CN108385067A - A kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production - Google Patents
A kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production Download PDFInfo
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- CN108385067A CN108385067A CN201810261873.6A CN201810261873A CN108385067A CN 108385067 A CN108385067 A CN 108385067A CN 201810261873 A CN201810261873 A CN 201810261873A CN 108385067 A CN108385067 A CN 108385067A
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- tin
- tialn
- arc
- fine blanking
- blanking die
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
Abstract
The present invention relates to a kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die, and coating production, the TiN/TiAlN laminated coatings one to be pressed to be divided into four depositional phases：First stage is Ti puppet transition zones, improves substrate and coating binding force；Second stage is TiN layer；Phase III is TiN/TiAlN multi-buffering-layers, improves coating integral hardness and puncture energy；Fourth stage is TiN working linings.Tu layer overall thickness reaches 7~9 μm, and binding force grade reaches HF2 and nothing collapses film phenomenon.Coating Vickers hardness is between 2500~3000HV0.05, and high temperature oxidation resisting temperature is up to 800 DEG C.The M3 high-speed steel fine blanking die service lifes processed are prepared through the invention can be improved 4 times.
Description
Technical field
The present invention relates to application of the PVD multi-arc ion coating membrane technologies on fine blanking die, belong to PVD multi-arc ion coatings surface
Processing technology field.
Background technology
PVD multi-arc ion coatings are to be machined one of the process for treating surface being most widely used at present.Its high ionization level
The characteristics of so that this technology has more advantages in industrial production now.PVD multi sphere ion plating technologies are put using arc light
Electricity makes target evaporate, leads under vacuum using cathode target as evaporation source by the arc discharge between target and anode casing
Enter working gas, to form plasma in cavity space, to substrate work-piece depositing coating.
Currently, PVD multi-arc ion coatings film deposition techniques are in industry such as cutter, stamping tool, boring bar tool, molds
It is widely applied in production.Production cost has not only been saved, the loss and environmental pollution of raw material are reduced, and has been obtained
Huge economic benefit.But it is limited by technology itself, coating layer thickness is blocked up to be easy to occur collapsing film phenomenon because internal stress is excessive.
Invention content
The present invention is directed to existing PVD multi-arc ion coatings film deposition techniques problem, and coating layer thickness is blocked up to be easy because of planted agent
Power is excessive and occurs collapsing film phenomenon, and the present invention provides a kind of TiN/TiAlN multilayer anti-impact extrusion layers applied to fine blanking die
Preparation method.
The technical solution adopted in the present invention is：
A kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production, include the following steps：
1) it pre-processes：M3 high-speed steel fine blanking dies are cleaned up, are degreased, clamping apparatus disk is loaded in after sloughing oxidation film
On be put into PVD coating machine cavitys, target-substrate distance 30mm；It vacuumizes, heats up；
2) Ti puppet transition zones are generated：Base vacuum is evacuated to 8.0 × 10-3Pa hereinafter, chamber temp rises to 400 DEG C.It is passed through
Ar, Dc bias are set as 600V；Start Ti arc targets, pseudo- transition zone, sedimentation time 3min are deposited in punch head surface；
3) TiN layer is generated：Ar and Ti arc targets are closed, are passed through N2, pulsed bias is set as 100V；Start Ti arc targets, is rushing
Head surface depositing TiN layer, 30~40min of sedimentation time；
4) TiN/TiAlN multi-buffering-layers are generated：Ti arc targets are closed, being passed through N2, (flow is 250~300sccm, deposition gas
Press 0.8~1Pa), pulsed bias is set as 100V；Start TiAl alloy target (arc stream is set as 80A), is deposited in die surface
TiAlN layers, sedimentation time 7min；TiAl alloy target is turned off, Ti arc targets, sedimentation time 3min are opened；Repeat the above steps tune
Periodicity 6~10 processed, is terminated with TiAlN layers；
5) TiN working linings are generated：TiAl alloy target is closed, being passed through N2, (flow is 250~300sccm, deposition pressure 0.8
~1Pa), pulsed bias is set as 100V；Open Ti arcs target (arc stream is set as 80A), depositing TiN working lining, sedimentation time
60min；
6) after the completion of coating deposition, arc target, flowmeter, power supply are closed successively, and gradually cooling boosts to 100 DEG C of chamber temp
Hereinafter, taking out fine blanking die.
It is further arranged to, pivoted frame uses revolution mode, rotating speed 1.5r/min in chamber.
It is further arranged to, the Ti targets purity 99.99%, TiAl alloy target is purity 99.99%Ti/Al atom matter
Amount is than being 67:33 high-aluminium alloy target.
It is further arranged to, the Ar gas flows are 60sccm, deposition pressure 0.2Pa.
It is further arranged to, N2 flows are 250~300sccm, 0.8~1Pa of deposition pressure.
It is further arranged to, Ti arc target arc streams are set as 80A.
The beneficial effects of the present invention are：
The present invention can make coating layer thickness reach 7~9 μm without collapsing film by setting deposition parameter and increase buffer layer, and
And the introducing of buffer layer plays active influence to coating anti-impact pressure effect.
Description of the drawings
Fig. 1 is ball milling instrument ground sample coating schematic diagram.
Fig. 2 is the micro-image of rockwell indentation test sample coating and substrate caking power.
Specific implementation mode
Technical scheme of the present invention is clearly and completely described below in conjunction with attached drawing, it is clear that described implementation
Example is a part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, ordinary skill
The every other embodiment that personnel are obtained without making creative work, shall fall within the protection scope of the present invention.
Embodiment 1：
M3 high-speed steel fine blanking dies are cleaned up, are degreased, sloughs to be loaded on clamping apparatus disk after oxidation film and is put into PVD
Coating machine cavity, target-substrate distance 30mm；Pivoted frame uses revolution mode, rotating speed 1.5r/min；It vacuumizes, heats up；Work as base vacuum
8.0 × 10-3Pa is evacuated to hereinafter, chamber temp rises to 400 DEG C.It is passed through Ar (gas flow 60sccm, deposition pressure 0.2Pa),
Dc bias is set as 600V；Start Ti arcs target (arc stream is set as 80A), pseudo- transition zone, sedimentation time are deposited in die surface
3min；Ar and Ti arc targets are closed, are passed through N2 (flow 285sccm, deposition pressure 1Pa), pulsed bias is set as 100V；Start
Ti targets (arc stream is set as 80A), in die surface depositing TiN layer, sedimentation time 30min；Ti arc targets are closed, TiAl alloy is started
Target (arc stream is set as 80A), in AlN layers of punch head surface depositing Ti, sedimentation time 7min；TiAl alloy target is turned off, Ti is opened
Arc target, sedimentation time 3min；It is 6 to repeat number modulation period, is terminated with TiAlN layers；Close TiAl alloy target；Ti arc targets are opened,
Depositing TiN working lining, sedimentation time 60min；After the completion of coating deposition, arc target, flowmeter, power supply are closed successively, is gradually cooled down
100 DEG C of chamber temp is boosted to hereinafter, taking out fine blanking die.
Test result：8.84 μm of total coating thickness, 2.10 μm of TiN layer, totally 4.74 μm of multilayer TiN/TiAlN buffer layers, TiN
2.00 μm of working lining；Coating is averaged Vickers hardness 2842HV0.05；Using Rockwell apparatus 150kgf gears, under viewing microscope
Image, binding force grade reach HF2.Production test is carried out on cold headers, with the frequency cold-heading ailhead of 120/min, uses the longevity
Life is promoted to more than 100,000 times by 2.4 ten thousand times before non-coating layer, and service life improves 4 times.
Embodiment 2：
M3 high speed steel material fine blanking dies are cleaned up, are degreased, sloughs to be loaded on clamping apparatus disk after oxidation film and put
Enter PVD coating machine cavitys, target-substrate distance 30mm；Pivoted frame uses revolution mode, rotating speed 1.5r/min；It vacuumizes, heats up；Work as background
Vacuum is evacuated to 8.0 × 10-3Pa hereinafter, chamber temp rises to 400 DEG C.It is passed through Ar (gas flow 60sccm, deposition pressure
0.2Pa), Dc bias is set as 600V；Start Ti arcs target (arc stream is set as 80A), deposits pseudo- transition zone in die surface, sink
Product time 3min；Ar and Ti arc targets are closed, are passed through N2 (flow 252sccm, deposition pressure 0.8Pa), pulsed bias is set as
100V；Start Ti targets (arc stream is set as 80A), in die surface depositing TiN layer, sedimentation time 40min；Ti arc targets are closed, are opened
Dynamic TiAl alloy target (arc stream is set as 80A), in AlN layers of punch head surface depositing Ti, sedimentation time 7min；Turn off TiAl alloy
Target opens Ti arc targets, sedimentation time 3min；It is 6 to repeat number modulation period, is terminated with TiAlN layers；Close TiAl alloy target；It beats
Open Ti arc targets, depositing TiN working lining, sedimentation time 60min；After the completion of film deposition, arc target, flowmeter, power supply are closed successively,
Gradually cooling boosts to 100 DEG C of chamber temp hereinafter, taking out fine blanking die.
In conclusion test result of the embodiment of the present invention is：Total coating thickness 8.45m, 2.27 μm of TiN layer, multilayer TiN/
Totally 4.32 μm of TiAlN buffer layers, 1.86 μm of TiN working linings；Coating is averaged Vickers hardness 2682HV0.05；Binding force grade HF2；
Service life is also up to more than 100,000 times.
Therefore, the present invention can reach can make coating layer thickness reach 7~9 by setting deposition parameter and increase buffer layer
μm without collapsing film, and the introducing of buffer layer plays active influence to coating anti-impact pressure effect.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
Understanding without departing from the principles and spirit of the present invention can carry out these embodiments a variety of variations, modification, replace
And modification, the scope of the present invention is defined by the appended.
Claims (6)
1. a kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production, it is characterised in that：Including as follows
Step：
1) it pre-processes：M3 high-speed steel fine blanking dies are cleaned up, are degreased, sloughs to be loaded on clamping apparatus disk after oxidation film and put
Enter PVD coating machine cavitys, target-substrate distance 30mm；It vacuumizes, heats up；
2) Ti puppet transition zones are generated：Base vacuum is evacuated to 8.0 × 10-3Pa hereinafter, chamber temp rises to 400 DEG C.It is passed through Ar, directly
Stream bias sets are 600V；Start Ti arc targets, pseudo- transition zone, sedimentation time 3min are deposited in punch head surface；
3) TiN layer is generated：Ar and Ti arc targets are closed, are passed through N2, pulsed bias is set as 100V；Start Ti arc targets, in punch table
Face depositing TiN layer, 30~40min of sedimentation time；
4) TiN/TiAlN multi-buffering-layers are generated：Ti arc targets are closed, being passed through N2, (flow is 250~300sccm, deposition pressure
0.8~1Pa), pulsed bias is set as 100V；Start TiAl alloy target (arc stream is set as 80A), is deposited in die surface
TiAlN layers, sedimentation time 7min；TiAl alloy target is turned off, Ti arc targets, sedimentation time 3min are opened；Repeat the above steps tune
Periodicity 6~10 processed, is terminated with TiAlN layers；
5) TiN working linings are generated：Close TiAl alloy target, be passed through N2 (flow be 250~300sccm, deposition pressure 0.8~
1Pa), pulsed bias is set as 100V；Open Ti arcs target (arc stream is set as 80A), depositing TiN working lining, sedimentation time
60min；
6) after the completion of coating deposition, arc target, flowmeter, power supply are closed successively, gradually cooling boost to 100 DEG C of chamber temp with
Under, take out fine blanking die.
2. a kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production according to claim 1,
It is characterized in that：Pivoted frame uses revolution mode, rotating speed 1.5r/min in chamber.
3. a kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production according to claim 1,
It is characterized in that：The Ti targets purity 99.99%, TiAl alloy target are that purity 99.99%Ti/Al atom mass rates are 67:33
High-aluminium alloy target.
4. a kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production according to claim 1,
It is characterized in that：The Ar gas flows are 60sccm, deposition pressure 0.2Pa.
5. a kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production according to claim 1,
It is characterized in that：N2 flows are 250~300sccm, 0.8~1Pa of deposition pressure.
6. a kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production according to claim 1,
It is characterized in that：Ti arc target arc streams are set as 80A.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810261873.6A CN108385067A (en) | 2018-03-28 | 2018-03-28 | A kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810261873.6A CN108385067A (en) | 2018-03-28 | 2018-03-28 | A kind of TiN/TiAlN multilayer anti-impacts applied to fine blanking die press coating production |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1643183A (en) * | 2002-03-14 | 2005-07-20 | 钴碳化钨硬质合金公司 | Nanolayered coated cutting tool and method for making the same |
| CN203394354U (en) * | 2013-06-25 | 2014-01-15 | 西南石油大学 | Cone bit of spherical fixing sleeve bearing |
| CN103658790A (en) * | 2012-09-21 | 2014-03-26 | 无锡慧明电子科技有限公司 | Novel high-speed steel milling cutter plated with ultrahard coating layer |
-
2018
- 2018-03-28 CN CN201810261873.6A patent/CN108385067A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1643183A (en) * | 2002-03-14 | 2005-07-20 | 钴碳化钨硬质合金公司 | Nanolayered coated cutting tool and method for making the same |
| CN103658790A (en) * | 2012-09-21 | 2014-03-26 | 无锡慧明电子科技有限公司 | Novel high-speed steel milling cutter plated with ultrahard coating layer |
| CN203394354U (en) * | 2013-06-25 | 2014-01-15 | 西南石油大学 | Cone bit of spherical fixing sleeve bearing |
Non-Patent Citations (3)
| Title |
|---|
| YONG-QIANG WEI ET AL.: ""Effects of pulsed bias duty ratio on microstructure and mechanical properties of TiN/TiAlN multilayer coatings"", 《APPLIED SURFACE SCIENCE》 * |
| 魏永强等: ""调制周期对TiN/TiAlN 多层薄膜微观结构和摩擦性能的影响"", 《热加工工艺》 * |
| 黄美东等: ""多弧离子镀沉积TiAlN/TiN 多层膜的结构与性能"", 《天津师范大学学报（自然科学版）》 * |
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Application publication date: 20180810 |