3And Sc2Se3One kind or more in the group constituted Kind.
7. self-heating phase-change memory cell according to claim 1, it is characterised in that:The self-heating electrode includes 2~5 The layer self-heating material layer, the phase change memory medium include 5~10 layers of phase-change storage material layer.
8. self-heating phase-change memory cell according to claim 1, it is characterised in that:The self-heating phase-change memory cell Repeatable number of operations be not less than 107It is secondary.
9. self-heating phase-change memory cell according to claim 1, it is characterised in that:The self-heating phase-change memory cell Writing speed in nanosecond rank.
10. a kind of self-heating phase change storage structure, it is characterised in that:The self-heating phase change storage structure includes an at least lamination Structure, the laminated construction include at least one self-heating phase-change memory cell as claimed in any one of claims 1-9 wherein.
11. self-heating phase change storage structure according to claim 10, it is characterised in that:The laminated construction includes multiple The self-heating phase-change memory cell being sequentially stacked, wherein the phase transformation in a self-heating phase-change memory cell is deposited Storage media and the self-heating contact electrode in another self-heating phase-change memory cell adjacent thereto.
12. self-heating phase change storage structure according to claim 11, it is characterised in that:The laminated construction include 5~ 20 self-heating phase-change memory cells.
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