CN108385136A - A kind of three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device - Google Patents
A kind of three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device Download PDFInfo
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- CN108385136A CN108385136A CN201810450201.XA CN201810450201A CN108385136A CN 108385136 A CN108385136 A CN 108385136A CN 201810450201 A CN201810450201 A CN 201810450201A CN 108385136 A CN108385136 A CN 108385136A
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- contact
- led panel
- electrolytic
- electric installation
- bconductive
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
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Abstract
The invention discloses a kind of three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive devices, include mainly that electric installation, led panel, top insulation board, auxiliary conducting copper, insulating layer are taught in bottom, teach auxiliary conducting copper and insulating layer of the electric installation containing integral structure in bottom, led panel is mounted on bottom and teaches inside electric installation, and top insulation board is mounted on led panel top.The present invention is successfully solved the problems, such as because installing short of width between electrolytic bath；Effectively reduce the probability of cathode and anode short circuit；Improve the operable space of pole plate；It is whole only have point of contact it is exposed remaining is separated by electro-insulating rubber outside, reduce contact short circuit phenomenon.
Description
Technical field
The present invention relates to the fields of non-ferrous metal electrolytic refining technique, and in particular to a kind of three layers of full coverage type the two poles of the earth four are tactile
Point electrodeposition, Inter-electrolytic-bconductive conductive device.
Background technology
Since the technical merit of non-ferrous metal metallurgy equipment is constantly promoted, the auxiliary facility of some reasons has been unable to meet
The demand of actual use.Similar problems are equally existed in electrorefining, the technological innovation of wherein electrolytic cell just facilitates conduction
The technology upgrading of device.Traditional electrolytic cell is poured using cement, then does Corrosion Protection of Fiber Reinforced Plastics, this structure trough rim thickness again
Greatly, antiseptic property is poor, and heat insulation effect is general, so starting large quantities of resin electrolytic cells occur in recent years, main feature is exactly slot
Side thickness is thin (being half of cement tub or so), and antiseptic property is strong, easy for construction.But the thing followed is electric installation between slot
Installation width is heavily compressed, and existing electric installation cannot be satisfied installation requirements, can be met mounted on tree so design is a kind of
The demand of the electric installation of fat electrolytic cell is very urgent.
Invention content
It is an object of the invention to overcome the shortcomings of the prior art, and it is tactile to provide a kind of three layers of full coverage type the two poles of the earth four
Point electrodeposition, Inter-electrolytic-bconductive conductive device.
The purpose of the present invention is by following technical solution to complete：This three layers of full coverage type dipolar four-contact electricity
Product, Inter-electrolytic-bconductive conductive device, mainly include bottom teach electric installation, led panel, top insulation board, auxiliary conducting copper, absolutely
Edge layer, bottom teach auxiliary conducting copper and insulating layer of the electric installation containing integral structure, led panel to be mounted on bottom and teach electricity
Inside device, top insulation board is mounted on led panel top.
Electric installation both ends are taught to be equipped with embedded card slot in the bottom.
The led panel is equipped with boss contact surface, and installs the height of rear boss contact surface and touched with the copper of auxiliary conducting copper
The height in point contact face is identical.
The top insulation board carries zigzag card slot.
Not on the same line, bottom is taught at the center of the conductive contact surfaces of the led panel and bottom guidance electric installation
On the outside, the contact surface of led panel is in inside for the contact surface of electric installation.
Beneficial effects of the present invention are：The present invention is successfully solved the problems, such as because installing short of width between electrolytic bath；Have
Effect reduces the probability of cathode and anode short circuit；Improve the operable space of pole plate；It is whole only have point of contact it is exposed outside, remaining equal quilt
Electro-insulating rubber separates, and reduces contact short circuit phenomenon.
Description of the drawings
Fig. 1 is the assembly structure diagram of the present invention.
Fig. 2 is that electric installation structural schematic diagram is taught in the bottom of the present invention.
Fig. 3 is the top panel structure schematic diagram of the present invention.
Fig. 4 is the led panel structural schematic diagram of the present invention.
Fig. 5 is that electric installation appearance diagram is taught in the bottom of the present invention.
Reference sign：Electricity is taught in three layers of full coverage type bipolar four-contact electrodeposition and Inter-electrolytic-bconductive conductive device 1, bottom
Device 2, led panel 3, top insulation board 4, auxiliary conducting copper 5, insulating layer 6, embedded card slot 7.
Specific implementation mode
Detailed introduction is done to the present invention below in conjunction with attached drawing：
Embodiment：As shown in the picture, this three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device, it is main
To include that bottom teaches electric installation 2, led panel 3, top insulation board 4, auxiliary conducting copper 5, insulating layer 6, bottom to teach Denso
2 auxiliary conducting coppers 5 and insulating layer 6 containing integral structure are set, led panel 3 is mounted on bottom and teaches inside electric installation 2, top
Insulation board 4 is mounted on 3 top of led panel, forms the structure type that three stackings add.
2 both ends of electric installation are taught to be equipped with embedded card slot 7 in the bottom.It can guarantee that led panel 3 will not be sent out after mounting
Raw movement, ensure that the positioning accuracy of electric installation, while the length of electric installation 2, contact point in led panel 3 is taught in bottom
Reach maximum, the operability of anode and cathode in use is made to greatly improve.
The led panel 3 is equipped with boss contact surface, and installs the copper of the height and auxiliary conducting copper 5 of rear boss contact surface
The height in contact face is identical.
The top insulation board 4 carries zigzag card slot.All exposed coppers other than the boss of led panel 3 can be protected
Row；Reduce contact short circuit caused by the outer copper line of boss.
Not on the same line, bottom is auxiliary at the center of the conductive contact surfaces of the led panel 3 and bottom guidance electric installation 2
On the outside, the contact surface of led panel 3 is in inside for the contact surface of electric installation 2.
It is understood that it will be understood by those skilled in the art that being subject to technical scheme of the present invention and inventive concept
The protection domain of appended claims of the invention should all be belonged to replacement or change.
Claims (5)
1. a kind of three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device, it is characterised in that：It include mainly bottom
Electric installation (2), led panel (3), top insulation board (4), auxiliary conducting copper (5), insulating layer (6), bottom is taught to teach Denso
(2) auxiliary conducting copper (5) and insulating layer (6) containing integral structure is set, led panel (3) is mounted on bottom and teaches electric installation
(2) internal, top insulation board (4) is mounted on led panel (3) top.
2. three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device according to claim 1, feature exist
In：Electric installation (2) both ends are taught to be equipped with embedded card slot (7) in the bottom.
3. three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device according to claim 1, feature exist
In：The led panel (3) is equipped with boss contact surface, and installs the copper of the height and auxiliary conducting copper (5) of rear boss contact surface
The height in contact face is identical.
4. three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device according to claim 1, feature exist
In：The top insulation board (4) carries zigzag card slot.
5. three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device according to claim 1, feature exist
In：Not on the same line, bottom is auxiliary at the center of the conductive contact surfaces of the led panel (3) and bottom guidance electric installation (2)
On the outside, the contact surface of led panel (3) is in inside for the contact surface of electric installation (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810450201.XA CN108385136A (en) | 2018-05-11 | 2018-05-11 | A kind of three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810450201.XA CN108385136A (en) | 2018-05-11 | 2018-05-11 | A kind of three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108385136A true CN108385136A (en) | 2018-08-10 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810450201.XA Pending CN108385136A (en) | 2018-05-11 | 2018-05-11 | A kind of three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device |
Country Status (1)
| Country | Link |
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| CN (1) | CN108385136A (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201722437U (en) * | 2010-06-11 | 2011-01-26 | 德阳市南邡有色金属有限公司 | Fixed electrolytic polar plate |
| CN103122467A (en) * | 2013-02-05 | 2013-05-29 | 杭州三耐环保科技有限公司 | Inter-electrolytic-bath conductive device with homopolar communication circuit |
| CN203159732U (en) * | 2013-02-05 | 2013-08-28 | 杭州三耐环保科技有限公司 | Conductive device positioned between electrolytic baths with homopolar communicated loops |
| CN203976943U (en) * | 2014-05-28 | 2014-12-03 | 九星控股集团有限公司 | A kind of special-shaped auxiliary conductive plate structure between groove for electrolysis |
| CN104562091A (en) * | 2014-12-30 | 2015-04-29 | 三门三友冶化技术开发有限公司 | Embedded type electrodeposition two-pole and four-contact conducting device in electrolytic cell |
| CN204385304U (en) * | 2014-12-30 | 2015-06-10 | 三门三友冶化技术开发有限公司 | Dipolar four-contact electric conduction device between embedded electrodeposition electrolyzer |
| CN207276745U (en) * | 2017-09-15 | 2018-04-27 | 杭州三耐环保科技股份有限公司 | Electric installation between a kind of cathode and anode conductive contact bag groove of different sizes |
| CN208815140U (en) * | 2018-05-11 | 2019-05-03 | 三门三友科技股份有限公司 | Three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device |
-
2018
- 2018-05-11 CN CN201810450201.XA patent/CN108385136A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201722437U (en) * | 2010-06-11 | 2011-01-26 | 德阳市南邡有色金属有限公司 | Fixed electrolytic polar plate |
| CN103122467A (en) * | 2013-02-05 | 2013-05-29 | 杭州三耐环保科技有限公司 | Inter-electrolytic-bath conductive device with homopolar communication circuit |
| CN203159732U (en) * | 2013-02-05 | 2013-08-28 | 杭州三耐环保科技有限公司 | Conductive device positioned between electrolytic baths with homopolar communicated loops |
| CN203976943U (en) * | 2014-05-28 | 2014-12-03 | 九星控股集团有限公司 | A kind of special-shaped auxiliary conductive plate structure between groove for electrolysis |
| CN104562091A (en) * | 2014-12-30 | 2015-04-29 | 三门三友冶化技术开发有限公司 | Embedded type electrodeposition two-pole and four-contact conducting device in electrolytic cell |
| CN204385304U (en) * | 2014-12-30 | 2015-06-10 | 三门三友冶化技术开发有限公司 | Dipolar four-contact electric conduction device between embedded electrodeposition electrolyzer |
| CN207276745U (en) * | 2017-09-15 | 2018-04-27 | 杭州三耐环保科技股份有限公司 | Electric installation between a kind of cathode and anode conductive contact bag groove of different sizes |
| CN208815140U (en) * | 2018-05-11 | 2019-05-03 | 三门三友科技股份有限公司 | Three layers of full coverage type bipolar four-contact electrodeposition, Inter-electrolytic-bconductive conductive device |
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