CN108396369A - 一种合金基材电镀镀层退镀免抛光退镀液及退镀方法 - Google Patents
一种合金基材电镀镀层退镀免抛光退镀液及退镀方法 Download PDFInfo
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- CN108396369A CN108396369A CN201810215317.5A CN201810215317A CN108396369A CN 108396369 A CN108396369 A CN 108396369A CN 201810215317 A CN201810215317 A CN 201810215317A CN 108396369 A CN108396369 A CN 108396369A
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- decoating liquid
- strip
- concentrated sulfuric
- sulfuric acid
- phosphoric acid
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
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- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
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- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
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Priority Applications (1)
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CN201810215317.5A CN108396369A (zh) | 2018-03-15 | 2018-03-15 | 一种合金基材电镀镀层退镀免抛光退镀液及退镀方法 |
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CN201810215317.5A CN108396369A (zh) | 2018-03-15 | 2018-03-15 | 一种合金基材电镀镀层退镀免抛光退镀液及退镀方法 |
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CN108396369A true CN108396369A (zh) | 2018-08-14 |
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CN201810215317.5A Pending CN108396369A (zh) | 2018-03-15 | 2018-03-15 | 一种合金基材电镀镀层退镀免抛光退镀液及退镀方法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109706517A (zh) * | 2019-02-22 | 2019-05-03 | 苏州中研达环境技术有限公司 | 一种电解退镍铬添加剂及其制备方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2536690A1 (de) * | 1975-08-18 | 1977-03-03 | Siemens Ag | Bad und verfahren zum elektrolytischen abloesen von stromlos abgeschiedenen nickelueberzuegen von buntmetallen und buntmetallegierungen |
GB2129443A (en) * | 1982-10-29 | 1984-05-16 | Latszereszeti Eszkoezoek Gyara | Electrolytic removal of nickel chromium or gold layers from the surface base and apparatus therefore |
SE9101469D0 (sv) * | 1991-05-15 | 1991-05-15 | Sandvik Ab | Etsmetod |
CN101481816A (zh) * | 2008-12-29 | 2009-07-15 | 西安理工大学 | 一种剥离铁基类石墨镀层的脱膜剂及脱膜方法 |
CN101629319A (zh) * | 2009-08-11 | 2010-01-20 | 中国科学院宁波材料技术与工程研究所 | 一种退除钢铁表面类金刚石碳膜的方法 |
CN102943301A (zh) * | 2012-10-30 | 2013-02-27 | 四川华丰企业集团有限公司 | 一种对工件表面上的镍磷镀层进行褪镀的方法 |
CN204959074U (zh) * | 2015-07-30 | 2016-01-13 | 深圳市泰日升实业有限公司 | 嵌铜铝基板退镀装置 |
-
2018
- 2018-03-15 CN CN201810215317.5A patent/CN108396369A/zh active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2536690A1 (de) * | 1975-08-18 | 1977-03-03 | Siemens Ag | Bad und verfahren zum elektrolytischen abloesen von stromlos abgeschiedenen nickelueberzuegen von buntmetallen und buntmetallegierungen |
GB2129443A (en) * | 1982-10-29 | 1984-05-16 | Latszereszeti Eszkoezoek Gyara | Electrolytic removal of nickel chromium or gold layers from the surface base and apparatus therefore |
SE9101469D0 (sv) * | 1991-05-15 | 1991-05-15 | Sandvik Ab | Etsmetod |
US5380408A (en) * | 1991-05-15 | 1995-01-10 | Sandvik Ab | Etching process |
CN101481816A (zh) * | 2008-12-29 | 2009-07-15 | 西安理工大学 | 一种剥离铁基类石墨镀层的脱膜剂及脱膜方法 |
CN101629319A (zh) * | 2009-08-11 | 2010-01-20 | 中国科学院宁波材料技术与工程研究所 | 一种退除钢铁表面类金刚石碳膜的方法 |
CN102943301A (zh) * | 2012-10-30 | 2013-02-27 | 四川华丰企业集团有限公司 | 一种对工件表面上的镍磷镀层进行褪镀的方法 |
CN204959074U (zh) * | 2015-07-30 | 2016-01-13 | 深圳市泰日升实业有限公司 | 嵌铜铝基板退镀装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109706517A (zh) * | 2019-02-22 | 2019-05-03 | 苏州中研达环境技术有限公司 | 一种电解退镍铬添加剂及其制备方法 |
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PB01 | Publication | ||
CB03 | Change of inventor or designer information | ||
CB03 | Change of inventor or designer information |
Inventor after: Chen Huahui Inventor after: Qi Jiangtao Inventor after: Yu Zefeng Inventor after: Li Rongzhu Inventor after: Guan Jian Inventor after: Huang Chi Inventor before: Chen Huahui Inventor before: Yu Zefeng Inventor before: Li Rongzhu Inventor before: Guan Jian Inventor before: Huang Chi |
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SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180814 |